Abstract: Provided are a semiconductor device and a method for fabricating the same. The semiconductor device can include a transistor structure, including a gate dielectric on a substrate, a gate electrode on the gate dielectric, a spacer at sidewalls of the gate electrode, and source/drain regions in the substrate; and an interlayer dielectric on the transistor structure where an air gap is provided in a region between the spacer, the interlayer dielectric, and the source/drain region of the substrate.

Abstract: Provided are a semiconductor device and a method for manufacturing the same. The semiconductor device may include a substrate having a plurality of isolation areas formed therein, the isolation areas defining an active region, a gate electrode formed on the active region, spacers formed on sides of the gate electrode, a source region formed in the substrate at a side of the spacer formed at a first side of the gate electrode, a drain region formed in the substrate at a side of the spacer formed on a second side of the gate electrode, and lightly doped drain regions formed in the substrate below the spacer.

Abstract: The present invention relates to a Field-Effect Transistor (FET) and, more particularly, to a Dielectric-Modulated Field-Effect Transistor (DMFET) and a method of fabricating the same. A DMFET according to an embodiment of the present invention comprises a substrate in which a source and a drain are formed, wherein the source and the drain are spaced apart from each other, a gate formed on a region between the source and the drain, of the substrate, wherein at least part of the gate is spaced apart from the substrate, biomolecules formed below a region spaced apart from the substrate, of the gate, and a linker for combining the gate and the biomolecules.

Abstract: A gate oxide and method of fabricating a gate oxide that produces a more reliable and thinner equivalent oxide thickness than conventional SiO2 gate oxides are provided. Gate oxides formed from alloys such as cobalt-titanium are thermodynamically stable such that the gate oxides formed will have minimal reactions with a silicon substrate or other structures during any later high temperature processing stages. The process shown is performed at lower temperatures than the prior art, which inhibits unwanted species migration and unwanted reactions with the silicon substrate or other structures. Using a thermal evaporation technique to deposit the layer to be oxidized, the underlying substrate surface smoothness is preserved, thus providing improved and more consistent electrical properties in the resulting gate oxide.

Abstract: An integrated circuit includes one or more transistors on or in a semiconductor substrate. At least one of the transistors includes a gate electrode and source and drain structures. The gate electrode has a fully silicided gate electrode layer with a ratio of Ni:Si ranging from about 2:1 to about 3:1. The source and drain structures are located in openings of the substrate and adjacent to the gate electrode. The source and drain structures are filled with SiGe to produce stress in the transistor channel region.

Abstract: A package of a MEMS microphone is suitable for being mounted on a printed circuit board. The package includes a substrate, at least one MEMS microphone, and a conductive sealing element. The MEMS microphone is arranged on the substrate, and electrically connected to a conductive layer on a bottom surface of the substrate. The conductive sealing element is arranged on the substrate and around the MEMS microphone for connecting the printed circuit board, and constructs an acoustic housing with the printed circuit board and the substrate. The acoustic housing has at least one acoustic hole passing through the substrate. The acoustic hole has a metal layer on the inner wall thereof for connecting the conductive layer on the bottom surface of the substrate to another conductive layer on the top surface of the substrate.

Abstract: The device (100) comprises a MEMS element (60) in a cavity (30) that is closed by a packaging portion (17) on a second side (2) of the substrate (10). Contact pads (25) are defined on a flexible resin layer (13) on an opposite first side (1) of the substrate. Electrical connections (32) extend through the resin layer (13) to at least one element of the device (100). The device (100) is suitably made with the use of a temporary carrier (42), and opening of etching holes (18) from the second side (2) of the substrate (10).

Abstract: A Film Bulk Acoustic (FBA) MEMS device in a wafer level package including a photostructurable glass material and methods of manufacture are described.

Abstract: A lower electrode is formed over a semiconductor substrate via an insulator film, first and second insulator films are formed to cover the lower electrode, an upper electrode is formed over the second insulator film, third to fifth insulator films are formed to cover the upper electrode and a void is formed between the first and second insulator films between the lower and upper electrodes. An ultrasonic transducer comprises the lower electrode, the first insulator film, the void, the second insulator film and the upper electrode. A portion of the first insulator film contacting with the lower electrode is made of silicon oxide, a portion of the second insulator film contacting with the upper electrode is made of silicon oxide and the first or second insulator film includes a silicon nitride film positioned between the upper and lower electrodes and not in contact with the upper and lower electrodes.

