Abstract: A defect detection system for thermally imaging a structure that has been energized by sound energy. The system includes a transducer that couples a sound signal into the structure, where the sound signal induces acoustic chaos in the structure that causes defects in the structure to heat up. In one embodiment, the transducer is a broadband transducer. A thermal imaging camera images the structure when it is heated by the sound signal.

Abstract: A target-seeking-and-tracking system featuring hyperspectral sensing performed by a tunable filter and an infrared focal plane array is programmable to collect and process several hyperspectral bands of infrared radiation emanating from a target scenery. The programming is done by tuning the filter from time to time to collect several hyperspectral bands containing image data corresponding to several objects of interest in the scenery. The image data is further processed in the target recognition unit to identify the objects and aid in the selection and tracking of a particular target object for the ultimate goal of accurate destruction of the object. The programmability of hyperspectral sensing provides a degree of countermeasures immunity by allowing several bands to be combined to achieve the best signal-to-clutter ratio.

Abstract: A radiation detector can perform both rate and dose measurements for personal safety and also to provide measurements that are sufficiently sensitive for security applications. In one embodiment, a radiation detector has a first measurement channel and a second measurement channel, where the second measurement channel can measure radiation at levels that would saturate the first measurement channel. The detector can automatically switch between the high and low sensitivity channels while continuously integrating the measured rates to determine a radiation dose. The detector can also conserve power by automatically shutting off the unused measurement channel and still give a personal safety warning when the radiation rate or the dose reaches respective alarm thresholds.

Abstract: An imaging system for imaging an object has an x-ray source for emitting x-rays. A detection system has a plurality of position sensitive detector planes, and the object is located between the x-ray source and the detection system. A portion of the x-rays pass through said object and pass into said plurality of detector planes and are detected within the plurality of detector planes. A multi-channel readout system is coupled to the plurality of position sensitive detector planes. A display system is coupled to the multi-channel readout system, and the display system displays an image of said object. A portion of the x-rays passing into the plurality of detector planes undergoes at least one Compton scatter within the plurality of detection planes and is detected. A total or partial energy corresponding to each portion of the emitted x-rays is recorded by a multichannel readout system.

Abstract: A method for calibrating at least some individual light sensor elements of a linear sensor array of a scanner, wherein output values of first and second pluralities of elements are carried, respectively, by first and second output channels. A relative gain (Stored Gain) for each of such elements is calculated from a scan of a light calibration strip area of substantial uniformity. Output values of such elements are obtained from a scan of a light calibration strip area of unknown uniformity. An average is calculated of the obtained output values of the first elements (First Light Average) and an average is calculated of the obtained output values of the second elements (Second Light Average). A final gain for each first and second element is calculated using at least its Stored Gain and for second elements only also using the First and Second Light Averages.

Abstract: A method is provided. The method includes displaying a first image pixel on a first display pixel of a plurality of display pixels of a monitor, and displaying a second image pixel following the first image pixel on a portion of sub-pixels of the first display pixel and a portion of sub-pixels of a second display pixel so as to avoid loss of image data when displaying the image pixels on a monitor of a small resolution.

Abstract: An image sensor is mounted on a substrate. A base is further formed on the substrate. The base has an opening above the image sensor. A filter is fixed to the opening of the base. The filter has a projecting dam member in a peripheral portion thereof. A lens barrel holding lenses is disposed on the filter.

Abstract: The present invention relates to a camera module apparatus with an IR-cut-coated window glass including a lower housing; a printed circuit board that is installed on the lower housing and is provided with an image sensor; a lens holder that is installed on the printed circuit board and is provided with a lens above the image sensor; a window glass that is installed above the lens and is IR-cut-coated; and an upper housing that has an opening formed above the window glass and is coupled to the lower housing.

