With Indicating, Testing, Inspecting, Or Measuring Means Patents (Class 118/712)
  • Patent number: 11551982
    Abstract: An ink jet process is used to deposit a material layer to a desired thickness. Layout data is converted to per-cell grayscale values, each representing ink volume to be locally delivered. The grayscale values are used to generate a halftone pattern to deliver variable ink volume (and thickness) to the substrate. The halftoning provides for a relatively continuous layer (e.g., without unintended gaps or holes) while providing for variable volume and, thus, contributes to variable ink/material buildup to achieve desired thickness. The ink is jetted as liquid or aerosol that suspends material used to form the material layer, for example, an organic material used to form an encapsulation layer for a flat panel device. The deposited layer is then cured or otherwise finished to complete the process.
    Type: Grant
    Filed: July 19, 2021
    Date of Patent: January 10, 2023
    Assignee: Kateeva, Inc.
    Inventors: Eliyahu Vronsky, Nahid Harjee
  • Patent number: 11535935
    Abstract: A thin film deposition system includes a vacuum-preloaded gas bearing deposition head positioned in an external environment having an ambient pressure, the deposition head having an output face including a plurality of source openings through which gaseous materials are supplied and one or more exhaust openings. An exhaust pressure at the exhaust openings is less than ambient pressure, and a source pressure at the source openings is greater than that at the exhaust openings, with the pressure at the outermost source openings being greater than ambient pressure. A motion control system moves a substrate unit over the output face in the in-track direction without constraining its motion in a direction normal to the output face to a point where a center of gravity of the substrate unit is beyond the first edge of the output face.
    Type: Grant
    Filed: June 17, 2020
    Date of Patent: December 27, 2022
    Inventors: Todd Mathew Spath, Carolyn Rae Ellinger
  • Patent number: 11534794
    Abstract: A method for forming an isolating layer of a crucible includes placing a round crucible sideways with a bottom surface of an inside thereof perpendicular to a horizontal plane, and then performing a plurality of spraying processes to form the isolating layer on the bottom surface and a wall surface of the round crucible. Each spraying process includes spraying a slurry on the bottom surface; using an optical positioner to set a spraying range the same as one of a plurality of partial areas divided from the wall surface; aligning one of the plurality of partial areas with the spraying range; fixing the round crucible and spraying the slurry in the spraying range; stopping the spraying; and rotating the round crucible to move another partial area to the spraying range. Then, the steps are repeated until the spraying of all the partial areas is completed.
    Type: Grant
    Filed: May 25, 2020
    Date of Patent: December 27, 2022
    Assignee: Sino-American Silicon Products Inc.
    Inventors: Yu-Min Yang, Huang-Wei Lin, Bo-Kai Wang, Sung-Lin Hsu, Ying-Ru Shih
  • Patent number: 11539016
    Abstract: The present disclosure discloses a light-emitting device, a display apparatus and a manufacturing method.
    Type: Grant
    Filed: June 18, 2021
    Date of Patent: December 27, 2022
    Assignee: Beijing BOE Technology Development Co., Ltd.
    Inventor: Tieshi Wang
  • Patent number: 11538665
    Abstract: A gas supply system includes first and second gas supply lines, first and second valves, and a controller. The first gas supply line is connected between a process gas source and a substrate processing chamber and has an intermediate node. The second gas supply line is connected between a purge gas source and the intermediate node. The first valve is disposed upstream of the intermediate node on the first gas supply line. The second valve is disposed upstream of the first valve on the first gas supply line. A controller controls the first and second valves to open the first and second valves in a first mode for supplying a process gas from the process gas source to the substrate processing chamber, and close the first and second valves in a second mode for supplying a purge gas from the purge gas source to the substrate processing chamber.
    Type: Grant
    Filed: October 26, 2020
    Date of Patent: December 27, 2022
    Inventors: Atsushi Sawachi, Norihiko Amikura
  • Patent number: 11530773
    Abstract: A pipe repair device includes a body defining a first body end, a second body end, and a middle body section therebetween; a pivotable arm attached to the body, wherein the pivotable arm is pivotable relative to the body to radially reposition the pivotable arm relative to the body; a locomotion subsystem configured to drive the pipe repair device through a pipe, the locomotion subsystem mounted to the pivotable arm and configured to engage an inner surface of the pipe; and a stent mounted to the body, the stent comprising a sealing layer and a spring.
