With Spray Or Jet Applying Conduits Or Nozzles Patents (Class 134/151)
  • Patent number: 9955850
    Abstract: A rack for a domestic dishwasher includes a frame and a base. The base can be swung and folded out in order to increase a loading volume of the rack. The base includes a first portion articulated to a first side of the frame via a first articulation, and a second portion articulated to a second side of the frame opposite the first site via a second articulation, and articulated to the first portion via a third articulation. The second portion is configured to change its length between the second and third articulations.
    Type: Grant
    Filed: October 30, 2015
    Date of Patent: May 1, 2018
    Assignee: BSH Hausgeräte GmbH
    Inventor: Ersin Isbilen
  • Patent number: 9543173
    Abstract: An apparatus and a method for selectively etching an encapsulant forming a package of resinous material around an electronic device includes an electronic device package mountable on the etch head; a conductive electrode in electrical contact with package leads of the electronic device package to apply a first voltage to the package leads of the electronic device; a first pump configured to pump a first quantity of the etchant solution from the source into the etch head where the etchant solution is electrically biased to a second voltage different from the first voltage and is cooled to a temperature below the ambient temperature. An etch cavity is formed on an exterior surface of the electronic device package. When the etchant solution has etched through an exterior surface of the electronic device package, the conductive bond wires of the electronic device is prevented from being etched by the applied first voltage.
    Type: Grant
    Filed: May 16, 2013
    Date of Patent: January 10, 2017
    Assignee: Nisene Technology Group
    Inventor: Alan M. Wagner
  • Patent number: 9032979
    Abstract: An improved portable cleaning system for use in cleaning heat exchanger tube bundles, fin-fans, towers and other elongated components. The cleaning system comprises a cleaning unit having a cleaning enclosure that receives and cleans the component and a control unit that controls the operation of the system. The cleaning unit has a cleaning enclosure defining a chamber sized and configured to receive the component through a sealable lid. A roller assembly rotates the component while a spray assembly sprays cleaning fluid over and into the rotating component. The cleaning fluid is heated in the chamber using surface heating elements attached to heat transfer plates along sections of the chamber walls. A vapor recovery system captures and treats toxic vapors. In use, the cleaning system is transported to a facility to clean the components on-site using cleaning fluid supplied by the facility and discharging waste to the facility.
    Type: Grant
    Filed: February 17, 2014
    Date of Patent: May 19, 2015
    Inventor: Gary I Hays
  • Publication number: 20150129000
    Abstract: An apparatus for cleaning a substrate includes a substrate transferring unit configured to support a substrate at a polar angle from a first direction, and transfer the substrate along a second direction orthogonal to the first direction. A cleaning unit is disposed on the substrate transferring unit. The cleaning unit includes a plurality of two-fluid nozzles. The cleaning unit has an azimuth angle from the first direction. The two-fluid nozzles mix a cleaning solution and compressed gas together and spray the mixture.
    Type: Application
    Filed: August 20, 2014
    Publication date: May 14, 2015
    Inventors: Seok Jun JANG, Bong Kyun Kim, Yang II Jeon
  • Patent number: 8997764
    Abstract: An apparatus for treating a wafer-shaped article, comprises a spin chuck for holding a wafer-shaped article in a predetermined orientation, at least one upper nozzle for dispensing a treatment fluid onto an upwardly facing surface of a wafer-shaped article when positioned on the spin chuck, and at least one lower nozzle arm comprising a series of lower nozzles extending from a central region of the spin chuck to a peripheral region of the spin chuck. The series of nozzles comprises a smaller nozzle in a central region of the spin chuck and a larger nozzle in a peripheral region of the spin chuck. In the method according to the invention, a heated liquid is supplied through the series of nozzles so as to supply more heat to peripheral regions of a wafer than to central regions.
    Type: Grant
    Filed: May 27, 2011
    Date of Patent: April 7, 2015
    Assignee: Lam Research AG
    Inventor: Michael Puggl
  • Publication number: 20150090303
    Abstract: A system includes a plurality of nozzles, a pump configured to pump a fluid through the nozzles, and a manifold configured to arrange the plurality of nozzles to substantially match a shape of a workpiece. Each nozzle of the plurality of nozzles is configured to impinge upon a section of the workpiece with the fluid.
    Type: Application
    Filed: September 28, 2013
    Publication date: April 2, 2015
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Jonathan Matthew Lomas, Michelle Fullerton Simpson
  • Publication number: 20150068556
    Abstract: A device (1) for removing a coating, particularly a photoresist, from a substrate (10) in at least one area of the substrate (10), comprises a nozzle (11) suitable for applying a jet of a solution medium to the substrate.
