Patents Issued in August 2, 2007
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Publication number: 20070176092Abstract: A system for analyzing one or more ion species of a sample including a first ion mobility filter associated with a first flow path for passing first ions of the sample, a second ion mobility filter associated with a second flow path for passing second ions of the sample, a first outlet from the first flow path for passing a portion of the first ions from the first flow path to the second flow path, and a first outlet from the second flow path for removing neutral particles from the second flow path where the first outlet from the second flow path is upstream of the second ion mobility filter in relation to the ion flow in the second flow path.Type: ApplicationFiled: November 7, 2006Publication date: August 2, 2007Applicant: SIONEX CORPORATIONInventors: Raanan Miller, Evgeny Krylov, Erkinjon Nazarov, Gary Eiceman, John Wright
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Publication number: 20070176093Abstract: A mass spectrometry target assembly for accommodating at least one analyte (1) for mass spectrometry is provided, said assembly comprising: a target substrate (10) having a substrate surface (11), at least one measuring element (2), wherein said target substrate (10) and said measuring element (2) are different components, said measuring element (2) is fixed to said substrate surface (11), and wherein an electrical contact (12,16) is provided between said measuring element (2) and said target substrate (10) and/or said substrate surface (11). Because said target substrate (10) and said measuring element (2) are different components, said measuring elements (2) can be fabricated separately from said target substrate (10) and a material for said target substrate (10) can be chosen independent from the material used for said measuring element (2).Type: ApplicationFiled: December 29, 2006Publication date: August 2, 2007Applicant: SONY DADC AUSTRIA AGInventors: Jaroslav Kukla, Johannes Goller
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Publication number: 20070176094Abstract: Methods for applying an RF field in a two-dimensional electrode structure include applying RF voltages to main electrodes and to compensation electrodes. The voltages on the compensation electrodes may be proportional to the voltages on the main electrodes so as to optimize the RF field for processes involving ion excitation, including collision-induced dissociation. Electrode structures may include main trapping electrodes, one or more compensation electrodes, one or more ion exit apertures, and a device or circuitry for applying the various desired voltages.Type: ApplicationFiled: January 30, 2006Publication date: August 2, 2007Inventor: Gregory Wells
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Publication number: 20070176095Abstract: An electrode for use in a device such as an ion trap has an axial length extending generally in the direction of a central axis from a first axial end to a second axial end, and an inside surface. The inside surface includes a surface profile that is uniform from the first axial end to the second axial end, or at least is uniform for a uniform section length along the axial direction. The electrode may include an elongated surface feature such as a groove that extends for at least the uniform section length. An aperture may communicate with the groove. The electrode may be axially segmented into regions. Gaps between the regions may be oriented at an angle relative to a plane orthogonal to the central axis. The electrode may be one of several electrodes arranged as an electrode structure coaxially disposed about an elongated interior space.Type: ApplicationFiled: January 30, 2006Publication date: August 2, 2007Inventors: Roger Tong, Mingda Wang, Gregory Wells
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Publication number: 20070176096Abstract: Methods for applying an RF field in a two-dimensional electrode structure include applying RF voltages to one or more main electrodes and compensation electrodes. The voltages on the one or more compensation electrodes may be adjusted to be proportional to the voltages on the main electrodes. The adjustment(s) may be done to optimize the RF field for different modes of operation such as ion ejection and ion dissociation. For dissociation and other procedures involving ion excitation, the voltages applied to the one or more compensation electrodes may be different from the voltages applied to the one or more main electrodes. Electrode structures may include main trapping electrodes, one or more compensation electrodes, one or more ion exit apertures, and a device or circuitry for applying the various desired voltages.Type: ApplicationFiled: January 30, 2006Publication date: August 2, 2007Inventor: Gregory Wells
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Publication number: 20070176097Abstract: An electrode structure for manipulating ions includes a main electrode and a compensation electrode. An outer surface of the main electrode includes a curved section that includes an apex. An aperture is generally disposed at the apex and extends along a radial center line from the outer surface through a thickness of the main electrode. The compensation electrode is disposed at the radial center line and at a tangent line tangent to the apex. Another electrode structure includes a plurality of main electrodes defining an interior space, and one or more compensation electrodes disposed in the interior space. RF signals may be applied to the main electrodes and to the compensation electrode.Type: ApplicationFiled: January 30, 2006Publication date: August 2, 2007Inventor: Gregory Wells