Abstract: To provide a low power consuming image pickup apparatus, for a radiation image pickup apparatus using an FPD, which can sufficiently initialize dark current component stored in the photoelectric conversion element, specifically electric charges trapped at the trap level. After the power to the radiation image pickup apparatus has been turned on, a readout circuit 24 stops operating in the standby state, thin-film transistors 2 and 20a, 20b, . . . , 20c are turned on, and the first bias circuit 25 and the second bias circuit 26 operate thereby initializing the photoelectric conversion element 3.

Abstract: At least part of a readout pattern including carrier collecting electrodes, capacitors, thin-film transistors, data lines and gate lines is formed by vapor deposition or printing. This is formed separately from a semiconductor thick film. The semiconductor thick film and readout pattern constitute a flat panel X-ray detector (FPD) is mounted in a case to form a unit. A weight reduction is achieved by using the semiconductor thick film in place of a conventional glass substrate. The FPD manufactured in this way is free from great restrictions in time of transport and use.

Abstract: A radiation detector comprises an electrode substrate, pixel electrodes provided on the electrode substrate, and detecting electric signals, a radiation conversion layer provided on the pixel electrodes, and converting incident radiations into electric signals, upper electrodes provided at a position on the radiation conversion layer opposite to the pixel electrodes, and a protective layer provided on the upper electrode, the protective layer having a flexural modulus not more than a flexural modulus of the electrode substrate.

Abstract: A glass or scintillating glass contains Tb2O3 and/or Eu2O3, and a content of at least one of Tb2O3 and Eu2O3 is 0.01 to 15 mol percent on the oxide basis. The glass or scintillating glass contains none of Ga2O3 and GeO2 and has a density of 3.0 g/cm3 or over. More preferably, the glass or scintillating glass further contains F wherein a total amount of F calculated on the assumption that a part or whole of oxides of the glass has been substituted by a fluoride is 1 to 100 mol % to a total amount of components of the glass expressed on the oxide basis.

Abstract: A radiation detecting apparatus according to the present invention includes: pixels including switching elements arranged on an insulating substrate and conversion elements arranged on the switching elements to convert a radiation into electric carriers, the switching elements and the conversion elements are connected with each other, the pixels two-dimensionally arranged on the insulating substrate in a matrix; gate wiring commonly connected with a plurality of switching elements arranged in a row direction on the insulating substrate; signal wiring commonly connected with a plurality of switching elements arranged in a column direction; and a plurality of insulating films arranged between the switching elements and the conversion elements, wherein at least one of the gate wiring and the signal wiring is arranged to be put between the plurality of insulating films.

Abstract: A technique for implementing a variable aperture lens in an ion implanter is disclosed. In one particular exemplary embodiment, the technique may be realized as a variable aperture lens. The variable aperture lens may comprise a first electrode element. The variable aperture lens may also comprise a second electrode element. The variable aperture lens may further comprise a driver assembly coupled to at least one of the first and the second electrode elements, wherein the driver assembly alters an aperture between the first and the second electrode elements based on a geometry of an ion beam.

Abstract: The invention relates to a method for determining lens errors in a Scanning Electron Microscope, more specifically to a sample that enables such lens errors to be determined. The invention describes, for example, the use of cubic MgO crystals which are relatively easy to produce as so-called ‘self-assembling’ crystals on a silicon wafer. Such crystals have almost ideal angles and edges. Even in the presence of lens errors this may give a clear impression of the situation if no lens errors are present. This enables a good reconstruction to be made of the cross-section of the beam in different under- and over-focus planes. The lens errors can then be determined on the basis of this reconstruction, whereupon they can be corrected by means of a corrector.

Abstract: A method of operating liquid in a vacuum or low-pressure environment and observing the operation and a device for the operation and the observation respectively, including the steps of preparing a housing, putting the housing in the vacuum or low-pressure environment and keep a predetermined temperature difference between liquid, vapor, and buffer chambers, infusing vapor into the vapor chamber through a gas inlet and control the vapor pressure inside the vapor chamber to be equal to the saturated vapor pressure of a liquid specimen inside the liquid chamber under the same temperature to prevent the inside liquid from volatilization, and evacuating the buffer chamber through the pumping port to pump out the vapor and prevent the vapor from exhausting through outer apertures out of the housing. A probing source can pass through the outer, inner, and vapor apertures for observation and analysis of the liquid specimen inside the liquid chamber.

