Substrate Contacting Mask Patents (Class 118/721)
  • Patent number: 10799993
    Abstract: A vapor deposition apparatus disclosed in an embodiment is configured to allow an electromagnet (3) to attract a vapor deposition mask, and comprises a control circuit (7) connected between the electromagnet (3) and a power supply circuit (6) for driving the electromagnet (3). The control circuit gradually changes a magnetic field to be generated by the electromagnet (3) when a current is applied to the electromagnet (3). As a result, the change in current to flow in an electromagnetic coil (32) of the electromagnet (3) becomes gradual and an effect of electromagnetic induction is reduced, thereby suppressing the defect of elements formed on a substrate for vapor deposition or the deterioration in property of the element.
    Type: Grant
    Filed: May 10, 2019
    Date of Patent: October 13, 2020
    Assignee: Sakai Display Products Corporation
    Inventors: Katsuhiko Kishimoto, Koshi Nishida
  • Patent number: 10644240
    Abstract: A deposition mask extending in a first direction may include: a pattern portion including a plurality of pattern holes; and a clamping portion including a protrusion portion to be attached to the clamp and an indentation portion formed in a direction toward the pattern portion, wherein the pattern portion may include a blocking portion that at least partially overlaps the protrusion portion in the first direction and has an area gradually decreasing in a second direction from the protrusion portion toward the indentation portion, the second direction crossing the first direction.
    Type: Grant
    Filed: November 26, 2018
    Date of Patent: May 5, 2020
    Assignee: Samsung Display Co., Ltd.
    Inventor: Sanghoon Kim
  • Patent number: 10597768
    Abstract: There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a vapor deposition mask preparation body capable of simply producing the vapor deposition mask and a method for producing a vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition. A metal mask 10 in which a slit 15 is provided and a resin mask 20 in which openings 25 corresponding to a pattern to be produced by vapor deposition are provided at a position of overlapping with the slit 15 are stacked, and the metal mask 10 has a general region 10a in which the slit 15 is provided and a thick region 10b larger in thickness than the general region.
    Type: Grant
    Filed: November 14, 2018
    Date of Patent: March 24, 2020
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Katsunari Obata, Toshihiko Takeda, Hiroshi Kawasaki, Hiroyuki Nishimura, Atsushi Maki, Hiromitsu Ochiai, Yoshinori Hirobe
  • Patent number: 10580683
    Abstract: A vapor deposition apparatus comprises a vacuum chamber, at least two movable holders and an alignment system. A pedestal, a backboard supported on the pedestal and a metal mask located above the backboard are disposed inside the vacuum chamber, wherein an anti-plasma coated layer is provided on the metal mask; each of the movable holders is configured to clamp an end of the metal mask on which a pulling force can be applied; and the alignment system is configured to drive the movable holders to move in at least one direction of a first direction and a second direction that are perpendicular to each other within a plane in parallel to the backboard and a third direction perpendicular to the plane to perform at least one of applying a pulling force on the metal mask and attaching the metal mask onto a preset location of the backboard.
    Type: Grant
    Filed: May 19, 2016
    Date of Patent: March 3, 2020
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventor: Zhiwei Su
  • Patent number: 10510511
    Abstract: Provided is an apparatus for treating a substrate which is capable of uniformly controlling a temperature of a support plate. The apparatus for treating the substrate includes a chamber having a treating space with an opened top surface, a support unit disposed within the chamber to support the substrate, a dielectric assembly disposed on the opened top surface of the chamber to cover the opened top surface, and a plasma source disposed above the dielectric assembly, the plasma source including an antenna generating plasma from a gas supplied into the chamber. The dielectric assembly includes a dielectric window, and heating units each of which is formed of a non-metallic material, the heating units being disposed on a top surface of the dielectric window to heat the dielectric window.
    Type: Grant
    Filed: October 30, 2014
    Date of Patent: December 17, 2019
    Assignee: SEMES CO., LTD.
