Abstract: A system for monitoring a condition of a consumable component in a substrate processing system that includes a tapered plug having a first axis, a second axis that intersects the first axis, a top portion with first width, a bottom portion with a second width, and sidewalls joining said top and bottom portions respectively. The tapered plug has a cross sectional profile that is substantially parallel to the top and bottom portions and a cross sectional width that varies according to a location where the cross sectional profile intersects the second axis. At least one of the tapered plugs is inserted into at least one consumable component of the substrate processing system such that the top portion of the tapered plug is exposed to a processing environment of a plasma processing system.

Abstract: An apparatus for forming alignment layer includes a printing stage for supporting a substrate thereon, at least one inkjet head having at least one spray hole above the printing stage, the spray hole spraying an alignment material onto the substrate, a head support supporting the inkjet head, a pitch measuring unit adjacent to the inkjet head, and a display unit displaying measured results provided by the pitch measuring unit.

Abstract: The invention provides a means for estimating a self-bias voltage under arbitrary etching conditions via a simple procedure.

Abstract: Receiving element for receiving a specimen detached from a biological mass by means of laser radiation A receiving element (1) is provided for receiving a specimen detached from a biological mass (7) by means of laser radiation, the receiving element (1) comprising a receiving surface for receiving the specimen, the receiving surface comprising an adhesive agent (4) for enhancing the adhesion of the respective specimen to the receiving surface. The adhesive agent (4) suppresses the occurrence of electrostatic forces, acting on the specimen, in the receiving element (1), may be dissolved without damaging the specimen and/or may receive agents for further processing of the specimen. A suitable adhesive agent (4) is in particular a hydrogel such as for example agarose. Such a receiving element (1) is suitable in particular for collecting specimens catapulted out of the biological mass (7).

Abstract: An apparatus and method for simultaneously coating and measuring a part including a part support, a sprayer, a part measurer including a digital camera and a display device, all of which are positioned adjacent to the part support. The sprayer applies a coating to a section of the part while the part measurer continuously measures at least two dimensions of the section. The digital camera takes at least one picture of the entire section of the part while the part is being coated and enables a user to accurately determine the cross section of the part to the optimum finished part configuration and size and also detect defects, blemishes or coating irregularities formed on the section. The apparatus and method of the present invention significantly reduces the margin of error related to the application of coatings to parts, the number of defective parts and increases the overall efficiency.

Abstract: Techniques for automatically adjusting and/or optimizing the color and/or intensity of the illuminating light used in a vision system is presented. The intensity of each of a plurality of illuminating light colors is allowed to be independently adjusted to adapt the illumination light based on the color of a part feature against the part feature background of a part being viewed by the vision system to produce high contrast between the part feature and background. Automated contrast optimization may be achieved by stepping through all available color combinations and evaluating the contrast between the part feature and background to select a color combination having a “best” or acceptable contrast level.

Abstract: The present invention relates to an integrated apparatus for monitoring wafers and for process control in the semiconductor manufacturing process, by means of at least two different measurements that can be installed inside any part of the semiconductor production line, i.e., inside the photocluster equipment, the CVD equipment or the CMP equipment. The apparatus comprises a measuring unit for performing at least one optical measurement in predetermined sites on said wafer, illumination sources for illuminating said wafer via measuring unit, supporting means for holding, rotating and translating the wafer and a control unit. The measuring unit comprises: at least two measuring sub-units, one of them being normal-incidence optical measuring system.

Abstract: An optical window deposition shield including a backing plate having a through hole, and a honeycomb structure having a plurality of adjacent cells configured to allow optical viewing through the honeycomb structure. Each cell of the honeycomb structure has an aspect ratio of length to diameter sufficient to impede a processing plasma from traveling through the full length of the cell. A coupling device configured to couple the honeycomb core structure to the backing plate such that the honeycomb structure is aligned with at least a portion of the through hole in the backing plate. The optical window deposition shield shields the optical viewing window of a plasma processing apparatus from contact with the plasma.

Abstract: Device and method for fabricating a display panel having ink-jet printing applied thereto, the device including a stage for supporting a substrate, a base having one or more than one rail for transporting the stage, and one or more than one ink-jet head rotatable by an angel for spraying a pattern forming solution to the substrate, thereby reducing a fabrication cost and simplifying a fabrication process.

