Abstract: The present invention relates to a composite sheet for resin film formation composed of a pressure-sensitive adhesive sheet having a pressure-sensitive adhesive layer on a base and a heat curable film for resin film formation provided on the pressure-sensitive adhesive layer. The film for resin film formation includes a binder component having a reactive double bond group. The pressure-sensitive adhesive layer includes a non-energy ray curable pressure-sensitive adhesive composition or a cured product of an energy ray curable pressure-sensitive adhesive composition.

Abstract: An electronic component comprises: a resin frame; a semiconductor substrate housed in the resin frame; a plate shape metal member having at least one end fixed in the resin frame at a position spaced apart from the semiconductor substrate; an electrical connection region portion formed on the surface on the side of the plate shape metal member of the semiconductor substrate with an electrically conductive material; and a solder layer formed on the surface on the side of the plate shape metal member of the electrical connection region portion, wherein the plate shape metal member supports the semiconductor substrate without contact through the solder layer and the electrical connection region portion, and is electrically connected to the electrical connection region portion.

Abstract: The present disclosure provides a display device and a method for assembling the same. The display device includes an electronic device and a flexible printed circuit board. The electronic device includes a lead region and a port located at the lead region, the flexible printed circuit board includes a first portion and a second portion. The first portion is a connector; the second portion includes connecting fingers through which the flexible printed circuit board is connected to the port through the connecting finger. The second portion of the flexible printed circuit board is arranged at a predetermined region, the predetermined region comprises the lead region and an extension region which is arranged outside the lead region and in a same plane where the lead region is located.

Abstract: A semiconductor wafer and a plurality of semiconductor dies are provided. The wafer and the dies each include first electrically conductive terminals arranged on a main surface. The wafer is permanently attached to each of the semiconductor dies such that the first terminals are electrically connected to one another. At least one of the wafer and the semiconductor dies is thinned. The wafer is diced so as to form a plurality of chip-stacks, each of the chip-stacks comprising one of the semiconductor dies permanently attached to a diced wafer chip. At least one of the first terminals in the chip-stack is accessible by a second electrically conductive terminal arranged on a rear surface and electrically connected to the first terminal by an electrical connector that is internal to a semiconductor body of either the semiconductor die or the diced wafer chip of the chip-stack.

Abstract: A semiconductor package may include a first semiconductor chip, second semiconductor chips disposed to respectively overlap with portions of the first semiconductor chip, a interposer disposed to overlap with a portion of the first semiconductor chip, and a package substrate disposed on backside surfaces of the second semiconductor chips opposite to the first semiconductor chip. The interposer may be disposed between the first semiconductor chip and the package substrate. First conductive coupling members connect the first semiconductor chip to the second semiconductor chips. Second conductive coupling members connect the first semiconductor chip to the interposer. Third conductive coupling members connect the interposer to the package substrate.

Abstract: A semiconductor device may include a first semiconductor die. A passivation layer supports the first semiconductor die. The passivation layer may include a first via having a barrier layer and a first redistribution layer (RDL) conductive interconnect coupled to the first via through the barrier layer. The first via may couple the first semiconductor die to the first RDL conductive interconnect.

Abstract: To improve reliability of signal transmission of an interposer which couples between semiconductor chips. A reference potential wiring and a reference potential wiring are provided on both neighboring sides of a signal wiring provided in a first wiring layer of an interposer. Also, a reference potential wiring and a reference potential wiring are provided on both neighboring sides of a signal wiring provided in a second wiring layer of the interposer. Further, the signal wiring and the signal wiring cross each other in plan view. The reference potential wirings of the first wiring layer, and the reference potential wirings of the second wiring layer are coupled to each other at the periphery of their crossing portion.

Abstract: A system for interconnecting at least two die each die having a plurality of conducting layers and dielectric layers disposed upon a substrate which may include active and passive elements. In one embodiment there is at least one interconnect coupling at least one conducting layer on a side of one die to at least one conducting layer on a side of the other die. Another interconnect embodiment is a slug having conducting and dielectric layers disposed between two or more die to interconnect between the die. Other interconnect techniques include direct coupling such as rod, ball, dual balls, bar, cylinder, bump, slug, and carbon nanotube, as well as indirect coupling such as inductive coupling, capacitive coupling, and wireless communications. The die may have features to facilitate placement of the interconnects such as dogleg cuts, grooves, notches, enlarged contact pads, tapered side edges and stepped vias.

