With Indicating, Testing, Inspecting, Or Measuring Means Patents (Class 118/712)
  • Patent number: 10287666
    Abstract: The invention relates to an installation and a method for the metallic coating of a workpiece using a coating device, said coating device comprising a displaceable coating lance, by which a metal plasma jet can be generated to create a coating of metal particles. According to the invention, it is provided that the coating device with the coating lance and a measuring device for measuring the coating thickness are jointly integrated in the installation, and that the coating device with the coating lance as well as the measuring device are enclosed by a housing.
    Type: Grant
    Filed: January 15, 2016
    Date of Patent: May 14, 2019
    Assignee: STURM MASCHINEN- & ANLAGENBAU GMBH
    Inventors: Andreas Ebenbeck, Gerhard Aufschläger, Marc Kesting, Ralf Völlinger
  • Patent number: 10274807
    Abstract: Methods of generating second harmonic generation (SHG) signals from interfaces formed with, or formed over, a noncentrosymmetric material, e.g., ?-quartz, are provided. The methods make use of the noncentrosymmetric material as an internal phase reference for the determination of a variety of interfacial electrostatic parameters, including interfacial potential, interfacial charge density, and the sign of the interfacial charge (i.e., net positive or net negative).
    Type: Grant
    Filed: December 7, 2017
    Date of Patent: April 30, 2019
    Assignees: Northwestern University, Battelle Memorial Institute, The Trustees of Columbia University in the City of New York
    Inventors: Franz M. Geiger, Paul E. Ohno, Hong-fei Wang, Kenneth B. Eisenthal
  • Patent number: 10256101
    Abstract: In a raw material gas supply apparatus, a control unit obtains an offset value of (m3?(m1+m2)), m1, m2 and m3 being respective measurement values of first and second mass controllers, and a mass flow meter, by supplying a carrier gas and a dilution gas in a state where the carrier gas flows through a bypass channel. Further, the control unit obtains an actual measurement value of a flow rate of the raw material by subtracting the offset value from (m3?(m1+m2)) obtained by supplying the carrier gas and dilution gas in a state where the carrier gas flows through the inside of a raw material container and calculating a difference between a target value of the flow rate of the raw material and the actual measurement value, and adjusts a set value of the first mass flow controller such that the flow rate of the raw material becomes.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: April 9, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hironori Yagi, Kensaku Narushima, Atsunari Matsuyama
  • Patent number: 10247658
    Abstract: A test jig for coating adhesion strength includes a base, a sample carrier, a first displacement mechanism and a second displacement mechanism mounted on the base, and a cutting knife holder equipped with two differently oriented cutting knives that is mounted between the second displacement mechanism and the sample carrier. The sample carrier, the first displacement mechanism and the second displacement mechanism can be driven to move such that the cutting knives can exert a constant pressure to cut the sample on the sample carrier.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: April 2, 2019
    Assignee: UNIVERSAL GLOBAL TECHNOLOGY (SHANGHAI) CO., LTD.
    Inventors: Chih-Kao Yeh, Xiao-Li Shao
  • Patent number: 10244634
    Abstract: A dispensing apparatus includes a frame having a gantry configured to provide movement in the X axis and Y axis directions, and first and second dispensing units coupled to the gantry and configured to dispense material onto a substrate. The second dispensing unit is coupled to the gantry by an automatic adjustment mechanism. The dispensing apparatus further includes a controller configured to control the operation of the gantry, the first dispenser, the second dispenser, and the automatic adjustment mechanism. The automatic adjustment mechanism is configured to move the second dispenser in the X axis and Y axis directions to manipulate a spacing between the first dispensing unit and the second dispensing. Methods of dispensing material on the substrate are further disclosed.
    Type: Grant
    Filed: February 6, 2018
    Date of Patent: March 26, 2019
    Assignee: Illinois Tool Works Inc.
    Inventors: Scott A. Reid, Hugh R. Read, Thomas C. Prentice
  • Patent number: 10141164
    Abstract: A plasma processing apparatus and a plasma processing method are provided which can sufficiently suppress an abnormal discharge in a gas space. A plasma processing apparatus includes a high frequency power source connected between a processing chamber and a base stand; a gas storage unit provided within the base stand and configured to store a gas; a blocking mechanism configured to block a gas introducing port of the gas storage unit; and a connection unit configured to connect a space between a disposition position of a wafer and the base stand, to the gas storage unit.
    Type: Grant
    Filed: September 24, 2014
    Date of Patent: November 27, 2018
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yasuharu Sasaki, Akihito Fushimi, Manabu Iwata
  • Patent number: 10062593
    Abstract: During a teaching operation regarding a transport mechanism, a hand of the transport mechanism is moved to a tentative target position in a substrate supporter, and a substrate supported at a reference position in the substrate supporter is received by the hand. A positional relationship between the substrate held by the hand and the hand is detected. A deviation between the tentative target position and the reference position is acquired as correction information based on the detected positional relationship. During the teaching operation or during substrate processing, the tentative target position is corrected to a true target position to coincide with the reference position based on the acquired correction information. During the substrate processing, the hand is moved to the true target position, so that the substrate is transferred to the substrate supporter by the hand, or the substrate is received from the substrate supporter by the hand.
