Abstract: A stent mandrel fixture for supporting a stent during the application of a coating substance is provided.

Abstract: A coating apparatus includes a liquid film forming mechanism configured to form a liquid film of a process liquid for preventing a contaminant derived from a coating liquid from being deposited or left on a back side peripheral portion of a substrate. The liquid film forming mechanism includes a counter face portion facing the back side peripheral portion of the substrate and a process liquid supply portion for supplying the process liquid onto the counter face portion. The coating apparatus further includes a posture regulating mechanism disposed around the substrate holding member and configured to damp a vertical wobble of the peripheral portion of the substrate being rotated. The posture regulating mechanism includes delivery holes arrayed in a rotational direction of the substrate and configured to deliver a gas onto a back side region of the substrate on an inner side of the peripheral portion.

Abstract: A wet processing system detects a globule of a process solution in a drippy or dripping state from the tip of any one of process solution pouring nozzles being moved to a pouring position for pouring the process solution onto a substrate by obtaining image data on the process solution pouring nozzle, and takes proper measures to prevent the process solution from dripping. A wet processing system 1 pours a process solution, such as a resist solution, through one of process solution pouring nozzles 10 onto a surface of a substrate, such as a wafer W, held substantially horizontally by a substrate holding device 41 surrounded by a cup 5 to process the surface by a wet process. A nozzle carrying mechanism 10a carries the process solution pouring nozzles 10 between a home position on a nozzle bath 14 and a pouring position above the substrate held by the substrate holding device 41. An optical image of the tips of the process solution pouring nozzles 10 is obtained by an image pickup means, such as a camera 17.

Abstract: A method and device for wet treatment of plate-like articles includes, a chuck for holding a single plate-like article having an upwardly facing surface for receiving liquid running off a plate-like article when being treated with liquid, wherein the chuck is outwardly bordered by a circumferential annular lip. The chuck has an outer diameter greater than the greatest diameter of the plate-like article to be treated, and a rotatable part with an upwardly facing ring-shaped surface for receiving liquid running off the circumferential lip of the chuck. The rotatable part is rotatable with respect to the chuck, the ring-shaped surface is coaxially arranged with respect to the circumferential annular lip, the inner diameter of the ring-shaped surface is smaller than the outer diameter of the chuck, and the distance d between the lip and the upwardly facing ring-shaped surface is in a range from 0.1 mm to 5 mm.

Abstract: A coating apparatus includes a driving unit configured to rotate a substrate holding member about a vertical axis to spread a coating liquid supplied on a front side central portion of a substrate toward a front side peripheral portion of the substrate by a centrifugal force. The apparatus is provided with a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate and configured to damp a wobble of the substrate being rotated by delivering a gas from the delivery port and sucking the gas into the suction port.

Abstract: A resist coating method supplies a resist solution to substantially the center of a target substrate to be processed while rotating the target substrate at a first rotational speed, then reduces a rotational speed of the target substrate to a second rotational speed lower than the first rotational speed, reduces the rotational speed of the target substrate to a third rotational speed lower than the second rotational speed or until rotational halt to adjust the film thickness of the resist solution, and accelerates the rotation of the target substrate to a fourth rotational speed higher than the third rotational speed to spin off a residue of the resist solution.

Abstract: A resin layer formation method, resin layer formation device, disk and disk manufacturing method for making a resin layer uniform on a substrate before lamination or on a substrate to be coated by a simple procedure are provided. Adhesive A is coated at the inner circumference side while rotating a substrate P at low speed, a first adhesive layer AL1 is formed on the surface of the substrate P by rotating the substrate P at high speed, a step difference section H is formed around a rotation center of the substrate P by irradiating ultraviolet on an area in the inner circumference side of the first adhesive layer AL1 and hardening the area, the adhesive A is coated at the rotation center side from the step difference section H on the substrate P, and a second adhesive layer AL2 is formed on the first adhesive layer AL1 by rotating the substrate P at high speed. The first adhesive layer AL1 and the second adhesive layer AL2 are integrated to form a uniform adhesive layer B as a whole.

