Abstract: Temperature control of the coating medium is performed to influence the processability of coating media in an applicator system. In order to operate without losing efficiency, devices acting directly from the inside or the outside for heat supply or dissipation are connected to the elements guiding the coating medium. The temperature of the coating medium is influenced by measuring the temperature within the coating medium and, if necessary, at the elements guiding the coating medium.

Abstract: A conveyor system for parts coupled to a loadbar assembly is disclosed. The conveyor system includes a walking beam conveyor and a push bar conveyor. The loadbar assembly and walking beam conveyor are configured to allow transfer of parts coupled to loadbar assemblies along a path through upward and downward and forward and reverse movements of the walking beam conveyor. The push bar conveyor and the loadbar assembly are configured to urge parts coupled to the loadbar assemblies through the push bar conveyor by an incremental distance substantially equal to the length of a segment bar of the loadbar assembly.

Abstract: Systems and methods for creating a combinatorial coating library including a coating system operatively coupled to at least one of a plurality of materials suitable for forming at least one coating layer on a surface of one or more substrates. The systems and methods also including a curing system operative to apply at least one of a plurality of curing environments to each of a plurality of regions associated with the at least one coating layer, the curing system comprising a plurality of waveguides each having a first end corresponding to at least one of the plurality of regions and a second end associated with at least one curing source. The combinatorial coating library comprising a predetermined combination of at least one of the plurality of materials and at least one of the plurality of curing environments associated with each of the plurality of regions.

Abstract: Systems and methods for creating a combinatorial coating library including a coating system operatively coupled to at least one of a plurality of materials suitable for forming at least one coating layer on a surface of one or more substrates and a curing system operative to apply at least one of a plurality of curing environments to each of a plurality of regions associated with the at least one coating layer. The curing system including a scanning mirror system having a mirrored surface positionable relative to an incoming radiation beam, wherein the mirrored surface is positionable to direct the incoming radiation beam to a selected one of the plurality of regions associated with the coating layer. The combinatorial coating library comprising a predetermined combination of at least one of the plurality of materials and at least one of the plurality of curing environments associated with each of the plurality of regions.

Abstract: A method of semiconductor device manufacture provided includes forming a gate insulating layer upon a single crystal semiconductor substrate, forming a gate electrode made from a polycrystal conductive film upon the gate insulating layer, implanting impurity in the gate electrode and in the surface layer of the semiconductor substrate adjacent to or separate from the gate electrode, performing a first heat treatment, and performing a second heat treatment. The first heat treatment performs heat treatment at a temperature that diffuses the impurity implanted mainly in the gate electrode and controls the diffusion of the impurity implanted in the surface layer of the semiconductor substrate. The second heat treatment performs heat treatment at a higher temperature and for a shorter time than the first heat treatment, and at a temperature that activates the impurity implanted in the semiconductor substrate.

Abstract: A method and apparatus for extrusion coating both sides of a metal strip. A metal strip, such as aluminum alloy strip, is moved through a pre-conditioner, two extrusion dies, a post-heater and a cooling system. Both sides of the strip are coated with thin coatings of thermoplastic polymers. The coated metal strip is useful for containers, such as cans and can ends, as well as for automobiles, appliances, aerospace, construction and electrical devices.

Abstract: A polymer substrate for radiation-induced graft polymerization in the form of a woven or non-woven fabric that comprises a woven or non-woven fabric composed of polymer fiber and a reinforcement polymer having a greater strength and a slower rate of radiation-induced graft polymerization than said polymer fiber. Also, radiation graft treated stock prepared from said polymer substrate. In another aspect, a radiation graft treated material in the form of a woven or non-woven fabric material that is composed of polymer monofilament fiber of which only the surface has undergone a radiation-induced graft polymerization but of which the center remains unaffected by grafting.