Abstract: To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen, a specimen stage on which the sliced specimen is fixed and having at least one or more rotation axis, a specimen posture recognition means recognizing positional relation of the sliced specimen with respect to the specimen stage and a specimen stage control means controlling the specimen stage based on a specimen posture recognized by the posture recognition means and an installation angle of the gas-ion beam irradiation apparatus in order to allow an incident angle of the gas-ion beam with respect to the obverse or the reverse of the sliced specimen to be a desired value.

Abstract: This invention relates generally to methods and apparatuses for the treatment of liquids and gases using ultraviolet light. In one embodiment, a substantially enclosed chamber coated with a reflective material containing an ultraviolet lamp and an ultraviolet transmissive tube running through the chamber for the treatment of liquid passed therethrough is disclosed.

Abstract: Systems and methods for controlling ambient pressure during processing of microfeature workpieces, including during immersion lithography, are disclosed. A system in accordance with one embodiment includes a support configured to carry a microfeature workpiece with a surface of the microfeature workpiece at a support location, and a liquid supply device positioned proximate to the support to dispense liquid at the surface location. The system can further include a generally gas-tight enclosure disposed around at least a portion of the surface location. The enclosure can be coupleable to a vacuum source and can be configured to withstand an internal pressure less than atmospheric pressure. This arrangement can be used in the context of an immersion photolithography system, or other systems for which a liquid is disposed on the surface of the microfeature workpiece.

Abstract: A fabricating method of a semiconductor light-emitting device includes the step of forming a wafer including a multi-layered semiconductor film epitaxially grown on a base substrate and containing an active layer, the step of performing pass/fail judgment of the active layer by photo-exciting the active layer in the wafer and by measuring emission intensity from the active layer at least at two temperature points, and the step of forming a light-emitting device structure with the multi-layered semiconductor film containing the active layer judged to be of good quality in the pass/fail judgment.

Abstract: A glass or scintillating glass contains, in mol percent on the oxide basis, 0.005% to 15% Ce2O3, and it contains none of Ga2O3 and GeO2 and has a density of 3.0 g/cm3 or over. More preferably, the glass or scintillating glass further contains F wherein a total amount of F calculated on the assumption that a part or whole of oxides of the glass has been substituted by a fluoride is 1 to 100 mol % to a total amount of components of the glass expressed on the oxide basis.

Abstract: An object is to provide a radiation image conversion panel minimizing deterioration of sensitivity and sharpness due to improved moisture resistance, as well as a method of preparing a radiation image conversion panel exhibiting high production efficiency. Also disclosed is a radiation image conversion panel possessing a support having thereon at least a stimulable phosphor layer, wherein an average height of burr generated on the radiation image conversion panel is 1-400 ?m.

Abstract: The position of a substrate's edge is detected using a substrate alignment system that includes, in part, a light source, an optical module adapted to receive a light emanating from the light source to form a multi-dimensional light beam; and an array sensor positioned at a focal plane of the optical module and oriented substantially perpendicular to the sample's edge. The substrate alignment system detects the substrate's edge position as soon as the substrate is loaded and placed within the capture range of the linear array sensor. As long as the substrate's edge position is within the capture range, the substrate does not have to be moved to determine its position relative to the tool's coordinate space. The capture range is substantially larger than the position accuracy required. The sensor array includes a multitude of sensors disposed along one or more rows.

Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency, and also directed to an application of such apparatus to treat a coating on a substrate of a treatable material, such as for flexible packaging. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, electrons are generated and accelerated to pass through the foil support assembly. In the flexible packaging application, the substrate is fed to the processing apparatus operating at a low voltage, such as 110 kVolts or below, and is exposed to the accelerated electrons to treat the coating on the substrate.

