Abstract: The invention relates to a method and apparatus for the fragmentation of large molecules, especially biopolymers. The invention consists in reacting analyte ions with excited or radical neutral particles, whereby, at least in the case of bombardment of analyte ions with helium atoms from an FAB generator, a new type of fragmentation occurs which strongly resembles fragmentation by electron capture (ECD). The reactions may be performed in magnetic ion traps (ion cyclotron resonance cells, ICR), in RF ion traps according to Wolfgang Paul, in RF ion guides, or in free beams of analyte ions or neutral particles.

Abstract: An analyzing method which includes ionizing a sample, dissociating plurality of precursor ions which have different m/z values, and deciding if fragment ions of a predetermined m/z value are present.

Abstract: An asymmetric field ion mobility spectrometer for filtering ions via an asymmetric electric field, an ion flow generator propulsing ions to the filter via a propulsion field.

Abstract: The invention relates to an ion mobility spectrometer in which a measuring tube, a filter and a transport device are connected to form a circulatory gas system, with a gas inlet which introduces ambient gas for analysis into the measuring tube of the ion mobility spectrometer. The invention involves connecting the measuring tube with the ambient gas by means of a dosing channel and connecting the circulatory gas system with the ambient gas by means of an outlet channel. The outlet channel joins the circulatory gas system between the high-pressure side of the transport device and the measuring tube, so that ambient gas for analysis is introduced into the measuring tube via the dosing channel while, at the same time, gas flows out of the circulatory gas system via the outlet channel without further transport devices being required.

Abstract: Improved ion focusing for an ion mobility drift cell allows for improved throughput for subsequent detection such as mass detection. Improved focusing is realized by the use of alternating regions of high and low electric fields in the ion mobility drift cell.

Abstract: By connecting the Bradbury-Nielson gate (BNG) directly to a driver without a transmission line, distortion of the voltage waveform experienced a the BNG are much reduced. Because the magnitude of the modulation defects grows as the applied modulation voltage is increased, Bradbury-Nielson gates with finer wire spacing such as 100 microns, and operating at 10 to 15 V, significantly better signal-to-noise ratios are achieved. HT-TOFMS data were also post processed using an exact knowledge of the modulation defects.

Abstract: Provided are ion sources, methods of forming ions and mass analyzer systems. In various embodiments, the present teachings provide ion sources, methods for focusing ions from an ion source, and methods for operating a time-of-flight mass analyzer. In various embodiments, the present teachings relate to matrix-assisted laser desorption/ionization (MALDI) ion sources and methods of MALDI ion source operation, for use with mass analyzers. In various aspects, provided are ion sources and methods of operation thereof that facilitate increasing one or more of sensitivity and resolution of a TOF mass analyzer configured for multiple modes of operation.

Abstract: Disclosed are an apparatus, system, and method for performing electrospray of biomolecules, particularly peptides, polypeptides, and proteins. The apparatus comprises at least (1) a microfluidic substrate for containing an electrospray microchannel for delivering analyte molecules to a side edge of the substrate, and (2) a porous membrane attached to the side edge for performing electrospray from the exposed membrane surface. In one preferred embodiment, the exposed membrane surface is positioned above a target surface for depositing analyte molecules onto the target surface by electrospray. In another preferred embodiment, a proteolytic enzyme is bound to the porous membrane for performing protein digestion during electrospray.

Abstract: An integrated analytical device is described. The device includes a plurality of components which are initially mounted or provided on support submounts. The submounts are then packaged onto a microbench, with the alignment of the submounts relative to the microbench being determined by alignment features provided on the microbench.

Abstract: An ion optical system including an ionizer for ionizing one or more compounds, the ionizer including a plurality of components, a mass separator for separating ions of the one or more compounds, the mass separator including a plurality of components, and a detector for identifying the one or more compounds, the detector including a plurality of components. At least one of the plurality of components of at least one of the ionizer, mass separator and detector includes a composition of zirconium oxide and aluminum oxide.

Abstract: The present invention provides a time of flight mass spectrometer having an ion optics forming a multi-turn track, which is capable of time-focusing the ions while allowing the multi-turn track to be configured in an unlimited and highly variable manner. In a specific form of the invention, a reflector 9 is provided on the flight path between the position where the ions leave the loop orbit P and the ion detector 10 located outside the loop orbit P, and the condition of the electric field generated by the reflector 9 is appropriately determined. Thus, even if the ions cannot be well time-focused by the ion optics 2 creating the sector-shaped electric fields 4 and 7, it is possible to compensate the time-focusing performance with the reflector 9 to achieve a good performance of time-focusing of the ion throughout the overall system wherein the ions leave the ion source 1 and finally reach the ion detector 10.

