Abstract: An apparatus and associated method are provided for treating a workpiece with a cryogenic impingement fluid. A fixture supports the workpiece in an upright position and operably connects an electrical component of the workpiece to a power source in the supported position. A cryogenic impingement fluid applicator sprays a stream of the cryogenic impingement fluid against the supported workpiece and laterally moves the stream in accordance with a predetermined path. A shield deflects the stream of cryogenic impingement fluid to prevent the stream from contacting at least a part of the workpiece as the stream is moved along the predetermined path.

Abstract: A device (11) for cleaning a pleated filter element, the device having; a body, a fluid inlet (13), a work face (14) having at least one pleat separating projection (19) and at least one fluid outlet (22) for directing fluid between pleats separated thereby.

Abstract: A coating apparatus includes a liquid film forming mechanism configured to form a liquid film of a process liquid for preventing a contaminant derived from a coating liquid from being deposited or left on a back side peripheral portion of a substrate. The liquid film forming mechanism includes a counter face portion facing the back side peripheral portion of the substrate and a process liquid supply portion for supplying the process liquid onto the counter face portion. The coating apparatus further includes a posture regulating mechanism disposed around the substrate holding member and configured to damp a vertical wobble of the peripheral portion of the substrate being rotated. The posture regulating mechanism includes delivery holes arrayed in a rotational direction of the substrate and configured to deliver a gas onto a back side region of the substrate on an inner side of the peripheral portion.

Abstract: A water-conducting household machine, specifically a dishwasher, includes a compartment having a closable compartment opening, and at least one washing device for generating at least one water jet in the compartment. At least one baffle plate is disposed on an inner side of the compartment in at least one area of impact of the water jet and in such a way as to be vibration-free for noise reduction, particularly for noise damping and/or sound insulation.

Abstract: The present invention relates to an apparatus for cleaning a painting tool. The apparatus comprises an inlet for inflow of cleaning fluid, a first compartment in fluid communication with the inlet for buffering the cleaning fluid, a second compartment for insertion of a painting tool, where the second compartment is separated from the first compartment by a partition wall including one or more openings for the cleaning fluid buffered in the first compartment to pass through to the second compartment, and a dispersing element for dispersing at least a portion of the cleaning fluid passing through the one or more openings onto the painting tool.

Abstract: A substrate processing method and apparatus can securely carry out a pre-plating treatment that enables uniform plating in the necessary area of the surface of a substrate. The substrate processing method carries out a cleaning treatment and a catalyst-imparting treatment of a surface of a substrate as pre-plating treatments and then electroless plates a metal film on the catalyst-imparted surface of the substrate. The cleaning treatment is carried out in a wider area of the surface of the substrate than that area to which a catalyst is imparted by the catalyst-imparting treatment.

Abstract: A pet waste disposal device having a motor driving a set of cutting blades inside of an open ended plenum. A water supply such as a garden hose provides water to a nozzle or jet inside of the plenum, the water washes away the waste as it is chopped by the blades. The motor may be electrical, gasoline driven, or water driven. The plenum may have a safety screen across the open end. In preferred embodiments, the device may be mounted on an elongated support with a hand grip at one end and the plenum and motor at the other end.

Abstract: A wash element for washing one or more reusable fluid manipulators is provided comprising at least one nozzle for connection to a fluid pump to generate a fluid jet and at least one deflector surface positioned to deflect the fluid jet towards a washing zone for receiving at least a portion of the fluid manipulator. The deflector surface is being shaped to broaden the fluid jet. The invention further relates to a wash station having a cavity provided with one or more wash elements. The invention yet further relates to an automated system for manipulating fluids comprising at least one wash station and a controller set up to control washing the fluid manipulator. In a process for washing the reusable fluid manipulator at least a portion of the fluid manipulator is moved in a washing zone, a fluid jet of washing fluid is generated and directed onto a deflector surface shaped to broaden and deflect the fluid jet towards the washing zone.

Abstract: Embodiments of the invention generally relate to apparatus and methods for cleaning chamber components using a cleaning plate. The cleaning plate is adapted to be positioned on a substrate support during a cleaning process, and includes a plurality of turbulence-inducing structures. The turbulence-inducing structures induce a turbulent flow of cleaning gas while the cleaning plate is rotated during a cleaning process. The cleaning plate increases the retention time of the cleaning gas near the showerhead during cleaning. Additionally, the cleaning plate reduces concentration gradients within the cleaning plate to provide a more effective clean. The method includes positioning a cleaning plate adjacent to a showerhead, and introducing cleaning gas to the space between the showerhead and the cleaning plate. A material deposited on the surface of the showerhead is then heated and vaporized in the presence of the cleaning gas, and then exhausted from the processing chamber.

