Patents Issued in May 6, 2004
  • Publication number: 20040084375
    Abstract: To make an inexpensive chromatographic column and perform chromatography with it, column walls and a column end with a port are molded integrally from plastic. A closure is integrally molded with a port as well. One type of closure includes part of a snap-on fastener integrally molded to it to cooperate with corresponding parts molded integrally with the column walls and another type of closure is welded to the tubular walls. In the preferred embodiment the welding is spin welding. The end and closure have channels molded into them radiating from a port and opening toward packing material such as silica beads or porous polymeric plugs. Filters and secondary seals may be located at the ends to prevent leakage of packing material.
    Type: Application
    Filed: October 30, 2003
    Publication date: May 6, 2004
    Applicant: Isco, Inc.
    Inventors: Delwin D. Hodgin, Dale A. Davison
  • Publication number: 20040084376
    Abstract: In order to provide a safe means for the direct purification of groundwater, which enables the efficient use of carbon source and the concentration of nitrificans, while requiring no addition of heavy metals, a starch-derived biodegradable plastic is used as a single carbon source and immobilizing carrier of denitrificans, and contacted with nitrate-polluted groundwater.
    Type: Application
    Filed: December 6, 2002
    Publication date: May 6, 2004
    Inventors: Masatoshi Matsumura, Rey Nayve Fidel
  • Publication number: 20040084377
    Abstract: A method and apparatus for regenerating contaminated or spent water-glycol fluid used as a fire resistant hydraulic fluid. The spent fluid is delivered to a process tank and allowed to settle so that oil floats to the surface and can be skimmed off and removed. Water can be deionized and added to the process tank if necessary. The fluid is pumped out of the process tank and passed through progressively smaller particulate filters and then through a filter media bed for removal of oils, grease, hydrocarbons, dissolved hydrocarbons, hydrolyzed acids, solvents and organic compounds. The purified fluid is delivered to a finish tank to which metered amounts of specified additives can be supplied.
    Type: Application
    Filed: November 5, 2002
    Publication date: May 6, 2004
    Inventors: Gary R. Walker, Jim O. Ackerman
  • Publication number: 20040084378
    Abstract: The present invention is directed to a filtration system including filter media that use diffusion as a method of particulate reduction that balances the contact time required for a desirable level of interception and filter performance. The filter system of the present invention includes a filter medium that removes particulate contaminants by diffusion, means for providing sufficient contact time for an influent to contact the filter medium such that the filter medium can intercept sub-micron particulates at an average flow rate below that of an on-demand or instantaneous flow rate; and a storage buffer for providing a filtered effluent at a rate independent of the average flow rate required to achieve adequate particulate reduction through the filter medium.
    Type: Application
    Filed: December 3, 2002
    Publication date: May 6, 2004
    Inventor: Evan E. Koslow
  • Publication number: 20040084379
    Abstract: A method of treating liquid including mixing coagulant with the liquid, introducing mixed coagulant and liquid into a primary reaction zone, containing an agitator, of a reactor which is substantially concentrically positioned with respect to a secondary reaction zone of the reactor, introducing flocculant into the primary reaction zone at a location between the agitator and where the mixed coagulant and liquid are introduced into the primary reaction zone, mixing the mixed coagulant and liquid with the flocculant and causing the resulting mixture to flow into the secondary reaction zone, introducing an encapsulating agent into the secondary reaction zone, recirculating the liquid and encapsulated flocs through the primary and secondary reaction zone, and passing the liquid and encapsulated flocs outwardly of the reactor, and an apparatus for treating liquids including a reactor, a draft tube substantially concentrically positioned within the reactor and being positioned such that the liquids may flow inwardl
    Type: Application
    Filed: October 31, 2002
    Publication date: May 6, 2004
    Applicant: Ondeo Degremont, Inc.
    Inventor: Peter Temple Ballard
  • Publication number: 20040084380
    Abstract: The present invention relates to a method and system for treating waste materials, such as wastewater treatment plant biosolids or process wastes, by application of energy waves. In one embodiment, waste materials are treated by adding and blending an alkaline material to the waste material, and applying energy waves, such as microwaves or radio frequency waves, thereby significantly reducing pathogenic microorganisms in the waste material to meet the requirements of 40 C.F.R. 503 (2002) for producing a Class “A” product for beneficial use.