    Type: Grant
    Filed: December 14, 2021
    Date of Patent: December 20, 2022
    Assignee: Mueller International, LLC
    Inventors: Cody Badger, Clifton Braun, Adam Tank
  • Patent number: 11527391
    Abstract: The present disclosure provides a position-detectable shielding device, which includes a first-shield member, a second-shield member, a driver and two position sensors. The driver includes a motor, an outer tube and a main shaft within the outer tube. The motor is connected to the first-shield member and the second-shield member, respectively via the outer tube and the main shaft. Such that, the motor drives and swings the two shield members between a shielding state and an open state. The two position sensors are respectively disposed for detecting that the outer tube has rotated to a first position where the first-shield member is in the open state, and for detecting that the outer tube has rotated to a second position where the first-shield member is in the shielding state, thereby to confirm that the two shield members are exactly at the preset shielding state or the open state.
    Type: Grant
    Filed: October 20, 2021
    Date of Patent: December 13, 2022
    Assignee: SKY TECH INC.
    Inventors: Jing-Cheng Lin, Yu-Te Shen
  • Patent number: 11524429
    Abstract: An imprinting apparatus 100 includes a control unit 126 that controls movement of a stage 104. During a period after a pattern is formed in a first region of regions until a pattern is formed in a second region that differs from the first region of the regions, the control unit 126 does not allow the first region to pass through a facing portion that faces a discharge ports 122b. After a predetermined time has elapsed since the discharging unit 106 finally discharges a imprint material 127 to the substrate with an airstream generated along a substrate from the facing portion at the facing portion that faces the discharge ports 122b, the control unit 126 controls movement of the stage such that the regions in which the pattern is formed are allowed to pass through the facing portion.
    Type: Grant
    Filed: June 7, 2019
    Date of Patent: December 13, 2022
    Inventor: Yousuke Kondo
  • Patent number: 11518087
    Abstract: The present disclosure provides a method of making an article, including: providing a composition comprising two or more types of polymerizable monomers and two or more types of polymerization initiators; exposing the build region to one or more polymerization stimuli; polymerizing the two or more polymerizable monomers at the build region to provide a polymer layer; and advancing the polymer layer away from the build region to provide a three-dimensional article containing two or more integrally mixed polymers.
    Type: Grant
    Filed: September 11, 2017
    Date of Patent: December 6, 2022
    Inventors: Andrew Boydston, Johanna Schwartz, Carl Thrasher, Troy Becker, Mark Ganter, Duane Storti
  • Patent number: 11518082
    Abstract: Plasma applications are disclosed that operate with argon or helium at atmospheric pressure, and at low temperatures, and with high concentrations of reactive species in the effluent stream. Laminar gas flow is developed prior to forming the plasma and at least one of the electrodes can be heated which enables operation at conditions where the argon or helium plasma would otherwise be unstable and either extinguish, or transition into an arc. The techniques can be employed to clean and activate a metal substrate, including removal of oxidation, thereby enhancing the bonding of at least one other material to the metal.
    Type: Grant
    Filed: September 10, 2020
    Date of Patent: December 6, 2022
    Assignee: Surfx Technologies LLC
    Inventors: Siu Fai Cheng, Thomas Scott Williams, Toby Desmond Oste, Sarkis Minas Keshishian, Robert F. Hicks
  • Patent number: 11501986
    Abstract: A substrate etching system includes a support to hold a wafer in a face-up orientation, a dispenser arm movable laterally across the wafer on the support, the dispenser arm supporting a delivery port to selectively dispense a liquid etchant onto a portion of a top face of the wafer, and a monitoring system comprising a probe movable laterally across the wafer on the support.
    Type: Grant
    Filed: May 5, 2017
    Date of Patent: November 15, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Jeffrey Chi Cheung, John Ghekiere, Jerry D. Leonhard, David P. Surdock, Benjamin Shafer, Ray Young
  • Patent number: 11498268
    Abstract: This method describes techniques to create 3D parts by dispensing a liquid polymer or slurry in evenly delivered layers, which are exposed to light from a visual display screen before the print platform upon which it is being built is moved one-layer thickness away and the process is repeated. The process of dispensing the photosensitive material is via a pumped system through a metering device that discharges and levels the material. Multiple dispensing devices can be arranged in sequence to deliver different materials, either multiple photosensitive dispensing heads or alternative mechanisms such as robocasting, fused deposition modelling or inkjet in addition to a photosensitive deposition head.
    Type: Grant
    Filed: March 4, 2020
    Date of Patent: November 15, 2022
    Assignee: PhotoCentriC Limited
    Inventors: Paul Holt, Richard Fletton, Hanifeh Zarezadeh
  • Patent number: 11491812
    Abstract: Embodiments herein describe a DTG printing environment that uses autonomous robots to move garments between DTG processing stages (e.g., retrieval stages, pretreatment stages, printing stages, drying stages, etc.). Doing so removes the dependency of DTG printing process on the stage that consumes the most time. In one embodiment, the DTG processing stages or the autonomous robot include an actuator for moving the garment and the DTG processing stage closer together. In one embodiment, the processing stage includes a lift (e.g., an actuator) that lifts a detachable carrier from the robot on which the garment is mounted. The lift can level and rotate the detachable carrier to provide a fine alignment between the garment and the DTG processing stage. While a lift is specifically disclosed, in other embodiments, the actuator could be disposed on the robot to lift up the garment.