Abstract: Rinsing methodologies and components to accomplish rinsing of tool surfaces in tools that are used to process one or more microelectronic workpieces. The invention can be used to rinse structures that overlie a workpiece being treated in such a manner to function in part as a lid over the process chamber while also defining a tapering flow channel over the workpiece. Rather than spray rinsing liquid onto the surface in a manner that generates undue splashing, droplet, or mist generation, a swirling flow of rinse liquid is generated on a surface of at least one fluid passage upstream from the surface to be rinsed. The swirling flow then provides smooth, uniform wetting and sheeting action to accomplish rinsing with a significantly reduced risk of generating particle contamination.

Abstract: A surface cleaning system having a storage container, debris collection apparatus and debris conduit is disclosed. Water discharged from spray nozzles configured in a circular arrangement forces debris into a debris collection ring and then a debris conduit. An auger, water pressure or air pressure is used to force the debris through debris conduit into the storage container for disposal. The design of the debris collection apparatus also facilitates the capture of most of the water used to force the debris into the debris collection apparatus. Accordingly, the system is able to reuse the water thereby extending the surface area that may be cleaned with a specified amount of water.

Abstract: A dish washing machine capable of smoothly discharging dirt contained in wash water out of a sump so as to prevent the emission of bad smells from the dirt and prevent the propagation of bacteria. The dish washing machine includes a sump to receive and pump wash water, a sump housing forming an external appearance of the sump, a drainage pump coupled with the sump housing to discharge wash water and dirt, and a drainage channel disposed in the sump housing to guide wash water and dirt to the drainage pump.

Abstract: A pet waste disposal device having a motor driving a set of cutting blades inside of an open ended plenum. A water supply such as a garden hose provides water to a nozzle or jet inside of the plenum, the water washes away the waste as it is chopped by the blades. The motor may be electrical, gasoline driven, or water driven. The plenum may have a safety screen across the open end. In preferred embodiments, the device may be mounted on an elongated support with a hand grip at one end and the plenum and motor at the other end.

Abstract: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.

Abstract: A device for treating pieces of a substrate at high pressure, piece by piece or in batches, with a treatment medium in the supercritical or near-critical state, includes a first pressure chamber, a pipe system for supplying and discharging the treatment medium, to and from the pressure chamber under high pressure and an electric motor, which is fixed to the housing in the first pressure chamber or in a second pressure chamber coupled to the first pressure chamber under the high pressure, for driving an actuator to carry out a mechanical action in the treatment medium. The electric motor is in this case open to the treatment medium and is disposed and designed to be accessible to the treatment medium, in such a manner that during the treatment of a substrate the treatment medium flows through and around the electric motor.

Abstract: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.

Abstract: In a method of cleaning an ejection face by supplying a head liquid on a surface (ejection face) of an inkjet head provided with ink ejection outlets, and then by performing wiping operations thereon, an ink residue on the ejection face is efficiently and surely removed from the ejection face to achieve a sufficient cleaning thereon. For this purpose, a first wiping operation is first performed such that a wiper (9A) is relatively largely bent, and slidingly contacts the ejection face at an abdomen thereof to efficiently perform the application, stirring and mixing of the head liquid. Then, a second wiping operation is performed such that an edge portion of the top end of a wiper (9B) slidingly contacts the surface to efficiently scrape the mixture of the head liquid and the ink residue.

Abstract: An apparatus for removing particles from a shaft includes a housing having a bore that receives the shaft. The housing includes an inlet port coupled to a pressurized fluid supply, a manifold chamber in communication with the inlet port, and a plurality of bores in communication with the manifold chamber and adjacent the shaft such that the fluid flowing through the bores impinges on the shaft. The bores are angled to produce a spiraling flow pattern about the shaft. A method of removing particles from a shaft includes directing a flow of a fluid onto the surface of the shaft in a generally spiraling pattern, and removing particles from the shaft using the spiraling flow.

Abstract: Apparatus to clean silicon electrode assembly surfaces which controls or eliminates possible chemical attack of electrode assembly bonding materials, and eliminates direct handling contact with the parts to be cleaned during acid treatment, spray rinse, blow dry, bake and bagging. Aspects of the apparatus include a kit including an electrode carrier to hold an electrode assembly, a treatment stand to allow access to the electrode assembly, a spider plate to clamp the electrode assembly in the electrode carrier, a nitrogen purge plate to supply nitrogen gas to the backside of the electrode assembly during acid cleaning of the electrode, a water rinse plate to supply water to the electrode face, a blow dry plate to supply nitrogen to dry the electrode assembly and a bake stand to support the electrode assembly during a bake before placing the clean electrode assembly in a bag.