    Type: Application
    Filed: November 4, 2002
    Publication date: May 6, 2004
    Inventor: Andrew J. Kicinski
  • Publication number: 20040084381
    Abstract: A method and apparatus for treatment of a fluid medium to inactivate biocontamination using a pulsed electric field (PEF). A fluid medium is pumped through a treatment assembly to treat the fluid medium. A pulse generating system produces input pulses of high voltage that are supplied to the treatment assembly. A pulsed high intensity electric field associated with the input pulses is produced in a treatment assembly. As the fluid medium flows through the treatment assembly, it is exposed to the high intensity electric field, thereby treating the fluid medium. The pulse generating system includes a pulse compressor to reduce the rise time of the high voltage pulses supplied to the treatment assembly, and forming a pulsed electric field in space, without use of an electrode system.
    Type: Application
    Filed: November 4, 2002
    Publication date: May 6, 2004
    Applicant: STERIS Inc.
    Inventor: Sergey A. Korenev
  • Publication number: 20040084382
    Abstract: A novel system and method for purification and disinfection of water containing contaminates is provided. The system includes an aeration column, a first intermediate tank, a first mechanical filter, an electric discharge device, a second intermediate tank, a second mechanical filter and a sorption filter. The water is firstly aerated by continuous mixing the water with air and ozone-air mixture. The water obtained after the aeration is treated with coagulant materials in a medium of the ozone-air mixture. Further, the water is filtered from coagulated particles. Thereafter, the water is treated by electric discharges in an air medium. The water is then treated again with coagulant materials. Finally, the water is filtered from remaining contaminates.
    Type: Application
    Filed: November 5, 2002
    Publication date: May 6, 2004
    Applicant: Aquapure Technologies, Ltd.
    Inventors: Natalia Grigorievna Ryazanova, Nikolay Danilovich Ryazanov
  • Publication number: 20040084383
    Abstract: The invention is a method to inhibit the growth of at least one microorganism in an aqueous system capable of supporting such growth. This includes controlling, and preferably preventing, slime formation in the aqueous system. The method mixes a persulfate salt, a bromide salt, and water under conditions sufficient to form an active bromine-containing, [Br+], solution and then adds an effective amount of the active bromine-containing solution to an aqueous system to inhibit the growth of at least one microorganism in the aqueous system. Also, the invention is a method to inhibit the growth of at least one microorganism on a substrate capable of supporting such growth. The method contacts the substrate with an effective amount of active bromine-containing solution to inhibit the growth of at least one microorganism on the substrate. Combining an amine source with the persulfate salt and bromide salts generates an active bromine-containing solution which also contains bromamines.
    Type: Application
    Filed: October 30, 2002
    Publication date: May 6, 2004
    Applicant: BUCKMAN LABORATORIES INTERNATIONAL, INC.
    Inventors: Xiangdong Zhou, Thomas E. McNeel
  • Publication number: 20040084384
    Abstract: The invention relates to microbicidal separation systems using antimicrobial polymers, and to their production and use.
    Type: Application
    Filed: September 8, 2003
    Publication date: May 6, 2004
    Inventors: Peter Ottersbach, Friedrich Sosna
  • Publication number: 20040084385
    Abstract: An apparatus is provided for separation of suspended solid particles from fluids, for separation and mixing of fluids, and for dissolving gases in aqueous fluids. The apparatus employs a grooved ring to divide the fluid stream and impart a high velocity on each of the divided or sub-streams. A grooved ring with any number of grooves that may be spiral in shape is used to create a high velocity circular motion on a divided stream for separation of suspended solid particles by centrifugal force in a cyclone filter and for saturation of liquid with gases in a fluid mixer where gases are introduced through a diffuser. A grooved ring with any number of grooves that may be radial is used in a fluid mixer to divide a stream of fluid, produce a high velocity flow through each groove, introduce a second fluid through an orifice into the first fluid flowing through each groove, and direct the fluid mixture to a center impact zone where the various streams collide to complete the mixing.
    Type: Application
    Filed: October 1, 2003
    Publication date: May 6, 2004
    Applicant: Hydrotreat, Inc.
    Inventor: Johnny Arnaud
  • Publication number: 20040084386
    Abstract: A security device locks to a display structure such as a pegboard or slatboard to prevent the rapid removal of merchandise from the display structure by preventing the rapid removal of the entire security device. The security device includes a base and a rod with the base having locked and unlocked positions. The unlocked position of the base allows the security device to be removed from the display structure. The locked position of the base prevents the security device from being removed. The security device includes a lock that holds the base in the locked position. A key may be used to unlock the base. Customers may remove items of merchandise from the security device while the lock and base are in their locked positions.