Abstract: Semiconductor device packages in accordance with this disclosure may include a substrate and a stack of semiconductor dice attached to the substrate. The stack of semiconductor dice may include vias extending through each semiconductor die of the stack for electrically interconnecting the semiconductor dice in the stack to one another and to the substrate. Another semiconductor die may be electrically connected to the stack of semiconductor dice and may be located on a side of the stack of semiconductor dice opposing the substrate. The other semiconductor die may be a heat-generating component configured to generate more heat than each semiconductor die of the stack of semiconductor dice. Electrical connectors may be located laterally adjacent to the vias and may form electrical connections between the substrate and the other semiconductor die in isolation from integrated circuitry of the semiconductor dice in the stack.

Abstract: A semiconductor device is provided including a package substrate, and a plurality of semiconductor chips stacked above the package substrate, at least one of the plurality of semiconductor chips including a step part in a periphery edge part of a rear surface,

Abstract: A package structure of a power converter, can include: a die pad; an insulation adhesive layer and a conductive adhesive layer on the die pad; a control circuit die on the insulation adhesive layer, where the insulation adhesive layer comprises a first insulation adhesive layer on a back surface of the control circuit die, and a second insulation adhesive on a surface of the die pad, where the first insulation adhesive layer is connected to the second insulation adhesive layer; and a power device die on the conductive adhesive layer, where the insulation adhesive layer is separated from the conductive adhesive layer.

Abstract: Stacked die assemblies are electrically connected to connection sites on any support, without electrical connection to any interposed substrate or leadframe, and without solder.

Abstract: A semiconductor device includes a semiconductor die. An encapsulant is deposited over the semiconductor die. An insulating layer is formed over the encapsulant and a first surface of the semiconductor die. A semiconductor component is disposed over the insulating layer and first surface of the semiconductor die. A first interconnect structure is formed over the encapsulant and first surface of the semiconductor die to embed the semiconductor component. A conductive via is formed in the semiconductor die. A heat sink is formed over the semiconductor die. A second interconnect structure is formed over a second surface of the semiconductor die opposite the first surface. A conductive layer is formed over the semiconductor component. An opening is formed in the insulating layer.

Abstract: A package, comprising a substrate having electrical devices disposed at a first side of the substrate, vias extending from the first side of the substrate to a second side of the substrate opposite the first side and metallization layers disposed on the first side of the substrate. Contact pads are disposed over the first metallization layers and a protection layer is disposed over the contact pads. Post-passivation interconnects are disposed over the protection layer and extend to the contact pads through openings in the protection layer. Connectors are disposed on the PPIs and a molding compound extends over the PPIs and around the connectors.

Abstract: A semiconductor package includes a substrate comprising a chip area and a peripheral area, at least one semiconductor chip mounted on the chip area, a plurality of stubs respectively on a plurality of pads arranged in the peripheral area, and a molding unit configured to cover at least a partial area of the at least one semiconductor chip and at least a partial area of the plurality of stubs on the substrate while exposing an upper surface of at least one of the plurality of stubs to outside of the molding unit, wherein at least a partial area of the upper surface of at least one of the plurality of stubs is substantially flat.

Abstract: A chip package includes a first die encapsulated by a molding compound; a board comprising a chip mounting surface; a redistributed layer (RDL) structure on an active surface of the first die and between the die and the chip mounting surface; and a discrete passive device embedded in the molding compound and situated in close proximity to a side edge of the first die.

Abstract: An offset interposer includes a land side including land-side ball-grid array (BGA) and a package-on-package (POP) side including a POP-side BGA. The land-side BGA includes two adjacent, spaced-apart land-side pads, and the POP-side BGA includes two adjacent, spaced-apart POP-side pads that are coupled to the respective two land-side BGA pads through the offset interposer. The land-side BGA is configured to interface with a first-level interconnect. The POP-side BGA is configured to interface with a POP substrate. Each of the two land-side pads has a different footprint than the respective two POP-side pads.

