Abstract: A three-dimensional (3D) object comprises a plurality of layers representative of an additive manufacturing process, wherein each layer of the plurality of layers approximately has a first thickness. A first layer of the plurality of layers forms at least a portion of a first surface of the 3D object, the first layer comprising a support region and an overcure region, wherein the first layer approximately has the first thickness at the support region and a greater second thickness at the overcure region. A support mark is included at the support region, wherein the support mark is inset from a first surface profile of the 3D object defined by the overcure region.

Abstract: A monitoring system is for a sealing apparatus that seals a substrate treatment apparatus by a housing and fills a space sealed by the housing with a predetermined gas atmosphere. The monitoring system includes: a laser sensor for a region, which a person can enter in a space between the housing and the substrate treatment apparatus, as a detection region; and a controller that outputs a control signal to the substrate treatment apparatus or the sealing apparatus based on a detection result by the laser sensor or outputs a notification signal based on the detection result.

Abstract: Some devices and systems comprise one or more walls of a reaction chamber; an adjustable gap in the one or more walls, wherein the adjustable gap is formed between a first gap surface and a second gap surface facing the first gap surface, and wherein a distance between the first gap surface and the second gap surface is adjustable; a plurality of stops, wherein each stop of the plurality of stops is positioned on either the first gap surface or the second gap surface, wherein the plurality of stops ensure a minimum distance of the adjustable gap, wherein a total length of the plurality of stops is less than 1% of a length of the first gap surface; and one or more vacuum ports in the first gap surface or the second gap surface.

Abstract: A semiconductor processing apparatus is disclosed. The apparatus may include a multiple chamber module comprising at least a first reaction chamber and a second reaction chamber, and a first substrate support structure disposed within the first reaction chamber and a second substrate support structure disposed within the second reaction chamber. The apparatus may also include a wafer handling chamber comprising a transfer robot configured for transferring two or more substrates along a first transfer path between the wafer handling chamber and the first substrate support structure and a second transfer path between the wafer handling chamber and the second substrate support structure. The apparatus may also include at least a first pyrometer and a second pyrometer, wherein a first optical path of the first pyrometer intersects the first transfer path and a second optical path of the second pyrometer intersect the second transfer path.

Abstract: A deposition apparatus (20) comprising: a chamber (22); a process gas source (62) coupled to the chamber; a vacuum pump (52) coupled to the chamber; at least two electron guns (26); one or more power supplies (30) coupled to the electron guns; a plurality of crucibles (32,33,34) positioned or positionable in an operative position within a field of view of at least one said electron gun; and a part holder (170) having at least one operative position for holding parts spaced above the crucibles by a standoff height H. The standoff height H is adjustable in a range including at least 22 inches.

Abstract: Techniques and devices are disclosed for a fabrication layout device and assembly table. The device includes a table with a work surface. The work surface being a continuous surface and configured to support a plurality of railing pieces for fabrication of a railing assembly. The device further includes a beam located above the work surface. The beam is operatively coupled to the table, such that the beam moves relative to the work surface in a first direction. Attached to the beam is an ink dispenser. The ink dispenser is configured to move along the beam in a second direction different from the first direction. The ink dispenser is further configured to dispense ink onto the work surface of the table in the form of a pattern of the railing assembly. Railing pieces can be positioned on the pattern so that they can be assembled to one another.

Abstract: A treatment solution supply apparatus supplies a treatment solution to a substrate treatment apparatus which treats a substrate using the treatment solution. The treatment solution supply apparatus includes an accommodating part having compartments; in each compartment a storage container storing the treatment solution is installed from one side surface side. An acquirer provided for each of the compartments acquires identification information about the storage container from an identification information holder attached to a side surface of the storage container installed in the compartment corresponding thereto. A report part provided for each of the compartments reports an installation state of the storage container in the compartment based on an acquisition result by the acquirer for the corresponding compartment, by a light emitting state of a light-emitting element, the light-emitting element of the report part emitting light toward the one side surface side.

Abstract: Light emitting device, method of manufacturing the light emitting device, and display device including the light emitting device are disclosed. The light emitting device includes a first electrode and a second electrode each having a surface opposite the other, a light emitting layer including quantum dots that is disposed between the first electrode and the second electrode, and an electron auxiliary layer disposed between the light emitting layer and the second electrode, wherein the electron auxiliary layer includes metal oxide nanoparticles including an anion of an organic acid bound to a surface of the metal oxide nanoparticle.

