Having Means To Expose A Portion Of A Substrate To Coating Medium Patents (Class 118/720)
  • Patent number: 10266962
    Abstract: A physical vapor deposition system includes a deposition chamber; a wafer support structure disposed within the deposition chamber and configured to support at least one wafer thereon, and at least one effusion cell disposed at least partially outside the deposition chamber and coupled to a wall of the deposition chamber. The at least one effusion cell is configured to generate physical vapor by evaporation or sublimation of material within the at least one effusion cell, and to inject the physical vapor into the deposition chamber through an aperture in the wall of the deposition chamber. The at least one effusion cell is configured such that the at least one effusion cell can be filled with the material to be evaporated or sublimated without removing the at least one effusion cell from the deposition chamber and without interrupting a deposition process performed using the deposition system.
    Type: Grant
    Filed: April 24, 2017
    Date of Patent: April 23, 2019
    Assignee: Innovative Advanced Materials, Inc.
    Inventor: William Alan Doolittle
  • Patent number: 10204820
    Abstract: A novel interchangeable spin chuck system is provided that allows the user to quickly change substrate sizes and spin chuck styles without any extra tools. This system has a two-piece design and overcomes many of the drawbacks of previous spin chuck designs, such as difficulty in seating the spin chuck and ensuring that the spin chuck is at a consistent flatness and height. Furthermore, this spin chuck system allows the spin chucks to be manufactured at a lower cost. Thus, rather than restricting users to “make do” with incorrect spin chucks due to budget limitations, this economical design gives users access to a wider range of spin chuck sizes and styles.
    Type: Grant
    Filed: May 19, 2015
    Date of Patent: February 12, 2019
    Assignee: Cost Effective Equipment LLC
    Inventors: Kirk Emory, Brandon Wilson, Roger Ruesing
  • Patent number: 10081860
    Abstract: The present disclosure relates to the field of display technology, particularly to a vacuum deposition apparatus and a vapor deposition method. The vacuum deposition apparatus includes a vacuum chamber and a rotary base, an evaporation source, and a plurality of vapor deposition zones arranged in series from bottom to top in the vacuum chamber, wherein the shape of the rotary base is a Reuleaux triangle, and the trajectories of movement of its vertices in the horizontal plane is a rounded square, the vapor deposition zones are arranged at intervals along the trajectories of movement of the vertices of the rotary base, the evaporation source is driven by the rotary base to pass below the vapor deposition zones sequentially, so that the evaporation source can be used to perform the vapor deposition operation in multiple directions simultaneously, thus improving the uniformity of film formation and utilization of the evaporation material.
    Type: Grant
    Filed: March 25, 2016
    Date of Patent: September 25, 2018
    Inventors: Gu Yao, Suwei Zeng, Peng Xu
  • Patent number: 10049906
    Abstract: Provided is a substrate processing apparatus, which comprises a processing chamber, a substrate sensing assembly, a rotation shaft and a driving assembly. A portion of the rotation shaft is provided inside the processing chamber and the remaining portion thereof is provided outside the processing chamber. The substrate sensing assembly is provided on the portion of the rotation shaft outside the processing chamber. The driving assembly is fixed at the portion of the rotation shaft inside the processing chamber. The driving assembly drives, when coming into contact with the substrate, the rotation shaft to rotate about its own axis along a first direction, and drives, when the substrate comes into no contact with the driving assembly, the rotation shaft to rotate about its axis along a second direction opposite to the first direction. The treatment liquid does not affect the substrate sensing assembly since it is provided outside the processing chamber.
    Type: Grant
    Filed: January 3, 2017
    Date of Patent: August 14, 2018
    Inventors: Weigang Peng, Wei Zhou, Chengnan Hsieh, Yu Yang, Giseub Lim, Chen Yuan
  • Patent number: 10030603
    Abstract: The film forming apparatus includes a mask member and a shield member. The mask member is made of a cylindrical insulation material that can expose inner surfaces of cylinder bores, and mask the inner surface of a crankcase. The shield member is made of a metal material disposed along an inner surface of the mask member.
    Type: Grant
    Filed: September 25, 2017
    Date of Patent: July 24, 2018
    Assignee: HONDA MOTOR CO., LTD.