Abstract: Fabrication apparatus for fabricating an object as a plurality of successive laminae, the apparatus comprising: a nozzle comprising a precursor outlet for applying an aerosol or gaseous precursor onto a recipient surface; a heater for providing a temperature gradient along an application path of the precursor, so that the precursor is heated as it approaches the recipient surface and a transformation initiated so that a material layer of transformed material is deposited on the recipient surface; and a directable light beam for locally heating regions of the material layer so as to further transform the locally-heated regions to a solid material.

Abstract: A light source comprising a plurality of flash lamps emits flashes thereby flash-heating a semiconductor wafer held by a thermal diffuser and a hot plate. The current distance of irradiation between the thermal diffuser and the hot plate holding the semiconductor wafer and the light source is so adjusted as to attain predetermined intensity of irradiation. The distance of irradiation between the thermal diffuser and the hot plate and the light source can be changed or corrected by vertically moving the thermal diffuser and the hot plate. Thus provided is a thermal processing apparatus using the flash lamps, capable of readily controlling the intensity of irradiation.

Abstract: A method for applying a coating to an optical surface of an optical device. In one embodiment, the method includes the steps of placing a coating solution in a cliche of a cliche plate, transferring the coating solution from the cliche to deformable body of a transfer pad, and pressing the transfer pad to the optical surface so as to transfer the coating solution from the deformable body of the transfer pad to the optical surface. The method further includes a step of irradiating the coating solution associated with the optical surface at a wavelength of microwave so as to form a coating layer on the optical surface. The coating layer can be further cured to form a desired coating on a proper optical surface. The optical device can be an optical lens having at least one optical surface, or a mold that can be used to produce an optical lens. In other words, the present invention allows a coating to be applied directly to an optical surface of an optical lens.

Abstract: A method and an assembly is disclosed for coating a web (1) of paper or board by a dry treatment agent, the method comprising the step of applying the treatment agent to at least one side of the moving web (1). In the method is used a treatment agent contains a binder capable of undergoing a change of state at least under the effect of elevated temperature. The web (1) after being treated with the treatment agent is subjected to at least an elevated temperature at which the binder becomes deformable, and the web is subjected to a lower temperature serving to set the binder so that the same bonds the treatment agent to the web surface. The solids content of the treatment agent is not less than 75%, preferably not less than 90%, whereby a drying step after the treatment is not required.

Abstract: A UV curing system includes a light source, which produces UV light and non-useful light (heat energy), a shade member having a lamp-side surface that reflects light and provides thermal insulation to the target substance, and a housing having an internal reflecting surface. The shade member is situated between the light source and the target substance so that all, or most, light from the light source does not directly strike the target substance. The housing is situated on the opposite side of the light source from the barrier and partially encloses the light source.

Abstract: An apparatus for forming and finishing a continuous fabric web in a single operation. The apparatus includes a fabric web forming station for forming a continuous fabric web and a finishing station downstream from the fabric web forming station for receiving the continuous fabric web from the fabric web forming station and for providing a finishing treatment to the continuous fabric web. In the preferred embodiment, the finishing station includes a substantially excess-free applicator which helps to prevent thick spots in the coated fabric web which may occur when a coating applicator is stopped and restarted. In the preferred embodiment, the finishing station includes a curing station downstream from the applicator. The curing station may include both a drying station and a heat set station downstream from the drying station. The operating temperatures of the drying and heat set stations are controlled to minimize the amount of air having VOCs to be treated before being discharged into the atmosphere.

Abstract: The present invention is generally directed to various processes and systems for forming layers and coatings on substrates, such as semiconductor wafers and solar cells. In one embodiment, the process of the present invention is directed to forming a layer on a substrate from a liquid precursor. The liquid precursor is atomized and exposed to light energy. Besides light energy, the parent material may also be exposed to an electric field and/or to sonic energy. In an alternative embodiment of the present invention a stress measurement device monitors stress in the substrate as a layer is deposited on the substrate. This stress measurement information is then sent to a controller for automatically controlling the amount of energy, such as light energy being emitted onto the substrate.

