Interfacing Control Of Plural Operations Patents (Class 118/695)
  • Patent number: 10564548
    Abstract: An exposure apparatus that scans and exposes each of a plurality of areas on a glass substrate, by irradiating the substrate with an illumination light via a projection optical system and relatively driving the substrate with respect to the illumination light, is equipped with: a substrate holder that levitates and supports a first area of the substrate; a substrate carrier that holds the glass substrate levitated and supported by the substrate holder; an X coarse movement stage that drives the substrate holder; an X voice coil motor that drives the substrate carrier; and a controller that controls the X coarse movement stage and the X voice coil motor so that the substrate holder and the substrate carrier are driven, respectively, in scanning exposure. Accordingly, an exposure apparatus with improved position controllability of an object can be provided.
    Type: Grant
    Filed: September 21, 2017
    Date of Patent: February 18, 2020
    Assignee: NIKON CORPORATION
    Inventor: Yasuo Aoki
  • Patent number: 10545806
    Abstract: Methods and systems for printing accurate three-dimensional structures include printing a three-dimensional structure according to an original three-dimensional model. The original three-dimensional model is adjusted to reduce measured differences between the printed three-dimensional structure and the original three-dimensional model. A three-dimensional structure is printed according to the adjusted three-dimensional model.
    Type: Grant
    Filed: June 5, 2017
    Date of Patent: January 28, 2020
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Christopher J. Penny, Michael Rizzolo, Aldis G. Sipolins
  • Patent number: 10442177
    Abstract: Provided is a three-dimensional object formation apparatus including: a head unit which discharges a plurality of types of liquid including first liquid and second liquid and forms dots with the discharged liquid; and a curing unit which cures the dots, in which the three-dimensional object formation apparatus forms a three-dimensional object with the cured dots, and the three-dimensional object is formed in a plurality of formation modes including a first formation mode of forming an inner portion of the three-dimensional object with a plurality of dots formed of the first liquid, and a second formation mode of forming the inner portion of the three-dimensional object with a plurality of dots not including dots formed of the first liquid and including dots formed of the second liquid.
    Type: Grant
    Filed: September 16, 2015
    Date of Patent: October 15, 2019
    Assignee: Seiko Epson Corporation
    Inventor: Kohei Utsunomiya
  • Patent number: 10373810
    Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a body having a first side and a second side; a gas distribution plate disposed proximate the second side of the body and having an annular channel formed in a side surface; and a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the body, wherein the clamp includes a body and a protrusion extending radially inward into the annular groove, and wherein a portion of the gas distribution plate extends over a bottom surface of the clamp.
    Type: Grant
    Filed: January 26, 2017
    Date of Patent: August 6, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Hamid Noorbakhsh, Xiaoping Zhou
  • Patent number: 10323966
    Abstract: A gas meter that is a flow rate measurement device includes a flow rate measurement unit for measuring, at a constant time interval, a flow rate of gas flowing in a passage, a pressure measurement unit for measuring pressure of the gas in the passage, a power supply unit for supplying power to a pressure measurement unit, and an appliance determination unit for determining an appliance being used based on a gas flow rate value. The gas meter further includes a measurement interval controller for determining a gas non-use state, an appliance determination performing state, or an appliance determination non-performing state based on the gas flow rate value and operation information of the appliance determination unit, for controlling the power supply unit in accordance with the determined state, and for changing an interval for turning on/off power supplied to the pressure measurement unit.
    Type: Grant
    Filed: November 15, 2016
    Date of Patent: June 18, 2019
    Assignee: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Mitsuo Yokohata, Yusuke Kitano
  • Patent number: 10183306
    Abstract: An apparatus and method of preparing and coating a large structure such as a ship's hull while in a dry dock wherein a plurality of spray guns disposed in an array are positioned by a robotic arm in a spaced relationship along the surface to be treated so that their spray patterns overlap. The array of spray guns is traversed downwardly and thus painting a strip whereupon the spray guns are secured, move horizontally and then are activated to be moved upwardly until another strip adjacent to and overlapping the first strip is painted. These steps are repeated until the surface area is substantially entirely painted. A shroud is provided for collecting paint oversprays and other excess paint is mounted in the array assemblage. An auxiliary spray gun may be positioned and its spray pattern adjusted to apply paint to area which were missed by the original spray pattern emanating from the array of spray guns.
    Type: Grant
    Filed: February 13, 2018
    Date of Patent: January 22, 2019
    Inventor: John Stephen Morton
  • Patent number: 9818601
    Abstract: A substrate processing apparatus includes a chamber, a stage provided in the chamber, a shower head in which a plurality of slits are formed, and which is opposed to the stage, an opening/closing part for opening and closing the plurality of slits, a first gas supply part which supplies a gas to a space between the stage and the shower head via the plurality of slits, and a second gas supply part which is connected to a side wall of the chamber, and which supplies a gas to the space between the stage and the shower head.