    Inventors: Junya Funatsu, Koji Kobayashi
  • Patent number: 9978569
    Abstract: Embodiments of the invention generally provide a process kit for use in a physical deposition chamber (PVD) chamber. In one embodiment, the process kit provides adjustable process spacing, centering between the cover ring and the shield, and controlled gas flow between the cover ring and the shield contributing to uniform gas distribution, which promotes greater process uniformity and repeatability along with longer chamber component service life.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: May 22, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Lara Hawrylchak, Kirankumar Savandaiah
  • Patent number: 9852933
    Abstract: A heating processing performed on an outer peripheral portion of a substrate can be optimized. A substrate processing apparatus includes a holding unit configured to hold a substrate; a rotation unit configured to rotate the holding unit; a processing liquid supply unit configured to supply a processing liquid onto the substrate held in the holding unit; and a heating device configured to heat an outer peripheral portion of the substrate held in the holding unit. Further, the heating device includes a discharge flow path through which a gas is discharged toward the outer peripheral portion of the substrate held in the holding unit; a branch flow path through which a gas is discharged toward a region other than the substrate held in the holding unit; and a heating unit configured to heat the discharge flow path and the branch flow path.
    Type: Grant
    Filed: April 30, 2015
    Date of Patent: December 26, 2017
    Inventor: Norihiro Ito
  • Patent number: 9817315
    Abstract: A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.
    Type: Grant
    Filed: March 13, 2014
    Date of Patent: November 14, 2017
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Wen-Zhan Zhou, Heng-Jen Lee, Hsu-Yuan Liu, Yu-Chen Huang, Cheng-Han Wu, Shih-Che Wang, Ho-Yung David Hwang
  • Patent number: 9708705
    Abstract: Disclosed is a chemical vapor deposition system for forming an organic thin film over a substrate. The system introduces a mask roll including two or more mask patterns for depositing an organic material on the substrate. The mask roll is released from one side and takes up on the other side to selectively provide one of the two or more patterns.
    Type: Grant
    Filed: September 9, 2013
    Date of Patent: July 18, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventor: Ki-Hyun Kim
  • Patent number: 9689070
    Abstract: Embodiments of the invention generally relate to a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a kit. More specifically, embodiments described herein relate to a process kit including a deposition ring and a pedestal assembly. The components of the process kit work alone, and in combination, to significantly reduce their effects on the electric fields around a substrate during processing.
    Type: Grant
    Filed: July 21, 2016
    Date of Patent: June 27, 2017
    Inventors: Muhammad Rasheed, Keith A. Miller, Rongjun Wang
  • Patent number: 9666745
    Abstract: A method for manufacturing a compound film comprising a substrate and at least one additional layer is disclosed. The method comprising the steps of depositing at least two chemical elements on the substrate and/or on the at least one additional layer using depositions sources, maintaining depositing of the at least two chemical elements while the substrate and the deposition sources are being moved relative to each other, measuring the compound film properties, particularly being compound film thickness, compound-film overall composition, and compound-film composition in one or several positions of the compound film, comparing the predefined values for the compound film properties to the measured compound film properties, and adjusting the deposition of the at least two chemical elements in case the measured compound film properties do not match the predefined compound film properties.
    Type: Grant
    Filed: July 26, 2013
    Date of Patent: May 30, 2017
    Assignee: FLISOM AG
    Inventors: Dominik Rudmann, Marc Kaelin, Thomas Studer, Felix Budde
  • Patent number: 9650709
    Abstract: The present disclosure provides a magnetic device and a vapor deposition device. The magnetic device is configured to adsorb a metal mask in the vapor deposition device, including: a metal plate; an electromagnet array including a plurality of electromagnets; each of the electromagnets being inserted in the metal plate; a power supply module configured to supply a current; a control module configured to, when adsorbing the metal mask during a vapor deposition process, control the power supply module to supply a direct current to all or some of the plurality of electromagnets and control a direction and a size of the direct current by sending a first control signal to the power supply module.
    Type: Grant
    Filed: August 28, 2014
    Date of Patent: May 16, 2017
    Inventors: Dejiang Zhao, Haoran Gao, Jianwei Yu, Jie Yin
  • Patent number: 9633889
    Abstract: Substrate supports are provided herein, In some embodiments, a substrate support includes a first plate; a plurality of vacuum passages disposed through the first plate; a plurality of vertical passages formed partially into the first plate; a plurality of horizontal passages disposed in the first plate, each of the plurality of horizontal passages beginning proximate a perimeter of the first plate and terminating proximate one of the plurality of vertical passages such that the horizontal passages and the vertical passages are in fluid communication; a second plate coupled to the first plate at an interface; an elongate shaft having a vacuum line and an edge purge line internal to the shaft; a vacuum channel formed at the interface fluidly coupling the vacuum line to the plurality of vacuum passages; and an edge purge channel formed at the interface fluidly coupling the edge purge line to the plurality of vertical passages.