Abstract: The invention device measures the instantaneous rotation speed of a turbine (6) which is housed inside the body (3) of the paint sprayer (2) and which rotationally drives the rotating bowl (5) when the paint sprayer is mounted on the end of an arm (8) of a robot or an analogous multi-axis machine. A disk (10), which is disposed to the rear of the turbine (6) and which rotates therewith, cooperates with the front end (11a) of an optical-fiber-type light guide (11) which is interrupted (11b) at the rear (7) of the body (3) of the paint sprayer (2). Transmitting and receiving optoelectronic means are mounted on the end of the arm on the mounting plane (9) of the paint sprayer, opposite the rear end (11b) of the light guide (11). Said means convert a reflected optical signal which is carried by the optical guide (11) into an electronic signal which is carried by an electric cable (22) placed in the arm (8). The inventive device is suitable for use with machines on automatic painting lines for automotive vehicles.

Abstract: In a film forming apparatus according to the aerosol deposition method, the thickness of a structure being formed can be controlled accurately. The film forming apparatus includes an aerosol generating part in which raw material powder is to be provided, a compressed gas cylinder and a pressure regulating part for introducing a gas into the aerosol generating part to blow up the raw material powder thereby generating an aerosol, a substrate holder for holding a substrate on which a structure is to be formed, a nozzle for spraying the aerosol generated in the aerosol generating part toward the substrate, and a sensor to be used for obtaining an amount of primary particles that have contributed to film formation by impinging on the substrate or the structure formed thereon from among the raw material powder contained in the aerosol sprayed from the nozzle.

Abstract: Solder paste application, inspection and correction. Following or during application of solder paste on a substrate, the result thereof is inspected and any detected errors are registered. Following an evaluation as to whether correction of these errors is required and if it would be worthwhile, the errors are corrected. The correction involves removing solder paste from locations where so required, and jetting of additional solder paste to locations where so required.

Abstract: There is provided by this invention a wafer probe for measuring plasma and surface characteristics in plasma processing environment that utilizes integrated sensors on a wafer substrate. A microprocessor mounted on the substrate receives input signals from the integrated sensors to process, store, and transmit the data. A wireless communication transceiver receives the data from the microprocessor and transmits information outside of the plasma processing system to a computer that collects the data during plasma processing. The integrated sensors may be dual floating Langmuir probes, temperature measuring devices, resonant beam gas sensors, or hall magnetic sensors. There is also provided a self-contained power source that utilizes the plasma for power that is comprised of a topographically dependent charging device or a charging structure that utilizes stacked capacitors.

Abstract: A plasma processing apparatus having a sample stage disposed inside a vacuum chamber and a plate member disposed opposing to a sample which is placed on the sample stage and supplied with electric power. The sample is processed using a plasma generated between the sample stage and the plate member and a measuring port is disposed at a back side of the plate member. The measuring port includes an optical transmitter which receives light from a surface of the sample, and a seal which vacuum-seals between an atmospheric side and vacuum side of the vacuum chamber.

Abstract: When vehicle wheels are powder-coated with powder coating, those surfaces on which no coating is wanted are always also coated. To suck off the powder coating from these surface areas before it is baked in, a device which includes a conveyor system, an electronic camera and a suction station is used. The electronic camera records the axial and angular position of the vehicle wheels which pass it, and supplies corresponding data to a controller. After a certain time delay, this causes a suction head in the suction station to move, in such a way that it approaches the vehicle wheel with appropriate alignment of its axis and angular position, and using suction nozzles sucks off those surfaces of the vehicle wheel on which the powder coating is not wanted. During the suction process, the suction head moves together with the vehicle wheel, at the same speed.

Abstract: In a method and apparatus for predicting process results of objects being processed in a processing chamber of a processing apparatus, operation data and process result data obtained at the time of processing each of the objects are collected and a multivariate analysis is performed on the basis of the collected operation data and process result data to obtain a first correlation therebetween. Process results are predicted on the basis of the first correlation. Weighting coefficients for the respective operation data are set on the basis of the predicted process results. A second correlation between the weighted operation data and the process result data is obtained by a multivariate analysis. Process results are predicted by using operation data, obtained when objects other than the objects used to obtain the second correlation are processed, on the basis of the second correlation.