    Type: Grant
    Filed: September 28, 2016
    Date of Patent: November 14, 2017
    Assignee: ASM IP HOLDING B.V.
    Inventors: Masaki Tokunaga, Masaru Zaitsu, Atsuki Fukazawa
  • Patent number: 9353442
    Abstract: Provided is an apparatus for forming a silicon-containing thin film, the apparatus including a controller which is configured to control a process gas supplying mechanism, a heating device, and an exhauster to perform: forming a first seed layer on a base by adsorbing at least silicon included in an aminosilane-based gas on the base, using the aminosilane-based gas; forming a second seed layer on the first seed layer by depositing at least silicon included in a higher-order silane-based gas having an order that is equal to or higher than disilane, using the higher-order silane-based gas having an order that is equal to or higher than the disilane, wherein the first seed layer and the second seed layer form a dual seed layer; and forming the silicon-containing thin film on the dual seed layer.
    Type: Grant
    Filed: December 19, 2014
    Date of Patent: May 31, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Mitsuhiro Okada, Akinobu Kakimoto, Kazuhide Hasebe
  • Patent number: 9027508
    Abstract: A periphery coating unit performs a scan-in process of moving a resist liquid nozzle 27 from an outside of an edge Wb of a wafer W to a position above a periphery region Wc of the wafer W while rotating the wafer W and discharging a resist liquid from the resist liquid nozzle 27; and a scan-out process of moving the resist liquid nozzle 27 from the position above the periphery region Wc of the wafer W to the outside of the edge Wb of the wafer W while rotating the wafer W and discharging the resist liquid from the resist liquid nozzle 27. Further, in the scan-out process, the resist liquid nozzle 27 is moved at a speed v2 lower than a speed v3 at which the resist liquid is moved to a side of the edge Wb of the wafer W.
    Type: Grant
    Filed: December 3, 2013
    Date of Patent: May 12, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Shinichi Hatakeyama, Yoshitomo Sato, Kazuyuki Tashiro, Naofumi Kishita
  • Patent number: 8997686
    Abstract: A system for and method of delivering pulses of a desired mass of gas to a tool is described.
    Type: Grant
    Filed: September 29, 2010
    Date of Patent: April 7, 2015
    Assignee: MKS Instruments, Inc.
    Inventor: Junhua Ding
  • Patent number: 8996422
    Abstract: [PROBLEM] To enable confirmation of whether a substrate processing system is being illicitly used and preventing that use when there is the fact of illicit use. [MEANS FOR SOLUTION] A license file LF is a file encrypting license information L including usage terms of a substrate processing system for a specific user. A match confirmation program P2 confirms the match between the content of the license file LF decrypted by a decryption program P1 and device information DI, network information NI, and current time CT obtained from the substrate processing system to confirm the existence of the fact of illicit use. If there is illicit use, the control program P3 stops operation of the substrate processing system until predetermined action is taken based on the information from the match confirmation program P2.
    Type: Grant
    Filed: August 10, 2005
    Date of Patent: March 31, 2015
    Assignees: Nikon Corporation, Nikon Systems Inc.
    Inventors: Hiroyuki Suzuki, Shinichi Okita, Tadashi Yamaguchi
  • Patent number: 8991331
    Abstract: A method for providing steerability in a plasma processing environment during substrate processing is provided. The method includes managing, power distribution by controlling power being delivered into the plasma processing environment through an array of electrical elements. The method also includes directing gas flow during substrate processing by controlling the amount of gas flowing through an array of gas injectors into the plasma processing environment, wherein individual ones of the array of gas injectors are interspersed between the array of electrical elements. The method further includes controlling gas exhausting during substrate processing by managing amount of gas exhaust being removed by an array of pumps, wherein the array of electrical elements, the array of gas injectors, and the array of pumps are arranged to create a plurality of plasma regions, each plasma region being substantially similar, thereby creating a uniform plasma region across the substrate.
    Type: Grant
    Filed: August 16, 2013
    Date of Patent: March 31, 2015
    Assignee: Lam Research Corporation
    Inventor: Neil Martin Paul Benjamin
  • Publication number: 20150064351
    Abstract: An apparatus including an air blower; a rotary airlock; a receptacle having an inner chamber supplied with a plurality of colorant particles; a water supply; and a mixing chamber. The air blower blows air into a bottom section of the rotary airlock, and the rotary airlock receives colorant particles from an output of the receptacle. A rotor shaft of the rotary airlock rotates to cause colorant particles to be transported to the bottom section of the rotary airlock. Air blown into the bottom section of the rotary airlock mixes with colorant particles transported into the bottom section of the rotary airlock to form an air and colorant particles mixture, which is blown out of a first output of the rotary airlock and combined with water to form a water, air, and colorant particles mixture, which is mixed with material in a mixing chamber. The material may be natural mulch.
    Type: Application
    Filed: November 11, 2014
    Publication date: March 5, 2015
    Inventor: Mark N. Halper
  • Publication number: 20150050418
    Abstract: It is described a method for changing parameters for controlling a transfer of solder paste onto a printed circuit board (150, 250).
