Polishes Patents (Class 106/3)
  • Patent number: 5676741
    Abstract: Metal-free polymer compositions are disclosed which contain selectively swellable emulsion polymer functionalities and which are cross-linked before film formation to an extent that still allows the polymers to form a film upon application, which film is removable with a stripper solution containing swellant for the polymer functionality. When the polymers are formulated into sacrificial coatings, the polishes produce detergent resistant and removable finishes.
    Type: Grant
    Filed: August 19, 1996
    Date of Patent: October 14, 1997
    Assignee: Rohm and Haas Company
    Inventors: Richard Thomas Gray, Joseph Michael Owens, Harrison Scott Killam
  • Patent number: 5676742
    Abstract: The present invention comprises dipropylene glycol dibenzoate and diethylene glycol dibenzoate, the improvement comprising the addition of dipropylene glycol monobenzoate or diethylene glycol monobenzoate, whereby the plasticizer is resistant to fungal growth.
    Type: Grant
    Filed: October 30, 1995
    Date of Patent: October 14, 1997
    Assignee: Velsicol Chemical Corporation
    Inventors: William D. Arendt, David Wayne Barrington
  • Patent number: 5669942
    Abstract: An abrasive paste composition. The abrasive paste is made up from an aqueous suspension of water insoluble abrasive particles of from about forty five percent (45%) to about sixty five percent (65%) by weight, from thickeners of natural or synthetic clay of from about three percent (3%) to about fifteen percent (15%) by weight, from liquid detergent of from about two percent (2%) to about twenty percent (20%) by weight, and from water of from about twenty percent (20%) to about sixty percent (60%) by weight, and optional ingredients such as dyes, humectant, and perfumes. The water based abrasive paste has abrasive particles sized to provide adequate cut without surface gouging for use in automotive painting and body repair.
    Type: Grant
    Filed: March 16, 1994
    Date of Patent: September 23, 1997
    Inventor: David Keith McCullough
  • Patent number: 5667567
    Abstract: A polishing agent used for polishing a silicon wafer is composed of a colloidal silica polishing agent containing an ethyl silicate monomer and/or an ethyl silicate polymer. Even when the polishing agent is used with a rigid polishing pad, it is able to provide a polished wafer having an excellent flatness and whose surface has a roughness comparable to that obtained by the conventional final polishing process.
    Type: Grant
    Filed: December 16, 1996
    Date of Patent: September 16, 1997
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventors: Hisashi Masumura, Kiyoshi Suzuki
  • Patent number: 5667575
    Abstract: Disclosed herein is a method for reducing the color of an emulsion of functionalized polyolefin wax by treating an emulsion with a water soluble oxidizing agent at a temperature above the freezing point and below the boiling point of the emulsion and below the softening point of the wax. Disclosed herein, also, is the essentially colorless emulsion produced according to the disclosed method which is useful as an additive to floor polishes and other coating products.
    Type: Grant
    Filed: September 21, 1995
    Date of Patent: September 16, 1997
    Assignee: Eastman Chemical Company
    Inventors: Paul Andrew Rundquist, Ernest Phillip Smith, Stephen Louis Poteat, Dante Joseph Rutstrom, Richard Kingsley Stuart, Jr.
  • Patent number: 5651915
    Abstract: This composition consists of a coated composition of solid ice melting agents, abrasives and absorbents. The coated composition employs a coating of calcium chloride.The method of making the composition, also part of the invention, includes placing a solid ice melting agent such as urea, potassium chloride, sodium chloride and abrasives such as sand, gravel, cinders, and absorbents (i.e. calcined diatomaceous earth) into a mechanical stirring device; and spraying a measured amount of adhering solution on to the medium. This adhering solution may be made up, but not limited to, plain water, solutions of organic or inorganic solids with ice melting properties, etc. To this mixture is added a measured amount of powdered non-fully hydrated calcium chloride as a solid coatant. The non-fully hydrated calcium chloride by hydration forms a coating around the ice melt base. The resultant mixture is discharged from the mixer, screened and packaged.
    Type: Grant
    Filed: September 20, 1996
    Date of Patent: July 29, 1997
    Assignee: Ossian, Inc.
