Rotary, Pivoted Or Swinging Work Holder Patents (Class 134/153)
  • Patent number: 10453702
    Abstract: The present disclosure describes a chemical mechanical polishing device and a chemical mechanical polishing method. The chemical mechanical polishing device includes: a cleaning apparatus and a polishing pad conditioner disc positionally configurable relative to the cleaning apparatus, where the cleaning apparatus includes: a cleaning disc; a pre-polishing pad disposed inside the cleaning disc and configured to perform a pre-polishing operation of the polishing pad conditioner disc when positioned in contact with the polishing pad conditioner disc; a pre-polishing grinding liquid dispensing assembly disposed on a side edge of the cleaning disc and configured to supply a pre-polishing grinding liquid to the pre-polishing pad; and a rotation driver configured to drive the pre-polishing pad to rotate during the pre-polishing operation. The present disclosure beneficially reduces wafer scratches and increases evenness of distribution of a grinding liquid during polishing.
    Type: Grant
    Filed: November 15, 2017
    Date of Patent: October 22, 2019
    Assignees: SEMICONDUCTOR MANF. INTL. (SHANGHAI) CORPORATION, SEMICONDUCTOR MANF. INTL. (BEIJING) CORPORATION
    Inventor: Qiang Tang
  • Patent number: 10293384
    Abstract: In order to adapt a centrifugal cleaning installation (1) in a simple manner to different components (7), the centrifugal cleaning installation (1) is provided with a clamping unit (14) for clamping and retaining a component holder (4a, 4b, 5a-5d) for the component (7). The clamping unit (14) and a drive (6) are removably connected to the component holder (4a, 4b, 5a-5d) and said component holder (4a, 4b, 5a-5d) is adapted to a specific component (7) by positioning devices (25) and/or balance weights (26) provided on the holder.
    Type: Grant
    Filed: January 26, 2015
    Date of Patent: May 21, 2019
    Assignee: TMS TURNKEY MANUFACTURING SOLUTIONS GMBH
    Inventor: Stefan Wilden
  • Patent number: 10265738
    Abstract: An apparatus for washing an article includes a container defining an internal chamber configured to receive the article, an inflow connector connectable to a source of pressurized fluid, a filter member disposed within the internal chamber between a base of the container and the inflow connector, and a lid sealingly engagable with an open upper end of the container and defining at least one opening. Pressurized fluid supplied to the internal chamber is urged upwardly through the internal chamber, through and around an article disposed therein, and out the at least one opening of the lid. As a result, salt retained within or on the article is expelled through the at least one opening of the lid and particulate on or within the article is collected or passed through the filter member. Systems incorporating the apparatus and methods of using the same are also provided.
    Type: Grant
    Filed: September 16, 2016
    Date of Patent: April 23, 2019
    Inventor: Dean R. Damore
  • Patent number: 10083852
    Abstract: Edge grippers are disposed around an outer edge of a chuck. Each of the edge grippers includes a finger configured to pivot around a point; a contact pad configured to contact the wafer; and a flexure disposed between the contact pad and the finger. The flexure is configured to flex toward and away from the chuck. The chuck can use a matrix of vacuum and pressure nozzles designed to keep a wafer floating above the chuck. The edge grippers can hold the wafer at the edge while minimizing deformation of the wafer or without affecting z-jitter of the wafer.
    Type: Grant
    Filed: July 18, 2017
    Date of Patent: September 25, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Aviv Balan, Vaibhaw Vishal
  • Patent number: 9947556
    Abstract: There are provided first and second cleaning members which are configured to clean a central zone in a rear surface of a wafer when the wafer held by an absorption pad is horizontally held, and configured to clean a peripheral zone in the rear surface of the wafer when the wafer is held by the spin chuck. Due to the provision of the first and second cleaning members, detergency can be improved as compared with a case in which only one cleaning member is used. The first and second cleaning members are configured to be horizontally turned by a common turning shaft. When the central zone in the rear surface of the wafer is cleaned, the turning shaft is located to be overlapped with the wafer. Since the turning shaft is located by using the moving area of the wafer, a size of an apparatus can be reduced.
    Type: Grant
    Filed: July 1, 2014
    Date of Patent: April 17, 2018
    Assignee: Tokyo Electron Limited
    Inventors: Yasushi Takiguchi, Taro Yamamoto, Hideharu Kyouda, Koshi Muta
  • Patent number: 9922861
    Abstract: A rotary table; a drive motor M configured to rotate the rotary table; a pin base supported by the rotary table; a pin fixing member configured to move closer to or away from C1 upon the pin base revolving; first chuck pins and second chuck pins provided on the pin fixing member and configured to be into contact with an outer edge of the substrate W; a substrate gripping force generation mechanism including a spring member; a chuck pin switching mechanism including an inertia member configured to be rotated coaxially with the rotary table and a protruded member provided on an outer peripheral part of the inertia member; and a cam member provided on the pin fixing member and configured to engage with protruded member.