    Type: Grant
    Filed: June 29, 2015
    Date of Patent: August 28, 2018
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Joji Kuwahara
  • Patent number: 10054781
    Abstract: A microscope apparatus includes a detection optical system that detects fluorescence produced in a specimen immersed in a medium having a different refractive index from air and accommodated in a container and acquires a fluorescence image. An illumination device focuses excitation light emitted from an excitation-light source, in the form of a plane along a plane intersecting an optical axis of the detection optical system and makes the planar excitation light incident on the specimen in the container. A driving unit moves the specimen in a direction of an optical axis of a cylindrical lens. An illumination control unit adjusts a focal position of the illumination device based on a movement amount of the specimen moved by the driving unit such that an air-equivalent length along an optical path of the excitation light from the illumination device to the optical axis of the detection optical system remains constant.
    Type: Grant
    Filed: April 18, 2016
    Date of Patent: August 21, 2018
    Assignee: OLYMPUS CORPORATION
    Inventor: Go Ryu
  • Patent number: 10043690
    Abstract: A method includes providing radio frequency (RF) power from an RF power supply to a showerhead of a plasma processing system running a process operation on a substrate disposed in the plasma processing system. The method senses a voltage the showerhead using a voltage probe that is connected in-line between the RF power supply and the showerhead. The sensing of the voltage produces voltage values during the running of the process operation. The method includes comparing the voltage values against a voltage check band that is predefined for the process operation being run. The comparing is configured to detect when the voltage values are outside of the voltage check band. The method generates an alert when the comparing detects that the voltage values are outside of the voltage check band. The alert identifies a type of fault based on the voltage check band that was predefined for the process operation.
    Type: Grant
    Filed: March 22, 2016
    Date of Patent: August 7, 2018
    Assignee: Lam Research Corporation
    Inventors: Sunil Kapoor, Yaswanth Rangineni, Aaron Bingham, Tuan Nguyen
  • Patent number: 10030297
    Abstract: A method for producing a hot-dip aluminum-coated steel wire, including dipping a steel wire in molten aluminum, and drawing up the steel wire from the molten aluminum, wherein at the time of drawing up the steel wire from the molten aluminum, a stabilization member is contacted with a surface of the molten aluminum and the steel wire at the boundary between the steel wire and the surface of the molten aluminum, a nozzle having a tip end of which inside diameter is 1 to 15 mm is disposed so that the tip end is positioned at a place away from the steel wire by a distance of 1 to 50 mm, and an inert gas having a temperature of 200 to 800° C. is blown out from the tip end to the boundary at a volume flow rate of 2 to 200 L/min.
    Type: Grant
    Filed: July 26, 2016
    Date of Patent: July 24, 2018
    Assignee: NISSHIN STEEL CO., LTD.
    Inventors: Tadaaki Miono, Shinichi Kamoshida, Yasunori Hattori, Takeshi Shimizu
  • Patent number: 9881819
    Abstract: A semiconductor wafer with (100) plane orientation has two orthogonal cleavage directions. A notch is provided so as to indicate one of these directions. During irradiation with a flash, the semiconductor wafer warps about one of two radii at an angle of 45 degrees with respect to the cleavage directions such that the upper surface thereof becomes convex, and the opposite ends of the other radii become the lowest position. Eight support pins in total are provided in upright position on the upper surface of a holding plate of a susceptor while being spaced at intervals of 45 degrees along the same circumference. The semiconductor wafer is placed on the susceptor such that any of the support pins supports a radius at an angle of 45 degrees with respect to a cleavage direction.
    Type: Grant
    Filed: June 6, 2016
    Date of Patent: January 30, 2018
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Yoshio Ito
  • Patent number: 9870963
    Abstract: An endpoint booster transports an optical signal from inside of a plasma etch chamber through a viewport to an optical cable outside of the plasma etch chamber. The optical signal is analyzed to determine an endpoint of a plasma process. The endpoint booster inhibits process byproducts from accumulating on the viewport during the plasma process, which increases the time between chamber cleanings. The reduction in chamber downtime for cleaning increases production throughput.
    Type: Grant
    Filed: May 28, 2015
    Date of Patent: January 16, 2018
    Assignee: Skyworks Solutions, Inc.