Abstract: A semiconductor package includes a processor die (e.g., an SoC) and one or more memory die (e.g., DRAM) coupled to a ball grid array (BGA) substrate. The processor die and the memory die are coupled to opposite sides of the BGA substrate using terminals (e.g., solder balls). The package may be coupled to a printed circuit board (PCB) using one or more terminals positioned around the perimeter of the processor die. The PCB may include a recess with at least part of the processor die being positioned in the recess. Positioning at least part of the processor die in the recess reduces the overall height of the semiconductor package assembly. A voltage regulator may also be coupled to the BGA substrate on the same side as the processor die with at least part of the voltage regulator being positioned in the recess a few millimeters from the processor die.

Abstract: According to one embodiment, a composite resin includes a resin component; a plurality of first powder bodies dispersed in the resin component, and having a nonlinear current-voltage characteristic having a decreasing resistance as a voltage increases; and a plurality of second powder bodies dispersed in the resin component, and having electrical conductivity. The plurality of first powder bodies is a polycrystalline powder body including a plurality of primary particles bound via a grain boundary, a component different from a main component of the plurality of primary particles being present. A work function of the plurality of second powder bodies is not more than a work function of the plurality of primary particles.

Abstract: Disclosed herein is a light emitting diode chip having ESD protection. An exemplary embodiment provides a flip-chip type light emitting diode chip, which includes a light emitting diode part aligned on a substrate, and a reverse-parallel diode part disposed on the substrate and connected to the light emitting diode part. Within the flip-chip type light emitting diode chip, the light emitting diode part is placed together with reverse-parallel diode part, thereby providing a light emitting diode chip exhibiting strong resistance to electrostatic discharge.

Abstract: A radiation-emitting semiconductor chip having a semiconductor body including a semi-conductor layer sequence having an active region that generates radiation, a first semiconductor layer of a first conductor, and a second semiconductor layer of a second conductor different from the first conductor, and having a carrier on which the semiconductor body is arranged, wherein a pn junction is formed in the carrier, the carrier has a first contact and a second contact on a rear side facing away from the semiconductor body, and the active area and the pn junction connect to one another in antiparallel in relation to the forward-bias direction by the first contact and the second contact.

Abstract: A semiconductor device for protection from electrostatic discharge includes a number of modules for protection from electrostatic discharge. Each module includes a thyristor having terminals and a gate, and a diode coupled in antiparallel to the terminals of the thyristor. Each module is sized to share a saturation current with neighboring modules when an electrostatic discharge current is received. A resistive network couples modules between two terminals. A triggering circuit includes a common triggering output that is coupled to the gate of the thyristor of each module and a common buried semiconductor layer contacts each module.

Abstract: A semiconductor device according to an embodiment includes a normally-off transistor having a first drain, a first source electrically connected to a source terminal, and a first gate electrically connected to a gate terminal, a normally-on transistor having a second source electrically connected to the first drain, a second drain electrically connected to a voltage terminal, and a second gate electrically connected to the first source, a coil component provided between the voltage terminal and the second drain, and a first diode having a first anode electrically connected to the first drain and the second source, and a first cathode electrically connected to the coil component and the voltage terminal.

Abstract: A semiconductor device according to an embodiment includes a normally-off transistor having a first drain, a first source electrically connected to a source terminal, and a first gate electrically connected to a gate terminal, a normally-on transistor having a second gate, a second source electrically connected to the first drain, and a second drain electrically connected to a voltage terminal, a first capacitor provided between the gate terminal and the second gate, a first diode having a first anode electrically connected to the first capacitor and the second gate, and a first cathode electrically connected to the first source, a coil component provided between the voltage terminal and the second drain, and a second diode having a second anode electrically connected to the first drain and the second source, and a second cathode electrically connected to the coil component and the voltage terminal.

Abstract: According to one embodiment, a semiconductor device includes a first region having an insulated gate bipolar transistor and a second region having a diode. The first region and the second region are formed in a same chip. A breakdown voltage of the second region is lower than a breakdown voltage of the first region.

Abstract: A semiconductor device is provided comprising a substrate, two or more semiconductor fins, and one or more gates. A flowable oxide layer is deposited on the semiconductor device. An area between the two or more semiconductor fins is etched such that the substrate is exposed. An insulating layer is deposited within the etched area. At least the flowable oxide layer is removed.