    Type: Grant
    Filed: April 8, 2014
    Date of Patent: March 20, 2018
    Assignee: SHIBAURA MECHATRONICS CORPORATION
    Inventors: Masaaki Furuya, Koichi Higuchi
  • Patent number: 9833876
    Abstract: Embodiments of a polishing apparatus are provided. The polishing apparatus includes a polishing pad having a polishing surface. The polishing apparatus also includes a dispensing device including a dispensing arm located over the polishing pad and a liquid nozzle disposed on the dispensing arm. The liquid nozzle is configured to dispense washing liquid onto the polishing surface along a dispensing direction. The dispensing direction has an acute angle with respect to the polishing surface.
    Type: Grant
    Filed: March 3, 2014
    Date of Patent: December 5, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventor: I-Pin Chan
  • Patent number: 9797080
    Abstract: A laundry treating machine is provided. The laundry treating machine may include a tub to receive wash water, a drum rotatably provided in the tub, an air supply device to supply air to the tub, a lint filter to filter lint from the air circulated by the air supply device, a filter cleaning device to supply cleaning water to the lint filter to remove the lint from the lint filter, and a cooling water supply device to supply cooling water to an inner surface of the tub such that moisture contained in air is condensed at the inner surface of the tub.
    Type: Grant
    Filed: April 5, 2013
    Date of Patent: October 24, 2017
    Assignee: LG ELECTRONICS INC.
    Inventors: Youngjin Doh, Jihong Lee, Hong Namgoong, Kyuhwan Lee
  • Patent number: 9799537
    Abstract: A processing assembly for a semiconductor workpiece generally includes a rotor assembly capable of spinning a workpiece, a chemistry delivery assembly for delivering chemistry to the workpiece, and a chemistry collection assembly for collecting spent chemistry from the workpiece. The chemistry collection assembly may include a weir that is configured to spin with the rotor assembly. A method of processing a semiconductor workpiece is also provided.
    Type: Grant
    Filed: December 3, 2010
    Date of Patent: October 24, 2017
    Assignee: APPLIED Materials, Inc.
    Inventors: Jason Rye, Kyle M. Hanson
  • Patent number: 9786523
    Abstract: A method and apparatus are disclosed for optimizing a rinsing and drying process in semiconductor manufacturing. The optimization seeks to maximize processing throughput while maintaining low defect counts and high device yields, and utilizes simulation and experimental data to set the optimal process parameters for the rinsing and drying process. Improved methods of rinse liquid and purge gas nozzle movement are also disclosed.
    Type: Grant
    Filed: March 14, 2014
    Date of Patent: October 10, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Carlos A Fonseca, Michael A Carcasi
  • Patent number: 9775365
    Abstract: This invention relates to a flexible bag for storing raw milk where the flexible bag is for use in system comprising a cassette adapted to contain the flexible bag, where the flexible bag further comprises a spout, preferably with a screw top, and two or more perforations for fixing the flexible bag inside the cassette when the former is mounted in the cassette. Additionally, the invention relates to a cassette for use in a system comprising said cassette and the flexible bag, where the cassette comprises at least two sets of small pins, and at least two sets of cavities, where said cavities are adapted to receive said pins, and wherein said pins are constructed and placed such that they penetrate said perforations of said flexible bag, when said bag is placed inside said cassette.
    Type: Grant
    Filed: November 20, 2009
    Date of Patent: October 3, 2017
    Assignee: CALVEX A/S
    Inventor: Brian Pedersen
  • Patent number: 9694371
    Abstract: A substrate treatment apparatus according to the embodiment includes: a nozzle which ejects a treatment liquid onto a treatment target surface of a substrate; a trajectory deflector including a trajectory deflecting surface, which is an annular inclined surface that deflects a traveling direction of the treatment liquid ejected from the nozzle and makes the treatment liquid incident on the treatment target surface, the trajectory deflecting surface having an inclination angle varying in a direction of annular extension of the trajectory deflecting surface; and a position changer which moves an incident position of the treatment liquid on the trajectory deflecting surface in the direction of annular extension of the trajectory deflecting surface.
    Type: Grant
    Filed: March 27, 2015
    Date of Patent: July 4, 2017
    Assignee: SHIBAURA MECHATRONICS CORPORATION
    Inventors: Takashi Ootagaki, Konosuke Hayashi
  • Patent number: 9675910
    Abstract: A cartridge filter cleaning device sprays water onto the outside of a cartridge filter as a nozzle array is moved with respect to the longitudinal axis of the filter as the filter is rotated. In an electric version, a DC motor drives a threaded rod to provide nozzle array movement, and a drive belt to rotate the cartridge filter. In a fluid-driven version, a pump provides fluid pressure for the cartridge filter rotation and nozzle array movement. Multiple cartridge filter embodiments use a single motor or pump to rotate the cartridge filters and move the nozzle array. The nozzle array provides a single nozzle or a plurality of spaced-apart nozzles for each filter. Filter orientation may be vertical, horizontal, or angled.