    Type: Application
    Filed: March 26, 2013
    Publication date: March 12, 2015
    Inventor: Pirmin Muffler
  • Patent number: 8968485
    Abstract: An apparatus for processing a substrate, comprising: a process chamber having a track; a carrier connected to the track; upper and lower proximity heads in the chamber and positioned along the path, the proximity heads having opposing faces that define a gap in which a meniscus of fluid is formed, the path being defined along the gap between the opposing faces; a first pre-wet dispenser and a second pre-wet dispenser disposed along side of the upper proximity head and directed toward the path; a drive for moving each of the pre-wet dispensers between a center position along the length of the upper proximity head and opposite outer positions near outer ends of the upper proximity head; and a pre-wet controller for causing the drive to move each of the first and second pre-wet dispensers based on a position of the carrier when moved under the first and second pre-wet dispensers.
    Type: Grant
    Filed: September 30, 2011
    Date of Patent: March 3, 2015
    Assignee: Lam Research Corporation
    Inventors: Arjun Mendiratta, Cheng-Yu Lin, David Mui
  • Publication number: 20150053242
    Abstract: The cleaning method includes a cleaning step of, in a state in which an upper cleaning liquid 3 is spouted downward from an upper nozzle 2 arranged on an upper side of a work 10 and a lower cleaning liquid 5 is spouted upward from a lower nozzle 4 arranged on a lower side of the work 10, cleaning at least an upper surface of the work 10 among the upper surface of the work and an outer peripheral surface 10b of the work 10 with the upper cleaning liquid 3 and cleaning a lower surface 10c of the work 10 with the lower cleaning liquid 5 by relatively moving the work 10 in a horizontal direction with respect to both the upper nozzle 2 and the lower nozzle 4.
    Type: Application
    Filed: May 17, 2011
    Publication date: February 26, 2015
    Inventors: Tomohiro Watanabe, Michiya Sunazuka, Tutomu Yanagawa
  • Patent number: 8956465
    Abstract: [Problem] To provide a liquid processing method with which, while alleviating a watermark occurring in the surface of a substrate, it is possible to hydrophobize the surface using a hydrophobing gas. [Solution] A substrate (W), retained in substrate retaining parts (21, 22, 23), is rotated and has a liquid compound supplied to the surface thereof, whereby a liquid process is carried out. Next, a rinse liquid is supplied to the surface of the substrate (W) while the substrate (W) is rotated, and the liquid compound is replaced with the rinse liquid. Next, supplying a hydrophobing gas for hydrophobizing the surface of the substrate (W) and supplying the rinse liquid to the surface of the substrate (W) after supplying the hydrophobing gas are repeated alternately, thus hydrophobizing the substrate (W). Next, the rinse liquid is removed by rotating the substrate (W), drying the substrate (W).
    Type: Grant
    Filed: January 11, 2013
    Date of Patent: February 17, 2015
    Assignee: Tokyo Electron Limited
    Inventor: Jun Nonaka
  • Patent number: 8932672
    Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block in the substrate processing apparatus. The exposure device subjects a substrate to exposure processing by means of an immersion method. In the edge cleaning unit in the cleaning/drying processing block, a brush abuts against an end of the rotating substrate, so that the edge of the substrate before the exposure processing is cleaned. At this time, the position where the substrate is cleaned is corrected.
    Type: Grant
    Filed: November 30, 2009
    Date of Patent: January 13, 2015
    Assignee: SCREEN Semiconductor Solutions Co., Ltd.
    Inventors: Koji Kaneyama, Masashi Kanaoka, Tadashi Miyagi, Kazuhito Shigemori, Shuichi Yasuda, Tetsuya Hamada
  • Patent number: 8888925
    Abstract: A nozzle for discharging droplets of a processing liquid for processing a substrate has a main body including a supply port, a drain port, a processing liquid flow passageway connecting the supply port and the drain port, and a plurality of discharge ports from which the processing liquid is discharged. The processing liquid flow passageway includes a plurality of branch flow channels, which branch out between the supply port and the drain port and collect together between the supply port and the drain port. The plurality of discharge ports form a plurality of columns respectively corresponding to the plurality of branch flow channels; and are aligned along and connected to the corresponding branch flow channels. A piezo element applies vibration to the processing liquid flowing through the plurality of branch flow channels.
    Type: Grant
    Filed: February 29, 2012
    Date of Patent: November 18, 2014
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Masanobu Sato, Hiroyuki Yashiki, Mai Yamakawa, Takayoshi Tanaka, Ayumi Higuchi, Rei Takeaki
  • Patent number: 8845819
    Abstract: An embodiment of the present invention provides a water wash system that may mix a cleaning fluid with at least one chemical agent to form a cleaning solution. The cleaning solution may reduce the corrosives on components of a compressor. The cleaning solution may be an mildly acidic solution to reduce corrosion of a caustic nature. Alternatively, the cleaning solution may be a mildly basic solution to reduce corrosion of an acidic nature.
