Abstract: A semiconductor apparatus is disclosed. The semiconductor apparatus comprises a gate electrode formed on a surface of a semiconductor substrate with a gate insulating film provided therebetween. The semiconductor apparatus further comprises a gate sidewall insulating film having a three-layered structure formed of a first nitride film, an oxide film, and a second nitride film, which are formed on a sidewall of an upper portion of the gate electrode, and a gate sidewall insulating film having a two-layered structure formed of the oxide film and the second nitride film, which are formed on a sidewall of a lower portion of the gate electrode. The semiconductor apparatus further comprises a raised source/drain region formed of an impurity region formed in a surface layer of the semiconductor substrate and an impurity region grown on the impurity region.

Abstract: A semiconductor structure and a method for operating the same. The semiconductor structure includes a first semiconductor chip and a second semiconductor chip. The first semiconductor chip is on top of and bonded to the second semiconductor chip. The first and second semiconductor chips include a first and a second electric nodes. The second semiconductor chip further includes a first comparing circuit. The semiconductor structure further includes a first coupling via electrically connecting the first electric node of the first semiconductor chip to the first comparing circuit of the second semiconductor chip. The first comparing circuit is capable of (i) receiving an input signal from the second electric node directly, (ii) receiving an input signal from the first electric node indirectly through the first coupling via, and (iii) asserting a first mismatch signal in response to the input signals from the first and second electric nodes being different.

Abstract: In a semiconductor device including a multi-gate MIS transistor having a channel on a plurality of surfaces, a gate electrode is formed on a gate insulating film on side surfaces of an island-like semiconductor layer formed along a given direction on an insulating film, and source/drain electrodes are formed in contact with the semiconductor layer. The semiconductor layer has a plurality of side surfaces along the given direction. All angles formed by adjacent side surfaces are larger than 90°. A section perpendicular to the given direction is vertically and horizontally symmetrical.

Abstract: A high performance semiconductor device has an NMOS and a PMOS for which each channel is formed on an optimal crystal plane. A semiconductor device comprises a silicon single-crystal substrate whose surface is a (110) crystal plane, a PMOSFET formed on a (110) plane as a wall surface of a Fin perpendicular to a <110> axis, and an NMOSFET formed on a (001) plane as a wall surface of a Fin perpendicular to a <001> axis on the (110) plane of the substrate.

Abstract: A MOS transistor including a source region, a drain region, and a gate electrode has first and second partial isolation regions in one-end gate region and the other-end gate region, respectively, with a first tap region provided adjacent to the first partial isolation region, and a second tap region provided adjacent to the second partial isolation region. A full isolation region is provided in the whole area around the first and second partial isolation regions, first and second tap regions, and source and drain regions.

Abstract: A gate electrode is provided such that both ends thereof in a gate width direction are projected from an active region in plane view. Partial trench isolation insulation films are provided in a surface of an SOI substrate corresponding to lower parts of the both ends, and body contact regions are provided in the surface of the SOI substrate outside the both ends of the gate electrode in the gate width direction so as to be adjacent to the respective partial trench isolation insulation films. The body contact region and a body region are electrically connected through an SOI layer (well region) under the partial trench isolation insulation film. In addition, a source tie region in which P type impurity is doped in a relatively high concentration is provided in the surface of a source region in the vicinity of the center of the gate electrode in the gate width direction.

Abstract: A substrate includes a first region and a second region. The first region comprises a III-nitride layer, and the second region comprises a first semiconductor layer. A first transistor (such as an n-type transistor) is formed in and on the III-nitride layer, and a second transistor (such as a p-type transistor) is formed in and on the first semiconductor layer. The III-nitride layer may be indium nitride. In the first region, the substrate may include a second semiconductor layer, a graded transition layer over the second semiconductor layer, and a buffer layer over the transition layer, where the III-nitride layer is over the buffer layer. In the second region, the substrate may include the second semiconductor layer and an insulating layer over the second semiconductor layer, where the first semiconductor layer is over the insulating layer.

Abstract: A catalytic element is added to an amorphous semiconductor film and heat treatment is conducted therefor to produce a crystalline semiconductor film with good quality, a TFT (semiconductor device) with a satisfactory characteristic is realized using the crystalline semiconductor film. A semiconductor layer includes a region containing an impurity element which has a concentration of 1×1019/cm3 to 1×1021/cm3 and belongs to group 15 of the periodic table and an impurity element which has a concentration of 1.5×1019/cm3 to 3×1021/cm3 and belongs to group 13 of the periodic table, and the region is a region to which a catalytic element left in the semiconductor film (particularly, the channel forming region) moves.

