Abstract: Methods of manufacturing alumina abrasive for use in chemical mechanical polishing are described, wherein the abrasive is in a slurry having gamma alumina formed in a low temperature fuming process, water, an acid sufficient to maintain the pH below about 7, wherein the slurry does not settle appreciably in an 8 to 24 hour period. Advantageously, the alumina is wet-milled without the use of wet-milling salt additives.

Abstract: Reducing CMP wafer contamination by in-situ clean is disclosed herein. The invention can be employed in a method in which a conductive layer is formed on a surface of a semiconductor wafer. After a portion of the conductive layer is removed, an acidic solution is directly or indirectly applied to the semiconductor wafer. Then the semiconductor wafer is engaged with a polishing pad as the acidic solution is applied directly or indirectly to the semiconductor wafer. In one embodiment, the portion of the conductive layer is removed by a CMP tool, and the semiconductor wafer is engaged with the polishing pad before the semiconductor is removed from the CMP tool.

Abstract: A method of manufacturing micro-structure elements by utilizing molding glass includes the steps of forming a mold having a micro-structure pattern thereon by using an electroforming process, making a copy of the micro-structuring pattern on a glass structure by using glass molding technology, and filling clothing material on the glass substrate to form a micro-structure element with less complex and cost, thereby being suitable for mass production.

Abstract: A method for etching an organic anti-reflective coating (ARC) layer on a substrate in a plasma processing system comprising: introducing a process gas comprising ammonia (NH3), and a passivation gas; forming a plasma from the process gas; and exposing the substrate to the plasma. The process gas can, for example, constitute NH3 and a hydrocarbon gas such as at least one of C2H4, CH4, C2H2, C2H6, C3H4, C3H6, C3H8, C4H6, C4H8, C4H10, C5H8, C5H10, C6H6, C6H10, and C6H12. Additionally, the process chemistry can further comprise the addition of helium. The present invention further presents a method for forming a bilayer mask for etching a thin film on a substrate, wherein the method comprises: forming the thin film on the substrate; forming an ARC layer on the thin film; forming a photoresist pattern on the ARC layer; and transferring the photoresist pattern to the ARC layer with an etch process using a process gas comprising ammonia (NH3), and a passivation gas.

Abstract: A method for forming a via hole and a trench for a dual damascene interconnection comprises forming a via hole through an inter-metal insulating film to expose a portion of a surface of an etch stop film on a lower metal film, forming a photoresist film on an entire surface of the resultant structure and in the via hole, exposing a top surface and a side surface of the inter-metal insulating film by recessing the photoresist film using a development process for the photoresist film, forming a bottom antireflective coating film on the exposed surfaces of the inter-metal insulating film and the photoresist film, forming a mask pattern on the bottom antireflective coating film, forming a trench by an etching process using the mask pattern as an etch mask, and completely removing the photoresist film within the via hole.

Abstract: A method is provided for plasma ashing to remove photoresist remnants and etch residues formed during preceding plasma etching of dielectric layers. The ashing method uses a two-step plasma process involving a hydrogen-containing gas, where low or zero bias is applied to the substrate in the first cleaning step to remove significant amount of photoresist remnants and etch residues from the substrate, in addition to etching and removing detrimental fluorocarbon residues from the chamber surfaces. An increased bias is applied to the substrate in the second cleaning step to remove the remains of the photoresist and etch residues from the substrate. A chamber pressure less than 20 mTorr is utilized in the second cleaning step. The two-step process reduces the memory effect commonly observed in conventional one-step ashing processes. A method of endpoint detection can be used to monitor the ashing process.

Abstract: A process for etching semiconductor substrates using a deep reactive ion etching process to produce through holes or slots (hereinafter “slots”) in the substrates. The process includes applying a first layer to a back side of a substrate as a first etch stop material. The first layer is a relatively soft etch stop material. A second layer is applied to the first layer on the back side of the substrate to provide a composite etch stop layer. The second layer is a relatively hard etch stop material. The substrate is etched from a side opposite the back side of the substrate to provide a slot in the substrate.