Abstract: A plasma processing apparatus includes: a processing container; a ceiling wall forming a part of the processing container and including an opening; and a transmission window configured to close the opening, wherein the opening under the transmission window is formed as a recess portion, wherein the recess portion is a supply port for supplying electromagnetic waves from the transmission window into the processing container, wherein first gas supply holes are formed on a lower surface of the ceiling wall, and wherein second gas supply holes are formed on an inner surface of the recess portion.

Abstract: A method and apparatus for supplying insulating liquid to form an insulating coating layer on an electrode is disclosed herein. In some embodiments, an apparatus includes a storage tank for storing an insulating liquid; a coating die for coating the insulating liquid on an electrode; a supply line which supplies the insulating liquid from the storage tank to the coating die; a pump connected to the supply line; a defoaming tank connected to the storage tank and supplies defoamed insulating liquid to the storage tank; a vacuum pump which defoams bubbles of the insulating liquid by applying vacuum to the defoaming tank; a bubble sensor connected to the supply line, wherein the bubble sensor senses generation of bubbles in the supply line in real time; and a controller for adjusting an operating condition of the apparatus based on an amount of bubbles sensed by the bubble sensor.

Abstract: The device (420) is for supporting substrates in a reaction chamber of an epitaxial reactor; it comprises: a disc-shaped element (422) having a first face (422A) adapted to be upperly positioned when the device (420) is being used and a second face (422B) adapted to be lowerly positioned when the device (420) is being used, said disc-shaped element (422) being adapted to receive a gas flow (F) to rotate the device (420) about an axis (X) thereof, a substrate-supporting element (424) in a single piece with said disc-shaped element (422) and preferably adjacent to said first face (422A), and a shaft (426) coaxial to said disc-shaped element (422), in a single piece with said disc-shaped element (422) and having a first end (426A) at said second face (422B); said shaft (426) has at a second end (426 B) thereof at least a protrusion (428 A, 428B, 428C) whose rotation is adapted to be detected by a pyrometer (430) or a thermographic camera.

Abstract: A substrate treatment method of treating a treatment object substrate includes before applying a resist solution for forming a resist film onto a base film formed on a substrate surface of the treatment object substrate, making a determination of which one of a first treatment and a second treatment to perform based on the treatment object substrate. In response to the determination determining to perform the first treatment, performing the first treatment of decreasing a polarity of the base film to bring it closer to a polarity of the resist solution. In response to the determination determining to perform the second treatment, performing a treatment of increasing the polarity of the base film to bring it closer to the polarity of the resist solution.

Abstract: A plasma process monitoring apparatus using terahertz waves is provided. A plasma process monitoring apparatus using terahertz waves may comprise: a first monitoring module disposed in a direction parallel to the width direction of a wafer on the outside of a plasma chamber in which the wafer is introduced and monitoring plasma formed inside the plasma chamber during a plasma process for forming a film on the wafer by using terahertz waves; and a second monitoring module disposed outside the plasma chamber in the thickness direction of the wafer so as to face the wafer and monitoring the wafer on which a film is formed on a surface through the plasma process by using the terahertz waves.

Abstract: In a coating system, two rollers are arranged adjacent to one another. A donor foil with rheological material dispensed thereon is advanced through a gap between the two rollers. Such gap spreads the dispensed material over the donor foil, coating the donor foil with a layer of the material with a uniform thickness associated with the gap width. Each roller is supported on a holder. Adjustment of the gap width may be effected by keeping the position of one of the holders fixed, while horizontally translating the position of the other holder. The position of the translatable holder may be adjusted by pistons and linear actuators. The pistons may bias the moveable holder towards the stationary holder. The linear actuators mounted on the moveable holder may extend respective arms against the stationary holder, thereby countering the biasing of the pistons and pushing the moveable holder away from the stationary holder.

Abstract: A heat treatment apparatus including: a cylindrical processing container; a heater configured to heat the processing container; and a cooler configured to cool the processing container, wherein the cooler includes: discharge holes provided at intervals in a longitudinal direction of the processing container, the discharge holes being configured to discharge a cooling medium toward the processing container; a branch configured to divide the cooling medium into a plurality of flowing paths that communicate with the discharge holes; and blowers provided for respective ones of the flowing paths, the blowers being configured to send the cooling medium to the discharge holes that communicate with the respective ones of the flowing paths.