    Type: Grant
    Filed: August 12, 2008
    Date of Patent: September 30, 2014
    Assignee: General Electric Company
    Inventors: Eric Gebhardt, Rahul J. Chillar, Dale J. Davis
  • Patent number: 8834649
    Abstract: An embodiment of the present invention provides a water wash system that may mix a cleaning fluid with at least one chemical agent to form a cleaning solution. The cleaning solution may reduce the corrosives on components of a compressor. The cleaning solution may be a mildly acidic solution to reduce corrosion of a caustic nature. Alternatively, the cleaning solution may be a mildly basic solution to reduce corrosion of an acidic nature.
    Type: Grant
    Filed: July 11, 2011
    Date of Patent: September 16, 2014
    Assignee: General Electric Company
    Inventors: Eric Gebhardt, Rahul J. Chillar, Dale J. Davis
  • Patent number: 8757180
    Abstract: In a processing block, a plurality of back surface cleaning units and a main robot are provided. The main robot is provided between the back surface cleaning units provided on one side of the processing block and the back surface cleaning units provided on the other side of the processing block. A reversing unit used to reverse a substrate and a substrate platform used to transfer and receive substrates between an indexer robot and the main robot are provided adjacent to each other in the vertical direction between the indexer robot and the processing block. The main robot transports substrates among the plurality of back surface cleaning units, the substrate platform, and the reversing unit.
    Type: Grant
    Filed: February 12, 2008
    Date of Patent: June 24, 2014
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventor: Ichiro Mitsuyoshi
  • Patent number: 8707974
    Abstract: A wafer cleaning device comprising a wafer stage for holding a wafer having a surface to be washed, a first nozzle positioned above the wafer, a second nozzle positioned above the wafer. A first height is between the first nozzle and the surface and a second height is between the second nozzle and the surface, wherein the first height is shorter than the second height.
    Type: Grant
    Filed: December 11, 2009
    Date of Patent: April 29, 2014
    Assignee: United Microelectronics Corp.
    Inventors: Hsin-Ting Tsai, Cheng-Hung Yu, Chin-Kuang Liu, Ming-Hsin Lee, Wei-Hong Chuang, Kuei-Chang Tung, Yan-Yi Lu, Chin-Chin Wang
  • Publication number: 20140102485
    Abstract: A dishwashing system for cleaning soiled kitchenware, dishware and utensils is provided. The dishwashing system uses a combination of compressed air and blasting media to thoroughly remove grease and loose as well as hardened food particles from soiled surfaces, without hand tool scrubbing, manual rinsing, or use of soap, detergent, surfactants or other chemicals, whether in pre-soaking or cleaning. This heavy-duty dishwashing system accomplishes this thorough cleaning using no or a minuscule quantity of water. The overall energy requirements are low compared to existing systems due to elimination of water, reduction of the heating load and possible use of the heat of incineration. The dishwashing system may include a system for reclaiming used blasting media by separation from food residues. The dishwashing system is most appropriate for locations where freshwater is unavailable or costly, such as arid zones and aboard ships, and where disposal of gray water is impermissible.
    Type: Application
    Filed: December 15, 2011
    Publication date: April 17, 2014
    Applicants: TECHNOLOGY INTERNATIONAL, INC., KING ABDULAZIZ UNIVERSITY
    Inventor: Nablia Bahjat
  • Patent number: 8627835
    Abstract: A cleaning chamber is provided. The cleaning chamber includes a base portion housing a chuck and a lid affixed to the base portion. A support assembly is linked to the lid and the support assembly includes a top plate spaced apart from a bottom plate, the top plate has a plurality of openings defined therethrough and the bottom plate has a plurality of openings defined therethrough. The cleaning chamber includes a plurality of cups extending through corresponding pairs of the plurality of openings of the top plate and the bottom plate. The plurality of cups is configured to seal against a surface of a substrate, wherein each cup of the plurality of cups is independently supported by the bottom plate.
    Type: Grant
    Filed: April 13, 2011
    Date of Patent: January 14, 2014
    Assignee: Intermolecular, Inc.
    Inventors: Gregory Lim, Aaron Francis, Kenneth Williams
  • Publication number: 20130306111
    Abstract: A machine is presented for the cleaning of jewelry. The machine allows the manual or automatic cleaning of jewelry. Under both modes of operation, the jewelry is secured by a user to a support bracket inside a transparent, water-tight cylindrical wash chamber. When in manual mode, the user can direct the spray of wash fluid onto the jewelry by rotating the jewelry using a trackball. When used in automatic mode, the machine washes the jewelry during a preset washing cycle. For both modes, the washing cycle is followed by the drying cycle where a blower directs air onto the jewelry for a set time period to blow off excess moisture. The drying cycle concludes with a blower venting the cylindrical wash chamber to remove residual moisture from the wash chamber and the jewelry. After the cleaning, the user removes the jewelry from the machine.
