Rotating Work Patents (Class 118/320)
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Patent number: 7276118Abstract: Spin-coating apparatus for use in manufacturing a semiconductor device includes a spin-chuck for rotating a wafer or the like, and a baffle plate disposed under the spin chuck to collect and discharge residue spun off of the wafer as the wafer is rotated by the spin chuck. The inner periphery of the baffle plate and a portion of a clamping plate adjacent the inner periphery of the baffle plate are configured to prevent the baffle plate from moving up relative to the clamping plate. Also, an outer peripheral surface of the clamping plate and a portion of the baffle plate adjacent the outer peripheral edge of the clamping plate may be configured as a guide to seat the baffle plate on the clamping plate and prevent the baffle plate from moving laterally relative to the clamping plate.Type: GrantFiled: May 6, 2005Date of Patent: October 2, 2007Assignee: Samsung Electronics Co., Ltd.Inventor: Seung-Jun Lim
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Publication number: 20070224347Abstract: A liquid coating apparatus and method for spraying a liquid on a wafer. The liquid coating apparatus may include a nozzle unit spraying the liquid on the wafer and moving relative to the wafer and a laminar flow forming unit forming a forced air flow around the nozzle unit. Though a wake may be formed around the nozzle unit by a movement of the nozzle unit, the laminar forming unit may reduce and/or minimize an influence of the wake.Type: ApplicationFiled: September 22, 2006Publication date: September 27, 2007Inventors: Jin Sung Lee, Tae Gyu Kim, June Mo Koo, Chang Hoon Jung
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Patent number: 7270711Abstract: For use in a rotational casting machine used for coating a rotating body with elastomer, such as polyurethane, there is provided a nozzle used for dispensing the liquid polyurethane onto the rotating body to be coated. The nozzle of the invention has a plurality of liquid-flow interior discharge-passageways each of which has an inlet connected to a sub-branch tube, which sub-branch tube is, in turn, is fluidly connected to a main branch that, in turn, is connected to a main inlet-passageway having the inlet that is directly connected to mixing head. Each discharge-passageway, or exit-passageway, changes in cross-sectional shape along the longitudinal axis thereof from its inlet to its outlet such that the cross-sectional area from the inlet to the outlet thereof gradually and minimally increases, whereby at least substantial laminar flow of the liquid is achieved with the concomitant reduced dwell-time of the liquid therein, in order to reduce in-nozzle reaction and subsequent clogging of the nozzle.Type: GrantFiled: June 7, 2004Date of Patent: September 18, 2007Assignee: Kastalon, Inc.Inventors: R. Bruce DeMent, Paul Werstler, Robert G. Snyder, III
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Publication number: 20070182081Abstract: A wafer spinner apparatus includes a main body, and a plurality of spin units disposed in the main body to open and close in a rack configuration, each spin unit including a stepping motor disposed in the main body to move a spin unit in a horizontal direction, a base plate coupled to the stepping motor, a reference sensor disposed in the main body to determine a position deviation of the spin unit, and a spin chuck disposed on the base plate.Type: ApplicationFiled: December 14, 2006Publication date: August 9, 2007Inventor: Seok-gi Si
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Patent number: 7252854Abstract: A rotatable vacuum chamber receives an optical connector having an output face on which an optical gel is applied substantially without entrapped air. Opposite the output face is placed a gel dispenser with its opened nozzle pointing towards the output face. Uncured gel components contained in the dispenser are outgased prior to application of the gel on the output face while a vacuum is maintained in the chamber. Outgasing takes place at a first chamber orientation with the nozzle pointing upwards through which the outgasing air ventilates. The gel is applied at a second chamber orientation where the output face is horizontal and upwards pointing. Immediately following the gel application, the vacuum is unmade to prevent cooking of the mixed and uncured gel. A glass plate is then pressed against the applied fluid gel.Type: GrantFiled: March 4, 2005Date of Patent: August 7, 2007Assignee: Intel CorporationInventor: Janusz Liberkowski
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Patent number: 7241339Abstract: A rotatable vacuum chamber receives an optical connector having an output face on which an optical gel is applied substantially without entrapped air. Opposite the output face is placed a gel dispenser with its opened nozzle pointing towards the output face. Uncured gel components contained in the dispenser are outgased prior to application of the gel on the output face while a vacuum is maintained in the chamber. Outgasing takes place at a first chamber orientation with the nozzle pointing upwards through which the outgasing air ventilates. The gel is applied at a second chamber orientation where the output face is horizontal and upwards pointing. Immediately following the gel application, the vacuum is unmade to prevent cooking of the mixed and uncured gel. A glass plate is then pressed against the applied fluid gel.Type: GrantFiled: March 4, 2005Date of Patent: July 10, 2007Assignee: Intel CorporationInventor: Janusz Liberkowski
