Abstract: The invention relates to an electrochemical device (100) having electrically controllable optical and/or energy transmission properties comprising a substrate (40), a functional system (60) formed on the substrate and a cover film (56) formed on the functional system. The functional system comprises a bottom electrode coating (46), formed on the substrate, a top electrode coating (54) and at least one electrochemically active film (48, 52) located between the two electrode coatings, the electro-chemically active film being able to switch reversibly between a first state and a second state having optical and/or energy transmission properties different from the first state. The cover film defines at least one surface cavity (66) that passes through the cover film without penetrating the top electrode coating and the device comprises electrical connection means (70) arranged at least partially in at least one surface cavity for electrical contact with the top electrode coating.

Abstract: “Smart” controllers for windows having controllable optical transitions are described. Controllers with multiple features can sense and adapt to local environmental conditions. Controllers described herein can be integrated with a building management system (BMS) to greatly enhance the BMS's effectiveness at managing local environments in a building. The controllers may have one, two, three or more functions such as powering a smart window, determining the percent transmittance, size, and/or temperature of a smart window, providing wireless communication between the controller and a separate communication node, etc.

Abstract: A colored composition including a non-polar solvent and a methine dye represented by the following Formula (1) and having a solubility in n-hexane of 1% by mass or higher at 25° C. and 0.1 MPa: wherein, in Formula (1), R1 represents a hydrogen atom, an alkyl group, an aryl group, —COOR11, or —CONR11R12; Ar represents an aromatic ring; each of R9 and R10 independently represents a hydrogen atom or an alkyl group; each of R11 and R12 independently represents a hydrogen atom, an alkyl group, or an aryl group, and R11 and R12 may be linked to each other to form a 5-membered, 6-membered, or 7-membered ring; n represents an integer from 0 to 2; and none of R1, R9, R10 and Ar has a dissociable group different from NH.

Abstract: A colored composition includes: an azomethine pigment represented by the following Formula (1) and having a solubility in n-hexane of 1% by mass or more at 25° C. and 0.1 MPa; and a non-polar solvent: wherein, in Formula (1), Het1 represents a ring having no dissociable group and Ar represents an aromatic ring having no dissociable group or a saturated heterocycle having no dissociable group.

Abstract: A Mach-Zehnder optical modulator is provide and has a travelling wave electrode extending over two optical waveguide branches and modulating the relative phase of the optical beam components propagating in those branches. The travelling wave electrode has transmission line conductors and pairs of waveguide electrodes, the waveguide electrodes of each pair being coupled to one of the optical waveguide branches, respectively. The travelling wave electrode further includes active devices having a high impedance input electrically connected to one of the transmission line conductors and a low impedance output electrically connected to one of the waveguide electrodes. Each active device transfers the electrical modulation signal from the associated transmission line conductor onto the associated waveguide electrode according to a voltage transfer function.

Abstract: A lens structure and a 3D display device having the same are provided. The lens structure has unit regions. Each unit region includes upper and lower substrates, an anisotropic birefringence medium, center electrodes, edge electrodes and at least one set of side electrodes. The upper and the lower substrates are disposed oppositely to each other. The anisotropic birefringence medium is located between the upper and lower substrates. The center electrodes, the edge electrodes and the at least one set of side electrodes are located on the upper and lower substrates. The edge electrodes are disposed corresponding to the center electrodes. The at least one set of side electrodes are disposed between the center electrodes and the edge electrodes. An electric field distribution is formed between the center electrodes, the edge electrodes and the at least one set of side electrodes, so that the anisotropic birefringence medium constitutes a Fresnel lens.

Abstract: Apparatus and a method for monitoring various conditions of a vehicle structure including an optical sensor comprising an optical fiber bearing a photonic crystal mounted to one end, an interrogation system including an optical signal generator interfacing with one or more of the optical sensors located remotely from the interrogation module, and a method of monitoring the vehicle structural health using the interrogation system.