    Inventors: Hyung Joon Kim, Seung Kue Kim
  • Patent number: 10453735
    Abstract: A substrate processing apparatus includes: a reaction tube including inner and outer tubes installed to surround the inner tube; a substrate holder for holding substrates in a vertical direction; gas nozzles installed in a gap between the outer and inner tubes and having supply holes from which a gas is supplied toward an inlet port of the inner tube; a gas supply system for feeding gases to the reaction tube though the gas nozzles; an outlet port formed in the inner tube to flow out the gas; a discharge port for discharging the gas; a discharge part for discharging the gas staying in the gap from the discharge port; and a controller for controlling the gas supply system to supply a precursor gas and an inert gas and for causing the discharge part to purge the gas staying in the gap with the inert gas.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: October 22, 2019
    Assignee: Kokusai Electric Corporation
    Inventors: Yusaku Okajima, Hidenari Yoshida, Shuhei Saido, Takafumi Sasaki
  • Patent number: 10335909
    Abstract: A vapor deposition apparatus disclosed in an embodiment is configured to allow an electromagnet (3) to attract a vapor deposition mask, and comprises a control circuit (7) connected between the electromagnet (3) and a power supply circuit (6) for driving the electromagnet (3). The control circuit gradually changes a magnetic field to be generated by the electromagnet (3) when a current is applied to the electromagnet (3). As a result, the change in current to flow in an electromagnetic coil (32) of the electromagnet (3) becomes gradual and an effect of electromagnetic induction is reduced, thereby suppressing the defect of elements formed on a substrate for vapor deposition or the deterioration in property of the element.
    Type: Grant
    Filed: April 4, 2017
    Date of Patent: July 2, 2019
    Assignee: Sakai Display Products Corporation
    Inventors: Katsuhiko Kishimoto, Koshi Nishida
  • Patent number: 10317792
    Abstract: A mask plate includes an outer frame and a plurality of sub-mask plates, the outer frame includes a first side, a second side, a third side and a fourth side. The third side and the fourth side are parallel to each other and extended along a first direction, the first side and the second side are spaced apart from each other parallelly and extended along a second direction. Two opposite ends of the third side are connected to one end of the first side and one end of the second side, and two opposite ends of the fourth side are connected to another end of the first side and another end of the second side. The sub-mask plates selectively shield the luminescent material when preparing pixels, and extend along the first direction and arrange along the second direction and do reciprocating motion along the first direction or the second direction.
    Type: Grant
    Filed: August 11, 2017
    Date of Patent: June 11, 2019
    Assignee: Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
    Inventors: Long Pei, Chunlai Song
  • Patent number: 10271416
    Abstract: A plasma processing apparatus may include a process chamber having an interior processing volume, first, second and third RF coils disposed proximate the process chamber to couple RF energy into the processing volume, wherein the second RF coil disposed coaxially with respect to the first RF coil, and wherein the third RF coil disposed coaxially with respect to the first and second RF coils, at least one ferrite shield disposed proximate to at least one of the first, second or third RF coils, wherein the ferrite shield is configured to locally guide a magnetic field produced by an RF current flow through the first, second or third RF coils toward the process chamber, wherein the plasma processing apparatus is configured to control a phase of each RF current flow through each of the of the first, second or third RF coils.
    Type: Grant
    Filed: October 22, 2012
    Date of Patent: April 23, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Samer Banna, Waheb Bishara, Ryan Giar, Valentin Todorow, Dmitry Lubomirsky, Kyle R. Tantiwong
  • Patent number: 10236475
    Abstract: A mask frame assembly including a frame, a mask coupled to the frame and including a pattern region for deposition, and a partitioning stick coupled to the frame and configured to partition the pattern region of the mask into unit cell patterns. The partitioning stick includes a pair of opposing fixing ends fixed to sides of the frame, and a narrow width portion connecting the pair of fixing ends and including a first partitioning portion and a second partitioning portion respectively recessed inwards from both edges of the fixing ends in a width direction to maintain rigidity balance between the first and second partitioning portions.
    Type: Grant
    Filed: June 7, 2017
    Date of Patent: March 19, 2019
    Assignee: Samsung Display Co., Ltd
    Inventor: Sanghoon Kim
  • Patent number: 10156505
    Abstract: The present invention discloses an analysis method of a tensioning process of a fine mask plate. The analysis method, based on the simulation function of ANSYS software, finds an appropriate tensile force for stretching a fine mask plate and a corresponding actual counterforce applied to a metal frame before each fine mask plate is welded onto the metal frame through establishing a finite element model of the fine mask plate and a finite element model of the metal frame. The analysis process requires no physical tests, thereby effectively avoiding damaging the fine mask plate and further effectively saving the test cost.
    Type: Grant
    Filed: January 16, 2015
    Date of Patent: December 18, 2018
    Assignees: BOE Technology Group Co., Ltd., Ordos Yuansheng Optoelectronics Co., Ltd.