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Patent number: 7232490Abstract: An apparatus for coating stents and a method of using the same is provided.Type: GrantFiled: March 15, 2002Date of Patent: June 19, 2007Assignee: Advanced Cardiovascular Systems, Inc.Inventor: Syed F. A. Hossainy
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Patent number: 7226637Abstract: An information layer for an optical information storage medium is formed in a centrifuge. A photopolymerizable composition is applied to a solid base having a relief pattern, and a flexible, transparent film layer is applied on top of the composition. The three are spun in a centrifuge to cause a thin, even distribution of the photopolymerizable composition, which is photopolymerized. The resulting replica is separated from the relief pattern and has a fluorescent material applied thereto. Alternatively, the replica has a non-fluorescent material applied thereto, and the non-fluorescent material is made fluorescent through diffusion. Multiple information layers thus formed can be glued together to form a multilayer optical information storage medium.Type: GrantFiled: January 18, 2001Date of Patent: June 5, 2007Assignee: D Data Inc.Inventors: Galina Dorozhkina, Irina Kiryusheva, Eugene Levich, Alexey Lezhnev, Dmitry Pebalk
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Patent number: 7211150Abstract: A coating and drying apparatus for the application of a coating substance to a stent and drying the stent is provided.Type: GrantFiled: December 9, 2002Date of Patent: May 1, 2007Assignee: Advanced Cardiovascular Systems, Inc.Inventors: Arkady Kokish, Yung-Ming Chen, Jason Van Sciver, Roberto Listek
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Patent number: 7208046Abstract: A system for applying a sprayed coating includes a spray mechanism operative to spray a liquefied coating material; a target system including a rotatable spray target wheel; and one or more device-holding fixtures configured to be mounted onto the spray target wheel without requiring either an unattached threaded fastener or a locking pin. Preferred embodiments of the system are configured for thermal spray application of Tamper Resistant Coatings (TRCs).Type: GrantFiled: January 10, 2003Date of Patent: April 24, 2007Assignee: White Electronic Designs CorporationInventors: Curtis Wayne Anderson, Lenard Reeves, Bjarne Heggli, Thomas William Dowland, Jr.
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Patent number: 7192484Abstract: A coating apparatus for coating a rollable device including a device rotator having a pair of rollers and spray nozzle is described. The spray nozzle produces a spray of coating material that is directed towards a gap that is between the rollers of the pair. The majority of any spray not deposited on the rollable device during a coating process passes through the gap between the rollers.Type: GrantFiled: September 27, 2002Date of Patent: March 20, 2007Assignee: SurModics, Inc.Inventors: Ralph A. Chappa, Mark F. Carlson
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Patent number: 7179333Abstract: A machine for applying sealant material to non-circular closures using a rotating chuck connected to a rotational motor and a fixedly mounted dispensing apparatus. The chuck is also moved in at least one linear direction in a plane normal to the rotational axis of the chuck. The rotational motor may be connected to the chuck using various mechanisms while minimizing the moving mass of the machine. Sealant applicators are also disclosed that are mounted on a turret and use independently controlled motors, or fully integrated servomotors to rotate the chuck.Type: GrantFiled: September 23, 2003Date of Patent: February 20, 2007Assignee: Computrol, Inc.Inventors: Scott J. Woolley, William W. Weil, Ian J. Buckley, James N. McBride
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Patent number: 7179332Abstract: A process and apparatus for adding glue to a flow (L) of loose wooden material, in particular a flow of wood chips and fibers, in which the wooden material is introduced through an inlet (3) into a mixer device (4). The glue is sprayed onto the flow of wooden material, internally of the mixer device (4), by nozzles (21) arranged in proximity of the inlet (3). The mixer device (4) is crossed by a flow of hot air. The wooden material, mixed with the glue, after having crossed the mixer device, drawn by the flow of hot air, is removed via an outlet (10) and sent on to subsequent work operations. The invention serves in particular in the manufacturing of wood-chip and fiber panels. The panels obtained are of high quality, being practically devoid of surface imperfections.Type: GrantFiled: July 10, 2001Date of Patent: February 20, 2007Assignee: IMAL S.r.l.Inventor: Paolo Benedetti
