Abstract: An electron beam apparatus equipped with a review function of a semiconductor wafer includes a scanning electron microscope to obtain image information of a semiconductor wafer, and an information processing apparatus to process the image information. The information processing apparatus includes a data input unit to receive positional information of a defect on the wafer, a storage for storing a plurality of image information of a position on the wafer corresponding to the positional information, and an image processing unit that retrieves any of the plurality of image information, and classifies the retrieved image information corresponding to the positional information depending on the type of defect.

Abstract: A device and method which enable a transmission electron microscope to measure electron diffraction patterns of a sample very precisely are disclosed. The patterns are suitable for structure determination. The electron beam is precessed by means of deflector coils (6) in the transmission electron microscope before the sample (4), in combination with a similar precession of the electron diffraction pattern by means of deflector coils (9) situated after the sample. The electron diffraction pattern is scanned by means of deflector coils (9) situated after the sample.

Abstract: A method and a device for generating images in a motor vehicle are provided. An infrared-sensitive camera generates images of the surroundings of the motor vehicle. An emission source emitting in the near infrared spectral region is used for the pulsed illumination of sub-ranges of the image recording region of the camera. The camera generates the images by recording partial image regions. To record the partial image regions, a synchronization in time is carried out with the pulsed illumination of the sub-range including at least the partial image region. In the preferred exemplary embodiment, the recording of partial image regions of an infrared-sensitive CMOS camera is synchronized in time with a laser diode array emitting in the near infrared spectral region.

Abstract: An IR camera system includes an array of thermally-tunable optical filter pixels, an NIR source and an NIR detector array. The IR camera system further includes IR optics for directing IR radiation from a scene to be imaged onto the array of thermally-tunable optical filter pixels and NIR optics for directing NIR light from the NIR source, to the filter pixels and to the NIR detector arrays. The NIR source directs NIR light onto the array of thermally-tunable optical filter pixels. The NIR detector array receives NIR light modified by the array of thermally-tunable optical filter pixels and produces an electrical signal corresponding to the NIR light the NIR detector array receives.

Abstract: One embodiment of the present invention is a system for identifying a human being from movement of the human being. The system includes a dual element pyroelectric detector, a Fresnel lens array, and a processor. The dual element pyroelectric detector detects radiation from the human being as the human being moves over time. The Fresnel lens array is located between the dual element pyroelectric detector and the human being. The Fresnel lens array improves collection efficiency and spatial resolution of the dual element pyroelectric detector. The Fresnel lens array includes a mask. The mask provides at least one zone of visibility. The processor is coupled to the dual element pyroelectric detector, the processor converts the detected radiation to a spectral radiation signature. The processor compares the spectral radiation signature to at least a second spectral radiation signature to identify the human being.

Abstract: A sensor system senses a scene and includes a dual-band imaging infrared detector lying on a beam path, wherein the infrared detector detects infrared images in a first infrared wavelength band and in a second infrared wavelength band; and a two-color cold-shield filter lying on the beam path between the infrared detector and the scene. The cold-shield filter defines a first aperture size for infrared light of the first infrared wavelength band, and a second aperture size larger than the first aperture size for infrared light of the second infrared wavelength band. The first infrared wavelength band has wavelengths less than wavelengths of the second infrared wavelength band.

Abstract: The present invention relates to a method for quantifying the composition of a product, with the following steps: irradiating the product with a radiation source in the near infrared range; receiving radiation which is reflected by or transmitted through the product, and providing an output signal corresponding to the intensity of the radiation received at a number of different wavelengths; determining whether or not the product lies within predetermined integrity criteria on the basis of the output signal using a mathematical method, wherein the product contains a solution or homogeneous dispersion, and the content of at least one substance contained in the dispersion or solution is quantitatively determined on the basis of the output signal., The present invention also relates to an apparatus for carrying out this method.

Abstract: A radiation detection system that measures radiation (e.g., signature energy-level gamma radiation and neutrons) is employed aboard a ship or other transport vehicle along with conventional cargo to monitor for the presence of a fissile material, as would be found in a nuclear weapon, or for the presence of other sources of radiation. The detection system can be used over the course of the cargo transport, thereby enabling finely tuned monitoring for fissile material across distances of many meters extending through surrounding cargo containers. Because the system can be utilized during a ship's transport, a positive detection of fissile material can be made and acted upon while the ship is still at sea far from the destination port, where detonation of a nuclear weapon could have catastrophic consequences.