Abstract: The present invention discloses a method for preparing a structure with high aspect ratio, which can be a trench or a conductor. A first mask is formed on a substrate, and a first etching process is performed to remove the substrate uncovered by the first mask to form at least one concavity. A second mask is formed on the surface of the prepared structure, a second etching process is then performed to remove the second mask on the concavity, and a third etching process is performed subsequently to extend the depth of the concavity into the substrate. To prepare a conductor with high aspect ratio in the substrate, the first mask and the second mask are preferably made of dielectric material or metal. In addition, to prepare a trench with high aspect ratio in a silicon substrate, the first mask and the second mask are preferably made of dielectric material.

Abstract: Plasma etch processes incorporating helium-based etch chemistries can remove dielectric a semiconductor applications. In particular, high density plasma chemical vapor etch-enhanced (deposition-etch-deposition) gap fill processes incorporating etch chemistries which incorporate helium as the etchant that can effectively fill high aspect ratio gaps while reducing or eliminating dielectric contamination by etchant chemical species.

Abstract: A semiconductor substrate comprising a semiconductor base, a dielectric layer formed in at least a part of an area on the semiconductor base, and a single crystal semiconductor layers having mutually different film thicknesses, disposed on the dielectric layer and formed by epitaxial growth.

Abstract: In order to use an etching solution of less complicated composition for recovering used wafers, embodiments of the present invention provide a recovering method, and also provide a kind of wafer, which is used as a process control wafer or dummy wafer, and fabrication methods. In one embodiment, a wafer-recovering method comprises providing a first wafer, wherein the first wafer has a base, a first conductive layer on the base, and a second conductive layer on the first conductive layer. The method further comprises removing the first and second conductive layers with an acidic solution to obtain a second wafer; and washing the second wafer with a liquid. The second conductive layer is formed on the first conductive layer in a deposition process, and the first conductive layer is more easily removed by the acidic solution than the second conductive layer.

Abstract: A method for cleaning a substrate on which a silicon layer and a silicon germanium layer are formed and exposed, and method for fabricating a semiconductor device using the cleaning method are disclosed. The cleaning method comprises preparing a semiconductor substrate on which a silicon layer and a silicon germanium layer are formed and exposed; and performing a first cleaning sub-process that uses a first cleaning solution to remove a native oxide layer from the semiconductor substrate. The cleaning method further comprises performing a second cleaning sub-process on the semiconductor substrate after performing the first cleaning sub-process, wherein the second cleaning sub-process comprises using a second cleaning solution. In addition, the second cleaning solution comprises ammonium hydroxide (NH4OH), hydrogen peroxide (H2O2), and deionized water (H2O), and the second cleaning solution comprises at least 200 times more deionized water (H2O) than ammonium hydroxide (NH4OH) by volume.

Abstract: A method and system for treating a dielectric film includes exposing at least one surface of the dielectric film to an alkyl silane, an alkoxysilane, an alkyl siloxane, an alkoxysiloxane, an aryl silane, an acyl silane, a cyclo siloxane, a polysilsesquioxane (PSS), an aryl siloxane, an acyl siloxane, or a halo siloxane, or any combination thereof. The dielectric film can include a low dielectric constant film with or without pores having an etch feature formed therein following dry etch processing. As a result of the etch processing or ashing, exposed surfaces in the feature formed in the dielectric film can become damaged, or activated, leading to retention of contaminants, absorption of moisture, increase in dielectric constant, etc. Damaged surfaces, such as these, are treated by performing at least one of healing these surfaces to, for example, restore the dielectric constant (i.e., decrease the dielectric constant) and cleaning these surfaces to remove contaminants, moisture, or residue.

Abstract: The present invention provides a gate dielectric having a flat nitrogen profile, a method of manufacture therefor, and a method of manufacturing an integrated circuit including the flat nitrogen profile. In one embodiment, the method of manufacturing the gate dielectric includes forming a gate dielectric layer (410) on a substrate (310), and subjecting the gate dielectric layer (410) to a nitrogen containing plasma process (510), wherein the nitrogen containing plasma process (510) has a ratio of helium to nitrogen of 3:1 or greater.