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Patent number: 7147893Abstract: A disc is produced using a method of and an apparatus for forming a transparent layer on a disc substrate. The method for forming the transparent layer on the disc substrate includes covering an axial hole formed at a center of the disc substrate with a cover element by inserting a protrusion of the cover element in the axial hole of the disc substrate so that a resin does not leak through the axial hole, dispensing the resin toward the center of the disc substrate from an upper side of the disc substrate, and removing the cover element. A more uniform transparent layer can be obtained throughout the disc substrate.Type: GrantFiled: August 14, 2002Date of Patent: December 12, 2006Assignee: Samsung Electronics Co., Ltd.Inventors: Do-hoon Chang, Myong-do Ro, Du-seop Yoon, Chang-min Park
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Patent number: 7132125Abstract: A process including: providing a cylindrical substrate rotating about the long axis; applying at least one coating layer with a direct writing applicator on the outer surface of the rotating substrate; and curing the resulting coated layer or layers. The use of a direct writing applicator provides precision in the dispensing of organic photoconductor coating layers with respect to line width and line thickness.Type: GrantFiled: December 12, 2001Date of Patent: November 7, 2006Assignee: Xerox CorporationInventors: John M. Hammond, Thomas A. Trabold
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Patent number: 7087118Abstract: A coating film forming apparatus for forming a film by applying a coating solution to a substrate, which is provided with a cassette section, coating unit, developing unit, pre-treatment/post-treatment units and a main arm for transferring the substrate between the respective units. In the coating unit, provided is a coating section in which a resist is applied on the substrate in a manner of single stroke by intermittently moving the substrate in a Y-direction and by moving a nozzle in an X-direction, and provided is a reduced-pressure drying section for drying under reduced pressure the substrate after being applied, and further provided is equipment for removing the coating film adhered to a periphery of the substrate. Additionally, when the reduced-pressure drying section is arranged outside the coating unit, the main arm is covered with a cover so that the inside thereof is under a solvent atmosphere.Type: GrantFiled: March 16, 2005Date of Patent: August 8, 2006Assignee: Tokyo Electron LimitedInventors: Takahiro Kitano, Masateru Morikawa, Yukihiko Esaki, Nobukazu Ishizaka, Norihisa Koga, Kazuhiro Takeshita, Hirofumi Ookuma, Masami Akimoto
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Patent number: 7083683Abstract: An apparatus for the forming a covering on surfaces of solid bodies in a coating chamber. The covering is homogeneous and has a constant layer thickness on the surface of the solid bodies while being flexible for use of different liquids including solid materials. A liquid including solid materials is fed to a surface rotating about an axis of rotation, or a surface area of a rotating member. Channel and/or nozzle members forming liquid droplets are arranged on a radially outer edge area of the rotating member.Type: GrantFiled: July 1, 2004Date of Patent: August 1, 2006Assignee: Glatt Systemtechnik GmbHInventors: Hans Schneidereit, Heinz Pritzke
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Patent number: 7083682Abstract: A coating assembly paints a coating on a plurality of articles having first and second article portions. The coating assembly includes a rail frame defining a longitudinal path for the plurality of articles to travel along. An endless chain having a chain portion thereof extending along the longitudinal path transports the plurality of articles along the longitudinal path. The coating assembly also includes a painting station for applying a coat of paint to the first article portion of each of the plurality of articles while preventing the coat of paint from extending to the second article portions of each of the plurality of articles. The painting station includes a plurality of spray nozzles fixedly secured to the rail frame on either side of the endless chain. Each of the plurality of spray nozzles are offset from each other along the longitudinal path such that the first article portions are entirely covered by the coat of paint as the plurality of articles pass thereby.Type: GrantFiled: September 24, 2004Date of Patent: August 1, 2006Assignee: The Magni Group, Inc.Inventor: Thomas A. DeVilbiss, III
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Patent number: 7077910Abstract: The invention provides an apparatus for coating a device comprising a coating chamber and a device rotator having at least one device mount wherein the apparatus allows insertion and retraction of the device on the device mount into and out of the coating chamber. In another aspect, the invention provides a method of applying a substantially uniform coating on a device comprising the steps of providing an apparatus for coating a device, mounting the device onto the device mount, purging the coating chamber to reduce humidity in the coating chamber, maintaining a reduced humidity content in the coating chamber, inserting the device into the coating chamber, disposing a coating material on the device and rotating the device mounts about the device axis.Type: GrantFiled: April 7, 2003Date of Patent: July 18, 2006Assignee: SurModics, Inc.Inventors: Ralph A. Chappa, Steven J. Porter