    Inventors: Kenneth C. Ossian, Norbert J. Steinhauser
  • Patent number: 5645633
    Abstract: An ultra-thin, water- and oil-repelling and durable overcoat easily formed on a substrate surface via covalent bonding by applying a finishing agent, in which a chemical adsorbent including at least one chlorosilyl group is mixed in a nonaqueous viscous liquid or a solid medium, to the substrate surface; and an oil-repelling, extremely thin and durable overcoat with a high water-separation property covalently bonded to a substrate surface by applying an organosiloxane-based finishing agent, in which at least one organosiloxane bond chain and chlorosilyl group are mixed in a nonaqueous viscous liquid or a solid medium, to the substrate surface.
    Type: Grant
    Filed: April 12, 1995
    Date of Patent: July 8, 1997
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Kazufumi Ogawa
  • Patent number: 5641345
    Abstract: Disclosed is a polishing composition for refinishing a plastic surface of a compact disk. The composition is made of (a) from about 15 to about 25 weight percent of a solvent for the plastic surface, (b) from about 12.5 to about 35 weight percent of an abrasive particulate, (c) from about 15 to about 35 weight percent of a petroleum distillate, (d) from about 2 to about 10 weight percent of a hard wax, and (e) from about 15 to about 25 weight percent water.
    Type: Grant
    Filed: September 26, 1995
    Date of Patent: June 24, 1997
    Assignee: James R. Black
    Inventor: Daniel J. Henry
  • Patent number: 5634965
    Abstract: A substantially liquid, aqueous, rare earth oxide based composition for preserving the luster of the smooth surfaces of objects needing to have such an appearance. The composition is characterized in that the rare earth oxide in the composition consists of particles with an average diameter of less than two micrometers (2 .mu.m), and in that aqueous solvent includes a polysiloxane oil and a degreasing agent for diluting the polysiloxane oil.
    Type: Grant
    Filed: January 23, 1995
    Date of Patent: June 3, 1997
    Assignee: Lotigie S.A.
    Inventor: Yves Delcroix
  • Patent number: 5614005
    Abstract: A water resistant shoe polish including in addition to a tradition base mixture of wax and turpentine oil, petroleum benzin, high vacuum silicone grease, glycerin, glycerol stearate and stearic acid. The composition greatly enhances the retention period of shoe polish on leather or imitation leather materials.
    Type: Grant
    Filed: April 1, 1996
    Date of Patent: March 25, 1997
    Inventor: Ricky Leung
  • Patent number: 5607665
    Abstract: A nail enamel composition comprising:a) 0.1-85% solvent,b) 0.1-60% film former, andc) 0.005-5% of a silicone glycol copolymer.
    Type: Grant
    Filed: December 16, 1994
    Date of Patent: March 4, 1997
    Assignee: Revlon Consumer Products Corporation
    Inventors: Joseph F. Calello, Robert W. Sandewicz, Anjali A. Patil
  • Patent number: 5603739
    Abstract: The invention is directed to an abrasive composition comprising an abrasive component in a liquid base component and methods of making the same. More specifically, the present invention is directed to an abrasive composition comprising water, an alcohol, a surfactant, polymer, and an abrasive and methods of making the same.
    Type: Grant
    Filed: June 9, 1995
    Date of Patent: February 18, 1997
    Assignee: Diamond Scientific, Inc.
    Inventor: Edward J. Neuland
  • Patent number: 5584898
    Abstract: A process for superpolishing hard ceramic substrates, and super polished substrates having surface finishes below about 20 angstroms RMS. In the first embodiment, the process comprises applying a pitch to a lap tool and forming channels in the pitch. The pitch is wetted with a polishing compound comprising colloidal alumina and powder of a substance harder than that being polished. The substrate is brought into contact with the wetted pitch, and relative motion is applied thereto to polish the substrate. In a second embodiment, microporous pads are used which absorb the polishing compound and contact the substrate to polish the same.
    Type: Grant
    Filed: October 26, 1994
    Date of Patent: December 17, 1996
    Assignee: Planar Technologies Inc.
    Inventor: Kenneth W. Fulton
  • Patent number: 5575837
    Abstract: A novel polishing composition composed of water, sol or gel of silica as a polishing agent, and a polishing accelerator has been obtained. The accelerator could be a persulfate compound, a persulfate compound combined with hydrogen peroxide, or a hydrazine compound. Another polishing composition composed of water, other polishing agent than silica and a hydrazine compound as a polishing accelerator has also been obtained.