Abstract: Time-of-flight mass spectrometer instruments are disclosed for monitoring fast processes with large dynamic range using a multi-threshold TDC data acquisition method or a threshold ADC data acquisition method. Embodiments using a combination of both methods are also disclosed.

Abstract: A mass analyzer for isolating, fragmenting and scanning ions. The mass analyzer includes an ion trap having a first electrode, a second electrode adjacent to the first electrode, and a third electrode interposed between the first electrode and the second electrode, a first RF source electrically connected to the first electrode and second electrode and a second RF voltage source electrically connected to the third electrode. The second RF voltage source provides for a second electrical field for fragmenting ions and broadens the potential application of the fragmentation cut-off of the device allowing for analysis of peptides and other complex molecules. The mass analyzer may be used independently or in combination with a mass spectrometry system. A method of ion fragmentation and cut-off is also disclosed.

Abstract: A system and method for analyzing a specimen containing particles that can be difficult to differentiate. The system and method determines a first collective count of a selected group of particles in the specimen, treats at least a portion of the specimen to alter a subgroup of the selected group of particles, determines a second collective count of any of the selected group of particles in the treated portion of the specimen, and subtracts the second collective count from the first collective count to determine a differentiation count for the subgroup of particles altered by the treating of the specimen. The system and method is described with the example of determining concentrations of red and white blood cells in a specimen (e.g. spinal fluid), using auto-particle recognition techniques, without attempting to distinguish and count red versus white blood cells co-existing in the same specimen portion.

Abstract: A method of manufacturing a processing probe comprising a cantilever arranged in opposition to a sample, and a processing needle provided at a tip end of the cantilever to be able to contact with a surface of the sample in a state of being opposed to the sample, the processing needle being sharpened at a tip end thereof, the method comprising a selecting process of selecting a diamond small piece, which is sized to be conformed to a tip end dimension of the cantilever and has a projection, out of a plurality of diamond small pieces, a moving process of moving the selected diamond small piece onto a processing base after the selecting process, and a processing process of performing an etching processing in a manner to further sharpen the projection in an optional shape with focused beam after the moving process and mounting a base end side of the projection to the tip end of the cantilever with the use of the focused beam to fabricate a processing needle.

Abstract: Systems and methods for addressable field enhancement microscopy are provided. In an embodiment, a nanoscale array of islands may be illuminated with an electromagnetic signal and addressed to differentiate signals from different islands of the nanoscale array. The differentiated signals originating from illuminating the nanoscale array may be applied to microscopy of a specimen.

Abstract: An apparatus including a positioner control device, a measuring device and a control routine. The positioner control device is communicatively coupled to a chamber of a charged particle beam device (CPBD) and is configured to individually manipulate each of a plurality of probes within the CPBD chamber to establish contact between ones of the plurality of probes and corresponding ones of a plurality of contact points of a sample positioned in the CPBD chamber. The measuring device is communicatively coupled to the CPBD and the positioner control device and is configured to perform one of a measurement and a detection of a characteristic associated with one of the plurality of contact points. The control routine is configured to at least partially automate control of at least one of the CPBD, the positioner control device and the measuring device.

Abstract: An inspection method and apparatus irradiates a sample on which a pattern is formed with an electron beam, so that an inspection image and a reference image can be generated on the basis of a secondary electron or a reflected electron emitted by the sample. An abnormal pattern is determined based on a difference in halftone values of each pixel between the inspection image and the reference image. A plurality of feature quantities of the abnormal pattern are obtained from an image of the abnormal pattern, and, based on the distribution of the plurality of feature quantities of the abnormal pattern, a range for classifying the type of the abnormal pattern is designated. Thus, a desired defect can be extracted from many defects extracted by inspection.

Abstract: Calculation means calculates a sample height for focusing an ion beam and an electron beam onto a same observation point, based on magnifications of a secondary electron image obtained by an irradiation with the ion beam and a secondary electron image obtained by an irradiation with the electron beam, and a distance between an observation point in the secondary electron image obtained by the irradiation with the ion beam and the observation point in the secondary electron image obtained by the irradiation with the electron beam.

Abstract: A scanning method for a scanning electron microscope is provided which minimizes a degradation in dimension measuring accuracy caused by a shrink of a specimen. A time between the first and the second scan over the same location on the specimen is shortened by changing the scanning order of scan lines to enable the scanning to be performed successively while the shrink is small.