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Patent number: 7048801Abstract: A chemical pump includes a pressure chamber, a partition member for dividing the pressure chamber into a cleaning pressure chamber and a discharging pressure chamber, a filter part disposed on the primary side of the discharging pressure chamber, and a single drive mechanism. A pair of openings with respective check valves mounted therein are provided in each of the cleaning and discharging pressure chambers, and are positioned so as to cause a resist solution to flow only in the +Z direction. The drive mechanism moves the partition member in the ?X direction to cause the resist solution to be sucked into the cleaning pressure chamber and to cause the resist solution to be discharged from the discharging pressure chamber.Type: GrantFiled: October 7, 2003Date of Patent: May 23, 2006Assignee: Dainippon Screen Mfg. Co., Ltd.Inventor: Akihiko Morita
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Patent number: 7041171Abstract: For use in a rotational casting machine used for coating a rotating body with elastomer, such as polyurethane, there is provided a nozzle used for dispensing the liquid polyurethane onto the rotating body to be coated. The outlet of the nozzle is a narrow, elongated slit or opening. However, the interior passageway of the nozzle continually changes shape from the inlet to the outlet thereof, in order to ensure a constant cross-sectional area of the interior passageway along the length thereof, and in order to arrive at the desired narrow, elongated outlet-opening, whereby laminar flow of the liquid polyurethane is achieved with the concomitant reduced dwell-time of the liquid polyurethane therein, in order to reduce build up and clogging of the nozzle.Type: GrantFiled: September 10, 2003Date of Patent: May 9, 2006Assignee: Kastalon, Inc.Inventors: R. Bruce DeMent, Paul Werstler
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Patent number: 7030039Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.Type: GrantFiled: June 30, 2001Date of Patent: April 18, 2006Assignee: ASML Holding N.V.Inventors: Emir Gurer, Tom Zhong, John Lewellen, Edward C. Lee, Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Edmond R. Ward, Jung-Hoon Chun, Sangjun Han
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Patent number: 7011863Abstract: A substrate which has been subjected to heat processing in any of hot plate units is transferred to a normal cooling unit by a transfer device and subjected to cooling processing to some extent, and then transferred to a high accuracy cooling unit and subjected to cooling processing with high accuracy, and thereafter transferred to any of coating units or a developing units. Thereby, the substrate can be subjected to the cooling processing with high accuracy and thereafter to coating processing with no increase in apparatus cost and with no decrease in throughput.Type: GrantFiled: August 19, 2002Date of Patent: March 14, 2006Assignee: Tokyo Electron LimitedInventor: Masami Akimoto
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Patent number: 7008480Abstract: Disclosed is a photoresist coating apparatus capable of preventing a substrate from being contaminated and preventing a pattern bridge phenomenon from being created in the substrate during an exposure process by shielding backflow of photoresist through forcibly exhausting photoresist to an exterior. The photoresist coating apparatus includes a vacuum chuck for holding a substrate by using vacuum, a driving motor connected to the vacuum chuck through an arm, a first nozzle for coating photoresist onto the substrate, a second nozzle for performing a rinse process, a bath surrounding the vacuum chuck to prevent photoresist from being discharged to an exterior, a first drain pipe connected to both lower ends of the bath in order to discharge photoresist contained in the bath, and a photoresist discharge section for forcibly discharging photoresist contained in the bath to the exterior.Type: GrantFiled: July 9, 2004Date of Patent: March 7, 2006Assignee: Hynix Semiconductor Inc.Inventor: Jae Doo Eom
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Patent number: 7008204Abstract: An extrusion die for extruding biodegradable material, the extrusion die comprising: a mandrel; a nozzle extending from the mandrel; an outer member positioned near the mandrel; an extrusion orifice between the mandrel and the outer member; a member in communication with at least one defining member of the extrusion orifice, wherein the member is capable of producing relative movement between the outer member and the mandrel, wherein the relative movement has a component transverse to an extrusion direction of biodegradable material through the extrusion orifice; a flow control device which controls flow of biodegradable material through the extrusion die; and a positioning device which positions the outer member and the mandrel relative to each other.Type: GrantFiled: June 18, 2003Date of Patent: March 7, 2006Assignee: Amylex CorporationInventors: Hans G. Franke, Don R. Bittner
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Patent number: 7001086Abstract: A developing method comprises determining in advance the relation of resist dissolution concentration in a developing solution and resist dissolution speed by the developing solution, estimating in advance the resist dissolution concentration where the resist dissolution speed is a desired speed or more from the relation, and developing in a state in which the resist dissolution concentration in the developing solution is the estimated dissolution concentration or less.Type: GrantFiled: October 21, 2004Date of Patent: February 21, 2006Assignee: Kabushiki Kaisha ToshibaInventors: Masamitsu Itoh, Ikuo Yoneda, Hideaki Sakurai