Abstract: A process and a plant for applying of one or more compounds, such as, for example, inks or coatings, to a substrate, are described. In each station of the plant at least one compound is applied by means of a process that requires a first step of applying an essentially liquid mixture containing the compound to be applied to a transfer medium, a second step of heating the transfer medium to obtain coagulation of the portion of the mixture which is in contact with the transfer medium, and a third step in which the transfer medium is placed in contact with the substrate so that the coagulated portion of the mixture is applied to the substrate.

Abstract: The invention concerns a method for continuously coating at least a metal strip with a crosslikable polymer fluid film free of non-active solvent or diluent and whereof the softening temperature is higher than 50° C. The method consists in continuously unwinding the metal strip (1) on at least a back-up roll (3); forming, on a roll (20) by forced flow, a layer of said crosslinkable polymer in melted state; forming, from said layer (30), said crosslinkable polymer film (31); and transferring entirely in thickness said film onto the metal strip (1) and, between the zone forming the layer (30) on the roll (20) and the zone applying the film (31) on the metal strip, in thermally conditioning the crosslinkable polymer to reduce its viscosity. The invention also concerns a coating device for implementing said method.

Abstract: An integrated apparatus for processing a resist pattern imaged on a substrate, notably a thermal lithographic printing plate, comprises a chemical development section, and a preheat oven upstream of the chemical development section. The preheat oven is controllable to provide for substantially uniform heating of the imaged lithographic plate (or other imaged resist pattern on the substrate) as the plate progresses through the apparatus. If desired a plate baking oven may be provided downstream of the chemical development section.

Abstract: A system and method for finishing a series of golf balls is disclosed herein. The system automatically transfers each of the golf balls from station to station on the system. The system has at least one coating station that has at least one spray gun that moves in relation to a golf ball being conveyed through the coating station. The spray gun moves in a track extending from a position below the golf ball to a position above the golf ball. The system has a transfer means that includes a series of transport pucks. Each transport puck has a plurality of shafts with spindles attached to the top of each of the shafts. Each spindle holds a golf ball for processing through the system. The spindles are rotated at relatively high rates during the coating process. In order to reduce tip marks on the finished golf ball, the golf balls are transferred from each spindle utilizing a high pressure gas. The system may be used to coat each golf ball with a basecoat, an indicia and a topcoat.

Abstract: A curing module for use in fabricating semiconductor wafers is provided. The cure module comprises a housing and a bottom plate. The housing also contains a heating plate adjacent a top surface of the housing and side walls extending from the top surface. The housing sidewalls, the heating plate and the bottom plate define a chamber within the cure module. Films disposed on semiconductor wafers are cured within the chamber by being raised on lift pins to the heating plate during a heating operation and then lowered on the lift pins to the bottom plate during a cooling operation.

Abstract: Various embodiments of a system and method for forming coated toner images on a web are disclosed. The coating unit can be employed off-line or in-line with a digital printing system. The coating is applied on already fused toner images and is subsequently cured by means of UV radiation. The resulting coated fused toner images have a reduced sensitivity towards mechanical interaction, e.g., rubbing, and towards water, solvents and sunlight. In addition, they yield a smooth surface with an even tunable gloss, independent of the amount of superimposed toner layers.

Abstract: The present invention relates to an improved doctor blade and bedplate apparatus wherein there is a recess in the bedplate from some position upstream of the doctor blade to some position downstream of the doctor blade. This recess or gap in the area of the bedplate under the doctor blade allows one to form an even or uniform coating on the back of a web of material. This is particularly helpful in forming uniform coatings on the back of a greige good which has face fibers of varying lengths. The present invention also relates to an improved process for preparing a relatively uniform coating on the back of a web of material.