Abstract: It is therefore an object of the present invention to provide a method in which, in a semiconductor integrated circuit device, a plurality of transistors having wide-rangingly different Ioff levels are embedded together in a semiconductor device including transistors each using a non-doped channel. By controlling an effective channel length, a leakage current is controlled without changing an impurity concentration distribution in a transistor including a non-doped channel layer and a screen layer provided immediately under the non-doped channel layer.

Abstract: A fin field device structure and method for forming the same are provided. The FinFET device structure includes a substrate and a fin structure extending from the substrate. The FinFET device structure also includes an anti-punch through implant (APT) region formed in the fin structure and a barrier layer formed on the APT region. The barrier layer has a middle portion and a peripheral portion, and the middle portion is higher than the peripheral portion. The FinFET device structure further includes an epitaxial layer formed on the barrier layer.

Abstract: A method for fabricating semiconductor device is disclosed. The method includes the steps of: providing a substrate having at least one fin-shaped structure thereon, wherein the fin-shaped structure comprises a top portion and a bottom portion; removing part of the bottom portion of the fin-shaped structure; forming an epitaxial layer on the substrate to surround the bottom portion of the fin-shaped structure; transforming the bottom portion of the fin-shaped structure into the epitaxial layer; and removing part of the epitaxial layer.

Abstract: The semiconductor device of the present invention comprises first and second transistors and first and second capacitors. One of source and drain electrodes of the first transistor is electrically connected to a first wiring, the other is electrically connected to a second wiring, and a gate electrode of the first transistor is electrically connected to one of a source electrode and a drain electrode of the second transistor and one of electrodes of the first capacitor. The other of the source and drain electrodes of the second transistor is electrically connected to the first wiring, and a gate electrode of the second transistor is electrically connected to one of electrodes of a second capacitor and a fifth wiring. The other electrode of the first capacitor is electrically connected to a third wiring, and the other electrode of the second capacitor is eclectically connected to a fourth wiring.

Abstract: A semiconductor device includes a stacked structure having first conductive layers stacked stepwise and first insulating layers interposed between the first conductive layers, wherein undercuts are formed under the first conductive layers and each of the first conductive layers includes a first region covered by the first conductive layer and a second region extending from the first region, contact pads coupled to the second regions of the respective first conductive layers, and a liner layer formed on the contact pads and filling the undercuts.

Abstract: The reliability of a semiconductor device having a nonvolatile memory is improved. The memory cell of the nonvolatile memory is of a split gate type, and has first and second n type semiconductor regions in a semiconductor substrate, a control electrode formed over the substrate between the semiconductor regions via a first insulation film, and a memory gate electrode formed over the substrate between the semiconductor regions via a second insulation film having a charge accumulation part. The SSI method is used for write to the memory cell. During the read operation of the memory cell, the first and second semiconductor regions function as source and drain regions, respectively. The first width of the first sidewall spacer formed adjacent to the side surface of the memory gate electrode is larger than the second width of the second sidewall spacer formed adjacent to the side surface of the control gate electrode.

Abstract: According to one embodiment, a semiconductor memory device includes: a semiconductor substrate; a first semiconductor pillar above the semiconductor substrate; a first insulating layer comprising a first section and a second section, the first section being in contact with the semiconductor substrate and a bottom of the first semiconductor pillar, and the second section covering a side of the first semiconductor pillar; conductive layers and second insulating layers stacked one by one above the semiconductor substrate and covering the second section of the first insulating layer; a first plug on the first semiconductor pillar; and an interconnect on the first plug.

Abstract: A method of forming a memory device by forming spaced apart first and second regions with a channel region therebetween, forming a floating gate over and insulated from a first portion of the channel region, forming a control gate over and insulated from the floating gate, forming an erase gate over and insulated from the first region, and forming a select gate over and insulated from a second portion of the channel region. Forming of the floating gate includes forming a first insulation layer on the substrate, forming a first conductive layer on the first insulation layer, and performing two separate etches to form first and second trenches through the first conductive layer. A sidewall of the first conductive layer at the first trench has a negative slope and a sidewall of the first conductive layer at the second trench is vertical.