    Inventors: Elena Becerra Woodard, Daniel Kwadwo Amponsah Berkoh, Kelly Yuji Kimura
  • Patent number: 9828675
    Abstract: Disclosed is a processing apparatus. The processing apparatus includes: a load port in which a conveyance container accommodating a plurality of semiconductor wafers is placed; a dummy wafer storage area in which a conveyance container accommodating a plurality of dummy wafers is placed; a normal-pressure conveyance room in which a first conveyance arm is installed; an equipment that processes the plurality of semiconductor wafers in a state where the semiconductor wafers and the dummy wafers which are conveyed are placed in slots, respectively; and a controller that controls each component of the processing apparatus. The controller classifies the dummy wafers accommodated in the conveyance container into a plurality of groups, and controls the first conveyance arm to preferentially convey the dummy wafers within one of the classified groups to the equipment and, in replacing the dummy wafers, to perform replacement of the dummy wafers group to group as classified.
    Type: Grant
    Filed: September 21, 2015
    Date of Patent: November 28, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Naohide Ito, Daisuke Morisawa, Keiji Osada
  • Patent number: 9697991
    Abstract: An RF matching network includes a control circuit configured to instruct at least one EVC to alter its variable capacitance, the alteration of the variable capacitance causing the matching network to achieve a preliminary match state, the preliminary match state having an associated first reflection parameter value at an RF source output; and upon the achievement of the preliminary match state, instruct an RF source to alter a variable RF source frequency, the alteration of the variable RF source frequency causing achievement of a final match state, the final match state having an associated second reflection parameter value at the RF source output; wherein the second reflection parameter value is less than the first reflection parameter value.
    Type: Grant
    Filed: July 1, 2015
    Date of Patent: July 4, 2017
    Inventor: Imran Ahmed Bhutta
  • Patent number: 9676202
    Abstract: An inkjet printer for printing on a continuous web of recording media includes a receiver to receive a beam of collimated light transmitted across the surface of a continuous web of recording media supported by a roller. The intensity of the transmitted beam received by the receiver can be used to determine the presence of a defect in the continuous web or in the roller. A controller is configured to reduce the speed of or stop movement of the web through the printer and to retract one or more printheads from a printing location to prevent the defect from damaging the printhead(s).
    Type: Grant
    Filed: May 9, 2012
    Date of Patent: June 13, 2017
    Assignee: Xerox Corporation
    Inventors: Roger G. Leighton, Piotr Sokolowski, James E. Williams
  • Patent number: 9673026
    Abstract: Systems and methods for performing edge ramping are described. A system includes a base RF generator for generating a first RF signal. The first RF signal transitions from one state to another. The transition from one state to another of the first RF signal results in a change in plasma impedance. The system further includes a secondary RF generator for generating a second RF signal. The second RF signal transitions from one state to another to stabilize the change in the plasma impedance. The system includes a controller coupled to the secondary RF generator. The controller is used for providing parameter values to the secondary RF generator to perform edge ramping of the second RF signal when the second RF signal transitions from one state to another.
    Type: Grant
    Filed: July 7, 2016
    Date of Patent: June 6, 2017
    Assignee: Lam Research Corporation
    Inventors: John C. Valcore, Jr., Bradford J. Lyndaker, Andrew S. Fong
  • Patent number: 9640370
    Abstract: A method is for etching the whole width of a substrate to expose buried features. The method includes etching a face of a substrate across its width to achieve substantially uniform removal of material; illuminating the etched face during the etch process; applying edge detection techniques to light reflected or scattered from the face to detect the appearances of buried features; and modifying the etch in response to the detection of the buried feature. An etching apparatus for etching substrate across its width to expose buried is also disclosed.
    Type: Grant
    Filed: March 4, 2014
    Date of Patent: May 2, 2017
    Assignee: SPTS Technologies Limited
    Inventor: Oliver James Ansell
  • Patent number: 9620334
    Abstract: A method for achieving an etch rate is described. The method includes receiving a calculated variable associated with processing a work piece in a plasma chamber. The method further includes propagating the calculated variable through a model to generate a value of the calculated variable at an output of the model, identifying a calculated processing rate associated with the value, and identifying based on the calculated processing rate a pre-determined processing rate. The method also includes identifying a pre-determined variable to be achieved at the output based on the pre-determined processing rate and identifying a characteristics associated with a real and imaginary portions of the pre-determined variable. The method includes controlling variable circuit components to achieve the characteristics to further achieve the pre-determined variable.
    Type: Grant
    Filed: January 10, 2014
    Date of Patent: April 11, 2017
    Assignee: Lam Research Corporation
    Inventors: Bradford J. Lyndaker, John C. Valcore, Jr., Alexei Marakhtanov, Seyed Jafar Jafarian-Tehrani, Zhigang Chen
  • Patent number: 9601391
    Abstract: A method and system are provided for determining mechanical stress experienced by a film during fabrication thereof on a substrate positioned in a vacuum deposition chamber. The substrate's first surface is disposed to have the film deposited thereon and the substrate's opposing second surface is a specular reflective surface. A portion of the substrate is supported. An optical displacement sensor is positioned in the vacuum deposition chamber in a spaced-apart relationship with respect to a portion of the substrate's second surface. During film deposition on the substrate's first surface, displacement of the portion of the substrate's second surface is measured using the optical displacement sensor. The measured displacement is indicative of a radius of curvature of the substrate, and the radius of curvature is indicative of mechanical stress being experienced by the film.