Abstract: A machine can deposit a film on a roll that will be used as a rotogravure printing medium. The machine has a carriage for rotatably holding the roll. Also included is a rotary driver for rotating the roll, and a linear driver for moving the carriage downstream along a processing path in order to move the roll axially. The machine also has a coating head with an orifice that is in communication with a source of composition for dispensing the composition onto the roll helically as a merging series of adjacent, self-leveling strip or bead portions. The carriage can be moved to one or more curing stations where the composition film will be (a) initially cured with a UV energy source at a primary energy flux density, and (b) secondarily cured with a UV energy source at a secondary energy flux density that is greater than the primary energy flux density.

Abstract: The present invention provides a method and apparatus for curing a coated fiber, comprising either two fiber coating curing stages separated by a cooling stage, or two fiber coating curing stages separated by a distinct time interval, or both. One of the two fiber coating curing stages responds to the coated fiber, and provides a partially cured fiber coating. The other of the two fiber coating curing stages responds to the partially cured coated fiber for further curing the coating of the fiber. In one embodiment of the invention, a cooling stage is placed between the two curing stages, while in the other the curing stages are placed a set distance apart such that polymerization of the coating initiated by the first curing stage has time to complete prior to the coating being irradiated by the second curing stage.

Abstract: The invention relates to a method for electrically controlling a flow of material, wherein a single- or multi-component, essentially polymer-based material (1), such as plastics, elastomer or the like, is charged electrically (I) and sprayed (II) in an electrical field (E) to a three-dimensional mould (2)/target (3). The method of the invention makes use of the mould (2)/target (3) set at an electric potential and provided with two or more treatment blocks (Li) to be set at voltage levels different from each other, especially for coordinating the courses of sprayed material particles and the electrical field (E) affecting the same, in such a manner that each section/area of the mould/target surface forms a material layer of desirable thickness in the spraying cycle (II). The invention relates also to an apparatus operating in accordance with the method.

Abstract: An automatic machine for varnishing an application piece including at least one of wood, medium density fiberboard, and particle board, with an ultraviolet powder, and a method of varnishing the application piece. A preheating device preheats the application piece. An application device applies the powder to the preheated application piece. A fusion device fuses the applied powder to the application piece. A curing device cures the fused powder on the application piece. A cooling device cools the cured powder on the application piece.

Abstract: An optical disk is provided by bonding two substrates to each using a radiation-hardening resin, and leveling and hardening the resin. In an optical recording medium manufacturing apparatus including lamps for emitting radiation to two disks attached to each other with a radiation-hardening resin layer sandwiched therebetween, and a rotation arm for supporting and rotating the two disks to allow the disks to traverse the emission area of the lamps, light source centers of the lamps are positioned radially outside a rotation locus of the center of the disks attached to each other, said locus being drawn while the disks are supported by the rotation arm.

Abstract: The present invention comprises a wicket conveyor for conveying a series of wickets through pre-curing, curing and post-curing sections of a curing system. The wicket conveyor forms a continuous loop, having a straight upper track portion, a straight lower track portion and a pair of curved end portions of track that adjoin each end of the straight upper and lower track potions. Each wicket is attached to the wicket conveyor track such that the plane of the wicket is oriented at a predetermined angle. B wicket picks up a horizontally oriented sheet and carries it toward the pre-curing section. The wicket and substrate sheet are reoriented in response to the contour of the conveyor, into a near vertical planar orientation. While in the near vertical orientation, liquid coatings on the surface of the sheet substrate move down the substrate sheet in “sheet flow,” thereby leaving a smooth coating surface prior to curing.

Abstract: An apparatus for redirecting energy applied to a susceptor of a substrate process chamber. Specifically, a shield comprising one or more reflector members is disposed below said susceptor whereby thermal energy radiated from a backside of said susceptor is reflected back to the susceptor. The apparatus comprises a bracket member attached to the reflector members and a pedestal assembly disposed below said susceptor. The reflector members are fabricated from a low emissivity material such as stainless steel (which can be polished to a highly reflective condition). Also, the first and second reflector members can be annealed.