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Patent number: 6989061Abstract: For use in a rotational casting machine used for coating a rotating body with elastomer, such as polyurethane, there is provided a nozzle used for dispensing the liquid polyurethane onto the rotating body to be coated. The outlet of the nozzle is a narrow, elongated slit or opening. However, the interior passageway of the nozzle continually changes shape from the inlet to the outlet thereof, in order to ensure a constant cross-sectional area of the interior passageway along the length thereof, and in order to arrive at the desired narrow, elongated outlet-opening, whereby laminar flow of the liquid polyurethane is achieved with the concomitant reduced dwell-time of the liquid polyurethane therein, in order to reduce build up and clogging of the nozzle.Type: GrantFiled: August 22, 2003Date of Patent: January 24, 2006Assignee: Kastalon, Inc.Inventors: R. Bruce DeMent, Paul Werstler
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Patent number: 6982002Abstract: The apparatus of the present invention for forming a coating film on a substrate by applying a coating liquid to the substrate comprises: a spin chuck for holding the substrate; a motor for rotating the spin chuck; and a nozzle for dropping the coating liquid on the center surface of the substrate. The nozzle included a spiral groove or a plurality of fins for giving a gyrating force to the dropped coating liquid.Type: GrantFiled: February 11, 2002Date of Patent: January 3, 2006Assignee: Tokyo Electron LimitedInventors: Takashi Tanaka, Shinji Nagashima
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Patent number: 6982102Abstract: The present invention is a coating unit for applying a coating solution on a substrate, comprising: a container enclosing the substrate; a casing for accommodating the container therein; a supply device for supplying a predetermined gas into the casing; a first exhaust pipe for exhausting an atmosphere inside the container; a second exhaust pipe for exhausting an atmosphere inside the casing; a first adjusting device which is disposed in the first exhaust pipe, for adjusting a flow rate of an atmosphere passing through the first exhaust pipe; and a second adjusting device which is disposed in the second exhaust pipe, for adjusting a flow rate of an atmosphere passing through the second exhaust pipe. According to the present invention, the second exhaust pipe is usable for adjusting the exhaust flow rate to maintain a pressure inside the casing at a positive pressure.Type: GrantFiled: March 17, 2004Date of Patent: January 3, 2006Assignee: Tokyo Electron LimitedInventors: Hiroichi Inada, Shinichi Hayashi
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Patent number: 6977098Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.Type: GrantFiled: February 28, 2001Date of Patent: December 20, 2005Assignee: ASML Holding N.V.Inventors: Emir Gurer, Tom Zhong, John Lewellen, Ed Lee, Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Edmond R. Ward
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Patent number: 6969538Abstract: The present invention relates to a method for heat processing a substrate. After a coating film is formed on the substrate, the substrate is baked at a predetermined high temperature. The baking step is performed by first increasing the substrate temperature from a predetermined low temperature to a predetermined intermediate temperature that is lower than a predetermined reaction temperature at which the coating film reacts. Next, a second baking step maintains the substrate at the predetermined intermediate temperature for a predetermined period of time, and is followed by a third step of increasing the temperature of the substrate to the predetermined high temperature that is higher than the predetermined reaction temperature. This results in uniform temperature within the surface of the substrate when the temperature of the substrate reaches the reaction temperature. Consequently, a chemical reaction due to heat processing of the coating film within the surface of the substrate is performed uniformly.Type: GrantFiled: September 7, 2001Date of Patent: November 29, 2005Assignee: Tokyo Electron LimitedInventors: Masatoshi Deguchi, Eiichi Sekimoto, Koichi Asaka, Yuji Matsuyama
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Patent number: 6960257Abstract: A processor for processing integrated circuit wafers, semiconductor substrates, data disks and similar units requiring very low contamination levels. The processor has an interface section which receives wafers in standard wafer carriers. The interface section transfers the wafers from carriers onto novel trays for improved processing. The interface unit can hold multiple groups of multiple trays. A conveyor having an automated arm assembly moves wafers supported on a tray. The conveyor moves the trays from the interface along a track to several processing stations. The processing stations are accessed from an enclosed area adjoining the interface section.Type: GrantFiled: May 7, 2003Date of Patent: November 1, 2005Assignee: Semitool, Inc.Inventors: Raymon F. Thompson, Robert W. Berner, Gary L. Curtis, Stephen P. Culliton, Blaine G. Wright, Darryl S. Byle