Abstract: A quality control system for controlling quality of a paint target includes: an individual identification section associating a step control value and a quality control value with identification information for the paint target on the basis of the amount of movement; a state value computing section calculating a state value indicative of a paint state of the paint target on the basis of a history of a temporal change of the step control value; a learning section learning a correlation between the step control value, the state value, and the quality control value using sets of the step control value, the state value, and the quality control value; an input device receiving information on the amount of movement, the step control value, and the quality control value; and a storage device storing a set of the identification information, the step control value, the state value, and the quality control value.

Abstract: A substrate holder holds a substrate at a predetermined position. An etching solution supply unit supplies an etching solution to the substrate at the predetermined position. A rotating unit rotates the substrate holder about a predetermined rotation axis. A temperature distribution acquisition unit acquires the temperature distribution in a peripheral area around the substrate area occupied by the substrate when the substrate is arranged at the predetermined position in a chamber. A feature value calculator calculates, from the temperature distribution, a feature value relating an etching amount of the substrate by the etching using the etching solution.

Abstract: A processing module includes: a processing container including therein processing spaces in which stages are disposed, respectively, wherein a center of each of the processing spaces is located on a same circumference; a rotation arm including holders configured to hold wafers, which are placed on the stages of the processing spaces, respectively, wherein the rotation arm is rotatable around a center of the circumference as a rotation axis; and a sensor located between adjacent processing spaces and configured to detect positions of the wafers held by the rotation arm during rotational operation of the rotation arm.

Abstract: The photocurable inkjet ink contains: a radical polymerizable compound; a photoinitiator; and a thixotropic agent, and has a first viscosity of 1,000 mPa·s or less as measured at a shear rate of 10,000 s?1, and a second viscosity of 10,000 mPa·s or more as measured at a shear rate set to 10?1 s?1 after a shear force is continuously applied at the shear rate of 10,000 s?1 for 30 seconds.

Abstract: A method for processing a substrate within a processing chamber comprises receiving a first radiation signal corresponding to a film on a target element disposed within the processing chamber, analyzing the first radiation signal, and controlling the processing of the substrate based on the analyzed first radiation signal. The processing chamber includes a substrate support configured to support the substrate within a processing volume and a controller coupled to a first sensing device configured to receive the first radiation signal.

Abstract: An information processing apparatus is used to determine a waveform of a drive pulse applied to a drive element provided in a liquid discharge head for discharging a liquid, by using results obtained by evaluating a first discharge characteristic and a second discharge characteristic of the liquid discharge head. The information processing apparatus includes a first reception unit that receives an input of first information for designating a voltage based on the evaluation result of the first discharge characteristic as a voltage of the drive pulse used to evaluate the second discharge characteristic, and a second reception unit that receives an input of second information for designating a voltage freely designated by a user, as the voltage of the drive pulse used to evaluate the second discharge characteristic.

Abstract: Embodiments disclosed herein include a method for determining a temperature error of a pyrometer. In an embodiment, the method comprises measuring a first signal with a first sensor of the pyrometer and measuring a second signal with a second sensor of the pyrometer. In an embodiment, the method further comprises determining a reflectivity of a reflector plate from the first signal and the second signal, and determining the temperature error using the reflectivity.

Abstract: A three-dimensional shaping device includes a stage, a heater, a head dispensing a shaping material toward the stage to form a shaping layer, a thermal sensor measuring a temperature of a measurement region of the shaping layer, an actuator moving the stage, the thermal sensor, and/or the head relative to each other, and a processor. The processor sets the measurement region being a point. The point has the lowest heat dissipation property within the shaping layer. The processor causes the head to dispense the shaping material to form another shaping layer when the processor determines that the measured temperature is equal to or lower than the predetermined value and repeats the measurement and the determination if the processor determines that the measured temperature is higher than the predetermined value until the processor determines that the measured temperature is equal to or lower than the predetermined value.

Abstract: The present disclosure generally relates to a substrate processing chamber, a substrate processing apparatus, and a substrate processing method for self-assembled monolayer (SAM) deposition of low vapor pressure organic molecules (OM) followed by further substrate processing, such as atomic layer deposition.

Abstract: A method for measuring an electron nonextensive parameter of a plasma by using nonextensive statistical mechanics and electric probe is provided. The plasma is described by the nonextensive statistical mechanics and establishes a nonextensive single electric probe theory on the basis of this. The electron nonextensive parameter have been measured which cannot be measured by traditional single probe, and obtained more accurate electron temperature, plasma potential, electron density and floating potential than traditional single probe. The nonextensive electric probe plays a role in plasma diagnosis, which will measure the nonextensivity of plasma and improve the diagnostic accuracy of other plasma parameters.