    Type: Grant
    Filed: February 21, 2022
    Date of Patent: November 8, 2022
    Assignee: CreateMe Technologies LLC
    Inventors: Khamvong Thammasouk, Thomas C. K. Myers, Jinhwa Jung, Benjamin R. Waller, IV, David B. Lemke
  • Patent number: 11488806
    Abstract: Embodiments of process kits for use in a process chamber are provided herein. In some embodiments, a process kit includes a slit door having an arcuate profile and including a first plate coupled to a second plate, wherein the first plate is configured to be coupled to an actuator, and wherein the second plate has a processing volume facing surface that includes silicon.
    Type: Grant
    Filed: May 8, 2020
    Date of Patent: November 1, 2022
    Inventor: Hamid Noorbakhsh
  • Patent number: 11478814
    Abstract: Systems and methods for coating a thin film with a viscous material, such as a liquid, a paste, or an adhesive, at a desired thickness. In such a system, two films move adjacent to one another, optionally in opposite directions, atop two rollers separated by a known gap that defines a coating thickness, with the material being transferred from one film to the other. The rollers may be maintained in their relative positions by springs and/or linear actuators and positioned using linear encoders. In alternative arrangements, the material to be coated could be low viscosity material such as a polymeric solution. Air knives may be provided near the gap to create an air flow that aids in preventing the free flow of low viscosity materials outside the bounds of the film during coating.
    Type: Grant
    Filed: January 19, 2021
    Date of Patent: October 25, 2022
    Assignee: IO Tech Group Ltd.
    Inventors: Michael Zenou, Ziv Gilan
  • Patent number: 11482403
    Abstract: The present disclosure provides a thin-film-deposition equipment for detecting shielding mechanism, which includes a reaction chamber, a carrier, a shielding mechanism and two distance sensors. The carrier and the shielding mechanism is partially disposed within the reaction chamber. The shielding mechanism includes two shield unit and a driver. The driver interconnects and drives the two shield units to sway in opposite directions and into an open state and a shielding state. Each of the two shield unit is disposed with a reflective surface for each of the two distance sensors to respectively project optical beams onto and detect a distances therebetween when the two shield units are operated in the shielding state, such that to confirm that the shielding mechanism is in the shielding state.
    Type: Grant
    Filed: October 21, 2021
    Date of Patent: October 25, 2022
    Assignee: SKY TECH INC.
    Inventors: Jing-Cheng Lin, Yu-Te Shen
  • Patent number: 11453054
    Abstract: There is provided a method for manufacturing a three-dimensional shaped object by a continuous formation of a plurality of solidified layers through a light beam irradiation, the three-dimensional shaped object being provided with a hollow portion in an interior of the shaped object. The manufacturing method performs the formation of the solidified layer by irradiating a raw material with a light beam at the time of suppling the raw material, thereby allowing a sintering of the raw material or a melting and subsequent solidification of the raw material. In particular, a solidified foundation portion is provided as a part of the three-dimensional shaped object, the solidified foundation portion being used for a platform for a formation of a subsequent layer provided as the solidified layer. An orientation of the solidified foundation portion is changed prior to the formation of the subsequent solidified layer.
    Type: Grant
    Filed: November 27, 2017
    Date of Patent: September 27, 2022
    Inventors: Akifumi Nakamura, Norio Yoshida, Noriyasu Nakashima
  • Patent number: 11453946
    Abstract: Methods of and systems for performing leak checks of gas-phase reactor systems are disclosed. Exemplary systems include a first exhaust system coupled to a reaction chamber via a first exhaust line, a bypass line coupled to a gas supply unit and to the first exhaust system, a gas detector coupled to the bypass line via a connecting line, a connecting line valve coupled to the connecting line, and a second exhaust system coupled to the connecting line. Methods include using the second exhaust system to exhaust the connecting line to thereby remove residual gas in the connecting line that may otherwise affect the accuracy of the gas detector.
    Type: Grant
    Filed: May 28, 2020
    Date of Patent: September 27, 2022
    Assignee: ASM IP Holding B.V.
