Abstract: A phthalate-free long-lasting nail polish enamel composition consisting essentially of a film-forming agent, solvents, one or more colorants, one or more suspending agents, adhesion promoters and plasticizers selected from the group consisting essentially of the adipates, pentaerythrityl tetrabenzoate, 2,2,4-trimethyl-1,3-pentanediol diisobutyrate, pentaerythrityl tetraacetate and mixtures thereof. Preferably, the nail composition is free of any toluene-containing components as well.

Abstract: The present invention relates to a wipe-on polish composition which contains no wax or abrasive components. The polish requires minimal effort to wipe out to a thin, glossy, streak-free, hydrophobic film. The polish is comprised of an emulsion that contains an organopolysiloxane and a volatile diluent.

Abstract: A slurry containing abrasive particles and exhibiting normal stress effects. The slurry further contains non-polishing particles resulting in reduced polishing rate at recesses, while the abrasive particles maintain high polish rates at elevations. This leads to improved planarization.

Abstract: An emulsion polymer composition having fast drying properties that provides floor polish coating materials having superior resistance to black heel marks, resistance to scuffing, resistance to abrasion, adhesion, and resistance to cleaning agents characteristics, is obtained from a film forming emulsion polymer composition comprising from greater than 60 wt % to 95 wt % of a first emulsion copolymer having a glass transition temperature within the range of from 10.degree.-100.degree. C., and from 5 wt % to less than 40 wt % of a second emulsion copolymer having a glass transition temperature that is lower than that of the first emulsion copolymer and is within the range of from 0.degree.-50.degree. C.

Abstract: A cleaning and protectant composition for automotive painted surfaces is provided. The composition includes a low-foaming nonionic surfactant, a silicone antifoam emulsion, and a volatile silicone fluid. A method of cleaning and protecting an automotive surface includes applying the composition to the surface.

Abstract: A polishing slurry for use in chemical mechanical polishing is disclosed. The polishing slurry contains a solvent and polishing particles dispersed in this solvent. The polishing particles are selected from silicon nitride, silicon carbide, and graphite. The primary particle size of the polishing particles dispersed in the solvent is appropriately 0.01 to 1000 nm. When the polishing particles are colloidally dispersed in the solvent, the secondary particle size of the polishing particles is appropriately 60 to 300 nm.

Abstract: A polishing composition is shown which includes (1) a polishing media particle; (2) a film forming binder for suspending the particle and forming a temporary film on an exposed surface of the workpiece, the temporary film being dissolvable in a subsequently applied polishing wash, whereby the polishing media particle is freed to polish the workpiece; (3) a solvent for suspending the polishing media particle in the film forming binder to facilitate forming the temporary film; and (4) a wetting agent to improve the wettability of the composition on the exposed surface of the workpiece.

Abstract: Improved lapping slurries provide for easier and more thorough cleaning of alumina workpieces, as well as inhibit corrosion of the lapping table and provide for easier cleaning of the lapping equipment. The unthickened lapping slurry comprises abrasive grains such as diamond abrasive dispersed in a carrier comprising water, glycerine, and triethanolamine. The thickened lapping slurry comprises abrasive grains such as diamond abrasive dispersed in a carrier comprising water, glycerine, triethanolamine, a water soluble silicate, and acid.

Abstract: Spherical metal-oxide powder particles are used as finely ground raw and filler materials in mineral, ceramic and refractory construction, technical and auxiliary materials, as well as for polishing and grinding agents. There is a process for producing the powder particles, and there is a process for treating ceramic and refractory residual materials.

Abstract: Aqueous oil-in-water emulsion scratch cover compositions for covering scratches, blemishes and other damage to finished wooden articles such as furniture, wooden trim and wooden floors with characteristics comparable to volatile organic solvent-based scratch cover compositions are described which are substantially free of added volatile organic solvents and conventional surfactants. These emulsion compositions comprise 2-10% of an animal, vegetable or mineral oil that is a liquid and substantially nonvolatile at 25.degree. C., 0.0001-1% of at least one organic solvent soluble dye that is soluble in the oil and is substantially water insoluble, an effective amount, preferably 0.01-5%, of a polymeric electrostatic emulsifier such as an acrylates/C.sub.10 -C.sub.30 alkyl acrylate cross polymer that takes the place of conventional surfactants with the balance comprising water, and optionally, non-ionic waxes, nonionic nonvolatile silicone fluids, pigments or no more than about 1% of nonionic surfactants.