Abstract: A method for the duplication of microscopic patterns from a master to a substrate is disclosed, in which a replica of a topographic structure on a master is formed and transferred when needed onto a receiving substrate using one of a variety of printing or imprint techniques, and then dissolved. Additional processing steps can also be carried out using the replica before transfer, including the formation of nanostructures, microdevices, or portions thereof. These structures are then also transferred onto the substrate when the replica is transferred, and remain on the substrate when the replica is dissolved. This is a technique that can be applied as a complementary process or a replacement for various lithographic processing steps in the fabrication of integrated circuits and other microdevices.

Abstract: A semiconductor device manufacturing method capable of making in-plane temperature distribution on a wafer uniform at heat treatment time. Before heat treatment is performed by irradiating the wafer with lamp light from the side of a device formed area where semiconductor devices are to be formed, an SiN film with certain thickness the reflection factor of which is equal to the average reflection factor of the device formed area is formed in an edge portion outside the device formed area. By doing so, reflection factors on the surface of the wafer irradiated with lamp light can be made uniform and uniform temperature distribution on the wafer can be obtained at heat treatment time. As a result, in-plane variations in the characteristics of semiconductor devices on the wafer can be made small and high-quality semiconductor devices can be manufactured.

Abstract: An absorbent structure can include a matrix of fibers, wherein the matrix is reinforced with a reinforcing member, such as scrim. The scrim is secured to the fibrous matrix by entanglement of fibers with the scrim and entanglement of fibers in the matrix from opposite sides of the scrim with each other. The scrim layer can be restricted to a longitudinally extending, medial region of the absorbent. In a particular arrangement, the scrim has a cross-directional width dimension which is less than a narrowest width dimension of the fibrous matrix. The scrim can be located between two, opposed, major surfaces of the fibrous matrix. The scrim has a reduced stiffness in the cross direction which promotes fit and comfort of the absorbent structure as incorporated into a disposable absorbent garment.

Abstract: Noble metal catalysts and methods for producing the catalysts are provided. The catalysts are useful in applications such as fuel cells. The catalysts exhibit reduced agglomeration of catalyst particles as compared to conventional noble metal catalysts.

Abstract: A system comprising a) Ni(0) b) from 4 to 10 mol per mol of Ni(0) in a) of a compound (I) of the formula P(X1R1)(X2R2)(X3R3) ??(I) where X1, X2, X3 are each, independently of one another, oxygen or a single bond, R1, R2, R3 are, independently of one another, identical or different organic radicals and c) from 1 to 4 mol per mol of Ni(0) in a) of a compound (II) of the formula where X11, X12, X13 X21, X22, X23 are each, independently of one another, oxygen or a single bond, R11, R12 are identical or different, individual or bridged organic radicals, R21, R22 are identical or different, individual or bridged organic radicals and Y is a bridging group is suitable as catalyst for preparing mixtures of monoolefinic C5 mononitriles having nonconjugated C?C and C?N bonds by hydrocyanation of a 1,3-butadiene-containing hydrocarbon mixture and for preparing a dinitrile by hydrocyanation of a mixture of monoolefinic C5 mononitriles having nonconjugated C?C and C?N bonds.

Abstract: A catalyst for selectively oxidizing carbon monoxide in reformed gas by oxygen gas is disclosed. The catalyst for selective oxidation of carbon monoxide comprises ruthenium and/or platinum carried by a porous carrier, this porous carrier contains ?-alumna, and purity of this alumna is not less than 99.95%. A particle diameter of the ruthenium and/or platinum is not larger than 200 ?. According to this catalyst for selective oxidation of carbon monoxide, it is possible to provide the catalyst, which reduces the carbon monoxide in the reformed gas by oxidizing it selectively, and possible to realize excellent efficiency of fuel utilization and favorable generation efficiency.