    Type: Grant
    Filed: March 12, 2015
    Date of Patent: March 21, 2017
    Assignee: The United States of America as Represented by the Administrator of the National Aeronautics and Space Administration
    Inventor: David M. Broadway
  • Patent number: 9567661
    Abstract: A reactor apparatus includes a first chamber coupled to a first source of vacuum, a monitor chamber isolated from the first chamber and coupled to a second source of vacuum, and at least one removable deposition monitor disposed in the monitor chamber.
    Type: Grant
    Filed: November 6, 2015
    Date of Patent: February 14, 2017
    Assignee: SUPERCONDUCTOR TECHNOLOGIES, INC.
    Inventors: Ward Ruby, Kurt Von Dessonneck, Brian Moeckly
  • Patent number: 9561877
    Abstract: An apparatus and method is described herein for automatically labeling using labels having a fluid activatable adhesive along the back surface of such label. The apparatus has multiple pallets each being positionable with the lowermost label of a stack of one or more labels to releasably secure by suction the label against the pallet, and multiple pads each being positionable with respect to pallets to receive labels from the pallets and then releasably retain such labels until application onto containers. Fluid for activating adhesive is applied by an applicator onto labels retained upon the pad to change the fluid activatable adhesive along the label's back surface from a non-tacky state to a tacky state just prior to application of the label onto container.
    Type: Grant
    Filed: December 17, 2013
    Date of Patent: February 7, 2017
    Assignee: NuLabel Technologies, Inc.
    Inventors: Michael C. Woods, Benjamin David Lux, Randy Peckham
  • Patent number: 9530682
    Abstract: An apparatus to support a substrate may include a base, a clamp portion to apply a clamping voltage to the substrate, and a displacement assembly configured to hold the clamp portion and base together in a first operating position, and to move the clamp portion with respect to the base from the first operating position to a second operating position, wherein the clamp portion and base are separate from one another in the second operating position.
    Type: Grant
    Filed: May 12, 2014
    Date of Patent: December 27, 2016
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Roger B. Fish, W. Davis Lee
  • Patent number: 9530620
    Abstract: Systems and methods for using variables based on a state associated with a plasma system. A method includes determining whether the state associated with the plasma system is a first state or a second state and determining a first variable upon determining that the state is the first state. The first variable is determined based on a measurement at a communication medium. The method further includes determining a second variable upon determining that the state is the second state. The second variable is determined based on a measurement at the communication medium. The method includes determining whether the second variable exceeds a first threshold, providing an instruction to reduce power supplied to a plasma chamber upon determining that the second variable exceeds the first threshold, and providing an instruction to increase power supplied to the plasma chamber upon determining that the second variable is below the first threshold.
    Type: Grant
    Filed: February 19, 2014
    Date of Patent: December 27, 2016
    Assignee: Lam Research Corporation
    Inventor: John C. Valcore, Jr.
  • Patent number: 9475730
    Abstract: Disclosed is a system and method for constructing fibrous mats. In accordance with the disclosure, continuous lengths of filament are pre-coated with a liquefied thermoplastic. The pre-coated filaments are then laid down upon a belt to form a fibrous mat. The filaments can be laid down in continuous lengths or they can be chopped into discontinuous lengths. The filaments are heated after they have been laid down in order to re-liquefy the thermoplastic and facilitate bonding between intersecting fibers. The disclosure further relates to a system and method for incorporating constructed fibrous mats into a composite building board.
    Type: Grant
    Filed: June 8, 2012
    Date of Patent: October 25, 2016
    Assignee: CertainTeed Gypsum, Inc.
    Inventors: Robert J. Hauber, Gerald D. Boydston
  • Patent number: 9464976
    Abstract: The present invention relates to in-line viscometers with no moving parts for monitoring the viscosity of fluids. One embodiment of the invention is a viscometer including a first tube, a second tube, a first flow metering device coupled with the first tube, a second flow metering device coupled with the second tube. The second tube is larger in diameter than the first tube. Another embodiment is directed to a method for maintaining a desired viscosity during a process.
    Type: Grant
    Filed: September 1, 2011
    Date of Patent: October 11, 2016
    Assignee: Saint Clair Systems, Inc.
    Inventor: Robert A. Norcross, Jr.