    Inventors: SungBae Kim, HakYong Kwon, YoungMin Kim, KiKang Kim, SeungHwan Lee
  • Patent number: 11433608
    Abstract: An imprint apparatus includes: a substrate stage configured to move a substrate; an ejection unit including a plurality of nozzles and configured to eject an ejection material from the nozzles onto the substrate in synchronization with movement of the substrate stage; and a mold driving mechanism configured to drive a mold on which a pattern is formed to press down the mold onto the substrate. The imprint apparatus determines a relative ejection timing of an abnormal nozzle with respect to a normal nozzle based on ejection properties of the nozzles and a moving direction of the substrate stage, determines an ejection timing of the normal nozzle based on the determined relative ejection timing, and controls a synchronization timing of the substrate stage and the ejection unit based on the determined ejection timing of the normal nozzle.
    Type: Grant
    Filed: September 4, 2020
    Date of Patent: September 6, 2022
    Inventors: Hisashi Namba, Noriyasu Hasegawa
  • Patent number: 11430640
    Abstract: A substrate processing apparatus having an improved exhaust structure includes a reaction space formed between a processing unit and a substrate support unit, an exhaust unit surrounding the reaction space, an exhaust port with a channel inside, a partition wall with an exhaust line inside, wherein the channel of the exhaust port connects the exhaust unit and the exhaust line.
    Type: Grant
    Filed: July 24, 2020
    Date of Patent: August 30, 2022
    Assignee: ASM IP Holding B.V.
    Inventors: WonKi Jeong, JuIll Lee, HaSeok Jang
  • Patent number: 11424107
    Abstract: The present disclosure relates to a plasma generation system with a dielectric window, an inductive coil disposed on the dielectric window, a gas distribution element disposed on the dielectric window, and a gas conditioning system coupled to the gas distribution element. The gas distribution element is configured to discharge a thermally conditioned gas on the dielectric window and regulate a temperature across the dielectric window. The gas conditioning system is configured to supply the thermally conditioned gas to the gas distribution element.
    Type: Grant
    Filed: June 11, 2019
    Date of Patent: August 23, 2022
    Inventor: Li-Shi Liu
  • Patent number: 11415617
    Abstract: Various approaches can be used to interrogate a surface such as a surface of a layered semiconductor structure on a semiconductor wafer. Certain approaches employ Second Harmonic Generation and in some cases may utilize pump and probe radiation. Other approaches involve determining current flow from a sample illuminated with radiation. Decay constants can be measured to provide information regarding the sample. Additionally, electric and/or magnetic field biases can be applied to the sample to provide additional information.
    Type: Grant
    Filed: December 4, 2019
    Date of Patent: August 16, 2022
    Assignee: FemtoMetrix, Inc.
    Inventors: Viktor Koldiaev, Marc Kryger, John Changala
  • Patent number: 11414344
    Abstract: The apparatus and methods include moving an optical fiber over a fiber path that includes a marking location at which resides a marking unit that dispenses an ink-jet stream. A centering method is performed whereby the optical fiber is incrementally moved in a lateral direction through the path of the ink-stream and the mark number density of marks formed on the optical fiber is measured along with the optical fiber position. A process window is defined by the range of lateral fiber positions over which a target mark number density is formed on a consistent basis. A controller calculates an optimum fiber path position and stores it memory for future reference while also moving the fiber path to the optimum position. The initially wet ink marks are dried and the fiber coated with a transparent protective overcoat to form a coated and marked optical fiber.
    Type: Grant
    Filed: July 16, 2020
    Date of Patent: August 16, 2022
    Assignee: Corning Incorporated
    Inventors: Steven Howard Dunn, Aditya Kaimal, Kelvin Nguyen
  • Patent number: 11406137
    Abstract: The present apparatus relates to an electronic cigarette manufacturing apparatus, and more particularly, to an electronic cigarette manufacturing apparatus with which electronic cigarettes each composed of a plurality of segments can be easily and quickly manufactured without defects and thus productivity improvement and cost reduction can be achieved.
    Type: Grant
    Filed: February 7, 2019
    Date of Patent: August 9, 2022
    Inventor: Jung-soo Lee
  • Patent number: 11400718
    Abstract: A liquid discharge apparatus includes a head configured to discharge a liquid onto a print target, a carriage configured to hold the head and reciprocally movable in a main-scanning direction, a sealing configured to seal a nozzle surface of the head, and a support configured to hold the print target and movable in a sub-scanning direction perpendicular to the main-scanning direction, the support including a space configured to accommodate the sealing in the support.
    Type: Grant
    Filed: March 1, 2021
    Date of Patent: August 2, 2022
    Assignee: RICOH COMPANY, LTD.