Abstract: An integrated circuit device (e.g., a logic device or a memory device) having a memory cell array including a plurality of word lines (e.g., first and second word lines) and a plurality of word line segments (e.g., first and second word line segments) wherein each word line segment is coupled to an associated word line (e.g., a first segment is associated with the first word line and a second segment is associated with the second word line). The memory cell array further includes a plurality of memory cells, wherein each memory cell includes a transistor having a first region, a second region, a body region, wherein the body region is electrically floating, and a gate coupled to an associated word line via an associated word line segment.

Abstract: An integrated circuit has functional circuitry coupled to a terminal. An electrostatic discharge protector can be coupled to the terminal to protect the functional circuitry from an electrostatic discharge. A substrate includes a first semiconductor material with a first dopant type. A plurality of drain segments adjoin the substrate. Each of the drain segments has a first conductor, a second conductor, and a third conductor. A central via set in a central region of the drain segment couples the second conductor to the third conductor. A peripheral via set in a peripheral region of the drain segment couples the first conductor to the second conductor. A plurality of source segments adjoin the substrate and laterally interlace with the drain segments.

Abstract: An electrostatic discharge protection device, and a method of fabricating the same, includes a substrate, an n-well formed in the substrate, a p-well formed on the n-well, an NMOS transistor formed on the p-well, the NMOS transistor including a gate electrode, an n+ source and an n+ drain, and a grounded p+ well pick-up formed in the p-well, wherein the n-well is connected to the n+ drain of the NMOS transistor and the n+ source is grounded. The n+ drain and the n-well are connected to decrease a voltage of a trigger and a current density of a surface of the substrate.

Abstract: A well isolation trenches for a CMOS device and the method for forming the same. The CMOS device includes (a) a semiconductor substrate, (b) a P well and an N well in the semiconductor substrate, (c) a well isolation region sandwiched between and in direct physical contact with the P well and the N well. The P well comprises a first shallow trench isolation (STI) region, and the N well comprises a second STI region. A bottom surface of the well isolation region is at a lower level than bottom surfaces of the first and second STI regions. When going from top to bottom of the well isolation region, an area of a horizontal cross section of the well isolation region is an essentially continuous function.

Abstract: Semiconductor structures and methods for suppressing latch-up in bulk CMOS devices. The semiconductor structure comprises a shaped-modified isolation region that is formed in a trench generally between two doped wells of the substrate in which the bulk CMOS devices are fabricated. The shaped-modified isolation region may comprise a widened dielectric-filled portion of the trench, which may optionally include a nearby damage region, or a narrowed dielectric-filled portion of the trench that partitions a damage region between the two doped wells. Latch-up may also be suppressed by providing a lattice-mismatched layer between the trench base and the dielectric filler in the trench.

Abstract: The magnetic memory device includes a magnetic shield film 48, and a magnetoresistive effect element 62 formed over the magnetic shield film 48 and including a magnetic layer 52, a non-magnetic layer 54 and a magnetic layer 56, in which a magnetization direction of the first magnetic layer or the second magnetic layer is reversed by spin injection, and a second magnetic shield film 68 formed over the side wall of the magnetoresistive effect element 62. Thus, the arrival of the leakage magnetic field from the interconnection near the magnetoresistive effect element 62 can be effectively prevented.

Abstract: The present invention relates to a semiconductor device comprising at least one static random access memory (SRAM) cell with self-aligned contacts. Specifically, the at least one SRAM cell comprises at least a first gate conductor that is located over a channel region between a source region and a drain region. The first gate conductor is covered by a dielectric cap comprising a protective dielectric material, and the source and drain regions are covered by non-protective dielectric material(s) that can be selectively removed against the protective material. In this manner, a self-aligned source or drain contact can be formed through the non-protective dielectric material(s) to contact either the source or the drain region, while the dielectric cap protects the first gate conductor during formation of the source or drain contact opening and thereby prevents shorting between the first gate conductor and the source or drain contact to be formed.