    Type: Grant
    Filed: March 6, 2013
    Date of Patent: April 25, 2017
    Inventors: Olkan Cuvalci, Gwo-Chuan Tzu
  • Patent number: 9472443
    Abstract: Embodiments of a process kit for substrate process chambers are provided herein. In some embodiments, a process kit for a substrate process chamber may include a ring having a body and a lip extending radially inward from the body, wherein the body has a first annular channel formed in a bottom of the body; an annular conductive shield having a lower inwardly extending ledge that terminates in an upwardly extending portion configured to interface with the first annular channel of the ring; and a conductive member electrically coupling the ring to the conductive shield when the ring is disposed on the conductive shield.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: October 18, 2016
    Inventors: Muhammad M. Rasheed, Kirankumar Savandaiah, William Johanson, Zhenbin Ge, Goichi Yoshidome
  • Patent number: 9457373
    Abstract: A unit mask is extended in a direction and is supported by a frame including an opening. The unit mask includes a first fixed part located in the opening and fixed to one surface of the frame disposed in the direction, a second fixed part spaced apart from the first fixed part and fixed to another surface of the frame disposed in the direction, and a mask part held by the first fixed part and the second fixed part between the first fixed part and the second fixed part.
    Type: Grant
    Filed: November 18, 2013
    Date of Patent: October 4, 2016
    Assignee: Samsung Display Co., Ltd.
    Inventor: Sang-Shin Lee
  • Patent number: 9386678
    Abstract: The plasma generator has the dielectric having the inner circumferential surface, and a pair of electrodes which are arranged separated from each other in the direction along the inner circumferential surface and are isolated from each other by the dielectric and which are capable of generating plasma on the inner circumferential surface by application of voltage. In the inner circumferential surface, at the positions between the pair of electrodes in a plan view, recessed portions causing electric field concentration are formed.
    Type: Grant
    Filed: June 15, 2012
    Date of Patent: July 5, 2016
    Assignee: KYOCERA Corporation
    Inventors: Takashige Yagi, Hiroshi Makino, Tetsuya Tojo, Takahito Hirata
  • Patent number: 9303317
    Abstract: A deposition apparatus includes a deposition source unit that has a crucible heating a deposition material filled therein to vaporize the deposition material and a plurality of nozzles spraying the vaporized deposition material, a substrate disposed to face the nozzles, a blind plate disposed between the deposition source unit and the substrate and including a plurality of first openings to guide a traveling direction of the deposition material sprayed from the nozzles, a mask disposed between the substrate and the blind plate and including a plurality of second openings to provide a path through which the deposition material passing through the first openings of the blind plate is deposited on the substrate, and a heater unit that heats the blind plate at a predetermined temperature to vaporize the deposition material stacked up on the blind plate.
    Type: Grant
    Filed: February 15, 2013
    Date of Patent: April 5, 2016
    Assignee: Samsung Display Co., Ltd.
    Inventor: Heung-Cheol Jeong
  • Patent number: 9290842
    Abstract: The present invention provides an evaporation device for which maintenance is readily conducted, and further, provides an electrode cover which can prevent an evaporation material from being adhered to electrodes. Moreover, the present invention provides an evaporation device including an evaporation chamber; a holding portion for holding an object to be treated; an evaporation source; an electrode; an electrode cover; and a power supply, in which the evaporation chamber includes the holding portion in an upper portion, and includes the evaporation source, the electrode, and the electrode cover in a lower portion; the electrode cover covers at least a part of an exposed surface of the electrode; the electrode and the power supply are electrically connected.
    Type: Grant
    Filed: November 12, 2013
    Date of Patent: March 22, 2016
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Nobuharu Ohsawa, Ryoji Nomura, Masahiro Takahashi
  • Patent number: 9273390
    Abstract: An apparatus and method for coating an organic film are disclosed. The apparatus comprises an evaporation device, an electron emission device and a spray device; wherein the evaporation device comprises an evaporation container, the evaporation container is a linear evaporation container, in which a uniform organic gas is generated; the electron emission device is horizontally arranged over the evaporation container such that the organic gas evaporated in the evaporation container is uniformly charged and becomes charged organic gas; the spray device is provided with an electric field, under which the charged organic gas is moved toward a substrate so as to deposit the organic film on the substrate.
    Type: Grant
    Filed: May 11, 2015
    Date of Patent: March 1, 2016
    Assignee: BOE TECHNOLOGY GROUP CO., Ltd.