    Inventors: Fengli Ji, Minghua Xuan, Shanshan Bai, Jiantao Liu, Jingbo Xu
  • Patent number: 10147880
    Abstract: A mask for thin film deposition used in forming an organic thin film or a conductive layer in an organic light emitting device is disclosed. In one embodiment, the mask includes i) a base member, ii) a plurality of slits configured to penetrate through the base member, wherein the plurality of slits have a predetermined length and extend in a first direction, wherein the plurality of slits comprise an outermost slit positioned in an outermost in a second direction having a predetermined angle with respect to the first direction, and wherein the outermost slit comprises two sub-slits separated from each other and iii) a rib supporting part formed between and contacting the two sub-slits, wherein the rib supporting part extends from a rib which is adjacent to the outermost slit.
    Type: Grant
    Filed: September 1, 2016
    Date of Patent: December 4, 2018
    Assignee: Samsung Display Co., Ltd.
    Inventors: Dong-Young Sung, Hong-Ryul Kim
  • Patent number: 9997708
    Abstract: A mask frame assembly includes a frame having an opening, a support bar extended in a first direction crossing the opening of the frame and having distal ends installed over the frame, and a mask having extended in a second direction crossing the first direction, having distal ends installed over the frame, and having a pattern unit extended along the second direction and configured to pass a deposition material. The support bar includes a first opening disposed on one side of the support bar and having a first width in the second direction, and a second opening disposed on the other side of the support bar opposite to the one side of the support bar and having a second width greater than the first width in the second direction.
    Type: Grant
    Filed: January 3, 2017
    Date of Patent: June 12, 2018
    Assignee: Samsung Display Co., Ltd.
    Inventors: Sanghoon Kim, Jongsung Park, Sangshin Lee
  • Patent number: 9953828
    Abstract: A frame and a mask assembly having the same. The frame supports both ends of each unit mask, each unit mask applying a tensile force in a first direction. The frame includes a frame main body part forming an opening exposing the unit mask, and a first through hole formed by passing through the frame main body part.
    Type: Grant
    Filed: June 14, 2013
    Date of Patent: April 24, 2018
    Assignee: Samsung Display Co., Ltd.
    Inventors: Yoon-Chan Oh, Choong-Ho Lee, Da-Hee Jeong
  • Patent number: 9806257
    Abstract: A vapor deposition mask includes a metal mask and a resin mask having an opening. An inner wall surface for composing the opening has an inflection point in a thicknesswise cross section of the resin mask. When an intersection of a first surface, not facing the metal mask, of the resin mask and the inner wall surface is set to be a first intersection, an intersection of a second surface, facing the metal mask, of the resin mask and the inner wall surface is set to be a second intersection, and there is set a first inflection point first positioned from the first intersection toward the second intersection, an angle formed by a line connecting the first intersection and the first inflection point and the first surface is larger than an angle formed by a line connecting the first inflection point and the second intersection and the second surface.
    Type: Grant
    Filed: May 10, 2016
    Date of Patent: October 31, 2017
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Toshihiko Takeda, Katsunari Obata, Hiroshi Kawasaki
  • Patent number: 9705083
    Abstract: In a method for stretching a vapor deposition mask including a metal mask in which a slit is formed and a resin mask in which an opening corresponding to a pattern to be produced by vapor deposition is formed at a position overlapping with the slit, a stretching assistance member is overlapped on one surface of the vapor deposition mask, the stretching assistance member is fixed to the vapor deposition mask in at least part of a portion in which the one surface of the vapor deposition mask and the stretching assistance member overlap with each other, and the vapor deposition mask fixed to the stretching assistance member is stretched by pulling the stretching assistance member fixed to the vapor deposition mask.
    Type: Grant
    Filed: March 30, 2015
    Date of Patent: July 11, 2017
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Katsunari Obata, Hideyuki Okamoto, Yoshiyuki Honma, Toshihiko Takeda
  • Patent number: 9377681
    Abstract: A mask manufacturing apparatus includes a laser irradiator, a stage, a frame, and a heat spreader sheet. The laser irradiator divides a laser beam into a plurality of sub-laser beams and irradiates the sub-laser beams to a shadow mask material which is placed over a stage. The frame is disposed over the stage to support the shadow mask material. The heat spreader sheet makes contact with the shadow mask material, absorbs heat generated from the shadow mask material, and dissipates the heat to surroundings of the shadow mask material. Accordingly, the shadow mask material is protected from overheating.
    Type: Grant
    Filed: September 9, 2013
    Date of Patent: June 28, 2016
    Assignee: Samsung Display Co., Ltd.
    Inventors: Doh-Hyoung Lee, Jun Ho Jo
  • Patent number: 9348237
    Abstract: Mask carriers and mask alignment in vacuum deposition processes, mask handling modules, and methods for aligning a mask. A mask handling module can include a substrate carrier for carrying at least one substrate; a mask carrier for carrying at least two masks. The mask carrier can include at least two mask carrier sections each being adapted to carry a mask and a mask carrier positioning device for moving the mask carrier relative to the substrate carrier. The mask carrier sections are arranged so that the masks carried on the mask carrier sections can be positioned on the mask carrier in respective planes forming an angle with respect to each other so that only one of the at least two masks can be aligned to one of the at least one substrates.
