Abstract: A dish-cleaning appliance comprising a sink having a bowl defining a wash chamber with an open top for providing access to the wash chamber. A liquid recirculation system is provided for spraying liquid onto the dish rack to effect the cleaning of any dishes along the rack. The lid is mounted to the sink and is movable to selectively cover the open top of the bowl. The lid includes a sound absorber and a sound dampener for reducing the transfer of sound from the wash chamber through the lid.

Abstract: A low-pressure dryer dries a substrate applied a coating solution thereon at low pressure. The dryer includes an airtight chamber installing a substrate table to place the substrate thereon; a diffuser plate, provided as facing the substrate placed on the substrate table with a gap, for discharging gas existing in the gap toward outside, the diffuser plate having a size almost the same as or larger than the substrate; a substrate-temperature adjuster, installed in the substrate table, for adjusting a temperature of the substrate; and a decompression mechanism for decompressing the airtight chamber. The diffuser plate has a temperature adjuster for making temperature adjustments to have a temperature difference between a first region and a second region of the diffuser plate, the first region facing a center region of the substrate, the second region being outside the first region and including a region facing an outer region of the substrate.

Abstract: A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

Abstract: A dishwasher includes a wash and rinse system that operates to dislodge soil particles that adhere to internal surfaces of a washing chamber. During wash and rinse cycles, the washing chamber is initially filled to a first level with washing fluid. The washing fluid is drawn into a wash system through operation of a pump, that causes the washing fluid in the washing chamber to fall to a second level, and directed to a spray arm that sprays jets of washing fluid onto the kitchenware. Thereafter, the wash system enters a pause period during which the washing fluid is caused to return to the first level in the washing chamber to loosen particles from walls of the chamber. After the pause period, the trajectory of the jets of washing fluid is varied to further clean the kitchenware and the internal surfaces of the washing chamber.

Abstract: A low-pressure dryer dries a substrate applied a coating solution thereon at low pressure. The dryer includes an airtight chamber installing a substrate table to place the substrate thereon; a diffuser plate, provided as facing the substrate placed on the substrate table with a gap, for discharging gas existing in the gap toward outside, the diffuser plate having a size almost the same as or larger than the substrate; a substrate-temperature adjuster, installed in the substrate table, for adjusting a temperature of the substrate; and a decompression mechanism for decompressing the airtight chamber. The diffuser plate has a temperature adjuster for making temperature adjustments to have a temperature difference between a first region and a second region of the diffuser plate, the first region facing a center region of the substrate, the second region being outside the first region and including a region facing an outer region of the substrate.

Abstract: A cleaning apparatus for medical and/or dental tool provides a possibility to clean the burrs and brushes (files) of the remained tooth material on them after operation on patient. An improved cleaning apparatus for medical and/or dental tool includes a container, comprising a neck with an opening and at least one of a plurality of apertures located in the lower part of the neck, a fluid stream reflector of a lid, which includes a connector comprising a fluid inlet pipe which is coupled by a tubular means with a fluid line via controllable valve, and a cylindrical stand connected to the base, providing a stable position of the container during cleaning process.

Abstract: The invention relates to an arrangement and a method for cleaning fine solid particles from a continuously flowing liquid suspension. According to the invention, alternate emptying of cleaned liquid in at least two decanting chambers (34, 36) of the cleaning arrangement (10) is brought about by alternately opening and closing valve units (48, 50) coordinated with outlets (44, 46) of the decanting chambers (34, 36). Alternatively, valves in feeds to at least two separate inlet tanks of the cleaning arrangement can be opened and closed alternately in order to bring about a continuous outflow of cleaned liquid.

Abstract: A semiconductor wafer cleaning apparatus includes a gas spraying unit, having a gas injection tube and a gas guard extending therearound, for spraying cleaning gas into a water layer formed on a wafer. The gas guard forms a small chamber just above the water layer, so that the partial pressure of gas injected from the gas injection tube is increased in the small chamber, whereupon the cleaning gas readily dissolves in the water layer. As a result, a cleaning solution having a high concentration of cleaning gas is produced, whereby the cleaning efficacy of the solution is high. Subsequently, a drying gas, such as isopropyl alcohol, for drying the wafer can be ejected onto the water layer using the gas spraying unit. Thus, the semiconductor wafer cleaning apparatus has a simple structure.