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Publication number: 20070176098Abstract: Methods for applying an RF field in a two-dimensional electrode structure include applying RF voltages to main electrodes and to compensation electrodes. The voltages on the compensation electrodes may be adjusted to be proportional to the voltages on the main electrodes. The adjustment(s) may be done to optimize the RF field for different modes of operation such as ion ejection and ion dissociation. For dissociation, a supplemental RF dipole may be applied, or two mutually orthogonal dipoles may be applied in phase quadrature to form a circularly polarized field. Electrode structures may include main trapping electrodes, one or more compensation electrodes, one or more ion exit apertures, and means for applying the various desired voltages.Type: ApplicationFiled: January 30, 2006Publication date: August 2, 2007Inventor: Gregory Wells
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Publication number: 20070176099Abstract: Problems to be solved by the present invention are to present a technique for preliminarily working a sample, which makes a place, that is desired to be analyzed, of a device into an acicular protrusion by locally cutting out the place, and to provide, even if the sample is a sample of a multilayer structure containing element layers whose evaporation electric fields are small in later-mentioned circumstances, a technique for making a stable ion evaporation in order possible, thereby making an SAP analysis at an atomic level possible. A preliminarily working of a sample for an atom probe apparatus of the invention comprises a step of cutting out a sample's desired observation site to a block-like form by using an FIB apparatus, a step of carrying and fixing the block-like cut-out sample onto a sample substrate, and a step of working the block-like sample fixed onto the sample substrate into a needle tip shape by an FIB etching.Type: ApplicationFiled: March 2, 2005Publication date: August 2, 2007Inventor: Takashi Kaito
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Publication number: 20070176100Abstract: An automated nanomanipulation system is provided for manufacturing a nanoscale structure. The system includes: a design model for the nanoscale structure; image data of a sample surface upon which the nanoscale structure is to be manufactured; a movable member configured to perform a nanomanipulation operation on the sample surface; and a path planning subsystem adapted to receive the design model and the image data. The path planning subsystem generates path data indicative of a path for traversing the movable member along the sample surface such that the movable member manipulates one or more randomly distributed nanoobjects in accordance with the design model.Type: ApplicationFiled: August 16, 2005Publication date: August 2, 2007Inventors: Ning Xi, Guangyong Li, Heping Chen
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Publication number: 20070176101Abstract: Systems and techniques for varying a scan rate in a measurement instrument. The techniques may be used in scanning probe instruments, including atomic force microscopes (AFMs) and other scanning probe microscopes, as well as profilometers and confocal optical microscopes. This allows the selective imaging of particular regions of a sample surface for accurate measurement of critical dimensions within a relatively small data acquisition time.Type: ApplicationFiled: November 28, 2006Publication date: August 2, 2007Inventors: Roger B. Proksch, Roger C. Callahan
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Publication number: 20070176102Abstract: The invention relates to a particle-optical apparatus with a predetermined final vacuum pressure. To that end a vacuum chamber of said apparatus is via a first restriction connected to a volume where vapour or gas is present at a known pressure and via a second restriction to a vacuum pump. By making the ratio of the two conductances, associated with said restrictions, a calibrated ratio, the final pressure of the vacuum chamber is a predetermined final pressure. This eliminates the need for e.g. vacuum gauges and control systems, resulting in a more compact design of such apparatus.Type: ApplicationFiled: January 31, 2007Publication date: August 2, 2007Applicant: FEI CompanyInventors: Hendrik Nicolaas Slingerland, William Ralph Knowles
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Publication number: 20070176103Abstract: The present invention provides a method of observing a specimen in a field of view of an electron microscope comprising the acts of illuminating the specimen with an electron beam having a first angle and forming a first transmission image of the specimen in the field of view and adjusting the electron beam to a second angle and forming a second transmission image of the specimen in the field of view and calculating a degree of coincidence between the first and second transmission images.Type: ApplicationFiled: November 8, 2006Publication date: August 2, 2007Inventors: Hiromi Inada, Isao Nagaoki, Hiroyuki Kobayashi