    Type: Application
    Filed: October 23, 2003
    Publication date: May 6, 2004
    Inventors: David Huehner, Robert L. Michael, Michael Jaeb, Dennis D. Belden, Todd H. Christian, Nicholas M. Sedon
  • Publication number: 20040084387
    Abstract: A letter tray kit is disclosed to include two trays and an accessory set. The trays respectively include a floor panel for lodging papers, two side walls respectively positioned at a left side and a right side of the floor panel, and at least one connection portion at each of the side wall. The accessory set includes at least two supporting members, each of which is coupled with the connection portions of the trays respectively at a top side and a bottom side thereof so as to set one tray vertically apart from the other tray at a predetermined height. Each of the trays is provided with a plurality of retaining grooves at a bottom side thereof for detachably embedding the supporting members.
    Type: Application
    Filed: December 26, 2002
    Publication date: May 6, 2004
    Inventor: Jung-Shih Chang
  • Publication number: 20040084388
    Abstract: A card retention system comprises a retainer adapted to apply an increasing level of retention force to an expansion card disposed in a chassis as a size of the expansion card increases. The system also comprises a support member adapted to support the retainer in a plurality of different locations relative to the expansion card.
    Type: Application
    Filed: November 5, 2002
    Publication date: May 6, 2004
    Inventors: Arlen L. Roesner, Erick J. Tuttle
  • Publication number: 20040084389
    Abstract: A merchandising display shelf track device for receiving a row of articles for sliding movement therealong has non-planar front face members connected to a base wall and top stop members. Racking forces exerted on the top stop members are transferred through the non-planar face members to the base wall to minimize racking.
    Type: Application
    Filed: October 31, 2002
    Publication date: May 6, 2004
    Applicant: Display Industries
    Inventors: James David Robertson, Bernard Primiano
  • Publication number: 20040084390
    Abstract: A refrigerator tray holds containers of individual beverages for dispensing the beverages one at a time. The tray has a ventilated support panel surrounded about its periphery by a frame of sidewalls. The support panel fits in the sidewalls so that the panel slants downward toward the front to gravity feed the beverages.
    Type: Application
    Filed: October 31, 2002
    Publication date: May 6, 2004
    Applicant: Display Industries
    Inventor: David Bernstein
  • Publication number: 20040084391
    Abstract: A merchandising display shelf track device for receiving a row of articles for sliding movement therealong has non-planar front face members connected to a base wall and sidewalls. Racking forces exerted on the front face members are transferred through the non-planar face members to the base wall and sidewalls to minimize racking. An anti-torsion bar connects the front face members to prevent spreading of the sidewalls and thereby minimize racking.
    Type: Application
    Filed: February 27, 2003
    Publication date: May 6, 2004
    Inventor: Bernard Primiano
  • Publication number: 20040084392
    Abstract: A merchandising system is disclosed. The merchandising system provides for the presentation and storage of articles comprising a frame comprising a plurality of generally horizontal members configured for attachment of a holder and at least one frame member provided to rigidify the plurality of horizontal members so that the frame is resistant to deformation when the holder is attached to one or more of the plurality of horizontal members.
    Type: Application
    Filed: September 10, 2003
    Publication date: May 6, 2004
    Applicant: DCI Marketing, Inc.
    Inventors: Gary M. Richter, M. Scott Bryson, Terrence G. Berglund
  • Publication number: 20040084393
    Abstract: An apparatus is disclosed comprising a tray which is rotatably connected to a base. The tray can be comprised of a plurality of recesses, wherein each of the plurality of recesses is adapted to receive a corresponding one of a plurality of garbage cans. Each of the plurality of garbage cans can be placed in a corresponding recess so that when the tray is rotated with respect to the base, the position of any of the plurality of garbage cans with respect to the base changes. This allows easy access to the appropriate garbage can such as an open garbage can. One or more handles may be connected to the tray to help rotate the tray.
    Type: Application
    Filed: December 30, 2002
    Publication date: May 6, 2004
    Inventor: Josephine Varga
  • Publication number: 20040084394
    Abstract: A lock for preventing inadvertent removal of a first frame component from a second frame component of an adjustable storage system. The lock includes a housing having a distal end extending into the first frame component, a shaft having a proximal end and a distal end and being movable between an extended position and a retracted position relative to the housing, with the distal end thereof extending into the second frame component when the shaft is in the extended position and not extending into the second frame component when the shaft is in the retracted position, a head being slender and elongated, joined to the proximal end of the shaft, and extending radially outwardly therefrom, radially outwardly through the housing, when the shaft is in the extended position and the retracted position, and a spring joined between the head and the housing and biasing the shaft into the extended position.