Abstract: The invention relates to an adhesive robot, comprising a device for applying adhesive to a workpiece. The adhesive robot has a nozzle head (18), which has an application nozzle (24) and can be supplied with a pressurized viscous adhesive, the nozzle head (18) and the workpiece (14) being displaceable in relation to one another. The adhesive which is issued from the application nozzle (24) in a spray jet (28) is applied to a workpiece (14) along a predefined line of application (36) in the form of a strip of adhesive (40). To facilitate the adjustment and re-calibration process, the system comprises at least one camera unit (42), which is located on the nozzle head (18) and whose leans is directed towards the spray jet (28) or the adhesive strip (40). The output of said camera unit is connected to an image evaluation unit (45). The image data (40) recorded by the camera unit (42) is buffered and compared with predetermined image values (40).

Abstract: A liquid processing apparatus comprises a liquid processing section for applying a liquid processing to wafers W, a carrier delivery section for delivering the carrier housing the wafers W, a carrier stock section capable of storing a plurality of carriers, an interface section for transferring the wafers W between the carrier stock section and the liquid processing section, a carrier transfer device for transferring the carrier, a wafer inspecting device for inspecting the wafers W within the carrier, and a carrier transfer device control section for controlling the carrier transfer device. The carrier transfer device control section controls the carrier transfer device such that the carrier, which has been judged to be capable of a liquid processing on the basis of the result of the inspection of the wafers W, is stored in the carrier stock section, and the liquid processing is started after completion of the inspection of a predetermined number of carriers.

Abstract: A reaction apparatus for atomic layer deposition includes a vacuum chamber having a gas inlet, a gas outlet, and a gas flow path for connecting the gas inlet and the gas outlet; a reactor located in the vacuum chamber, including a reaction chamber where a first gas, which is input through the gas flow path, reacts with a specimen in the reaction chamber, the reactor further including a gas distributor, which is located in the reaction chamber to evenly supply the gas; a specimen location controller for moving the specimen located in the vacuum chamber to the reaction chamber; and an analyzer, which is connected to the reaction chamber, for analyzing a second gas generated in the reaction chamber. The apparatus is able to deposit uniform atomic layers on a specimen by maintaining the pressure and flow of reactant gas and can deposit and analyze an atomic layer simultaneously.

Abstract: An apparatus and method for forming a microfiber coating includes directing a liquid solution toward a deposition surface. The apparatus includes a tube defining a volume through which the liquid solution travels. An electric field is applied between the origin of the liquid solution and the surface. A gas is injected into the tube to create a vortex flow within the tube. This vortex flow protects the deposition surface from entrainment of ambient air from the surrounding atmosphere.

Abstract: An apparatus for atomic layer deposition preventing mixing of a precursor gas and an input gas. From the apparatus a flow of the input gas is provided over a surface of the workpiece wherein a beam of the electromagnetic radiation is directed into the input gas in close proximity to the surface of the workpiece, but spaced a finite distance therefrom. The input gas is dissociated by the beam producing a high flux point of use generated reactive gas species that reacts with a surface reactant formed on the surface of the workpiece by a direct flow of the precursor gas flown from the dispensing unit. The surface reactant and reactive gas species react to form a desired monolayer of a material on the surface of the workpiece.

Abstract: A coating control system and method for monitoring and potentially adjusting system at least one spray property at various stages of the painting process, thereby also providing an efficient set-up and monitoring process involving less manual labor, less waste, and less harmful exhaust to the atmosphere, wherein the coating control system includes at least one spray gun, at least one light emitting source and at least one receiver.

Abstract: There is provided a coating device which can quickly cope with a change in size of a container. A pair of coating belts (annular belts) (11, 15) are arranged on two sides of a conveyor (10). The coating belt (15) is rotated at a high speed while the coating belt (11) is rotated at a low speed. A container (bottle) (1) on the conveyor (10) is coated while being rotated. When the size of the container (1) is to be changed, a pressing roller (57) is moved by an adjusting mechanism (50) in accordance with the size of the container (1).

Abstract: An apparatus for inspecting drawing accuracy in a liquid droplet ejection apparatus performs drawing by ejecting a function liquid droplet while moving a function liquid droplet ejection head relative to a workpiece by using a moving mechanism. In response to the relative movement, a laser irradiating mechanism performs visually recognizable stippling on the workpiece by irradiating coherent light thereon. A control part drives the laser irradiating mechanism for stippling at a predetermined frequency timing.