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Publication number: 20070176104Abstract: A process and system for a medium wave infrared (MWIR) uncooled microbolometer focal plane array (FPA). One embodiment is for a single MWIR band uncooled IR detector, wherein the design and fabrication utilizes standard silicon processing techniques reducing manufacturing costs and preserving existing manufacturing capabilities. Another embodiment is a two color uncooled microbolometer IR detector providing broadband detection.Type: ApplicationFiled: March 23, 2005Publication date: August 2, 2007Inventors: Jeannie Geneczko, Richard Blackwell, Margaret Kohin
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Publication number: 20070176105Abstract: The present invention relates to a photosensitive diagnostic device configured to project an optical signal, capture reflected portions of the optical signal, and convert the captured portions of the optical signal into an electrical signal indicative of characteristics of a sample analyzed by the device. In accordance with one embodiment, a photosensitive diagnostic device comprises an illumination source and a detector. The illumination source comprises an output face configured to project an optical signal characterized by at least one diagnostic frequency. The detector comprises a photosensitive input face configured to capture reflected portions of the optical signal. The photosensitive input face of the detector is further configured to convert the captured portions of the optical signal into one or more electrical signals at least partially representing a degree of change in the diagnostic frequency of the optical signal.Type: ApplicationFiled: January 12, 2007Publication date: August 2, 2007Inventors: Igor Trofimov, Stephen A. Lyon
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Publication number: 20070176106Abstract: Methods and systems for imaging a patient using an imaging system is provided. The method includes rotating a detector about a patient, detecting a predetermined distance of the detector from the patient, and automatically moving the detector to within a predetermined range of distance from the patient based on the detected distance.Type: ApplicationFiled: January 19, 2006Publication date: August 2, 2007Inventor: Yaron Hefetz
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Publication number: 20070176107Abstract: An optical engine for use in a projection apparatus is disclosed, wherein the optical engine carries an illumination system and an imaging system for co-defining an optical axis, while a light beam emitted from the illumination system is transmitted to the imaging system along the optical axis. The optical engine comprises a chassis, a housing, a light tunnel apparatus and a holding edge. The dimensions of the receiving space defined by the holding edge and the housing are substantially constant and identical to the dimensions of the light tunnel apparatus comprised of a light tunnel and a bracket apparatus. The receiving space comprises a symmetry centerline coinciding with the optical axis to prevent the light beam from deviating away from the optical axis. To accommodate different resolutions, the differently sized light tunnels may fit into the receiving space, provided that the bracket apparatus comes in a size that can maintain constant dimensions after assembly with the light tunnel.Type: ApplicationFiled: November 7, 2006Publication date: August 2, 2007Applicant: DELTA ELECTRONICS, INC.Inventors: Shengwei Lin, Mao Shan Hsu
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Publication number: 20070176108Abstract: A detector arrangement and/or a semiconductor-based image sensor with a plurality of detector elements or image pixels is described, which each have an integrated SD-(Sigma Delta) Modulator (20 to 29) or an integrated SD-A/D-(Sigma Delta Analog/Digital) converter (20 to 30), as well as particularly such a detector arrangement and/or such an image sensor on the basis of a CMOS-semiconductor. Particularly on the basis of the differential version and/or the multi-phase structure of the SD modulator and the SD-A/D converter, a detector arrangement and/or an image sensor with specially high noise robustness, a high dynamic range and a lesser noise can be produced, so that this is particularly suitable for usage in Computer Tomography (CT) apparatus.Type: ApplicationFiled: January 7, 2005Publication date: August 2, 2007Applicant: KONINKLIJKE PHILIPS ELECTRONICS NVInventors: Olaf Such, Josef Lauter, Michael Gnade, Dirk Weiler, Armin Kemna, Gereon Vogtmeier, Roger Steadman
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Publication number: 20070176109Abstract: A radiation sensor 10 includes an array of imaging pixels 13 electrically connectable to a readout port. At least one first peripheral row of trigger pixels 11 is located at a first edge of the array, the trigger pixels also being electrically connectable to the readout port but responding faster to x-rays than the imaging pixels. At least one second peripheral row of trigger pixels 12 may be located at a second edge of the array opposed to the first edge. Trigger pixels 11, 12 from the first and second peripheral rows may be addressable alternately in a predetermined pattern to detect a radiation signal for triggering the sensor. Various methods of clocking the sensor are also described. The sensor has particular applicability to intra-oral x-ray imaging.Type: ApplicationFiled: July 20, 2006Publication date: August 2, 2007Applicant: E2V Technologies (UK) LimitedInventor: Raymond Bell