Abstract: A magnetic random access memory includes a transistor having a gate electrode formed above a surface of a substrate, and first and second impurity diffusion regions which sandwich a channel region below the gate electrode, a first plug formed on the first impurity diffusion region, a recording element formed on the first plug, including a plurality of stacked layers, and configured to hold information in accordance with an internal magnetization state, a first signal line formed on the recording element, a second plug formed on the second impurity diffusion region, an electrical conductor formed on the second plug, an area of a shape of the electrical conductor, which is projected onto the surface of the substrate, being larger than that of a shape of the recording element, which is projected onto the surface of the substrate, and a second signal line formed on the electrical conductor.

Abstract: A thermal deformation preventing layer is located between a recording photoconductive layer, which contains a-Se as a principal constituent, and a crystallization preventing layer, which is constituted of an a-Se layer containing at least one kind of element selected from the group consisting of As, Sb, and Bi. The thermal deformation preventing layer is constituted of an a-Se layer containing at least one kind of specific substance selected from the group consisting of a metal fluoride, a metal oxide, SiOx, and GeOx, where x represents a number satisfying 0.5?x?1.5.

Abstract: A pixel area for generating an image signal corresponding to incident light is formed on a semiconductor substrate. A light-shielding layer is formed on the semiconductor substrate around the pixel area. The light-shielding layer has a slit near the pixel area and shields the incident light. A passivation film is formed in the pixel area, on the light-shielding layer, and in the slit. A coating layer is formed in the slit of the light-shielding layer and on the passivation film in the pixel area. Microlenses are formed on the coating layer in the pixel area.

Abstract: An image sensor and a method for manufacturing the same are provided. The image sensor comprises a pixel region defined on a substrate, an interlayer dielectric on the substrate and comprising a trench above the pixel region, a color filter within the trench, and a microlens on the color filter.

Abstract: An image sensor and method for manufacturing the same are provided. The image sensor can include a semiconductor substrate, a metal interconnection layer, a light-receiving unit, a lens-type upper electrode, and a color filter. The semiconductor substrate can include a circuit region. The metal interconnection layer can include a metal interconnection and an interlayer dielectric. The light-receiving unit can be a photodiode disposed on the metal interconnection layer. The lens-type upper electrode can be disposed on the light-receiving unit and formed in a convex lens shape. The color filter can be disposed on the lens-type upper electrode.

Abstract: A semiconductor device includes a semiconductor substrate having a first electronic circuit and a second electronic circuit formed on an active surface, a pad electrode formed on the active surface by being connected to the first electronic circuit and/or the second electronic circuit, a first opening formed to some point along a depth of the semiconductor substrate toward the pad electrode from a surface opposite to the active surface of the semiconductor substrate, a second opening formed so as to reach the pad electrode from a bottom surface of the first opening, an insulating layer formed by covering sidewall surfaces of the first opening and the second opening, a conductive layer formed by covering at least an inner wall surface of the insulating layer and a bottom surface of the second opening, a third opening formed to some point along the depth of the semiconductor substrate from the surface opposite to the active surface of the semiconductor substrate, and a heat insulator imbedded in the third openi

Abstract: Provided are a semiconductor package, a method of fabricating the same, and a semiconductor package module for an image sensor The semiconductor package includes a mounting portion on which a semiconductor chip is mounted; a semiconductor chip including a plurality of bonding pads disposed along an edge thereof, wherein the semiconductor chip adhered onto the mounting portion; a plurality of leads spaced apart from a sidewall of the semiconductor chip and having a greater height than the semiconductor chip; an encapsulant for fixing the mounting portion and the leads and encapsulating a bottom surface and a sidewall of the semiconductor package and exposing top and bottom surfaces of the leads; bonding wires for connecting the bonding pads of the semiconductor chip with the exposed top surfaces of the leads; and a transparent plate adhered onto the leads a predetermined space apart from the semiconductor chip.

Abstract: A single-photon avalanche detector is disclosed that is operable at wavelengths greater than 1000 nm and at operating speeds greater than 10 MHz. The single-photon avalanche detector comprises a thin-film resistor and avalanche photodiode that are monolithically integrated such that little or no additional capacitance is associated with the addition of the resistor.