    Type: Application
    Filed: June 12, 2014
    Publication date: February 19, 2015
    Inventors: Mathew GREER, Robert GRAY
  • Publication number: 20150000591
    Abstract: Provided are a substrate processing apparatus, a method of manufacturing a semiconductor device, and a non-transitory computer-readable recording medium, which are capable of reducing an effect on a substrate, which is caused by a change in an atmosphere in a substrate storage container, by appropriately supplying an inert gas into the substrate storage container.
    Type: Application
    Filed: June 27, 2014
    Publication date: January 1, 2015
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Junichi KAWASAKI, Mitsuru FUNAKURA
  • Publication number: 20140331928
    Abstract: A method of forming a germanium thin film on an underlying film includes forming a germanium seed layer by absorbing a germanium on a surface of the underlying film using an aminogermane-based gas, and forming a germanium thin film on the germanium seed layer using a germane-based gas.
    Type: Application
    Filed: July 22, 2014
    Publication date: November 13, 2014
    Inventors: Akinobu KAKIMOTO, Shigeru NAKAJIMA, Kazuhide HASEBE
  • Publication number: 20140329013
    Abstract: A computer implemented system and method of coating a workpiece includes moving a coating applicator mounted to a coating dispensing robot relative to a workpiece and moving a mask mounted to a masking robot relative to the workpiece, wherein the mask is positioned between the coating applicator and the workpiece. A portion of the coating dispensed by the applicator is deposited on the workpiece, and another portion is intercepted by and deposited onto the mask. A desired pattern of coating can be deposited by moving the mask or dispenser or both in a coordinated manner.
    Type: Application
    Filed: May 1, 2014
    Publication date: November 6, 2014
    Applicant: ABB Technology AG
    Inventor: Didier Rouaud
  • Publication number: 20140295095
    Abstract: A method and apparatus for the continuous powder coating of a non-conductive profile produced in a continuous forming process, such as pultrusion or extrusion, such that the profile is powder coated while on the profile forming machine and before the subject segment of the continuous profile is severed from the continuous profile on the forming machine (i.e. in-line).
    Type: Application
    Filed: April 2, 2013
    Publication date: October 2, 2014
    Inventors: Robert Langlois, Jeffrey Sugar, Gary Sugar
  • Publication number: 20140295103
    Abstract: A process and apparatus are disclosed for the deposition of a layer of a first material onto a substrate of a second material. Powder particles of the first material are entrained into a carrier gas flow to form a powder beam directed to impinge on the substrate. This defines a powder beam footprint region at the substrate. The powder beam and the substrate are moved relative to each other to move the powder beam footprint relative to the substrate, thereby to deposit the layer of the first material. A laser is operated to cause direct, local heating of at least one of a forward substrate region and a powder beam footprint region. The laser is controlled to provide a spatial temperature distribution at the powder footprint region of the substrate in which the local temperature of the substrate is in the range 0.5Ts to less than Ts in a volume from the surface of the substrate at least up to a depth of 0.2 mm from the surface of the substrate and not more than 0.
    Type: Application
    Filed: October 26, 2012
    Publication date: October 2, 2014
    Inventors: Andrew Cockburn, William O'Neill, Martin Sparkes, Rocco Lupoi, Matthew Bray
  • Publication number: 20140287139
    Abstract: A method of manufacturing an object. A thermoplastic matrix material is melted to transform it into liquid matrix material. The liquid matrix material is fed into a chamber via one or more matrix inlets. A fibre is also fed into the chamber via a fibre inlet. The fibre in the chamber is contacted by the liquid matrix material. A coated fibre is extruded from an extrusion outlet of the chamber onto a substrate, the coated fibre comprising the fibre with a coating of the liquid matrix material, the substrate comprising a previously extruded coated fibre. The fibre moves in and out of the chamber at the same velocity relative to the chamber. The coating fuses with the previously extruded coated fibre and solidifies after it has fused with the previously extruded coated fibre. Relative movement is generated between the extrusion outlet and the substrate as the coated fibre is extruded from the extrusion outlet.
    Type: Application
    Filed: March 18, 2014
    Publication date: September 25, 2014
    Applicant: EADS UK Limited
    Inventors: Benjamin FARMER, William KESSLER, Jonathan MEYER, Andrew HAWKINS
  • Publication number: 20140273421
    Abstract: A high throughput system for warming a wafer to a desired temperature after undergoing a low-temperature implantation process includes an implantation chamber, a wafer warming chamber configured to uniformly warm a single wafer, and a plurality of robotic arms to transfer wafers throughout the system. At each stage in the fabrication process, the robotic arms simultaneously work with multiple wafers and, therefore, the system provides a high throughput process. Also, the warming chamber may be a vacuum environment, thus eliminating the mist-condensation problem that results in wafer spotting.