    Inventors: Wulin Shen, Chunsheng Jiang, Qing Dai, Haijing Chen, Guangcai Yuan, Jingang Fang
  • Patent number: 9228275
    Abstract: An apparatus with two-chamber structure for growing silicon carbide (SiC) crystals is disclosed. The apparatus comprises a sample feed chamber and a crystal growth chamber, both of which are separately connected with each other by a vacuum baffle valve and connected with a vacuum system. The crystal growth apparatus ensures that the insulation materials in the crystal growth chamber cannot contact with air, minimizes the adsorption of nitrogen and pollutants on the insulation materials and the growth chamber, improves purity of SiC crystals and achieves precise control of the impurities so that growth of high-quality SiC crystals such as conductive, doped semi-insulating or high-purity semi-insulating SiC crystals and the like is enabled.
    Type: Grant
    Filed: June 22, 2010
    Date of Patent: January 5, 2016
    Inventors: Zhizhan Chen, Erwei Shi, Chengfeng Yan, Bing Xiao
  • Patent number: 9171702
    Abstract: A consumable isolation ring of a movable substrate support assembly is described. The consumable isolation ring is configured to be supported on a step of a movable ground ring fit around a fixed ground ring. The consumable isolation ring is configured to electrically isolate the movable ground ring from a dielectric ring of the movable substrate support assembly.
    Type: Grant
    Filed: June 30, 2010
    Date of Patent: October 27, 2015
    Assignee: Lam Research Corporation
    Inventors: Michael C. Kellogg, Alexei Marakhtanov, Rajinder Dhindsa
  • Patent number: 9105849
    Abstract: A deposition mask assembly having a plurality of deposition masks consecutively arranged in parallel is discussed. The deposition mask has a frame coupled with the plurality of deposition masks, wherein cross section of one end of each deposition mask having first and second sectors which are asymmetric and meet each other at a first contact point, wherein the first sector has a first radius and a first center angle, and connected to an upper surface of the deposition mask, the second sector has a second radius different from the first radius and a second center angle different from the first center angle, and connected to a lower surface of the deposition mask, and the contact point is asymmetric, pointed and protruded horn-shaped or arrow-shaped.
    Type: Grant
    Filed: June 4, 2014
    Date of Patent: August 11, 2015
    Assignee: LG DISPLAY CO., LTD.
    Inventors: Chong-Hyun Park, Tae-Hyung Kim, Il-Hyun Lee
  • Patent number: 9055653
    Abstract: A deposition apparatus 50 forms a thin film 3 in a predetermined pattern on a substrate 10 for an organic EL display. A first correction plate 81 and a second correction plate 82 are placed between a shadow mask 60 and a deposition source 53 that emits deposition particles. Each of the correction plates 81, 82 has a plurality of blade plates 83 and a frame 84 that supports the plurality of blade plates 83. The blade plates 83 are placed so as to be tilted with respect to the shadow mask 60, and to extend parallel to each other with an opening 86 between adjoining ones of the blade plates 83 as viewed in a direction perpendicular the deposition mask 60.
    Type: Grant
    Filed: February 10, 2011
    Date of Patent: June 9, 2015
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Tohru Sonoda, Nobuhiro Hayashi, Shinichi Kawato, Satoshi Inoue
  • Publication number: 20150144061
    Abstract: Combinatorial plasma enhanced deposition techniques are described, including designating multiple regions of a substrate, providing a precursor to at least a first region of the multiple regions, and providing a plasma to the first region to deposit a first material on the first region formed using the first precursor, wherein the first material is different from a second material formed on a second region of the substrate.
    Type: Application
    Filed: February 4, 2015
    Publication date: May 28, 2015
    Inventors: Sunil Shanker, Tony P. Chiang
  • Publication number: 20150140832
    Abstract: Sources, devices, and techniques for deposition of organic layers, such as for use in an OLED, are provided. A vaporizer may vaporize a material between cooled side walls and toward a mask having an adjustable mask opening. The mask opening may be adjusted to control the pattern of deposition of the material on a substrate, such as to correct for material buildup that occurs during deposition. Material may be collected from the cooled side walls for reuse.
    Type: Application
    Filed: November 15, 2013
    Publication date: May 21, 2015
    Applicant: Universal Display Corporation
    Inventors: William E. Quinn, Siddharth Harikrishna Mohan, Gregory McGraw
  • Patent number: 9021983
    Abstract: According to one embodiment, a stage apparatus includes a height control unit includes height control elements each which is drove in an upward/downward direction independently, a measuring unit which divides an upper surface of the substrate into areas, and measures a height of each of the areas. The control unit is configured to set the height of each of the areas independently by controlling a height of each of the height control elements based on a data value, determine using the measuring unit whether the height of each of the areas in the upper surface of the substrate is in a allowable range, and set the height of the area out of the allowable range again by the height control elements.