Abstract: An SRAM cell. The SRAM cell including: a first gate segment common to a first PFET and a first NFET, a second gate segment common to a second PFET and a second NFET; a first silicide layer contacting a first end of the first gate segment and a drain of the second PFET; a second silicide layer contacting a sidewall contact region of the second gate segment and a drain of the first PFET; a third silicide layer contacting a sidewall contact region of the first gate segment and a drain of the second NFET; a fourth silicide layer contacting a first end of the second gate segment, a drain of the first PFET and a drain of a fourth NFET; and a fifth silicide layer contacting a second end of the first gate segment and a drain of a third NFET.

Abstract: This disclosure relates to field-effect-transistor (FET) multiplexing/demultiplexing architectures and methods for fabricating them. One of these FET multiplexing/demultiplexing architectures enables decoding of an array of tightly pitched conductive structures. Another enables efficient decoding of various types of conductive-structure arrays, tightly pitched or otherwise. Also, processes for forming FET multiplexing/demultiplexing architectures are disclosed that use alignment-independent processing steps. One of these processes uses one, low-accuracy imprinting step and further alignment-independent processing steps.

Abstract: This invention relates to a semiconductor device having a beam made of a semiconductor to which strain is introduced by deflection, and a current is permitted to flow in the beam.

Abstract: A micro-electro mechanical system (MEMS) device that uses an SOI wafer, and a method of manufacturing the same. The MEMS device includes an SOI wafer including a first silicon layer, a second silicon layer, and an insulating layer formed between the first and second silicon layers, and a protective substrate that is bonded to the first silicon layer, wherein grounding via holes are formed through the first silicon layer, the insulating layer and the protective substrate, and filled with a conductive material, and ventilation holes to be connected to the grounding via holes are formed in the second silicon layer.

Abstract: A method of manufacturing a solid-state image pickup device comprises a process for forming a plurality of photoelectric conversion elements PD within a semiconductor substrate 4, a process for forming an interconnection portion, having an interconnection layer 8 in an insulating layer 7, on the surface side of the semiconductor substrate 4, a process for forming an adhesive layer, made of a material cured at a temperature lower than a deterioration starting temperature of the interconnection layer 8, on the surface of the interconnection portion and bonding a supporting substrate 30 to the surface side of the interconnection portion through the adhesive layer 9 by heat treatment at a temperature lower than the deterioration starting temperature of the interconnection layer 8 and a process for decreasing a thickness of the semiconductor substrate 4 from the back side.

Abstract: A method for making a micromirror device comprises is disclosed herein.

Abstract: An image sensing device includes a substrate with a photo sensing and a transistor regions, a photo diode, a transistor, a dielectric layer, a metal interconnect, a metal conductive line, a conformal passivation layer, a color filter, a lens planar layer, and a microlens. The photo diode is in the substrate within the photo sensing region. The transistor is on the substrate in the transistor region. The dielectric layer is on the substrate. Except the photo sensing region, the metal interconnect and the metal conductive line are respectively located in and on the dielectric layer. The conformal passivation layer is on the dielectric layer and covers the metal conductive line. The color filter is on the conformal passivation layer in the photo sensing region and the bottom thereof is lower than the top of the metal conductive line. The lens planar layer and the microlens are sequentially on precedent structure.

Abstract: Semiconductor devices (61) and methods (80-89, 100) are provided with dual passivation layers (56, 59). A semiconductor layer (34) is formed on a substrate (32) and covered by a first passivation layer (PL-1) (56). PL-1 (56) and part (341) of the semiconductor layer (34) are etched to form a device mesa (35). A second passivation layer (PL-2) (59) is formed over PL-1 (56) and exposed edges (44) of the mesa (35). Vias (90, 92, 93) are etched through PL-1 (56) and PL-2 (59) to the semiconductor layer (34) where source (40), drain (42) and gate are to be formed. Conductors (41, 43, 39) are applied in the vias (90, 92, 93) for ohmic contacts for the source-drain (40, 42) and a Schottky contact (39) for the gate. Interconnections (45, 47) over the edges (44) of the mesa (35) couple other circuit elements. PL-1 (56) avoids adverse surface states (52) near the gate and PL-2 (59) insulates edges (44) of the mesa (35) from overlying interconnections (45, 47) to avoid leakage currents (46).

Abstract: The semiconductor device includes a device isolation structure formed in a semiconductor substrate to define an active region, a bridge type channel structure formed in the active region, and a coaxial type gate electrode surrounding the bridge type channel structure of a gate region. The bridge type channel structure is separated from the semiconductor substrate thereunder by a predetermined distance in a vertical direction.