Abstract: A substrate processing apparatus is provided. The substrate processing apparatus includes a substrate supporting member including a spin head on which a substrate is placed, a nozzle discharging processing liquid to the substrate placed on the spin head, and a processing liquid supplying source supplying the processing liquid to the nozzle. The nozzle includes a nozzle main body that has a plurality of discrete discharging openings and an integration discharging opening. The discrete discharging openings have a slit-shaped cross section having a first length and are arrayed in series in a predetermined direction. The integration discharging opening is formed by connecting the discrete discharging openings to each other in a single slot shape having a length greater than the first length, and finally discharges the processing liquid.

Abstract: A coating film forming apparatus that holds a substrate upon a spin chuck and forms a coating film by supplying a chemical liquid upon a top surface of said substrate comprises: an outer cup provided detachably to surround the spin chuck; an inner cup provided detachably to surround a region underneath the substrate held upon the chuck; a cleaning nozzle configured to supply a cleaning liquid for cleaning a peripheral edge part of the substrate, such that the cleaning liquid is supplied to a peripheral part of a bottom surface of the substrate; a cutout part for nozzle mounting, the cutout part being provided to the inner cup to engage with the cleaning nozzle; and a cleaning liquid supply tube connected to the cleaning nozzle, the cleaning nozzle being detachable to the cutout part in a state in which the cleaning liquid supply tube is connected.

Abstract: A support assembly for a stent and a method of using the same to coat a stent are provided. The support assembly provides for minimum contact between the stent and the support assembly so as to reduce or eliminate coating defects.

Abstract: An apparatus for applying a layer to a hydrophobic surface. The apparatus including: a chuck having a top surface and rotatable about a axis perpendicular to the top surface and passing through a center point of the top surface; and hollow first and second dispense nozzles having respective first and second bores, the first and second dispense nozzles mounted on a application head disposed above the top surface of the chuck, the application head moveable in a direction parallel to the top surface of the chuck, the first dispense nozzle alignable over the center point when the application head is in a first position and the second dispense nozzle alignable over the center point when the application head is in a second position, at least a portion of the bore of second dispense tube having a maximum cross-sectional dimension of between about 0.5 millimeters and about 2.0 millimeters.

Abstract: A fastener suitable for use in airplane manufacture or repair that is coated with a pre-mixed moisture cure sealant. The sealant layer is coated with a frangible moisture barrier that will break apart when the fastener is installed, thus exposing the sealant to atmospheric moisture. Once exposed to moisture, the sealant will begin to cure. Preferred embodiments also provide a moisture indicator that provides a visual indication that the outer moisture resistant layer has been damaged.

Abstract: To manufacture a photochromic lens by uniformly applying a coating liquid having a photochromic function without leaving an uncoated area, with a minimum necessary coating amount. There is provided a manufacturing method of the photochromic lens for dripping and applying a coating liquid 9 having the photochromic function onto a coating surface 2 of a spectacle lens, while rotating a spectacle lens 1, and forming a photochromic film having the photochromic function on the coating surface, comprising dripping (ring-shaped drip part 25) the coating liquid in a ring shape in the vicinity of an outer circumference on the coating surface of the spectacle lens, and thereafter dripping (spiral-shaped drip part 26) the coating liquid in a spiral shape toward a geometrical center or an optical center of the spectacle lens from the vicinity of the outer circumference, wherein the coating surface has a convex curved shape, and a viscosity of the coating liquid is 25 to 500 cps at 25° C.

Abstract: This invention relates to a multi-purpose holding device to handle, support and rotate one or more hollow cylindrical objects. The holding device consists of a rigid frame and support members for precise alignment and rotation of one or more objects within the frame structure. A method is also provided to reproducibly support, rotate and inspect the hollow cylindrical objects.

Abstract: Disclosed is a silver thin film spread apparatus by means of deposition of nano metallic silver, the apparatus comprising: a treatment booth formed at one side with an inlet for inputting a substrate, and formed at the other side with an outlet for discharging the substrate; a transfer device formed at a lower side of the treatment booth for transferring the substrate; a spray device formed at an upper side of the treatment booth for spraying silver solution on a surface of the substrate; a moving device for linearly reciprocating the spray device; and a rotation device formed at the lower side of the treatment booth for rotating the substrate, whereby reflectivity can be enhanced by increasing film compactness and coating uniformity of thin film, where the substrate is rotated at a predetermined constant speed to allow the spray guns to linearly reciprocate and to allow the nano silver thin film to be uniformly spread and deposited on the surface of the substrate at a predetermined constant frequency.