Abstract: The invention pertains to an apparatus and a method for tuning and then locking a nonlinear crystal to the angle at which phase-matching occurs. It is particularly advantageous to conduct tuning automatically and in the field.

Abstract: A subaquatic monopod for photographic equipment is disclosed. The subaquatic monopod is adapted from a standard telescoping monopod. A photographer affixes anchoring weights to a base of the monopod and affixes flotation devices to an upper end of the monopod. The photographer affixes anchoring weights of sufficient mass to hold the base on a bottom surface of a body of water. The underwater photographer affixes flotation devices of sufficient buoyancy to steady the monopod in a vertical position, without lifting the monopod and attached photographic equipment from the bottom surface. The photographer places or “throws” the subaquatic monopod into position on the bottom surface. The photographer can then record photographic images without manually steadying the photographic equipment. The subaquatic monopod optionally includes a ring for attachment of a retrieval line. The retrieval line allows deployment and retrieval from a distance (including by a photographer who is not underwater).

Abstract: A GoPro® pivoting/swivel mount that is securely integrated with high quality Mechanix® type gloves that are used for diving.

Abstract: Various camera mounts used to attach a camera to a helmet, vehicle, user, or other object are described. In one embodiment, a flexible camera mount deforms under impact, allowing an attached camera to detach without fracturing the mount. In a second embodiment, a non-flexible camera mount fractures under impact, allowing an attached camera to detach. In a third embodiment, a camera mount comprising a ring base and a floating base separates under impact, allowing a camera attached to the floating base to detach. In a fourth embodiment, a non-flexible camera mount including two rigid sections joined in a “V” shape fractures under impact, allowing the camera to detach. In a fifth embodiment, a flexible camera mount comprising two sections connected in a “V” shape separate under impact, allowing the camera to detach.

Abstract: Embodiments disclose systems and methods for a camera mount. Specifically, embodiments are directed towards a camera support that may be quickly unlocked and rotated, so that the grip orientation changes from a normal hand-grip use, to an orientation that can be undergirded by the crook of the operators elbow.

Abstract: A projection apparatus and a method for protecting the projection apparatus are provided. The projection apparatus includes a light source module, a light source control module, and an optical engine module. The light source module includes a light source and light conversion unit. The light source emits an illumination beam, and the light conversion unit converts the illumination beam into a plurality of color beams with different colors. The light source control module includes a light sensing unit and a control unit. The light sensing unit senses light intensities of the color beams, and the control unit determines whether to turn off the light source according to at least one of a light intensity proportion of the color beams and a sum of the light intensities of the color beams. The optical engine module receives the color beams to generate an image beam.

Abstract: A projector includes: an optical unit body having a light modulating apparatus configured to modulate an optical flux emitted from a light source according to image information; a projection lens configured to project the optical flux modulated by the light modulating apparatus; and an adjusting mechanism configured to adjust an inclination of the projection lens with respect to the optical unit body. The adjusting mechanism includes; a supporting portion configured to support the projection lens; a base portion configured to constitute part of the optical unit body; a clamping portion configured to clamp the base portion in cooperation with the supporting portion; a fixing member configured to fix the supporting portion to the clamping portion; and adjusting members configured to be capable of adjusting a distance between the base portion and the supporting portion.

Abstract: A projection apparatus for projecting an image of a display unit by emitting light from a light source includes a detection unit configured to detect flicker information indicating how easily flicker occurs based on input image information, and a control unit configured to control the number of light emissions of the light source in a time period during which an image in one frame is displayed by the display unit based on the flicker information detected by the detection unit.

Abstract: A projector includes a light source device, a diffraction element that converts light from the light source device into 0-th order light and diffracted light, a light modulation device that modulates the diffracted light so as to form image light, and a projection optical system that emits projected light having a chief ray which is tilted with respect to an optical axis of the image light incident from the light modulation device. Defining a reference plane as a plane which is perpendicular to a plane including the optical axis and a chief ray of the projected light and includes the optical axis, a plane including an optical axis of the 0-th order light and a chief ray of the diffracted light intersects the reference plane.