    Type: Grant
    Filed: March 23, 2012
    Date of Patent: May 5, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Ryoichi Inanami, Shinichi Ito, Hiroshi Koizumi, Akihiro Kojima
  • Patent number: 9016234
    Abstract: A mask holding device has a replaceable magnetic means, and a deposition apparatus for an organic light emitting device includes the mask holding device. The mask holding device is provided with magnets, and the magnets can be replaced as required so as to change the magnetic force of the mask holding device.
    Type: Grant
    Filed: September 19, 2011
    Date of Patent: April 28, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventor: Jung-Woo Ko
  • Patent number: 9011601
    Abstract: A substrate processing apparatus capable of forming an oxide film on a substrate by forming a layer on the substrate by supplying a source gas into a process vessel accommodating the substrate via the first nozzle, and simultaneously supplying an oxygen-containing gas through a second nozzle and a hydrogen-containing gas through a first nozzle into the process vessel having an inside pressure thereof lower than atmospheric pressure; mixing and reacting the oxygen-containing gas with the hydrogen-containing gas in a non-plasma atmosphere within the process vessel to generate atomic oxygen; and oxidizing the layer with the atomic oxygen to change the layer into an oxide layer is disclosed.
    Type: Grant
    Filed: July 11, 2014
    Date of Patent: April 21, 2015
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Naonori Akae, Yoshiro Hirose, Yushin Takasawa, Yosuke Ota
  • Patent number: 9005365
    Abstract: In one embodiment the disclosure relates to an apparatus for depositing an organic material on a substrate, including a source heater for heating organic particles to form suspended organic particles; a transport stream for delivering the suspended organic particles to a discharge nozzle, the discharge nozzle having a plurality of micro-pores, the micro-pores providing a conduit for passage of the suspended organic particles; and a nozzle heater for pulsatingly heating the micro-pores nozzle to discharge the suspended organic particles from the discharge nozzle.
    Type: Grant
    Filed: January 26, 2012
    Date of Patent: April 14, 2015
    Assignee: Massachusetts Institute of Technology
    Inventors: Vladimir Bulovic, Marc A. Baldo, Martin A. Schmidt, Valerie Gassend, Jianglong Chen
  • Publication number: 20150096488
    Abstract: The present disclosure generally relates to systems and methods for growing and preferentially volumetrically enhancing group III-V nitride crystals. In particular the systems and methods include diffusing constituent species of the crystals through a porous body composed of the constituent species, where the species freely nucleate to grow large nitride crystals. The systems and methods further include using thermal gradients and/or chemical driving agents to enhance or limit crystal growth in one or more planes.
    Type: Application
    Filed: October 8, 2014
    Publication date: April 9, 2015
    Inventors: Peng Lu, Jason Schmitt
  • Publication number: 20150086716
    Abstract: An apparatus for depositing a layer of material at different thicknesses on a substrate using atomic layer deposition (ALD) to form patterns that exhibit different colors. The patterns may be formed using a printer head that moves in a two-dimensional plane over the substrate along a path while injecting the precursor gases onto the substrate. Patterns are formed on the substrate along the path along which the printer head moves. The refraction of light incident on the layer of material on the substrate causes the deposited material to exhibit different colors.
    Type: Application
    Filed: September 23, 2014
    Publication date: March 26, 2015
    Inventors: Samuel S. Park, Hyo-Seok Yang, Sang In Lee
  • Patent number: 8980001
    Abstract: A susceptor having a recessed portion and a ring-like step portion is arranged in a reaction chamber, and a plurality of through bores are formed in a bottom wall in the recessed portion excluding the step portion. A lift pin inserted in each of the through bores temporarily holds a wafer, then a lower surface of an outer peripheral portion of the wafer is mounted on the step portion to accommodate the wafer in the recessed portion, and a raw material gas is circulated in the reaction chamber to form an epitaxial layer on a wafer surface in the recessed portion. When forming the epitaxial layer on the wafer surface, the lift pin protrudes upwards from an upper surface of the bottom wall, and a height h of a top portion of the lift pin based on the upper surface of the bottom wall as a reference is set to the range from a position where the height h exceeds 0 mm to a position immediately before the lift pin comes into contact with the wafer.