Abstract: The invention relates to a diffuser for wet processing systems involved in the manufacturing of semiconductor wafers. The diffuser includes a plenum section and a slitted section. Pressurized fluid from the plenum section is forced through the slitted section and across a plurality of wafers mounted in the wet processing system. One advantage is that by “diffusing” pressurized fluid through the slitted section, a generally uniform and/or laminar flow is achieved. Desirably, the diffuser provides a more reliable, and hence more cost-effective, technology for wet processing fabrication of semiconductor wafers.

Abstract: A device for cleaning roller covers. A spray head has a fluid inlet with a fastener collar and a fluid collection chamber in communication with the fluid inlet defined by a retention wall. A plurality of spray apertures are radially spaced within the retention wall to be adjacent the nap of a roller cover during use. A sealing surface positioned within the radius of the spray apertures seals off an end of the roller cover. A housing having an inner cavity for receiving roller covers has a diameter sized to create cleansing fluid flow through the nap of a roller cover. A plurality of outlet apertures in communication with the inner cavity are radially spaced to be adjacent fibrous portions of a roller cover during use. A drain outlet in communication with the outlet apertures drains fluid from the housing. An outwardly protruding flange about the housing coacts with a fastening ring to tighten the housing against the spray head.

Abstract: A dishwasher tub is provided with containment structure which prevents liquid from leaking around a door seal. The containment structure includes a bead that extends along side portions of a front flange of the dishwasher tub. At each lower portion of the front flange, the bead includes an inward and downward extending portion which leads to a substantially vertical portion, and finally to another inward and downward extending portion. The final two portions of the bead are arranged along a reduced dimension section of the front flange and define a trough which guides the liquid back into the tub.

Abstract: A single wafer cleaning chamber that includes a rotatable bracket that can place a wafer beneath an upper end of a catch cup during a wafer cleaning process, a gutter positioned above a wafer transfer slit; where the catch cup can mate with the gutter to create a gap, and with the upper end of the catch cup positioned at a height equal to or higher than the gutter.

Abstract: This invention relates to an apparatus for splash-back proofing, being used for treating a panel or substrate in photolithographic process. The present invention prevents a liquid (such as developer or photoresist solution) dripping on the surface of the substrate or panel from splashing back to the substrate or panel after scattering to the periphery of the substrate or panel by spin-coating. The splashing-back liquid will bring about defects in the patterning or photolithographic process, and result in deterioration of products. The apparatus for splash-back proofing includes a rotating device, at least a liquid spray unit, a guard means surrounding part of the rotating device and a roughening unit. Also, a method for splash-back proofing is disclosed.

Abstract: A spin-rinse-dryer (SRD) includes a substrate support adapted to hold and rotate a substrate, and a source of fluid adapted to supply fluid to the surface of a substrate positioned on the substrate support. The SRD also includes at least one shield positioned to receive fluid displaced from a substrate rotating on the substrate support. The shield includes a substrate-facing surface that has been particle-blasted to cause the substrate-facing surface to have a hydrophilic characteristic.

Abstract: An apparatus comprising multiple heating, cooling, and/or cleaning zones. The apparatus produces a jet flow of solvent/cleaning fluid onto an article to be cleaned without the need for a pump or compressor. The jet flow provides more effective contaminant removal. The multiple zones result in increased residence time for increased efficiency in separating the solubilized contaminant from the solvent/cleaning fluid.

Abstract: A low-pressure dryer dries a substrate applied a coating solution thereon at low pressure. The dryer includes an airtight chamber installing a substrate table to place the substrate thereon; a diffuser plate, provided as facing the substrate placed on the substrate table with a gap, for discharging gas existing in the gap toward outside, the diffuser plate having a size almost the same as or larger than the substrate; a substrate-temperature adjuster, installed in the substrate table, for adjusting a temperature of the substrate; and a decompression mechanism for decompressing the airtight chamber. The diffuser plate has a temperature adjuster for making temperature adjustments to have a temperature difference between a first region and a second region of the diffuser plate, the first region facing a center region of the substrate, the second region being outside the first region and including a region facing an outer region of the substrate.