Abstract: The invention is directed to an abrasive composition comprising an abrasive component in a liquid base component and methods of making the same. More specifically, the present invention is directed to an abrasive composition comprising water, an alcohol, a surfactant, polymer, and an abrasive and methods of making the same.

Abstract: An abrasive composition is provided comprising an oxidizing agent and abrasive particles which have a mean particle size of 2 .mu.m or less, wherein each of the abrasive particles comprises (i) at least one oxide selected from aluminum oxide and silicon oxide and (ii) cerium oxide in an amount of 5% to 40% by weight in terms of cerium based on the oxide (i). A method for polishing and planarizing a metal layer formed on a semiconductor substrate using the abrasive composition is also provided.

Abstract: A magnetorheological fluid comprises non-colloidal magnetic particles, an abrasive, water, glycerol, and an alkaline buffer. The abrasive may be CeO.sub.2, the non-colloidal magnetic particles may be carbonyl iron, and the alkaline buffer may be Na.sub.2 CO.sub.3. The fluid is useful for magnetorheological finishing.

Abstract: A polishing composition for chemical mechanical polishing which comprises a carboxylic acid, an oxidizing agent, and water and has pH adjusted to 5 to 9 with an alkali. In chemical mechanical polishing for obtaining a high precision surface, particularly in chemical mechanical polishing for forming a circuit layer in production of semiconductor devices, the polishing composition shows a high polishing rate, has a high selectivity for circuit materials from insulation films, forms few corrosion marks or dishing, has neutral pH, does not contain any metal components which adversely affect properties of semiconductor devices, does not require any special expensive chemical agents, and does not comprise any substances harmful for human health as the main component.

Abstract: A surface protective composition especially for use on automobiles is prepared which contains about 0.1 to 5% of a film forming fluorine containing polymer, 0 to 10% of micronized wax, a hydrocarbon solvent, an organosilicone compound, a surfactant and water.

Abstract: A chemical mechanical polishing slurry comprising at least two oxidizing agents, an organic acid and an abrasive and a method for using the chemical mechanical polishing slurry to remove titanium, titanium nitride, and an aluminum alloy containing layer from a substrate.

Abstract: A composition is provided, which is suitable for polishing SiO.sub.2, silicates, and silicon nitride, comprising an aquesous slurry of submicron SiO.sub.2 particles and a soluble inorganic salt or combination of soluble inorganic salts of total solution concentration below the critical coagulation concentration for the slurry, wherein the slurry pH is adjusted to within the range of about 9 to 10 by addition of a soluble amine or mixture of soluble amines. Optionally, the compositions of this invention may also comprise a polyhydric alcohol.

Abstract: Finishing agents comprise the combination of an alkoxysilane surface active agent, a silanol condensing catalyst, and a nonaqueous liquid or solid medium, or the combination of an alkoxysilane surface active agent, an acid catalyst and a liquid or solid medium. In the latter embodiment, it is preferred that at least one of the alkoxysilane surface active agent and the acid catalyst be microencapsuled. The finishing agent permits formation of chemically adsorbed protecting films. Such protecting films are used for substrates of such equipments as electronics products, electric domestic products, automobiles, industrial equipment, mirrors, lenses for glasses and the like. The protecting films have a durability and heat, weather and abrasion resistance, and also water and oil repellent properties.

Abstract: In forming a wiring layer on a semiconductor stepped substrate (wafer) 15, the wiring layer is polished by using a slurry 12 which contains polishing particles treated in advance with a surface treatment agent containing at least an amino group. During polishing, a uniformity of polishing of the surface of the wafer 15 is maintained by rotating a wafer carrier rotation shaft 17 and a platen rotation shaft 14 while supplying slurry 12 through a guide tube 11. Consequently, scratches are prevented from being caused on surfaces of a multilayer wiring layer and an interlayer insulation film on a semiconductor device and, in addition, the wiring layer can be stably polished.