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Publication number: 20070176110Abstract: A radiological imaging apparatus comprising a semiconductor detector unit in which a plurality of semiconductor radiation detection elements are installed on a detector mounted substrate in a matrix to constitute a detector unit. A plurality of detector units are releasably mounted on a fixing substrate. This mounting is carried out mating a coupling screw with a threaded hole formed in the detector mounted substrate, the coupling screw being inserted through a through-hole formed in the fixing substrate. The detector mounted substrate is provided with a pair of positioning pins. The positioning pins are inserted into positioning holes, respectively, formed in the fixing substrate, to position the detector unit.Type: ApplicationFiled: March 6, 2007Publication date: August 2, 2007Inventors: Kazuma Yokoi, Hiroshi Kitaguchi, Katsutoshi Tsuchiya, Takafumi Ishitsu, Kensuke Amemiya
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Publication number: 20070176111Abstract: A detector is provided for an x-ray imaging system. The detector includes a photosensitive region with an area less than half of an area of a scintillator cell, from which the photosensitive region receives light.Type: ApplicationFiled: January 30, 2006Publication date: August 2, 2007Inventor: David Hoffman
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Publication number: 20070176113Abstract: An electrospray-assisted laser desorption ionization device includes: an electrospray unit including a nozzle; a voltage supplying member disposed to establish between the nozzle and a receiving unit a potential difference such that liquid drops of the electrospray medium formed at the nozzle are laden with charges, and such that the liquid drops are forced to leave the nozzle toward the receiving unit along a traveling path; a laser desorption unit adapted to irradiate a sample such that, upon irradiation, analytes contained in the sample are desorbed to fly along a flying path which intersects the traveling path so as to enable the analytes to be occluded in the liquid drops, and such that as a result of dwindling in size of the liquid drops when moving along the traveling path, charges of the liquid drops will pass on to the analytes occluded therein to form ionized analytes.Type: ApplicationFiled: November 17, 2006Publication date: August 2, 2007Inventors: Jentaie SHIEA, Min Zong Huang
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Publication number: 20070176114Abstract: An ion implantation is disclosed that includes an ionization chamber having a restricted outlet aperture and configured so that the gas or vapor in the ionization chamber is at a pressure substantially higher than the pressure within an extraction region into which the ions are to be extracted external to the ionization chamber. The vapor is ionized by direct electron impact ionization by an electron source that is in a region adjacent the outlet aperture of the ionization chamber to produce ions from the molecules of the gas or vapor to a density of at least 1010 cm?3 at the aperture while maintaining conditions that limit the transverse kinetic energy of the ions to less than about 0.7 eV. The beam is transported to a target surface and the ions of the transported ion beam are implanted into the target.Type: ApplicationFiled: December 29, 2006Publication date: August 2, 2007Inventors: Thomas Horsky, Brian Cohen, Wade Krull, George Sacco
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Publication number: 20070176115Abstract: An ion implantation is disclosed that includes an ionization chamber having a restricted outlet aperture and configured so that the gas or vapor in the ionization chamber is at a pressure substantially higher than the pressure within an extraction region into which the ions are to be extracted external to the ionization chamber. The vapor is ionized by direct electron impact ionization by an electron source that is in a region adjacent the outlet aperture of the ionization chamber to produce ions from the molecules of the gas or vapor to a density of at least 1010 cm?3 at the aperture while maintaining conditions that limit the transverse kinetic energy of the ions to less than about 0.7 eV. The beam is transported to a target surface and the ions of the transported ion beam are implanted into the target.Type: ApplicationFiled: December 29, 2006Publication date: August 2, 2007Inventors: Thomas Horsky, Brian Cohen, Wade Krull, George Sacco
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Publication number: 20070176116Abstract: A self-shielded sterilization apparatus using an electron beam, comprising: an electron beam irradiator for irradiating an electron beam; a shielding for shielding the electron beam irradiated from the electron beam irradiator and a bremsstrahlung of the electron beam; a tray disposed within the shielding for placing thereon an object to be irradiated; an opening for placing an object into and taking the object out of the shielding; and a shielding door for closing the opening. With the above configurations, the apparatus avoids the shield construction taking a large area and the complicated transporting device, which facilitates a miniaturization of the apparatus.Type: ApplicationFiled: July 24, 2006Publication date: August 2, 2007Inventors: Haifeng Hu, Zhiqiang Chen, Junli Li, Chuanxiang Tang, Jianping Cheng, Shenjin Ming, Bing Wang, Yanfeng Cao
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Publication number: 20070176117Abstract: A method and apparatus for sterilizing access sites such as attachment points for various therapeutic and diagnostic medical devices. More particularly, the invention concerns a sterilization apparatus which includes a substantially UV-C transparent closure cap for closing the access site and a compact, easy to use irradiating apparatus for controllably irradiating the closure cap with UV-C radiation.Type: ApplicationFiled: January 31, 2006Publication date: August 2, 2007Inventors: Russell Redmond, Claude Vidal