    Type: Application
    Filed: July 11, 2003
    Publication date: May 6, 2004
    Inventor: Michael Powell
  • Publication number: 20040084395
    Abstract: A frequency standard has a cell formed in a cavity of a substrate. The cell contains a metal alkali vapor. The substrate has an optical path that intersects the cell. A light source is supported by the substrate and supplies light through the first optical path to the cell, and a light detector is supported by the substrate and receives light through the second optical path from the cell. The sealed vapor-filled cell is surrounded by a vacuum cavity enclosure. Bridges between the cell and the substrate may be used to thermally isolate the cell in the cavity and allow closed loop temperature control of the cell.
    Type: Application
    Filed: August 14, 2002
    Publication date: May 6, 2004
    Applicant: Honeywell International Inc.
    Inventors: Dan W. Youngner, James F. Detry, J. David Zook
  • Publication number: 20040084396
    Abstract: Methods and systems for forming compound slots in a substrate are described. In one exemplary implementation, a method forms a plurality of slots in a substrate. The method also etches a trench in the substrate contiguous with the plurality of slots to form a compound slot.
    Type: Application
    Filed: August 19, 2003
    Publication date: May 6, 2004
    Inventors: Jeremy Donaldson, Eric L. Nikkel, Jeffrey S. Obert, Jeffrey R. Pollard, Jeff Hess
  • Publication number: 20040084397
    Abstract: A color wheel including a disk-shaped substrate made of a light-transmittable medium and a plurality of filters arranged on the substrate is fabricated. Each filter is capable of selectively transmitting rays of light having a desired wavelength. The method of fabricating the color wheel including the steps of forming at least one of a plurality of adjoining selective color-transmittable films as the filters each at a predetermined area on a front side of the disk-shaped substrate, and utilizing, as a mask for exposure from a back side of the disk-shaped substrate, a portion containing at least one of two borders with which each one of the plurality of adjoining selective color-transmittable films is defined.
    Type: Application
    Filed: July 14, 2003
    Publication date: May 6, 2004
    Applicants: National Institute for Materials Science, MURAKAMI CORPORATION
    Inventors: Masayuki Kamei, Takefumi Mitsuhashi, Sakae Mizuhashi
  • Publication number: 20040084398
    Abstract: The module (10) described is in particular a wafer module, and has two oppositely situated functional elements (11, 12) which are functionally interconnected by a compression-deformable joining agent layer (13) located in between. At least one functional element (11; 12; 11, 12) is surface-structured to form a recess (14), and the functional connection is present exclusively in the region of the recess (14).
    Type: Application
    Filed: July 2, 2003
    Publication date: May 6, 2004
    Inventors: Klaus Breitschwerdt, Hans Artmann, Wilhelm Frey, Karsten Funk, Juergen Neumann
  • Publication number: 20040084399
    Abstract: Provided for herein is a method of planarizing a printed circuit board substrate including contacting at least a portion of a printed circuit board substrate with a planarizing liquid, a planarizing surface, and an abrasive component that produces a surface texture on the planarized surface, the texture having a roughness less than the smallest wiring feature on the substrate, wherein the planarizing liquid includes a liquid carrier, and optionally components to remove material from the circuit board substrate and wherein the contacting comprises a plurality of contacting motions on the printed circuit board substrate.
    Type: Application
    Filed: May 28, 2003
    Publication date: May 6, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Lee M. Cook, Mark LeFebvre, Martin W. Bayes
  • Publication number: 20040084400
    Abstract: Patterning metal stack layers of a magnetic switching device to enable a critical lithography level to be made on planar substrate without any topography and enable a second lithography step without topography from a top patterned hardmask, comprising:
    Type: Application
    Filed: October 30, 2002
    Publication date: May 6, 2004
    Inventors: Gregory Costrini, John P. Hummel, George Stojakovic, Kia-Seng Low
  • Publication number: 20040084401
    Abstract: This invention consists of transforming a liquid crystal flat screen, normally designed to operate in transmissive mode, to enable it to operate in reflective mode so as to consume less energy. To do this, some screen elements inserted between the liquid crystal layer (3) and the reflector (9) must satisfy a specific relation.
    Type: Application
    Filed: June 4, 2003
    Publication date: May 6, 2004
    Inventors: Bernard Aspar, Jean-Frederic Clerc
  • Publication number: 20040084402
    Abstract: A polymer-based microfluidic device and its manufacturing methods. This microfluidic device is suitable for chromatographic and electrophoretic separations in which the detection of the components in the fluid is by means of ultraviolet (UV) spectroscopy. The device further comprises at least one cooling channel adjacent the separation channel, said cooling channel conducting a cooling fluid through the device for removing heat from the the separation channel. At least one section of the separation channel has an increased cross-sectional dimension with respect to other sections of said channel to provide an increased optical path length when the device is used in an ultraviolet detection arrangement.