Abstract: A method for reducing particles during ion implantation is provided. The method involves the use of an improved Faraday flag including a beam plate having thereon a beam striking zone comprising a recessed trench pattern on which the ion beam scans to and fro. An ion beam selected from the mass analyzer is blocked by the Faraday flag in a closed position between the mass analyzer and the semiconductor wafer. A beam current of the ion beam impinging on the beam striking zone of the beam plate is measured. After the beam current measurement, the Faraday flag is removed such that the ion beam impinges on the semiconductor wafer.

Abstract: A system, method and program product for monitoring the beam angle integrity of an ion beam generated by an ion implanter system are disclosed. The invention utilizes at least one template with each template having a template surface that impedes the motion of an ion. Each template is configured such that an ion impacts the surface of the template if the trajectory of the template deviates from the optimum trajectory by a pre-determined maximum variance angle. The change caused by the impact of the ions with the template and/or a target is then measured to determine the amount of variance in the ion beam. Adjustments can then be made to the ion beam generator to correct for a misaligned beam.

Abstract: A technique for improving ion implanter productivity is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for improving productivity of an ion implanter having an ion source chamber. The method may comprise supplying a gaseous substance to the ion source chamber, the gaseous substance comprising one or more reactive species for generating ions for the ion implanter. The method may also comprise stopping the supply of the gaseous substance to the ion source chamber. The method may further comprise supplying a hydrogen containing gas to the ion source chamber for a period of time after stopping the supply of the gaseous substance.

Abstract: Disclosed is a method for arranging a semiconductor wafer in a disk-type ion implantation apparatus and/or process. In the present method, the wafer is arranged to satisfy conditions of A=T and R=W, where T represents an angle between the ion beam and a normal axis to the plane of the wafer, W represents an angle between a projection of the ion beam to the wafer and a notch of the wafer, A represents a vertical tilt angle of the wafer to the ion beam, B represents a horizontal tilt angle of the wafer to the ion beam, and R represents an anticlockwise rotation angle based on the notch.

Abstract: A lithographic apparatus comprises an array of individually controllable elements that modulate a beam of radiation, a compressed-pattern memory that stores a compressed representation of a requested dose pattern to be formed on a substrate by the modulated beam, and a dictionary decompressor that at least partially decompress the compressed representation.

Abstract: The invention is directed to an arrangement for generating EUV radiation based on a gas discharge plasma with high radiation emission in the range between 12 nm and 14 nm. It is the object of the invention to find a novel possibility for plasma-based radiation generation with high radiation output in the EUV spectral region (between 12 nm and 14 nm) which makes it possible to use tin as a work medium in EUV gas discharge sources for industrial applications. This object is met, according to the invention, in that a gas preparation unit is provided for defined control of the temperature and pressure of a tin-containing work medium and the flow thereof into the vacuum chamber in gaseous state. At least one thermally insulated reservoir vessel and a thermally insulated supply line are provided for transferring the gaseous tin-containing work medium from the gas preparation unit to the pre-ionization unit located inside the electrode housing.

Abstract: A method and system position a laser beam spot relative to a semiconductor substrate having structures on or within the semiconductor substrate to be selectively processed by delivering a processing laser beam to a processing laser beam spot. The method generates a metrology laser beam and propagates the metrology laser beam along a propagation path to a metrology laser beam spot on or near a structure to be selectively processed. The method detects a reflection of the metrology laser beam from the structure, thereby generating a reflection signal, and determining, based on the reflection signal, a position of the metrology laser beam spot relative to the structure.

Abstract: Various methods and systems measure, determine, or align a position of a laser beam spot relative to a semiconductor substrate having structures on or within the semiconductor substrate to be selectively processed by delivering a processing laser beam to a processing laser beam spot. The various methods and systems utilize those structures themselves to perform the measurement, determination, or alignment.