    Type: Grant
    Filed: March 6, 2013
    Date of Patent: June 13, 2017
    Inventors: Robert Louis Wade, David W. Benson
  • Patent number: 9624430
    Abstract: Methods, apparatuses and systems are disclosed for chemically etching parts by generating an enclosed chemical etching chamber in contact with a part surface and directing a flow of chemical etchant solution in contact with a part region to be etched.
    Type: Grant
    Filed: May 14, 2015
    Date of Patent: April 18, 2017
    Assignee: THE BOEING COMPANY
    Inventors: David S. Nansen, Walter A. Beauchamp, Lee C. Firth
  • Patent number: 9596827
    Abstract: A process for reprocessing soiled animal bedding material commingled with animal manure to form a compact product. The soiled animal bedding material is separated in a shaker to send at least a preponderance of the manure to a holding tank. The bedding material is subsequently dried and compacted to form a compacted product. Alternatively, the bedding material is dried (without a compacting step) to form a product.
    Type: Grant
    Filed: June 3, 2013
    Date of Patent: March 21, 2017
    Inventor: Shelly Ann Townsend
  • Patent number: 9595457
    Abstract: A method for cleaning semiconductor substrate using ultra/mega sonic device comprising holding a semiconductor substrate by using a chuck, positioning a ultra/mega sonic device adjacent to the semiconductor substrate, injecting chemical liquid on the semiconductor substrate and gap between the semiconductor substrate and the ultra/mega sonic device, changing gap between the semiconductor substrate and the ultra/mega sonic device for each rotation of the chuck during the cleaning process. The gap can be increased or reduced by 0.5?/N for each rotation of the chuck, where ? is wavelength of ultra/mega sonic wave, N is an integer number between 2 and 1000. The gap is varied in the range of 0.5?n during the cleaning process, where ? is wavelength of ultra/mega sonic wave, and n is an integer number starting from 1.
    Type: Grant
    Filed: December 12, 2008
    Date of Patent: March 14, 2017
    Assignee: ACM Research (Shanghai) Inc.
    Inventors: Jian Wang, Sunny Voha Nuch, Liangzhi Xie, Junping Wu, Zhaowei Jia, Yunwen Huang, Zhifeng Gao, Hui Wang
  • Patent number: 9466439
    Abstract: A laundry treating appliance and a method operating a laundry treating appliance having at least one automatic cycle of operation, a plurality of components selectively operable by a controller to implement the at least one cycle of operation on a load of laundry received within a treating chamber of the appliance with the controller having a user interface for receiving input from a user and a door for closing an open face of the treating chamber, the method comprising determining a movement of the door in a closing direction and actuating the user interface when it is determined the door is moved in the closing direction.
    Type: Grant
    Filed: June 26, 2013
    Date of Patent: October 11, 2016
    Assignee: Whirlpool Corporation
    Inventors: Darryl C. Bodine, Donald E. Erickson, Michelle K. Flachs, Terry K. Litaker, Chris W. Paraskevopoulos, Scott Albright, Robert Blake
  • Patent number: 9129797
    Abstract: Disclosed is a low-cost and resource-saving cleaning method wherein high cleaning effects are obtained by high-pressure jet cleaning or two-fluid cleaning using a gas-dissolved water. In the high-pressure jet cleaning method or the two-fluid cleaning method, a cleaning liquid or a mixed fluid of the cleaning liquid and a gas is jetted from a cleaning fluid jetting nozzle toward a subject to be cleaned, and the subject is cleaned. The cleaning liquid introduced into the cleaning fluid jetting nozzle contains the dissolved gas in a quantity equal to or more than the saturation solubility at the liquid temperature of the cleaning liquid.
    Type: Grant
    Filed: December 21, 2010
    Date of Patent: September 8, 2015
    Assignee: KURITA WATER INDUSTRIES LTD.
    Inventors: Hiroto Tokoshima, Hiroshi Morita
  • Patent number: 9048269
    Abstract: Disclosed is a liquid treatment apparatus for processing a lower surface of the substrate. The apparatus includes a first nozzle disposed below a lower surface of the substrate retained by the substrate retaining unit to eject a treatment liquid towards the lower surface of the substrate, the first nozzle having a plurality of first ejection ports, which are arrayed from a position opposing a central portion of the substrate retained by the substrate retaining unit to a position opposing a peripheral portion of the substrate retained by the substrate retaining unit. An ejecting direction of the treatment liquid ejected from the first ejection port is inclined towards a rotation direction of the substrate rotated by the rotational driving unit.