    Type: Grant
    Filed: July 24, 2009
    Date of Patent: March 17, 2015
    Assignee: Sumco Corporation
    Inventors: Masaya Sakurai, Masayuki Ishibashi
  • Patent number: 8973526
    Abstract: A plasma deposition apparatus includes a cathode assembly including a cathode disk and a water-coolable cathode holder supporting the cathode disk, an anode assembly including a water-coolable anode holder, a substrate mounted on the anode holder to serve as an anode, and a substrate holder mounting and supporting the substrate, and a reactor for applying a potential difference between opposing surfaces of the cathode assembly and the anode assembly under a vacuum state to form plasma of a raw gas. The cathode disk comes into thermal contact with the cathode holder using at least one of a self weight and a vacuum absorption force so as to permit thermal expansion of the cathode disk.
    Type: Grant
    Filed: December 10, 2007
    Date of Patent: March 10, 2015
    Assignee: Korea Institute of Science and Technology
    Inventors: Wook Seong Lee, Young Joon BaiK, Jong-Keuk Park, Gyu Weon Hwang, Jeung-hyun Jeong
  • Publication number: 20150059974
    Abstract: Embodiments of the invention may generally provide a method and apparatus that is used to prepare new and used substrate support assemblies for use in typical semiconductor processing environments. Embodiments of the present invention generally relate to a method of coating a new substrate support assembly or a used substrate support assembly that is being refurbished. The deposited coating may include a surface enhancement and/or protective material that is configured to protect one or more of the components exposed to the processing environment during a semiconductor process. The substrate support assembly may be coated with a protective material and during the coating process, the substrate support assembly is maintained at a temperature that is less than or equal to 150° C. by flowing a coolant through channels formed in a base of the substrate support assembly.
    Type: Application
    Filed: October 21, 2013
    Publication date: March 5, 2015
    Inventors: Wendell Glen BOYD, JR., Vijay D. PARKHE, Sehn THACH
  • Patent number: 8969114
    Abstract: A method of manufacturing an organic light emitting display apparatus, the method includes loading a substrate on a moving unit, determining an angle formed between a side of the substrate and an opening in a patterning slit sheet, rotating the patterning slit sheet by two X motors so that the side of the substrate and the opening in a patterning slit sheet extend along the same direction and forming a layer on the substrate while conveying the substrate on the moving unit in the first direction in a chamber. The patterning slit sheet moves along a direction perpendicular to the first direction during the forming the layer on the substrate so that a deposition layer having a linear pattern that extends along the first direction is formed on the substrate.
    Type: Grant
    Filed: September 27, 2013
    Date of Patent: March 3, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventor: Joo-Nyung Jang
  • Patent number: 8968477
    Abstract: A deposition mask for manufacturing an organic light emitting display (OLED) using the same are provided. The deposition mask is intended for preventing an organic film from being damaged due to touching of a blocked-off portion of the mask to an emission layer (EML), or chemical transition from being generated at the organic film. For that purpose, the deposition mask stuck to a substrate of the OLED to deposit an organic EML includes an opening and an indentation. The opening is opened so as to deposit the organic EML. The indentation is indented a predetermined depth from a plane facing the substrate.
    Type: Grant
    Filed: October 7, 2009
    Date of Patent: March 3, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventors: Chang-Ho Kang, Tae-Seung Kim, Jae-Min Hong
  • Patent number: 8961688
    Abstract: Disclosed are a method and a device for plasma treating workpieces (5). Said workpiece is inserted into a chamber (7) of a treatment station (3), which can be at least partly evacuated, and is positioned within the treatment station by means of a holding element. In order to simultaneously supply at least two chambers with at least one operating means, a flow of the operating means is branched at least once so as to form at least two partial flows (55).
    Type: Grant
    Filed: May 9, 2003
    Date of Patent: February 24, 2015
    Assignee: KHS Corpoplast GmbH
    Inventors: Michael Lizenberg, Frank Lewin, Hartwig Müller, Klaus Vogel, Gregor Arnold, Stephan Behle, Andreas Lüttringhaus-Henkel, Matthias Bicker, Jürgen Klein, Marten Walther
  • Patent number: 8961690
    Abstract: A process of coating at least one substrate with a plurality of deposition sources, a method of tooling, a carrier unit and a deposition system are described. The systems and methods provide for or allow for exposing a first substrate portion 112a of said at least one substrate 112 to a first deposition source 118a through an aperture 122 of a carrier unit 110, 510, depositing a first layer 126a over the first substrate portion, said first layer including material from said first deposition source, varying a relative position between said at least one substrate and said aperture for exposing a second substrate portion of said at least one substrate, or another substrate, to a second deposition source, and depositing a second layer 126b over the second substrate portion 112b, said second layer including material from said second deposition source.