Abstract: Provided are an image sensor and a method for manufacturing the same. The image sensor includes a substrate, a first electrode, an intrinsic layer, a second conductive type conduction layer, and a second electrode. Circuitry including a lower interconnection is disposed on the substrate. The first electrode, the intrinsic layer, and the second conductive type conduction layer are sequentially stacked on the substrate. The second electrode is disposed on the second conductive type conduction layer and includes a non-explosive transparent electrode.

Abstract: The present invention relates to an integrated device, comprising a semiconductor device formed on a semiconductor substrate, a temperature sensing element formed within a semi-conductive layer formed on the semiconductor substrate, an electrically insulating layer formed over the semi-conductive layer, a metal layer formed over the insulation layer and forming an electrical contact of the semiconductor device, and a thermal contact extending from the metal layer through the electrically insulating layer to a first region of the semi-conductive layer, wherein the first region of the semi-conductive layer is electrically isolated from the temperature sensing element. The present invention also relates to a method of forming a temperature sensing element for integration with a semiconductor device.

Abstract: A method of manufacturing a semiconductor device having an active region and a termination region includes providing a semiconductor substrate having first and second main surfaces opposite to each other. The semiconductor substrate has an active region and a termination region surrounding the active region. The first main surface is oxidized. A first plurality of trenches and a first plurality of mesas are formed in the termination region. The first plurality of trenches in the termination region are filled with a dielectric material. A second plurality of trenches in the termination region. The second plurality of trenches are with the dielectric material.

Abstract: Methods of fabricating a semiconductor device having a self-aligned contact plug are provided. Methods include forming a lower insulating layer on a semiconductor substrate, forming a plurality of interconnection patterns parallel to each other on the lower insulating layer; forming an upper insulating layer that is configured to fill between the interconnection patterns, and forming a plurality of first mask patterns crossing the plurality of interconnection patterns, ones of the plurality of first mask patterns parallel to each other on the semiconductor substrate having the upper insulating layer.

Abstract: It is an object to achieve high performance of a semiconductor integrated circuit depending on not only a microfabrication technique but also another way and to achieve low power consumption of a semiconductor integrated circuit. A semiconductor device is provided in which a crystal orientation or a crystal axis of a single-crystalline semiconductor layer for a MISFET having a first conductivity type is different from that of a single-crystalline semiconductor layer for a MISFET having a second conductivity type. A crystal orientation or a crystal axis is such that mobility of carriers traveling in a channel length direction is increased in each MISFET. With such a structure, mobility of carriers flowing in a channel of a MISFET is increased, and a semiconductor integrated circuit can be operated at higher speed. Further, low voltage driving becomes possible, and low power consumption can be achieved.

Abstract: An integrated circuit structure includes a substrate; a through-silicon via (TSV) in the substrate, the TSV being tapered; a hard mask region extending from a top surface of the substrate into the substrate, wherein the hard mask encircles a top portion of the TSV; dielectric layers over the substrate; and a metal post extending from a top surface of the dielectric layers to the TSV, wherein the metal post comprises same materials as the TSV.

Abstract: The invention relates to a method for producing structures which make it possible to form a trench insulation and to bring into contact SOI wafers provided with active thick layers and which are easily processable. For this purpose, a carrier wafer electric contact and the insulation trench are provided with components exhibiting high-blocking capability of insertion into an integrated circuit SOI wafer. A narrow trench for an insulating trench (8) and a large trench for a carrier wafer contact (9) are etched up to an insulating oxide layer (2) and are buried by a masking layer which is thicker than the buried oxide layer (2). In the large trench (9), a polysilicon spacer (12) remains on the sidewalls, respectively, in the form of a predeposited polysilicon layer (11) rest. The adjustment of the polysilicon etching makes it possible to obtain the spacer (12) provided with a desired height.

Abstract: In a semiconductor device having element isolation made of a trench-type isolating oxide film 13, large and small dummy patterns 11 of two types, being an active region of a dummy, are located in an isolating region 10, the large dummy patterns 11b are arranged at a position apart from actual patterns 9, and the small dummy patterns 11a are regularly arranged in a gap at around a periphery of the actual patterns 9, whereby uniformity of an abrading rate is improved at a time of abrading an isolating oxide film 13a is improved, and surface flatness of the semiconductor device becomes preferable.