Abstract: An active rinse shield designed to protect electrofill chemical baths from excessive dilution during rinse sprays on the semiconductor wafer. The shield uses overlapping blades to cover the bath, making a physical barrier between the bath chemistry and the wafer rinse water. The blades are interconnecting ribs that actuate around a common pivot axis. A linear mechanical actuator controls the blade movement, moving the top-most blade, which in turn, moves an adjacent lower blade. Each upper blade is interconnected to an adjacent lower blade by upper and lower ledges, a pivot boss and interlocking cut, and a curved ledge on each blade's body surface. The interconnecting features allow the blades to move one another out for extension or in for retraction. The interlocking blades are inclined above one another, forming grooves to redirect the rinse water away from the chemical bath.

Abstract: A dishwasher tub is provided with containment structure which prevents liquid from leaking around a door seal. The containment structure includes a bead that extends along side portions of a front flange of the dishwasher tub. At each lower portion of the front flange, the bead includes an inward and downward extending portion which leads to a substantially vertical portion, and finally to another inward and downward extending portion. The final two portions of the bead are arranged along a reduced dimension section of the front flange and define a trough which guides the liquid back into the tub.

Abstract: A blanket wash head for cleaning the blanket cylinder of a printing press comprises a plurality of bristles arranged on a brush that are sized to contact a flicker bar disposed within the blanket wash head. The bristles are arranged to travel along a path and to collect debris and/or moisture. The bristles comprises a leading bristle and a trailing bristle and, in response to rotation of the brush, an end of the trailing bristle swings along an arc caused by contact with a flicker bar. The bristles are spaced on the brush according to a low density cause the trailing bristle to swing though an arc a sufficient distance sufficient to dislodge the debris without interference with the leading bristle.

Abstract: A sulfuric acid recycle apparatus capable of concentrating sulfuric acid, which is lowered in concentration upon completion of a wafer cleaning process, to a level to be recycled is provided. The sulfuric acid recycle apparatus for recycling sulfuric acid in a wafer cleaning fluid prepared by mixing sulfuric acid and hydrogen peroxide solution comprises a reaction bath having two openings formed of at least an introduction port and a discharge port for obtaining concentrated sulfuric acid by concentrating sulfuric acid in the wafer cleaning waste fluid introduced from the introduction port upon completion of a wafer cleaning process, then discharging the concentrated sulfuric acid from the discharge port, a wafer processing bath for processing wafers, and a supply unit for supplying the concentrated sulfuric acid to the wafer processing bath.

Abstract: In a first aspect, a first apparatus is provided. The first apparatus includes (1) a tank adapted to contain fluid; (2) at least one support component mounted in the tank and adapted to support a substrate in a supported position at least partially submerged in the fluid; (3) a transducer adapted to output sonic energy into the fluid; and (4) a reflector positioned at a side of the substrate and adapted to reflect the sonic energy toward an edge of the substrate so as to provide a 100% duty cycle. The reflector is positioned such that the reflector does not obstruct a path employed to load the substrate into the supported position and to unload the substrate from the supported position. Numerous other aspects are provided.

Abstract: A cleaning apparatus for medical and/or dental tool provides a possibility to clean the burrs and brushes (files) of the remained tooth material on them after operation on patient. An improved cleaning apparatus for medical and/or dental tool includes a container, comprising a neck with an opening and at least one of a plurality of apertures located in the lower part of the neck, a fluid stream reflector of a lid, which includes a connector comprising a fluid inlet pipe which is coupled by a tubular means with a fluid line via controllable valve, and a cylindrical stand connected to the base, providing a stable position of the container during cleaning process.

Abstract: The present invention provides an apparatus for removing an edge bead from a substrate. The apparatus includes a substrate support member, a plurality of mounting posts positioned along a perimeter of the substrate support member, and a rigid annular capillary ring mounted to the plurality of mounting posts. The rigid annular capillary ring includes a substantially planar upper capillary surface and is configured to maintain the substantially planar capillary surface when attached to the mounting posts.