Abstract: A drawer-type dishwasher includes a tub having front, rear, bottom and opposing side walls that collectively define a washing chamber and a lid shiftably mounted relative to the tub for selectively closing the washing chamber. A dispenser is mounted to one of the front, rear and opposing side walls and includes a detergent storage portion that is selectively exposed to release detergent into the washing chamber. The lid includes a dispenser rinse system having an inlet portion and an outlet portion, with the outlet portion guiding a flow of water from the lid onto the dispenser to wash out the detergent storage portion and fill the washing chamber. The outlet portion is preferably provided with a shaped contour and a wall that ensures that the all detergent is washed out from the dispenser.

Abstract: A jetspray nozzle for cleaning a photolithographic mask or semiconductor wafer and method for cleaning the same. The jetspray nozzle in one embodiment includes a water supply inlet, a gas supply inlet, a first row of gas injection nozzles communicating with the gas supply inlet, a mixing cavity defining a jetspray nozzle outlet, and a flow mixing baffle disposed in the cavity. The mixing baffle preferably is configured and arranged to combine gas and water in the jetspray nozzle for delivering a concentrated stream of gas with a cluster of micro water droplets entrained in the gas for removing contaminant particles from the mask. The jetspray nozzle is capable of cleaning photo masks or wafers without the use of chemicals. In one embodiment, the water may be deionized water and the gas may be nitrogen. In another embodiment, the jetspray nozzle further includes a second row of gas injection nozzles spaced above or below the first row of gas injection nozzles that communicate with the gas supply inlet.

Abstract: According to certain embodiments of the invention, a pressure washing system delivers a cleaning fluid under pressure to a surface to be cleaned, and includes a fluid pump unit for supplying the fluid to the surface. A fluid collector captures wastewater runoff of the cleaning fluid on the surface to be cleaned. The vacuum pump unit withdraws the captured waste fluid from the fluid collector.

Abstract: In the vicinity of a rim portion of a spin base 5, a plurality of supports 7 which abut on a bottom rim portion of a substrate W and support the substrate W are formed projecting toward above from the spin base 5. The substrate W is supported horizontally by the plurality of supports 7, with a predetermined distance ensured from the spin base 5 which opposes the bottom surface of the substrate W. Into the space which is created between the top surface of the substrate W and an opposing surface 9a of an atmosphere blocker plate 9, inert gas is ejected from a plurality of gas ejection outlets 9b which are formed in the opposing surface 9a. The inert gas thus supplied to the top surface of the substrate W presses the substrate W against the supports 7 and the substrate W is held at the spin base 5.

Abstract: A conveyor warewasher includes splash curtains that function differently according to their orientation. The top connection part of the splash curtains and the connections mounted on the warewasher are designed to attach the curtain only when the curtain is hung in the proper orientation and not when the curtain is hung in reverse. A splash curtain for a warewasher includes functionally distinct front and rear sides. The arrangement of hook-receptive slots on the splash curtain is asymmetric so that the hook arrangement that they will receive differs when the curtain's orientation is reversed.

Abstract: Disclosed is a device for wet treatment of plate-like articles including: a first plate holding elements for holding a single plate-like article substantially parallel to the first plate, first dispensing elements for introducing liquid into a first gap between said first plate and a plate-like article when being treated, wherein the first plate is a silicon plate, which consists at least 99 wt % of silicon, the silicon plate being in contact with the treatment liquid, when the plate-like article is treated. Further disclosed is a method associated therewith.

Abstract: A foam-assisted wafer-cleaning and drying method and apparatus based on forming a funnel-shaped space between the base plate of the apparatus and the wafer to be cleaned and supplying a foam cleaning liquid to the aforementioned space through the central opening of the base plate for displacing the cleaning liquid foam consisting of a plurality of bubbles from the center of the wafer toward the wafer periphery with a constant speed of movement of the bubbles provided by gradually decrease of distance from the base plate to the wafer in the radial outward direction from the center of the wafer. The nanoparticles of contaminants are caught with a surface-tension force developed by bubble meniscuses on the wafer surface.

Abstract: Systems and methods for processing microfeature workpieces are disclosed herein. In one embodiment, the system comprises a processing chamber having a workpiece processing site configured to receive a microfeature workpiece and a main inlet through which a processing fluid can flow into the processing chamber. The system further comprises a plate in the processing chamber between the main inlet and the workpiece processing site. The plate has a first side generally facing the main inlet and a second side opposite the first side. The plate further includes a plurality of passageways extending from the first side of the plate to the second side. The individual passageways include an inlet portion projecting from the first side of the plate by a separation distance.