Abstract: A pedestal is formed out of the pad layer such that two edges of the pedestal coincide with a border of the wells as implanted. An extended pedestal is formed over the pedestal by depositing a conformal dielectric layer. The area of the extended pedestal is exposed the semiconductor surface below is recessed to a recess depth. Other trenches including at least one intra-well isolation trench are lithographically patterned. After a reactive ion etch, both an inter-well isolation trench and at least one intra-well isolation trench are formed. The width of the inter-well isolation trench may be reduced due to the deeper bottom surface compared to the prior art structures. The boundary between the p-well and the n-well below the inter-well isolation structure is self-aligned to the middle of the inter-well isolation structure.

Abstract: A fuse circuit is disclosed, which comprises at least one electrical fuse element having a resistance that changes after being stressed in an electromigration mode, a switching device serially coupled with the electrical fuse element in a predetermined path between a fuse programming power supply (VDDQ) and a low voltage power supply (GND) for selectively allowing a programming current passing through the electrical fuse element during a programming operation, and at least one peripheral circuit coupled to the VDDQ, wherein the peripheral circuit is active and draws current from the VDDQ during a fuse programming operation.

Abstract: An anti-fuse structure that included a buried electrically conductive, e.g., metallic layer as an anti-fuse material as well as a method of forming such an anti-fuse structure are provided. According to the present invention, the inventive anti-fuse structure comprises regions of leaky dielectric between interconnects. The resistance between these original interconnects starts decreasing when two adjacent interconnects are biased and causes a time-dependent dielectric breakdown, TDDB, phenomenon to occur. Decreasing of the resistance between adjacent interconnects can also be expedited via increasing the local temperature.

Abstract: A semiconductor device includes, in one semiconductor substrate: a plurality of switching elements connected between a terminal of an input voltage and an inductor; a driver circuit connected to a gate electrode of the switching element and driving the switching element; a reference voltage line connected to a source electrode of the switching element; a power supply line of the driver circuit; and a capacitor connected between the power supply line and the reference voltage line.

Abstract: Capacitor area is increased in the vertical direction by forming capacitors on topographic features on the chip. The features are formed during existing process steps. Adding vertical topography increases capacitance per unit area, reducing die size at no added development cost or mask steps.

Abstract: In a semiconductor device including a bipolar transistor, a base region has a two layer structure including a first base region, and a second base region which is provided around the first base region and has a lower impurity density than that of the first base region and has a shallower depth than that of the first base region.

Abstract: A method of manufacturing group III-nitride semiconductor crystal includes the steps of accommodating an alloy containing at least a group III-metal element and an alkali metal element in a reactor, introducing a nitrogen-containing substance in the reactor, dissolving the nitrogen-containing substance in an alloy melt in which the alloy has been melted, and growing group III-nitride semiconductor crystal is provided. The group III-nitride semiconductor crystal attaining a small absorption coefficient and an efficient method of manufacturing the same, as well as a group III-nitride semiconductor device attaining high light emission intensity can thus be provided.

Abstract: An integrated circuit structure includes a semiconductor chip comprising a plurality of dielectric layers, wherein the plurality of dielectric layers includes a top dielectric layer; and a first seal ring adjacent edges of the semiconductor chip. The integrated circuit structure further includes a first passivation layer over a top dielectric layer; and a trench extending from a top surface of the first passivation layer into the first passivation layer, wherein the trench substantially forms a ring. Each side of the ring is adjacent to a respective edge of the semiconductor chip. At least one of the plurality of vias has a width greater than about 70 percent of a width of a respective overlying metal line in the plurality of metal lines.

Abstract: A semiconductor IC includes grooves formed in a substrate to define a first dummy region and second dummy regions formed at a scribing area, and third dummy regions and a fourth dummy region formed at a product area. A width of the first dummy region is greater than widths of each of the second and third dummy regions and a width of the fourth dummy region is greater than widths of each of the third dummy regions. A conductor pattern is formed over the first dummy region for optical pattern recognition. The first dummy region is formed under the conductor pattern so the grooves are not formed under the conductor pattern. The second dummy regions are spaced from one another by a predetermined spacing at the scribing area, and the third dummy regions are spaced from one another by a predetermined spacing at the product area.