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Patent number: 6946032Abstract: An installation for powder coating articles, in particular vehicle bodies, comprises a coating booth, in which a plurality of application devices for the powder coating may be arranged. The articles to be coated are located during the coating process on a rotating rotary stand. Application devices located in various angular positions relative to the axis of the rotary stand may be charged with powder coatings of different colors. A collecting hopper is located at the bottom of the coating booth, the outlet opening of which collecting hopper may be brought as desired into connection with various recovery devices for powder overspray. To coat articles of different colors, the application devices charged with powder coating of the appropriate color are activated in each case and the recovery device which collects the powder of the corresponding color is brought into connection with the outlet opening of the collecting hopper.Type: GrantFiled: March 2, 2002Date of Patent: September 20, 2005Assignee: Eisenmann Maschinenbau KG (Komplementar: Eisenmann-Stiftung)Inventors: Werner Pohl, Wolfgang Bezner, Jürgen Hanf, Peter Abel
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Patent number: 6932870Abstract: A process and system for applying an adhesive to a core during the production of rolled paper products is disclosed. The system of the present invention is generally directed to the use of pumping devices that meter out constant volumetric amounts of an adhesive onto a core through a plurality of adhesive applicators simultaneously. The systems includes, for instance, a positive displacement pump system in which a fluid at substantially constant pressure is fed to a pumping device for dispensing the adhesive to a plurality of adhesive applicators in constant volumetric amounts.Type: GrantFiled: May 3, 2002Date of Patent: August 23, 2005Assignee: Kimberly-Clark Worldwide, Inc.Inventors: Alexander F. Gunn, Richard A. Horton, Jason A. McDavid, Christopher L. Satori, Elizabeth E. Metz, Teresa M. Kaufman, Mark J. Hassman, Charles B. Strother, William H. Gilmore, Jr., Christopher R. Fahrbach
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Patent number: 6916503Abstract: A method of coating a coating liquid on a base material having a curved surface portion, includes processes of: a coating process of coating a coating liquid on a base material; and a rotating process of rotating the base material coated with the coating liquid.Type: GrantFiled: August 29, 2002Date of Patent: July 12, 2005Assignee: Konica CorporationInventors: Masahiro Morikawa, Kazumi Furuta, Osamu Masuda, Akiko Kuji
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Patent number: 6913651Abstract: An apparatus of the invention has a closable chamber that can be sealed and is capable of withstanding an increased pressure and high temperature. The chamber contains a substrate holder that can be rotated around a vertical axis, and an edge-grip mechanism inside the substrate holder. The deposition chamber has several inlet ports for the supply of various process liquids, such as deposition solutions, DI water for rinsing, etc., and a port for the supply of a gas under pressure. The apparatus is also provided with reservoirs and tanks for processing liquids and gases, as well as with a solution heater and a control system for controlling temperature and pressure in the chamber. The heater can be located outside the working chamber or built into the substrate holder, or both heaters can be used simultaneously. Uniform deposition is achieved by carrying out the deposition process under pressure and under temperature slightly below the boiling point of the solution.Type: GrantFiled: March 22, 2002Date of Patent: July 5, 2005Assignee: Blue29, LLCInventors: Igor Ivanov, Jonathan Weiguo Zhang, Artur Kolics
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Patent number: 6905734Abstract: A system and method is disclosed for applying polyurethane to a roll that is primarily used in the papermaking industry. One advantage of the present system and method is that the polyurethane may be applied to the roll in one pass of a traversing mechanism along the length of the roll while the roll rotates, thus significantly decreasing processing time of the roll.Type: GrantFiled: November 7, 2002Date of Patent: June 14, 2005Assignee: Coldwater Resins, Inc.Inventors: William David Withers, Thomas Cody Merrion, Charles Humbert Rhoads
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Patent number: 6890588Abstract: A rotatable vacuum chamber receives an optical connector having an output face on which an optical gel is applied substantially without entrapped air. Opposite the output face is placed a gel dispenser with its opened nozzle pointing towards the output face. Uncured gel components contained in the dispenser are outgased prior to application of the gel on the output face while a vacuum is maintained in the chamber. Outgasing takes place at a first chamber orientation with the nozzle pointing upwards through which the outgasing air ventilates. The gel is applied at a second chamber orientation where the output face is horizontal and upwards pointing. Immediately following the gel application, the vacuum is unmade to prevent cooking of the mixed and uncured gel. A glass plate is then pressed against the applied fluid gel.Type: GrantFiled: September 5, 2002Date of Patent: May 10, 2005Assignee: Intel CorporationInventor: Janusz Liberkowski