Abstract: The present invention provides a freshness-keeping agent for plants, such as a harvested plant, demonstrating an effect of keeping the freshness without selecting a type among various plants such as a harvested plant and also having a high safety. That is, the present invention provides a freshness-keeping agent for plants, such as a harvested plant, comprising a sugar derivative- or sugar alcohol derivative-based surfactant (A) and at least one selected from the group consisting of a sugar (B), a plant hormone (C), an aging inhibitor (D), an aggregating agent for colloidal particles (E) and a germicide, fungicide and preservative (F), preferably in a specific ratio by weight.

Abstract: The present invention relates to novel substituted pyrazolines of the formula (I) in which R1, R2, R3 and R4 are as defined in the disclosure, to a plurality of processes for preparing these substances and their use for controlling pests, and to novel intermediates and processes for their preparation.

Abstract: The invention is of oil-based drilling fluids including invert emulsion fluids that are able to maintain a relatively consistent rheological profile over a wide temperature range. The invention also includes new additives that enable the preparation of drilling fluids with viscosities that are less affected by temperature over a temperature range from less than about 40° F. to more than about 250° F. compared to conventional fluids. These additives are based on reaction products of polyamines and carboxylic acids with two or more carboxylic moieties combined with alkoxylated amines and fatty acid amides. In addition, this invention permits the use of reduced amounts of organoclay rheological additives in drilling fluids.

Abstract: The present invention relates to treatment operations in subterranean zones, and more particularly, to consolidation compositions and methods of using these consolidation compositions to mitigate water production from subterranean formations. The present invention provides methods for mitigating the production of water from a subterranean formation by injecting consolidation compositions comprising a furan-based resin into an interval in the subterranean formation.

Abstract: A method for increasing the foam stability of foams made with cationic, zwitterionic, and amphoteric viscoelastic surfactant fluid systems by adding an effective amount of an amphiphilic polymeric foam stabilizer containing at least one portion that is a partially hydrolyzed polyvinyl ester or partially hydrolyzed polyacrylate. The foam stabilizer allows foams to be used at temperatures at which the unfoamed fluids would not have stable viscosity, and allows use of lower viscoelastic surfactant concentrations in the liquid phase. Preferred surfactants are betaines and quaternary amines. The fluids are useful in oilfield treatments, for example fracturing and gravel packing.

Abstract: A composition useful for making gelled fluids by crosslinking hydratable polymers is an aqueous solution of zirconium complexed with carbonate and bicarbonate as the only multidentate ligands complexed with zirconium. The composition also provides pH modifying capability and the crosslinking is delayed, so that the single composition replaces several liquid additives previously necessary for generation of fluids used, for example, in hydraulic fracturing.

Abstract: A colored article suitable for cleansing skin having the general form of a fibrous bar is described. The article includes a solid or semi-solid lathering composition that at least partially incorporates a continuous fabricated polymeric network. The articles have a substantially red color defined by L*,a*,b* chromaticity values falling within a specific region of the CIE color space and exhibit a low tendency for discoloration in storage and use.

Abstract: Cleaning wipes containing antimicrobial quaternary ammonium compounds and alkylpolyglucosides, especially C8-C10 alkylpolyglucosides, have low filming and streaking when combined with C2-C4 alcohols and glycol ethers having a vapor pressure between 0.1 and 2.0 mm Hg at 20° C.

Abstract: The present invention relates to compositions comprising photosenitizer that can be used to provide lipophilic fluids with bleaching capabilities, lipophilic fluid cleaning compositions having bleaching capabilities and processes of making and using same. Such compositions provide the cleaning benefits of typical lipophilic solvents and additional cleaning benefits that include bleaching.