Abstract: The invention relates to a method and a device for the production of a strip-like metallic composite material by the high-temperature dip coating of a metallic carrier strip, consisting of a metallurgic vessel for receiving the liquid depositing material, through which the carrier strip is capable of being led in a preferably vertical run-through direction by means of pairs of rollers arranged on the entry and the exit side, and of a preheating device for the carrier strip, said preheating device being located upstream of the metallurgic vessel. At the same time, the preheating device (41) is arranged in a housing (61) which is arranged in the entry region upstream of the metallurgic vessel (11) and surrounds the carrier strip (21) and into which the medium coming from a media supply (52) is capable of being introduced via at least one feed (51) led into the housing.

Abstract: This invention relates to a tubular apparatus for UV curing coatings on a continuous filament in which concentric tubes are provided and through which the filament passes after being coated for curing the coating, with the apparatus having the first inner tube which passes the UV light through the tube to cure the filament passing therethrough, and a second concentric tube superposed over the first tube and spaced therefrom which reflects IR light and passes UV light to prevent burning and destroying the coating on the filament as it passes through the first tube.

Abstract: In a semiconductor device manufacturing apparatus comprising at least a reaction chamber and a substrate holder located within the reaction chamber, a silicon nitride film is deposited on the substrate holder within the reaction chamber, and then, a semiconductor substrate is put on the silicon nitride film of the substrate holder within the reaction chamber. A titanium film or a titanium nitride film is deposited on the semiconductor substrate within the reaction chamber, by a chemical vapor deposition process using a titanium halide as a raw material gas.

Abstract: A semiconductor wafer or flat panel display process chamber for thermally driven, chemical vapor deposition, and/or plasma enhanced chemical vapor deposition processes includes a chamber for loading/unloading the substrate to be processed, and another chamber for processing. The substrate is heated with multiple zone radiant heaters arranged around the processing chamber to provide uniform heating. Process gases are injected into and exhausted in a cross flow fashion. The chamber may be used for plasma processing. Shield plates prevent deposition of reactant species on chamber walls, and also serve to diffuse heat uniformly the chamber.

Abstract: A multiwafer chemical vapor deposition (CVD) reactor providing improved material deposition uniformity through use of improved gas injection and exhaust apparatus. The reactor includes a wafer boat for supporting a vertical stack of wafers, spaced apart for passage of a reactant gas. A preferred embodiment of the gas injector is in the form of a vertically oriented body having at a first end a gas inlet, and extending inward from a wall of the reactor towards the wafer boat, terminating in a widened injector outlet. The injector body and outlet extend vertically a distance approximating the height of the wafer boat, and the outlet is widened to provide an improved flow of gas across the wafer. A face of the injector outlet contains a plurality of gas ejecting holes, arranged to provide a uniform supply of reactant gas over each wafer surface.

Abstract: An UV oven comprises a compact longitudinal elliptical reflector with first and second focal lines; a longitudinal small diameter bulb disposed along the first focal line that generates short wavelength UV radiation, IR radiation, visible radiation and heat to cure the coating on magnet wires or wire-like elements that are passed through the other focal line. The inside surface of the reflector is coated with material to enhance the reflectivity of the short wavelength UV, IR and visible radiation.

Abstract: A semiconductor processing system for the production of semiconductor electronic devices is described, which includes a sequence of semiconductor processing steps carried out on a plurality of semiconductor processing machines, whereby the processing is carried out on discrete pieces of substrate which are smaller than conventional semiconductor wafers but may be made therefrom, or from larger diameter semiconducting wafers or from materials onto which semiconductor layers may be formed, and the discrete substrate pieces are selectably processable into the electronic devices either individually or as a plurality removably fixed to a support.