    Type: Application
    Filed: March 11, 2014
    Publication date: September 18, 2014
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: TSUN-JEN CHAN, CHENG-HUNG HU, YI-HANN CHEN, KANG HUA CHANG, MING-TE CHEN
  • Publication number: 20140245952
    Abstract: An automated apparatus and method for coating medical devices such as an intravascular stent, are disclosed in the method, a 2-D image of a stent is processed to determine (1) paths along the stent skeletal elements by which a stent secured to a rotating support element can be traversed by a dispenser head whose relative motion with respect to the support element is along the support-element axis, such that some or all of the stent skeletal elements will be traversed (2) the relative speeds of the dispenser head and support element as the dispenser head travels along the paths, and (3), and positions of the dispenser head with respect to a centerline of the stent elements as the dispenser head travels along such paths The rotational speed of the support and relative linear speed of the dispenser are controlled to achieve the desired coating thickness and coating coverage on the upper surfaces, and optionally, the side surfaces, of the stem elements
    Type: Application
    Filed: September 30, 2013
    Publication date: September 4, 2014
    Applicant: Biosensors International Group, Ltd.
    Inventors: Ivan Vecerina, Vinh Pham
  • Patent number: 8785216
    Abstract: A substrate processing method which is capable of enhancing productivity in manufacturing product substrates. In process chambers of an etching apparatus, etching is carried out on a substrate as an object to be processed, and dummy processing is carried out on at least one non-product substrate before execution of the etching. A host computer determines whether or not the dummy processing is to be executed. The host computer determines whether or not the interior of each of the process chambers and is in a stable state, and omits the execution of the dummy processing when it is determined that it is in the stable state.
    Type: Grant
    Filed: February 24, 2011
    Date of Patent: July 22, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Satoshi Yamazaki, Mitsuru Hashimoto
  • Publication number: 20140170320
    Abstract: A thin film forming method for forming a thin film on a workpiece accommodated within a reaction chamber includes a first operation of supplying a first source gas and a second source gas into the reaction chamber, and a second operation of stopping the supply of the first source gas, supplying the second source gas into the reaction chamber and setting an internal pressure of the reaction chamber higher than an internal pressure of the reaction chamber set in the first operation. The first operation and the second operation are alternately repeated a plurality of times.
    Type: Application
    Filed: December 16, 2013
    Publication date: June 19, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Kazuya YAMAMOTO, Yuichi ITO
  • Patent number: 8746170
    Abstract: A vacuum chamber is evacuated through a first evacuation passage provided with a first valve and a second evacuation passage provided with a second valve. An opening degree of the first valve is adjusted so that a pressure in the vacuum chamber becomes substantially equal to a process pressure P; an opening degree of a butterfly valve further provided in the second evacuation passage is adjusted to substantially equal to a set value determined by a table in order to set flow rates of gases to be evacuated through the first evacuation passage and the second evacuation passage to be substantially equal to corresponding set values determined by the recipe; and an opening degree of the second valve is adjusted so that a measurement value of a differential pressure gauge further provided in the second evacuation passage becomes substantially equal to a differential pressure written in the table.
    Type: Grant
    Filed: November 1, 2010
    Date of Patent: June 10, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Kohichi Orito, Manabu Honma, Tatsuya Tamura
  • Publication number: 20140154890
    Abstract: A periphery coating unit performs a scan-in process of moving a resist liquid nozzle 27 from an outside of an edge Wb of a wafer W to a position above a periphery region Wc of the wafer W while rotating the wafer W and discharging a resist liquid from the resist liquid nozzle 27; and a scan-out process of moving the resist liquid nozzle 27 from the position above the periphery region Wc of the wafer W to the outside of the edge Wb of the wafer W while rotating the wafer W and discharging the resist liquid from the resist liquid nozzle 27. Further, in the scan-out process, the resist liquid nozzle 27 is moved at a speed v2 lower than a speed v3 at which the resist liquid is moved to a side of the edge Wb of the wafer W.
    Type: Application
    Filed: December 3, 2013
    Publication date: June 5, 2014
    Applicant: Tokyo Electron Limited
    Inventors: Shinichi Hatakeyama, Yoshitomo Sato, Kazuyuki Tashiro, Naofumi Kishita
  • Patent number: 8733272
    Abstract: Fluid ejection apparatuses and processes for making the same are disclosed. An apparatus for ejecting fluid droplets includes a substrate having a plurality of flow paths formed therein, each flow path including a respective pumping chamber and a respective nozzle, and the respective nozzle being configured to eject fluid droplets through a first surface of the substrate in response to actuation of the respective pumping chamber; and an actuation assembly including a drive electrode layer over a second surface of the substrate opposite to the first surface, a piezoelectric layer over the drive electrode layer, and a reference electrode layer over the piezoelectric layer, the drive electrode layer being patterned to define an individually controllable drive electrode over each of two or more pumping chambers in the substrate, and the reference electrode layer including a continuous reference electrode spanning the two or more pumping chambers in the substrate.