    Type: Grant
    Filed: October 6, 1995
    Date of Patent: November 19, 1996
    Assignee: Fujimi Incorporated
    Inventors: Hitoshi Kodama, Shoji Iwasa
  • Patent number: 5531814
    Abstract: Hard surfaces are polished by applying an abrasive free, preferably clear, composition formed from an aqueous phase and a silicone phase. The aqueous phase contains water and a water soluble hydrophilic organic solvent. The silicone phase contains a volatile methyl siloxane, a siloxane polyether, and an organosilicon resin.
    Type: Grant
    Filed: April 25, 1995
    Date of Patent: July 2, 1996
    Assignee: Dow Corning Corporation
    Inventors: Bradley C. Bahr, David B. Selley
  • Patent number: 5527370
    Abstract: A lapping composition which contains abrasive grains which are commercially available and which consists of plate alumina-powder prepared by milling and class:trying a sintered body of plate alumina obtained by calcinating aluminum hydroxide, and other plate alumina powder classified and prepared separately from but similarly to the first-mentioned plate alumina powder having average grain size which is in a range of from 1.3 times to 2.3 times as large as the average grain size of the first-mentioned plate alumina powder. Further provided is a lapping method with such a lapping composition by which the removal rate is improved and a lapped surface excellent in quality can be obtained.
    Type: Grant
    Filed: June 17, 1994
    Date of Patent: June 18, 1996
    Assignee: Fujimi Incorporated
    Inventors: Masaaki Kubo, Koji Nishikawa, Shinji Maruyama
  • Patent number: 5527423
    Abstract: A slurry for use in chemical-mechanical polishing of a metal layer comprising high purity fine metal oxide particles uniformly dispersed in a stable aqueous medium.
    Type: Grant
    Filed: October 6, 1994
    Date of Patent: June 18, 1996
    Assignee: Cabot Corporation
    Inventors: Matthew Neville, David J. Fluck, Cheng-Hung Hung, Michael A. Lucarelli, Debra L. Scherber
  • Patent number: 5518533
    Abstract: A protective composition for automotive painted surfaces is provided, which is used with a detergent. The protective composition comprises modified silicone, a cationic emulsifier, and a dispersant.
    Type: Grant
    Filed: July 21, 1994
    Date of Patent: May 21, 1996
    Assignee: Armor All Products Corporation
    Inventor: Michael W. Howe
  • Patent number: 5516346
    Abstract: Novel slurries for the chemical mechanical polishing of thin films used in integrated circuit manufacturing. A tungsten slurry of the present invention comprises an oxidizing agent, such as potassium ferricyanide, an abrasive such as silica, and has a pH between two and four. The tungsten slurry of the present invention can be used in a chemical mechanical planarization process to polish back a blanket deposited tungsten film to form plugs or vias. The tungsten slurry can also be used to polish copper, tungsten silicide, and titanium nitride. A second slurry, which is a 9:1 dilution of the tungsten slurry is ideal for chemical mechanical polishing of titanium nitride films. A third slurry of the present invention comprises a fluoride salt, an abrasive such as silica and has a pH.ltoreq.8. The third slurry can be used to polish titanium films.
    Type: Grant
    Filed: May 13, 1994
    Date of Patent: May 14, 1996
    Assignee: Intel Corporation
    Inventors: Kenneth C. Cadien, Daniel A. Feller
  • Patent number: 5501724
    Abstract: A coating composition for the attenuation of the reflection electromagnetic radiation and particularly electromagnetic radiation have a wavelength of greater than 800 nm including the near infrared is described. The composition comprises a chromophore capable of absorbing up to about 95% of the electromagnetic radiation having a wavelength greater than 800 nm. Optionally, the composition may comprise microbeads that serve the purpose of also scattering the electromagnetic radiation.
    Type: Grant
    Filed: June 16, 1994
    Date of Patent: March 26, 1996
    Inventor: Howard Loff
  • Patent number: 5490883
    Abstract: A stable, crystallizing solution of magnesium silicofluoride and oxalic acid is disclosed which can be incorporated into a complete maintenance system covering daily and weekly maintenance along with the periodic maintenance process of crystallization for preserving the appearance of polished marble flooring, terrazzo limestone, etc. The results which can be achieved through the use of this system are determined via an initial pretest with performance quantified using a glossmeter. Final performance results, the visible results of crystallization, are quantified via the glossmeter.