    Type: Grant
    Filed: May 10, 2011
    Date of Patent: February 24, 2015
    Assignee: Applied Materials GmbH & Co. KG
    Inventors: Uwe Hoffmann, Jose Manuel Dieguez-Campo
  • Publication number: 20150047564
    Abstract: A chemical vapor deposition device includes a support member configured to support a lower surface of a substrate; a shadow frame configured to cover an edge portion of an upper surface of the substrate; and a jacket having a purge gas supply opening configured to supply a purge gas such that the purge gas exits the purge gas supply opening from a location below the lower surface of the substrate. The jacket is adjacent to a portion of the shadow frame and configured to cover a portion of the lower surface of the substrate. An exhaust unit is located at the jacket or is between the jacket and the shadow frame.
    Type: Application
    Filed: August 15, 2013
    Publication date: February 19, 2015
    Applicant: Samsung SDI Co., Ltd.
    Inventor: Woo-Jin Kim
  • Publication number: 20150047563
    Abstract: Systems and methods are provided for material processing. An example apparatus includes a process-kit component containing a first groove and a second groove. The first groove and the second groove are disposed to form a pattern on a surface of the process-kit component. The process-kit component is configured to be placed into a chamber to reduce material deposition on one or more parts of the chamber during material processing.
    Type: Application
    Filed: August 16, 2013
    Publication date: February 19, 2015
    Applicant: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: CHEN-FANG CHUNG, Chih-Tsang Tseng, Hsiao-Chuan Lee, KUO-PIN CHUANG, Shuen-Liang Tseng
  • Publication number: 20150017753
    Abstract: The example embodiments provide a thin film deposition apparatus for deposition of an organic material having a low volatility characteristic, and a method for manufacturing an OLED display using the same. A thin film deposition apparatus includes a crucible assembly evaporating an organic material toward a substrate, and a pattern mask provided in one side of the substrate facing the crucible assembly. The crucible assembly includes a crucible coupled with the heater and containing an organic material therein, and a guide pipe coupled to an entrance of the crucible and forming an inner space extended in one direction toward the substrate from the entrance of the crucible.
    Type: Application
    Filed: February 3, 2014
    Publication date: January 15, 2015
    Applicant: Samsung Display Co., Ltd.
    Inventors: Sung-Soo Bae, Jae-Yong Lee
  • Publication number: 20150017759
    Abstract: A method for producing a multiple-surface imposition vapor deposition mask enhances definition and reduces weight even when a size is increased. Each of multiple masks in an open space in a frame is configured by a metal mask having a slit, and a resin mask that is positioned on a front surface of the metal mask and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows. In formation of the plurality of masks, after each of the metal masks and a resin film material for producing the resin mask are attached to the frame, the resin film material is processed, and the openings corresponding to the pattern to be produced by vapor deposition are formed in a plurality of rows lengthwise and crosswise, whereby the multiple-surface imposition vapor deposition mask of the above described configuration is produced.
    Type: Application
    Filed: January 11, 2013
    Publication date: January 15, 2015
    Inventors: Yoshinori Hirobe, Yutaka Matsumoto, Masato Ushikusa, Toshihiko Takeda, Katsunari Obata, Hiroyuki Nishimura
  • Patent number: 8932896
    Abstract: The solar cell manufacturing apparatus includes: a load lock chamber configured to allow loading and unloading of a substrate by switching between atmospheric ambient and vacuum ambient; a processing chamber where the substrate for a solar cell is to be doped with impurity ions for pn junction formation in the vacuum ambient; and a conveyance chamber including a conveyance unit configured to convey the substrate between the load lock chamber and the processing chamber. The doping of impurity ions is performed by irradiation with the impurity ions from an ion gun, and the ion gun is provided with a grid plate, as its ion irradiation surface, facing the substrate conveyed to the processing chamber.
    Type: Grant
    Filed: June 8, 2011
    Date of Patent: January 13, 2015
    Assignee: Ulvac, Inc.
    Inventor: Genji Sakata
  • Patent number: 8925480
    Abstract: A mask stick including a main body part having a pattern formed therein, one or more side clamping parts extending from a side of the main body part, and a slant clamping part disposed adjacent an outermost one of the one or more side clamping parts, wherein an angle (?) between the slant clamping part and the outermost side clamping parts is greater than 0° and less than 90° (0°<?<90°).