    Type: Application
    Filed: March 15, 2013
    Publication date: November 21, 2013
    Applicant: SHADE SAVER, INC.
    Inventor: SHADE SAVER, INC.
  • Patent number: 8567420
    Abstract: A cleaning apparatus for a semiconductor wafer includes: a gas jet device including a gas nozzle which jets a first gas onto the surface of a semiconductor wafer to thin the thickness of a stagnant layer on the surface of the semiconductor wafer; and a two-fluid jet device including a two-fluid nozzle which jets droplet mist onto a region where thickness of the stagnant layer of the semiconductor wafer is thinned, the droplet mist being mixed two-fluid of a liquid and a second gas.
    Type: Grant
    Filed: March 27, 2009
    Date of Patent: October 29, 2013
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Minako Inukai, Hiroshi Tomita, Kaori Umezawa, Yasuhito Yoshimizu, Linan Ji
  • Patent number: 8544483
    Abstract: Apparatuses, and related methods, for processing a workpiece that include a particular barrier structure that can overlie and cover a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular movable member that can be positioned over and moved relative to a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular ceiling structure that can overlie a processing chamber. Nozzle devices, and related methods, that include a particular annular body. Nozzle devices, and related methods, that include a particular first, second, and third nozzle structure.
    Type: Grant
    Filed: March 15, 2006
    Date of Patent: October 1, 2013
    Assignee: TEL FSI, Inc.
    Inventors: Jimmy D. Collins, Samuel A. Cooper, James M. Eppes, Alan D. Rose, Kader Mekias
  • Publication number: 20130233361
    Abstract: A liquid processing apparatus includes a substrate holding unit and an elevating member provided to ascend/descend with respect to the substrate holding unit. The substrate holding unit includes a holding base, and a first engagement member and a second engagement member which are provided to be movable in the holding base, and moved between an engaging position where the member is engaged with the peripheral edge of the substrate and a releasing position where the member releases the substrate. When the first contact unit connected to the first engagement member is in contact with a first portion to be contacted, the first engagement member is located at the engaging position. When the second contact unit connected to the second engagement member is in contact with a second portion to be contacted at a lower position than the first portion, the second engagement member is located at the engaging position.
    Type: Application
    Filed: March 5, 2013
    Publication date: September 12, 2013
    Applicant: Tokyo Electron Limited
    Inventor: Koji Egashira
  • Patent number: 8524008
    Abstract: In the case of a device and a method for cleaning substrates on a carrier, to the underside of which the substrates are fastened so as to be parallel to and slightly apart from one another, the carrier has in its interior a plurality of longitudinal channels, which run parallel to one another. As a result of the sawing of the wafers, they merge, via openings, into interstices between the substrates. As a result of a relative movement, an elongate tube, from which cleaning fluid is let out, is introduced into one of the longitudinal channels, the relative movement being achieved substantially through moving of the carrier.
    Type: Grant
    Filed: January 20, 2012
    Date of Patent: September 3, 2013
    Assignee: Gebr. Schmid GmbH
    Inventors: Sven Worm, Reinhard Huber
  • Patent number: 8486199
    Abstract: A device and method for treating the surface of a semiconductor wafer provides a treatment fluid in the form of a dispersion of gas bubbles in a treatment liquid generated at acoustic pressures less than those required to induce cavitation in the treatment liquid. A resonator supplies ultrasonic or megasonic energy to the treatment fluid and is configured to create an interference pattern in the treatment fluid comprising regions of pressure amplitude minima and maxima at an interface of the treatment fluid and the semiconductor wafer.
    Type: Grant
    Filed: July 22, 2011
    Date of Patent: July 16, 2013
    Assignees: Lam Research AG, Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e.V.
    Inventors: Frank Holsteyns, Alexander Lippert, Christian Degel, Anette Jakob, Franz Josef Becker
  • Patent number: 8479753
    Abstract: A liquid processing apparatus includes a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; an annular rotary cup configured to surround the substrate held on the substrate holding member and to rotate along with the substrate; a rotation mechanism configured to integrally rotate the rotary cup and the substrate holding member; and a liquid supply mechanism configured to supply a process liquid onto the substrate. The apparatus further includes an annular drain cup configured to receive the process liquid discharged from the rotary cup, and provided with a drain port; and a circular flow generation element configured to generate a circular flow within the drain cup when the rotary cup and the substrate holding member are rotated, such that the circular flow serves to lead the process liquid within the drain cup to the drain port.