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Patent number: 6890595Abstract: A method for coating low viscosity materials onto a wafer to form a uniform film. After a wafer is rotated at a first rotation speed, coating solution is dispensed onto the wafer. The wafer is decelerated to a second rotation speed at a first deceleration rate to spread the coating solution. Next, the wafer is slowly decelerated to a third rotation speed at a second deceleration rate considerably lower than the first deceleration rate, so the coating solution reflows to the center of the wafer. The wafer is then quickly accelerated to a fourth rotation speed at a third acceleration rate larger than the first deceleration rate to spread the coating solution again.Type: GrantFiled: December 5, 2002Date of Patent: May 10, 2005Assignee: Nanya Technology CorporationInventors: Ai-Yi Lee, Wen-Chi Chang
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Patent number: 6884294Abstract: A coating solution is sprayed on a rotating wafer held horizontally from a nozzle provided above the wafer while the nozzle is travelling over the wafer from a wafer center to a wafer outer area, thus spirally spraying the coating solution on the wafer. The nozzle stops when the coating solution has reached the wafer outer area and the coating solution is sprayed in circle on the wafer outer area while the wafer is rotating. A coating solution including a component of a coating film and a solvent may be sprayed on a first area to be coated of the wafer and the coating solution and a solvent for the coating film may be sprayed on a second edge area located outside the first area of the wafer.Type: GrantFiled: April 16, 2002Date of Patent: April 26, 2005Assignee: Tokyo Electron LimitedInventors: Tomohide Minami, Shinichi Sugimoto, Takahiro Kitano, Jun Ookura, Hiroaki Kurishima
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Patent number: 6878401Abstract: A specific amount of a processing solution is supplied on a wafer by spraying the processing solution from a first end (tip) of a nozzle. The solution surface of the processing solution remaining in the nozzle is sucked back to a second end side of the nozzle by aspirating the remaining processing solution to the second end side. The first end of the nozzle is then soaked into a fluid. The processing solution remaining in the nozzle is aspirated to the second end side to aspirate a specific amount of the fluid into the first end of the nozzle for further sucking back the solution surface of the processing solution to the second end side, thus the solution surface of the processing solution being not touching the fluid.Type: GrantFiled: September 27, 2002Date of Patent: April 12, 2005Assignee: Tokyo Electron LimitedInventors: Kazuhiro Nishijima, Tsuyoshi Mizuno
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Patent number: 6878203Abstract: A resin application station has processing units for heating dynamo-electric machine components. In one or more of the processing units batches of components are placed in fixtures on vertically rotating support plates. The vertically rotating support plates are mounted in cabinets. Heated air is circulated in the cabinets to control the ambient temperature. The components travel through regions of the controlled temperature ambient as the support plates rotate and are heated to process temperatures. Intermittent rotation of a support plate in a unit allows loading and unloading of an individual component from the unit while the support plate is stationary. The support plate rotations in all the units are synchronized to increase the station throughput.Type: GrantFiled: February 11, 2002Date of Patent: April 12, 2005Assignee: Axis USA, Inc.Inventors: Raffaele Becherucci, Gianfranco Stratico
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Patent number: 6875467Abstract: A method of preparing a multi-layer, crack resistant sol-gel glass derived coating on a substrate by removing the outer periphery of each layer before curing the layer and depositing any succeeding layer.Type: GrantFiled: December 15, 2002Date of Patent: April 5, 2005Assignee: Optinetrics, Inc.Inventors: Fernando A. Sigoli, Lothar U. Kempen, Edgar A. Mendoza
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Patent number: 6875466Abstract: The wafer coated with the resist is deliberately placed in the vapor before being transferred to an aligner that exposes the resist on the wafer, the vapor, for example, the moisture, uniformly adheres onto the resist on the wafer. As a result, the substrate can uniformly be exposed in the following exposing process, and the uniformity of the line width and the like can be improved.Type: GrantFiled: November 21, 2002Date of Patent: April 5, 2005Assignee: Tokyo Electron LimitedInventors: Hidefumi Matsui, Junichi Kitano