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Publication number: 20070176118Abstract: A system for subjecting articles and containers to microbiocidal radiation and for attaching the articles to the containers comprises a source (6) of microbiocidal radiation, a first conveying device (26) for advancing pour spout fitments (21) along a first path, a second conveying device (2) for advancing containers (4) along a second path substantially parallel to the first path, the source (6) being effective along both the first and the second paths, and a fitment applicator (27) arranged to attach to the containers (4) fitments (21) which have been subjected to the radiation.Type: ApplicationFiled: June 8, 2005Publication date: August 2, 2007Applicant: ELOPAK SYSTEMS AGInventor: Lars Thingelstad
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Publication number: 20070176119Abstract: Apparatuses and methods for analyzing semiconductor workpieces are disclosed herein. In one embodiment, for example, an apparatus for analyzing a semiconductor workpiece includes a first metrology unit configured to measure photoluminescence from the workpiece and a second metrology unit configured to determine a topographical profile of the workpiece. The apparatus can further include a control unit operatively coupled to the first metrology unit and the second metrology unit to receive and associate data regarding the photoluminescence and the topographical profile to produce an integrated map of the workpiece. The apparatus may have several different configurations. In one embodiment, for example, the first metrology unit and the second metrology unit can be housed in a single tool. In other embodiments, the first metrology unit and the second metrology unit may be in separate tools.Type: ApplicationFiled: January 30, 2006Publication date: August 2, 2007Applicant: Accent Optical Technologies, Inc.Inventor: Steve Hummel
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Publication number: 20070176120Abstract: The invention concerns a method for producing integrated, diagnostic test elements (1) which have a lancing area (2) and a detection area (3). The lancing area is used to generate an opening in the skin and the detection area is used to detect an analyte in a body fluid. The selective sterilization sterilizes the lancing area but not the detection area by electron radiation. The method according to the invention comprises the steps of screening the detection area on the test element against electron radiation and subsequently irradiating the test element with electron radiation. The invention additionally concerns a method according to the invention in which the test elements and lancing areas are in a connected arrangement and are brought into the radiation area by moving the entire arrangement. Finally the invention concerns a diagnostic test element which has been produced according to the inventive method.Type: ApplicationFiled: January 8, 2007Publication date: August 2, 2007Inventors: Karin Schwind, Wolfgang Fiedler
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Publication number: 20070176121Abstract: A vacuum-driven gas gauge proximity sensor for sensing a difference between a reference surface standoff and a measurement surface standoff is disclosed. Unlike existing proximity sensors, the vacuum-driven gas gauge proximity sensor uses a vacuum to reverse the traditional flow of gas through a proximity sensor, such that gas flows inward across measurement and reference standoffs through measurement and reference nozzles. The conditioned ambient gas that is vacuumed into the reference and measurement nozzles flows through reference and measurement channels that are coupled at a junction into a single channel. The single channel is coupled to the vacuum that is used to evacuate the conditioned ambient gas through the proximity sensor. A bridge channel couples the reference and measurement channels. A mass flow sensor along the bridge channel monitors flow rates to detect measurement standoffs that can be used to initiate a control action. A pump-driven liquid flow proximity sensor is also disclosed.Type: ApplicationFiled: December 29, 2006Publication date: August 2, 2007Applicant: ASML Holding N.V.Inventors: Joseph Lyons, Peter Kochersperger, James Walsh, Rajan Mali
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Publication number: 20070176122Abstract: An architecture for a ribbon ion beam ion implanter system is disclosed. In one embodiment, the architecture includes an acceleration/deceleration parallelizing lens system for receiving a fanned ribbon ion beam and for at least parallelizing (and perhaps also accelerate or decelerate) the fanned ribbon ion beam into a substantially parallel ribbon ion beam, and an energy filter system downstream from the acceleration/deceleration parallelizing lens system and prior to a work piece to be implanted by the substantially parallel ribbon ion beam. The acceleration/deceleration parallelizing lens system includes lenses for at least parallelizing (and perhaps also accelerate or decelerate) the fanned ribbon ion beam and acceleration/deceleration lenses for accelerating or decelerating the substantially parallel ribbon ion beam. The parallelizing lens allows delivery of a high current ribbon ion beam to the work piece with energy that can extend down to as low as approximately 200 eV.Type: ApplicationFiled: January 27, 2006Publication date: August 2, 2007Inventors: Kourosh Saadatmand, Peter Kellerman