    Type: Grant
    Filed: December 27, 2011
    Date of Patent: June 2, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Jiro Higashijima, Nobuhiro Ogata, Satoshi Kaneko, Shuichi Nagamine, Yoshihiro Kai
  • Patent number: 8997764
    Abstract: An apparatus for treating a wafer-shaped article, comprises a spin chuck for holding a wafer-shaped article in a predetermined orientation, at least one upper nozzle for dispensing a treatment fluid onto an upwardly facing surface of a wafer-shaped article when positioned on the spin chuck, and at least one lower nozzle arm comprising a series of lower nozzles extending from a central region of the spin chuck to a peripheral region of the spin chuck. The series of nozzles comprises a smaller nozzle in a central region of the spin chuck and a larger nozzle in a peripheral region of the spin chuck. In the method according to the invention, a heated liquid is supplied through the series of nozzles so as to supply more heat to peripheral regions of a wafer than to central regions.
    Type: Grant
    Filed: May 27, 2011
    Date of Patent: April 7, 2015
    Assignee: Lam Research AG
    Inventor: Michael Puggl
  • Publication number: 20150090292
    Abstract: A portable apparatus for sieving, washing, and drying particle samples onsite that are generated from well drill cutting. The apparatus comprises a sievewash chamber to initially remove contaminates from the samples, and a final wash-spin-dry chamber to completely clean and dry the samples for analysis. The two chambers function under the operational control of a computerized system comprising a processor, a user display, and a database storing computer code for operating the apparatus in various cleaning cycles. The sieve-wash chamber comprises two vertically stacked baskets: a coarse basket on top to hold the drill cutting samples; and, a caged basket underneath to catch clean samples as they fall through the coarse mesh screen on the bottom of the coarse basket. The caged basket with the samples is then manually transferred to the wash-spin-dry chamber for processing by motorized rotation of the basket at high rpm's.
    Type: Application
    Filed: September 27, 2013
    Publication date: April 2, 2015
    Inventor: Michael John DePatie
  • Publication number: 20150090305
    Abstract: A liquid processing apparatus performs a liquid processing on a rotating substrate by supplying a processing liquid. Surrounding members surround a region including an upper space of a cup body surrounding the rotating substrate and provided with an opening above the substrate. An air flow forming portion forms a descending air flow from an upper side of the cup body. A bottom surface portion blocks between the cup body and the surrounding member along a circumferential direction. An exhaust port is provided above the bottom surface portion and outside the cup body to exhaust an atmosphere in a region surrounded by the surrounding members and the bottom surface portion.
    Type: Application
    Filed: September 11, 2014
    Publication date: April 2, 2015
    Inventors: Terufumi Wakiyama, Norihiro Ito, Jiro Higashijima
  • Publication number: 20150068556
    Abstract: A device (1) for removing a coating, particularly a photoresist, from a substrate (10) in at least one area of the substrate (10), comprises a nozzle (11) suitable for applying a jet of a solution medium to the substrate.
    Type: Application
    Filed: March 26, 2013
    Publication date: March 12, 2015
    Inventor: Pirmin Muffler
  • Patent number: 8967167
    Abstract: The present invention provides a tool for treating microelectronic workpieces with one or more treatment materials, including liquids, gases, fluidized solids, dispersions, combinations of these, and the like.
    Type: Grant
    Filed: October 11, 2012
    Date of Patent: March 3, 2015
    Assignee: Tel FSI, Inc.
    Inventors: Jimmy D. Collins, David P. DeKraker, Tracy A. Gast, Alan D. Rose
  • Publication number: 20150053244
    Abstract: A nozzle for discharging droplets of a processing liquid for processing a substrate has a main body including a supply port, a drain port, a processing liquid flow passageway connecting the supply port and the drain port, and a plurality of discharge ports from which the processing liquid is discharged. The processing liquid flow passageway includes a plurality of branch flow channels, which branch out between the supply port and the drain port and collect together between the supply port and the drain port. The plurality of discharge ports form a plurality of columns respectively corresponding to the plurality of branch flow channels; and are aligned along and connected to the corresponding branch flow channels. A piezo element applies vibration to the processing liquid flowing through the plurality of branch flow channels.
    Type: Application
    Filed: October 31, 2014
    Publication date: February 26, 2015
    Inventors: Masanobu SATO, Hiroyuki YASHIKI, Mai YAMAKAWA, Takayoshi TANAKA, Ayumi HIGUCHI, Rei TAKEAKI
  • Publication number: 20150053243
    Abstract: The present invention relates to a dishwasher which comprises: a washer main body in which a washing basin is provided to form a space in which dishes are washed; multiple fixed jet nozzles which are fixed to the inner wall of the washing basin and jet water for washing toward the dishes at a fixed position; and a horizontally arranged cylindrical rotating rack rotatably disposed in the washing bath, wherein the inner space thereof is split into multiple dish mounting portions where the dishes can be mounted and the rotating rack rotates along the periphery of the multiple fixed jet nozzles.