Abstract: An illumination system including a plurality of light source units, at least one light concentrating unit, at least one taper tunnel and a light consolidating unit is provided. The light concentrating unit corresponds to and is disposed beside one of the light source units. The light concentrating unit has a first illuminating surface, the light source unit corresponding to the light concentrating unit has a second illuminating surface, and the other light source units not corresponding to the concentrator have a third illuminating surface, respectively. The concentrator is disposed between the taper tunnel and the light source unit, and the taper tunnel has a fourth illuminating surface. The light consolidating unit has a fifth illuminating surface. The area of the fourth illuminating surface, and each of the third illuminating surfaces corresponds to each other. A projection apparatus is also provided.

Abstract: A laser beam projection apparatus includes a first light source module including a red color laser light source, a green color laser light source, and a blue color laser light source, and a light source module for combination configured to be capable of emitting a laser beam and be used in combination with the first light source module according to use. The first light source module includes a first casing, and the light source module for combination includes a second casing. The first casing and the second casing have a common casing configuration including at least light source fitting portions.

Abstract: Disclosed is a method for photographing a panoramic image including the steps of recognizing movement of a corresponding photographing apparatus by comparing a current real-time input image with a previous image through a motion estimation mechanism with exposure compensation, determining a time to photograph each next picture by determining whether movement in a photography direction reaches a preset threshold value, and photographing each next picture by manual or automatic operation at the determined time.

Abstract: Provided is a photomask having a high-resolution pattern of a half-pitch of 32 nm or less (particularly, a half-pitch of 22 nm or less), which is manufactured by forming a blankmask in which a light-proof film and a hard film having a small thickness and high etch selectivity with respect to the light-proof film are formed on a transparent substrate. The photomask may have a high quality by adjusting a composition ratio of a metal, silicon (Si), and light elements that constitute the light-proof film to suppress damage to the pattern caused by an XeF2 gas in an electron-beam repair process.

Abstract: A mask and a manufacturing method thereof are provided. The mask comprises a body and a film layer comprising an oleophobic material and covering the surface of the body, thereby the possibility of the organic coagulation adhering to the surface of the mask is effectively reduced, and the contamination of the mask by the organic solvent and other volatile organic in the photoresist during exposure is also reduced.

Abstract: A mask including a light-blocking area, a transparent area and a partial-transparent area is disclosed. The partial-transparent area protrudes from edges of the light-blocking area to admit some of the UV rays to pass through. In addition, a glass substrate and the manufacturing method thereof are disclosed. By arranging the partial-transparent area on the edges of the light-blocking, area, the mask is formed with the slope having the small angle after the lithography process. As such, in the etching process, the edge of the thin film is formed with the slope having the small angle, which contributes to the formation of the second thin film. The thin films are prevented from being fragmented around the slope and the ITO layer is also prevented from fragmented around the periphery of the through hole.

Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a first dissolution-controlling agent including at least one of compounds represented by the following Chemical Formula 1 or Chemical Formula 2; (D) a second dissolution-controlling agent including a compound represented by the following Chemical Formula 3; and (E) a solvent, and a photosensitive resin film and a display device using the same.

Abstract: There is provided a copolymer and polymeric particle comprising the copolymer, a method of producing a polymeric particle, a copolymeric binder, a method of producing a copolymeric binder, a near infrared radiation-sensitive coating composition, a negative working lithographic offset printing plate, a method of producing a negative working lithographic offset printing plate and methods of imaging the plate and printing with the imaged plate.

Abstract: Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The photoresist compositions include one or more polymer additive that contains a basic moiety and which is substantially non-miscible with a resin component of the resist. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

Abstract: The present invention provides a photosensitive resin composition which can form an excellently light-resistant partition wall of an image display device and has excellent patterning properties. One embodiment of the present invention is a photosensitive resin composition for forming a partition wall of an image display device, comprising: (A) a binder polymer; (B) a photopolymerizable compound; (C) a photopolymerization initiator; (D) an inorganic black pigment; (E) a surfactant; and (F) a mercapto group-containing compound, wherein the (B) photopolymerizable compound contains a photopolymerizable compound having at least one unsaturated group and an isocyanuric ring structure in a molecule.