    Type: Grant
    Filed: December 29, 2010
    Date of Patent: May 27, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Deane A. Gardner, Andreas Bibl
  • Publication number: 20140120352
    Abstract: A coating apparatus configured to coat a peripheral surface of an endless member with a coating liquid, includes: a holding member configured to hold the endless member; an impregnation member configured to be impregnated with the coating liquid and configured to coat the endless member with the coating liquid in contact with the endless member; a nozzle member configured to eject the coating liquid onto the endless member; a rotating mechanism configured to rotate the holding member relative to the impregnation member and the nozzle member; and a moving mechanism configured to move the holding member relative to the impregnation member and the nozzle member so that the coating liquid is ejected from the nozzle member onto the endless member in a region where the coating liquid is already coated by the impregnation member.
    Type: Application
    Filed: October 25, 2013
    Publication date: May 1, 2014
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Yasuhiro Miyahara, Yuji Hasegawa, Katsuya Abe
  • Publication number: 20140099429
    Abstract: In an absorbent sheet manufacturing apparatus, a storage part stores speed determining information including relationships between conveying speed of a first sheet member and rotational speed of a supply cylinder and corresponding respectively to target particle densities. A control part determines the rotational speed of the supply cylinder on the basis of a target particle density, the conveying speed and the speed determining information. Even if various changes are made to the conveying speed of the first sheet member, the amount of particles supplied can be accurately controlled such that the density of particles on the first sheet member matches the target particle density. Even if various changes are made to the target particle density, the amount of particles supplied can be accurately controlled in consideration of the conveying speed such that the density of particles matches the target particle density.
    Type: Application
    Filed: September 18, 2013
    Publication date: April 10, 2014
    Applicant: LIVEDO CORPORATION
    Inventor: Kazuya MARUHATA
  • Patent number: 8689732
    Abstract: A system for creating a wood like appearance on a synthetic component including a sales client device, a network, computer instructions for creating a work order, a tray with scannable tray identifier to hold a synthetic component, a production client device connected to the network with computer instructions for applying a base coat, a glaze, and a top coat to the synthetic component as it automatically moves on a conveyer system a portion of which is connected to the production client device. A scannable tray identifier with a plurality of sensors link the tray identifier to the work order for authenticating and validating the location of the tray on the conveyor system, or initiating an alerting device. The system has a plurality of temperature control environments to simultaneously control heating of the synthetic component while spraying, drying and UV curing with spray treatment device.
    Type: Grant
    Filed: August 14, 2013
    Date of Patent: April 8, 2014
    Assignee: Glasscraft Door Company
    Inventors: John B. Plummer, Matthew James O'Shea, Joseph Gene Denley
  • Patent number: 8640644
    Abstract: A powder spraycoating method and powder spraycoating equipment. A dense phase powder pump is used. According to a predetermined conveying-air function in a control unit, different rates of compressed conveying air can be defined for different powder rates. In one predetermined total-air function in the control unit, the sum of total-air rate composed of the rate of compressed conveying air and of the rate of supplemental compressed air can be kept constant even if the rate of compressed conveying air changes.
    Type: Grant
    Filed: September 11, 2008
    Date of Patent: February 4, 2014
    Assignee: Gema Switzerland GmbH
    Inventors: Felix Mauchle, Christian Marxer, Hanspeter Vieli
  • Publication number: 20140030522
    Abstract: A method for forming a relatively transparent fiber composite is disclosed. In one embodiment, the relatively transparent fiber composite can include glass fibers with a relatively low amount of iron oxide. In another embodiment, the transparent fiber composite can include a selected resin, a sizing and glass fibers where the index of refraction of the glass fibers, the sizing and the resin can be similar, within a tolerance amount. In yet another embodiment, the resin can be relatively clear and free from pigments and tints. In one embodiment, the glass fibers can be formed into a mat. In another embodiment, glass fibers can be chopped or milled and a relatively transparent part can be formed through injection molding.
    Type: Application
    Filed: July 27, 2012
    Publication date: January 30, 2014
    Applicant: Apple Inc.
    Inventors: Paul CHOINIERE, Evans Hankey, Michael K. Pilliod, Peter N. Russell-Clarke
  • Patent number: 8627780
    Abstract: Exemplary painting devices for painting components, e.g., motor vehicle bodies or parts thereof, and associated exemplary methods are disclosed. An exemplary painting device may include a multi-axis painting robot positioning an atomizer, a robot controller for controlling the painting robot, and a controls enclosure comprising the robot controller. An exemplary controls enclosure may be a load-bearing column that mechanically supports the painting robot.