    Type: Grant
    Filed: June 13, 2007
    Date of Patent: July 9, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Hiromitsu Nanba, Norihiro Ito
  • Publication number: 20130152980
    Abstract: Apparatuses, systems, and methods to clean a paint roller are disclosed. Such apparatuses and systems include a housing with an outlet; a handle connected to housing; an adapter disposed on an end portion of the handle; a nozzle disposed inside the handle; an idler attached to an inside surface of the housing; and a slot disposed on the housing on a location substantially opposite to the location of the inside surface of the housing where the idler is attached, wherein the idler is configured to support a paint roller cover to be cleaned and the slot is configured to receive a first portion of a paint roller frame configured to support the paint roller cover so as to dispose the paint roller cover substantially in front of the cleaning fluid jet.
    Type: Application
    Filed: December 15, 2011
    Publication date: June 20, 2013
    Inventor: Peter James HUES
  • Publication number: 20130130597
    Abstract: A glass treatment apparatus, in one example, can include a fluid dispensing device configured to dispense a substantially laminar flow of a fluid film. In another example, a shroud substantially circumscribes an outer peripheral surface of a working wheel. The shroud includes a slot configured to receive an edge portion of a glass sheet. Methods of treating glass, in one example, include the step of dispensing a substantially laminar flow of a fluid film along a fluid plane to subsequently land on a first side of a glass sheet. In further examples, a fluid is passed over an inner surface of a shroud to carry away machined particles from a glass sheet. In still further examples, an outer peripheral surface of a working wheel is impacted with a fluid stream to clean the working wheel from glass particles generated when machining an edge of the glass sheet.
    Type: Application
    Filed: November 21, 2011
    Publication date: May 23, 2013
    Inventors: James William Brown, Keith Mitchell Hill, Siva Venkatachalam, Edward Zhmayev, Naiyue Zhou
  • Patent number: 8439053
    Abstract: An apparatus for cleaning and storing painting tools is disclosed. The apparatus comprises a bucket member having a bottom wall and a side wall extending vertically from the bottom wall to an upper periphery wherein the side wall surrounds an open cavity. The apparatus also comprises a manifold nested within the bucket member. The manifold substantially bifurcates the open cavity into a first volume within the manifold and a second volume between the side wall and the manifold. The manifold extends vertically between an upper end disposed closer to the upper periphery than the bottom wall and a lower end disposed closer to the bottom wall than the upper periphery. The apparatus comprises at least one retaining member projecting into the second volume from one of the side wall and the manifold. The apparatus comprises at least one drain extending through one of the bottom wall and the side wall.
    Type: Grant
    Filed: March 22, 2012
    Date of Patent: May 14, 2013
    Inventor: Don Krzycki
  • Patent number: 8388800
    Abstract: An exemplary wet processing apparatus includes a conveyor, a spraying system, and a suction system. The conveyor is configured for conveying a substrate. The spraying system includes an upper spraying conduit above the conveyor and an upper spraying nozzle mounted on the upper spraying conduit. The suction system includes a suction conduit and a suction nozzle connected to the suction conduit. The suction nozzle is adjacent to the conveyor and configured for suction the wet processing liquid sprayed on the substrate. The suction conduit is connected to the spraying conduit in such a manner that the flowing of the wet processing liquid in the upper spraying conduit can create a negative pressure in the suction conduit to enable the suction nozzle to suck the wet processing liquid on the substrate.
    Type: Grant
    Filed: April 25, 2010
    Date of Patent: March 5, 2013
    Assignees: FuKui Precision Component (Shenzhen) Co., Ltd., Zhen Ding Technology Co., Ltd.
    Inventors: Yao-Wen Bai, Pan Tang, Xiao-Ping Li
  • Patent number: 8388764
    Abstract: An apparatus is disclosed for handling an artificial turf arranged on a base. In at least one embodiment, the apparatus includes a removing station for lifting from the base a strip of the artificial turf extending in a longitudinal direction, a separating station for separating filling material from the strip and a winding station for winding the strip onto a shaft. A method is disclosed for handling an artificial turf arranged on a base. In at least one embodiment, the method includes lifting a strip of the artificial turf extending in a longitudinal direction from the base, separating infill material from the strip and winding the strip onto a shaft.
    Type: Grant
    Filed: June 19, 2009
    Date of Patent: March 5, 2013
    Assignee: SYDVAC
    Inventor: Ingemar Jonsson
  • Publication number: 20130032175
    Abstract: An apparatus and method for treating a wet solid is provided. The apparatus comprises a porous belt and nozzles for applying on or more liquids to the wet solid. The contact with the liquids is achieved in a treatment chamber which is configured for movement between a first position, separated from the belt, and a second position, where the treatment chamber is in sealing contact with the belt.