Abstract: The invention is directed to a cleaning device (RV) for cleaning objects of personal use, in particular a shaving head (S) of a shaving apparatus (TR), with a housing (1) having a cleaning bath (8), with a cleaning liquid container (3) containing a cleaning liquid (11), with an integrated filter element (4) as well as with a liquid impelling assembly (6) adapted to be driven by a motor (5) and having a supply conduit (7) to the cleaning bath (8) and a draining conduit (9) to the cleaning liquid container (3), wherein all the walls of the cleaning bath (8) have an angle of inclination (&agr; and &bgr;) in the direction of the draining conduit (9) which ensures that cleaning liquid (11), with or without contaminants, flows to the draining conduit (9).

Abstract: A dishwasher is provided such that an impurity-collecting filter collecting impurities is detachably mounted to a front of a cabinet, thus allowing the impurity-collecting filter to be easily cleaned, and keeping a bottom of a washing tub cleaner. The dishwasher includes a cabinet, the washing tub provided in the cabinet, a water container installed under the washing tub collecting wash water, and the impurity-collecting filter provided in the water container collecting the impurities contained in the wash water. The impurity-collecting filter is removably mounted in the water container through an external surface of the cabinet at a position around the water container.

Abstract: The invention relates to a diffuser for wet processing systems involved in the manufacturing of semiconductor wafers. The diffuser includes a plenum section and a slitted section. Pressurized fluid from the plenum section is forced through the slitted section and across a plurality of wafers mounted in the wet processing system. One advantage is that by “diffusing” pressurized fluid through the slitted section, a generally uniform and/or laminar flow is achieved. Desirably, the diffuser provides a more reliable, and hence more cost-effective, technology for wet processing fabrication of semiconductor wafers.

Abstract: An improved wash tube is provided for a dishwasher. The wash tube is mounted on the upper rack and has a first end adapted to be releasably docked with the water manifold in the back of the dishwashing chamber as the rack is moved between the extended loading position and the retracted wash position. The inner end of the wash tube includes a curved cap which increases the docking tolerance and which presents a substantially downwardly oriented water inlet to the wash tube. The cap creates water stagnation adjacent the inlet such that the water velocity is substantially reduced and the pressure increased. The second end of the wash tube is connected to the spray arm which rotates as water is ejected from the spray arm nozzles at increased pressure. The cap allows the wash tube to fully dock into the manifold without obstructing the water inlet.

Abstract: An apparatus that includes a rotatable single wafer holding bracket with one or more wafer supports disposed on the single wafer holding bracket, wherein the one or more wafer supports position a center of a wafer to be off-center from an axis of rotation of the single wafer holding bracket.

Abstract: A workpiece holder for processing a workpiece in a chamber of a liquified fluid. In one embodiment, the workpiece holder includes a cylindrically shaped rotator having an exterior wall and at least one fluid guide on the exterior wall. The rotator is adapted to rotate and provide fluid flow across a first end of the rotator, and is adapted to provide fluid flow and mixing perpendicular to a surface of the first end of the rotator. A fixture is coupled to the first end of the rotator for securing the workpiece to the first end of the rotator.

Abstract: A single wafer cleaning chamber that includes a rotatable bracket that can place a wafer beneath an upper end of a catch cup during a wafer cleaning process, a gutter positioned above a wafer transfer slit; where the catch cup can mate with the gutter to create a gap, and with the upper end of the catch cup positioned at a height equal to or higher than the gutter.

Abstract: A cleaning apparatus for electric shaver components has a removable basket that fits inside a compartment. Cleaning is carried out by pumping cleaning fluid and air into a bottom of the compartment via a sieve plate. Debris removed from the components is collected in one compartment of a reservoir. The level of the water in the reservoir is maintained and controlled by the provision of an overflow pipe.

Abstract: A shield or deflector for a dishwashing machine rack is disclosed. The deflector has a bottom wall and a front wall that permits food particles to be caught or deflected away from the floor when the rack extends beyond the door of the dishwashing machine when the door is in an open position. The deflector is removably or permanently mounted on the rack.