Abstract: A structure comprises a deep subcollector buried in a first region of a dual epitaxial layer and a reachthrough structure in contact with the deep subcollector to provide a low-resistive shunt which prevents CMOS latch-up for a first device. The structure may additionally include a near subcollector formed in a higher region than the deep subcollector and under another device. At least one reachthrough electrically connects the deep subcollector and the near subcollector. The method includes forming a merged triple well double epitaxy/double subcollector.

Abstract: A seal-ring structure is formed on a p-substrate that is coupled to a first voltage terminal. The seal-ring structure includes an n-well, a first metal layer, a second metal layer, a first capacitor, a poly-silicon layer, and a second capacitor. The n-well is formed on the p-substrate and coupled to a second voltage terminal. The first metal layer is sited on a first dielectric layer on the p-substrate and connected to the p-substrate through a plurality of contacts. The second metal layer is sited on a second dielectric layer on the first metal layer and connected to the n-well through a plurality of contacts. The first capacitor is formed between the first metal layer and the second metal layer. The poly-silicon layer is formed between the first metal layer and the n-well. The second capacitor is formed between the poly-silicon layer and the n-well.

Abstract: An integrated circuit comprises a plurality of layers including a first substrate with an on chip capacitor and a second substrate. In one embodiment, the second substrate has an on chip capacitor. The first and/or second substrate can include a sensor element, such as a magnetic sensor element.

Abstract: A capacitor structure uses an aperture located within a dielectric layer in turn located over a substrate. A pair of conductor interconnection layers embedded within the dielectric layer terminates at a pair of opposite sidewalks of the aperture. A pair of capacitor plates is located upon the pair of opposite sidewalks of the aperture and contacting the pair of conductor interconnection layers, but not filling the aperture. A capacitor dielectric layer is located interposed between the pair of capacitor plates and filling the aperture. The pair of capacitor plates may be formed using an anisotropic unmasked etch followed by a masked trim etch. Alternatively, the pair of capacitor plates may be formed using an unmasked anisotropic etch only, when the pair of opposite sidewalks of the aperture is vertical and separated by a second pair of opposite sidewalks that is outward sloped.

Abstract: A three-dimensional capacitor structure has a first conductive layer, a second conductive layer disposed above the first conductive layer, and a plug layer disposed between the conductive layers. The first conductive layer includes first conductive closed-end frames, and first conductive islands disposed inside the first conductive closed-end frames. The second conductive layer includes second conductive closed-end frames, and second conductive islands disposed inside the second conductive closed-end frames. The second conductive closed-end frames line up with the first conductive islands, and the second conductive islands line up with the first conductive closed-end frames. The plug layer has plugs disposed in between each first conductive island and each second conductive closed-end frame, and in between each first conductive closed-end frame and each second conductive island.

Abstract: The invention is directed to a semiconductor device having a diode element which prevents a leakage current due to a vertical parasitic bipolar transistor and enhances current efficiency. An element isolation insulation film is provided on an N well layer, and a first P+ layer and a second P+ layer are formed on the N well layer surrounded by the element isolation insulation film, the second P+ layer being formed at a distance from the first P+ layer. An electrode layer is formed on the N well layer between the first P+ layer and the second P+ layer. An N+ layer for a contact is formed on the N well layer between the element isolation insulation film and other element isolation insulation film. The first P+ layer is connected with an anode wiring, and the electrode layer, the second P+ layer, and the N+ layer are connected with a cathode wiring. A diode element utilizing a lateral PNP bipolar transistor is thus formed on the semiconductor substrate.

Abstract: In conventional mesa-type npn bipolar transistors, the improvement of a current gain and the miniaturization of the transistor have been unachievable simultaneously as a result of a trade-off being present between lateral diffusion and recombination of the electrons which have been injected from an emitter layer into a base layer, and a high-density base contact region—emitter mesa distance. In contrast to the above, the present invention is provided as follows: The gradient of acceptor density in the depth direction of a base layer is greater at the edge of an emitter layer than at the edge of a collector layer. Also, the distance between a first mesa structure including the emitter layer and the base layer, and a second mesa structure including the base layer and the collector layer, is controlled to range from 3 ?m to 9 ?m.