Abstract: A moldable and curing reflector material for an X-ray detector is disclosed. It includes a detector material which converts X-rays into light and is divided into a plurality of segments separated by the reflector material. The reflector material includes a polymer matrix which contains a first optically reflecting material and also a finely distributed gas and/or a second optically reflecting material, which is different than the first optically reflecting material. An X-ray detector is further disclosed, which contains a material of this type, along with a process for producing a material of this type and a process for producing an X-ray detector.

Abstract: A portable radiographic imaging apparatus is provided which includes a system for facilitating proper alignment of a capturing section of the apparatus with a ray source while a subject is positioned therebetween. The apparatus includes a sensor having an effective capturing area which includes devices for converting rays into electrical signals; a casing enclosing the sensor; and portions formed on the casing for indicating a target capturing area aligned with and having a shape similar to the effective capturing area. A boundary of the effective capturing area is perceivable by touching the portions, thereby allowing an operator to recognize offset between the subject and the capturing section during alignment/positioning of the capturing section with respect to the subject and the ray source.

Abstract: A low noise digital radiography image capture system employs a two-dimensional array of pixel sites in the image capture panel with each site having an analog-to-digital converter to digitize analog charge values produced by imaging radiation directly into corresponding digital data at the site prior to read-out to subsequent digital data processing electronics thereby avoiding noise and crosstalk problems associated with high frequency read-out of analog information. Fill factor problems caused by inclusion of integrated circuitry on the pixel site are minimized by inclusion of the A/D counter on the opposite side of the substrate support for the pixel site.

Abstract: Method and apparatus for sensing and acquiring radiation data comprises sensing radiation events with a multi-modality detector. The detector comprises solid state crystals forming a matrix of pixels which may be arranged in rows and columns, and has a radiation detection field for sensing radiation events. The radiation events for each pixel are counted by an electronic module attached to each pixel. The electronic module comprises a threshold analyzer for analyzing the radiation events. The threshold analyzer identifies valid events by comparing an energy level associated with the radiation event to a predetermined threshold. The electronic module further comprises at least a first counter for counting the valid events.

Abstract: A device to measure the amount of ultraviolet (UV) light that can transmit through a water sample, relative to the amount of UV light that can transmit through a sample of known UV transmittance. The measurement is known in the industry as UV percent transmittance (UVT). UVT can also be represented as UV absorbance (UVA) with the use of a simple mathematical calculation. UVT and UVA are essentially just different expressions of the same measurement. Preferably the sample of known UV transmittance (blank sample) has a UVT of 100%. A single UV sensor is used to measure the amount of UV light that transmits through the blank sample and through the water sample under test. In order to maintain accuracy, compensation must be made for fluctuations or drift in the UV lamp output. Such fluctuation and drift is very common in UV lamps and is due primarily to changes in temperature and imperfections in the ballast and lamp.

Abstract: The invention provides an imaging system using an inherently non-imaging detection probe, linked to a, position and optional contact-sensing device, for use in scanning a surface having a surface radiation flux. The system has processing means to take signals from the detection probe and sensing devices, and to create an image of the geometry of the surface, and of the surface radiation flux. The system also provides means to determine the depth of a radiation source below the surface. The system also has means to present this image to a user.

Abstract: An apparatus for producing a beam of charged particles is provided, which comprises an emitter (1, 2) and a switching device (3) adapted to switch between first, second and third beam current levels, wherein the beam current at said first current level is suitable for writing a pixel of an image on the surface of a sample, the beam current at said second current level is suitable for not writing a pixel on the surface of said sample, and the beam current at said third current level is lower than the beam current at the second current level.

Abstract: An electric-magnetic field-generating element and a multipole element comprising a plurality of these field-generating elements providing for a stable charged particle beam are described. For some embodiments, the electric-magnetic field-generating element includes a pole piece, a yoke to which the pole piece is attached, at least one coil, a vacuum-tight container accommodating the coil(s), and a holder adapted to hold the vacuum-tight container such that the vacuum-tight container is spaced from the pole piece and the yoke.