    Type: Grant
    Filed: August 19, 2009
    Date of Patent: January 14, 2014
    Assignee: Durr Systems GmbH
    Inventors: Frank Herre, J├╝rgen Haas, Thomas Hezel, Bernd Leiensetter
  • Publication number: 20130330467
    Abstract: A method and system for applying a liner material to a contoured surface, such as an exposed rock face in an underground hard rock mine, is disclosed. Locations of a plurality of spatially distributed surface grid points on the contoured surface may be detected so as to generate a representative topographical profile of the contoured surface. Based on the plurality of surface grid points, a spray path for a liner application device configured to emit a spray of the liner material may be determined. In some cases, the spray path may have a trajectory that follows the topographical profile of the contoured surface offset therefrom within a spray range of the liner application device. Liner material may then be sprayed onto the contoured surface while controlling the liner application device to undertake at least one pass of the spray path.
    Type: Application
    Filed: June 12, 2012
    Publication date: December 12, 2013
    Applicant: ABB INC.
    Inventors: Brian J. BOND, Abel J. ELIAS, Aaron J. ELLIOTT, Seth GALIPEAU, Mark GREAVES, Stephen M. KELLY, Nick MCDONALD, Brian W. RICHARDSON, Steve F. SIMPSON
  • Patent number: 8601977
    Abstract: An electronic spraycoating control device for implementing spraycoating methods includes at least one manually driven program selecting element for selecting programs from two different groups of programs. The electronic spraycoating control device further includes a plurality of manually driven parameter setting elements and display units to automatically display the adjusted parameter references values.
    Type: Grant
    Filed: March 6, 2006
    Date of Patent: December 10, 2013
    Assignee: ITW Gema GmbH
    Inventors: Felix Mauchle, Christian Marxer
  • Patent number: 8601976
    Abstract: A gas supply system includes a main gas supply line; a vent gas supply line; a plurality of gas supply mechanisms disposed in middle of both gas supply lines; a pressure type flow-rate control system disposed on an inlet side of the main gas supply line so a flow of carrier gas is supplied to the main gas supply line; a pressure control system disposed on an inlet side of the vent gas supply line, a carrier gas having a predetermined pressure is supplied to the vent gas supply line while the pressure control system performs a pressure adjustment, a gas pressure of the main gas supply line detected downstream from an orifice of the pressure type flow-rate control system and a gas pressure of the vent gas supply line are compared, and the gas pressure of the vent gas supply line is adjusted so a difference therebetween becomes zero.
    Type: Grant
    Filed: July 17, 2008
    Date of Patent: December 10, 2013
    Assignee: Fujikin Incorporated
    Inventors: Kouji Nishino, Ryousuke Dohi, Masaaki Nagase, Kaoru Hirata, Katsuyuki Sugita, Nobukazu Ikeda
  • Patent number: 8590484
    Abstract: Provided is a semiconductor device manufacturing method and a substrate processing apparatus. The method comprise: a first process of forming a film containing a predetermined element on a substrate by supplying a source gas containing the predetermined element to a substrate processing chamber in which the substrate is accommodated; a second process of removing the source gas remaining in the substrate processing chamber by supplying an inert gas to the substrate processing chamber; a third process of modifying the predetermined element-containing film formed in the first process by supplying a modification gas that reacts with the predetermined element to the substrate processing chamber; a fourth process of removing the modification gas remaining in the substrate processing chamber by supplying an inert gas to the substrate processing chamber; and a filling process of filling an inert gas in a gas tank connected to the substrate processing chamber.
    Type: Grant
    Filed: December 6, 2011
    Date of Patent: November 26, 2013
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Taketoshi Sato, Masayuki Tsuneda
  • Publication number: 20130295300
    Abstract: A method of manufacturing a glazing having a frequency selective surface comprising the steps of: a) depositing a coating on a substrate, said coating being non-transmitting to radio frequency (RF) radiation; b) providing a laser beam and c) removing a portion of the coating by laser ablation to form one or more curves and/or lines having a spacing selected to provide transparency of the coating to RF radiation of a desired wavelength; characterized by d) directing the laser beam and/or moving the substrate such that the relative motion of the intersection of the laser beam and the coating, with respect to the substrate, comprises motion in a first dimension, wherein said motion is simultaneously superimposed with a reciprocating motion in a second dimension; e) translating said intersection in the second dimension; and f) repeating at least step d) out of steps d) to f).
    Type: Application
    Filed: November 16, 2011
    Publication date: November 7, 2013
    Applicant: Pilkington Group Limited
    Inventor: Peter Paulus
  • Patent number: 8545711
    Abstract: A processing method performs a predetermined process to an object by supplying a process gas at a prescribed flow rate into a process container to which a gas supply unit and an exhaust system are connected. The processing method includes a first process of setting the gas supply unit to supply a process gas at a flow rate greater than the prescribed flow rate of a predetermined process for a predetermined short time from a gas channel while exhausting an atmosphere in the process container through the exhaust system; and a second process of setting the gas supply unit to supply the process gas at the prescribed flow rate from the gas channel after the first process is completed.