Abstract: A fine particulate polishing agent is based on cerium oxide and silicon oxide; a slurry polishing agent comprises the foregoing fine particulate polishing agent which can be prepared by a method which comprises the steps of mixing, with stirring, cerium oxide fine particles, silica sol and a liquid; drying the mixture; mixing the material with a liquid; and then subjecting the mixture to deagglomeration using a wet pulverizing mill to give a slurry. Preferably, the dried particulate material is subjected to a thermal treatment at a high temperature of 150.degree. to 1200.degree. C., preferably 800.degree. to 900.degree. C., thereby to produce a solid solution of cerium oxide and silicon oxide. The slurry polishing agent can ensure the achievement of surface roughness comparable to or superior to that achieved by the colloidal silica polishing agents and a high polishing rate at least comparable to that achieved by the conventional cerium oxide polishing agents.

Abstract: An aqueous slurry is provided which is useful for the chemical-mechanical polishing of substrates containing titanium comprising: water, submicron abrasive particles, an oxidizing agent, and a combination of complexing agents comprising a phthalate compound and a compound which is a di- or tri-carboxylic acid with at least one hydroxyl group in an alpha position relative to one of the carboxyl groups.

Abstract: A furniture cleaning and polishing composition that provides protection against water. The composition contains an admixture of A) about 0.01 to 4% by weight of a water repelling fluorinated polymer; B) up to 15% mineral oil; C) about 3 to 25% hydrocarbon solvent; D) about 0.1 to 5% silicone oil; about 0.01 to 5% surfactant, and the remainder water.

Abstract: A solid buffing compound made up of polishing powder and a bonding agent, wherein the bonding agent to be used is a good amount of water-soluble surface active agent and/or polyalkylene glycol which is an intermediate thereof; the melting point of said bonding agent is 30.degree. C. or more, and said bonding agent is water soluble so that a buff residue adhering on the surface of product, etc. after buffing may be washed out easily by use of water.

Abstract: A composition and method are described for repairing surface defects in plastic objects, particularly laser-readable discs such as audio compact discs, video laser discs and CD-ROM discs. Using the composition and method, a surface defect in the disc is smoothed over and filled with a waxy material having a refractive index approximating that of the plastic substrate, thereby forming a repair which does not distract the laser and permits continued use of the disc.

Abstract: A polishing composition comprising silicon nitride fine powder, water and an acid.

Abstract: An auto finish-treating composition universally useful on paint, metal, vinyl and other plastic finishes comprises micronized wax dispersed in a water/organic solvent emulsion also containing silicone liquid emulsified in both the organic and aqueous phases.

Abstract: Slurries and methods for the chemical mechanical polishing of thin films used in integrated circuit manufacturing are described. A first slurry comprises an oxidant, such as water, a halogen, such as fluorine, an abrasive, such as silica, and a chelating agent, such as citric acid, and has a pH between four and nine. The first slurry is ideal for the chemical mechanical polish of an aluminum film. Another slurry comprises an abrasive, such as silica, and an acid, such as citric acid, and has a pH of approximately three. The second slurry is ideal for the chemical mechanical polish of titanium aluminide and is compatible with the first slurry.

Abstract: This invention is directed to a chrome polish/exhaust pipe de-bluer consisting of 20 lbs aluminum powder and 8 oz walnut shell powder.

Abstract: This invention is directed to a hard water stain remover for glass and glazed surfaces consisting of 20 lbs. pumice powder and 8 oz. walnut shell powder.

Abstract: A dry, non-oily, non-greasy, rubber or vinyl surface protectant contains a silicone component and an acrylic component in its formulation. When only the silicone component is applied to rubber and vinyl surfaces, the surfaces become glossy but feel oily. When only the acrylic component is applied, they are glossy and feel dry but are tacky and draggy as if a heavy residue was present. When components are blended and applied to rubber and vinyl surfaces, the surfaces have a dry shine with good gloss and feel completely dry. The treated surfaces are also not tacky and give no sensation of heavy residue presence.