Abstract: A beam current density distribution in y direction of an ion beam 4 at a position of a forestage beam restricting shutter 32 is measured by measuring a change in a beam current of the ion beam 4 incident on a forestage multipoint Faraday 24 by passing an outer side of a side 34 of the shutter 32 while driving the forestage beam restricting shutter 32 in y direction by a forestage shutter driving apparatus 36. Further, a beam current density distribution in y direction of the ion beam 4 at a position of a poststage beam restricting shutter 42 is measured by measuring a change in the beam current of the ion beam 4 incident on a poststage multipoints Faraday 28 by passing an outer side of a side 44 of the shutter 42 while driving the poststage beam restricting shutter 42 in y direction by a poststage shutter driving apparatus 46. Further, at least one of an angle deviation, a diverging angle and abeam side in y direction of the ion beam 4 is measured by using a result of the measurement.

Abstract: The present invention provides an apparatus and method for use with a mass spectrometer. The multimode ionization source of the present invention provides one or more atmospheric pressure ionization sources (e.g., electrospray, atmospheric pressure chemical ionization and/or atmospheric pressure photoionization) for ionizing molecules. A method of producing ions using the multimode ionization source is also disclosed. The apparatus and method provide the advantages of the combined ion sources without the inherent disadvantages of the individual sources. In an embodiment, the multimode ionization source includes an infrared emitter enclosed in an inner chamber for drying a charged aerosol. ESI/APCI multimode sources may include a corona needle shield and/or an auxiliary electrode.

Abstract: The present invention provides an apparatus and method for use with a mass spectrometry system. The invention provides an ion source for providing radiative heating to an ionization region. The ion source includes a nanospray ionization device for producing ions and a conduit adjacent to the ionization device for receiving ions from the ionization device. The conduit includes a conductive material for providing indirect radiative heating to the ionization region. Direct radiative heating may also be provided using a heater in the conduit. The ion source may be used separately or in conjunction with the mass spectrometry system. When used in conjunction with a mass spectrometry system a detector may also be employed down stream from the device. A method for desolvating an analyte using the device is also disclosed.

Abstract: The present invention provides an apparatus and method for use with a mass spectrometer. The multimode ionization source of the present invention provides one or more atmospheric pressure ionization sources (e.g., electrospray, atmospheric pressure chemical ionization and/or atmospheric pressure photoionization) for ionizing natural product and organic molecules. A method of producing ions using the multimode ionization source is also disclosed. The apparatus and method provide the advantages of the combined ion sources without the inherent disadvantages of the individual sources. In an embodiment, the multimode ionization source includes an infrared emitter enclosed in an inner chamber for drying a charged aerosol. ESI/APCI multimode sources may include a corona needle shield and/or an auxiliary electrode.

Abstract: Biological molecules such as protein molecules are ionized without being damaged. Massive cluster ions of a water/methanol mixture (to which acetic acid or ammonia, etc., has been added) (in the vicinity of dry ice—acetone temperature) are generated in a charged-droplet generating chamber by a cold electrospray, and the ions are accelerated in an evacuated acceleration chamber by a high-voltage electric field on the order of 10 KV, thereby bombarding a biological sample thin film, which has been applied to a cooled specimen substrate, and achieving ionization of large biomolecules.

Abstract: A high sensitivity glow discharge ion source system for analyzing particles includes an aerodynamic lens having a plurality of constrictions for receiving an aerosol including at least one analyte particle in a carrier gas and focusing the analyte particles into a collimated particle beam. A separator separates the carrier gas from the analyte particle beam, wherein the analyte particle beam or vapors derived from the analyte particle beam are selectively transmitted out of from the separator. A glow discharge ionization source includes a discharge chamber having an entrance orifice for receiving the analyte particle beam or analyte vapors, and a target electrode and discharge electrode therein. An electric field applied between the target electrode and discharge electrode generates an analyte ion stream from the analyte vapors, which is directed out of the discharge chamber through an exit orifice, such as to a mass spectrometer.

Abstract: In accordance with the present invention, modular corona shields are employed in a HTS device to reduce the electric field surrounding the HTS device. In a exemplary embodiment a fault current limiter module in the insulation region of a cryogenic cooling system has at least one fault current limiter set which employs a first corona shield disposed along the top portion of the fault current limiter set and is electrically coupled to the fault current limiter set. A second corona shield is disposed along the bottom portion of the fault current limiter set and is electrically coupled to the fault current limiter set. An insulation barrier is disposed within the insulation region along at least one side of the fault current limiter set. The first corona shield and the second corona shield act together to reduce the electric field surrounding the fault limiter set when voltage is applied to the fault limiter set.