    Type: Grant
    Filed: December 28, 2012
    Date of Patent: October 1, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Toshihisa Nozawa, Koji Kotani, Kouji Tanaka
  • Patent number: 8539908
    Abstract: A film forming apparatus includes a processing chamber, and a mounting table disposed in the processing chamber to mount a substrate thereon. The film forming apparatus further includes a gas shower head having gas supply holes and including a central region facing a central portion of the substrate and a peripheral region facing a peripheral portion of the substrate, a first processing gas supply unit for supplying a first processing gas to the central region, a second processing gas supply unit for supplying a second processing gas to the central region, an energy supply unit for supplying energy to react the first processing gas with the second processing gas on the substrate, and a purge gas supply unit for supplying a purge gas to the central region and the peripheral region when one of the first and the second processing gas is switched by the other.
    Type: Grant
    Filed: March 13, 2008
    Date of Patent: September 24, 2013
    Assignee: Tokyo Electron Limited
    Inventor: Toshio Takagi
  • Patent number: 8512474
    Abstract: A precursor delivery system for an irradiation beam instrument includes an injection tube for injecting gasses into the instrument vacuum chamber and a main gas line having an inlet and an outlet. The outlet is connected to the injection tube, and the inlet is connected to a sequential pair of valves connected to a carrier gas source. A crucible for holding precursor material is selectively connected to the main gas line at a location between the pair of valves and the injection tube. The source of carrier gas may be selectively connected to the inlet by sequential operation of the pair of carrier gas valves, so that pulses of carrier gas assist the flow of precursor material to the injection tube. Rapid purging of the system between precursors is enabled by a valve selectively connecting the main line to an envelope in communication with the instrument vacuum.
    Type: Grant
    Filed: January 25, 2012
    Date of Patent: August 20, 2013
    Assignee: Omniprobe, Inc.
    Inventors: Rocky Kruger, Aaron Smith, Thomas M. Moore
  • Patent number: 8505478
    Abstract: Developed is high-efficiency synthesis method and apparatus capable of promoting the initial growth of carbon nanostructure by eliminating the initial fluctuation time and rising time in raw gas flow quantity.-A high-efficiency synthesis method of carbon nanostructure according to the present invention is a high-efficiency synthesis method of carbon nanostructure, the method comprising: bringing raw material gas and a catalyst into contact with each other under reactive conditions so as to produce a carbon nanostructure, wherein: the initiation of contact of the raw material gas with the catalyst is carried out instantaneously. Reaction conditions such as temperature and raw material gas concentration are set so as to meet those for catalyst growth, and under the reaction conditions, the initiation of contact of raw material gas G with catalyst 6 is carried out instantaneously.
    Type: Grant
    Filed: August 4, 2010
    Date of Patent: August 13, 2013
    Assignee: Taiyo Nippon Sanso Corporation
    Inventors: Osamu Suekane, Toshikazu Nosaka, Yoshikazu Nakayama, Lujun Pan, Takeshi Nagasaka, Toru Sakai, Hiroyuki Tsuchiya, Toshiki Goto, Xu Li
  • Patent number: 8479683
    Abstract: A method of forming a boron nitride or boron carbon nitride dielectric produces a conformal layer without loading effect. The dielectric layer is formed by chemical vapor deposition (CVD) of a boron-containing film on a substrate, at least a portion of the deposition being conducted without plasma, and then exposing the deposited boron-containing film to a plasma. The CVD component dominates the deposition process, producing a conformal film without loading effect. The dielectric is ashable, and can be removed with a hydrogen plasma without impacting surrounding materials. The dielectric has a much lower wet etch rate compared to other front end spacer or hard mask materials such as silicon oxide or silicon nitride, and has a relatively low dielectric constant, much lower then silicon nitride.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: July 9, 2013
    Assignee: Novellus Systems, Inc.
    Inventors: George Andrew Antonelli, Mandyam Sriram, Vishwanathan Rangarajan, Pramod Subramonium
  • Patent number: 8470126
    Abstract: An apparatus for etching features in an etch layer is provided. A plasma processing chamber is provided, comprising a chamber wall, a chuck, a pressure regulator, an electrode or coil, a gas inlet, and a gas outlet. A gas source comprises a fluorine free deposition gas source and an etch gas source. A controller comprises at least one processor and computer readable media, comprising computer readable code for providing a conditioning for a patterned pseudo-hardmask, wherein the conditioning comprises computer readable code providing a fluorine free deposition gas comprising a hydrocarbon gas, computer readable code for forming a plasma, computer readable code for providing a bias less than 500 volts, and computer readable code for forming a deposition on top of the patterned pseudo-hardmask, computer readable code for etching the etch layer, and computer readable code for cyclically repeating the conditioning and etching at least twice.