Abstract: A phototimer detects the dose of an X-ray radiation that has passed through a stimulable phosphor panel, and a stored quantity calculator calculates the quantity of radiation energy stored in the stimulable phosphor panel. An irradiation time ratio setting unit reads an irradiation time ratio from an irradiation time ratio storage unit according to the calculated quantity of radiation energy, and sets the read irradiation time ratio in an erasing unit. Based on the irradiation time ratio, the erasing unit applies erasing light including a radiation in a short wavelength range to the stimulable phosphor panel and thereafter applies erasing light comprising only a radiation in a long wavelength range to the stimulable phosphor panel, thereby erasing a residual radiation image from the stimulable phosphor panel.

Abstract: A cassette processing apparatus has a plurality of stack units for holding respective cassettes in an array, and a tilting mechanism for tilting the cassettes held by the respective stack units at respective different angles depending on the types of the cassettes. The tilting mechanism has a rotatable shaft connected to a rotary actuator, and a plurality of eccentric cams held in respective angular positions by the rotatable shaft to adjust the angles at which the stack units are tilted thereby to set angles at which the cassettes are titled.

Abstract: A metering valve arrangement comprises a spool 14 movable within a bore 12, the spool 14 and bore 12 together defining first and second control chambers 22, 32 the first control chamber 22 being supplied, in use, with fluid at a substantially fixed pressure, and a control valve arrangement 36 controlling the fluid pressure applied to the second control chamber 32, the control valve arrangement 36 comprising at least one solenoid operated three port valve 38, 56.

Abstract: A fluid operated position regulator comprises a servo means, arranged in a regulator housing and by which a supply connection, a venting connection and a power connection can be placed in circuit in an adjustable manner. To predetermine or set its position the servo means possesses two mutually oppositely orientated fluid actuating faces of equal size, which respectively delimit a control chamber. The two control chambers are connected by way of an intermediately placed choke means with a common control pressure connection. Downstream from the two choke means each control chamber is connected with a venting connection. A control valve means can control the two venting connections and in particular simultaneously close them.

Abstract: A retaining cylinder is threadedly engaged with a fixed cylinder of a flow rate control valve, by means of a screw section formed on an outer circumferential surface. A fence cover, which is capable of expanding and contracting in the axial direction, is installed between the fixed cylinder and a float rod supported by the retaining cylinder. An upper seal member is provided on the float rod, on the upper side thereof with respect to a valve plug. A lower seal member is provided on the lower side thereof with respect to the valve plug. The upper seal member and the lower seal member have substantially identical diameters. The float rod is displaced under an energizing action of a stepping motor. The flow rate of a fluid is controlled depending on a distance of the valve plug with respect to a valve seat.

Abstract: In a pressure increase control valve, the size of a gap G between a plunger and a guide is 0.2 mm or greater, or a ratio between a diameter of a restriction and a seat diameter ds is 0.9 or less. Setting the size of the gap between the plunger and the guide to 0.2 mm or greater can decrease variations in an electromagnetic force with respect to a stroke of a valve body. In addition, setting the ratio between the diameter do of the restriction and the seat diameter to 0.9 or less can increase variations in a fluid force with respect to the stroke of the valve body. Therefore, it is easier to achieve a relationship between the electromagnetic force and a resistance force that is required in order to enable linear control of a differential pressure amount generated between upstream and downstream flows.

Abstract: A low leakage seal for separating two environments and contacting a component surface is provided. The seal includes a base and an annular rib. The annular rib is coupled to and extends from the base. The annular rib includes at least one contact surface configured to contact the component surface having a plurality of angularly cut radial grooves formed therein. The annular rib flexes and pressure energizes in the presence of a pressure differential between the two environments.

Abstract: A shaft protection washer to protect a rotating shaft in a “measurement while drilling” (MWD) tool. Use of the shaft protection washer renders the rotating shaft less susceptible to erosion from the drilling fluid flowing between the rotating component and the stationary component.