    Type: Application
    Filed: February 28, 2013
    Publication date: February 26, 2015
    Inventor: Due Gyu KIM
  • Patent number: 8951361
    Abstract: An apparatus for guiding hydraulic hoses for use in cleaning sewer lines. The claimed hose guide locks the hydraulic hose, near the head of the hose, in a clamp, providing rigidity for an operator trying to locate the opening of a clogged pipeline. Once the hose has been placed at the pipeline opening, the operator releases the hose from the hose guide, pressurizes the hose so as to separate the hose from the hose guide, removes the hose guide from the sewer line, and cleans the pipeline with the hydraulic hose.
    Type: Grant
    Filed: December 8, 2011
    Date of Patent: February 10, 2015
    Inventor: Daniel Sutton
  • Patent number: 8932672
    Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block in the substrate processing apparatus. The exposure device subjects a substrate to exposure processing by means of an immersion method. In the edge cleaning unit in the cleaning/drying processing block, a brush abuts against an end of the rotating substrate, so that the edge of the substrate before the exposure processing is cleaned. At this time, the position where the substrate is cleaned is corrected.
    Type: Grant
    Filed: November 30, 2009
    Date of Patent: January 13, 2015
    Assignee: SCREEN Semiconductor Solutions Co., Ltd.
    Inventors: Koji Kaneyama, Masashi Kanaoka, Tadashi Miyagi, Kazuhito Shigemori, Shuichi Yasuda, Tetsuya Hamada
  • Publication number: 20140360535
    Abstract: A produce cleaning system having a housing member defining a base, a sidewall, and an open unit cavity therebetween. The sidewall may define a water compartment and a cleansing compartment. The system may include a lid configured to close the open unit cavity and one or more jet sprayers secured to an interior surface of the unit cavity. The jet sprayers may be configured to selectively disperse fluids from the water compartment and cleansing compartment toward the basket. The system may include an interface configured to receive operation commands based on user input including a rinse command and cleansing command, such that the rinse command includes instructions to direct the jet sprayers to disperse fluid from the water compartment, and the cleansing command includes instructions to direct the jet sprayers to disperse fluids from both the water compartment and the cleansing compartment.
    Type: Application
    Filed: December 12, 2013
    Publication date: December 11, 2014
    Inventor: Karen ANDRUS
  • Patent number: 8887657
    Abstract: According to one embodiment, a film forming system includes: a stage including a placement surface on which an object to be coated is placed; a rotating mechanism rotating the stage in a rotational direction along the placement surface; an application nozzle discharging a material onto the object placed on the stage for application; a moving mechanism relatively moving the stage and the application nozzle along the placement surface in a cross direction crossing the rotational direction; a controller performing a control to rotate the stage on which the object is placed through the rotating mechanism while relatively moving the stage and application nozzle along the placement surface in the cross direction through the moving mechanism and applying the material to the object on the stage through the application nozzle; and a cleaning apparatus cleaning the application nozzle.
    Type: Grant
    Filed: June 7, 2010
    Date of Patent: November 18, 2014
    Assignees: Kabushiki Kaisha Toshiba, Chugai Ro Co., Ltd.
    Inventors: Kenichi Ooshiro, Tsuyoshi Sato, Takao Tokumoto, Sadao Natsu, Souichirou Iwasaki
  • Patent number: 8888925
    Abstract: A nozzle for discharging droplets of a processing liquid for processing a substrate has a main body including a supply port, a drain port, a processing liquid flow passageway connecting the supply port and the drain port, and a plurality of discharge ports from which the processing liquid is discharged. The processing liquid flow passageway includes a plurality of branch flow channels, which branch out between the supply port and the drain port and collect together between the supply port and the drain port. The plurality of discharge ports form a plurality of columns respectively corresponding to the plurality of branch flow channels; and are aligned along and connected to the corresponding branch flow channels. A piezo element applies vibration to the processing liquid flowing through the plurality of branch flow channels.
    Type: Grant
    Filed: February 29, 2012
    Date of Patent: November 18, 2014
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Masanobu Sato, Hiroyuki Yashiki, Mai Yamakawa, Takayoshi Tanaka, Ayumi Higuchi, Rei Takeaki
  • Patent number: 8881751
    Abstract: A substrate liquid processing apparatus includes a placement table configured to hold a substrate, a rotary driving unit configured to rotate the placement table, a liquid supply unit configured to supply a liquid to the substrate placed on the placement table, and an upper liquid guide cup, a central liquid guide cup, and a lower liquid guide cup which are disposed in this order from the top and are configured to guide downward the liquid scattering from the rotating substrate being placed on the placement table. A driving mechanism is configured to move up and down the upper liquid guide cup, the central liquid guide cup, and the lower liquid guide cup. The driving mechanism is connected to the central liquid guide cup.