    Type: Grant
    Filed: June 16, 1994
    Date of Patent: February 13, 1996
    Assignee: The ServiceMaster Company, L.P.
    Inventors: Kevin P. McLaren, Diane M. Scheele
  • Patent number: 5480476
    Abstract: Disclosed is a process for preparing activated compositions and the compositions derived therefrom which are suitable for polishing surfaces, particularly integrated circuits, wherein a base abrasive is activated by addition of a second cation whose oxide exhibits a higher polishing rate than the base abrasive alone. The activation is effected by chemical adsorption of the activating cation onto the base abrasive during cyclic impact in an aqueous medium whose pH is at a level which is favorable for adsorption of the activating cation onto the base abrasive surface.
    Type: Grant
    Filed: September 6, 1994
    Date of Patent: January 2, 1996
    Assignee: Rodel, Inc.
    Inventors: Lee M. Cook, Scott B. Loncki, Gregory Brancaleoni
  • Patent number: 5474835
    Abstract: A cationic silicone compound which can be employed in a variety of environments, such as a fiber lubricant, textile fabric softener, hair conditioner, and skin conditioner is formed from an aminosilicone compound which has the following Formula (I): ##STR1## wherein a, b, and c are 0-300;d is 0-4, preferably 1 or 2;R.sub.1 comprises hydrogen, an alkyl, aryl, alkynyl, alkenyl, alkyloxyalkylene group which may be unsubstituted or substituted with P,N, or S moieties;R.sub.2 is defined the same as R.sub.1 and can also be a carboxylic acid residue preferably a fatty acid residues, with the proviso that where R.sub.2 is a carboxylic acid residue, the R.sub.1 attached to the terminal N is hydrogen;R.sub.3 is defined the same as R.sub.2 and can also be alkoxy, aryloxy or oxyalkylene groups;R.sub.4 is defined the same as R.sub.3 and can also be an amino-substituted alkyl group;Z.sub.1 and Z.sub.
    Type: Grant
    Filed: August 12, 1994
    Date of Patent: December 12, 1995
    Assignee: Karlshamns AB
    Inventors: James P. McCarthy, George H. Greene, Anthony G. DeWar
  • Patent number: 5456736
    Abstract: This invention provides a lap capable of reducing the pole recession produced between the substrate and the magnetic film when the air-bearing surface of a thin-film magnetic head is lapped, a lapping liquor used for such lapping, and a thin-film magnetic head having its air-bearing surface lapped by using them. Lapping is carried out by using a lap made of a material having both a phase of tin and a phase of brass with a greater rigidity in supporting the abrasive grains than tin, and a lapping liquor prepared by mixing an anionic surfactant (15) and an ampholytic surfactant (16). According to the present invention, it is possible to reduce the pole recession in the thin-film magnetic heads and to accordingly shorten the recording bit length of the magnetic discs.
    Type: Grant
    Filed: March 5, 1993
    Date of Patent: October 10, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Yoshiharu Waki, Masayasu Fujisawa, Shigeo Aikawa, Kenya Ohashi, Yukihiro Isono
  • Patent number: 5445670
    Abstract: This invention relates to an abrasive-containing surface-finish composition, comprising: an effective amount of abrasive particulates to enhance the non-slip characteristics of said composition, said abrasive particulates having an average particle size of up to about 100 microns. The surface finish-composition can be water-based or oil-based. In one embodiment the surface-finish composition further comprises water, at least one acrylic polymer and at least one synthetic wax. Optional ingredients include one or more alkali-soluble resins, leveling agents, water-soluble solvents, plasticizers, defoaming agents, fragrance enhancers, biocides, and the like. These compositions are useful as anti-slip floor finishes.
    Type: Grant
    Filed: June 8, 1994
    Date of Patent: August 29, 1995
    Assignee: Blue Coral, Inc.