Abstract: A plasma enhanced chemical vapor deposition (PECVD) system having an upper chamber for performing a plasma enhanced process, and a lower chamber having an access port for loading and unloading wafers to and from a wafer boat. The system includes apparatus for moving the wafer boat from the upper chamber to the lower chamber. The wafer boat includes susceptors for suspending wafers horizontally, spaced apart in a vertical stack. An RF plate is positioned in the boat above each wafer for generating an enhanced plasma. An RF connection is provided which allows RF energy to be transmitted to the RF plates while the wafer boat is rotated. Apparatus for automatic wafer loading and unloading is provided, including apparatus for lifting each wafer from its supporting susceptor and a robotic arm for unloading and loading the wafers.

Abstract: A thin-film fabrication method includes a spray step in which at least one thin-film composition material in liquid form is sprayed into a vacuum vessel via a spray nozzle provided for each thin-film composition material and deposited on a substrate, and a heat treatment step in which the material deposited on the substrate is heat treated. The substrate temperature in the spray step and/or the heat treatment step is controlled within a prescribed temperature range.

Abstract: The invention relates to an apparatus for the production of thin oxide coatings, having a vacuum chamber wherein an oxygen chamber with an opening and a rotary substrate holder overlapping the latter are disposed. For the rotary arrangement of the substrate holder a rotary mounting is provided, which engages a circumferential portion of the substrate holder.

Abstract: In a conveyor system with a radiant heating system, convection is provided with hollow elongated tubes having small holes for providing a gentle air flow toward a workpiece to heat the workpiece with convection and radiation.

Abstract: A heat-treating apparatus is arranged to perform a reforming process and a crystallizing process for tantalum oxide deposited on a semiconductor wafer. The apparatus includes a worktable with a heater incorporated therein. Under the worktable, there is a heat-compensating member formed of a thin plate and having a counter surface facing the bottom surface of the worktable along the periphery. The counter surface is formed of a mirror surface having a surface roughness of Rmax=25 &mgr;m or less. Heat rays and radiant heat are reflected by the counter surface and applied to the periphery of the worktable, thereby compensating the periphery for heat loss.

Abstract: A heat processing apparatus comprises a heating section having a hot plate for heating a substrate in a heat conduction manner, refrigeration medium for decreasing temperature of the hot plate in a heat exchange manner by bring the refrigeration medium in direct or indirect contact with the hot plate, a refrigeration section for storing the refrigeration medium while cooling, a transport mechanism for taking out the refrigerant from the refrigeration section, transporting the refrigeration medium to the heating section, mounting the refrigeration medium on the hot plate, picking up the refrigeration medium from the hot plate, taking out the refrigeration medium from the heating section, and transporting the refrigeration medium to the refrigeration section, setting mechanism for setting a heat processing temperature for the substrate, and a controller for controlling temperature of the hot plate by using the refrigeration medium so as to reach the heat processing temperature set by the setting mechanism.

Abstract: An interface apparatus places, in a boat, plural wafers transported thereto one by one from an application apparatus for performing single wafer processing, then transports the boat having the wafers placed therein to a heating apparatus for subjecting plural wafers to a heat treatment process, and after completion of the heat treatment process, receives the boat. The interface apparatus includes a stage, a rotary table rotatably arranged on the stage for placing the boat thereon, and a positioning mechanism for turning the rotary table in a direction of displacement of the boat to permit the boat to be placed on the rotary table when the boat is being placed on the rotary table with the position thereof displaced from a reference position in a rotatable direction of the rotary table, and after completion of the placement, turning the rotary table in a direction opposite to the displacement direction to thereby position the boat at the reference position.

Abstract: An apparatus for additively de-marking a packaged integrated circuit die bearing engraved marking indicia on an exterior surface thereof. The marked surface of a packaged die presented by a handling device is covered by an applicator with an overlayer of material to fill the engraved markings and provide a surface suitable for re-marking. The covering material may be applied in a flowable state by applicator contact or by non-contact dispensing, or may be applied by the applicator as a preformed segment. A pre-treatment device may be employed to treat the package exterior surface to be covered to enhance bonding of the covering material thereto. Bonding of the covering material to the package surface, or solidification of the covering material, may be enhanced by use of a post-application curing station.