    Type: Application
    Filed: January 28, 2011
    Publication date: February 7, 2013
    Applicant: POET RESEARCH, INC.
    Inventor: Steven G. Redford
  • Patent number: 8347682
    Abstract: An apparatus for cleaning cylinders (5) and/or rolls (5), e.g., working rolls (5) in a rolling stand, which are used for producing a rolled stock (1) such as strips or slabs, in which a liquid is sprayed onto the cylinders (5) at high pressure through several nozzles D1-Dn, a number of nozzles (D1-Dn) are stationary arranged in and/or on a nozzle beam (10), at least one on-off valve is associated with each nozzle (D1-Dn), and one or several nozzle(s) (D1-Dn) are sequentially switched on and off one after another starting from one end of the nozzle beam.
    Type: Grant
    Filed: May 24, 2010
    Date of Patent: January 8, 2013
    Assignee: SMS Siemag Aktiengesellschaft
    Inventors: Andreas Gramer, Peter De Kock, Rolf Brisberger
  • Publication number: 20120305192
    Abstract: A system for fluid processing one or more substrate surfaces arrayed in a fluid. The system has a process module with a frame and a plurality of fluid jet elements to inject a fluid at the substrate surfaces without contacting the substrate surfaces. A substrate holder assembly has a holder frame and a number of substrate holders, each of which is coupled to the holder frame and configured to hold a substrate so that a different substrate is held by each substrate holder of the substrate holder assembly for transport therewith as a unit to and from the process module. The substrate holder assembly and each substrate holder of the substrate holder assembly are removably coupled to the process module frame and, when coupled to the process module frame, each substrate holder is independently moveable and positionable relative to the other substrate holders of the substrate holder assembly.
    Type: Application
    Filed: June 4, 2012
    Publication date: December 6, 2012
    Inventors: ARTHUR KEIGLER, Freeman Fisher, Daniel L. Goodman
  • Patent number: 8297293
    Abstract: Provided are a substrate support unit and a substrate treating apparatus and method using the same. The substrate support unit includes a first support part and a second support part. The first support part is movable in a first direction. The first support part supports a first portion of a substrate in which a processing fluid is supplied in a direction corresponding to the first direction. The second support part is movable in a second direction. The second support part supports a second portion of the substrate. At least one of the first support part and the second support part supports the substrate while the processing fluid is supplied.
    Type: Grant
    Filed: September 25, 2008
    Date of Patent: October 30, 2012
    Assignee: Semes Co. Ltd
    Inventors: Dong-Soon Hwang, Tae-In Kim, Sung-Jin Hong
  • Patent number: 8241431
    Abstract: The invention relates to a method and an apparatus for applying a fluid (32) to items (14) to be cleaned, which items are continuously or intermittently transported in the conveying direction (12) in an automatic cleaning machine, preferably an automatic pass-through dishwasher. At least two, preferably tubular, spray bodies (26.1, 26.2, 26.3, . . . 26.n) which are spaced apart from one another are arranged in at least one spray plane (22, 24) which is oriented parallel to the conveying direction (12) of the items (14) to be cleaned.
    Type: Grant
    Filed: October 5, 2007
    Date of Patent: August 14, 2012
    Assignee: Meiko Maschinenbau GmbH & Co KG
    Inventors: Stefan Scheringer, Michael Streb, Engelbert Ecker, Thomas Peukert, Bruno Gaus, Joachim Kupetz, Wendelin Hils, Denis Lehmann, Thomas Roederer
  • Publication number: 20120167927
    Abstract: A dishwasher is disclosed. The dishwasher includes a tub to provide a washing space, a dish rack positioned in the washing space, to receive washing objects therein, a spraying arm to spray washing water toward the washing objects received in the dish rack, a supply path to provide washing water to the spraying arm, and a rack spraying arm provided in the dish rack, in communication with the supply path, to spray the washing water only to predetermined washing objects received in the rack. As a result, the dishwasher may realize an effect of intensive washing performed for washing objects with a high contamination level.
    Type: Application
    Filed: December 29, 2011
    Publication date: July 5, 2012
    Inventors: Yongho SHIN, Moonkee CHUNG, Joonho PYO
  • Publication number: 20120118331
    Abstract: A substrate cleaning system including a carrying unit having a plurality of rollers for carrying a substrate, wherein each of the rollers includes a roller shaft and a plurality of division rollers coupled to the roller shaft, and wherein a gap between adjacent ones of the roller shafts is larger than a radius of each of the division rollers; a first rinse unit located along the carrying unit and configured to apply a first cleaning liquid onto the substrate; and a cleaning unit comprising a slit nozzle and configured to apply a second cleaning liquid to the substrate after it encounters the first rinse unit.