    Inventors: Thomas C. Each, Mohammad Nilchian
  • Patent number: 5443604
    Abstract: A polishing compound for plastic surfaces. The compound contains by weight approximately 4 to 17 parts at least one petroleum distillate lubricant, 1 to 6 parts mineral spirits, 2.5 to 15 parts abrasive particles, and 2.5 to 10 parts water. The abrasive is tripoli or a similar material that contains fine particles silica. Preferably, most of the abrasive particles are less than approximately 10 microns, more preferably less than approximately 5 microns in size. The compound is used on PLEXIGLAS.TM., LEXAN.TM., LUCITE.TM., polyvinyl chloride (PVC) and similar plastic materials whenever a smooth, clear polished surface is desired.
    Type: Grant
    Filed: October 13, 1993
    Date of Patent: August 22, 1995
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventor: Michael S. Stowell
  • Patent number: 5433890
    Abstract: An aqueous polymer preservative and protectant composition containing a silicone emulsion, an aminofunctional silicone emulsion, a film forming thickening agent and a polyol.
    Type: Grant
    Filed: July 19, 1994
    Date of Patent: July 18, 1995
    Assignee: First Brands Corporation
    Inventors: Kenneth L. Meyer, Edward T. Turner, Richard L. Wolstoncroft
  • Patent number: 5397384
    Abstract: A composition which comprises approximately by weight 1 to 8 percent of a hydrocarbon solvent; 1 to 4 percent of a silicone; 1 to 5.5 percent of at least one nonionic surfactant; 0.5 to 3 percent of an alkali metal neutralized tall oil fatty acid and 0.25 to 2.5 percent of an unneutralized tall oil fatty acid.
    Type: Grant
    Filed: February 4, 1994
    Date of Patent: March 14, 1995
    Assignee: Colgate Palmolive Co.
    Inventor: Karen Wisniewski
  • Patent number: 5389352
    Abstract: The invention is a process for preparing chemically active solid oxide particles useful for polishing, composed primarily of CeO.sub.2, or CeO.sub.2 together with other oxides, comprising: (a) forming an aqueous solution comprised of a water soluble trivalent cerium salt and an oxidizing agent and (b) aging said mixture in the liquid state for a time not less than 4 hours.
    Type: Grant
    Filed: July 21, 1993
    Date of Patent: February 14, 1995
    Assignee: Rodel, Inc.
    Inventor: Jiun-Fang Wang
  • Patent number: 5389129
    Abstract: A polish composition for pharmaceutical tablets, food products and confectionery pieces comprises beeswax, carnauba wax, water and emulsifier. A polish composition for pharmaceutical tablet, food products and confectionery pieces comprises wax, water and an emulsifier with an HLB value of about 16 to about 17.
    Type: Grant
    Filed: May 28, 1992
    Date of Patent: February 14, 1995
    Assignee: Berwind Pharmaceutical Services, Inc.
    Inventor: Martin P. Jordan
  • Patent number: 5382272
    Abstract: Disclosed is a process for preparing activated compositions and the compositions derived therefrom which are suitable for polishing surfaces, particularly integrated circuits, wherein a base abrasive is activated by addition of a second cation whose oxide exhibits a higher polishing rate than the base abrasive alone. The activation is effected by chemical adsorption of the activating cation onto the base abrasive during cyclic impact in an aqueous medium whose pH is at a level which is favorable for adsorption of the activating cation onto the base abrasive surface.
    Type: Grant
    Filed: September 3, 1993
    Date of Patent: January 17, 1995
    Assignee: Rodel, Inc.
    Inventors: Lee M. Cook, Scott B. Loncki, Gregory Brancaleoni
  • Patent number: 5380356
    Abstract: The invention is directed to the creation of a material which does not have the hazardous properties of prior art materials containing quartz. In the material according to the invention, quartz is replaced with a quartz-free magmatic rock, especially nepheline syenite. Surprisingly, the magmatic rock in powdered form attains nearly the same treatment results as conventional materials which contain quartz. The material according to the invention is particularly suitable for polishing and blasting dental parts, especially those parts which are made of plastic material.
    Type: Grant
    Filed: September 8, 1992
    Date of Patent: January 10, 1995
    Assignee: BEGO Bremer Goldschlagerei Wilh. Herbst GmbH & Co.