    Type: Grant
    Filed: June 2, 2011
    Date of Patent: November 11, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Nobuhiro Ogata, Shuichi Nagamine
  • Patent number: 8869811
    Abstract: Disclosed is a liquid processing apparatus and a liquid processing method that can prevent a processing liquid from being left on a lift pin after a drying-out process of a substrate, thereby preventing the processing liquid from being attached to the back surface of the substrate after the liquid processing. The liquid processing apparatus of the present disclosure includes a holding plate that supports a substrate, a lift pin plate provided above the holding plate having a lift pin that supports the wafer from a lower side, and a processing liquid supply unit that supplies the processing liquid to the back surface of the wafer. The processing liquid supply unit is provided with a head part configured to close a penetrating hole of the lift pin plate. The processing liquid supply unit and the lift pin plate are configured to be elevated with respect to the holding plate.
    Type: Grant
    Filed: August 23, 2010
    Date of Patent: October 28, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Nobuhiro Ogata, Shuichi Nagamine
  • Publication number: 20140299166
    Abstract: A rotary table; a drive motor M configured to rotate the rotary table; a pin base supported by the rotary table; a pin fixing member configured to move closer to or away from C1 upon the pin base revolving; first chuck pins and second chuck pins provided on the pin fixing member and configured to be into contact with an outer edge of the substrate W; a substrate gripping force generation mechanism including a spring member; a chuck pin switching mechanism including an inertia member configured to be rotated coaxially with the rotary table and a protruded member provided on an outer peripheral part of the inertia member; and a cum member provided on the pin fixing member and configured to engage with protruded member.
    Type: Application
    Filed: April 8, 2014
    Publication date: October 9, 2014
    Applicant: SHIBAURA MECHATRONICS CORPORATION
    Inventors: Masaaki FURUYA, Koichi HIGUCHI
  • Publication number: 20140182631
    Abstract: Disclosed is a method of cleaning components of a substrate processing apparatus The components of the substrate processing apparatus are cleaned by using a first cleaning jig including a disk-shaped lower member, and a disk-shaped upper member connected to the lower member and forming a gap between the upper member and the lower member. The lower member of the first cleaning jig is held by the substrate holding unit to rotate the first cleaning jig. The cleaning liquid is ejected toward the first cleaning jig from a bottom side of the first cleaning jig while the first cleaning jig is rotated. The cleaning liquid flows out toward outside of the first cleaning jig via the gap between the upper member and the lower member by a centrifugal force, and the components of the substrate processing apparatus are cleaned by the cleaning liquid that has flowed out.
    Type: Application
    Filed: December 10, 2013
    Publication date: July 3, 2014
    Inventor: Hiromitsu Namba
  • Patent number: 8758855
    Abstract: A coating film forming apparatus that holds a substrate upon a spin chuck and forms a coating film by supplying a chemical liquid upon a top surface of said substrate comprises: an outer cup provided detachably to surround the spin chuck; an inner cup provided detachably to surround a region underneath the substrate held upon the chuck; a cleaning nozzle configured to supply a cleaning liquid for cleaning a peripheral edge part of the substrate, such that the cleaning liquid is supplied to a peripheral part of a bottom surface of the substrate; a cutout part for nozzle mounting, the cutout part being provided to the inner cup to engage with the cleaning nozzle; and a cleaning liquid supply tube connected to the cleaning nozzle, the cleaning nozzle being detachable to the cutout part in a state in which the cleaning liquid supply tube is connected.
    Type: Grant
    Filed: March 19, 2012
    Date of Patent: June 24, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Nobuhiro Ogata, Hiroichi Inada, Taro Yamamoto, Akihiro Fujimoto
  • Patent number: 8757180
    Abstract: In a processing block, a plurality of back surface cleaning units and a main robot are provided. The main robot is provided between the back surface cleaning units provided on one side of the processing block and the back surface cleaning units provided on the other side of the processing block. A reversing unit used to reverse a substrate and a substrate platform used to transfer and receive substrates between an indexer robot and the main robot are provided adjacent to each other in the vertical direction between the indexer robot and the processing block. The main robot transports substrates among the plurality of back surface cleaning units, the substrate platform, and the reversing unit.