  • Patent number: 9466483
    Abstract: A film deposition apparatus includes a turntable to rotate a substrate thereon, a process gas supply part to supply a process gas to form a thin film on the substrate, a heating part to heat the substrate up to a predetermined film deposition temperature to form a thin film, a plasma treatment part to treat the thin film for modification, a heat lamp provided above the turntable and configured to heat the substrate up to a temperature higher than the predetermined film deposition temperature by irradiating the substrate with light in an adsorption wavelength range of the substrate, and a control part to output a control signal so as to repeat a step of depositing the thin film and a step of modifying the thin film by the plasma, and then to stop supplying the process gas and to heat the substrate by the heat lamp.
    Type: Grant
    Filed: July 17, 2013
    Date of Patent: October 11, 2016
    Assignee: Tokyo Electron Limited
    Inventors: Hitoshi Kato, Shigehiro Miura
  • Patent number: 9453816
    Abstract: A differential transformer type magnetic sensor includes a board, a drive coil, a first differential coil, and a second differential coil. The drive coil includes a planar coil in which a dimension of a first direction is smaller than that of a second direction, and is disposed on the board. The first differential coil includes a planar coil having the same shape as the drive coil, and is disposed on the board. The second differential coil includes a planar coil having the same shape as the drive coil, and is disposed on the board. The first differential coil and the second differential coil are electrically connected so that a direction of induced current flowing along the first differential coil and a direction of induced current flowing along the second differential coil are opposite to each other.
    Type: Grant
    Filed: October 10, 2013
    Date of Patent: September 27, 2016
    Assignee: KYOCERA DOCUMENT SOLUTIONS INC.
    Inventor: Masashi Morimoto
  • Patent number: 9408288
    Abstract: Systems and methods for performing edge ramping are described. A system includes a base RF generator for generating a first RF signal. The first RF signal transitions from one state to another. The transition from one state to another of the first RF signal results in a change in plasma impedance. The system further includes a secondary RF generator for generating a second RF signal. The second RF signal transitions from one state to another to stabilize the change in the plasma impedance. The system includes a controller coupled to the secondary RF generator. The controller is used for providing parameter values to the secondary RF generator to perform edge ramping of the second RF signal when the second RF signal transitions from one state to another.
    Type: Grant
    Filed: October 24, 2012
    Date of Patent: August 2, 2016
    Assignee: Lam Research Corporation
    Inventors: John C. Valcore, Jr., Bradford J. Lyndaker, Andrew S. Fong
  • Patent number: 9383316
    Abstract: A method of measuring vapor flux density including directing a light beam through a vapor flux to a pixel array sensor and using the pixel array sensor to measure attenuation of the light beam.
    Type: Grant
    Filed: December 26, 2013
    Date of Patent: July 5, 2016
    Assignee: First Solar, Inc.
    Inventors: Markus E. Beck, Ulrich A. Bonne, Raffi Garabedian, Erel Milshtein, Ming Lun Yu
  • Patent number: 9377423
    Abstract: Disclosed systems and methods for testing a device under test (DUT) with a probe system are selected to test a DUT at a temperature below the dew point of the ambient environment surrounding the probe system. Probe systems include a measurement chamber configured to isolate a cool, dry testing environment and a measurement chamber door configured to selectively isolate the internal volume of the measurement chamber. When a DUT, that is or is included on a substrate, is tested at a low temperature, systems and methods are selected to heat the substrate in a dry environment, at least partially isolated from the measurement chamber, to at least a temperature above the dew point and/or the frost point of the ambient environment.
    Type: Grant
    Filed: December 27, 2013
    Date of Patent: June 28, 2016
    Assignee: Cascade Microtech, Inc.
    Inventors: Botho Hirschfeld, Axel Becker
  • Patent number: 9334607
    Abstract: A device for producing a composite fiber material in the form of a fiber band impregnated with a polymer includes a transport device for supplying and for transporting a fiber band along a processing path. To preheat the raw fiber band to a processing temperature a preheating device is used. An application device is used for applying the melted polymer on the whole width onto the surface of the raw fiber band. At least one pressure shearing vibration application device is used to apply pressure to the raw fiber band perpendicular to the band plane after the application of the polymer, where the application of pressure is performed by at least one pressure stamp with the simultaneous shearing vibration of the pressure stamp by a vibration movement component (y) in the band plane and transversely to a band running direction. At least one tempering device is used to keep the raw fiber band within a processing temperature range.
    Type: Grant
    Filed: March 7, 2012
    Date of Patent: May 10, 2016
    Assignee: Thermoplast Composite GmbH
    Inventor: Herbert Börger
  • Patent number: 9248544
    Abstract: A method of controlling a polishing operation includes polishing a substrate, during polishing obtaining a sequence over time of measured spectra from the substrate with an in-situ optical monitoring system, for each measured spectrum from the sequence of measured spectra determining a difference between the measured spectrum and an immediate previous spectrum from the sequence, accumulating the difference for each measured spectrum to generate a total difference, comparing the total difference to a threshold, and detecting a polishing endpoint based on the comparison of the total difference to the threshold.