Abstract: A process and apparatus is disclosed for preparation of a no-jam vending machine card wherein the card is treated with a suitably adhering powder to have a residual powder layer on the card to reduce generation of an electrical static charge upon each card as the card is dispensed by the vending machine. The process comprises applying a suitable dusting powder and testing the dusted card for the necessary residual powder layer. The apparatus comprises a powder dusting device and a card powder layer testing device.

Abstract: A device for applying a coating medium onto a substrate, includes at least one spray valve that has a nozzle opening that can be adjusted with regard to its effective outlet area using a closing mechanism, whereby the substrate can be moved past the spray valve, which can be supplied with the coating medium under pressure via a supply line, whereby the positioning device is assigned a regulator that has at least one target value input for the instantaneously required outflow rate of the coating medium from the spray valve and at least one actual value input for the mass flow rate through a supply section arranged in front of the nozzle opening, and from the deviation between these values, the regulator forms an adjustment signal that moves the positioning device in the direction to offset the deviation.

Abstract: Device and method for fabricating a display panel having ink-jet printing applied thereto, the device including a stage for supporting a substrate, a base having one or more than one rail for transporting the stage, and one or more than one ink-jet head rotatable by an angel for spraying a pattern forming solution to the substrate, thereby reducing a fabrication cost and simplifying a fabrication process.

Abstract: A central controller for a powder coating system has a single processor connected to a memory, a gun controller input/output device and gun control logic for controlling a characteristic of a spray gun. An air flow controller input/output device and air flow control logic for controlling a characteristic of a pump providing air flow may also be included. A process input/output device for electrically communicating with a process input or a process output may also be included. Part identification and tracking logic, gun triggering logic, gun movement logic, booth control logic, part profiling logic and system monitoring and logging logic may also be included.

Abstract: A system for internally filling a joint or other discontinuity in a pipeline. The system includes a flexible conduit, a fill device removably connected to said flexible conduit, wherein the fill device is constructed and arranged to apply a fill material to an interior surface of said pipeline to fill one or more gaps in the pipeline, and a propulsion unit connected to at least one of the flexible conduit and the fill device that propels the flexible conduit through said pipeline.

Abstract: A process for the continuous dip-coating of a metal strip (1) in a tank (11) containing a liquid metal bath (12), in which process the metal strip (1) is made to run continuously through a duct (13), the lower part (13a) of which is immersed in the liquid metal bath (12) in order to define with the surface of the bath a liquid seal (14). A natural flow of the liquid metal from the surface of the liquid seal (14) is set up in two overflow compartments (25, 29) made in the duct (13) and each having an internal wall which extends the duct (13) in its lower part, and the level of liquid metal in the compartments is maintained at a level below the surface of the liquid seal (14). A plant for implementing the process.

Abstract: A coating film forming apparatus for forming a film by applying a coating solution to a substrate, which is provided with a cassette section, coating unit, developing unit, pre-treatment/post-treatment units and a main arm for transferring the substrate between the respective units. In the coating unit, provided is a coating section in which a resist is applied on the substrate in a manner of single stroke by intermittently moving the substrate in a Y-direction and by moving a nozzle in an X-direction, and provided is a reduced-pressure drying section for drying under reduced pressure the substrate after being applied, and further provided is equipment for removing the coating film adhered to a periphery of the substrate. Additionally, when the reduced-pressure drying section is arranged outside the coating unit, the main arm is covered with a cover so that the inside thereof is under a solvent atmosphere.

Abstract: A plasma processing apparatus having a sample bench located in a vacuum chamber, a structure disposed at a position opposed to a sample placed on the sample bench and facing a plasma generated in the vacuum chamber, and at least one through-hole disposed in the structure through which a gas flows into the vacuum chamber. An optical transmitter is mounted on a back of the at least one through-hole through which light from the sample passes, which light is detected by way of the optical transmitter.

Abstract: A dual-port endpoint detection window for a process chamber for substrates. The dual-port endpoint detection window of the present invention comprises a primary port and a secondary port each of which may be individually removably fitted with a light sensor for the endpoint detection system. A cover is provided for removably covering the secondary port. After the window of the primary port has become covered with material deposition as a result of prolonged use of the process chamber, the secondary port is uncovered for use and the light sensor is attached to the secondary port for continued use of the endpoint detection system through the secondary port.