    Type: Grant
    Filed: February 12, 2008
    Date of Patent: June 24, 2014
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventor: Ichiro Mitsuyoshi
  • Patent number: 8734593
    Abstract: A substrate treatment apparatus includes: substrate holding unit which horizontally holds a substrate; a rotating unit which rotates the substrate held by the substrate holding unit about a vertical axis; and a first nozzle having a first opposing face to be opposed to a region of a lower surface of the substrate inward of a peripheral portion of the substrate in spaced relation to the lower surface of the substrate during rotation of the substrate by the rotating unit and a treatment liquid spout provided in the first opposing face for filling a space defined between the lower surface of the substrate and the first opposing face with a treatment liquid spouted from the treatment liquid spout to keep the space in a liquid filled state.
    Type: Grant
    Filed: March 10, 2011
    Date of Patent: May 27, 2014
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Takuya Kishimoto, Koji Ando
  • Publication number: 20140116480
    Abstract: When a substrate W is processed, a cover member covers a peripheral portion of the upper surface of the substrate held by the substrate holding unit, and a central portion of the substrate located at an inner position than the peripheral portion in a radial direction is exposed without being covered by the cover member. A gap is formed between the lower surface of the cover member and the peripheral portion of the upper surface of the substrate held by the substrate holding unit. When the interior space of the cup is exhausted, a gas present above the interior space of the cup is introduced from a space enclosed by the internal peripheral surface of the cover member through the gap into the interior space of the cup.
    Type: Application
    Filed: October 17, 2013
    Publication date: May 1, 2014
    Applicant: Tokyo Electron Limited
    Inventors: Jiro Higashijima, Yoshifumi Amano, Eiichiro Okamoto, Yuki Ito
  • Patent number: 8707974
    Abstract: A wafer cleaning device comprising a wafer stage for holding a wafer having a surface to be washed, a first nozzle positioned above the wafer, a second nozzle positioned above the wafer. A first height is between the first nozzle and the surface and a second height is between the second nozzle and the surface, wherein the first height is shorter than the second height.
    Type: Grant
    Filed: December 11, 2009
    Date of Patent: April 29, 2014
    Assignee: United Microelectronics Corp.
    Inventors: Hsin-Ting Tsai, Cheng-Hung Yu, Chin-Kuang Liu, Ming-Hsin Lee, Wei-Hong Chuang, Kuei-Chang Tung, Yan-Yi Lu, Chin-Chin Wang
  • Publication number: 20140090673
    Abstract: This cleaning apparatus includes a rotation holding unit that holds and rotates an object; a cleaning fluid spray unit that sprays a cleaning fluid onto a spot-like cleaning region on the object, which is held by the rotation holding unit; a cleaning region moving unit that moves at least one of the rotation holding unit and the cleaning fluid spray unit to relatively move the cleaning region from the rotation center of the object toward the outer peripheral side thereof; a layered air current forming unit that forms a layered air current entering the surface of the object so as to cover the periphery of the cleaning region from a backward side in the direction of movement of the cleaning region relative to the rotation center; and a layered air current moving unit that relatively moves the incoming position of the layered air current while following the relative movement of the cleaning region.
    Type: Application
    Filed: December 6, 2013
    Publication date: April 3, 2014
    Applicant: Olympus Corporation
    Inventors: Motohiro Atsumi, Masahiro Akahane
  • Publication number: 20140075682
    Abstract: A home appliance (2), in particular dishwasher or laundry treatment apparatus, further in particular a laundry treatment apparatus capable of washing and/or drying, includes a liquid supply channel (24) and/or a liquid reservoir (22) and a droplet spraying device (26). The droplet spraying device includes a membrane (36) arranged in fluid connection with the liquid supply channel (24) and/or the liquid reservoir (22). The membrane (36) has a plurality of openings (38), and at least one actuator (40) is provided for actuating the membrane (36).
    Type: Application
    Filed: January 19, 2012
    Publication date: March 20, 2014
    Applicant: ELECTROLUX HOME PRODUCTS CORPORATION N.V.
    Inventors: Mario Filippetti, Andrea Zattin
  • Patent number: 8672821
    Abstract: A combined paint roller and paint roller cleaner quickly and efficiently removes paint from the paint roller cleaner while preventing fluids from splashing outwardly and away from the paint roller cleaner. The paint roller cleaner includes a main chamber having a first slot formed at an outer surface thereof, and an auxiliary chamber statically coupled to the main chamber. Such an auxiliary chamber protrudes outwardly from the outer surface of the main chamber and preferably has an outer surface provided with a second slot formed therein. Notably, the second slot may be offset from the first slot in such a manner that an external fluid stream, after passing through the first and second slots, is caused to enter the main chamber at a non-perpendicular angle relative to the outer surface of the main chamber and thereby rotate a portion of the paint roller located within the paint roller cleaner.
