Abstract: An apparatus and a method for producing layers on the surfaces of workpieces, preferably on spotlight, or headlight, reflector inserts formed of plastic, includes an apparatus having a vacuum chamber that can be operated as a batch system with a PCVD coating process, where a microwave ECR plasma coating source is used, and the workpieces to be coated are secured to a rotary cage arranged in the vacuum chamber. The rotary cage can be conducted past a microwave coating source with a frequency-matched and phase-matched planetary motion. Such a coating process can be used in a vacuum chamber, under plasma, and at pressures below 2.times.10.sup.-2 mbar.

Abstract: An apparatus for treating substrates, in particular for applying a protective layer to the surface of optical reflectors (17) in a microwave-generated gas-supported plasma (16), which comprises a vacuum bell jar (1, 2), which is preferably of drum-type design and has a gas inlet (6), for receiving the substrates (17) to be treated. The vacuum bell jar has a passage window (7) sealed by a quartz-glass pane (8) or the like, for the microwave energy generated by a generator (11) disposed outside the bell jar (1, 2). The microwave energy is injected into the interior of the bell jar (1, 2) by a microwave aerial (12) adjoining the window (7).

Abstract: A film forming method and an apparatus therefor, in which reactant gas and carrier gas set at 10 torr through several atmospheres, much higher than the conventional plasma CVD gas pressure are put in a plasma condition of high density by utilizing standing waves or progressive waves of the microwave in a predetermined space, and then neutral radicals and ions of reactant species based on the reactant gas are guided to a substrate, thereby forming a thin film thereon at high-speed.

Abstract: Apparatus for the production of glow discharge, preferably for a large-area plasma CVD process, including a vacuum coating chamber (K) and a microwave waveguide resonator with one or more coupling points, wherein the resonator is made in the form of a microwave waveguide ring resonator (13, 13'), reaction zones (R) are formed at the coupling points between the microwave waveguide ring resonator (13, 13') and the vacuum chamber (K), and in each case a series of magnets (5, 5', . . . ; 6, 6', . . . ) of different polarity are provided, so that in front of the reaction zone (R) individual tunnels of magnetic field lines (16, 16') running parallel thereto are formed and each magnetic field (16, 16') encloses a spatially uniform plasma tube (17) in the reaction zone (R).