Abstract: A semiconductor device and a fabrication method thereof are disclosed. The method includes attaching a wafer with a plurality of chips on a carrier board having an insulating layer, a plurality of conductive circuits and a bottom board; forming a plurality of first grooves between solder pads of adjacent chips to expose the conductive circuits, and filling the first grooves with an insulating adhesive layer; forming second grooves in the insulating adhesive layer; and cutting among the chips to separate the chips from one another.

Abstract: The present invention relates to a process for producing an SiO2-containing insulating layer on chips and the use of specific precursors for this purpose. The invention further relates to an insulating layer obtainable in this way and also to chips which have been provided with such an insulating layer.

Abstract: An integrated circuit including a dielectric layer and a method for producing an integrated circuit. In one embodiment, a dielectric layer is deposited in a process atmosphere. The process atmosphere includes a first starting component at a first point in time, a second starting component at a second point in time and a third starting component at a third point in time. The third starting component includes a halogen.

Abstract: Disclosed herein is a semiconductor device including a gate insulating film formed over a semiconductor substrate, and a gate electrode formed over the gate insulating film, wherein the gate insulating film is so provided as to protrude from both sides of the gate electrode, and the gate electrode includes a wholly silicided layer.

Abstract: In accordance with the present teachings, semiconductor devices and methods of making semiconductor devices and dielectric stack in an integrated circuit are provided. The method of forming a dielectric stack in an integrated circuit can include providing a semiconductor structure including one or more copper interconnects and forming an etch stop layer over the semiconductor structure in a first processing chamber. The method can also include forming a thin silicon oxide layer over the etch stop layer in the first processing chamber and forming an ultra low-k dielectric layer over the thin silicon oxide layer in a second processing chamber, wherein forming the thin silicon oxide layer improves adhesion between the etch stop layer and the ultra low-k dielectric as compared to a dielectric stack that is devoid of the thin silicon oxide layer between the etch stop layer and the ultra low-k dielectric.

Abstract: An electromagnetic shielding device in an infrared receiver comprises of a wiring frame (4) of metal and an electromagnetic shielding cover (1) of metal. There is a window (2) in the electromagnetic shielding cover (1), in which there is provided a shielding net (3). The electromagnetic shielding cover (1) has a protruding tongue (6) in the bottom of its both sides respectively and the protruding tongues (6) are bent downwards and entad to engage on the wiring frame (4), thus forming an electromagnetic shielding structure transparent to a chip inside. The electromagnetic shielding device of the present invention is simple in structure, reasonable in design, easy to manufacture, low-cost, high qualified ratio and thus suitable for mass productivity. The electromagnetic shielding device improves the electromagnetic interference preventive capability of a semiconductor element and thus increases the sensibility and reliability of an infrared receiver.

Abstract: A device is disclosed which includes a first packaged integrated circuit device, a second packaged integrated circuit device positioned above the first packaged integrated circuit device and a plurality of planar conductive members conductively coupling the first and second packaged integrated circuit devices to one another. A method is also disclosed which includes conductively coupling a plurality of extensions on a leadframe to each of a pair of stacked packaged integrated circuit devices and cutting the leadframe to singulate the extensions from one another.

Abstract: A leadframe (40) for a semiconductor device has a radially extending leads (42) having inner lead portions (44) and outer lead portions (46), and a dam bar (48) that mechanically connects the leads (42) together near the outer lead portions (46). The inner lead portions (44) define an open area having a central region and the dam bar (48) defines a leadframe outer perimeter. A generally X-shaped die support member has arms (50) that extend from the leadframe outer perimeter and meet at the central region. A heat sink includes sections (64) that are formed between adjacent pairs of the die support member arms (50). The heat sink sections (64) are connected to the die support member arms (50) with down set tie bars (66) such that the heat sink lays in a plane below a plane of the die support member arms (50).

Abstract: A semiconductor package is disclosed that comprises a chip paddle and a semiconductor chip that has a plurality of bond pads. The semiconductor chip is located on an upper surface of the chip paddle. Leads are formed at intervals along the perimeter of the chip paddle. The leads are in electrical communication with the bond pads. The semiconductor chip, the chip paddle and the leads are encapsulated by an encapsulation material. The height of the semiconductor package of the invention is minimized by half etching the chip paddle to reduce the thickness of the chip paddle such that the thickness of the chip paddle is less than the thickness of the leads. Preferably, the chip paddle of the present invention is about 25-75% of the thickness of the leads.