Abstract: A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit capable of decomposing by an action of an acid to produce a carboxyl group, represented by the following formula (I) as defined in the specification and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of performing a development by using a developer containing an organic solvent to form a negative pattern.

Abstract: Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

Abstract: A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of isosorbide nitrate ester, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.

Abstract: Provide is a curable composition for imprints capable of keeping a good pattern and heat resistance. A curable composition for imprints comprising a polymerizable compound (Ax-1) having maleimide structure(s), or a compound (Ax-2) having a partial structure represented by formula (I) below.

Abstract: This invention describes compositions and methods of using non-covalently crosslinked resin coatings for lithographic applications. These materials are designed to undergo, after coating, a change that provides solvent resistance and, with some materials, simultaneous aqueous-base solubility. Non-covalent interactions allow for easier removal of these coatings than of covalently crosslinked materials. These types of materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks.

Abstract: To provide a composition for forming a topcoat layer enabling to produce a pattern excellent in roughness and in pattern shape, and also to provide a pattern formation method employing that. A composition for forming a topcoat layer, containing a solvent and a triphenylene derivative having a hydrophilic group; and also a method of forming a pattern by casting the above composition on a resist surface and then by subjecting it to exposure and development. The composition may further contain a polymer.

Abstract: A lithography apparatus and a method of using the same, the apparatus including a stage for accommodating a substrate that has a photoresist film thereon; a main unit on the stage, the main unit being configured to irradiate a projection beam to the photoresist film; and an electric field unit adjacent to the stage, the electric field unit being configured to apply an electric field to the photoresist film, wherein the electric field unit is configured to be turned on at a same time as or before irradiation of the projection beam, and is configured to be turned off at a same time as or after termination of the projection beam.

Abstract: A negative-working lithographic printing plate precursor includes a support and a coating containing a photopolymerisable layer; characterized in that the coating includes a compound including at least one moiety having a structure according to Formula (I) at a level above 10% wt and below 40% wt relative to the total dry weight of the ingredients of the coating: wherein n represents an integer equal to 0 or 1; L1 represents a divalent linking group; with the proviso that the carbonyl groups in Formula (I) are bonded to a carbon atom.

Abstract: A lithographic printing plate precursor which is excellent in both the on-press development property and the printing durability and which is excellent particularly in the on-press development property after preservation for a long period of time, wherein the lithographic printing plate precursor includes an intermediate layer containing a polymer compound including a repeating unit (a1) having a support-adsorbing group and a repeating unit (a2) having a polyoxyalkylene group having a repeating number of oxyalkylene units from 8 to 120 between a support and a polymerizable image-recording layer, and contains a compound having a molecular weight of 1,500 or less and having an oxyalkylene group in at least any of the intermediate layer and the polymerizable image-recording layer.

Abstract: Disclosed are a processing liquid and a processing method that can favorably perform plate inspection of an on-press development-type lithographic printing plate precursor and image quality control, by using a processing liquid of a lithographic printing plate precursor having an image recording layer formable of an image by removing an unexposed region with at least one of printing ink and dampening water, the processing liquid containing a basic coloring dye expressed by General Formula (I) below and an anionic surfactant having an aromatic ring: wherein each of R1 to R14 independently represents a hydrogen atom and an alkyl group having 1 to 4 carbon atoms, R10 and R14 may be bonded to each other to form a single bond, Ar1 represents a phenylene group or a naphthylene group, Ar2 represents an aryl group, and X? represents SO3? or COO?.