Abstract: Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g.

Abstract: A non-destructive method is provided for determining amount and distribution of a corrosion product on a metallic substrate. A value of infrared energy reflected from the metallic substrate without corrosion is determined. A value of infrared energy reflected from the metallic substrate with the corrosion product is determined. A value of infrared energy absorbed in the corrosion product is determined, and the value of the infrared energy absorbed in the corrosion product is correlated to an amount of the corrosion product.

Abstract: An apparatus and methods for spectroscopic analysis of a petroleum product, including detecting and quantifying fuel dilution in an oil sample are disclose. The apparatus includes a sample reservoir for receiving a liquid sample of a petroleum product, a heater for heating a sample in the sample reservoir, a vapor collector for collecting vapors released by heating the liquid sample, and a spectrometer for analyzing the released vapors.

Abstract: Methods are provided for determining the presence of cracks in razor blades during manufacturing. The methods may include, for example, providing a plurality of razor blades in a stack, inducing a current in the stack, and measuring a parameter that is related to the current and indicative of the presence or absence of cracks in the razor blades.

Abstract: When making a characteristic line, a plurality of different small amount reference light beams is caused to impinge upon the photodetector element, a zero-light signal value is obtained by extrapolation of the relation between the small amount side reference light beams and the signal values which are respectively output from the photodetector element in response to the small amount side reference light beams, a large amount reference light signal value which is output when a large amount light beam impinges upon the photodetector element is obtained, and a characteristic line representing a relation between the amount of light which the photodetector element receives and a value of the signal which is output from the photodetector element is made on the basis of the zero-light signal value and the large amount reference light signal value.

Abstract: A light source is disclosed. The light source has a light-emitting chip that includes an LED that generates light in an active region thereof. The LED emits a light signal in a forward direction, and infrared radiation generated in the active region is emitted in a side direction in the form of a first infrared signal. The first light signal is determined by a first drive signal coupled to the LED. The light source also includes an infrared detector positioned to collect a portion of the infrared signal. The infrared detector generates a heat signal indicative of the amount of infrared radiation detected. A controller generates the drive signal so as to maintain the heat signal at a first target value. In light sources having LEDs that emit in different spectral ranges, the infrared detectors can all detect heat in the same spectral range.

Abstract: A support mechanism for protecting an object is described. The support system includes at least one support or friction ring for providing dynamic protection to the object. One embodiment includes a support ring having corrugated bumps. Another embodiment includes multiple support rings axially separated by spacers. In another embodiment a support mechanism is provided having at least one friction ring in combination with O-rings. A compound optical coupler is also described, which has a self-wetting clear optical coupling gel and an elastomeric load ring.

Abstract: A ?-ray signal processing section 60? determines a detection time of a ? ray based on a ?-ray detection signal outputted from a semiconductor radiation detector for detecting the ? ray, and determines the energy of the ? ray. Then, a time correction circuit 70 obtains, based on the energy of the ? ray, a detection value of the detection time that corresponds to the energy of the ? ray from a time correction table indicating the relationship between the energy of the ? ray and the correction value of the detection time of the ? ray, and corrects the detection time according to the obtained correction value of the detection time. Coincidence counting is performed on the ? ray in a coincidence counting circuit 80 based on the corrected detection time.

Abstract: Gamma ray detector characterised in that its structural elements are a continuous scintillator crystal, a position sensitive photodetector and associated electronics intended to calculate, in addition to the gamma ray energy in the position of its interaction in the crystal, the interaction depth in the crystal from the standard deviation of the scintillation light distribution. Said information may be obtained electronically, in analog form and therefore instantaneous, from the first three moments of the scintillation light distribution. A method for implementing said electronics by way of a network of resistances characterised for analog and simultaneous computation of the first and second distribution moments is also disclosed.

Abstract: A scintillated CCD detector system for imaging x rays uses x-rays having a photon energy in the range of 1 to 20 keV. The detector differs from existing systems in that it provides extremely high resolution of better than a micrometer, and high detection quantum efficiency of up to 95%. The design of this detector also allows it to function as an energy filter to remove high-energy x-rays. This detector is useful in a wide range of applications including x-ray imaging, spectroscopy, and diffraction. The scintillator optical system has scintillator material with a lens system for collecting the light that is generated in the scintillator material. A substrate is used for spacing the scintillator material from the lens system.