Abstract: An amphiphilic functional substance with lipophilicity, affinity for supercritical CO2, and if necessary hydrophilicity comprising an oligoolefin chain and a perfluoroalkyl group(s) at a single end thereof or at both ends thereof with or without the intervention of a poly(oxyalkylene) chain, which enables the utilization of supercritical CO2 as a reaction medium; a photopolymerizable functional substance comprising an oligoolefin chain and a reversible photopolymerization/dissociation group(s) at a single end thereof or at both ends thereof and a functional substance comprising a photo- and/or thermodissociable polymer obtained by photopolymerization of the aforementioned photopolymerizable functional substance, which can be utilized as recycle polymers; a hydrolyzable functional substance comprising a polymer obtained by chain-elongating plural oligoolefin chains through ester linkages, which can be utilized as a recycle polymer; and a functional substance capable of forming a microphase separation structure

Abstract: The invention relates to agents for the prevention of organ damage, in particular of the kidneys and the inner ear, induced by the administration of aminoglycosides. Agents according to the invention are all substances which are megalin and/or cubilin antagonists (inhibitors). In particular, these are molecules (compounds) having polybasic structures which bind to megalin and inhibit the binding of aminoglycosides and related substances.

Abstract: Methods and compositions are provided for protecting or enhancing excitable tissue function in mammals by systemic administration of an erythropoietin receptor activity modulator, such as erythropoietin, which signals via an EPO-activated receptor to modulate the function of excitable tissue. Excitable tissues include central neuronal tissues, such as the brain, peripheral neuronal tissues, retina, and heart tissue. Protection of excitable tissues provides treatment of hypoxia, seizure disorders, neurodegenerative diseases, hypoglycemia, and neurotoxin poisoning. Enhancement of function is useful in learning and memory. The invention is also directed to compositions and methods for facilitating the transport of molecules across endothelial cell tight junction barriers, such as the blood-brain barrier, by association of molecules with an erythropoietin receptor activity modulator, such as an erythropoietin.

Abstract: The application concerns a method of identifying compounds that can be used to inhibit undesired human CD4+ T cell immune responses by identifying compounds that block the interaction of CD4 and MHC, class II, gene products and a method of treatment which comprises administering such an identified compound. The compounds that inhibit undesired human CD4+ T cell immune responses can be used to treat disease such as multiple sclerosis and to prevent graft rejection and graft versus host disease. More specifically, the application concerns compounds having molecular weights between about 1400 and 400 that mimic three portions of the human CD4 lymphocyte cell surface antigen. The portions are residues 29-35, the C—C? loop of the D1 domain; residues 317-323, the C—C? loop of the D4 domain; and residues 346-353, the CDR3 or FG ridge of the D4 domain of the CD4 molecule. Specific examples of such compounds include cyclic peptides and peptidomimetic.

Abstract: The present invention provides both a method and means for regulating angiogenesis within living cells, tissues, and organs in-situ. The regulation is performed using native PR-39 peptide or one of its shorter-length homolog, for interaction with such proteasomes as one present in the cytoplasm of viable cells. The result of PR-39 peptide interaction with proteasomes is a decrease in the intracellular degradation of active peptides such as HIF-1? and a consequential stimulation of angiogenesis in-situ.

Abstract: Novel peptides are disclosed that may be used as inhibitors of amyloidogenesis, as suppressors of amyloid toxicity, and as therapeutic agents for amyloid-associated diseases such as Alzheimer's disease, Parkinson's Disease, Creutzfeldt-Jakob Disease, Huntington's Disease, and Type II Diabetes. These new ?-strand mimics (?-sheet “blockers”), containing C?,?-disubstituted amino acids, specifically interact with and block the development of the ?-sheet structure of the developing fibrils of amyloid diseases, such as Alzheimer's disease amyloid ?-peptide (A?). We have discovered that oligomerization of ?-sheet structures, including those implicated in amyloid-associated diseases, may be inhibited or even reversed by the presence of extended peptide structures that have only one edge available for hydrogen bonding. Without a second edge that is also available for hydrogen bonding, the extension of a developing ?-sheet is blocked by binding to the novel peptides.

Abstract: The present invention relates to pharmaceutical formulations comprising an anthracycline and the uses thereof for treatment of clinical conditions of body surfaces such as skin and mucosal membranes, wherein abnormal cell differentiation and/or hyperproliferation is a primary factor of the pathogenesis. In particular the invention relates to treatment of psoriasis, and preferably to treatment of psoriasis with valrubicin topically applied.