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Patent number: 6872418Abstract: A method for forming a film using a rotating cup application apparatus in which a rotatable inner cup is provided within an outer cup, the upper openings of the inner cup and the outer cup are closed with corresponding lids, and the lid for the inner cup is integrally rotated together with the inner cup, the method comprising the steps of setting a material to be treated, on which wiring layers have been formed, in the rotating cup application apparatus, applying SOG onto the surface of the material to be treated, thereafter closing the upper openings of the inner cup and the outer cup with the lids, rotating the inner cup in this state to thereby uniformly diffusing the SOG, repeating the SOG application and diffusing steps, and thereafter baking the material to be treated in a heat treatment apparatus.Type: GrantFiled: September 25, 2002Date of Patent: March 29, 2005Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventor: Hiroki Endo
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Patent number: 6869640Abstract: A coating film is formed by the steps of supplying a mixture of a solvent for dissolving a coating liquid and a volatilization suppressing substance for suppressing the volatilization of the solvent onto the surface of the target substrate W, expanding the mixture onto the entire surface of the target substrate W, and supplying a coating liquid onto substantially the central portion of the target substrate W that has received the mixture while rotating the target substrate W thereby expanding the coating liquid outward in the radial direction of the target substrate W thereby forming a coating film.Type: GrantFiled: June 6, 2002Date of Patent: March 22, 2005Assignee: Tokyo Electron LimitedInventors: Kousuke Yoshihara, Yuichi Terashita
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Patent number: 6866887Abstract: Electro-optic structures are constructed by spin coating water based emulsions or solvent based sensor materials, preferably a solvent-based polymer dispersed liquid crystal (PDLC), onto a substrate under conditions of controlled solvent evaporation. In a particular process, the uniformity of the PDLC coating is achieved by 1) spin coating in a semi-sealed chamber, 2) “converting” a square substrate into round substrate by using a fixture; 3) providing a controllable distance between the substrate and a spin coater top cover; and 4) providing a controllable solvent evaporation rate.Type: GrantFiled: October 14, 2003Date of Patent: March 15, 2005Assignee: Photon Dynamics, Inc.Inventors: Xianhai Chen, Alexander Nagy
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Patent number: 6866719Abstract: An apparatus for coating a fabric substrate comprising a housing frame, a continuous moving conveyor moving along a generally circular path and mounted to the housing frame; a plurality of vertically oriented mandrels removably mounted on the conveyor for receiving an article to be coated; a fixed coating station adjacent the path for applying a quantity of a coating to at least a portion of the article to be coated, the coating station including a solenoid for controlling the amount and pattern of the coating substance onto the article to be coated; a pivotable arm for gripping and removing the article to be coated after the coating station, the pivotable arm including a pair of cooperating gripping members for gripping the article to be coated. The coating is a non-sticky, high coefficient of friction polymer with additional components.Type: GrantFiled: July 24, 2002Date of Patent: March 15, 2005Assignee: C&S Automated Systems, Inc.Inventor: Michael Harry Crane
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Patent number: 6860946Abstract: Methods of coating an implantable device and a system for performing such methods are disclosed. An embodiment of the method includes applying a coating substance to the surface of an implantable device, and rotating the implantable device in a centrifuge. The method can uniformly coat the implantable device with the coating substance and to remove unwanted accumulations of coating substance entrained between struts or crevices in the implantable device body. This system is applicable to methods for coating intraluminal stents, synthetic grafts, and stent coverings with therapeutic compositions comprising therapeutic agents mixed with a polymeric matrix and a solvent.Type: GrantFiled: March 5, 2003Date of Patent: March 1, 2005Assignee: Advanced Cardiovascular Systems, Inc.Inventors: Syed F. A. Hossainy, Jeffrey Steward
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Patent number: 6860944Abstract: A process chamber is provided which includes a gate configured to align barriers with an opening of the gate and an opening of the process chamber such that the two openings are either sealed or provide an air passage to the chamber. A method is provided and includes sealing an opening of a chamber with a gate latch and exposing a topography to a first set of process steps, opening the gate latch such that an air passage is provided to the process chamber, and exposing the topography to a second set of process steps without allowing liquids within the chamber to flow through the air passage. A substrate holder comprising a clamping jaw with a lever and a support member coupled to the lever is also contemplated herein. A process chamber with a reservoir arranged above a substrate holder is also provided herein.Type: GrantFiled: June 16, 2003Date of Patent: March 1, 2005Assignee: Blue29 LLCInventors: Igor C. Ivanov, Welguo Zhang