    Type: Grant
    Filed: October 31, 2011
    Date of Patent: March 18, 2014
    Inventor: Neil Frederick Pearce
  • Patent number: 8656936
    Abstract: Apparatuses, and related methods, for processing a workpiece that include a particular barrier structure that can overlie and cover a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular movable member that can be positioned over and moved relative to a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular ceiling structure that can overlie a processing chamber. Nozzle devices, and related methods, that include a particular annular body. Nozzle devices, and related methods, that include a particular first, second, and third nozzle structure.
    Type: Grant
    Filed: July 9, 2008
    Date of Patent: February 25, 2014
    Assignee: Tel FSI, Inc.
    Inventors: Jimmy D. Collins, Samuel A. Cooper, James M. Eppes, Alan D. Rose, Kader Mekias
  • Patent number: 8613288
    Abstract: Improved resistance to temperature-related degradation or deformation in a wafer-supporting chuck is provided by at least one shielding member that physically and/or thermally shields chuck components from effects of elevated temperature processing fluids.
    Type: Grant
    Filed: December 18, 2009
    Date of Patent: December 24, 2013
    Assignee: Lam Research AG
    Inventors: Michael Brugger, Otto Lach
  • Patent number: 8590550
    Abstract: A substrate holder is defined to support a substrate. A rotating mechanism is defined to rotate the substrate holder. An applicator is defined to extend over the substrate holder to dispense a cleaning material onto a surface of the substrate when present on the substrate holder. The applicator is defined to apply a downward force to the cleaning material on the surface of the substrate. In one embodiment the cleaning material is gelatinous.
    Type: Grant
    Filed: August 24, 2010
    Date of Patent: November 26, 2013
    Assignee: Lam Research Corporation
    Inventors: Mikhail Korolik, Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Mike Ravkin, Fritz Redeker
  • Patent number: 8578952
    Abstract: A substrate processing system which enables a minute piece of foreign matter attached to a substrate surface to be detected and are suitable for mass production of substrates. The substrate processing system has a substrate processing apparatus that carries out predetermined processing on a substrate. The substrate processing system comprises a substrate surface processing apparatus having a fluid supply unit that supplies onto a surface of the substrate a fluid containing an altering substance that alters a substance exposed at the surface of the substrate, and a substrate surface inspecting apparatus that inspects the surface of the substrate onto which the fluid has been supplied.
    Type: Grant
    Filed: June 13, 2011
    Date of Patent: November 12, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Hiroshi Nagaike, Tsuyoshi Moriya
  • Patent number: 8578953
    Abstract: A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to support the substrate at a second area of the back surface of the substrate, the second area being separated from the first area; a cleaning liquid supplying portion configured to supply cleaning liquid to the back surface of the substrate; a drying portion configured to dry the second area of the back surface of the substrate; and a cleaning portion configured to clean a third area of the back surface of the substrate when the substrate is supported by the first substrate supporting portion, the third area including the second area, and a fourth area of the back surface of the substrate when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area of the back
    Type: Grant
    Filed: December 14, 2007
    Date of Patent: November 12, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Yasushi Takiguchi, Taro Yamamoto, Akihiro Fujimoto, Shuuichi Nishikido, Dai Kumagai, Naoto Yoshitaka, Takahiro Kitano, Yoichi Tokunaga
  • Patent number: 8567420
    Abstract: A cleaning apparatus for a semiconductor wafer includes: a gas jet device including a gas nozzle which jets a first gas onto the surface of a semiconductor wafer to thin the thickness of a stagnant layer on the surface of the semiconductor wafer; and a two-fluid jet device including a two-fluid nozzle which jets droplet mist onto a region where thickness of the stagnant layer of the semiconductor wafer is thinned, the droplet mist being mixed two-fluid of a liquid and a second gas.
    Type: Grant
    Filed: March 27, 2009
    Date of Patent: October 29, 2013
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Minako Inukai, Hiroshi Tomita, Kaori Umezawa, Yasuhito Yoshimizu, Linan Ji
  • Publication number: 20130263897
    Abstract: A dielectric window cleaning apparatus may be used for cleaning a dielectric window of a plasma processing device. The dielectric window cleaning apparatus may comprise a window support base, a fluid containing enclosure, a window rotating mechanism, a spray arm, and multiple fluid spraying nozzles. The fluid containing enclosure may include at least one overflow containment sidewall and may be located at least partially under and at least partially around a portion of the window support base. The window rotating mechanism may be operatively connected to the window support base and may rotate the window support base. The spray arm may be in fluid communication with a fluid source and may include a fluid flow channel. The multiple fluid spraying nozzles may each expel fluid from the fluid flow channel in a window cleansing spray.
    Type: Application
    Filed: April 9, 2012
    Publication date: October 10, 2013
    Applicant: LAM RESEARCH CORPORATION
    Inventors: Armen Avoyan, Hong Shih, Cliff LaCroix, John Daugherty