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Publication number: 20070176123Abstract: An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece, such as a silicon wafer is positioned to intersect the ion beam for ion implantation of a surface of the workpiece by the ion beam. Various magnets located along the beamline are provided for manipulating the ion beam and ions. Ion beam implanters having magnets including superconducting magnet coils are disclosed.Type: ApplicationFiled: January 31, 2006Publication date: August 2, 2007Inventors: Leonard Rubin, John Poate
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Publication number: 20070176124Abstract: Disclosed is a plasma doping method that, even though a plasma doping treatment is repeated, can make a dose from a film to a silicon substrate uniform for each time. According to an embodiment of the invention, there is provided a plasma doping method that places a sample on a sample electrode in a vacuum chamber, generates plasma in the vacuum chamber, and causes impurity ions in the plasma to collide against a surface of the sample so as to form an impurity doped layer in the surface of the sample.Type: ApplicationFiled: March 30, 2007Publication date: August 2, 2007Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.Inventors: Yuichiro Sasaki, Katsumi Okashita, Hiroyuki Ito, Bunji Mizuno, Tomohiro Okumura
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Publication number: 20070176125Abstract: A particle beam therapy system comprises a charged particle beam generator for generating a charged particle beam, two or more treatment rooms provided with respective irradiation devices for irradiating the charged particle beam, a beam line for transporting the charged particle beam extracted from the charged particle beam generator to the irradiation device in selected one of the two or more treatment rooms, a beam detection processing/control unit for monitoring a beam state of the charged particle beam in one of the two or more irradiation devices, and a selector for switchably selecting one of the irradiation devices which is to be monitored by the beam detection processing/control unit. The selector is controlled such that the selector establishes connection with the irradiation device in the selected one treatment room to which the charged particle beam is transported through the beam line. The system configuration can be simplified while maintaining the operation efficiency.Type: ApplicationFiled: November 21, 2006Publication date: August 2, 2007Inventors: Takayoshi Natori, Kunio Moriyama, Kazumune Sakai, Takahide Nakayama
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Publication number: 20070176126Abstract: A multi-leaf collimator that narrows a radiation field to a predetermined shape is provided with leaf blocks movable in the direction of the radiation field and having pattern images drawn along the direction of movement on a predetermined surface, and detection part acquiring an image of fixed-point via fixed-point observation in the direction of that predetermined surface and for detecting displacement of said leaf blocks based on the arranged locations of the pattern images existing in this image of fixed-point. Moreover, it is provided with detection part acquiring an image of fixed-point via fixed-point observation in the direction of that predetermined surface and for detecting the locations of the leaf blocks based on the arranged locations of the pattern images existing in this image of fixed-point.Type: ApplicationFiled: February 1, 2007Publication date: August 2, 2007Applicants: KABUSHIKI KAISHA TOSHIBA, TOSHIBA MEDICAL SYSTEMS CORPORATIONInventor: Teruo Hashimoto
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Publication number: 20070176127Abstract: An optical coating equipment, which includes a delivery device, a coater head, and an ultraviolet irradiative device. The delivery device delivers a film. A liquid coating is coated on the film by the coater head. The ultraviolet irradiative-device includes a board assembly. When the coated film is delivered through the ultraviolet irradiative device, irradiative dose is controlled by the board assembly of the ultraviolet irradiative device.Type: ApplicationFiled: April 25, 2006Publication date: August 2, 2007Applicant: DAXON TECHNOLOGY INC.Inventors: Po Liu, Kuan Lai, Chin Chen, Kun Yang
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Publication number: 20070176128Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: ApplicationFiled: December 22, 2006Publication date: August 2, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Van Bilsen, Jacobus Burghoorn, Richard Franciscus Van Haren, Paul Hinnen, Hermanus Van Horssen, Jeroen Huijbregtse, Andre Jeunink, Henry Megens, Ramon Y Koren, Hoite Theodoor Tolsma, Hubertus Gertrudus Simons, Johny Schuurhuis, Sicco Schets, Brian Bok Lee, Allan Dunbar
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Publication number: 20070176129Abstract: An electronic microwave circuit with GaAs field-effect transistors, which are integrated onto a semiconductor substrate, for switching high frequency electrical input signals has at least one light source for illuminating the GaAs field-effect transistors. The intensity of the light source and/or the color of the light source are changeable during operation. A calibrating device calibrates the intensity and/or color of the light source using a method according to the invention.Type: ApplicationFiled: April 22, 2005Publication date: August 2, 2007Applicant: Rohde & Schwarz GmbH & CO.KGInventor: Wilhelm Kraemer