    Type: Application
    Filed: March 13, 2003
    Publication date: May 6, 2004
    Inventors: James William Ashmead, Sau Lan Tang
  • Publication number: 20040084403
    Abstract: A method for making a through-hole in a silicon substrate includes the steps of forming a high-impurity-concentration region in the periphery of a through-hole-forming region at a first surface of the silicon substrate, forming an etching stop layer over the through-hole-forming region and the high-impurity-concentration region, forming a mask layer having an opening at a second surface of the silicon substrate, etching the silicon substrate at the opening through the mask layer until the etching stop layer is exposed to the second surface, further etching the silicon substrate until the etched portion extends to the high-impurity-concentration region, and removing the etching stop layer at least at the portion exposed to the second surface. Also disclosed is an ink-jet printer head including an ink supply port fabricated using the method for making the through-hole.
    Type: Application
    Filed: June 23, 2003
    Publication date: May 6, 2004
    Applicant: Canon Kabushiki Kaisha
    Inventor: Norio Ohkuma
  • Publication number: 20040084404
    Abstract: The described embodiments relate to a slotted substrate and methods of forming same. One exemplary method patterns a hardmask on a first substrate surface sufficient to expose a first area of the first surface and forms a slot portion in the substrate through less than an entirety of the first area of the first surface. The slot portion has a cross-sectional area at the first surface that is less than a cross-sectional area of the first area. After forming the slot portion, the method etches the substrate to remove material from within the first area to form a fluid-handling slot.
    Type: Application
    Filed: June 20, 2003
    Publication date: May 6, 2004
    Inventors: Jeremy Donaldson, Martha A. Truninger, Jeffrey S. Obert
  • Publication number: 20040084405
    Abstract: A method of fabricating an ink jet printhead includes the step of depositing a layer of a sacrificial material on a substrate that incorporates drive circuitry layers positioned on a wafer substrate. The layer of sacrificial material is etched to define deposition zones for actuators. A first layer of a thermally expandable actuator material is deposited on the deposition zones. The first layer of actuator material and the drive circuitry layers are etched to define deposition zones for a conductive material of the actuators and for vias for heating circuits of the actuators. A layer of a conductive material is deposited on the first layer of actuator material. The layer of conductive material is etched to define a heating circuit for each actuator. A second layer of actuator material is deposited on the layer of conductive material so that the heating circuits are embedded in the actuator material. The actuator material is etched to define the actuators and the closure members.
    Type: Application
    Filed: October 28, 2003
    Publication date: May 6, 2004
    Inventor: Kia Silverbrook
  • Publication number: 20040084406
    Abstract: An apparatus and method for etching a feature in a wafer with improved depth control and reproducibility is described. The feature is etched at a first etching rate and then at a second etching rate, which is slower than the first etching rate. An optical end point device is used to determine the etching depth and etching is stopped so that the feature has the desired depth. Two different etching rates provides high throughput with good depth control and reproducibility. The apparatus includes an etching tool in which a chuck holds the wafer to be etched. An optical end point device is positioned to measure the feature etch depth. An electronic controller communicates with the optical end point device and the etching tool to control the tool to reduce the etch rate part way through etching the feature and to stop the etching tool, so that that the feature is etched to the desired depth.
    Type: Application
    Filed: September 25, 2002
    Publication date: May 6, 2004
    Applicant: Lam Research Corporation
    Inventors: Tom A. Kamp, Alan J. Miller, Vijayakumar C. Venugopal
  • Publication number: 20040084407
    Abstract: A method for surface preparation of a polycrystalline material prior to etching. The material surface is amorphized by two particle beam bombardments s on the material surface. These energized particles break the crystal structure of the crystalline material and convert it into amorphous material. The two particle beams are oriented to each other at an angle of at least twice of the critical angle of channeling for the most open crystal structure in the material. This ensures amorphization of the material surface regardless of the different grain orientations on the surface. The amorphous surface has isotropic surface properties and thus allows uniform etching. The uniformity in surface properties allows better control over etching process and reduces damage to underlying and adjacent material.
    Type: Application
    Filed: October 31, 2002
    Publication date: May 6, 2004
    Applicant: NPTEST, INC.