    Type: Grant
    Filed: July 18, 2012
    Date of Patent: February 2, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Jimin Zhang, Harry Q. Lee, Zhihong Wang, Wen-Chiang Tu
  • Patent number: 9207153
    Abstract: Provided is a test jig including a jig main body having, at an end portion thereof, an insertion part into which an electrode lead is inserted and a fixing member detachably coupled to the insertion part to fix the electrode lead inserted to the insertion part, wherein the insertion part includes insertion faces outwardly extending from both end portions of the jig main body, and coupling faces extending from the insertion faces toward insides of the jig main body and brought into contact with the fixing member, and thus a tensile test is performed on an ultrasonic-welded portion of the electrode lead without an additional cell.
    Type: Grant
    Filed: October 21, 2014
    Date of Patent: December 8, 2015
    Assignee: LG CHEM, LTD.
    Inventors: Heung Min Kim, Han Sik Kim, Seang Hee Chae
  • Patent number: 9170181
    Abstract: Provided is a test jig including a jig main body having, at an end portion thereof, an insertion part into which an electrode lead is inserted and a fixing member detachably coupled to the insertion part to fix the electrode lead inserted to the insertion part, wherein the insertion part includes insertion faces outwardly extending from both end portions of the jig main body, and coupling faces extending from the insertion faces toward insides of the jig main body and brought into contact with the fixing member, and thus a tensile test is performed on an ultrasonic-welded portion of the electrode lead without an additional cell.
    Type: Grant
    Filed: October 21, 2014
    Date of Patent: October 27, 2015
    Assignee: LG CHEM, LTD.
    Inventors: Heung Min Kim, Han Sik Kim, Seang Hee Chae
  • Patent number: 9141001
    Abstract: A mask support frame for supporting a mask is provided. The frame is configured to secure both ends of a mask and apply tension to the mask in a first direction. The frame includes a frame main body defining an opening for exposing a patterned opening area of the mask and an end tensioner coupled to the frame main body, and configured to apply tension to one of both ends of the mask in a second direction crossing the first direction.
    Type: Grant
    Filed: March 6, 2013
    Date of Patent: September 22, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventor: Yong-Hwan Kim
  • Patent number: 9105519
    Abstract: A substrate treatment apparatus configured such that substrates in a same lot are distributed by a delivery mechanism into a plurality of unit blocks, each unit block including a solution treatment module, an ultraviolet irradiation module, and a substrate carrying mechanism, the apparatus includes: an illuminance detection part that detects an illuminance of a light source of the ultraviolet irradiation module; and a control part that controls, when an illuminance detection value of the ultraviolet irradiation module in one unit block among the plurality of unit blocks becomes a set value or less, the delivery mechanism to stop delivery of a substrate to the one unit block and deliver subsequent substrates to another unit block, and the ultraviolet irradiation module to perform irradiation on substrates which have already been delivered to the one unit block with an irradiation time adjusted to a length according to the illuminance detection value.
    Type: Grant
    Filed: October 20, 2014
    Date of Patent: August 11, 2015
    Assignee: Tokyo Electron Limited
    Inventor: Masatoshi Kaneda
  • Patent number: 9076834
    Abstract: A spacer for a thermal plate in semiconductor processing includes a base substrate having a top surface defined thereon, a wafer having a bottom surface covering a portion of the base substrate, and a plurality of air passages formed in between the bottom surface of the wafer and the base substrate. The air passages connect the bottom surface of the wafer to an ambience.
    Type: Grant
    Filed: September 28, 2012
    Date of Patent: July 7, 2015
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventor: Yong-An Lin
  • Publication number: 20150136325
    Abstract: A system for modifying the uniformity pattern of a thin film deposited in a plasma processing chamber includes a single radio-frequency (RF) power source that is coupled to multiple points on the discharge electrode of the plasma processing chamber. Positioning of the multiple coupling points, a power distribution between the multiple coupling points, or a combination of both are selected to at least partially compensate for a consistent non-uniformity pattern of thin films produced by the chamber. The power distribution between the multiple coupling points may be produced by an appropriate RF phase difference between the RF power applied at each of the multiple coupling points.
    Type: Application
    Filed: November 12, 2014
    Publication date: May 21, 2015
    Inventors: Zheng John YE, Ganesh BALASUBRAMANIAN, Thuy BRICHER, Jay D. PINSON, II, Hiroji HANAWA, Juan Carlos ROCHA-ALVAREZ, Kwangduk Douglas LEE, Martin Jay SEAMONS, Bok Hoen KIM, Sungwon HA
  • Publication number: 20150140694
    Abstract: A gas supply device for intermittently supplying raw material gas into a film forming process unit that includes a raw material container for accommodating a raw material, a carrier gas supply unit for supplying carrier gas to evaporate the raw material, a raw material gas supply path for supplying the raw material gas and the carrier gas into the film forming process unit, a flow rate detector, a flow rate regulating valve, a raw material supply and block unit for supplying and blocking the raw material gas into the film forming process unit, and a control unit for outputting a control signal for intermittently supplying the raw material gas into the film forming process unit.