Abstract: Provided is a coating device including: a rotating part which rotatably holds a substrate while the substrate is upright; a cup portion disposed to surround an outer periphery of the substrate held by the rotating part and having an opening which exposes a first surface and a second surface of the substrate; a coating part which includes a nozzle ejecting a liquid material to the first surface and to the second surface of the substrate through the opening; and a cover portion which is provided on the first surface and the second surface sides of the substrate and by which the opening is opened and closed.

Abstract: A coating apparatus comprises a tray, a nozzle for supplying a coating liquid, and a squeegee which serves as an applicator for spreading a coating liquid. The tray has a recessed portion into which a substrate is placed, and a spinner chuck is provided in the recessed portion. In the spinner chuck, a chuck for attracting the substrate is attached to the upper end of a spinner shaft which can be lifted and lowered, and the upper surface of the chuck and the bottom surface of the recessed portion are arranged to be in the same plane in a state where the spinner shaft is lowered to the lowest position.

Abstract: In a substrate-processing apparatus for performing coating, baking and developing processes on a semiconductor substrate, a first processing block performs a coating process and a developing process. A second processing block is disposed opposite to the first processing block to heat-treat substrates. A main transfer block is disposed between the first and second processing blocks to transfer the substrates. A third processing block is disposed on one side of the main transfer block in a direction perpendicular to an arrangement direction of the first and second processing blocks to adjust a temperature of the substrates. An auxiliary transfer block is disposed adjacent to the second and third processing blocks to transfer the substrates between the second and third processing blocks. Thus, an overload of the main transfer block may be reduced.

Abstract: In a substrate-processing apparatus for performing coating, baking and developing processes on a semiconductor substrate, a first processing block performs a coating process and a developing process on substrates. A second processing block is disposed opposite to the first processing block to heat-treat the substrates. The first processing block includes upper, middle and lower unit blocks. The upper and lower blocks include at least one coating unit for forming a layer on the substrates and at least one developing unit for developing a photoresist layer on the substrates, respectively. The middle unit block is detachably disposed between the upper and lower unit blocks and includes at least one of coating units and developing units. The configuration of the middle unit block may vary according to a process recipe to improve the throughput of the substrate-processing apparatus.

Abstract: The invention relates to a device (10) for coating an elongated work-piece (20), particularly for painting or impregnating a joined wooden workpiece, having at least one nozzle (14) directed toward the workpiece (20), wherein the nozzle (14) is disposed on a holder (11) aligned substantially perpendicular to the workpiece longitudinal axis and being suspended in a frame (17), and preferably being disposed in a rotating assembly (12). The invention further comprises a method for coating an elongated, rod-shaped work-piece (20) and a system (40), comprising the device (10), and on which the method according to the invention can be carried out.

Abstract: A method of cleaning a spin coater apparatus is provided. In one embodiment, the method comprises providing a spin coater apparatus having a coater cup comprising a basin with sidewalls, a rotatable platform situated inside the cup adapted for holding and rotating a wafer to be coated, and a solvent dispensing means mounted under the rotatable platform; placing the substrate on the rotatable platform; rotating the rotatable platform; continuously dispensing a cleaning solvent from the solvent dispensing means to rinse the backside of the wafer with the cleaning solvent and to pre-wet an interior surface of the sidewalls; and dispensing a coating material upon the wafer, the substrate mounted on the rotatable platform.

Abstract: The present invention provides a coating apparatus which can form a stable photochromic coating film. In the invention, a centering device, a lens height measuring device, a primer fluid applicator device, a primer spinning device, a drying device, a photochromic fluid applicator device, a photochromic spinning device, a UV device and a lens transport means comprising a pair of handling devices are provided to a coating apparatus.

Abstract: A resin layer formation method, resin layer formation device, disk and disk manufacturing method for making a resin layer uniform on a substrate before lamination or on a substrate to be coated by a simple procedure are provided. Adhesive A is coated at the inner circumference side while rotating a substrate P at low speed, a first adhesive layer AL1 is formed on the surface of the substrate P by rotating the substrate P at high speed, a step difference section H is formed around a rotation center of the substrate P by irradiating ultraviolet on an area in the inner circumference side of the first adhesive layer AL1 and hardening the area, the adhesive A is coated at the rotation center side from the step difference section H on the substrate P, and a second adhesive layer AL2 is formed on the first adhesive layer AL1 by rotating the substrate P at high speed. The first adhesive layer AL1 and the second adhesive layer AL2 are integrated to form a uniform adhesive layer B as a whole.