    Inventors: Vladimir V. Makarov, William B. Thompson, Theodore R. Lundquist
  • Publication number: 20040084408
    Abstract: A method for surface preparation of a polycrystalline material prior to etching. The material surface is effectively amorphized by two particle beam bombardments on the material surface. These energized particles break the crystal structure of the crystalline material and convert it effectively into an amorphous material. The two particle beams are oriented to each other at an angle of at least twice of the critical angle of channeling for the most open crystal structure in the material. This ensures effective amorphization of the material surface regardless of the different grain orientations on the surface. The amorphized surface has isotropic surface properties and thus allows uniform etching at the second angle. The uniformity in surface properties allows better control over etching process and reduces damage to underlying and adjacent material.
    Type: Application
    Filed: April 21, 2003
    Publication date: May 6, 2004
    Applicant: NPTEST, INC.
    Inventors: Vladimir V. Makarov, William B. Thompson, Theodore R. Lundquist
  • Publication number: 20040084409
    Abstract: An integrated etch process, for example as used for etching an anti-reflection layer and an underlying aluminum layer, in which the chamber wall polymerization is controlled by coating polymer onto the sidewall by a plasma deposition process prior to inserting the wafer into the chamber, etching the structure, and after removing the wafer from the chamber, plasma cleaning the polymer from the chamber wall. The process is process is particularly useful when the etching is performed in a multi-step process and the polymer is used for passivating the etched structure, for example, a sidewall in an etched structure and in which the first etching step deposits polymer and the second etching step removes polymer. The controlled polymerization eliminates interactions of the etching with the chamber wall material, produces repeatable results between wafers, and eliminates in the etching plasma instabilities associated with changing wall conditions.
    Type: Application
    Filed: November 4, 2002
    Publication date: May 6, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Shashank C. Deshmukh, Thorsten B. Lill
  • Publication number: 20040084410
    Abstract: Methods of etching dielectric materials in a semiconductor processing apparatus use a thick silicon upper electrode that can be operated at high power levels for an extended service life.
    Type: Application
    Filed: October 31, 2002
    Publication date: May 6, 2004
    Inventor: Eric H. Lenz
  • Publication number: 20040084411
    Abstract: Disclosed herein is a method of pattern etching a layer of a silicon-containing dielectric material. The method employs a plasma source gas comprising CH2F2, CF4, and O2, where a volumetric ratio of CH2F2 to CF4 is within the range of about 1:2 to about 3:1, and where O2 comprises about 2 to about 20 volume % of the plasma source gas. Etching is performed at a process chamber pressure within the range of about 4 mTorr to about 10 mTorr. The method provides a selectivity for etching a silicon-containing dielectric layer relative to photoresist of at least 2:1. The method also provides an etch profile sidewall angle ranging from about 84° to about 90° between the etched silicon-containing dielectric layer and an underlying horizontal layer in a semiconductor structure.
    Type: Application
    Filed: October 31, 2002
    Publication date: May 6, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Yan Du, Shashank Deshmukh, Meihua Shen, Steven Jones
  • Publication number: 20040084412
    Abstract: A substantially oxygen-free and nitrogen-free plasma ashing process for removing photoresist in the presence of a low k material from a semiconductor substrate includes forming reactive species by exposing a plasma gas composition to an energy source to form plasma. The plasma gas composition is substantially free from oxygen-bearing and nitrogen-bearing gases. The plasma selectively removes the photoresist from the underlying substrate containing low k material by exposing the photoresist to substantially oxygen and nitrogen free reactive species. The process can be used with carbon containing low k dielectric materials.
    Type: Application
    Filed: August 11, 2003
    Publication date: May 6, 2004
    Inventors: Carlo Waldfried, Orlando Escorcia, Qingyuan Han, Thomas Buckley, Palani Sakthivel
  • Publication number: 20040084413
    Abstract: An interlayer insulating film composed of an organic compound film containing an organic component as a main constituent is deposited on a semiconductor substrate. Then, etching is performed with respect to the interlayer insulating film by using a plasma derived from an etching gas containing an ammonia gas as a main constituent. As a result, active hydrogen is generated in the plasma derived from the ammonia gas to decompose the organic component into hydrogen cyanide, whereby etching proceeds. Since a surface of the organic compound film is efficiently nitrided by nitrogen generated from the ammonia gas, the sidewalls of a depressed portion in the organic compound film are protected so that an excellent anisotropic property is provided. Since the etching gas does not contain a component which oxidizes the organic compound film, the problem does not occur that a gas is generated from the organic compound film in a subsequent heat treatment process.