    Inventors: Hans-Werner Gundlach, Peter Stroncik
  • Patent number: 5378271
    Abstract: The invention provides a tire polishing and protective composition including, as dissolved or dispersed in an organic solvent, 2 to 25% by weight of a silicone varnish, 0.1 to 4% by weight of a rubber type polymer and 0.1 to 10% by weight of a tackifier.
    Type: Grant
    Filed: August 27, 1993
    Date of Patent: January 3, 1995
    Assignees: Ishihara Chemical Co., Ltd., Ikkaku Industry Co., Ltd.
    Inventors: Kunio Arimoto, Nobuo Yoshida, Haruo Ohtani, Yasuhiko Ikkaku
  • Patent number: 5376222
    Abstract: This invention discloses a polishing method for flattening an inter-level insulating film or polycrystalline silicon inside a device isolation ditch in a semiconductor fabrication process.To this end, the present invention grinds and flattens an insulating film having a step on the surface thereof by using a polishing solution containing an alkali solution and a grain, wherein a cation concentration in the alkali solution is higher than an OH.sup.- ion concentration in the alkali solution.
    Type: Grant
    Filed: August 31, 1992
    Date of Patent: December 27, 1994
    Assignee: Fujitsu Limited
    Inventors: Motoshu Miyajima, Yasuyuki Ichihashi
  • Patent number: 5366542
    Abstract: The present invention relates to a polishing composition comprising water, alumina, and a chelating agent. It may optionally be incorporated with an aluminum salt and/or boehmite. The present composition permits efficient polishing and gives a polished surface having superior surface properties. The composition is suitable for polishing a memory hard disk.
    Type: Grant
    Filed: December 7, 1992
    Date of Patent: November 22, 1994
    Assignee: Fujimi Incorporated
    Inventors: Tsutomu Yamada, Taizo Okajima, Kouichi Ootani, Hitoshi Morinaga
  • Patent number: 5352277
    Abstract: A final polishing composition for polishing a silicon wafer used as a substrate crystal in electrical integrated circuits comprises water, colloidal silica, a water-soluble polymeric compound, and a water-soluble salt.
    Type: Grant
    Filed: July 26, 1993
    Date of Patent: October 4, 1994
    Assignee: E. I. Du Pont de Nemours & Company
    Inventor: Shigeo Sasaki
  • Patent number: 5340370
    Abstract: Novel slurries for the chemical mechanical polishing of thin films used in integrated circuit manufacturing. A tungsten slurry of the present invention comprises an oxidizing agent, such as potassium ferricyanide, an abrasive such as silica, and has a pH between two and four. The tungsten slurry of the present invention can be used in a chemical mechanical planarization process to polish back a blanket deposited tungsten film to form plugs or vias. The tungsten slurry can also be used to polish copper, tungsten silicide, and titanium nitride. A second slurry, which is a 9:1 dilution of the tungsten slurry is ideal for chemical mechanical polishing of titanium nitride films. A third slurry of the present invention comprises a fluoride salt, an abrasive such as silica and has a pH.ltoreq.8. The third slurry can be used to polish titanium films.
    Type: Grant
    Filed: November 3, 1993
    Date of Patent: August 23, 1994
    Assignee: Intel Corporation
    Inventors: Kenneth C. Cadien, Daniel A. Feller
  • Patent number: 5330787
    Abstract: A multi-component polish composition and polishing process for a surface. The polish composition comprises a multi-component mixture which when applied to a surface, e.g., the painted surface of a vehicle, under effective drying conditions forms a substantially dry hydrophilic wax-containing film which may be substantially removed from the surface by water rinsing of the surface whereby a hydrophobic protective layer is provided to the surface.
    Type: Grant
    Filed: December 2, 1991
    Date of Patent: July 19, 1994
    Assignee: First Brands Corporation
    Inventors: David R. Berlin, Bonnie A. Rishel, Richard R. Wolstoncroft
  • Patent number: 5326387
    Abstract: An automobile surface protectant composition containing volatile silicone which when applied to a wet surface displaces water and imparts gloss and water repellency. Preferably, the composition includes a volatile silicone fluid, an amino-functional silicone fluid, and an organopolysiloxane fluid.