Abstract: The semiconductor manufacturing device according to the present invention having a mechanical drive part which is moved in a vacuum device while holding a substrate includes at least one discharge port for introducing an inert gas into the vacuum device, and a flow rate control part for controlling the inert gas which is discharged into the vacuum device from the discharge port at a constant flow rate.

Abstract: A process chamber 35 capable of processing a substrate 30 and monitoring a process conducted on the substrate 30, comprises a support 45, a gas inlet, a gas energizer, an exhaust 85, and a wall 38 having a recess 145 that is sized to reduce the deposition of process residues therein. A process monitoring system 35 may be used to monitoring a process that may be conducted on a substrate 30 in the process chamber 25 through the recess 145 in the wall 38.

Abstract: An end point detection window prevents process failures in a plasma etching device. The end point detection window has a body of aluminum or an aluminum alloy through which a hole extends to provide a path along which light generated during the etching process can pass from the process chamber, and a capping section coupled to a light outlet of the body. The capping section is of quartz for allowing the light passing through the hole in the body to be transmitted out of the process chamber.

Abstract: An apparatus and method for simultaneously coating and measuring a part including a part support, a sprayer, a part measurer including a digital camera and a display device, all of which are positioned adjacent to the part support. The sprayer applies a coating to a section of the part while the part measurer continuously measures at least two dimensions of the section. The digital camera takes at least one picture of the entire section of the part while the part is being coated and enables a user to accurately determine the cross section of the part to the optimum finished part configuration and size and also detect defects, blemishes or coating irregularities formed on the section. The apparatus and method of the present invention significantly reduces the margin of error related to the application of coatings to parts, the number of defective parts and increases the overall efficiency.

Abstract: Systems, devices and methods for applying solution to a filament include an applicator for applying at least a partial coating of a solution to a filament, comprising: an applicator surface operable to at least partially coat a filament with a solution; a first container operable to supply the solution to the applicator surface, a volume of the solution in the first container corresponding to a solution level in the first container; a second container operable to contain a supply of solution in fluid communication with the solution in the first container such that the solution in the second container has a solution level indicative of the solution level of the solution in the first container; and a detector for determining the solution level within the second container, the detector operable to control an adjustment of the volume of the solution in the first container such that the solution level in the first container is maintained within a predetermined range of levels.

Abstract: In the manufacture of a semiconductor device, an arrangement for forming a layer on a semiconductor substrate compensates for variations in wafer substrate reflectivity. The arrangement includes providing substrate illumination and then adjusting the illumination on the substrate. The arrangement also includes controlling the dispensation of material over the substrate as a function of the adjusted illumination. By compensating for variations in wafer substrate reflectivity, manufacturing processes can realize more consistent photoresist coatings on wafer substrates from one wafer lot to another.

Abstract: A method and system are provided for monitoring material buildup on system components in a plasma processing system. The system components contain emitters that are capable of producing characteristic fluorescent light emission when exposed to a plasma. The method utilizes optical emission to monitor fluorescent light emission from the emitters for determining system component status. The method can evaluate material buildup on system components in a plasma, by monitoring fluorescent light emission from the emitters. Consumable system components that can be monitored using the method include rings, shields, electrodes, baffles, and liners.

Abstract: Disclosed is a manufacturing apparatus for a plasma display panel (PDP) to form a fluorescent material film in the PDP, the apparatus comprising a lower table; a lower rail formed on the lower table; a panel mounting portion operated on the lower rail for mounting a panel detachably; an upper fixation plate installed above the lower table; and a plurality of fluorescent material ink spread units fixed to the upper fixation plate and having a plurality of nozzle holes corresponding to non-applied rows for forming fluorescent material on the fluorescent material film of the panel, wherein a sophisticated spread of the fluorescent material is performed more efficiently.

Abstract: The present apparatus comprises a vacuum process chamber 100 that contains an upper electrode 110 having a conductive plate 115 with gas supply holes for supplying a process gas and a lower electrode 130 having a platform on which a sample is to be mounted; process gas supply means 117 for supplying the process gas to the gas supply holes in the upper electrode 110 and exhaust means 106 for exhausting the vacuum process chamber; a high frequency power supply 121 for applying a high frequency power to the upper electrode to generate a plasma between the upper and lower electrodes; a high frequency bias power supply 122 for applying a high frequency power to the upper electrode to generate a direct current bias potential in the upper electrode; and abnormal discharge determination means 152 for determining whether an abnormal discharge has occurred or not based on the direct current bias potential generated in the upper electrode.