    Type: Application
    Filed: August 20, 2003
    Publication date: May 6, 2004
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventor: Nobuo Aoi
  • Publication number: 20040084414
    Abstract: A polishing method for reliably polishing a polishing target and a polishing composition used for polishing are provided. The polishing method of the present invention includes a first step in which the polishing target is polished with a first polishing composition, a second step in which the polishing target is polished with a second polishing composition, and a third step in which polishing target is polished with a third polishing composition. The polishing target is a multilayer, which includes an insulation layer, which has trenches on its surface, a barrier layer located on the insulation layer, and a conductor layer located on the barrier layer. In the first step, part of a portion of the conductor layer located outside the trenches is removed. In the second step, a remaining part of the portion of the conductor layer located outside the trenches is removed. In the third step, a portion of the barrier layer located outside the trenches is removed.
    Type: Application
    Filed: August 18, 2003
    Publication date: May 6, 2004
    Inventors: Kenji Sakai, Kazusei Tamai, Atsunori Kawamura, Tsuyoshi Matsuda, Tatsuhiko Hirano, Katsuyoshi Ina
  • Publication number: 20040084415
    Abstract: Two problems seen in CMP as currently executed are a tendency for slurry particles to remain on the surface and the formation of a final layer of oxide. These problems have been solved by adding to the slurry a quantity of TMAH or TBAH. This has the effect of rendering the surface being polished hydrophobic. In that state a residual layer of oxide will not be left on the surface at the conclusion of CMP. Nor will many slurry abrasive particles remain cling to the freshly polished surface. Those that do are readily removed by a simple rinse or buffing. As an alternative, the CMP process may be performed in three stages—first convention CMP, then polishing in a solution of TMAH or TBAH, and finally a gentle rinse or buffing.
    Type: Application
    Filed: October 29, 2003
    Publication date: May 6, 2004
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
    Inventors: Ying-Lang Wang, Shih-Chi Lin, Yi-Lung Cheng, Chi-Wen Liu, Ming-Hua Yoo, Wen-Kung Cheng, Jiann-Kwang Wang
  • Publication number: 20040084416
    Abstract: A method for post-treating a dry-etched metal film is provided. The dry-etched metal film includes an unetched portion covered by a photoresist and an etched portion exposed from the photoresist and having thereon an etching by-product. According to the method, a stripping agent is used to remove the photoresist on the unetched portion, while reacting the stripping agent with the etching by-product to form a passivation layer on the exposed metal film. Then, a washing agent is used to remove the passivation layer after the photoresist is removed. A system for performing combined etching and stripping procedures of a metal film is also provided. The system comprises dry-etching chambers, stripping and cleaning chambers and a transportation device. In the stripping and cleaning chambers, the photoresist on the unetched portion is removed by a stripping agent and a passivation layer is formed on the etched portion by reacting the stripping agent.
    Type: Application
    Filed: July 7, 2003
    Publication date: May 6, 2004
    Inventors: Tehsin Lee, Brian Peng, Jerry Chung, Chih-Chung Liu, Chia-Wei Lin
  • Publication number: 20040084417
    Abstract: An electroacoustic transducer 1 includes a base 24 made of a magnetic material, a magnetic core 22 made of a magnetic material and erected on the base 24, and a diaphragm 20 made of a magnetic material and supported with a space distanced from the top end of the magnetic core 22. The base 24, the magnetic core 22 and the diaphragm 20 form a magnetic circuit. The electroacoustic transducer 1 includes a magnet 25 supplying a static magnetic field, and a coil 23 supplying an oscillation magnetic field to the magnetic circuit. A lead wire 23a (23b) of the coil 23 and a connection land 50a (50b) are electrically connected by resistance welding or thermal welding with the lead wire 23a (23b) held between the connection land 50a (50b) and a cover member 52a (52b).
    Type: Application
    Filed: October 21, 2003
    Publication date: May 6, 2004
    Applicant: STAR MICRONICS CO., LTD.
    Inventor: Kazuyasu Ono
  • Publication number: 20040084418
    Abstract: An electrical discharge machining apparatus is provided with at least two work stations. A first servomotor is mounted above the first and second work stations, and a second servomotor mounted to the first servomotor so as to be selectively positioned over either of the first and second work stations by the first servomotor. The second servomotor is capable of causing relative motion between an electrode and a workpiece fixture in the first work station when positioned over the first work station and causing relative motion between an electrode and a workpiece fixture in the second work station when positioned over the second work station.
    Type: Application
    Filed: November 1, 2002
    Publication date: May 6, 2004
    Applicant: General Electric Company
    Inventor: Rudi Oskar Krenz
  • Publication number: 20040084419
    Abstract: A wire electric discharge machine capable of preventing a straightness error from being caused by consumption of a wire electrode, to thereby eliminate insufficient machining. A correction angle &phgr; is predetermined for preventing the straightness error of the workpiece due to consumption thereof. Correction amounts d1′, d2′ on a program plane and an upper surface of a workpiece, respectively, are determined based on the predetermined correction angle &phgr;, and are added to or subtracted from a predetermined offset amount depending on a wire electrode radius and an electric discharging gap, to thereby determine corrected offset amounts d1, d2 on the program plane and the upper surface of the workpiece, respectively. Correction amounts dlo, dup for lower and upper wire guides in an offset direction are obtained based on the corrected offset amounts d1, d2, respectively, so that motion paths of upper and lower wire guides relative to the workpiece are determined.