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Publication number: 20070176130Abstract: The invention relates to a measuring arrangement comprising a sensor head (13) that can be displaced over a surface (11) at a distance therefrom in a scanning direction (R), a plurality of distance sensors which are suitable for distance measurement and are interspaced in the scanning direction in a fixed manner, a displacement device for displacing the sensor head (13) in such a way that points of the surface (11) are detected in successive scanning steps carried out by a plurality of distance sensors, and an evaluation device to which the output signals of the distance sensors are supplied. According to the invention, one such measuring arrangement is improved by an angle measuring device (14, 15) for determining an angle value of the sensor head (13) in relation to the scanning direction (R), and for forwarding said angle value to the evaluation device. In this way, systematic measuring errors can be eliminated for the reconstruction of a topography of the surface (11) in the scanning direction (R).Type: ApplicationFiled: July 4, 2005Publication date: August 2, 2007Inventors: Ingolf Weingaertner, Clemens Elster, Michael Schulz
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Publication number: 20070176131Abstract: A radiation absorbing phosphor layer including phosphors which absorb radiation and emit light according to the amount of the radiation, a stimulable photoconductive layer which generates electron-positive hole charges in an amount according to the amount of light and stores and records a radiation image information by trapping the charges while releasing the trapped charges upon exposure to stimulating light, a pair of photocurrent detecting electrode layers which are permeable to light and are respectively provided on upper and lower surfaces of the stimulable photoconductive layer to detect the released charges, and a panel-like light source for projecting the stimulating light onto the stimulable photoconductive layer is provided to form a radiation image information detecting panel.Type: ApplicationFiled: November 2, 2006Publication date: August 2, 2007Inventor: Kenji Takahashi
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Publication number: 20070176132Abstract: A valve assembly (60) for an injection valve (62) has a valve body (4) including a central longitudinal axis (L), the valve body (4) has a cavity (8) with a fluid inlet portion (42) and a fluid outlet portion (44), a valve needle (10) axially movable in the cavity (6), the valve needle (10) preventing a fluid flow through the fluid outlet portion (44) in a closing position and releasing the fluid flow through the fluid outlet portion (44) in further positions, and a fluid flow directing element (46) arranged in the fluid outlet portion (44) coaxially between the valve body (4) and the valve needle (10) and extending in radial direction away from the valve needle (10) in a way that a fluid flow between the valve needle (10) and the fluid flow directing element (46) is prevented.Type: ApplicationFiled: January 24, 2007Publication date: August 2, 2007Inventor: Mauro Grandi
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Publication number: 20070176133Abstract: The supplementary control valve device comprises a valve body, which may be reversibly displaced in a guide (3), in the direction of the longitudinal axis, between an opening solenoid (1) and a closing solenoid (2). The magnetic yoke (4) of the opening solenoid (1) comprises at least one extension (5), with direct contact with a web (6), connected to the guide (3) on the end thereof facing away from the extension (5).Type: ApplicationFiled: June 14, 2004Publication date: August 2, 2007Applicant: SIEMENS AKTIENGESELLSCHAFTInventors: Eugen Bernarding, Thomas Mann, Christian Reimann, Herbert Severien
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Publication number: 20070176134Abstract: A primary pole piece (PPP) for an electrical solenoid linear actuator includes an inner skirt portion extending axially from a radial flange portion and having a substantially uniform cylindrical thickness and a non-uniform axial length. The skirt is formed into a plurality of “saw teeth” or other axially-extending and circumferentially tapered elements separated by axially extending notches or similar axial inlets along the terminal skirt edge. Whereas in the prior art the magnetic flux is intensified radially by conical formation of the skirt, in the present invention the magnetic flux is intensified azimuthally by being collected in and directed to terminal flats of the saw teeth. The entire PPP may be net-formed by conventional powdered metal press/sintering, requiring no post-forming machining. Preferably, the molded PPP is conventionally sintered to increase density and is impregnated for plating.Type: ApplicationFiled: February 2, 2006Publication date: August 2, 2007Inventors: Joseph Cocca, Dwight Overmoyer, Thomas Lichti, Jack Gerke