Abstract: To provide a coating apparatus capable of automatically executing a series of steps of measuring the shape of a lens and applying a primer solution thereon, drying the primer solution and applying a photochromic coating solution thereon, and curing the coated solutions by the UV irradiation, liberating the operator from the work of setting the lenses piece by piece. A lens-feeding portion 2 is arranged upstream of the series of steps, the lens-feeding portion 2 having lens-holding units 22 in which a plurality of lenses are arranged straight in the horizontal direction and/or in the up-and-down direction, and a first lens sub-carrier means 31 for carrying the lenses held therein to the lens-measuring portion 3.

Abstract: Economical heavy concrete weight coating is used as a weight coating for submarine pipes. The developed economical heavy concrete weight includes steel slag and iron ore as aggregate. Steel slag can contain iron and thus have a higher density than some other types of slag. By supplementing the steel slag with iron ore as aggregate, the economical heavy concrete weight coating can have a higher density than a coating having just slag. Economical heavy concrete weight coating can have a density greater than 190 pcf.

Abstract: The pipe treatment apparatus rotates a pipe to be treated, from the pipe exterior. The apparatus provides easy adaptation to varied pipe lengths and pipe diameters. The blast nozzle delivers blast media to the pipe interior to clean and prepare the interior for coating. The spray head delivers various chosen coatings to the pipe interior. The blast nozzle and spray head are easily installed and removed. The trolley and telescopic member with c-channel, along with the longitudinal drive motor with drive roller propel either the blast nozzle or spray nozzle into, within, and out of the pipe, as the rotational motor and transverse rollers turn the pipe from the pipe exterior. The apparatus therefore provides a basic design with which pipe can be both cleaned and coated within.

Abstract: This disclosure describes a sample drying system and method that provides a high rates of evaporation and sublimation that is commonly employed in compound processing procedures. The drying increases the sample-solute concentration and removes the solvent completely to produce the dried sample as a non-volatile solute precipitate. Re-circulating of drying gas is disclosed along with a solvent cold trap.

Abstract: It is shown a method and apparatus for distributing a viscous liquid over a surface of a substrate, e.g. a semiconductor wafer or a datastorage media, by conditioning the substrate thermally, locally specific before or during the spin coating process.

Abstract: A mounting assembly for a stent and a method of coating a stent using the assembly are provided.

Abstract: The invention relates to providing a virtually air tight seal of the joints of fittings used in HVAC air distribution systems. The invention relates to the manufacturing process, equipment used in the manufacturing process, and the sealed fitting itself.

Abstract: A liquid processing apparatus is arranged to planarize a film on a substrate by supplying onto the film a process liquid for dissolving the film while rotating the substrate. The apparatus includes a substrate holding member configured to rotatably hold the substrate in a horizontal state, a rotation mechanism configured to rotate the substrate holding member, and a liquid supply mechanism configured to supply the process liquid onto a surface of the substrate. The liquid supply mechanism includes first and second liquid delivery nozzles configured to deliver the same process liquid. The first liquid delivery nozzle has a smaller diameter and provides a smaller delivery flow rate, as compared to the second liquid delivery nozzle. The first liquid delivery nozzle is inclined to deliver the process liquid in a rotational direction of the substrate, and is movable between a center of the substrate and a peripheral edge thereof.

Abstract: A system or device for spin coating an implantable medical device, such as a stent, is disclosed. The device includes a coating table to support the stent, the stent being positioned on top of the coating table and supported on the table by a support fixture. The coating table has an axis of rotation. The axis of rotation of the table can intersect a center of the mass of the stent. A driving means can be provided for rotating the stent about the longitudinal axis of the stent and for rotating the coating table about the axis of rotation.

Abstract: The present invention supplies a solvent to the front surface of a substrate while rotating the substrate. Subsequently, the substrate is acceleratingly rotated to a first number of rotations, and a resist solution is supplied to a central portion of the substrate during the accelerating rotation and the rotation at the first number of rotations. Thereafter, the substrate is deceleratingly rotated to a second number of rotations, and after the number of rotations of the substrate reaches the second number of rotations, the resist solution is discharged to the substrate. The substrate is then acceleratingly rotated to a third number of rotations higher than the second number of rotations so that the substrate is rotated at the third number of rotations. According to the present invention, in application of the resist solution by spin coating, the consumption of the resist solution can be suppressed, and a high in-plane uniformity can be obtained for the film thickness of the resist film.