    Type: Grant
    Filed: August 20, 2010
    Date of Patent: May 24, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Michael Heumüller, Heike Landgraf, Michael König
  • Patent number: 9249490
    Abstract: A system to install a mask onto a component of a gas turbine engine includes a drive movable along an axis with respect to a movable base.
    Type: Grant
    Filed: December 6, 2012
    Date of Patent: February 2, 2016
    Assignee: United Technologies Corporation
    Inventors: Frank J. Trzcinski, Chelsea Brown, Kevin Castonguay
  • Patent number: 9074284
    Abstract: Provided is a heat treatment apparatus that can form films having a uniform thickness on a plurality of substrates. The heat treatment apparatus comprises a process chamber configured to grow silicon carbide (SiC) films on wafers, a boat configured to hold a plurality of wafers in a state where the wafers are vertically arranged and approximately horizontally oriented so as to hold the wafers in the process chamber, a heating unit installed in the process chamber, and a gas supply nozzle configured to supply a reaction gas. The heating unit comprises a susceptor configured to cover at least a part of the boat, and a susceptor wall disposed between the boat and the susceptor.
    Type: Grant
    Filed: April 27, 2010
    Date of Patent: July 7, 2015
    Assignee: HITACHI KOKUSAI ELECTRIC, INC.
    Inventors: Masanao Fukuda, Kenji Shirako, Akihiro Sato, Kazuhiro Morimitsu, Sadao Nakashima
  • Publication number: 20150114293
    Abstract: A thin-film depositing apparatus including a mask, and a chucking unit for adhering the mask to a surface of a substrate, wherein the chucking unit includes a plurality of magnet units that contact another surface of the substrate by independently rising or falling by using their weight and thus are magnetically combined with the mask.
    Type: Application
    Filed: March 24, 2014
    Publication date: April 30, 2015
    Applicant: Samsung Display Co., Ltd.
    Inventors: Kyung-Hoon Chung, You-Min Cha
  • Patent number: 9016234
    Abstract: A mask holding device has a replaceable magnetic means, and a deposition apparatus for an organic light emitting device includes the mask holding device. The mask holding device is provided with magnets, and the magnets can be replaced as required so as to change the magnetic force of the mask holding device.
    Type: Grant
    Filed: September 19, 2011
    Date of Patent: April 28, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventor: Jung-Woo Ko
  • Publication number: 20150101536
    Abstract: A mask assembly includes a mask frame including an opening and a frame enclosing the opening, a pattern mask including a pattern part in which at least one pattern is disposed thereon and a coupling part coupled to the frame, a supporter crossing the opening and coupled to the pattern mask, and a fixing pin coupling the pattern mask and the supporter to each other. At least one of the pattern mask and the supporter has a fixing part including a plurality of holes, and the fixing pin is disposed in the fixing part and at least one end of the fixing pin has a “T” shape to fix the pattern mask and the supporter to each other.
    Type: Application
    Filed: July 30, 2014
    Publication date: April 16, 2015
    Inventor: Jeong Won HAN
  • Patent number: 9005365
    Abstract: In one embodiment the disclosure relates to an apparatus for depositing an organic material on a substrate, including a source heater for heating organic particles to form suspended organic particles; a transport stream for delivering the suspended organic particles to a discharge nozzle, the discharge nozzle having a plurality of micro-pores, the micro-pores providing a conduit for passage of the suspended organic particles; and a nozzle heater for pulsatingly heating the micro-pores nozzle to discharge the suspended organic particles from the discharge nozzle.
    Type: Grant
    Filed: January 26, 2012
    Date of Patent: April 14, 2015
    Assignee: Massachusetts Institute of Technology
    Inventors: Vladimir Bulovic, Marc A. Baldo, Martin A. Schmidt, Valerie Gassend, Jianglong Chen
  • Publication number: 20150083045
    Abstract: A mask fixing device is disclosed. In one aspect, the mask fixing device includes a plate and a magnetic assembly. The magnetic assembly faces a mask such that a substrate is interposed therebetween and generates a magnetic force to fix the mask to the substrate. The plate holds the magnetic assembly and faces the substrate. The magnetic assembly includes a plurality of first and second magnetic members respectively having first and second magnetic poles. The first magnetic members and the second magnetic members are alternately arranged.