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Publication number: 20070176135Abstract: A dual bushing rod seal housed in a balance chamber head. The balance chamber head has opening for receiving the rod. The first bushing a first section disposed between the rod and a counterbore in the balance chamber and a second section disposed between the rod and the inner wall of the balance chamber. The second bushing has a first section disposed between a second counterbore in the balance chamber head and the rod, and a second section disposed between the balance chamber head and the rod. A rod wiper is held against the rod by the second section of the second bushing. A rod seal is held against the rod by the first section of the first bushing. An O ring is disposed between the second section of the first bushing and the inner wall of the balance chamber.Type: ApplicationFiled: December 7, 2006Publication date: August 2, 2007Inventors: Mickey HEESTAND, Craig Santini, Rich Somplatsky
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Publication number: 20070176136Abstract: The invention relates to a magnet valve, having a valve insert and a tappet guided movably in the valve insert via a tappet guide, which tappet is braced on a valve body via a restoring spring resting a contact face of the tappet, and the restoring spring is guided radially from inside on one end by a spring guide of the tappet, the spring guide adjoining the contact face. According to the invention, centering means are present, which are disposed on the tappet in such a way that the restoring spring is centered and radially guided from inside over a substantial portion of its length.Type: ApplicationFiled: January 31, 2007Publication date: August 2, 2007Inventors: Harald Speer, Thomas Michl, Ralf Schindler, Dietmar Kratzer, Elmar Vier, Gerhard Schuster
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Publication number: 20070176137Abstract: A non-toxic, non-static, environmentally benign artificial snow product is made by extruding a mixture of starch, polyvinyl alcohol, soy flakes and talc to form an extruded starch product and smashing the extruded starch product into fragments. The fragments may be sorted by size. Colorant may be added to yield artificial snow flakes in various festive colors.Type: ApplicationFiled: October 6, 2006Publication date: August 2, 2007Inventors: John QUEE, Elizabeth QUEE
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Publication number: 20070176138Abstract: An apparatus and method for preparing and dispensing a liquid deicer. The apparatus and method allow deicer ingredients or precursors to be combined in an exothermic reaction to produce a heated deicer at the location where it will be used. In one implementation, potassium hydroxide and acetic acid are combined using the apparatus and method to make hot potassium acetate for use in numerous deicer applications, including deicing of airport runways.Type: ApplicationFiled: December 21, 2006Publication date: August 2, 2007Inventors: Michael Hoerle, Lawrence Micek, Donald Ireland
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Publication number: 20070176139Abstract: The present invention provides novel deicing and anti-icing compositions and methods based on by-produce of off-specification materials from biodegradable and renewable sources and which also can be used in a variety of other services.Type: ApplicationFiled: January 31, 2007Publication date: August 2, 2007Inventors: Richard Sapienza, Axel Johnson, William Ricks
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Publication number: 20070176140Abstract: A first polishing composition is used in chemical mechanical polishing for removing one part of the portion of a conductive layer positioned outside a trench. A second polishing composition is used in chemical mechanical polishing for removing the remaining part of the portion of a conductive layer positioned outside the trench and the portion of a barrier layer positioned outside the trench. The first polishing composition contains a specific surfactant, a silicon oxide, a carboxylic acid, an anticorrosive, an oxidizing agent, and water. The second polishing composition contains colloidal silica, an acid, an anticorrosive, and a completely saponified polyvinyl alcohol.Type: ApplicationFiled: September 30, 2004Publication date: August 2, 2007Inventors: Tsuyoshi Matsuda, Tatsuhiko Hirano, Junhui Oh, Atsunori Kawamura, Kenji Sakai
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Publication number: 20070176141Abstract: The present invention provides an aqueous composition useful for polishing silica and boro-phosphate-silicate-glass on a semiconductor wafer comprising by weight percent 0.01 to 5 carboxylic acid polymer, 0.02 to 6 abrasive, 0.01 to 10 polyvinylpyrrdidone, 0 to 5 cationic compound, 0 to 5 zwitterionic compound and balance water, wherein the polyvinylpyrrolidone has a average molecular weight between 100 grams/mole to 1,000,000 grams/mole.Type: ApplicationFiled: January 30, 2006Publication date: August 2, 2007Inventors: Sarah Lane, Charles Yu
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Publication number: 20070176142Abstract: A metal-polishing liquid contains at least one heterocyclic compound having from one to three nitrogen atom as heteroatoms in a molecule; and colloidal silica having a surface partially covered with aluminum. A chemical-mechanical polishing method contains processes of supplying the metal-polishing liquid to a polishing pad on a polishing platen; rotating the polishing platen; relatively moving the polishing pad while the polishing pad is contacted with a surface to be polished of an object to be polished; and polishing the surface to be polished of the object to be polished.Type: ApplicationFiled: January 25, 2007Publication date: August 2, 2007Applicant: FUJIFILM CorporationInventor: Makoto Kikuchi