Abstract: A surface cleaning system having a storage container, debris collection apparatus and debris conduit is disclosed. Water discharged from spray nozzles configured in a circular arrangement forces debris into a debris collection ring and then a debris conduit. An auger, water pressure or air pressure is used to force the debris through debris conduit into the storage container for disposal. The design of the debris collection apparatus also facilitates the capture of most of the water used to force the debris into the debris collection apparatus. Accordingly, the system is able to reuse the water thereby extending the surface area that may be cleaned with a specified amount of water.

Abstract: A wash cylinder or chamber for an automated cleaning station to clean an object or a person's body part includes nozzles on the interior of the cylinder, the nozzles of one embodiment comprising an increasing roll angle providing a novel spray pattern. Additionally, embodiments of the invention include fluid guidance and conveyance structures, angled nozzles, sealing structures, finger guards, nozzle ribs, wash chamber seating mechanisms and drains, and nozzle inlays having a plurality of nozzles. Also disclosed are methods of washing an object or body part using a wash cylinder or chamber and methods of assembling a wash cylinder or chamber.

Abstract: A dish washing machine including a tub configured to form a space for a dish to be washed, a door configured to open or close the tub, and an exhaust duct extended to an under portion of the door to exhaust air in the tub. Further, the exhaust duct has a lower end sloped with respect to an installation surface of the dish washing machine.

Abstract: A lid for a semiconductor device processing apparatus is provided. The lid comprises a cover having an opening and a wall formed around the opening, the wall adapted to prevent fluid present on the lid from entering a body of the processing apparatus through the opening, and one or more cover edges including one or more edge walls; an outer door adapted to prevent fluid from entering the body of the processing apparatus through the opening of the cover, wherein the outer door interfaces with the wall formed around the opening and the one or more edge walls; and an inner door coupled to the outer door and adapted to prevent fluid from exiting the body of the processing apparatus through the opening of the cover. Numerous other aspects are provided.

Abstract: The present invention discloses a washer for washing produce such as potatoes. In one aspect, a debris removal section removes debris, such as rocks, and a sloped serpentine flume is used to gravity feed the produce through a serpentine flow path to remove the surface dirt and loosen any embedded dirt. The produce can be optionally routed to a spray washer to remove embedded dirt.

Abstract: An apparatus and method for commissioning steam turbine generator power plants to advance the cleanliness of the complete steam cycle by the conditioned discharge of steam to the plant surface condenser.

Abstract: An appliance comprising a sealable chamber (10) and a door (12) for the sealable chamber (10), wherein in an opened position the door (12) allows access to the chamber (10); and a venting system for allowing air to escape from the sealable chamber (10) when the door (12) is in closed position, wherein the venting system includes a vent flap (11), the vent flap (11) moveable from a closed position sealing the vent system to an open position allowing air to escape. The venting system allows an appliance, such as dishwasher, to expel unwanted air or vapour in a controlled manner whilst the appliance remains closed.

Abstract: The invention aims at improving a cleaning fluid container (3) for a cleaning device (RV) for personal needs, in particular for cleaning a shaving head (SK) of a dry shaving apparatus (R), with a housing (20), with an inlet port (15) provided on the housing (20) to admit cleaning fluid (11), with an outlet port (14) equally provided on the housing (20) to discharge the cleaning fluid (11), and with a filter element (F), said filter element (F) being provided with filter pores for filtering out solid particles, particularly hair particles, and being arranged in a flow area between the inlet port (15) and the outlet port (14), in a manner enabling the pump capacity to be significantly reduced or the service life of a cartridge (K) to be substantially increased. This is accomplished in that the filter element (F) has pores of a size causing part of the particles to penetrate the filter element (F) according to their size.

Abstract: A wafer processing chamber “chamber” is provided. Broadly speaking, the chamber allows a fluid flow and a fluid pressure within the chamber to be controlled in a variable manner. More specifically, the chamber utilizes removable plates that can be configured to control the fluid flow and the fluid pressure in an inner volume within the chamber. Also, the removable plates can be used to separate the inner volume within the chamber from an outer volume within the chamber. In this manner, the removable plates can be used to create a pressure differential between the inner volume within the chamber and the outer volume within the chamber. A lower pressure in the outer volume within the chamber requires less outer chamber strength to withstand the lower pressure. A lower outer chamber strength requirement translates into an overall decrease in chamber size.