    Type: Application
    Filed: May 13, 2014
    Publication date: March 26, 2015
    Applicant: Samsung Display Co., Ltd.
    Inventors: Sukbeom YOU, Hyungmin Kim
  • Publication number: 20150056370
    Abstract: A thin film deposition apparatus includes a mask in contact with a first surface of a substrate, a magnet plate above a second surface of the substrate and configured to pull the mask toward the first surface of the substrate, the second surface being an opposite surface to the first surface, and an insulating member between the magnet plate and the second surface of the substrate.
    Type: Application
    Filed: March 17, 2014
    Publication date: February 26, 2015
    Applicant: Samsung Display Co., Ltd.
    Inventor: Jae-Cheol Lee
  • Publication number: 20150047564
    Abstract: A chemical vapor deposition device includes a support member configured to support a lower surface of a substrate; a shadow frame configured to cover an edge portion of an upper surface of the substrate; and a jacket having a purge gas supply opening configured to supply a purge gas such that the purge gas exits the purge gas supply opening from a location below the lower surface of the substrate. The jacket is adjacent to a portion of the shadow frame and configured to cover a portion of the lower surface of the substrate. An exhaust unit is located at the jacket or is between the jacket and the shadow frame.
    Type: Application
    Filed: August 15, 2013
    Publication date: February 19, 2015
    Applicant: Samsung SDI Co., Ltd.
    Inventor: Woo-Jin Kim
  • Patent number: 8925480
    Abstract: A mask stick including a main body part having a pattern formed therein, one or more side clamping parts extending from a side of the main body part, and a slant clamping part disposed adjacent an outermost one of the one or more side clamping parts, wherein an angle (?) between the slant clamping part and the outermost side clamping parts is greater than 0° and less than 90° (0°<?<90°).
    Type: Grant
    Filed: November 23, 2011
    Date of Patent: January 6, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventor: Yong-Hwan Kim
  • Patent number: 8920563
    Abstract: A thin film deposition apparatus that may be easily manufactured, that may be easily applied to manufacture large-sized display devices on a mass scale, and that improves manufacturing yield and deposition efficiency, and a method of manufacturing an organic light-emitting display device by using the thin film deposition apparatus are disclosed. The thin film deposition apparatus for forming a thin film on a substrate, the thin film deposition apparatus including: a magnet disposed on a first surface of the substrate; a patterning wheel disposed on a second surface opposite to the first surface of the substrate, rotatable around a rotation axis, and including a plurality of grooves along a peripheral surface; and a patterning wire including a plurality of blockers having shapes corresponding to the plurality of grooves of the patterning wheel, and windable to the patterning wheel.
    Type: Grant
    Filed: September 6, 2011
    Date of Patent: December 30, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventors: Mu-Gyeom Kim, Chang-Mo Park
  • Patent number: 8915213
    Abstract: In a division mask and a method of assembling a mask frame assembly by using the same, the division mask includes a stick body on which deposition patterns are formed, and a clamping portion which extends from the stick body outward along a longitudinal direction of the stick body, the clamping portion increasing in width from the stick body. By using this structure, since tight tension is exerted on the division mask during the assembly of a mask frame assembly due to an extension portion of the clamping portion, creases are prevented from being formed on the division mask, thus obtaining a precise mask frame assembly.
    Type: Grant
    Filed: September 20, 2011
    Date of Patent: December 23, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventor: Kook-Chul Park
  • Patent number: 8915212
    Abstract: A mask frame assembly includes an air tunnel between a frame and a mask so as to allow flow of air. Therefore, evaporation of cleaning liquid can be facilitated in gaps between the frame and the mask during cleaning and drying processes performed so as to reuse the mask frame assembly sooner. Thus, the amount of remaining cleaning liquid can be reduced so as to reduce the time necessary for preparation of a subsequent process using the mask frame assembly.
    Type: Grant
    Filed: September 16, 2011
    Date of Patent: December 23, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventor: Sang-Shin Lee
  • Patent number: 8916032
    Abstract: The present invention discloses an improved method of LED reflector manufacturing process where the method includes providing a substrate, wherein said substrate comprises a reflector unit, and a Light Emitting Diode; providing a shield member with ferromagnetic property; placing said shield member over the desired area of over the substrate; providing a magnet where said shield member is attracted to; placing said magnet immediately below the substrate wherein said magnet is capable of immobilizing the shield member over the substrate; performing a vacuum deposition coating; and removing the magnet and the shield member.