    Type: Application
    Filed: April 28, 2011
    Publication date: May 17, 2012
    Inventors: Beung-Hwa Jeong, Kwang-Nam Kim
  • Patent number: 8136539
    Abstract: Devices, including a wash ring assembly, and methods are provided for the removal of excess fluid or solids from the exterior or interior of a probe used to transfer fluids, for instance, in an automated assay device. Typically, a probe is used to aspirate and dispense a sample fluid material such as whole blood or a reagent. The devices and methods provided herein are useful for removing excess fluid from the exterior or interior of the probe so as to prevent dripping and cross-contamination between samples or reagents. It is also contemplated that, utilizing the devices and methods provided herein, washing and/or drying can be performed simultaneously as the probe is in motion, aspirating a sample and/or dispensing a sample.
    Type: Grant
    Filed: May 9, 2008
    Date of Patent: March 20, 2012
    Assignee: Bio-Rad Laboratories, Inc.
    Inventors: Nasser Jafari, Lawrence Blecka, Chris Tsai
  • Patent number: 8136540
    Abstract: An improved portable cleaning system for use in cleaning heat exchanger tube bundles, fin-fans, towers and other elongated components. The cleaning system comprises a cleaning unit having a cleaning enclosure that receives and cleans the component and a control unit that controls the operation of the system. The cleaning unit has a cleaning enclosure defining a chamber sized and configured to receive the component through a sealable lid. A roller assembly rotates the component while a spray assembly sprays cleaning fluid over and into the rotating component. The cleaning fluid is heated in the chamber using surface heating elements attached to heat transfer plates along sections of the chamber walls. A vapor recovery system captures and treats toxic vapors. In use, the cleaning system is transported to a facility to clean the components on-site using cleaning fluid supplied by the facility and discharging waste to the facility.
    Type: Grant
    Filed: July 30, 2010
    Date of Patent: March 20, 2012
    Inventor: Gary I. Hays
  • Patent number: 8123868
    Abstract: A method and apparatus for cleaning, drying, coating, baking etching and deposition of surfaces on glass substrate as it transitions thru and between small gaps between hydro-static porous media bearings. Due to the non-contact nature of the device extremely high pressures can be induced upon the work piece through various fluids without damage to the substrate, allowing the system to utilize the viscous nature of fluids to accomplish the desired cleaning, drying, coating, etching or baking. The process also allows for simultaneous and immediately sequential ordering of processes.
    Type: Grant
    Filed: February 3, 2010
    Date of Patent: February 28, 2012
    Assignee: New Way Machine Components, Inc.
    Inventor: Andrew J. Devitt
  • Patent number: 8087419
    Abstract: A substrate holding rotating mechanism is used to hold and rotate a substrate to be processed. The substrate holding rotating mechanism according to the present invention includes at least three spindles, clamp rollers mounted respectively on the spindles for holding a periphery of a substrate, a rotating device for rotating at least one of the clamp rollers, at least one base member on which at least one of the spindles is installed, and a rotational mechanism adapted to allow the base member to be rotatable.
    Type: Grant
    Filed: March 28, 2011
    Date of Patent: January 3, 2012
    Assignee: Ebara Corporation
    Inventors: Hiroyuki Kaneko, Takahiro Ogawa, Kenichi Sugita
  • Patent number: 8088693
    Abstract: There is provided a substrate treatment method for performing treatment by feeding a chemical liquid to a surface of a substrate, in which, before feeding the chemical liquid to a predetermined area of the substrate, a liquid substance having a resistivity lower than that of the chemical liquid is fed to the surface of the substrate so that the liquid substance wets at least the predetermined area, and then, the chemical liquid is fed to the predetermined area so that the treatment is performed on the substrate with the chemical liquid fed to the surface of the substrate.
    Type: Grant
    Filed: October 4, 2006
    Date of Patent: January 3, 2012
    Assignee: Sony Corporation
    Inventors: Yoshimichi Shiki, Seiji Oda, Hayato Iwamoto, Yoshiya Hagimoto
  • Publication number: 20110226290
    Abstract: An exemplary apparatus for wet processing a substrate includes a wet processing system and a water supplying system. The wet processing system includes a preliminary rinsing device, a final rinsing device, and a conveyor. The preliminary rinsing device includes a first tank and a first spraying system above the first tank. The final rinsing device includes a second tank and a second spraying system above the second tank. The conveyor is configured for conveying a substrate from the preliminary rinsing device to the final rinsing device. The water supplying system includes a supply pipe configured for supplying water to the second spraying system, a connecting system communicating the second tank and the first spraying system, and a drain pipe communicating with the first tank.