Abstract: There is provided a sample deposition device for depositing samples on a target surface such as MALDI target surfaces for use in mass spectrometry analysis. The device comprises a vacuum chamber, a sealable opening communicating with the vacuum chamber, a sample inlet and a sample outlet. The sample outlet is located in the vacuum chamber which is sealed by contact with the target surface. The sample is drawn through the sample inlet and deposited on the surface by the action of the vacuum.

Abstract: Disclosed herein is a device for holding a substrate having one or more samples in a position for ionizing the samples with a light energy source. The device has a receiving plate with a receiving surface, a back surface and an edge defining an outline. One or more receiving lips project from the receiving surface. The receiving surface receives the back face of the substrate with at least one edge received by the receiving lips for positioning the substrate for ionization of the sample. The device also has at least one substrate clip that has a front finger and a back finger for capturing and aligning the substrate. The front finger extends across the thickness of the receiving plate and substrate to engage the front edge of the substrate to hold the substrate in position. The back finger engages the back surface of the receiving plate. The receiving plate cooperates with the space in a matrix assisted laser desorption ionization mass spectrometer to hold the samples in position for ionization.

Abstract: A vacuum processing apparatus and method includes a sample taken out from a given cassette placed on a cassette support in atmosphere, the sample is carried into a vacuum processing chamber via a chamber enabling switching between atmosphere and vacuum, the sample is subjected to etching processing in the vacuum processing chamber, and at least one inspection process is carried out in the vacuum either before or after etching of the sample in the vacuum processing chamber. The at least one inspection process in the vacuum is a defect inspection.

Abstract: A motion system includes a first stage that is configured to rotate about a first axis and a second stage coupled to the first stage that includes an object carrier adapted to position an object in at least one other axis. The motion system has a novel arrangement of laser interferometer elements and axes of motion. The arrangement permits accurate and precise measurement of a position of the object carrier in up to three (or more) axes of motion even as the first stage of the motion system is tilted through relatively large angles. The novel arrangement of the axes of motion also enables very precise control of the position of the object carrier even at high tilt angles.

Abstract: A conveyor system for exposing an object to an electrical discharge to increase the surface tension of a surface of the object comprises a guide, a first conveyor, an electrode, and a second conveyor. The first conveyor is configured to convey the object toward the guide. The electrode is configured to provide an electrical discharge. The guide and the second conveyor are configured to rotate the object for exposure to the electrical discharge.

Abstract: A resolution-enhanced luminescence microscopy method, wherein a sample is excited so as to luminesce, and thus to emit a given luminescence radiation, by irradiation of exciting radiation and an image of the luminescent sample is obtained, wherein the luminescent sample is transferable from a first state of luminescence, in which first state the sample's excitability for emission of the given luminescence radiation increases up to a maximum value as the exciting radiation power increases, into a second state of luminescence, in which second state the sample has reduced excitability for emission of the given luminescence radiation relative to the first state, wherein the maximum value is assigned to a threshold value of exciting radiation power and the sample is transferable into the second state by irradiation of exciting radiation power above the threshold value, the sample being brought into the first state in partial areas and being brought into the second state in adjacent partial areas by irradiating exc

Abstract: The invention relates to an irradiation device (1) comprising a base part (2), a support (3) longitudinally extending from the base part (2) and enclosing an angle (a) with a vertical axis V, and a housing (4) comprising a central axis (5), at least one radiation unit (6), and a radiation emission plane (7), said housing (4) being pivotally connected to said support via a pivot shaft (8), said housing (4) being pivotable between an operational position (A), in which the radiation emission plane (7) is horizontal (X), and a rest position (B), in which the radiation emission plane (7) vertical (Y), and the central axis (5) of the housing (4) encloses the angle (a) with the vertical axis (V), the pivot shaft (8) extending from the support enclosing an angle (a/2) with the horizontal plane (X) and with the vertical plane (Y).

Abstract: In an embodiment, an ion beam profiler center measuring apparatus is releasably mounted to the ion beam profiler and measures a center position of an ion beam profiler using a laser beam. Accurate data for a profiler center position may be obtained without direct contact with a platen. A procedure to measure and adjust a center position of the ion beam profiler may be easily performed regardless of an operator's dexterity, requiring relatively little time.