    Inventor: Norikazu Yanase
  • Patent number: 11404947
    Abstract: The invention relates to an impregnation device (1) for trickle impregnation of a stator (2) or armature of an electric machine with a synthetic resin (5) curing under temperature increase, comprising a holding device (32) which can be tilted vertically relative to the horizontal (16) and to which a drive motor (12) is attached as a rotary drive for the stator (2) or the armature, a drive shaft (58) operatively connected to the drive motor (12), a clamping device (34) which is non-rotatably connected to the drive shaft (58) and capable of detachably connecting the stator (2) or the armature to the drive shaft (58), a trickle device (24) capable of applying a synthetic resin (5) onto at least one axial end of the windings (4) of the stator (2) or the armature, and a heating device capable of heating the windings (4) of the stator (2) or the armature to a trickle temperature and to a comparatively higher curing temperature.
    Type: Grant
    Filed: February 18, 2018
    Date of Patent: August 2, 2022
    Inventors: Jens Berthold, Stefan Schneider, Richard A. Rasp
  • Patent number: 11372058
    Abstract: An impedance matching device includes: a variable capacitor connected between a radio-frequency power supply and a load; a first detector that detects an index value that determines impedance matching between the radio-frequency power supply and the load, and a first state value that indicates a state of a radio-frequency power; a second detector that detects a second state value that indicates a state of radio-frequency power output to the load; an adjustment unit that adjusts a capacitance value of the variable capacitor such that the index value detected by the first detector falls within a target range; and a diagnosis unit configured to diagnose an abnormality of the variable capacitor, the first detector, or the second detector based on the capacitance value adjusted by the adjustment unit, the first state value detected by the first detector, and the second state value detected by the second detector.
    Type: Grant
    Filed: April 1, 2020
    Date of Patent: June 28, 2022
    Inventor: Hideo Kato
  • Patent number: 11371839
    Abstract: A method of performing visualized measurement on thickness distribution of a paint film and an apparatus therefor. A measurement target region is heated by a heating unit that applies a light beam while moving relative to the measurement target region of a measurement target structure. A sensing unit moving together with the heating unit generates a plurality of thermal images related to a phenomenon in which thermal energy is propagated in the measurement target region by scanning and photographing the heated measurement target region. The thermal images in a dynamic state are converted into time-spatial-integrated thermal images in a static state by performing coordinate transformation according to a time-spatial-integrated coordinate transformation algorithm. A thickness of the paint film is calculated by using a Fourier thermal conduction equation.
    Type: Grant
    Filed: November 2, 2018
    Date of Patent: June 28, 2022
    Assignee: Korea Advanced Institute of Science and Technology
    Inventors: Hoon Sohn, Soonkyu Hwang, Jiho Park
  • Patent number: 11369987
    Abstract: A device and a system for a lacquer transfer with a frame, transfer roller with a circumferential lateral wall, a drive unit, a slit nozzle, the slit nozzle at least indirectly connected to the frame, an outside contact surface of the lateral wall including depressions, the transfer roller mounted rotatably about an axis of rotation at the frame, the drive unit configured to drive the transfer roller for the transfer roller to rotate about the axis of rotation. The slit nozzle includes a supply connection, nozzle-cavity, slit-shaped nozzle-channel and at least one limiter, the supply connection coupled to the nozzle-cavity for supplying lacquer to the nozzle-cavity, the nozzle-channel extending from the nozzle-cavity to a muzzle end formed by the slit nozzle at the end of the nozzle-channel for dispensing lacquer, the slit nozzle configured by the limiter to adjust a cross-section in a restriction area of the nozzle-channel.
    Type: Grant
    Filed: March 25, 2020
    Date of Patent: June 28, 2022
    Assignee: Airbus Operations GmbH
    Inventors: Pierre C. Zahlen, Alexander Gillessen, Sebastian Kerger
  • Patent number: 11361985
    Abstract: The present invention relates to a substrate supporting device and a substrate processing apparatus. The substrate supporting device, the substrate supporting device of the substrate processing apparatus, may include: a disk; and a plurality of substrate supporting parts disposed radially from a center of the disk, a substrate being supported by each of the plurality of substrate supporting parts. An upper surface of each of the plurality of substrate supporting parts may protrude more upward than an upper surface of the disk.
    Type: Grant
    Filed: August 20, 2018
    Date of Patent: June 14, 2022
    Inventors: Jong Sik Kim, Hyun Wook Shin, Su Yeon Lee
  • Patent number: 11361130
    Abstract: A three-dimensional object model is divided into a plurality of slices that are targeted for an additive manufacturing process having a minimum printable feature size. For each of the slices, a thinning algorithm is applied to one or more contours of the slice to form a meso-skeleton, where topological features of the thinned slice that are smaller than the minimum printable feature size are reduced to skeletal paths. A corrected slice is formed using the meso-skeleton by sweeping the meso-skeleton with the minimum printable feature size. The corrected slices are assembled into a corrected object model and the corrected object model is used in the additive manufacturing process.