Abstract: A sensor lower electrode of a MIS type photosensor is connected to a gate line distributed in a next line in a scanning direction through a refreshing capacitor. The MIS type photosensors of an (n?1)-th line are refreshed on the basis of an ON/OFF operation of TFTs accompanying a reading operation for a pixel column of an n-th line to thereby allow the refresh operation to be carried out every scanning line. Thus, it is possible to prevent a moving image from becoming unnatural due to the refresh operation as in the background art.

Abstract: A flat panel x-ray imager exhibiting reduced ghosting effects and overvoltage protection by appropriate leakage current characteristics of the thin-film transistor array. A top electrode of a suitable material is directly on an amorphous selenium-based charge generator layer allowing charge transport across the layer, thereby reducing ghosting. Alternatively, a non-insulating organic layer may be between the top electrode and the charge generating layer. The thin-film transistors have leakage current that rises relatively slowly with voltage across the transistor within a range that matches exposure through an object being imaged but rises at a sufficiently higher rate within a higher range to provide protection even when a corresponding region of the charge generator layer receives greater amounts of x-rays. A voltage is applied to the top electrode. This voltage may be within the range of 500 V to 2,000 V.

Abstract: A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.

Abstract: The invention is directed to electrostatic deflection systems for corpuscular beams which can be used particularly in microstructured and nanostructured applications in lithography installations or measuring equipment. According to the proposed object of the invention, the individual electrodes of a deflection system of this kind should permanently have and retain a very exact axially symmetric arrangement relative to one another. In the electrostatic deflection system according to the invention, rod-shaped electrodes are held in an axially symmetric arrangement in an inwardly hollow carrier through which a corpuscular beam can be directed. The carrier is formed of at least two, and at most four, carrier members which are connected to one another.

Abstract: The present invention provides a combined electrostatically suppressed Faraday and energy contamination monitor and related methods for its use. The apparatus of the present invention is capable of selectively measuring two properties of an ion beam, including, for example, a current and a level of energy contamination in a decelerated ion beam. A first aspect of the invention provides an ion beam measurement apparatus comprising an aperture for receiving the ion beam, a negatively biased electrode disposed adjacent to the aperture, a positively biased electrode disposed adjacent to the negatively biased electrode, a selectively biased electrode disposed adjacent to the positively biased electrode, and a collector, wherein the selectively biased electrode may selectively be negatively biased or positively biased.

Abstract: An ultraviolet water treatment system is provided for treating water moving through a treatment area in a direction D. The system includes a series of ultraviolet modules disposed in side-by-side relationship in the treatment area. Each module includes an ultraviolet lamp and a pair of vertical supports with one support of each module being deemed an upstream support and one support being deemed a downstream support. The upstream supports of the respective modules are non-aligned and at least two of the upstream supports are staggered in the direction D and lie generally in separate transverse planes with respect to direction D.

Abstract: A device that permits the in-home UV treatment of drinking water such as tap water is disclosed. The device employs a bare low-energy UV lamp suspended below a reflector and above a free surface of water flowing within the device. The water is supplied from a tap or other store of drinking water and proceeds through the device by the force of gravity. The device itself is not pressurized. The flow of water within the device is exposed to UV radiation from the UV lamp and is disinfected as a result. In the illustrated embodiment, the device is of a small size to permit its use, for example, directly at a tap for drinking water within the home. The flow rate of the device is commensurate with the normal flow rate of tap water, preferably less than about 8 liters per minute. The lamp power for safely disinfecting the water can be less than 20 watts, and in the illustrated embodiment the lamp is a low-pressure Hg lamp.

Abstract: A device (2) for sterilising a fluid comprising a sterilisation zone (4) having an outlet portion (10), comprising at least one aperture (16) through which the fluid may exit the device (2), wherein the sterilisation zone (4) is arranged to be irradiated by a source of ultraviolet radiation (18) such that substantially all of the internal surfaces of the outlet portion (10) are directly irradiated by the source of ultraviolet radiation (18) and wherein the source of ultraviolet radiation (18) and the at least one aperture (16) are arranged such that substantially no ultraviolet radiation may be transmitted directly from the source of ultraviolet radiation (18) through the at least one aperture (16). Preferably the device (2) comprises a shower unit. There is also disclosed a method of sterilising a fluid.

Abstract: The invention concerns a novel method adapted to experimental conditions, for determining the function defining the actual detecting sensitivity of a solid-state detector of nuclear traces and which represents the detecting performances for each type of nucleus emitting energy alpha particles Ei, located in each position inside a sample to be analyzed, and hence precision dosimetry of the radioactive nuclei in a sample using nuclear trace solid-state detectors. The method provides an improvement of the quality of sample analyses, a significant reduction of analysis costs and an important widening of the scope of application of this type of detectors. Thus, the method will bring about the development of a new generation of detectors having a better price-quality ratio which can be found in the field of radioactive nuclei analyses in different types of samples.