Abstract: A diaphragm position of a valve may be detected and/or determined such that operation of the diaphragm may be monitored. A sensor included in the valve may generate sensor data that may be used to monitor the position of the diaphragm, which in turn may be used to determine a flow of a fluid through the valve. In this way, the sensor may be used to determine whether the diaphragm is properly functioning, may be used to identify and detect failures of the diaphragm, and/or may be used to quickly terminate operation of an associated deposition tool. This may reduce semiconductor substrate scrap, may reduce device failures on semiconductor substrates that are processed by the deposition tool, may increase semiconductor processing quality of the deposition tool, and/or may increase semiconductor processing yields of the deposition tool.

Abstract: A plasma processing system includes a vacuum system, a plasma processing chamber including a chamber cavity coupled to the vacuum system, a substrate holder including a surface inside the chamber cavity, a radio frequency (RF) source electrode coupled to an RF power source, the RF source electrode configured to ignite plasma in the chamber cavity. The system includes microwave source coupled to a microwave oscillator, and an electromagnetic (EM) metasurface, where the EM metasurface having a major surface electromagnetically coupled to the microwave source, the major surface configured to couple microwave power to the plasma in the chamber cavity.

Abstract: A method of manufacturing a vapor deposition mask device includes: a preparing step of preparing a vapor deposition mask that includes a plurality of through-holes extending from a first surface to a second surface; and a welding step of welding the vapor deposition mask to a front surface of a frame that includes the front surface and a back surface opposite to the front surface.

Abstract: Provided is a light-emitting element to highly efficiently emit light in different colors. The light-emitting element includes: a cathode; an anode; a light-emitting layer formed between the cathode and the anode, and including a plurality of light-emitting regions respectively emitting light of different wavelengths; and an electron-transport layer formed between the cathode and the light-emitting layer, and including a plurality of regions each corresponding to one of the light-emitting regions. The electron-transport layer includes a Zn1-XMgXO film (where X is 0?X<1). Of the plurality of regions included in the electron-transport layer, a region, corresponding to one of the light-emitting regions that emits light of a shorter wavelength, is higher in composition ratio X of Mg and/or less in thickness of the Zn1-XMgXO film.

Abstract: Disclosed herein are methods and systems for painting driving markings invisible in visible light spectrum, comprising generating driving assistance markings expressing driving information relating to one or more road segments, computing instructions for painting the driving assistance markings on one or more elements of the road segment(s) using one or more paint material(s) characterized by: (1) reflecting light in a visible light spectral range deviating less than a first value from the visible light spectral range reflected by a surface of the element(s) and (2) reflecting light in an infrared spectral range deviating more than a second value from the infrared spectral range reflected by the surface of the element(s), and outputting the painting instructions for applying the one or more paint materials on the element(s) according to the instructions such that the driving assistance markings are visible in the infrared spectrum and significantly invisible in the visible spectrum.

Abstract: An apparatus for processing a substrate may comprise a reaction chamber, a substrate support disposed within the reaction chamber and provided with a support surface to support the substrate, and a motor to provide a rotary movement, wherein the motor is controlled and configured to create a bidirectional rotary movement between the reaction chamber and the substrate support around an axis perpendicular to the support surface.

Abstract: A method for detaching elastomer particles that adhere on microvalves (3) disposed on the internal surface of a vehicle tire mold (2) comprises vibrating the microvalve (3) at a constant amplitude ranging between approximately 0.05 and 0.2 mm and at a frequency ranging between 20,000 and 30,000 Hz during the detachment of the particles from the microvalve (3).

Abstract: An apparatus for controlling temperature uniformity of the disclosure includes a heater to supply a heat source to a substrate, a temperature sensor to generate temperature data of the substrate, a heating controller to present a distribution of a heat source based on the temperature data, and a heat source-electricity converter to calculate an amount of electricity to generate a heat source based on the distribution of a heat source and to supply the calculated amount of electricity to the heater. Since a method and an apparatus of the disclosure for controlling temperature uniformity uses a heat source and electricity having a linear relationship, problems of high costs and deterioration of an apparatus may be overcome that a typical method has to control an amount of electricity in a heater by temperature information.