    Type: Application
    Filed: November 20, 2014
    Publication date: May 21, 2015
    Inventors: Mitsuya INOUE, Makoto TAKADO
  • Patent number: 9034685
    Abstract: The present invention provides methods for making pnictide compositions, particularly photoactive and/or semiconductive pnictides. In many embodiments, these compositions are in the form of thin films grown on a wide range of suitable substrates to be incorporated into a wide range of microelectronic devices, including photovoltaic devices, photodetectors, light emitting diodes, betavoltaic devices, thermoelectric devices, transistors, other optoelectronic devices, and the like. As an overview, the present invention prepares these compositions from suitable source compounds in which a vapor flux is derived from a source compound in a first processing zone, the vapor flux is treated in a second processing zone distinct from the first processing zone, and then the treated vapor flux, optionally in combination with one or more other ingredients, is used to grow pnictide films on a suitable substrate.
    Type: Grant
    Filed: February 10, 2012
    Date of Patent: May 19, 2015
    Assignees: Dow Global Technologies LLC, California Institute of Technology
    Inventors: Gregory M. Kimball, Jeffrey P. Bosco, Harry A. Atwater, Nathan S. Lewis, Marty W. Degroot, James C. Stevens
  • Publication number: 20150132471
    Abstract: A curtain coating method including forming a curtain including a coating material. A coated web is formed by coating a moving primary web with the coating material. The curtain and the primary web meet at a contact line. A primary pattern is projected on a material layer. The material layer moves with respect to the contact line. The primary pattern includes a first pointer feature. A first image is captured. The first image includes a first sub-image of the first pointer feature. The position of the first sub-image is in the first image is detected. Distance information is provided by comparing the detected position of the first sub-image with a reference position.
    Type: Application
    Filed: November 8, 2013
    Publication date: May 14, 2015
    Applicant: UPM RAFLATAC OY
    Inventors: David HIBBS, Anthony Blackman
  • Publication number: 20150128860
    Abstract: Deposition chambers (102) for use with deposition systems (100) include a chamber wall (112) comprising a transparent material. The chamber wall may include an outer metrology window (122) surface extending from and at least partially circumscribed by an outer major surface of the wall, and an inner metrology window surface extending from and at least partially circumscribed by an inner major surface of the wall. The window surfaces may be oriented at angles to the major surfaces. Deposition systems include such chambers. Methods include the formation of such deposition chambers. The depositions systems and chambers may be used to perform in-situ metrology.
    Type: Application
    Filed: May 24, 2013
    Publication date: May 14, 2015
    Applicant: Soitec
    Inventors: Claudio Canizares, Ding Ding
  • Publication number: 20150128859
    Abstract: A deposition system includes a chamber, an electrical power module, a first detection module and a second detection module. The chamber includes a target, a substrate, and a plasma. The substrate is spaced apart with the target and corresponded to the target. The plasma is generated between the target and the substrate. The target, the substrate and the plasma are in an interior of the chamber. The electrical power module is electrically connected with the target so as to generate a potential difference between the target and the substrate. The first detection module is connected with the interior of the chamber for detecting a composition of the plasma so as to generate a first detection result. The second detection module is connected with the first detection module, and includes an avalanche photodiode detector for analyzing the first detection result so as to generate a second detection result.
    Type: Application
    Filed: April 24, 2014
    Publication date: May 14, 2015
    Applicant: MINGDAO UNIVERSITY
    Inventors: Chi-Lung CHANG, Wan-Yu WU, Pin-Hung CHEN, Wei-Chih CHEN, Da-Yung WANG
  • Publication number: 20150125591
    Abstract: Systems and methods for supplying a precursor material for an atomic layer deposition (ALD) process are provided. A gas supply provides one or more precursor materials to a deposition chamber. The deposition chamber receives the one or more precursor materials via an input line. A gas circulation system is coupled to an output line of the deposition chamber. The gas circulation system includes a gas composition detection system configured to produce an output signal indicating a composition of a gas exiting the deposition chamber through the output line. The gas circulation system also includes a circulation line configured to transport the gas exiting the deposition chamber to the input line. A controller is coupled to the gas supply. The controller controls the providing of the one or more precursor materials by the gas supply based on the output signal of the gas composition detection system.