    Type: Grant
    Filed: March 25, 2008
    Date of Patent: December 23, 2014
    Inventors: Roger Wen Yi Hsu, Shu-Yu Hsu, Shu-His Hsu
  • Publication number: 20140342102
    Abstract: In a system and method of depositing material on a substrate, a shadow mask, including one or more apertures therethrough, in intimate contact with the substrate is provided inside of a chamber or reactor. Material ejected from a solid target material is deposited on one or more portions of the substrate after passage through the one or more apertures of the shadow mask. Desirably, a target-to-substrate distance is within a mean free path length at a specified deposition pressure. Alternatively, an electric field acts on a process gas to create a plasma that includes ionized atoms or molecules of the material that are deposited on one or more portions of the substrate after passage through the one or more apertures of the shadow mask.
    Type: Application
    Filed: May 20, 2014
    Publication date: November 20, 2014
    Applicant: ADVANTECH GLOBAL, LTD
    Inventors: Thomas F. Ambrose, Byron B. Brocato, Jong Guang Pan
  • Publication number: 20140338599
    Abstract: The present invention relates to an evaporator and a thin film deposition system including the same. The evaporator according to an exemplary embodiment of the present invention includes a container including an evaporation space, a heater configured to heat the container, an inflow part configured to spray a liquid raw material into the evaporation space, and a rotor disposed in the evaporation space, the rotor configured to evaporate the liquid raw material.
    Type: Application
    Filed: August 30, 2013
    Publication date: November 20, 2014
    Applicant: Samsung Display Co., Ltd.
    Inventor: Hyun-Seok KIM
  • Publication number: 20140287140
    Abstract: A method of manufacturing a target for the generation of radiation of photons, protons or electrons by means of a laser, including: forming a support including first and second surfaces connected by openings, and forming in an enclosure a layer of material on the first surface by protecting the first surface with a protection element, injecting into the enclosure a gas of filling material, adjusting the pressure in the enclosure and the temperature of the support to form plugs of material in the openings of the support, and maintaining the temperature of the support and the pressure in the enclosure at values to maintain the plugs, followed by withdrawing the protection clement from the first surface, and forming a layer of metallic material on the first surface of the support and on the plugs. The pressure and support temperature are then modified to remove the plugs.
    Type: Application
    Filed: February 24, 2014
    Publication date: September 25, 2014
    Applicant: Commissariat A L'Energie Atomique Et Aux Energies Alternatives
    Inventor: Jean-Paul PERIN
  • Patent number: 8839739
    Abstract: A masking apparatus is provided for masking a workpiece, for example a turbine blade, to protect portions thereof from the deposition of coating material thereon during selective application of a coating material to other portions of the workpiece. The masking apparatus includes an enclosure formed of a first mask half body defining a first cavity half and a second mask half body defining a second cavity half. The first mask half body and the second mask half body mate in assembly to form a workpiece cavity it which the workpiece may be enclosed.
    Type: Grant
    Filed: March 31, 2010
    Date of Patent: September 23, 2014
    Assignee: United Technologies Corporation
    Inventors: Ronald R. Soucy, Anita Rebarchak
  • Publication number: 20140255831
    Abstract: The invention refers to a method and apparatus for protecting a substrate during a processing by at least one particle beam. The method comprises the following steps: (a) applying a locally restrict limited protection layer on the substrate; (b) etching the substrate and/or a layer arranged on the substrate by use of the at least one particle beam and at least one gas; and/or (c) depositing material onto the substrate by use of the at least one particle beam and at least one precursor gas; and (d) removing the locally limited protection layer from the substrate.
    Type: Application
    Filed: March 7, 2014
    Publication date: September 11, 2014
    Inventors: Thorsten Hofmann, Tristan Bret, Petra Spies, Nicole Auth, Michael Budach, Dajana Cujas
  • Publication number: 20140251216
    Abstract: Device for processing a substrate are described herein. An apparatus for controlling deposition on a substrate can include a chamber comprising a shadow frame support, a substrate support comprising a substrate supporting surface, a shadow frame with a shadow frame body including a first support surface, a second support surface opposite the first surface, and a detachable lip connected with the shadow frame body. The detachable lip can include a support connection, a first lip surface facing the substrate, a second lip surface opposite the first lip surface, a first edge positioned over the first support surface, and a second edge opposite the first edge to contact the substrate.
    Type: Application
    Filed: March 7, 2013
    Publication date: September 11, 2014
    Inventors: Qunhua WANG, Soo Young CHOI, Robin L. TINER, John M. WHITE, Gaku FURUTA, Beom Soo PARK
  • Publication number: 20140245956
    Abstract: A masking portion (recessed portion) 20 is provided at the center of a rear surface of a carbonaceous substrate 10. The masking portion 20 includes a first bore portion 20a and a second bore portion 20b. The first bore portion 20a has an inner wall in which a female screw portion 21 is formed. A male screw portion 7a of a masking jig 7 is screw-fitted to the female screw portion 21. The masking jig 7 is fixed to a film forming jig 2. The carbonaceous substrate is thus supported in a standing posture, and the carbonaceous substrate is provided, on a surface, with a firm such as a SiC film or a TaC film except for the recessed portion by introducing gas into the apparatus in this supported state.