Abstract: A coating system (10) for coating an optical substrate has an identification apparatus (40) configured for identifying an orientation of at least one mark on a surface of the optical substrate; a coating apparatus (30) configured to apply at least one coating material on at least a portion of the optical substrate in a predetermined pattern by a controlled deposition of the at least one coating material in an atomized droplet form; and a robotic placement arm (80) configured to move the optical substrate from the identification apparatus (40) to the coating apparatus (30) and position the optical substrate at a predetermined orientation relative to the coating apparatus (30) based on the orientation of the at least one mark. The coating system (10) may have a second coating apparatus, such as a spin coating apparatus.

Abstract: Techniques for controlling a solid precursor vapor source are provided. An example method of controlling a solid precursor vapor source includes providing a carrier gas to a sublimation vessel containing a solid precursor material, wherein the carrier gas is heated with a carrier gas temperature control device prior to entering the sublimation vessel, measuring a temperature of a vapor exiting the sublimation vessel, and controlling a temperature of the carrier gas with the carrier gas temperature control device based at least in part on the temperature of the vapor exiting the sublimation vessel.

Abstract: An image forming apparatus, to which a cartridge including a developer accommodating portion for accommodating a developer is detachably mountable, includes an image bearing member, an exposure unit configured to expose the image bearing member to light to form an electrostatic latent image on the image bearing member, a light receiving sensor provided in the cartridge and configured to receive the light emitted from the exposure unit, and a controller configured to detect vibration of the cartridge from a light reception value of the light received by the light receiving sensor. In a case in which the cartridge is removed from the image forming apparatus, the light receiving sensor is removed from the image forming apparatus together with the cartridge.

Abstract: An autoteach system includes an autoteach pin that is a scannable feature having a fixed position within the autoteach system. The autoteach pin enables an autoteach operation of a robot arm of the wafer processing system. The autoteach operation is an operation to automatically teach the fixed position within the autoteach system to the robot arm of the wafer processing system. The autoteach pin includes a first portion including a cylindrical sidewall. The robot arm is to use the first portion to locate the fixed position within the autoteach system. The autoteach portion further includes a second portion including planar sidewalls that are configured to enable calibration of robot arm error.

Abstract: A method and a system for applying a sealing agent to the surface of an internal cavity of a pneumatic tyre provided with an optoelectronic device provided with at least one sensor element able to acquire images of the entire surface and to provide signals indicative of the plurality of captured images; an electronic processing system connected to the optoelectronic device to acquire the signals that are indicative of the plurality of captured images and to process them in order to determine the surface profile of the entire internal cavity as a function of the respective images; and an applicator device to apply a strip of sealing agent to the surface; wherein the applicator device is connected to the electronic processing system, which is configured to drive the applicator device as a function of the surface profile of the entire internal cavity.

Abstract: A method for controlling stretching of a mask includes: obtaining actual position information of at least one opening of the mask; determining an actual offset of each opening according to actual position information of the opening and preset position information of a light-emitting region of a sub-pixel corresponding to the opening; determining whether the actual offset of the opening is less than or equal to a theoretical maximum offset of the opening; and in response to determining that the actual offset of the opening is less than or equal to the theoretical maximum offset of the opening, generating a first end command for ending a process of stretching the mask.

Abstract: A re-circulatory blasting device obtained is capable of performing stable treatment for a prolonged period of time even in cases in which an elastic abrasive employed has abrasive grains adhered to the surface of elastic cores. An elastic abrasive regeneration device provided to the blasting device regenerates elastic abrasive employed for re-circulation. The elastic abrasive regeneration device includes a mixer and a combining unit. Recovered abrasive fed in from an abrasive recovery section is mixed in the mixer with abrasive grains fed in from an abrasive grain feeder, and the abrasive grains are adhered to the surface of the cores of the recovered abrasive. In the combining unit, the abrasive grains are pressed against and combined to the surface of the cores by passing an aggregated state of the recovered abrasive mixed by the mixer along a constricted flow path having a flow path cross-sectional area that gradually narrows.

Abstract: A method of increasing thermal conduction in an electronic display assembly includes securing a panel forming part of a thermal management substructure for the electronic display assembly, depositing a structural adhesive to at least one of an electronic component for operating the electronic display assembly and the panel, securing said electronic component directly to a first side of the panel by way of the adhesive, and securing the thermal management substructure within a housing of the electronic display assembly such that a second side of said panel defines, at least in part, at least a portion of an airflow pathway of the electronic display assembly of which the thermal management substructure forms a part.