Abstract: The invention relates to an arrangement for a process washing apparatus, whereby a process device is washable by means of the apparatus by means of a washing device, that moves inside the same. The washing device (1) is connected moveably in connection with the process device by means of fastening means (2) and the washing medium of the washing device is arranged to be led at least partly inside the body (1a) of the washing device in order to spray the washing medium by nozzles (1b) or like existing in the body (1a) of the washing device. The washing device is arranged to be used by means of a driving device (K), such as a running motor (K1) and gear (K2) or a like. The arrangement comprises protecting means (SE) in order to protect the driving device (K) from its surroundings by a casing structure covering the same essentially overall.

Abstract: The invention relates to a diffuser for wet processing systems involved in the manufacturing of semiconductor wafers. The diffuser includes a plenum section and a slitted section. Pressurized fluid from the plenum section is forced through the slitted section and across a plurality of wafers mounted in the wet processing system. One advantage is that by “diffusing” pressurized fluid through the slitted section, a generally uniform and/or laminar flow is achieved. Desirably, the diffuser provides a more reliable, and hence more cost-effective, technology for wet processing fabrication of semiconductor wafers.

Abstract: The invention relates to a diffuser for wet processing systems involved in the manufacturing of semiconductor wafers. The diffuser includes a plenum section and a slitted section. Pressurized fluid from the plenum section is forced through the slitted section and across a plurality of wafers mounted in the wet processing system. One advantage is that by “diffusing” pressurized fluid through the slitted section, a generally uniform and/or laminar flow is achieved. Desirably, the diffuser provides a more reliable, and hence more cost-effective, technology for wet processing fabrication of semiconductor wafers.

Abstract: The invention relates to a diffuser for wet processing systems involved in the manufacturing of semiconductor wafers. The diffuser includes a plenum section and a slitted section. Pressurized fluid from the plenum section is forced through the slitted section and across a plurality of wafers mounted in the wet processing system. One advantage is that by “diffusing” pressurized fluid through the slitted section, a generally uniform and/or laminar flow is achieved. Desirably, the diffuser provides a more reliable, and hence more cost-effective, technology for wet processing fabrication of semiconductor wafers.

Abstract: To completely disinfect a soft cable and a forceps hole of the used endoscope.

Abstract: The present invention 10 discloses a device for cleaning and sanitizing objects such as food products 86, cartridge filter elements 64 and other such objects that could benefit from the advantages of being circumferentially sprayed with a fluid or a cleaning solution 119 or preferably a combination thereof. The present invention 10 comprises an inner and outer housing body 24, 44, a cover 26 for the housing body, a rotative central member such as a base, axle or shaft 42, a rotative drive means 60 for selectively rotating the rotative member 42, intake means 16 to introduce one or more fluids 119 or solutions individually or in combination into the interior of the housing body 24 including a means for further pressurizing and peripherally directing the resulting spray 130 towards a central point in a specific array, a containment means 66 for placement of such items therein, and an outlet means 18 to provide for the removal of fluid from the housing.

Abstract: A probe wash vessel characterized as having a cylindrical-shaped, outer test tube with at least two vertically aligned faucets, and an inner cannula positioned within the test tube, wherein the inner cannula is characterized by a top funnel opening attached to a stem, the stem characterized as having two arm extensions are attached to the two faucets, wherein washing fluid influent and effluent through the arm extensions washes a probe inserted through the top funnel into the stem.

Abstract: A lift-off procedure is provided which enables prevention of damage to a wiring pattern caused by contact of a metal being peeled off from a wafer with a wiring pattern at a time of lift-off procedure. A wafer having a surface on which a pattern is formed which contains a pattern portion to be removed is soaked into a chemical liquid at an angle at which the surface faces downward.

Abstract: A cleaning apparatus capable of sufficiently removing foreign matters such as coating or labels from surfaces of crushed pieces of the collected polymeric mold product is provided. The cleaning apparatus includes a cleaning bath provided with a rotary shaft extending in the longitudinal direction and having a water supply port, a drainage port as well as an introduction port and a discharging port for polymeric pieces, screw sections having a screw provided on the rotary shaft and flow-path restricting sections having stationary plates standing upright from the inner surface of the cleaning bath to restricting the advancement of water caused by the screw, wherein at least part of a surface of the stationary plate is roughened.