    Type: Grant
    Filed: November 23, 2011
    Date of Patent: January 6, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventor: Yong-Hwan Kim
  • Patent number: 8926756
    Abstract: A passing apparatus includes: upper and lower sealing rolls dealing with variations in a thickness of a proceeding strip, the upper and lower sealing rolls allowing the strip to pass; and a strip sealing unit dealing with variations in a width of the proceeding strip, the strip sealing unit cooperating with the upper and lower sealing rolls to seal the proceeding strip passing through a chamber in a state in which the strip sealing unit surrounds the proceeding strip.
    Type: Grant
    Filed: December 24, 2010
    Date of Patent: January 6, 2015
    Assignee: Posco
    Inventors: Dong-Yoeul Lee, Mun-Jong Eom, Kyoung-Bo Kim, Yong-Hwa Jung, Woo-Sung Jung, Young-Jin Kwak, Tae-Yeob Kim, Kyung-Hoon Nam, Sang-Cheol Lee, Sang-Hoon Park, Yang-Woo Nam
  • Publication number: 20150004312
    Abstract: An deposition apparatus for forming a deposition material layer on a substrate is described. The deposition apparatus includes a substrate support adapted for holding a substrate; and an edge (660) exclusion mask (640) for covering a periphery of the substrate (610) during layer deposition. The mask has at least one frame portion defining an aperture. The at least one frame portion of the mask is adapted for being moved (670,680) with respect to the substrate depending on the amount of deposition material deposited on the at least one frame portion of the mask. Further, a method for depositing a deposition material layer on a substrate using an edge exclusion mask is described.
    Type: Application
    Filed: August 9, 2011
    Publication date: January 1, 2015
    Inventors: Evelyn Scheer, Markus Hanika, Ralph Lindenberg, Marcus Bender, Andreas Lopp, Konrad Schwanitz, Fabio Pieralisi, Jian Liu
  • Patent number: 8920562
    Abstract: An object is to improve use efficiency of an evaporation material, to reduce manufacturing cost of a light-emitting device, and to reduce manufacturing time needed for a light-emitting device including a layer containing an organic compound. The pressure of a film formation chamber is reduced, a plate is rapidly heated by heat conduction or heat radiation by using a heat source, a material layer on a plate is vaporized in a short time to be evaporated to a substrate on which the material layer is to be formed (formation substrate), and then the material layer is formed on the formation substrate. The area of the plate that is heated rapidly is set to have the same size as the formation substrate and film formation on the formation substrate is completed by one application of heat.
    Type: Grant
    Filed: November 16, 2012
    Date of Patent: December 30, 2014
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Hisao Ikeda, Tomoya Aoyama, Takahiro Ibe, Yoshiharu Hirakata, Shunpei Yamazaki
  • Patent number: 8916032
    Abstract: The present invention discloses an improved method of LED reflector manufacturing process where the method includes providing a substrate, wherein said substrate comprises a reflector unit, and a Light Emitting Diode; providing a shield member with ferromagnetic property; placing said shield member over the desired area of over the substrate; providing a magnet where said shield member is attracted to; placing said magnet immediately below the substrate wherein said magnet is capable of immobilizing the shield member over the substrate; performing a vacuum deposition coating; and removing the magnet and the shield member.
    Type: Grant
    Filed: March 25, 2008
    Date of Patent: December 23, 2014
    Inventors: Roger Wen Yi Hsu, Shu-Yu Hsu, Shu-His Hsu
  • Patent number: 8915213
    Abstract: In a division mask and a method of assembling a mask frame assembly by using the same, the division mask includes a stick body on which deposition patterns are formed, and a clamping portion which extends from the stick body outward along a longitudinal direction of the stick body, the clamping portion increasing in width from the stick body. By using this structure, since tight tension is exerted on the division mask during the assembly of a mask frame assembly due to an extension portion of the clamping portion, creases are prevented from being formed on the division mask, thus obtaining a precise mask frame assembly.
    Type: Grant
    Filed: September 20, 2011
    Date of Patent: December 23, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventor: Kook-Chul Park
  • Patent number: 8915212
    Abstract: A mask frame assembly includes an air tunnel between a frame and a mask so as to allow flow of air. Therefore, evaporation of cleaning liquid can be facilitated in gaps between the frame and the mask during cleaning and drying processes performed so as to reuse the mask frame assembly sooner. Thus, the amount of remaining cleaning liquid can be reduced so as to reduce the time necessary for preparation of a subsequent process using the mask frame assembly.
    Type: Grant
    Filed: September 16, 2011
    Date of Patent: December 23, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventor: Sang-Shin Lee