Abstract: A memory device is provided. The memory device includes a substrate, a plurality of semiconductor strip structures, a first doped region, a plurality of second doped regions, a plurality of first contacts, and a plurality of second contacts. Each of the semiconductor strip structures extends along a first direction. The first doped region includes a plurality of first portions and a second portion. Each of the first portions is located on a lower part of the corresponding semiconductor strip structure. The second portion is located on a surface of the substrate, and the first portions are connected to the second portion. Each of the second doped regions is located on an upper part of the corresponding semiconductor strip structure. Each of the first contacts is electrically connected to the second portion of the first doped region. Each of the second contacts is electrically connected to the corresponding second doped region.

Abstract: A dielectric layer is formed over the substrate in the capacitor region and the memory region and a select gate layer is formed over the dielectric layer. A select gate is formed over the memory region and a plurality of lines of electrodes over the capacitor region from the select gate layer. A charge storage layer is formed over the capacitor region and the memory region including over the select gate and the plurality of lines. A control gate layer is formed over the charge storage layer over the capacitor region and over the memory region. The control gate layer is patterned to form a control gate of a memory cell over the memory region and a first electrode of a capacitor over the capacitor region. The plurality of lines are connected to the capacitor region to form a second electrode of the capacitor.

Abstract: Semiconductor devices and methods of manufacturing thereof are described. According to an example embodiment, a semiconductor device comprises: a substrate comprising a core region and a peripheral region, where the core region is adjacent to the peripheral region; a memory array comprising non-volatile memory cells that are located in the core region of the substrate; a high-voltage control logic comprising high-voltage transistors that are located in the peripheral region of the substrate; and a low-voltage control logic comprising low-voltage transistors that are located in the peripheral region of the substrate.

Abstract: A thin film transistor array panel includes: a gate line on a substrate and including a gate electrode; a first gate insulating layer on the substrate and the gate line, the first gate insulting layer including a first portion adjacent to the gate line and a second portion overlapping the gate line and having a smaller thickness than that of the first portion; a second gate insulating layer on the first gate insulating layer; a semiconductor layer on the second gate insulating layer; a source electrode and a drain electrode spaced apart from each other on the semiconductor layer; a passivation layer on the second gate insulating layer, the source electrode and the drain electrode; and a pixel electrode on the passivation layer and connected with the drain electrode. The first gate insulating layer and the second gate insulating layer have stress in opposite directions from each other.

Abstract: A pixel structure including a plurality of sub-pixels arranged in array is provided. Each of the sub-pixels includes an active device and a pixel electrode electrically connected to the active device respectively. Each of the pixel electrodes includes a plurality of stripe patterns respectively, and spacings of at least one portion of the stripe patterns of at least one of the sub-pixels are larger than spacings of the stripe patterns of the other sub-pixels.

Abstract: A display device includes: a gate electrode, a gate line, and data lines on a substrate, the data lines in a same layer as the gate line; a gate insulating layer on the gate line; a semiconductor member on the gate insulating layer; an etch stopper layer on the semiconductor member and the gate insulating layer; a first passivation layer on the etch stopper layer; a source electrode on the first passivation layer and the etch stopper layer and connected to the data lines; a drain electrode on the etch stopper layer; a common electrode on the first passivation layer and separated from the source electrode and the drain electrode; a second passivation layer on the source electrode, the drain electrode and the common electrode; and a pixel electrode on the second passivation layer and connected to the drain electrode.

Abstract: A display device includes: a first wiring line and a second wiring line separated from each other on a substrate; a gate insulating layer on the first wiring line and the second wiring line; a step difference compensation pattern between the first wiring line and the second wiring line on the gate insulating layer; a protective layer on the step difference compensation pattern; and a pixel electrode on the protective layer.

Abstract: Provided is a method to manufacture a liquid crystal display device in which a contact hole for the electrical connection of the pixel electrode and one of the source and drain electrode of a transistor and a contact hole for the processing of a semiconductor layer are formed simultaneously. The method contributes to the reduction of a photography step. The transistor includes an oxide semiconductor layer where a channel formation region is formed.