    Type: Application
    Filed: October 12, 2012
    Publication date: September 4, 2014
    Applicant: TOYO TANSO CO., LTD.
    Inventors: Masaaki Kita, Takeshi Kubota, Hiroyuki Hirano
  • Patent number: 8815015
    Abstract: An apparatus and method for fabricating an organic light emitting diode display device are provided. The apparatus for fabricating an organic light emitting diode display device includes a chamber, a mask disposed in the chamber to mount a substrate on the upper surface thereof and having a certain pattern of openings, a deposition material source disposed under the mask and supplying a deposition material to the mask through the openings of the mask to form a layer on the substrate, and a holding unit pressing the substrate toward the mask. The holding unit includes a member that is capable of being deformed according to a deformed shape of the substrate such that the mask closely contacts the substrate.
    Type: Grant
    Filed: April 14, 2009
    Date of Patent: August 26, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventor: Ikunori Kobayashi
  • Patent number: 8815013
    Abstract: A system for processing a semiconductor substrate is provided. The system includes a mainframe having a plurality of modules attached thereto. The modules include processing modules, storage modules, and transport mechanisms. The processing modules may include combinatorial processing modules and conventional processing modules, such as surface preparation, thermal treatment, etch and deposition modules. In one embodiment, at least one of the modules stores multiple masks. The multiple masks enable in-situ variation of spatial location and geometry across a sequence of processes and/or multiple layers of a substrate to be processed in another one of the modules. A method for processing a substrate is also provided.
    Type: Grant
    Filed: February 7, 2007
    Date of Patent: August 26, 2014
    Assignee: Intermolecular, Inc.
    Inventors: Tony P Chiang, Richard R Endo, James Tsung
  • Patent number: 8808457
    Abstract: A tool for depositing multilayer coatings onto a substrate. The tool includes a housing defining a vacuum chamber connected to a vacuum source, deposition stations each configured to deposit a layer of multilayer coating on the substrate, a curing station, and a contamination reduction device. At least one of the deposition stations is configured to deposit an inorganic layer, while at least one other deposition station is configured to deposit an organic layer. In one tool configuration, the substrate may travel back and forth through the tool as many times as needed to achieve the desired number of layers of multilayer coating. In another, the tool may include numerous housings adjacently spaced such that the substrate may make a single unidirectional pass. The contamination reduction device may be configured as one or more migration control chambers about at least one of the deposition stations, and further includes cooling devices, such as chillers, to reduce the presence of vaporous layer precursors.
    Type: Grant
    Filed: April 11, 2003
    Date of Patent: August 19, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventors: John Chris Pagano, Kenneth Jeffrey Nelson, Paul E. Burrows, Mark Edward Gross, Mac R. Zumhoff, Peter Maclyn Martin, Charles C. Bonham, Gordon Lee Graff, Lorenza Moro, Xi Chu
  • Patent number: 8802200
    Abstract: A method of cleaning off organic deposition material accumulated on a mask includes forming an organic deposition material pattern on a substrate using the mask, which includes a plurality of slots, in a deposition chamber including a deposition source; transporting the mask to a stock chamber that is maintained at a vacuum and adjacent to the deposition chamber; and partially cleaning off the organic deposition material accumulated along the boundaries of the slots of the mask in the stock chamber. A system to clean off an organic deposition material accumulated on a mask having a plurality of slots, includes a deposition chamber including a deposition source; and a stock chamber that is maintained at substantially the same vacuum as the deposition chamber and includes a cleaning device that cleans off the organic deposition material accumulated on the mask.
    Type: Grant
    Filed: June 8, 2010
    Date of Patent: August 12, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jung-Min Lee, Choong-Ho Lee, Yoon-Chan Oh, Hee-Seong Jeong
  • Patent number: 8795466
    Abstract: Apparatus and methods are provided that enable processing of patterned layers on substrates using a detachable mask. Unlike prior art where the mask is formed directly over the substrate, according to aspects of the invention the mask is made independently of the substrate. During use, the mask is positioned in close proximity or in contact with the substrate so as to expose only portions of the substrate to processing, e.g., sputtering or etch. Once the processing is completed, the mask is moved away from the substrate and may be used for another substrate. The substrate may be cycled for a given number of substrates and then be removed for cleaning or disposal.