    Type: Grant
    Filed: September 27, 2012
    Date of Patent: June 25, 2013
    Assignee: Lam Research Corporation
    Inventors: Ben-Li Sheu, Rajinder Dhindsa, Vinay Pohray, Eric A. Hudson, Andrew D. Bailey, III
  • Patent number: 8459203
    Abstract: A coating powder feed method, coating powder feeding device, electrostatic powder spraycoating apparatus containing such a coating powder feeding device. The invention includes a dense phase powder pump fitted with at least one feed chamber. A control signal to create a partial vacuum in the feed chamber is generated no earlier than simultaneously with, preferably by a predetermined delay time after, a control signal opening a powder intake valve of the feed chamber, as a result of which the beginning of partial vacuum buildup in the feed chamber shall take place no earlier than simultaneously with the initial opening of the powder intake valve or by a defined time delay after the opening of the powder intake valve.
    Type: Grant
    Filed: September 8, 2008
    Date of Patent: June 11, 2013
    Inventors: Felix Mauchle, Christian Marxer, Hanspeter Vieli
  • Publication number: 20130136859
    Abstract: A film forming method performs a film forming process on a target object having on a surface thereof an insulating layer. The film forming method includes a first thin film forming step of forming a first thin film containing a first metal, an oxidation step of forming an oxide film by oxidizing the first thin film, and a second thin film forming step of forming a second thin film containing a second metal on the oxide film.
    Type: Application
    Filed: June 24, 2011
    Publication date: May 30, 2013
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Kenji Matsumoto, Shigetoshi Hosaka, Hitoshi Itoh
  • Patent number: 8448600
    Abstract: A substrate processing apparatus is disclosed equipped with a transfer mechanism that transfers a substrate processed at a processing block to a carrier so that the increase of the number of transfer process is suppressed, improving the processing efficiency. The substrate processing apparatus is configured in such a way that, when a second-transfer module houses at least one substrate and a carrier that can house the at least one substrate is not placed in a carrier-placement unit, the at least one substrate is transferred to a buffer module. When the second transfer module houses at least one substrate and the carrier that can house the at least one substrate is placed in the carrier-placement unit, the at least one substrate is transferred to the carrier, regardless of whether or not a substrate is being transferred from the buffer module to the carrier.
    Type: Grant
    Filed: June 8, 2010
    Date of Patent: May 28, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Kenichirou Matsuyama, Tomohiro Kaneko
  • Patent number: 8408158
    Abstract: A coating/developing device includes a processing block having a plurality of coating unit blocks stacked and a developing unit block stacked on the coating unit blocks. Each of the unit blocks is provided with a liquid processing unit for coating a liquid chemical on a substrate, a heating unit for heating the substrate, a cooling unit for cooling the substrate and a transfer unit for transferring the substrate between the units. The liquid processing unit is provided with a coating unit for coating a resist liquid on the substrate, a first bottom antireflection coating (BARC) forming unit for coating a liquid chemical for a BARC on the substrate before the resist liquid is coated thereon, and a second BARC forming unit for coating a liquid chemical for the BARC on the substrate after the resist liquid is coated thereon.
    Type: Grant
    Filed: March 9, 2006
    Date of Patent: April 2, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Masami Akimoto, Shinichi Hayashi, Yasushi Hayashida, Nobuaki Matsuoka, Yoshio Kimura, Issei Ueda, Hikaru Ito
  • Patent number: 8387559
    Abstract: Fluorine gas generators are connected with semiconductor manufacturing apparatuses through a gas supplying system including a storage tank that can store a predetermined quantity of fluorine gas generated in the on-site fluorine gas generators. When one or more of the on-site fluorine gas generators are stopped, fluorine gas is supplied to the semiconductor manufacturing apparatuses from the storage tank storing a predetermined quantity of fluorine gas, so as to keep the operations of the semiconductor manufacturing apparatuses. Thereby obtained is a semiconductor manufacturing plant in which fluorine gas generated in the fluorine gas generators can be safely and stably supplied to the semiconductor manufacturing apparatuses, and with superior cost performance.
    Type: Grant
    Filed: February 7, 2007
    Date of Patent: March 5, 2013
    Assignees: Toyo Tanso Co., Ltd., Tokyo Electron Limited
    Inventors: Jiro Hiraiwa, Osamu Yoshimoto, Hiroshi Hayakawa, Tetsuro Tojo, Tsuneyuki Okabe, Takanobu Asano, Shinichi Wada, Ken Nakao, Hitoshi Kato
  • Patent number: RE45067
    Abstract: The invention concerns a contactless numerical printing machine for products of average fluidity, such as varnish, glue, and conducting or scratchable ink, onto a substrate of variable thickness and dimensions. The machine includes a special device for printing without contact by projection. The projected materials are materials of average fluidity or composed of large-dimension molecules. The process used includes an electro-acoustic device for control of the projection, and a multiplicity of projection nozzles, each controlled individually. The machine also includes a production chain with different work stations, whose printing devices are controlled by a computer management system. The production chain allows printing with a certain precision in given zones located during the processing by an appropriate work station.
    Type: Grant
    Filed: February 19, 2010
    Date of Patent: August 12, 2014
    Assignee: MGI France
    Inventors: Edmond Abergel, Raphael Renaud