    Type: Application
    Filed: October 22, 2003
    Publication date: May 6, 2004
    Applicant: Fanuc Ltd.
    Inventors: Junichi Kato, Keiichiro Miyajima, Yasuo Arakawa, Toshiyuki Ogata
  • Publication number: 20040084420
    Abstract: A welding torch (10) comprises an electrode (12), means to supply weld filler material (14), a nozzle (16) surrounding the electrode (12), means to supply inert gas (17) to the nozzle (16) and a shroud (18) surrounding the nozzle (16). There are means to form a seal (20) provided between the nozzle (16) and the shroud (18), the means to form a seal (20) is arranged to allow relative movement between the nozzle (16) and the shroud (18). The means to form a seal (20) comprises a plurality of rings (22,24,26). Each ring (22,24,26) has an aperture (28,30,32) and an outer diameter (34,36,38). The diameter of the aperture (28) in a first ring (22) is substantially the same as the diameter of the nozzle (16). The outer diameter (34) of the first ring (22) is less than the outer diameter (36) of a second ring (24). The outer diameter (36) of the second ring (24) is substantially the same as the diameter of the shroud (18).
    Type: Application
    Filed: October 15, 2003
    Publication date: May 6, 2004
    Inventor: Richard G. Milburn
  • Publication number: 20040084421
    Abstract: A method for applying wear resistant material to a substrate, the substrate comprised of material with a substrate coefficient of thermal expansion, the method including applying the wear resistant material to the substrate with application apparatus, the wear resistant material having a wear resistant material coefficient of thermal expansion, the substrate coefficient of thermal expansion within 15% of the wear resistant material coefficient of thermal expansion.
    Type: Application
    Filed: November 1, 2002
    Publication date: May 6, 2004
    Inventors: Jimmie Brooks Bolton, Billi Marie Rogers
  • Publication number: 20040084422
    Abstract: The invention relates to a plasma source whose plasma is ignited by means of an electric voltage. To be able to carry out the ignition at relatively low voltages, a plate (5) provided with holes (13, 14) is provided beneath a plasma volume (17), which is disposed above a wall (21) of a plasma chamber (3). Through this plate (5) an ignition volume (16) is formed beneath the plasma volume (17) with a higher pressure than in the plasma volume (17), in which the plasma ignites first. The ignition is subsequently propagated through the holes of the plate (5) into the plasma volume (17).
    Type: Application
    Filed: September 16, 2003
    Publication date: May 6, 2004
    Inventors: Rudolf Beckmann, Markus Fuhr, Walter Zultzke, Werner Weinrich
  • Publication number: 20040084423
    Abstract: A stationary shroud of a gas turbine engine made of a base metal is repaired by removing any damaged material from a flow-path region of the stationary shroud to leave an initially exposed base-metal flow-path surface; and applying a base-metal restoration overlying the initially exposed flow-path surface. The base-metal restoration is applied by furnishing a source of a structural material that is compatible with the base metal, and depositing the source of the structural material overlying the initially exposed base-metal flow-path surface of the stationary shroud by plasma transferred arc welding to form a repaired base-metal flow-path surface. An environmentally resistant rub coating may be applied overlying the base-metal restoration.
    Type: Application
    Filed: October 30, 2002
    Publication date: May 6, 2004
    Inventors: Warren Davis Grossklaus, Matthew Nicklus Miller
  • Publication number: 20040084424
    Abstract: A method and a device for the longitudinal welding of profiles (2,5, 13) is provided in which a profile (13) that is to be provided with a weld seam (22, 23) is guided through a welding device (1), and in the welding device (1) a welding head (14, 15) produces a weld point (20, 21) on the profile (13), in order to manufacture a weld seam (22, 23). The profile movement is braked at selectable intervals from an essentially constant production speed down to the point at which the profile (13) is at a standstill, and is subsequently accelerated back to the production speed, while the application of welding energy to the profile (13) is switched off below a threshold transport speed.
    Type: Application
    Filed: October 17, 2003
    Publication date: May 6, 2004
    Applicant: Dreisetern-Werk Maschinenbau GmbH & Co. KG
    Inventor: Thomas Kruckels