Abstract: A method for correcting drifts of an electron beam, includes periodically correcting drift of the electron beam once per time period while varying the time period in length, and correcting, in addition to the correction per time period, the drift of the electron beam regardless of elapse of said time period when a change in value of a specified disturbance factor occurs with a prespecified change amount.

Abstract: A method of producing a heat-resistant electrically charged fluororesin material is provided. The method comprises the steps of providing a fluorine-containing resin material; irradiating the fluorine-containing resin material with ionizing radiation at a temperature not lower than a crystalline melting point of the fluorine-containing resin material in absence of oxygen, thereby causing crosslinking in the fluorine-containing resin material to change the fluorine-containing resin material into a heat-resistant fluororesin material; and, electrifying the heat-resistant fluororesin material to form a heat-resistant electrically charged fluororesin material. The method may further comprises the step of heating the material following the step of electrifying. The successive steps of electrifying and heating are repeatedly conducted more than one time.

Abstract: A laser processing apparatus comprising a chuck table, laser beam irradiation means for irradiating a workpiece held on the chuck table with a laser beam, and processing feed means for processing-feeding the chuck table and the laser beam irradiation means relative to each other. The laser beam irradiation means includes first laser beam irradiation means for throwing a first pulsed laser beam having a wavelength in the intermediate-infrared radiation region, and second laser beam irradiation means for throwing a second pulsed laser beam having a wavelength in the ultraviolet radiation region. The first laser beam irradiation means and the second laser beam irradiation means are set such that at least a part, in the processing feed direction, of the focus spot of the second pulsed laser beam overlaps the focus spot of the first pulsed laser beam.

Abstract: This invention addresses the scalability problem of periodic “nanostructured” surface treatments such as those formed by interference lithography. A novel but simple method is described that achieves seamless stitching of nanostructure surface textures at the pattern exposure level. The described tiling approach will enable scaling up of coherent nanostructured surfaces to arbitrary area sizes. Such a large form factor nanotechnology will be essential for fabricating large aperture, coherent diffractive elements. Other applications include high performance, antiglare/antireflection and smudge resistant Motheye treatments for display products such as PDA's, laptop computers, large screen TV's, cockpit canopies, instrument panels, missile and targeting domes, and, more recently, “negative-index” surfaces.

Abstract: A method for filtering particles out of a beam of radiation propagating from a radiation source is provided. The method includes passing the beam of radiation through a filter having a first portion within the beam of radiation and a second portion outside of the beam of radiation, capturing at least some of the particles in the beam of radiation with the first portion, and moving the filter in a direction that is transverse to the beam of radiation so that the first portion is moved outside of the beam of radiation and the second portion is moved into the beam of radiation.

Abstract: In a method of removing particles on an object, a fluid is injected into a spacer where the object is placed to remove foreign substances in the space. A first light is irradiated to the object to remove charges between an upper face of the object and the particles, and inner walls of holes and the particles. A second light is irradiated to the object to remove moisture droplets between the upper face of the object and the particles, and the inner walls of the holes and the particles. A third light is irradiated to the object to remove static electricity between the upper face of the object and the particles, and the inner walls of the holes and the particles. A fluid is applied to the upper face and the holes of the object to remove the particles from the object.

Abstract: A system for implantation dosage control. A first interface receives scan position information. A second interface receives beam current information specifying a first beam current value between scans and a plurality of second beam current values during one of the scans. A controller, determines a tolerance range according to the first beam current value, determines whether the second beam current values exceeds the tolerance range, and calculates number of the second beam current values exceeding the tolerance range.

Abstract: A nonuniform ion implantation apparatus comprises a wide ion beam generator for generating a wide ion beam including a plurality of wide ion beams irradiated on at least two sections among a plurality of sections into which a wafer is divided, and a wafer drive unit for vertically reciprocating the wafer while the wide ion beam generated by the wide ion beam generator is irradiated on the wafer. At least one of the wide ion beams has a dose different from that of at least another wide ion beam.

Abstract: A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy.