Abstract: The invention relates to hardly soluble antiphlogistic salts and antiphlogistic-antibiotic pharmaceutical preparations and their use. The hardly water soluble antiphlogistic antibiotics salts have as their cationic component one of the antibiotics gentamicin, clindamycin, neomycin, streptomycin, tetracycline, doxicyline, oxytetracycline and rolitetracycline and as their anionic component one of the antiphlogistics ibuprofen, naproxen, indomethacin, dexamethasone-21-phosphate, dexamethasone-21-sulfate, triamcinolone-21-phosphate and triamcinolone-21-sulfate. The antiphlogistic antibiotics salts are used in pharmaceutical preparations as controlled-release antibiotic/antibiotics drugs.

Abstract: Described are compositions and methods relating to gene therapy, particularly as applied to hematopoietic progenitor (HP) cells, to transduced cells and methods of obtaining them, and to methods of using them to provide prolonged engraftment of modified hematopoietic cells in human subjects. The invention particularly relates to ex vivo gene therapy of HP cells for treatment or prevention of HIV infection.

Abstract: H-2 class I negative, HLA-A2.1 transgeniic HHD mice were used for a comparative evaluation of the immunogenicity of HLA-A2.1 restricted human tumor-associated CTL epitopes. A hierarchy was established among these epitopic peptides injected into mice in IFA which correlates globally with their capacity to bind and stabilize HLA-A2.1 molecules. Co-injection of a helper peptide enhanced most CTL responses. In contrast, classical HLA class I transgenic mice which still express their own class I molecules did not, in most cases, develop H.A.-A2.1-restricted CTL responses under the same experimental conditions. Different monoepitopic immunization strategies of acceptable clinical usage were compared in HHD mice. Recombinant Ty-virus-like particles, or DNA encoding epitopes fused to the hepatitis B virus middle envelope protein gave the best results. Using this latter approach and a melanoma-based polyepitope construct, CTL responses against five distinct epitopes could be elicited simultaneously in a single animal.

Abstract: RNA interference using small interfering RNAs which are specific for the vascular endothelial growth factor (VEGF) gene and the VEGF receptor genes Flt-1 and Flk-1/KDR inhibit expression of these genes. Diseases which involved angiogenesis stimulated by overexpression of VEGF, such as diabetic retinopathy, age related macular degeneration and many types of cancer, can be treated by administering the small interfering RNAs.

Abstract: Compositions comprising inorganic phosphate and the nucleotides adenosine diphosphate and adenosine monophosphate; and their use for neutralizing effects of excess incident energy on the human body, particularly effects of ionizing radiation from nuclear or radiological energy sources, are disclosed and claimed.

Abstract: The present invention relates to a solution for peritoneal dialysis, consisting of at least two single solutions which are combined after a heat sterilization and are administered to a patient, the first single solution containing an osmotic and the second single solution containing a buffer, and one of these single solutions or another single solution containing electrolyte salts. The avoidance of a glucose-like degradation as well as hydrolysis during sterilization and storage while maintaining a neutral mixture pH is achieved according to the invention by the osmotic comprising a glucose polymer and/or glucose polymer derivative, and the pH of the first single solution being between 3.5 and 5.0. The present invention further relates to a twin-chambered pouch consisting of a plastic pouch with at least one first chamber and a second chamber, the first single solution being included in the first chamber and the second single solution being included in the second chamber.

Abstract: The present invention is directed to the use of N-acetyl-D-glucosamine to treat organ lesions caused by toxicants and drugs. The present invention is also directed to a method for treating organ lesions caused by toxicant comprising administering to a patient suffering from organ lesions a pharmaceutical composition comprising N-acetyl-D-glucosamine or a pharmaceutically acceptable salt thereof.