    Type: Grant
    Filed: December 16, 2019
    Date of Patent: June 14, 2022
    Assignee: Palo Alto Research Center Incorporated
    Inventors: Erva Ulu, Nurcan Gecer Ulu, Walter Hsiao, Saigopal Nelaturi
  • Patent number: 11328944
    Abstract: The disclosed technology generally relates to semiconductor processing and more particularly to placing a substrate in a semiconductor manufacturing equipment for processing, and to apparatuses for placing the substrate in the semiconductor manufacturing equipment. In one aspect, a method of calibrating a process position of a semiconductor substrate in a process chamber comprises securing a calibration substrate on a susceptor in a processing chamber under an open chamber condition using a securing device, wherein securing comprises preventing the substrate from sliding laterally on the susceptor by more than a predefined tolerance from a centered position relative to a susceptor center. The method additionally comprises subjecting the calibration substrate under a process condition different from the open chamber condition. The method additionally comprises transferring the calibration substrate from the susceptor using a robot arm.
    Type: Grant
    Filed: October 23, 2019
    Date of Patent: May 10, 2022
    Assignee: Eugenus, Inc.
    Inventors: Alex Finkelman, Somilkumar J. Rathi, Niloy Mukherjee
  • Patent number: 11299803
    Abstract: A method of coating a component includes attaching the component to a support that is configured to hold a plurality of components and placing a base of the support in a holder that is attached to rotatable member of a fixture, wherein an axis of the holder is parallel to an axis of rotation of the rotatable member. The method also includes transporting the fixture into a coating chamber wherein a direction of an exit stream of a coater in oriented perpendicularly to the axis of rotation, exposing the fixture and the component to a reverse transfer arc cleaning/pre-heating procedure, and exposing the fixture and the component to a coating procedure during which a coating is directed at the component in a direction perpendicular to the axis of rotation while the rotatable member is rotating. The method further includes transporting the fixture and removing the component from the support fixture.
    Type: Grant
    Filed: January 4, 2019
    Date of Patent: April 12, 2022
    Assignee: Raytheon Technologies Corporation
    Inventors: Frank J. Trzcinski, Scott A. Elliott, Andrew Cervoni
  • Patent number: 11244849
    Abstract: Generation of dust from a peripheral portion of a substrate can be suppressed, and a processed substrate can be suppressed from being adversely affected by a pre-processed substrate. Further, an actual elevation state of the member configured to be moved up and down to support the substrate can be investigated. A substrate transfer device includes a first supporting portion, a second supporting portion and an elevating mechanism. The first supporting portion and the second supporting portion are configured to support a substrate from below the substrate. The elevating mechanism is configured to elevate the second supporting portion up and down between a first position higher than a height of the first supporting portion and a second position lower than the height of the first supporting portion. The substrate transfer device further includes a detecting mechanism configured to detect an elevation state of the second supporting portion.
    Type: Grant
    Filed: September 18, 2019
    Date of Patent: February 8, 2022
    Inventors: Katsuhiro Morikawa, Yuta Matsushima
  • Patent number: 11213850
    Abstract: Provided herein is an improved spin coating system and a method of using the spin coating machine to produce an optical article. The system includes at least one dispensing arm assembly. The holder assembly is moveable along a substantially vertical axis. The dispensing arm assembly has a base and at least one arm having a first end and a second end and is moveable along a horizontal axis. The at least one arm is operably coupled to the base at the first end and operably coupled to at least one applicator at the second end, and the applicator is capable of being positioned along the substantially vertical axis. The method includes depositing a primer layer onto a lens using the dispensing arm assembly, followed by a hard coating, and drying and cooling the substrate using a drying/cooling station that is positioned substantially along the substantially vertical axis.
    Type: Grant
    Filed: January 9, 2018
    Date of Patent: January 4, 2022
    Assignee: Essilor International
    Inventor: Stephen Celmer
  • Patent number: 11148164
    Abstract: A dispenser and methods for transferring liquids are disclosed. The dispenser may include a capillary tube with tip having an aperture, a piezoelectric actuator coupled to the capillary tube at a location. Actuation of the piezoelectric actuator causes a pressure wave to propagate along the capillary tube toward the tip such that radial motion at the location is transmitted as distally extending axial motion of the tip, thereby causing a droplet of a predetermined volume to be ejected from the aperture. In some embodiments, the capillary tube has a modulus of elasticity in a range which dampens acoustical noise from the actuation and provides single drop stability over a range of drop sizes.
    Type: Grant
    Filed: July 24, 2015
    Date of Patent: October 19, 2021
    Assignee: BioDot, Inc.