Abstract: A system for coating implantable medical devices, such as stents, and a method of coating stents using the system is also disclosed. The system includes a barrier or barriers for isolating an area of the stent on which a composition for coating a stent is applied. Two coating compositions can be applied simultaneously to a stent by separate nozzles on different sides of a barrier. Cross-contamination of the compositions is prevented by the barrier.

Abstract: A pipe joint lubrication device including at least one first nozzle for application of lubricant on at least one of the fittings, a threaded nipple or a threaded socket, wherein the at least one first nozzle is provided on a first jaw housing which is rotatable about the longitudinal axis of the nipple or the socket.

Abstract: Wafers A1 to A10 of a first lot A and wafers B1 to B10 of a second lot B are processed by a second heating unit at different temperatures, respectively. A wafer W is carried in a processing block included in coating and developing system along a route passing a temperature control unit CPL2, a coating unit BCT, a heating unit LHP2, a temperature control unit CPL3, a coating unit COT, a heating unit LHP3, and a cooling unit COL in that order. The process temperature of the heating unit LHP3 is changed after the last wafer A10 of the first lot A has been processed by the heating unit LHP3.

Abstract: A developer nozzle is moved from a periphery of a wafer toward the central portion while an exposed substrate held at a spin chuck is being rotated about a vertical axis and while a developing solution is being discharged from the developer nozzle, and this way the developing solution is supplied to the surface of the wafer, the developer nozzle having a slit-like ejection port whose longitudinal direction is oriented to the direction perpendicular to the radial direction of the wafer. The movement speed of the nozzle is higher than a case where a nozzle with a small-diameter circular nozzle is used, and this enables a development time to be reduced. Further, the thickness of a developing solution on a substrate can be reduced, so that the developing solution can be saved.

Abstract: A transfer flow is produced in accordance with a process recipe of a process to be carried out. In the transfer flow, a type of modules listed in accordance with a substrate transfer order is associated with a necessary staying time from when the substrate is transferred into a module by a substrate transfer unit to when the substrate is ready to be transferred back to the substrate transfer unit after the corresponding process is finished. A cycle limiting time is determined to be the longest necessary transfer cycle time among those obtained by dividing the necessary staying time by the number of the modules mounted in the coater/developer. The number of the modules to be used is determined to be a value obtained by dividing the necessary staying time by the cycle limiting time or a nearest integer to which the value is raised.

Abstract: A substrate treatment apparatus of the present invention includes: a holding means for rotatably holding a substrate to be treated; a coating solution supply nozzle for supplying a coating solution onto the front surface of the substrate to be treated held on the holding means; a treatment container with an upper surface open for housing them; an exhaust means for exhausting an atmosphere in the treatment container from the bottom; a multiblade centrifugal fan provided on the inner periphery of the treatment container for flowing airflow on a front surface side of the substrate to the exhaust means; and a controller for controlling the number of rotations of the multiblade centrifugal fan corresponding to the number of rotations of the substrate, wherein the number of rotations of the multiblade centrifugal fan is controlled so that turbulent airflow flowing in a circumferential direction on the front surface of the substrate generated due to the rotation of the substrate is corrected to laminar airflow flowi

Abstract: An apparatus for forming an optical film on an optical substrate is provided. The apparatus may include a rotatable jig for fixedly holding the optical substrate, an apparatus for rotating the jig, and a nozzle for dispensing a coating solution containing an optical-film-forming component onto the optical substrate. A rotation speed of the jig may be 8,000 rpm or more, and a deviation of rotation axis of the jig may be 50 ?m or less.

Abstract: A spray gun (31) is attached to a multi-function unit (32) movable in a horizontal direction and a perpendicular direction. The spray gun (31) is mounted to a support holder (33), and the support holder (33) is connected to a support arm (35) of the multi-function unit (32). The support arm (35) is attached to a unit cover (36) which is openable/closable with respect to a casing (2). The support holder (33) and the support arm (35) can hide and house a liquid hose and an air hose therein so that the hoses and the like are arranged in an apparatus in such a state as to be completely free from being exposed. An installation position of the spray gun (31) can be finely adjusted by the multi-function unit (32) during a coating process, thereby enabling a control for keeping constant distances between tablet surfaces and the spray gun (31).