Abstract: In a RTP (rapid Thermal Processing) of a large-diameter semiconductor wafer using a hot-wall type heating furnace, the temperature distribution of the wafer surface is made uniform by means of preliminarily heating a thermal storage plate(s) to a heat-treating temperature, and, then positioning the wafer between a pair of the thermal storage plates or in the direct proximity of a thermal storage plate. The wafer may be brought into contact with the thermal storage plate. The wafer is thus heated rapidly heated to the heat treating temperature.

Abstract: An apparatus and method provide for the alternate manufacture of permanent adhesive or repositional linerless labels utilizing the same equipment. Indicia is applied such as by using an intelligent imaging system by at least one print station. With repositional labels, a tie coat is applied and dried, whereas with permanent labels a barrier coating is applied. Coating stations apply a repositional adhesive and release coat in the construction of repositional adhesive labels. The coating station is followed by a dryer and chill rolls. In the construction of permanent adhesive labels a coating station for applying a release coat and a release coat curing station, as well as permanent adhesive application station, are also provided. Changeover time from the manufacture of one type of label to the other is short.

Abstract: A semiconductor processing chamber, capable of withstanding low pressures while transmitting radiant energy, is provided in a lightweight, compact design. The inner surface of the window is preferably substantially flat and parallel to the wafer to be processed. The window is thin in a center portion and thicker in a surrounding peripheral portion. The thickness increases in the radially outward direction, defined between the flat inner surface and a concave outer surface. Deposition uniformity is improved by employing multiple outlet ports for distributing gas laterally in a short length, enabling a compact, symmetrical geometry. Preferably, a quadra-flow system of gas distribution is used, whereby the chamber contains one inlet port and three outlet ports distributed approximately at 90 degrees around a cylindrical side wall defining the chamber space.

Abstract: An apparatus to facilitate tail threading of a paper web and a method of threading the tail of a paper web (1) to be coated through a coating line during startup or web break, in which an edge strip is slit from the web to act as the tail of the web which is first threaded through the line and then widened to the normal width of the web by moving the edge strip slitter. Said edge strip is first guided to a movable support element (12) located after the edge strip slitting point in the travel direction of the web (1) and the strip is supported against said movable support element (12) and is passed supported by said movable support element (12) to the next support element (14).

Abstract: Apparatus for coating a surface of a semiconductor wafer includes at least one treatment module, a handling device that may access each of the treatment modules, and a host controller connected to the handling device and to each of the treatment modules. The treatment modules may include a coating assembly for coating the semiconductor wafer surface and may also include at least one thermal conditioning module. The host controller may control the handling device to move a semiconductor wafer relative to the treatment modules. The treatment modules may be disposed within opposing assemblies and may be removed from the assemblies without disabling the treatment modules remaining within the opposing assemblies.

Abstract: A method of reducing particle generation from the thin coating deposited on the internal surfaces of a deposition chamber which undergoes temperature variation greater than 100.degree. C. comprising maintaining the temperature variation of the internal surfaces low enough during the process cycle to keep thermal expansion stresses between the coating and the surfaces under 500 MPa. For titanium nitride deposited on stainless steel, this means keeping temperature variations under approximately 70.degree. C. in a chamber that may be heated to over 350.degree. C. during a typical processing operation. Preferably, a supplemental heater is mounted behind the upper shield and controlled by a temperature sensitive element which provides feedback control based on the temperature of the upper shield.

Abstract: A system for selective treatment of a traveling web, preferably of paper or cardboard, by surface treatment or impregnation in which at least one coater is in the case of web treatment arranged after a dryer group for treatment of the one side of web. At least one further coater for treatment of the other side of the web is arranged before a further dryer group. Noncontact web deflectors are arranged after the coaters and noncontact dryers can be installed retroactively in existing dryer sections.