    Inventors: Yehuda Ivri, Thomas Tisone, Eric P. Kuo, Shane Gunsalus
  • Patent number: 11117158
    Abstract: A sealant discharging apparatus includes a sealing gun, a movement controller, and a discharge controller. The sealing gun discharges sealant to an object. The movement controller causes the sealing gun and the object to move relatively. The discharge controller controls a discharge amount of the sealant discharged from the sealing gun. The movement controller controls a movement velocity of the sealing gun based on a volume of post-sealing sealant that has been discharged from the sealing gun and used to seal the object, and an amount of volume change in a sealant pool that has been discharged from the sealing gun and is yet to be used to seal the object.
    Type: Grant
    Filed: October 1, 2019
    Date of Patent: September 14, 2021
    Inventors: Yohei Matsumoto, Mitsuru Kono
  • Patent number: 11114278
    Abstract: A plasma power supply device includes an AC power supply configured to generate an AC voltage of a predetermined frequency for application to a pair of electrodes by way of a power supply harness which is replaceable partially or wholly to change a wiring length and which is flexible, and a control section configured to set the predetermined frequency of the AC power supply so that the frequency becomes lower as the power supply harness becomes longer.
    Type: Grant
    Filed: November 22, 2017
    Date of Patent: September 7, 2021
    Inventor: Shinji Takikawa
  • Patent number: 11092637
    Abstract: Various approaches can be used to interrogate a surface such as a surface of a layered semiconductor structure on a semiconductor wafer. Certain approaches employ Second Harmonic Generation and in some cases may utilize pump and probe radiation. Other approaches involve determining current flow from a sample illuminated with radiation. Decay constants can be measured to provide information regarding the sample. Additionally, electric and/or magnetic field biases can be applied to the sample to provide additional information.
    Type: Grant
    Filed: December 4, 2019
    Date of Patent: August 17, 2021
    Assignee: FemtoMetrix, Inc.
    Inventors: Viktor Koldiaev, Marc Kryger, John Changala
  • Patent number: 11048175
    Abstract: Methods and systems are described for cleaning a support such as a clamp of a chuck that holds a patterning device or a wafer in a lithographic apparatus. The method includes loading a electrostatic cleaning substrate into a lithographic apparatus. The electrostatic cleaning substrate includes at least one electrode. The method further includes bringing the electrostatic cleaning substrate near to the clamping surface to be cleaned and connecting the electrode to a voltage source. Particles present on the support are then transferred to the electrostatic cleaning substrate.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: June 29, 2021
    Assignee: ASML Holding N.V.
    Inventors: Victor Antonio Perez-Falcon, Michael Andrew Chieda
  • Patent number: 11037808
    Abstract: During a teaching operation regarding a transport mechanism, a hand of the transport mechanism is moved to a tentative target position in a substrate supporter, and a substrate supported at a reference position in the substrate supporter is received by the hand. A positional relationship between the substrate held by the hand and the hand is detected. A deviation between the tentative target position and the reference position is acquired as correction information based on the detected positional relationship. During the teaching operation or during substrate processing, the tentative target position is corrected to a true target position to coincide with the reference position based on the acquired correction information. During the substrate processing, the hand is moved to the true target position, so that the substrate is transferred to the substrate supporter by the hand, or the substrate is received from the substrate supporter by the hand.
    Type: Grant
    Filed: March 22, 2018
    Date of Patent: June 15, 2021
    Inventor: Joji Kuwahara
  • Patent number: 11004709
    Abstract: A method for monitoring gas in a wafer processing system is provided. The method includes producing an exhaust flow in an exhausting conduit from a processing chamber. The method further includes placing a gas sensor in fluid communication with a detection point located in the exhausting conduit via a sampling tube that passes through a through hole formed on the exhausting conduit. The detection point is located away from the through hole. The method also includes detecting a gas condition at the detection point with the gas sensor. In addition, the method also includes analyzing the gas condition detected by the gas sensor to determine if the gas condition in the exhausting conduit is in a range of values.
    Type: Grant
    Filed: September 11, 2018
    Date of Patent: May 11, 2021
    Inventors: Wen-Chieh Hsieh, Su-Yu Yeh, Ko-Bin Kao, Chia-Hung Chung, Li-Jen Wu, Chun-Yu Chen, Hung-Ming Chen, Yong-Ting Wu
  • Patent number: 10988840
    Abstract: A crystal oscillation probe structure and an evaporation device are provided. The crystal oscillation probe structure includes a guide cover, a crystal oscillation probe and a mesh screen structure, the guide cover includes a chamber with a guide opening, the crystal oscillation probe is fixed in the chamber, the crystal oscillation probe includes at least one crystal oscillation sheet, the mesh screen structure includes a plurality of openings, and the mesh screen structure is located on a traveling path of a material traveling toward the at least one crystal oscillation sheet and disposed on a side of the at least one crystal oscillation sheet facing the guide opening.