Abstract: A device for irradiating a target by a charged hadron beam, which may find application in hadron therapy. The device includes corpuscular optics designed to make the density of the beam uniform, along at least one direction perpendicular to the trajectory of the beam, and a three-dimensional control for the irradiation.

Abstract: Minimum electron energy is used for the sterilization of preformed containers in order to minimize the machinery size, cost and radiation shielding required for in-line use. The electron energy required is reduced by the use of one-sided (unilateral) irradiation wherein the dose delivered by the primary radiation to thicker portions of the containers is supplemented by the dose delivered by scattered electrons.

Abstract: The invention pertains to a process for the production of particle beam systems (10-10??, 12-12?), in which at least one first particle beam system (10-10??) is produced on a first substrate (14) by computer-guided particle beam-induced deposition, and the minimum of one first particle beam system (10-10??) is used to produce at least one second particle beam system (12-12?) on at least one second substrate (16) by computer-guided particle beam-induced deposition. The inventive process makes it possible to produce a large number of particle beam systems in a relatively short time.

Abstract: An apparatus is provided which is capable of measuring an angle between a holder and an ion beam without generating particles, with a simple structure, in a short time and at high accuracy even during an implantation state. An angle measurement apparatus is configured to: measure an angle of the ion beam by measuring beam plasma produced and emitting light when the ion beam collides with residual gas, with two cameras at two positions in a beam traveling direction; measure an angle of the holder by measuring light from a linear light source provided on the holder; and thereby measure the angle between the ion beam and the holder.

Abstract: A charged particle beam lithography apparatus includes a charged particle beam generation source; a charged particle beam forming portion through which the charged particle beam is transmitted; a first deflector arranged between the charged particle beam forming portion and the charged particle beam generation source; a second deflector arranged between the first deflector and the charged particle beam forming portion; an imaging unit obtaining image data of the aperture; and a control portion calculating amounts of excitation of the first and second deflector based on the image data. The charged particle beam is deflected by the first deflector to intersect the optical axis. The deflected charged particle beam is deflected by the second deflector to advance on the optical axis. The control portion controls the first and second deflectors based on the calculated amounts of excitation.

Abstract: An electron beam welding apparatus includes an electron beam generator for selectively emitting an electron beam into a weld chamber. The electron beam welding apparatus further includes a measuring device for detecting an intensity of the electron beam and a slit plate disposed between the electron beam generator and the measuring device. The slit plate permits passage of the electron beam through a slit formed in the slit plate, and the measuring device determines a location of the electron beam in dependence upon the detected intensity of the electron beam passing through the slit. The electron beam welding device further includes thermally non-conductive and/or absorbing materials strategically placed between parts to be welded and all components of mechanical assemblies requiring precision location.

Abstract: A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam resulting in a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.

Abstract: The invention provides a charged particle therapy system capable of increasing the number of patients treated. An irradiation filed forming apparatus for irradiating a charged particle beam extracted from a charged particle beam generator to an irradiation target includes an RMW device. The RMW device comprises a housing and an RMW disposed within the housing. A rotary shaft of the RMW is rotatably mounted to the housing. The RMW device is detachably installed in an RMW holding member providied in a casing of the irradiation filed forming apparatus. The housing can be placed in contact with the RMW holding member, and hence positioning of the rotary shaft of the RMW to a predetermined position can be performed in a short time. This contributed to cutting a time required for treatment per patient and increasing the number of patients treated.

Abstract: A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.

Abstract: It is made possible to prevent the color aberration at the lenses from increasing and prevent the current distribution on the sample surface from changing at the time of the blanking operation. A deflector is placed between the first and second shaping apertures. A first crossover image is formed between the first and second shaping apertures. A second crossover image is formed in the vicinity of the beam blanking aperture. The deflector placed between the first shaping aperture and the second shaping aperture includes at least two deflectors. A beam position on the beam blanking aperture is moved without moving the image of the first shaping aperture on the second shaping aperture, by deflecting the electron beam at the time of blanking.

Abstract: A lithographic apparatus includes an illuminator configured to provide a projection beam of radiation and a polarization controller configured to control an intensity of a preferred state of polarization of the projection beam. The lithographic apparatus further includes a support configured to hold a patterning device. The patterning device configured to pattern the projection beam according to a desired pattern. The apparatus also includes a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate to form a patterned image on the substrate.