    Type: Application
    Filed: July 11, 2010
    Publication date: September 22, 2011
    Applicants: Hong Heng Sheng Electronical Technology (HuaiAn) Co., Ltd., FOXCONN ADVANCED TECHNOLOGY INC.
    Inventors: YONG-JIAN XUE, JUN CHEN
  • Patent number: 7999513
    Abstract: A system includes an input configured to connect to a power source providing an input voltage, an output configured to connect to a load and to transfer power from the power source to the load, a battery selectively coupled to the input to receive current from the power source, a detector configured to indicate whether the input voltage drops more than a threshold amount, and a processor configured to regulate the selective coupling of the battery to the input to regulate a charging current supplied to the battery, the processor configured to regulate the selective coupling such that if a first charge current induces a drop in the input voltage beyond the threshold amount, then the processor will change the charging current to a second charge current that is lower than the first charge current.
    Type: Grant
    Filed: November 22, 2010
    Date of Patent: August 16, 2011
    Assignee: American Power Conversion Corporation
    Inventors: Daniel C. Cohen, Wiliam L. Owens, Franklin Lee, James D. Orlando
  • Publication number: 20110180113
    Abstract: A method of cleaning wafer cleaning includes: first a wafer stage for holding and rotating a wafer is provided. The wafer has a surface to be washed. A nozzle is positioned on the wafer for spraying a cleaning solution. The nozzle moves in non-uniform motion from a first given point to a second given point so as to make the time which the first given point is exposed to the cleaning solution equal to the time which the second given point is exposed to the cleaning solution. Furthermore, the nozzle moves faster when passing the center of the wafer and moves slower when passing the edge of the wafer.
    Type: Application
    Filed: January 28, 2010
    Publication date: July 28, 2011
    Inventors: Chin-Cheng Chien, Chun-Yuan Wu
  • Patent number: 7938130
    Abstract: A substrate holding rotating mechanism is used to hold and rotate a substrate to be processed. The substrate holding rotating mechanism according to the present invention includes at least three spindles, clamp rollers mounted respectively on the spindles for holding a periphery of a substrate, a rotating device for rotating at least one of the clamp rollers, at least one base member on which at least one of the spindles is installed, and a rotational mechanism adapted to allow the base member to be rotatable.
    Type: Grant
    Filed: March 30, 2007
    Date of Patent: May 10, 2011
    Assignee: Ebara Corporation
    Inventors: Hiroyuki Kaneko, Takahiro Ogawa, Kenichi Sugita
  • Patent number: 7926494
    Abstract: An end effector for a transport robot arm for a wafer wet cleaning system has an arm with a chuck at an end of the arm to support a wafer. The chuck also includes a cavity to spray a bottom surface of the wafer with a cleaning fluid. At least two branches extend from the chuck away from the arm with a roller at the end of each branch to hold the wafer. A spray bar is coupled to the arm. The spray bar is configured to hold and spray a top surface of the wafer with the cleaning fluid.
    Type: Grant
    Filed: July 31, 2007
    Date of Patent: April 19, 2011
    Assignee: Applied Materials, Inc.
    Inventor: Kent Riley Child
  • Publication number: 20100313916
    Abstract: A wash cylinder or chamber for an automated cleaning station to clean an object or a person's body part includes nozzles on the interior of the cylinder, the nozzles of one embodiment comprising an increasing roll angle providing a novel spray pattern. Additionally, embodiments of the invention include fluid guidance and conveyance structures, angled nozzles, sealing structures, finger guards, nozzle ribs, wash chamber seating mechanisms and drains, and nozzle inlays having a plurality of nozzles. Also disclosed are methods of washing an object or body part using a wash cylinder or chamber and methods of assembling a wash cylinder or chamber.
    Type: Application
    Filed: August 24, 2010
    Publication date: December 16, 2010
    Applicant: RESURGENT HEALTH & MEDICAL, LLC
    Inventors: Paul R. Barnhill, Thomas M. Johannsen
  • Patent number: 7836901
    Abstract: An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: November 23, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Steven Verhaverbeke, J. Kelly Truman, Alexander Ko, Rick R. Endo
  • Patent number: 7823595
    Abstract: An apparatus for etching a substrate includes (a) a nozzle system including at least one nozzle through which acid solution containing at least hydrofluoric acid is sprayed onto the substrate, (b) a mover which moves at least one of the nozzle system and the substrate relative to the other in a predetermined direction in such a condition that the substrate and the nozzle system face each other, (c) a filter system which filters off particles out of the acid solution having been sprayed onto the substrate, and (d) a circulation system which circulates the acid solution having been sprayed onto the substrate, to the filter system, and further, to the nozzle system from the filter system.
    Type: Grant
    Filed: July 2, 2007
    Date of Patent: November 2, 2010
    Assignee: NEC Corporation
    Inventor: Kazushige Takechi