Abstract: An ion implanting apparatus and method are provided. The apparatus includes a plurality of dummy wafers and a plurality of dummy wafer cassettes. The dummy wafers are separately used for respective kinds of ions, and the plurality of dummy wafer cassettes separately store the dummy wafers separately used for the respective kinds of ions. The plurality of dummy wafer cassettes are installed in order to store the plurality of dummy wafers for the respective kinds of ions and use the dummy wafers for an ion implanting process.

Abstract: A rotating irradiation apparatus includes a rotating gantry 3 including a front ring 19 and a rear ring 20 and is provided with a beam delivery device 11 and an irradiation device 4. The beam delivery device 11 delivers an ion beam used for particle radiotherapy. Radial support devices 61A and 61B support the front ring 19 and radial support devices 61A and 61B support the rear ring 20. Each radial support device includes a linear guide 41, an upper support structure disposed above the linear guide 41, and a lower support structure disposed below the linear guide 41. The upper support structure is movably mounted on the lower support structure and is movable in the direction of the rotational axis of the rotating gantry 3.

Abstract: Doping with suppressed filament deterioration can be performed even in the case of doping in various conditions with an ion doping apparatus having a filament. After ion doping is completed, supply of a material gas is stopped and hydrogen or a rare gas is kept to be supplied. After that, current of the filament is decreased and correspondingly, filament temperature is decreased. Accordingly, in decreasing the filament temperature, the material gas around the filament has been replaced with hydrogen or a rare gas.

Abstract: A milling device is disclosed for the preparation of microscopy specimens or other surface science applications through the use of ion bombardment. The device provides the ability to utilize both gross and fine modification of the specimen surface through the use of high and low energy ion sources. Precise control of the location of the specimen within the impingement beams created by the ion sources provides the ability to tilt and rotate the specimen with respect thereto. Locational control also permits the translocation of the specimen between the various sources under programmatic control and under consistent vacuum conditions. A load lock mechanism is also provided to permit the introduction of specimens into the device without loss of vacuum and with the ability to return the specimen to ambient temperature during such load and unload operation. The specimen may be observed and imaged during all active phases of operation.

Abstract: A mask for the use of an etching process for forming a film on a subject film deposition substrate into a predetermined pattern includes a protection section for covering the film on a pattern area to be formed into the pattern, and a projecting section provided on a facing surface so as to project therefrom, with the facing surface facing to the subject film deposition substrate of the protection section at a position corresponding to a peripheral section of the pattern area.

Abstract: A writing apparatus including a selector unit responsive to receipt of input data of a pattern to be written by shots of irradiation of an electron beam, configured to select a current density of the electron beam being shot and a maximal shot size thereof based on the input data of the pattern to be written; and a writing unit configured to create an electron beam with the current density selected by said selector unit, shape the created electron beam into a shot size less than or equal to said maximal shot size in units of the shots, and shoot the shaped electron beam onto a workpiece to thereby write said pattern.

Abstract: A pattern drawing method capable of drawing a pattern such that opposite ends of a formation region on an inner periphery side and an outer periphery side are substantially linearly formed. A drawing beam is intermittently irradiated N times onto a generally belt-shaped exposure area extending in a direction of rotation of the substrate from one end to the other end of the belt-shaped exposure area in the direction of rotation of the substrate, the belt-shaped exposure area being defined within a formation region, in which one of the convex or concave portions is to be formed, to thereby irradiate the drawing beam onto N generally belt-shaped irradiation areas extending in the direction of rotation of the substrate.

Abstract: An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plasma source material contained in the plasma source material compound on the collector optic. The method may further comprise initiating the reacting by introducing hydrogen into a plasma formation chamber containing the collector optic, and may further comprise removing the hydride from the collector optic, e.g., by cleaning plasma action and/or plasma source material sputtering, or other means as may be determined to be effective. An apparatus and method of extending the useful life of a plasma produced EUV light source collector coating layer may comprise in situ replacement of the material of the coating layer by deposition of the coating layer material onto the coating layer.

Abstract: A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates are oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap is provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.

Abstract: Device (1) for the heat treatment of scalp hair (2) of a person (3), consisting of one first and one second heat radiator (11, 12), which are formed and arranged facing each other as a left side radiator (4) and as a right side radiator (5) to provide heat (6) to the side scalp hair (7), wherein the left side radiator (4) has one first ring-shaped infrared radiator (21) with one first shell ring reflector (22) and the right side radiator (5) has one second ring-shaped infrared radiator (21.1) with one second shell ring reflector (22.