Abstract: A transistor having minimized parasitics is provided including an emitter having a recessed extrinsic emitter portion atop an intrinsic emitter portion; a base including an intrinsic base portion in electrical contact with the intrinsic emitter portion and an extrinsic base portion in electrical contact with the intrinsic base portion and electrically isolated from the recessed extrinsic emitter portion by a set of emitter/base spacers; and a collector in electrical contact with the intrinsic base portion. The transistor may further include extrinsic base having top surfaces entirely silicided to the emitter/base spacer. Additionally, the transistor may include a base window opening within the transistor's active area. Methods of forming the above-described transistor are also provided.

Abstract: An electrically conducting track comprising an electrically conducting track layer; a semiconductor substrate; and a dielectric layer sandwiched between track layer and semiconductor substrate; the electrically conducting track further comprising an electrically conducting resistor track between semiconductor substrate and dielectric layer

Abstract: A heating unit includes an AlN substrate having a main surface on which an elongated heat-generating resistor is provided. A protection layer is formed on the main surface of the substrate for the heat-generating resistor. The protection layer includes a first cover layer covering the heat-generating resistor and a second cover layer covering the first cover layer. The first cover layer is made of crystallized or semi-crystallized glass having a higher crystallization temperature by at least 50° C. than the softening point of the glass. The second cover layer is made of non-crystalline glass.

Abstract: A semiconductor package is disclosed. The package includes a leadframe structure comprising a die attach region and plurality of leads. A molding material is molded around at least a portion of the leadframe structure, and comprises a window. A semiconductor die comprising an edge is mounted on the die attach region and is within the window. A gap is present between the edge of the semiconductor die and the molding material.

Abstract: The present invention provides an etched leadframe flipchip package system comprising forming a leadframe comprises forming contact leads and etching a plurality of multiple dotted grooves on the contact leads, and attaching a flipchip integrated circuit having solder interconnects on the contact leads between each of the plurality of the multiple dotted grooves.

Abstract: A semiconductor device package comprises a container including a base and sidewalls. The base is configured to support a semiconductor device chip, and a lead frame extends through at least one of the sidewalls. A portion of the lead frame within the sidewall has at least one aperture penetrating into the lead frame. The sidewall material extends into the aperture, thereby forming a strong interfacial bond that provides a low leakage, sidewall-lead-frame interface. The base has a reentrant feature that is positioned within the thickness of at least one of the sidewalls and engages the at least one sidewall, thereby forming a low leakage base-sidewall interface. The top surface of the base has a groove that is positioned within the thickness of at least one of the sidewalls and engages the at least one sidewall, thereby enhancing the low leakage base-sidewall interface.

Abstract: An object of the present invention is to provide an adhesive sheet that can fill irregularities due to wiring of a substrate or a wire attached to a semiconductor chip, etc., does not form resin burrs during dicing, and has satisfactory heat resistance and moisture resistance. The present invention relates to an adhesive sheet comprising 100 parts by weight of a resin comprising 15 to 40 wt % of a high molecular weight component containing a crosslinking functional group and having a weight-average molecular weight of 100,000 or greater and a Tg of ?50° C. to 50° C., and 60 to 85 wt % of a thermosetting component containing an epoxy resin as a main component, and 40 to 180 parts by weight of a filler, the adhesive sheet having a thickness of 10 to 250 ?m.

Abstract: The present invention includes a substrate with a glass plate, a plurality of oxide wires on the glass plate and a plurality of flip chip bumps on the oxide wires and an integrated circuit chip with a plurality of bump pads. The substrate and the integrated circuit chip are hot pressed with a predetermined bonding pressure and temperature to bond the bump pads to the flip chip bumps respectively by eutectic bonding.

Abstract: An adhesive bonding sheet having an optically transmitting supporting substrate and an adhesive bonding layer, and being used in both a dicing step and a semiconductor element adhesion step, wherein the adhesive bonding layer comprises: a polymer component (A) having a weight average molecular weight of 100,000 or more including functional groups; an epoxy resin (B); a phenolic epoxy resin curing agent (C); a photoreactive monomer (D), wherein the Tg of the cured material obtained by ultraviolet light irradiation is 250° C. or more; and a photoinitiator (E) which generates a base and a radical by irradiation with ultraviolet light of wavelength 200-450nm.

Abstract: A stacked semiconductor device is constructed by stacking in two levels: a lower semiconductor device having a wiring board, at least one semiconductor chip mounted on a first surface of the wiring board and having electrodes electrically connected to wiring by way of a connection means, an encapsulant composed of insulating plastic that covers the semiconductor chip and the connection means, a plurality of electrodes formed overlying the wiring of a second surface of the wiring board, and a plurality of linking interconnects each having a portion connected to the wiring of the first surface of the wiring board and another portion exposed on the surface of the encapsulant; and an upper semiconductor device in which each electrode overlies and is electrically connected to the exposed portions of each of the linking interconnects of the lower semiconductor device.