Abstract: A liquid treatment apparatus treating a surface of a substrate held generally horizontally on a stage in a housing by supplying a treating liquid to said surface from a supply nozzle. The liquid treatment apparatus includes a cup body provided so as to surround the substrate held in the substrate holding part laterally, the cup body being mounted detachably to a base inside the housing from an upward direction thereof; a cup body holding part holding the cup body detachably; and an elevating mechanism moving the cup body holding part up and down between a first position at which the cup body is mounted upon the base body and a second position located above the first position.

Abstract: A method of applying a coating to a stent supported by a mandrel is disclosed.

Abstract: An electroless plating apparatus is provided. The electroless plating apparatus includes a wafer holder; a chemical dispensing nozzle over the wafer holder; a conduit connected to the chemical dispensing nozzle; and a radiation source over the wafer holder.

Abstract: An arrangement for depositing coating powder on a rotational symmetric body is provided. The arrangement includes a rotation device for rotating the rotational symmetric body around a horizontal axis of rotation, wherein the horizontal axis of rotation coincides with the axis of the rotational symmetry of the body, a nozzle arranged vertically above a surface of the rotational symmetric body for providing the coating powder to the surface and a horizontal barrier at a specified distance defining a coating thickness above the surface, wherein the barrier is arranged next to the nozzle in the direction of a rotational movement of the surface at the nozzle. At this point, the nozzle includes a cross section elongated in one direction parallel to the axis of rotation.

Abstract: The invention provides a rotatable and optionally heatable device for holding a flat substrate. The device includes a supporting means for placing and holding the substrate on a supporting surface, optionally a heater, a means for rotating the supporting means and a means for applying a fluid, e.g. a solvent, onto the side of the substrate facing the supporting surface. The fluid is applied when the supporting device for supporting and holding the substrate is caused to rotate.

Abstract: A method and apparatus of coating a polymer solution on a substrate such as a semiconductor wafer. The apparatus includes a coating chamber having a rotatable chuck to support a substrate to be coated with a polymer solution. A dispenser to dispense the polymer solution over the substrate extends into the coating chamber. A vapor distributor having a solvent vapor generator communicable with the coating chamber is included to cause a solvent to be transformed into a solvent vapor. A carrier gas is mixed with the solvent vapor to form a carrier-solvent vapor mixture. The carrier-solvent vapor mixture is flown into the coating chamber to saturate the coating chamber. A solvent remover communicable with the coating chamber is included to remove excess solvent that does not get transformed into the solvent vapor to prevent the excess solvent from dropping on the substrate.

Abstract: A robotic spray system is provided for accurately spraying mold release onto any size or shaped green tire. The system analyzes individual green tires using an integrated vision system. The system controls the robotic spray position, the fan, fluid, atomizing air, and tire rotation speed for optimal spray coverage on both the inside and outside of green tires. The system includes a conveyor, an overhead mounted camera located over an infeed station, and a second camera located perpendicular to the green tire's tread and several feet away from the center of the tire. Pictures of the green tire in the station are used to estimate the center and radius of the tire and locate the angle of the bar code with respect to the center of the tire. Reference points are provided from the camera images and robot positions are calculated to control the spraying.

Abstract: A fluid dispenser for use in the processing of substrates. The dispenser has a dome shaped body with a convex upper surface and has a number of conduits designed to supply fluid to the surface of a substrate at predetermined points.

Abstract: In a liquid processing apparatus for forming a coating film on a polygonal substrate by spin coating in an ambient with a descending clean air flow, a spin chuck includes a support plate for substantially horizontally supporting the substrate thereon. Air flow control members are provided on the spin chuck such that the air flow control member being disposed adjacent to a periphery of the polygonal substrate supported on the spin chuck, wherein the air flow control member is not provided near corner portions of the substrate supported on the spin chuck. The liquid processing apparatus may includes an air flow regulation ring which is provided with an air inlet having an opening surrounding an outer periphery of the air flow control member, wherein the air inlet communicates with the exhaust unit.