Abstract: The present invention pertains to apparatus and methods for maintaining wafer back side, bevel, and front side edge exclusion during supercritical fluid processing. Apparatus of the invention include a pedestal and an exclusion ring. When the exclusion ring is engaged with the pedestal a channel is formed. A reactant-free supercritical fluid is passed through the channel and over a circumferential front edge of a wafer. The flow of reactant-free supercritical fluid protects the bevel and circumferential front edge of the wafer from exposure to reactants in a supercritical processing medium. The back side of the wafer is protected by contact with the pedestal and the flow of reactant-free supercritical fluid. Exclusion rings of the invention, when engaged with their corresponding pedestals make no or very little physical contact with the wafer front side.

Abstract: The invention relates to a diffuser for wet processing systems involved in the manufacturing of semiconductor wafers. The diffuser includes a plenum section and a slitted section. Pressurized fluid from the plenum section is forced through the slitted section and across a plurality of wafers mounted in the wet processing system. One advantage is that by “diffusing” pressurized fluid through the slitted section, a generally uniform and/or laminar flow is achieved. Desirably, the diffuser provides a more reliable, and hence more cost-effective, technology for wet processing fabrication of semiconductor wafers.

Abstract: The invention relates to a device for treating at least one bottom of a disc-shaped object.

Abstract: A device for cleaning the interior and exterior of a colostomy pouch or the like. The device includes a middle water sprayer for cleaning the interior of the pouch and two lateral water sprayers for cleaning the exterior of the pouch. The water sprayers are attached to a conduit which is connected to a source of water such as a flexible hose connected to a faucet. A water shield is provided to prevent the operator from being sprayed during the cleaning procedure. The waste material cleaned from the pouch is discharged through the spray shield into a conventional toilet where the water and waste is removed by flushing the toilet.

Abstract: A powered utensil basket is provided that captures a jet stream emanating from a nozzle located along a rear wall of a wash-tank type pot and pan washing machine. The nozzle directs the jet stream towards a bottom wall of the utensil basket. The jet stream is diverted from the bottom wall of the utensil upward and forward toward a front wall of the basket where it is diverted upward and rearward toward a rear wall of the basket. At the rear wall of the basket, the jet stream is again diverted downward towards the bottom wall where the jet stream is then diverted forward again towards the front wall. This diversion of the jet stream creates a washing action within the utensil basket that is substantially similar to the washing action of the washing machine.

Abstract: A washing and recycling unit for on-site washing of heavy machinery. The unit has a supporting frame onto which is mounted a washing liquid storage link. A washing hose arrangement connected to the tank injects washing liquid over the heavy machinery. A drainage receptacle positioned under the heavy machinery collects used liquid mixture falling from the heavy machinery. The used liquid mixture is sucked up with a suction hose connected to a cyclone which separates rough solids from liquids. A pump filtering arrangement recycles liquid from a settling tank under the cyclone by pumping it out, filtering it and transferring it into the washing liquid storage tank. A hoisting system mounted onto the supporting frame is used to movably support an operator directing the washing liquid around the heavy machinery.

Abstract: A device for washing and drying foods has an elastic sleeve-shaped body having two opposite ends, one of the ends being fixable elastically and water tightly onto an edge of a container, a filter provided with a plurality of openings for water to run through and arranged in another end of the body and a closing cap adapted to close and to open the filter.

Abstract: A processing tank has at least one fluid distribution device for introducing a treatment fluid. The fluid distribution device has at least one porous hollow rod, at least one porous plate, at least one capillary plate, or at least one single-ply or multi-ply fabric.

Abstract: An inventive vertical spin-dryer is provided. The inventive spin-dryer may have a shield system positioned to receive fluid displaced from a substrate vertically positioned within the spin-dryer. The shield system may have one or more shields positioned to at least partially reflect fluid therefrom as the fluid impacts the shield. The one or more shields are angled to encourage the flow of fluid therealong, and are preferably hydrophilic to prevent droplets from forming. Preferably the shield system has three shields positioned in a horizontally and vertically staggered manner so that fluid is transferred from a substrate facing surface of a first shield to the top or non-substrate-facing surface of an adjacent shield, etc. A pressure gradient may be applied across the interior of the spin-dryer to create an air flow which encourages fluid to travel along the shield system in a desired direction.