Abstract: A lead frame (10) for a quad flat non-leaded semiconductor package (606), includes a tie bar (12), a first group of leads (22) extending a first length from the tie bar (12) in a transverse direction (Y), and a second group of leads (24) extending a second length from the tie bar (12) in the transverse direction (Y). The second length is greater than the first length, and leads from the first and second group of leads (22, 24) alternate in a longitudinal direction (X) along the tie bar (12) so that the first and second groups of leads are staggered. The second group of leads (24) is displaced from the first group of leads (22) in a Z-direction (Z) perpendicular to both the transverse (Y) and longitudinal (X) directions. The leads of the first and second groups of leads (22, 24) each have a respective contact terminal (26 and 28) at their distal ends. The contact terminals (26 and 28) each have a contact face (40 and 42) in a contact plane (44).

Abstract: A chip-stacked package structure comprises a lead frame, a first chip, and a second chip. The led frame is composed of a plurality of inner leads and a plurality of outer leads. The plurality of inner leads comprises a plurality of first inner leads in parallel and a plurality of second inner leads in parallel, wherein the ends of first inner leads and the ends of second inner leads are arranged in rows facing each other at a distance. The active surface of first chip is fixedly connected to the lower surface of first inner leads and second inner leads via a first adhesive layer. A plurality of metal pads is provided near the central area of the active surface of first chip and is exposed. A second adhesive layer is formed on the back surface of second chip for fixedly connecting the back surface of second chip and the upper surface of first inner leads and second inner leads.

Abstract: The present invention proposes a multi-chip semiconductor device having leads and a method for fabricating the same. The method includes the steps of: providing a substrate having a plurality of connection pads disposed on a surface thereof; mounting a plurality of semiconductor chips on the surface of the substrate, and electrically connecting the semiconductor chips to the surface of the substrate; forming an encapsulant on the substrate to encapsulate the semiconductor chips and expose the connection pads to form a package unit; and providing a lead frame having a plurality of leads, and electrically connecting the connection pads exposed from the package unit to the leads of the lead frame to form a multi-chip semiconductor device having leads, thereby forming a multi-chip semiconductor device having leads.

Abstract: A portion of a frame body is fixed on a surface of a heat-radiating plate, and on frame body, a semiconductor chip is die-bonded. Next, a prescribed electrode of semiconductor chip and corresponding lead terminal and the like are electrically connected by a prescribed wire. Next, the lead frame is set in a metal mold such that the semiconductor chip is covered with resin from above the semiconductor chip. Thermoplastic resin is introduced into the metal mold, and semiconductor chip and the like are sealed. By taking out the resulting body from the metal mold, a semiconductor is formed. Thus, a semiconductor device can be provided with reduced manufacturing cost.

Abstract: A package structure and a manufacturing method thereof are provided. The package structure includes a leadframe, a die, a solder layer and several connecting components. The leadframe includes a heat dissipation pad and several leads. The heat dissipation pad is disposed in a substantial center of the leadframe. The leads are surrounding the heat dissipation pad. The die having an active surface is disposed on the leadframe. The solder layer is disposed between the active surface and the heat dissipation pad. The connecting components are disposed between the active surface and the leads. The die is electrically connected to the leadframe through the solder layer and the connecting components.

Abstract: Vias 7 penetrating a circuit substrate 2 or a seal ring 8 are provided on a part or the entire outer periphery of a molding semiconductor device 1 or in the cut region of the circuit substrate 2, so that adhesion between a substrate and a core 2C in the circuit substrate 2 is improved. Therefore, it is possible to suppress the exfoliation of the circuit substrate 2, improving the yields.

Abstract: A system-in-package type semiconductor device includes a plurality of semiconductor chips, a first semiconductor chip 1110 to which electric power is supplied from first power supply wiring 1111, and first ground wiring 1112 to which the first circuit unit is coupled. Moreover, the system-in-package type semiconductor device includes a second semiconductor chip 1120 to which electric power is supplied from second power supply wiring 1124, and second ground wiring 1125 coupled to the second circuit unit. The first semiconductor chip includes a first interface circuit unit 1412, and the second circuit unit includes a second interface circuit unit 1121 configured to perform inputting or outputting of a signal to and from the first interface circuit unit. The first ground wiring 1414 is coupled to the second ground wiring 1424 through a protection circuit 1442, and the second interface circuit unit is placed in the vicinity of the first interface circuit unit.