Abstract: A poppet valve for use with a sootblower for removing debris from an interior volume of a boiler is provided. The poppet valve assembly includes a valve housing and a valve head configured to move within the valve housing between an open position and a closed position. The poppet valve assembly enables the cleaning fluid to undergo relatively small pressure loss as it flows through the poppet valve assembly when the valve head is in the open position. More specifically, the poppet valve assembly has a loss factor that is substantially less than currently-known valves. The poppet valve causes the cleaning fluid to undergo relatively small pressure loss while flowing therethrough.

Abstract: A hydraulic flow control valve allowing easy adjustment of fluid flow for a variety of hydraulic attachments is disclosed. The hydraulic flow control valve comprises a spool and a flow rate setting adjustment device configured to adjust a flow rate setting of the hydraulic flow control valve by adjusting the amount of travel allowed for the spool. An associated method of operating the hydraulic flow control valve is disclosed.

Abstract: A fluid control valve assembly is disclosed that includes a housing, a valve with a ring-shaped groove, and a seal ring with a clearance extending between an outer diameter and an inner diameter. The seal ring includes a pair of opposing axial side surfaces and is provided in the groove. The seal ring seals against the housing when the valve is in the closed position. The valve assembly also includes a backup ring provided in the groove adjacent one of the axial side surfaces of the seal ring to thereby obstruct fluid flow through the clearance of the seal ring when the valve is in the closed position.

Abstract: A thermally and chemically inert valve seat is provided. The valve seat includes a sharp edge located on the periphery of the valve seat body, wherein the edge digs into a surface within the valve body to secure the valve seat. The valve seat may be case hardened to provide additional strength and sealing ability. The inner diameter of the valve seat may be flush against the valve fluid passageway, thereby decreasing the contact area between the diaphragm and the valve seat.

Abstract: The invention provides liquid crystal composites including a liquid crystal with a layered inorganic material and a photosensitive polymer dispersed therein. The layered inorganic layer reduces threshold voltage and enhances grating diffraction efficiency of the liquid crystal. The invention also provides a liquid crystal with a layered inorganic material dispersed in the liquid crystal, and a modified layered material MgAl—K2 LDH.

Abstract: This invention relates to the synthesis and isolation of colloidal silver particles through the use of thermomorphic polymers and the resulting composition. It further relates to the use of the resulting composition in the preparation of inks for printing with silver-containing inks.

Abstract: The present invention provides a process for the preparation of conductive polymer dispersion. In the present invention the polymer is dispersed after its synthesis, hence dispersion contains only pure poly aniline salt and stabilizer. e, it is therefore provides a pure poly aniline dispersion without any other contamination. More particularly, the purity of the dispersed poly aniline is achieved up 99% of initiator residue and monomer residue in the present invention. The present process provides a poly aniline dispersion in water, organic solvents and also in a mixture of solvents.

Abstract: There is provided an electrically conductive polymer composition, comprising a first electrically conductive polymer doped with an organic solvent wettable fluorinated acid polymer in admixture with a second electrically conductive polymer doped with an organic solvent non-wettable fluorinated acid polymer.

Abstract: The invention relates to a process for coupling thiophene or selenophene compounds, in particular for preparing conjugated thiophene or selenophene polymers with high molecular weight and high regioregularity, and to novel polymers prepared by this process. The invention further relates to the use of the novel polymers as semiconductors or charge transport materials in optical, electrooptical or electronic devices including field effect transistors (FETs), thin film transistors (TFT), electroluminescent, photovoltaic and sensor devices. The invention further relates to FETs and other semiconducting components or materials comprising the novel polymers.

Abstract: In a transparent conductor containing conductive particles and a binder, the conductive particles have an average particle size of 60 nm or smaller, and the number of conductive particles having an average particle size of 100 nm or greater is 10% or less of the total number of conductive particles.