Abstract: A display device includes a driver circuit including a logic circuit including a first transistor which is a depletion type transistor and a second transistor which is an enhancement type transistor; a signal line which is electrically connected to the driver circuit; a pixel portion including a pixel whose display state is controlled by input of a signal including image data from the driver circuit through the signal line; a reference voltage line to which reference voltage is applied; and a third transistor which is a depletion type transistor and controls electrical connection between the signal line and the reference voltage line. The first to the third transistors each include an oxide semiconductor layer including a channel formation region.

Abstract: A pixel portion and a driver circuit driving the pixel portion are formed over the same substrate. At least a part of the driver circuit is formed using an inverted staggered thin film transistor in which an oxide semiconductor layer is used and a channel protective layer is provided over the oxide semiconductor layer serving as a channel formation region which is overlapped with the gate electrode. The driver circuit as well as the pixel portion is provided over the same substrate to reduce manufacturing costs.

Abstract: A liquid crystal display includes a first substrate, a gate line which includes a gate electrode, a gate insulating layer, a semiconductor stripe layer which is separated from the gate line in a plan view, a semiconductor island, a data line, a source electrode and a drain electrode, an interlayer insulating layer in which a data line exposure hole which exposes a part of the data line is defined, a connecting member which is disposed on the interlayer insulating layer and is connected to the data lines which are disposed on and below the gate line through the data line exposure hole in plan view; and a pixel electrode which is disposed on the interlayer insulating layer and is separated from the connecting member, where the connecting member is directly connected to the source electrode and the pixel electrode is directly connected to the drain electrode.

Abstract: This invention aims at reducing the probability of short-circuiting between terminals in a display device in which an IC driver is connected by COG. Terminals for connection with the IC driver are formed in a terminal region of a TFT substrate (100). The terminals are each comprised of a terminal metal (60), a first through-bole formed in a first insulation film (107), a second through-hole formed in a second insulation film (109), a first ITO (20) formed in the first through-hole and being in contact with the terminal metal (60), and a second ITO (30) formed over the first ITO (20). The second ITO (30) is formed within an area where the second ITO is in contact with the first ITO but is not formed outside the second through-hole. This ensures that the distance between the ITOs of the adjacent terminals can be enlarged, whereby the probability of short-circuiting between the terminals can be lowered.

Abstract: A method of manufacturing a display device is disclosed. In one aspect, the method includes forming an active layer over a substrate, forming a first insulating layer over the active layer, forming a gate electrode over the active layer, and forming an alignment mark over the substrate. The forming of the alignment mark includes forming a first layer including a first pattern and forming a second layer over the first layer and including concave and convex portions formed along the first pattern. The first insulating layer is interposed between the first and second layers.

Abstract: The embodiments of the present invention provide a thin film transistor driving backplane and a manufacturing method thereof, and a display panel. The manufacturing method may comprise: manufacturing a backplane base disposed with a plurality of active device structures; disposing an electrode layer on the backplane base; and manufacturing the electrode layer into a source electrode, a drain electrode and a pixel electrode integrally disposed with the drain electrode by one patterning process.

Abstract: Object is to prevent deterioration in pixel characteristics due to dark-time white spot defects in a pixel. Generation of these dark-time white spot defects is attributable to diffusion of electrons and Fe (iron) from the vicinity of an interface between a semiconductor substrate and an element isolation region obtained by filling a trench formed in the upper surface of the semiconductor substrate with an insulating film. A semiconductor layer is formed by forming, in the upper surface of a semiconductor substrate, a trench for filling it with an element isolation region surrounding a photodiode formation region; and carrying out plasma doping to introduce B (boron) into the side wall and bottom surface of the trench.

Abstract: BSI image sensors and methods. In an embodiment, a substrate is provided having a sensor array and a periphery region and having a front side and a back side surface; a bottom anti-reflective coating (BARC) is formed over the back side to a first thickness, over the sensor array region and the periphery region; forming a first dielectric layer over the BARC; a metal shield is formed; selectively removing the metal shield from over the sensor array region; selectively removing the first dielectric layer from over the sensor array region, wherein a portion of the first thickness of the BARC is also removed and a remainder of the first thickness of the BARC remains during the process of selectively removing the first dielectric layer; forming a second dielectric layer over the remainder of the BARC and over the metal shield; and forming a passivation layer over the second dielectric layer.