    Type: Grant
    Filed: June 30, 2009
    Date of Patent: August 5, 2014
    Assignee: Intevac, Inc.
    Inventors: Michael S. Barnes, Terry Bluck
  • Publication number: 20140209025
    Abstract: A deposition apparatus includes a deposition chamber, a deposition source, and a deposition mask. The deposition source is disposed in the deposition chamber and provides a deposition material to a deposition substrate. The deposition mask includes a body portion and a carbon layer. The carbon layer is disposed on a first surface making contact with the deposition mask and includes at least one of carbon nanotube or graphene.
    Type: Application
    Filed: August 28, 2013
    Publication date: July 31, 2014
    Applicant: Samsung Display Co., Ltd.
    Inventor: Jeongwon HAN
  • Publication number: 20140191201
    Abstract: An apparatus for depositing one or more organic material layers of an OLED lighting device upon a first region of a substrate and one or more conducting layers upon a second region, wherein the conducting layers partially or completely cover and extend beyond one side of the organic layers, comprising: a reusable mask in contact with the substrate, at least one mask open area having an overhang feature; one or more sources of vaporized organic material, selected to form layers of the OLED lighting device, and the vaporized organic material plume is shaped, on the side corresponding to the mask overhang feature, so as to limit substantial transfer of organic material on said side to angles less than or equal to a selected cutoff angle to the first region; and one or more sources of vaporized conducting material that transfer conducting material to the second region, wherein the second region partially or completely overlaps the first region and extends beyond the first region on the side corresponding to the o
    Type: Application
    Filed: March 21, 2013
    Publication date: July 10, 2014
    Applicant: OLEDWORKS LLC
    Inventors: John W. Hamer, Michael L. Boroson
  • Publication number: 20140191200
    Abstract: An apparatus for depositing one or more organic material layers of an OLED lighting device upon a first region of a substrate and one or more conducting layers upon a second region, wherein the conducting layers partially or completely cover and extend beyond one side of the organic layers, comprising: a reusable mask in contact with the substrate, at least one mask open area having an overhang feature; one or more sources of vaporized organic material, selected to form layers of the OLED lighting device, and the vaporized organic material plume is shaped, on the side corresponding to the mask overhang feature, so as to limit substantial transfer of organic material on said side to angles less than or equal to a selected cutoff angle to the first region; and one or more sources of vaporized conducting material that transfer conducting material to the second region, wherein the second region partially or completely overlaps the first region and extends beyond the first region on the side corresponding to the o
    Type: Application
    Filed: January 8, 2013
    Publication date: July 10, 2014
    Applicant: OLEDWorks LLC
    Inventors: John W. Hamer, Michael L. Boroson
  • Publication number: 20140175051
    Abstract: The embodiments disclose a method of creating a mask by depositing a protection layer that mechanically strengthens patterned features that are imprinted into a resist layer that is deposited onto a magnetic layer, implanting mechanically strengthened patterned resist layer features into the magnetic layer using ion implantation and removing the resist layer and the mask to expose at least a portion of the magnetic layer.
    Type: Application
    Filed: March 12, 2013
    Publication date: June 26, 2014
    Inventors: Michael Feldbaum, Koichi Wago, David Kuo
  • Publication number: 20140147593
    Abstract: Methods and systems to control the temperature of a substrate during a physical vapor deposition (PVD) process are provided. A temperature controlled apertured shield can be disposed on the surface of the substrate, surrounding the substrate area that is subjected to the deposition process. The temperature controlled apertured shield can be actively cooled, for example, by a circulated coolant, which can absorb heat from the deposition region and maintaining a desired temperature for the deposited films. In some embodiments, the temperature controlled apertured shield can be used in a high productivity combinatorial (HPC) system, allowing screening of materials and process conditions.
    Type: Application
    Filed: November 27, 2012
    Publication date: May 29, 2014
    Applicant: INTERMOLECULAR, INC.
    Inventor: Peter Satitpunwaycha
  • Publication number: 20140147964
    Abstract: The present invention provides a shadow mask, an evaporation device and a related method for manufacturing OLED display panel. The shadow mask has an array of multiple openings. Each opening contains a rectangular first section and a number of second sections at the first section's four corners; and each second section is connected to the first section. By varying the design of the shadow mask, the present invention is able to reduce the ineffective area sizes of the openings, thereby enhancing the aperture ratio of the OLED display panel.
    Type: Application
    Filed: October 22, 2012
    Publication date: May 29, 2014
    Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd.
    Inventors: Tai-Pi Wu, Yuan-Chun Wu