Abstract: The device relates to a method and an arrangement for visualization or to gauge conditions of the surface of coated materials on baking pans and formulations and applications of materials to enhance this visualization. Specifically, surfaces on baking pans used in the baking of common foodstuffs where coatings are applied to the pan with visual enhancement additives so as to improve the release of baked products such as but not limited to bread and rolls and like baked goods and visualization of the pans for damage, wear, imperfections, contaminants and other surface defects or abnormalities. The device includes a light and/or energy emitter which reflects light off of the pan surface, an image capture element receiving the reflected light and/or energy to form an image of the pan, a controller analyzing the image of the pan for the aforesaid abnormalities and reporting same.

Abstract: A system, apparatus and method are provided for processing articles. The system includes subsystems for synthesizing, pre-treating, conducting a vapor phase coating process and post-treating articles in the form of powders and solid or porous workpieces. The apparatus permits vapor phase synthesis, treatment and deposition processes to be performed with high efficiency and at high overall throughput. The methods include converting solids, liquids or gases into gaseous and solid streams that can be separated or exchanged with or without treatment and/or coating steps, and produce optimized composite articles for specific applications.

Abstract: A three-dimensional (3D) printer including a floating solution for reducing resin usage may include a main frame, a water tank disposed inside the main frame, a build platform slidable in a vertical direction along the water tank, an optical assembly disposed at an upper portion of the main frame and irradiating a laser beam to the build platform, resin contained inside the water tank, and the floating solution contained inside the water tank, wherein the floating solution is not mixed with the resin, has a higher density than the resin, and supports the resin.

Abstract: A resin fine particle includes a polyester resin; and a basic dye, in which a volume average particle diameter of the resin fine particle is 0.05 ?m or more and 1 ?m or less, and a ratio of a concentration of the basic dye in a center of gravity portion of the resin fine particle to a concentration of the basic dye in a surface layer portion having a depth of 10 nm or less from a surface of the resin fine particle is 0.8 or more.

Abstract: A method of coating an active material for a secondary battery according to one embodiment of the present disclosure is a method of coating an active material on an electrode current collector of a secondary battery, the method comprising the steps of: disposing a guide member on each of the left and right sides based on a moving direction of the electrode current collector, and coating the active material onto the electrode current collector between the two guide members.

Abstract: A grounding cap module includes a main body, a frame portion, and a cap portion. The main body includes a first opening penetrating the main body and a grounding portion disposed on a periphery of the main body and configured to be electrically grounded. The frame portion is disposed on the main body and includes a second opening aligned with the first opening. The cap portion is disposed on the frame portion and covers the second opening, wherein the first opening, the second opening and the cap portion define a receiving cavity. A gas injection device and an etching apparatus using the same are also provided.

Abstract: There is provided a film thickness measurement method which measures a film thickness of a specific film to be measured in a multilayer film in situ in a film formation system that forms the multilayer film on a substrate, the method comprising: regarding a plurality of films located under the film to be measured as one underlayer film, measuring a film thickness of the underlayer film, and deriving an optical constant of the underlayer film by spectroscopic interferometry; and after the film to be measured is formed, deriving a film thickness of the film to be measured by spectroscopic interferometry using the film thickness and the optical constant of the underlayer film.

Abstract: An additive manufacturing apparatus produces a shaped article by adding a material melted by emission of a beam, to a workpiece. The additive manufacturing apparatus includes a machining head that emits the beam to the workpiece, a feed unit that feeds the material to the workpiece, and a numerical control device, which is a control unit that determines a machining path along which the machining head is caused to move with respect to the workpiece, and outputs a command to move the machining head. The control unit outputs a command to move the machining head along the machining path obtained by correction performed based on a moving direction of the machining head with respect to the workpiece.

Abstract: Equipment for coating a wafer is disclosed, where the equipment includes a wafer holder configured to spin the wafer while holding the wafer; a rotary drive configured to spin the wafer holder; a nozzle configured to pour liquid onto a surface to be coated of the wafer; an annular duct disposed circumferentially around the wafer when the wafer is spun by the wafer holder, the duct configured to collect material ejected off an edge of the wafer; and an air knife disposed proximate a backside, the backside being opposite the side to be coated, where the air knife is configured to blow an air curtain through a slot onto an exposed edge region of the backside at a grazing angle of incidence to flow gas radially outward along the backside toward the annular duct.