Abstract: A process for protecting, preserving, and renewing surfaces, especially rubber and other natural and synthetic polymers, leather, wood, painted surfaces and metal. An aqueous emulsion of an unsubstituted or substituted dimethylpolysiloxane fluid, or mixtures thereof, is used to thoroughly wet the surface to be protected. After a period of penetration, preferably about twenty four hours, the surface is rewetted and allowed to penetrate as in the first application. At least one additional application and penetration gives optimum protection.A unique preservative composition preferred for use in the above process is also provided. In addition to a dimethylpolysiloxane fluid aqueous emulsion as above described, the preservative also includes, based on the weight of the polysiloxane fluid, of from about 15% to about 65% by weight of one or more polyol compounds, preferably diethylene glycol and glycerin.

Abstract: Aluminium polishing solutions containing phosphoric, nitric and sulphuric acids provide etched finishes if the proportion of sulphuric acid is increased. The invention inhibits such etching by addition to the bath of an aromatic ring compound, in which at least 2 hetero atoms are conjugated with the ring such as benztriazole.

Abstract: Novel fluorocarbon surfactants containing a non-ionic hydrophilic chain (preferably an oxyethylene chain) and at least two terminal perfluorocarbon groups of at least three carbon atoms, preferably branched perfluorocarbon groups derived from an oligomer of tetrafluoroethylene.

Abstract: Hard surface scouring or cleansing composition, more particularly a scouring block comprising a non-ionic detergent, a long-chain fatty alcohol and an abrasive material.

Abstract: The polishing of monocrystalline silicon wafers with an aqueous composition of fine sized abrasive particles, a soluble alkali metal base such a sodium carbonate and an oxidizing agent such as sodium or potassium salt of dichloroisocyanuric acid (e.g., salts of halo-trizenetrione).

Abstract: An improved method is provided to reproducibly obtain stannic oxide of a type suitable for polishing plastic lenses. The optical density, bulk density and color of the oxide are within specified limits.

Abstract: A polishing composition suitable for polishing semi-conductive materials, e.g. silicon and germanium, comprises an aqueous slurry containing as a polishing agent a finely divided calcium-titanium-zirconium-oxygen product having the empirical formula CaTiZr.sub.3 O.sub.9. Additional materials that may be present include sodium hypochlorite, sodium metasilicate, potassium hydroxide, and glycerine.

Abstract: A chemical polishing process for alpha-alumina utilizing a silica colloid polishing fluid which is both a reactant and a medium for the removal of the reaction product is disclosed.

Abstract: The tarnish resistance of silver and silver alloy surfaces can be improved by brief contact in a liquid medium with compounds of quadrivalent tin bound by at least one valence to alkyl having 2 to 22 carbon atoms, and by the remaining valences to sulfur, the tin compounds being of the formulas ##STR1## IN SAID FORMULAS R.sub.1, R.sub.2, and R' being alkyl having 2 to 22 carbon atoms, R" being alkyl having 4 to 22 carbon atoms or --CH.sub.2 COOR.sub.3, R.sub.3 being alkyl having 1 to 22 carbon atoms, and n being 1, 2, or 3.

Abstract: This invention relates to carboxylated polyfluoroamine compounds of the general formula ##STR1## wherein the radical C.sub.n F.sub.2n.sub.+1 -- is a straight or branched perfluorinated chain, n is an integer from 1 to 20, a is an integer from 2 to 10, p is an integer from 1 to 10, R.sup.2 and R.sup.3 each is an alkyl radical containing from 1 to 6 carbon atoms and R.sup.1 is a hydrogen atom or an alkyl radical containing from 1 to 6 carbon atoms and the process for their preparation.

Abstract: There is disclosed a liquid abrasive composition comprising an aqueous suspension of a substantially water-insoluble particulate abrasive, a nonionic surfactant and a suspending agent selected from natural and synthetic clays, hydrophobically treated clays, fumed silica, magnesium montmorillonite, and complex magnesium aluminum silicates.

Abstract: Polishes are made detergent resistant by incorporating therein carboxyfunctional siloxanes.

Abstract: A waxing and protective coating composition embodying the invention comprises a mixture of wax residue such as paraffin and microcrystalline wax, chlorinated solvent, petroleum distillate, and a nonionic surfactant such as nonylphenoxypoly-(ethyleneoxy)ethanol and a small amount of [N,N,N',N'-tetrakis (2-hydroxypropyl)ethylenediamine].

Abstract: An improved process for preparing a polishing solution for use in the chemical-mechanical polishing of silicon comprising copper nitrate, ammonium fluoride, nitric acid and ammonium nitrate. The latter two components are added to the copper nitrate, the system mixed well and then the ammonium fluoride added. The process eliminates the need for settling, decantation or filtration during solution preparation and permits substantially lowered amounts of copper nitrate to be used for silicon polishing. The silicon polishing solution is also described.