Abstract: The present disclosure provides a solvent for reducing resist consumption, which includes a first solvent selected from the group consisting of alkylene glycol alkyl ether acetate, alkylene glycol alkyl ether and a combination thereof, and a second solvent having a hydrogen bonding Hansen parameter lower than 5.34 and an evaporation rate (n-BuAc=1) lower than 0.6. A volume ratio of the first solvent to the second solvent is in a range of 0/100 to 90/10. A resist dispense volume for a 300 mm wafer is less than 0.6 cc, or a resist dispense volume for a 450 mm wafer is less than 1.1 cc.

Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.

Abstract: An illumination optical system for EUV microlithography is used to direct an illumination light beam from a radiation source to an object field. At least one EUV mirror has a reflective face with a nonplanar mirror topography for forming the illumination light beam. The EUV mirror has at least one EUV attenuator arranged in front of it. The attenuator face which faces the reflective face of the EUV mirror has an attenuator topography which is designed to complement the mirror topography such that at least sections of the attenuator face are arranged at a constant interval from the reflective face. The result is an illumination optical system in which it is possible to correct unwanted variations in illumination parameters, for example an illumination intensity distribution or an illumination angle distribution, over the object field with as few unwanted radiation losses as possible.

Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

Abstract: A microlithography projection optical system is disclosed. The system can include a plurality of optical elements arranged to image radiation having a wavelength ? from an object field in an object plane to an image field in an image plane. The plurality of optical elements can have an entrance pupil located more than 2.8 m from the object plane. A path of radiation through the optical system can be characterized by chief rays having an angle of 3° or more with respect to the normal to the object plane. This can allow the use of face shifting masks as objects to be imaged, in particular for EUV wavelengths.

Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

Abstract: A system for controlling a patterning device in a lithographic apparatus using a patterning device having individually controllable elements that may only be set to two states. The method includes converting a representation of a pattern to be formed on the substrate into a plurality of area intensity signals, each corresponding to a radiation intensity level required to be set in a respective area of the patterning device in order to provide the desired pattern on the substrate and a separate step of converting each of the area intensity signals into control signals for a plurality of individually controllable elements that each correspond to the area of the patterning device.

Abstract: An overlap mark set is provided to have at least a first and a second overlap marks both of which are located at the same pattern layer. The first overlap mark includes at least two sets of X-directional linear patterns, having a preset offset a1 therebetween; and at least two sets of Y-directional linear patterns, having the preset offset a1 therebetween. The second overlap mark includes at least two sets of X-directional linear patterns, having a preset offset b1 therebetween; and at least two sets of Y-directional linear patterns, having the preset offset b1 therebetween. The preset offsets a1 and b1 are not equal.

Abstract: Implementations described and claimed herein include photolithography technology to alleviate the imbalance of transmission intensity induced. In one implementation, a method comprises exposing an alternating phase shift mask (Alt-PSM) and a trim mask, wherein an exposure placement of the trim mask is shifted relative to an exposure placement of the Alt-PSM.

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Abstract: An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.

Abstract: An objective for a projection exposure apparatus includes a metrology stage arranged on the frame of the objective. The objective includes at least one optical component, an objective mount for mounting the optical component, and a positioning device for holding at least one measuring device. The positioning device is connected to the objective mount and has at least one degree of freedom of displacement for displacing the measuring device.

Abstract: An electrophotographic imaging member which has improved imaging layer(s) formulated to comprise a charge transport compound and a polymer blended binder to render photoelectrical stability, tune-ability, and surface contact friction reduction for providing service life extension. The polymer blended binder used in the imaging layer(s) is a binary polymer blend binder consisting of: (1) an A-B diblock copolymer and a bisphenol polycarbonate and a low surface energy polysiloxane/polycarbonate random copolymer and (2) an A-B diblock copolymer and a low surface energy graft polysiloxane/polycarbonate copolymer.

Abstract: An organic photoconductor includes: a conductive substrate; a charge generation layer formed on the conductive substrate; a charge transport layer formed on the charge generation layer; and a protective coating formed on the charge transport layer. The protective coating comprises nanoparticles incorporated in an in-situ cross-linked polymer matrix. A process for increasing mechanical strength in an organic photoconductor is also provided.