Abstract: When a coating film is formed on a substrate, the inplane uniformity of the thickness of the coating film is enhanced to improve through put. Above the substrate, there are provided main and auxiliary nozzles separately movable, and monitoring means for monitoring the state of the surface of the substrate to detect the occurrence of an uncoated region on the surface of the substrate. On the basis of previously prepared coating data, a coating liquid is spirally applied on the substrate by the main nozzle. Then, if the monitoring means detects the occurrence of the uncoated region in a coated region in which the coating liquid has been applied by the main nozzle, a control part detects whether it is required to supply the coating liquid to the uncoated region. If it is required, the coating liquid is supplied to the uncoated region by the auxiliary nozzle. On the other hand, the portion of occurrence of the uncoated region has been grasped by the control part.

Abstract: An observation window airtightly installed at a wall of a processing room of a plasma processing apparatus includes a body having a through hole with an opening facing the processing room, a transparent member installed at a side of the body opposite to the processing room and a magnetic pole pair having two different magnetic poles disposed opposite each other with the hole interposed therebetween. The magnetic pole pair is configured to have a sufficient magnetic field strength to prevent electrons which form a plasma in the processing room from reaching the transparent member through the hole.

Abstract: A dry processing apparatus includes a processing chamber provided with a measurement window having a reflection portion which totally reflects light on the side of an inner surface thereof and a transmission portion. When a layer is not deposited, measurement light is irradiated so that the light is totally reflected by the reflection portion. A deviation between the measurement light reflected by a surface of the deposited layer and the measurement light reflected by the reflection portion is measured to determine a thickness of the deposited layer. A quantity of light reflected by the surface of the deposited layer is compared with the light quantity in case where irregularities are not formed in the surface of the deposited layer to evaluate a state of irregularities of the surface. The thickness of the deposited layer and a state of the surface of the layer are monitored separately.

Abstract: A susceptor is arranged in a reaction chamber, and an induction heating coil is arranged at a lower side of the susceptor. A ceiling of a bell jar is provided with an observation port, and an infrared radiation thermometer is arranged outside the observation port. A control unit controls the turning angle of the infrared radiation thermometer with a stepping motor, and detects the temperature of the susceptor at predetermined positions in radial direction. The control unit adjusts the heights of the induction heating coil at support positions, and uniforms the temperature distribution within the surface of the susceptor.

Abstract: A bubble detection system to detect bubbles in photoresist. The system includes photoresist at least one tank, a buffer tank, a pump, and a bubble sensor. The photoresist tank provides the photoresist. The buffer tank stores the photoresist from the photoresist tank. The pump pumps the photoresist from the buffer tank to an end terminal. The bubble sensor is set between the buffer tank and the pump to detect bubbles in the photoresist, and outputs an alarm signal when bubbles are detected. The nozzle is set at the end terminal to output the photoresist.

Abstract: A screen-printing apparatus for printing creamy solder paste on a substrate by attaching a screen mask to the substrate. A laser-measuring device mounted in the apparatus measures the top surface of the screen mask at a printing position and the top of the substrate at a substrate-measurement position by three-dimensional measurement, and detects a shape of the substrate or the screen mask, and determines whether or not they are acceptable. After screen printing is completed, the substrate and the screen mask undergo a printing inspection where their shapes are inspected. This provides not only inspection data of the printing results but also data for identifying the causes of print failures. As a result, the screen-printing apparatus, which has high-printing accuracy and can prevent printing failures from occurring, is provided.

Abstract: A process chamber 35 for processing a substrate 30 and monitoring the process conducted on the substrate 30, comprises a support 45, a gas distributor, and an exhaust 85. The process chamber 35 has a wall which may comprise a window or radiation transmitting portion 130 that allows light to be transmitted therethrough. Residue deposits onto the window 130 during processing of the substrate 30 may be reduced. In one version, the window 130 comprises a transparent plate 135 covered by an overlying mask 140 that has at least one aperture 145 extending through the mask 140 so that light can be transmitted through the aperture 145 and the transparent plate 135.

Abstract: This invention relates generally to systems for depositing a material onto a surface, and more particularly, to control systems for metering the amount of material being dispensed. The present invention provides an active compensation metering system that automatically compensates for material changes due to changes in material pressure, material temperature, and material viscosity.