    Type: Grant
    Filed: May 1, 2019
    Date of Patent: April 27, 2021
    Inventors: Yifan Yang, Peng Cao, Ming Zhao, Wanmei Qing
  • Patent number: 10913999
    Abstract: A box coating apparatus for coating of substrates comprises a vacuum chamber which contains an evaporation source. A substrate holder is disposed vis-à-vis to the evaporation source so that evaporated material can impinge on substrates held by the substrate holder. Besides the evaporation source and the substrate holder, at least one further functional component is provided, namely a Meissner trap and/or a high vacuum valve mechanism, to which a shield arrangement is assigned to prevent evaporated material from impinging on said component. This shield arrangement has a shutter portion which can be moved from a closed shielding position in which it covers a passageway through the shield arrangement and serves to shield said component, to an open pumping position in which it substantially clears the passageway to allow essentially free passage for gases and vapor, and vice versa.
    Type: Grant
    Filed: February 21, 2018
    Date of Patent: February 9, 2021
    Inventors: Giuseppe Di Paola, Franco Moreni, Antonio Corea, Giuseppe Viscomi, Frank Breme
  • Patent number: 10889895
    Abstract: A deposition apparatus comprises: an infeed chamber; a preheat chamber; a deposition chamber; and optionally at least one of a cooldown chamber and an outlet chamber. At least a first of the preheat chamber and the cooldown chamber contains a buffer system for buffering workpieces respectively passing to or from the deposition chamber.
    Type: Grant
    Filed: June 11, 2015
    Date of Patent: January 12, 2021
    Assignee: Raytheon Technologies Corporation
    Inventors: James W. Neal, David A. Litton, Brian T. Hazel, Michael J. Maloney, Eric M. Jorzik
  • Patent number: 10879092
    Abstract: A plasma processing system having a plurality of stations is provided. Each station has a substrate support and a showerhead for supplying process gases. A radio frequency (RF) power supply and a distribution system is provided, where the distribution system is coupled to the RF power supply. A plurality of voltage probes is provided. Each of the plurality of voltage probes is connected in-line between the distribution system and each showerhead of each of the stations. A controller is configured to receive sensed voltage values from each of the plurality of voltage probes and compare the sensed voltage values against a plurality of voltage check bands. Each voltage check band is predefined for a process operation, and the controller is configured to generate an alert when the comparing detects that a sensed voltage value is outside of a voltage check band.
    Type: Grant
    Filed: August 7, 2018
    Date of Patent: December 29, 2020
    Assignee: Lam Research Corporation
    Inventors: Sunil Kapoor, Yaswanth Rangineni, Aaron Bingham, Tuan Nguyen
  • Patent number: 10829854
    Abstract: There is provided a film forming method of forming a metal film, which includes: alternately supplying a metal chloride gas and a reducing gas for reducing the metal chloride gas to a substrate arranged inside a processing vessel a plurality of times, wherein the alternately supplying the metal chloride gas and the reducing gas includes a period of time during which a flow rate of the metal chloride gas gradually increases.
    Type: Grant
    Filed: February 15, 2018
    Date of Patent: November 10, 2020
    Inventors: Kensaku Narushima, Katsumasa Yamaguchi
  • Patent number: 10816480
    Abstract: In a method of detecting a defect on a substrate, an incident beam may be radiated to a surface of the substrate to generate reflected light beams. A second harmonic generation (SHG) beam among the reflected light beams may be detected. The SHG beam may be generated by a defect on the substrate. A nano size defect may be detected by examining the SHG beam.
    Type: Grant
    Filed: March 26, 2019
    Date of Patent: October 27, 2020
    Inventors: Eun-Hee Jeang, Aleksandr Shorokhov, Anton Medvedev, Maksim Riabko, Sang-Woo Bae, Akinori Okubo, Sang-Min Lee, Seong-Keun Cho, Won-Don Joo
  • Patent number: 10820424
    Abstract: Provided is a slot die with variable nozzles.
    Type: Grant
    Filed: October 25, 2017
    Date of Patent: October 27, 2020
    Inventors: Yong Sung Kim, Ok Jin Kim, Jin Woo Seong, Young Jin Kim
  • Patent number: 10807358
    Abstract: Disclosed is a printing apparatus. In an exemplary embodiment, the printing apparatus includes a nozzle for ejecting ink, a driving device for moving the nozzle, an imaging device for capturing an image displaying an ink printing process, and an automatic positioning controller for automatically setting a position of the nozzle based on the image captured by the imaging device while moving the nozzle by means of the driving device.
    Type: Grant
    Filed: March 19, 2019
    Date of Patent: October 20, 2020
    Assignee: ENJET CO. LTD.
    Inventors: Do Young Byun, Vu Dat Nguyen