Abstract: A wax-free silicone containing furniture polish is prepared using 1) a low viscosity silicone fluid and a silicone gum; or 2) a low visosity silicone fluid and a polydiorganosiloxane; or 3) a low visocity silicone fluid, a silicone gum, and a polydiorganosiloxane together with water and one or more suitable surfactants.

Abstract: The present invention comprises dipropylene glycol dibenzoate and diethylene glycol dibenzoate, the improvement comprising the addition of dipropylene glycol monobenzoate or diethylene glycol monobenzoate, whereby the plasticizer is resistant to fungal growth.

Abstract: Metal-free polymer compositions are disclosed which contain selectively swellable emulsion polymer functionalities and which are cross-linked before film formation to an extent that still allows the polymers to form a film upon application, which film is removable with a stripper solution containing swellant for the polymer functionality. When the polymers are formulated into sacrificial coatings, the polishes produce detergent resistant and removable finishes.

Abstract: An abrasive paste composition. The abrasive paste is made up from an aqueous suspension of water insoluble abrasive particles of from about forty five percent (45%) to about sixty five percent (65%) by weight, from thickeners of natural or synthetic clay of from about three percent (3%) to about fifteen percent (15%) by weight, from liquid detergent of from about two percent (2%) to about twenty percent (20%) by weight, and from water of from about twenty percent (20%) to about sixty percent (60%) by weight, and optional ingredients such as dyes, humectant, and perfumes. The water based abrasive paste has abrasive particles sized to provide adequate cut without surface gouging for use in automotive painting and body repair.

Abstract: A polishing agent used for polishing a silicon wafer is composed of a colloidal silica polishing agent containing an ethyl silicate monomer and/or an ethyl silicate polymer. Even when the polishing agent is used with a rigid polishing pad, it is able to provide a polished wafer having an excellent flatness and whose surface has a roughness comparable to that obtained by the conventional final polishing process.

Abstract: Disclosed herein is a method for reducing the color of an emulsion of functionalized polyolefin wax by treating an emulsion with a water soluble oxidizing agent at a temperature above the freezing point and below the boiling point of the emulsion and below the softening point of the wax. Disclosed herein, also, is the essentially colorless emulsion produced according to the disclosed method which is useful as an additive to floor polishes and other coating products.

Abstract: This composition consists of a coated composition of solid ice melting agents, abrasives and absorbents. The coated composition employs a coating of calcium chloride.The method of making the composition, also part of the invention, includes placing a solid ice melting agent such as urea, potassium chloride, sodium chloride and abrasives such as sand, gravel, cinders, and absorbents (i.e. calcined diatomaceous earth) into a mechanical stirring device; and spraying a measured amount of adhering solution on to the medium. This adhering solution may be made up, but not limited to, plain water, solutions of organic or inorganic solids with ice melting properties, etc. To this mixture is added a measured amount of powdered non-fully hydrated calcium chloride as a solid coatant. The non-fully hydrated calcium chloride by hydration forms a coating around the ice melt base. The resultant mixture is discharged from the mixer, screened and packaged.

Abstract: An ultra-thin, water- and oil-repelling and durable overcoat easily formed on a substrate surface via covalent bonding by applying a finishing agent, in which a chemical adsorbent including at least one chlorosilyl group is mixed in a nonaqueous viscous liquid or a solid medium, to the substrate surface; and an oil-repelling, extremely thin and durable overcoat with a high water-separation property covalently bonded to a substrate surface by applying an organosiloxane-based finishing agent, in which at least one organosiloxane bond chain and chlorosilyl group are mixed in a nonaqueous viscous liquid or a solid medium, to the substrate surface.

Abstract: Disclosed is a polishing composition for refinishing a plastic surface of a compact disk. The composition is made of (a) from about 15 to about 25 weight percent of a solvent for the plastic surface, (b) from about 12.5 to about 35 weight percent of an abrasive particulate, (c) from about 15 to about 35 weight percent of a petroleum distillate, (d) from about 2 to about 10 weight percent of a hard wax, and (e) from about 15 to about 25 weight percent water.