Abstract: Disclosed herein is a strip format of a semiconductor package board and an array thereof, in which a dummy area of the strip format of the semiconductor package board is formed into a predetermined shape such that, when several strip formats of semiconductor package boards are arranged on a panel, the number of strip formats of semiconductor package boards arranged on the panel can be increased.

Abstract: The present invention provides a radio frequency identification (RFID) package structure for improving a low data reading rate of the conventional RFID transponder structure to overcome the disadvantage of the prior art, and packages a RFID die by an adhesive according to a package technology. The RFID package structure provides different ways of improving the data reading capability, such as adding a capacitor. The capacitance of the capacity can be adjusted to provide a RFID package structure applicable for different frequencies, or the RFID package structure formed by the structure of a single substrate together with the use of an adhesive can be used for producing the RFID package structure to lower the manufacturing cost.

Abstract: According to one exemplary embodiment, an overmolded package includes a component situated on a substrate. The overmolded package further includes an overmold situated over the component and the substrate. The overmolded package further includes a wirebond cage situated over the substrate and in the overmold, where the wirebond cage surrounds the component, and where the wirebond cage includes a number of wirebonds. The wirebond cage forms an EMI shield around the component. According to this exemplary embodiment, the overmolded package further includes a conductive layer situated on a top surface of the overmold and connected to the wirebond cage, where the conductive layer forms an EMI shield over the component.

Abstract: A multichip package system is provided forming a first substrate having a first side, a second side, and a first opening, connecting a first integrated circuit die to the first substrate through the first opening, connecting a second integrated circuit die on the first substrate, and encapsulating the first integrated die and second integrated circuit die on the first substrate.

Abstract: A stacked integrated circuit package-in-package system is provided forming a first integrated circuit package having a first peripheral contact, forming a second integrated circuit package having a second peripheral contact, stacking the second integrated circuit package on the first integrated circuit package in an offset configuration with the first peripheral contact exposed, the offset configuration provides a second package overhang with the second integrated circuit package above the first integrated circuit package, electrically connecting the first peripheral contact and a package substrate top contact, and electrically connecting the second peripheral contact and the package substrate top contact.

Abstract: Methods, systems, and apparatus for reducing power consumption or signal distortions in a semiconductor device package. The semiconductor device package includes a semiconductor device, a first electric path, a second electric path, and an isolation element in the first electric path. The second electric path is electrically connected to the first electric path and a functional unit of the device. The isolation element separates an isolated portion in the first electric path from the second electric path, where the isolation element is configured to reduce current in the isolated portion when a signal is passing through the second electric path.

Abstract: A carrier board structure with a semiconductor chip embedded therein and a method for fabricating the same are proposed. A rectangular cavity is formed at a predetermined position of the carrier board, and at least a breach is formed at a corner of the rectangular cavity, wherein the breach is composed of a plurality of drilling holes. Thus, the breach is capable of providing the rectangular cavity with a larger space for receiving a semiconductor chip in the rectangular cavity, when in the process of disposing the semiconductor chip into the rectangular cavity.

Abstract: A semiconductor device P includes a die pad 20, a semiconductor element 30 which is loaded on the die pad 20, and a sealing resin 40. A plurality of electrically conductive portions 10 each having a layered structure including a metal foil 1 comprising copper or a copper alloy, and electrically conductive portion plating layers 2 provided at both upper and lower ends of the metal foil 1 are arranged around the die pad 20. The die pad 20 has a lower die pad plating layer 2b, and the semiconductor element 30 is loaded on the die pad 20 comprising such a die pad plating layer 2b. Electrodes 30a provided on the semiconductor element 30 are electrically connected with top ends of the electrically conductive portions 10 via wires 3, respectively. The lower electrically conductive portion plating layers 2 of the electrically conductive portions 10 and the die pad plating layer 2b of the die pad 20 are exposed outside from the sealing resin 40 on their back faces.

Abstract: A method and structure provides a Direct Write Wafer Level Chip Scale Package (DWWLCSP) that utilizes permanent layers/coatings and direct write techniques to pattern these layers/coatings, thereby avoiding the use of photoimagable materials and photo-etching processes.