    Type: Grant
    Filed: August 5, 1992
    Date of Patent: July 5, 1994
    Assignee: Amway Corporation
    Inventors: Robert D. Faber, Steven J. Brouwer
  • Patent number: 5318927
    Abstract: Chemical-mechanical polishing methods are disclosed for removing insulating inorganic metal oxide materials from semiconductor wafers. Such utilize aqueous acids or base slurries having a pK ionization constant of less than or equal to 5.0. Alternately, aqueous slurries having an oxidizing agent with an E.degree. reduction potential of greater than or equal to 1.0 volt are utilized. Further alternatively, non-aqueous slurries having a liquid halogenated or pseudohalogenated reactant are utilized. Further, slurries having an organic ligand precursor are utilized.
    Type: Grant
    Filed: April 29, 1993
    Date of Patent: June 7, 1994
    Assignee: Micron Semiconductor, Inc.
    Inventors: Gurtej S. Sandhu, Donald L. Westmoreland, Trung T. Doan
  • Patent number: 5314514
    Abstract: An abrasive tape comprises a flexible substrate and an abrasive layer, which is overlaid on the flexible substrate and contains abrasive grains and a binder. The abrasive grains comprise first abrasive grains, which have a mean grain diameter falling within the range of 0.07 .mu.m to 0.40 .mu.m and a Molls hardness falling within the range of 5 to 7, second abrasive grains, which have a mean grain diameter falling within the range of 0.20 .mu.m to 0.60 .mu.m and a Molls hardness not lower than 8.5, and fine diamond grains, which have a mean grain diameter falling within the range of 0.5 .mu.m to 3.0 .mu.m. The proportion of the fine diamond grains is not lower than 4% by weight with respect to the total weight of the first and second abrasive grains. The proportion of the fine diamond grains having grain sizes not larger than 33% of the mean grain diameter is not higher than 6% by volume with respect to the whole volume of the fine diamond grains.
    Type: Grant
    Filed: April 8, 1993
    Date of Patent: May 24, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masami Sato
  • Patent number: 5288314
    Abstract: A polish is provided for cleaning metallic and fiberglass surfaces, such as an automobile, truck and boat bodies, and for providing a protective film on the surface. The polish comprises water in an amount between about 40.0 to about 75.0 percent, a solvent in an amount between about 12.0 to about 35.0 percent, a rheological additive in an amount between about 0.30 to about 1.0 percent, an ultraviolet absorber in an amount between about 0.05 to about 0.50 percent, a dye in an amount between about 0.0005 to about 3.0 percent, a first silicate in an amount between about 5.0 to about 15.0 percent, dimethylpolysiloxane in an amount between about 0.50 to about 6.0 percent, a silicone resin solution in an amount between about 0.10 to about 3.0 percent, oleic diethanol amide in an amount between about 0.50 to about 2.0 percent, a second silicate in an amount between about 0.10 to about 3.0 percent, and a bactericide in an amount between about 0.05 to about 0.20 percent, by weight of the total polish.
    Type: Grant
    Filed: August 4, 1992
    Date of Patent: February 22, 1994
    Assignee: Crescent Manufacturing
    Inventors: Scott Howard, Richard Frazer, Jr.
  • Patent number: 5277708
    Abstract: A composition for buffing metal parts comprising from 2% to 12% by weight of a fatty acid or fatty ester, 0.5% to 10% by weight of a nonionic water soluble surfactant, 10% to 50% by weight of an abrasive grit, 40% to 70% by weight of water, a sufficient amount of an alkaline to provide the composition with a pH in the range of 6.5 to 9.0, and 0.3% to 3.0% by weight of an acrylic copolymer which provides a paste-like consistency for the composition. The composition is water washable from the metal part after buffing.
    Type: Grant
    Filed: January 19, 1993
    Date of Patent: January 11, 1994
    Assignee: S&S Industrial Services, Inc.
    Inventor: James A. Stuart, Jr.
  • Patent number: 5264027
    Abstract: Detergent resistant compositions comprising an aqueous emulsion of hydrocarbonoxy end-blocked branched organopolysiloxanes containing from 10 to 99 mol percent of R.sub.2 SiO units and from 90 to 1 mol percent of R.sub.3 SiO.sub.3/2 units and/or SiO.sub.4/2 units, where R is a monovalent hydrocarbon radical. Other silicone fluids such as aminofunctional, silicone fluids, organoalkoxysilanes, silicone resins, organopolysiloxane fluids and silicone gums as well as abrasive materials, surfactants and organic solvents may be incorporated in the aqueous emulsions.