Abstract: A substantially liquid, aqueous, rare earth oxide based composition for preserving the luster of the smooth surfaces of objects needing to have such an appearance. The composition is characterized in that the rare earth oxide in the composition consists of particles with an average diameter of less than two micrometers (2 .mu.m), and in that aqueous solvent includes a polysiloxane oil and a degreasing agent for diluting the polysiloxane oil.

Abstract: A water resistant shoe polish including in addition to a tradition base mixture of wax and turpentine oil, petroleum benzin, high vacuum silicone grease, glycerin, glycerol stearate and stearic acid. The composition greatly enhances the retention period of shoe polish on leather or imitation leather materials.

Abstract: A nail enamel composition comprising:a) 0.1-85% solvent,b) 0.1-60% film former, andc) 0.005-5% of a silicone glycol copolymer.

Abstract: The invention is directed to an abrasive composition comprising an abrasive component in a liquid base component and methods of making the same. More specifically, the present invention is directed to an abrasive composition comprising water, an alcohol, a surfactant, polymer, and an abrasive and methods of making the same.

Abstract: A process for superpolishing hard ceramic substrates, and super polished substrates having surface finishes below about 20 angstroms RMS. In the first embodiment, the process comprises applying a pitch to a lap tool and forming channels in the pitch. The pitch is wetted with a polishing compound comprising colloidal alumina and powder of a substance harder than that being polished. The substrate is brought into contact with the wetted pitch, and relative motion is applied thereto to polish the substrate. In a second embodiment, microporous pads are used which absorb the polishing compound and contact the substrate to polish the same.

Abstract: A novel polishing composition composed of water, sol or gel of silica as a polishing agent, and a polishing accelerator has been obtained. The accelerator could be a persulfate compound, a persulfate compound combined with hydrogen peroxide, or a hydrazine compound. Another polishing composition composed of water, other polishing agent than silica and a hydrazine compound as a polishing accelerator has also been obtained.

Abstract: Hard surfaces are polished by applying an abrasive free, preferably clear, composition formed from an aqueous phase and a silicone phase. The aqueous phase contains water and a water soluble hydrophilic organic solvent. The silicone phase contains a volatile methyl siloxane, a siloxane polyether, and an organosilicon resin.

Abstract: A lapping composition which contains abrasive grains which are commercially available and which consists of plate alumina-powder prepared by milling and class:trying a sintered body of plate alumina obtained by calcinating aluminum hydroxide, and other plate alumina powder classified and prepared separately from but similarly to the first-mentioned plate alumina powder having average grain size which is in a range of from 1.3 times to 2.3 times as large as the average grain size of the first-mentioned plate alumina powder. Further provided is a lapping method with such a lapping composition by which the removal rate is improved and a lapped surface excellent in quality can be obtained.

Abstract: A slurry for use in chemical-mechanical polishing of a metal layer comprising high purity fine metal oxide particles uniformly dispersed in a stable aqueous medium.

Abstract: A protective composition for automotive painted surfaces is provided, which is used with a detergent. The protective composition comprises modified silicone, a cationic emulsifier, and a dispersant.

Abstract: Novel slurries for the chemical mechanical polishing of thin films used in integrated circuit manufacturing. A tungsten slurry of the present invention comprises an oxidizing agent, such as potassium ferricyanide, an abrasive such as silica, and has a pH between two and four. The tungsten slurry of the present invention can be used in a chemical mechanical planarization process to polish back a blanket deposited tungsten film to form plugs or vias. The tungsten slurry can also be used to polish copper, tungsten silicide, and titanium nitride. A second slurry, which is a 9:1 dilution of the tungsten slurry is ideal for chemical mechanical polishing of titanium nitride films. A third slurry of the present invention comprises a fluoride salt, an abrasive such as silica and has a pH.ltoreq.8. The third slurry can be used to polish titanium films.