    Type: Application
    Filed: November 5, 2013
    Publication date: May 7, 2015
    Applicant: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: BOR-CHIUAN HSIEH, CHIEN-KUO HUANG, TAI-CHUN HUANG, KUANG-YUAN HSU, TZE-LIANG LEE
  • Publication number: 20150122176
    Abstract: A dispensing apparatus used to dispense glue on a workpiece includes a first conveyer, a robot arm and a first storing module. The first conveyer has a work region and a storage region. The workpiece is loaded on the first conveyer and transmitted from the work region to the storage region. The robot arm is movably disposed adjacent to the work region and has a dispensing unit and an image identifying unit. The image identifying unit retrieves an image signal of the work region. The robot aim controls the dispensing unit to dispense glue on the workpiece according to the image signal of the work region. The first conveyer transmits the dispensed workpiece from the work region to the storage region. The first storing module, which is disposed adjacent to the storage region, supports the dispensed workpiece and lifts it away from the first conveyer.
    Type: Application
    Filed: October 29, 2014
    Publication date: May 7, 2015
    Inventors: Tsung-Huang MA, Xiu-Xia FAN
  • Publication number: 20150118402
    Abstract: A method for spreading a resin paste onto a carrier film includes feeding resin paste into a doctor blade unit having a doctor blade, using a feed device that includes a discharge opening through which the resin paste is fed from the feed device into the doctor blade unit, moving a carrier film on a base surface through a doctor blade gap that is formed between the doctor blade and the base surface, and spreading the resin paste onto the carrier film using the doctor blade. The discharge opening is positioned to be immersed into the resin paste that is in the doctor blade unit during operation of a doctor blade apparatus configured to perform the method. A resin mat installation for producing resin mats, particularly of SMC, includes at least one doctor blade apparatus as described above.
    Type: Application
    Filed: April 23, 2013
    Publication date: April 30, 2015
    Applicant: Dieffenbacher GmbH Maschinen- und Anlagenbau
    Inventor: Tobias Fuerst
  • Patent number: 9017513
    Abstract: A plasma processing chamber is provided comprising one or more process gas inlets, one or more exhaust gas outlets, plasma generating hardware configured to generate a process gas plasma in a plasma processing portion of the plasma processing chamber, a wafer processing stage positioned in the plasma processing chamber, and a plasma monitoring probe assembly. The plasma monitoring probe assembly comprises an electrically conductive probe and an insulator sleeve assembly positioned about the electrically conductive probe. The insulator sleeve assembly comprises a plasma-side sleeve portion and a subterranean sleeve portion positioned about distinct portions of a longitudinal probe axis of the electrically conductive probe of the probe assembly.
    Type: Grant
    Filed: November 7, 2012
    Date of Patent: April 28, 2015
    Assignee: Lam Research Corporation
    Inventor: Simon Gosselin
  • Publication number: 20150111312
    Abstract: Provided are a deposition data processing apparatus, an apparatus and a method for manufacturing an organic EL device, which make it possible to check deposition states of constituent layers of each of organic EL elements that are continuously formed on a substrate being conveyed. The deposition data processing apparatus includes a scanning section configured to scan at least two of a plurality of constituent layers that constitute each of the organic EL elements; and a processor configured to accumulate data of the constituent layers scanned by the scanning section at a specific position in a longitudinal direction of the substrate as data of a specific one of the organic EL elements.
    Type: Application
    Filed: March 5, 2013
    Publication date: April 23, 2015
    Applicant: NITTO DENKO CORPORATION
    Inventors: Ryohei Kakiuchi, Satoru Yamamoto, Takayoshi Yamano
  • Publication number: 20150107514
    Abstract: A multiple degrees of freedom control apparatus for a roll-to-roll printing system.
    Type: Application
    Filed: October 18, 2013
    Publication date: April 23, 2015
    Applicant: The Chinese University of Hong Kong
    Inventors: Shih-Chi Chen, Xi Zhou, Jiyi Cheng
  • Publication number: 20150107512
    Abstract: A system for coating a non-rotating pipe work piece including: valves, flow lines, and a mixing block for receiving a first and a second component material each delivered at a pressure, flow measurement devices to measure the flows of the components, a static mixer in fluid communication with the mixing block for receiving the combined components, a C-shaped plate member arranged around the work piece, a drive mechanism to oscillate a partial rotation of the C-shaped member about the work piece with the rate of oscillations controlled by a logic controller, at least two spray guns disposed on the C-shaped member to spray towards the outside surface of the work piece, a drive mechanism to traverse the at least two spray guns longitudinally with the rate of traverse controlled by a logic controller; and the logic controller(s) programmed to control based on a number of input and measured parameters.
    Type: Application
    Filed: December 23, 2014
    Publication date: April 23, 2015
    Applicant: Line Travel Automated Coating Inc.
    Inventors: Sidney A. Taylor, Stanley Rogala, Ivan Belik, Miles Wenger