    Type: Grant
    Filed: August 11, 1992
    Date of Patent: November 23, 1993
    Assignee: Wacker Silicones Corporation
    Inventors: Eugene R. Martin, Andrew J. Conti
  • Patent number: 5264010
    Abstract: An abrasive composition for use in polishing or planarizing the surface of a work piece is provided comprising about 30 to 50 percent of cerium oxide; about 8 to about 20 percent of fumed silica and about 15 to about 45 percent of precipitated silica. Methods using the composition to polish or planarize the surfaces of work pieces, as well as products produced by such methods, are also provided.
    Type: Grant
    Filed: April 27, 1992
    Date of Patent: November 23, 1993
    Assignee: Rodel, Inc.
    Inventors: Gregory Brancaleoni, Elmer W. Jensen, John V. H. Roberts
  • Patent number: 5261951
    Abstract: Polishes for hard surfaces that are essentially free of organic solvent comprising organopolysiloxanes which are solid at room temperature.
    Type: Grant
    Filed: October 29, 1992
    Date of Patent: November 16, 1993
    Assignee: Wacker-Chemie GmbH
    Inventors: Johann Sejpka, Franz Wimmer, Annemarie Schmidt
  • Patent number: 5258063
    Abstract: A polish formulation containing as components thereof at least one member selected from the group consisting of waxes, solvents, surfactants, film formers, abrasives and other ingredients normally used in making polishes. The improvement resides in incorporating into the polish formulation as a film former a silylated polycycloaliphatic amine or epoxide.
    Type: Grant
    Filed: May 11, 1992
    Date of Patent: November 2, 1993
    Assignee: Dow Corning Corporation
    Inventors: Martin E. Cifuentes, David B. Selley
  • Patent number: 5226930
    Abstract: A method is provided for preventing agglomeration of a colloidal silica comprising trialkylsilyating part of silanol groups on the surface of silica particles of the colloidal silica with a trialkylhalosilane or a hexaalkyldisilazane in an amount from about 0.1-10 mole % based on the silanol groups on the surface of the silica particles.
    Type: Grant
    Filed: March 16, 1992
    Date of Patent: July 13, 1993
    Assignee: Monsanto Japan, Ltd.
    Inventor: Shigeo Sasaki
  • Patent number: 5226955
    Abstract: A polishing composition for memory hard discs used to obtain polished surfaces of a high precision and a high quality with a high stock removal rate. The composition consists of water, alumina polishing agent, and polishing accelerator, and polishes surfaces of alumite, aluminum, and non-electrolytically nickel plated memory hard discs. The polishing accelerator is one kind selected from the group of molybdate of ammonium molybdate, lithium molybdate, sodium molybdate and potassium molybdate, or a kind selected from the group of molybdate and aluminum salt such as aluminum nitrate or aluminum oxalate, or another one kind selected from the group of molybdate and nickel sulfate, nickel nitrate, nickel sulfamate, and nickel acetate. The addition quantity of the substance above is 0.1 to 20%, the weight ratio of the polishing agent is 2 to 30%, and the mean particle diameter is 0.3 to 10 .mu.m.
    Type: Grant
    Filed: September 18, 1992
    Date of Patent: July 13, 1993
    Assignee: Fumimi Incorporated
    Inventor: Toshiki Owaki
  • Patent number: 5196037
    Abstract: An improved fibrous composite structure for use in grinding, cutting and/or polishing operations, normally with abrasives. Webs of fibrous materials, preferably blends of fibers having different deniers are fed to a needling apparatus and are needled, starting with at least two such webs. The needles force fibers from the webs along the path of needle travel and withdraw generally clean, leaving voids that define pores. Further individual layers are needled in like fashion to alternating opposite sides of the structure. Needles pass through an amount greater than fifty percent of the then thickness of the structure adequate to produce a unitary composite, though, and most preferably entirely through the thickness. The process for producing the composite products and embodiments of the products are also disclosed and claimed.
    Type: Grant
    Filed: July 2, 1990
    Date of Patent: March 23, 1993
    Inventors: Robert J. Rossi, Andreas C. Ladjias, Henry A. Ramella