Abstract: Hydrophilic transportable N-linked glycosyl dopaminergic prodrug compounds according to FORMULA V and methods of their use, wherein, Ring 1 comprises an aryl or heteroaryl ring having 4 to 8 carbon atoms, among which atoms are counted “X” and “Y”; each of X and Y is optional; X, when present is either —C(R1)2— or —C(R1)2—; Y, when present, is either —CH2— or —CH2—CH2—; z, R5 and R5? are optional, and when present z, R5 and R5? together form a lower alkyl or a substituted lower alkyl moiety; N is part of either an amine or an amide linkage; E is a saccharide which forms a linkage with N through a single bond from a carbon or oxygen atom thereof; R1 and R4 are selected form the group consisting of hydrogen, hydroxyl, halogen, halo-lower alkyl, alkoxyl, alkoxyl-lower alkyl, halo-alkoxy, thioamido, amidosulfonyl, alkoxylcarbonyl, carboxamide, aminocarbonyl, and alkylamino-carbonyl; R2 and R3 are hydroxyl; R5 and R6, when present, are selected from the group consisting of hydrogen, hydroxyl, alkoxyl, carbon

Abstract: The present invention provides methods for the preparation of {2-[(8,9)-dioxo-2,6-diaza-bicyclo[5.2.0]-non-1(7)-en-2-yl]ethyl}phosphonic acid, and esters thereof.

Abstract: The present invention provides a compound of the following formula I: R3—NH—C(?X)—P(?O)OR1OR2 including pharmaceutically acceptable salts, solvates, hydrates and polymorphs of the compounds of formula I, as well as geometrical isomers and optically active forms of the compounds of formula I and pharmaceutically acceptable salts, solvates, hydrates and polymorphs of said isomers and forms, wherein R1 and R2 may be the same or different and are each selected from hydrogen, acyloxyalkyl and aryl or R1 and R2 may form together with the oxygen and phosphorus atoms a dioxaphosphacycloalkane ring; X is O or S; and R3 is selected, when X is O, from bicycloalkyl, cycloalkylalkyl and substituted cycloalkyl by at least one of alkyl, amino, amidino and guanidino; and R3 is selected, when X is S, from bicycloalkyl, cycloalkylalkyl and cycloalkyl optionally substituted by at least one of alkyl, amino, amidino and guanidino; with the proviso that: when X is O, R3 is not cyclohexylmethyl, and when X is S, R3 is not cycl

Abstract: Azacyclosteroid histamine-3 receptor ligands, pharmaceutical compositions comprising such compounds, and methods for using such compounds and compositions are described herein.

Abstract: The invention provides methods of downregulating mRNA encoding osteopontin comprising administering to a cell or mammal an amount of astrogorgiadiol effective to downregulate production of mRNA encoding osteopontin. The invention also provides methods of treating osteoporosis and autoimmune disease comprising administering to a patient in need of such treatment a therapeutically effective amount of astrogorgiadiol. Pharmaceutical compositions comprising astrogorgiadiol and a pharmaceutically acceptable carrier or diluent are also provided.

Abstract: The present invention relates to (pyrido/thieno)-[f]-oxazepine-5-one derivatives having the general Formula (I) or a pharmaceutically acceptable salt thereof. The invention also relates to pharmaceutical compositions comprising said derivatives, and to the use of these (pyrido/thieno)-[f]-oxazepine-5-one derivatives in the treatment of neurological diseases and psychiatric disorders which are responsive to enhancement of synaptic responses mediated by AMPA receptors in the central nervous system.

Abstract: Disclosed are (i) compounds of a steroid, a ?-agonist, an anticholinergic, a mast cell stabilizer and a phosphodiesterase (PDE) inhibitor directly or indirectly linked to a NO or NO2 group or a group which stimulates endogenous production of NO or EDRF in vivo; (ii) compositions of steroids, ?-agonists, anticholinergics, mast cell stabilizers and PDE inhibitors, which can optionally be substituted with at least one NO or NO2 moiety or a group which stimulates endogenous production of NO or EDRF in vivo, and a compound that donates, transfers or releases nitric oxide as a charged species, i.e., nitrosonium (NO+) or nitroxyl (NO?), or as the neutral species, nitric oxide (NO.) or that stimulates endogenous production of NO or EDRF in vivo; and (iii) uses for them in preventing and/or treating respiratory disorders.