Abstract: A pool filter cleaning device (1) which allows a person to thoroughly clean a filter cartridge (15) quickly and easily with minimal amount of splash back. The pool filter cleaning device (1) is comprised of a handle (2), an angled head section (12), a shield (6) and a nozzle (8). The device (1) is attachable to standard garden hoses (3) and utilizes water pressure to clean the cartridge filter (15). The handle (2) is attached to an angled head section (12) having a preferably transparent shield (6) attached therebetween. The head section (12) is angled so as to provide a more comfortable cleaning position for a user. The shield (6) has a duel purpose as it separates the pleats (16) on the cartridge filter (15) and prevents water and debris from splashing back onto the user.

Abstract: A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

Abstract: A spray clean stage of a pretreatment system for treating a product surface having contaminants includes a tank for holding a cleaning solution to clean the product surface. A solution applicator is in fluid communication with the tank through an applicator inlet. The solution applicator is oriented to spray the solution onto the product surface thereby removing the contaminants from the product surface. A partition at least partially covers the tank and receives runoff of the solution from the product surface being sprayed with the solution. The partition is oriented to direct the runoff of solution from the product surface into the tank at a location spaced from the applicator inlet to distance the contaminants removed from the product surface from the applicator inlet.

Abstract: An inventive vertical spin-dryer is provided. The inventive spin-dryer may have a shield system positioned to receive fluid displaced from a substrate vertically positioned within the spin-dryer. The shield system may have one or more shields positioned to at least partially reflect fluid therefrom as the fluid impacts the shield. The one or more shields are angled to encourage the flow of fluid therealong, and are preferably hydrophilic to prevent droplets from forming. Preferably the shield system has three shields positioned in a horizontally and vertically staggered manner so that fluid is transferred from a substrate facing surface of a first shield to the top or non-substrate-facing surface of an adjacent shield, etc. A pressure gradient may be applied across the interior of the spin-dryer to create an air flow which encourages fluid to travel along the shield system in a desired direction.

Abstract: A dishwashing machine containing spraying devices and at least one dish rack. The dishwashing machine has at least one dish rack having stationary spraying devices to optimally clean material stacked in the at least one rack and increase and optimize storage room in the dishwashing machine.

Abstract: A cleaning apparatus capable of sufficiently removing foreign matters such as coating or labels from surfaces of crushed pieces of the collected polymeric mold product is provided. The cleaning apparatus includes a cleaning bath provided with a rotary shaft extending in the longitudinal direction and having a water supply port, a drainage port as well as an introduction port and a discharging port for polymeric pieces, screw sections having a screw provided on the rotary shaft and flow-path restricting sections having stationary plates standing upright from the inner surface of the cleaning bath to restricting the advancement of water caused by the screw, wherein at least part of a surface of the stationary plate is roughened.

Abstract: The substrate processing apparatus has an enclosure structure enclosing a substrate support member to define a processing space. The enclosure structure has an opening closed by a shutter. A processing fluid supply unit, which supplies processing fluid, such as chemical liquid, is accommodated in a housing. The processing fluid supply unit accommodated in the housing is advanced into the processing space through the opening of the enclosure structure to feed the processing fluid onto the substrate supported by the substrate support member.

Abstract: A cleaning apparatus includes a tank housing and a partition disposed in the tank housing so as to divide the interior thereof into pumping and cleaning chambers as the only chambers within the tank housing adapted to contain cleaning liquid. A submersible pump mounted inside the pumping chamber has an outlet connected to a first end of at least one tubular member, which defines a flow path extending from the first end and through an opening in the partition to an opposing second end inside the cleaning chamber and connected to a respiratory device for cleaning thereof. Cleaning liquid is pumped from the pumping chamber along the flow path, through the device for interior cleaning, and into the cleaning chamber to fill such chamber to an upper end portion of the partition defining an overflow weir, thereby immersing ad the device for exterior cleaning and allowing overflow into the pumping chamber.

Abstract: The present invention relates to apparatus for washing drains. The apparatus includes a support and a nozzle, which are adapted and configured to convey fluid to and to wash a drain. Typically, the apparatus includes a wand as the support and a ball or head as the nozzle. The apparatus can also include a fluid retainer, which can keep the dispensed fluid in and/or near the drain.

Abstract: A dish-cleaning appliance comprising a sink having a bowl defining a wash chamber with an open top for providing access to the wash chamber. A liquid recirculation system is provided for spraying liquid onto the dish rack to effect the cleaning of any dishes along the rack. The lid is mounted to the sink and is movable to selectively cover the open top of the bowl. The lid includes a sound absorber and a sound dampener for reducing the transfer of sound from the wash chamber through the lid.

Abstract: A low-pressure dryer dries a substrate applied a coating solution thereon at low pressure. The dryer includes an airtight chamber installing a substrate table to place the substrate thereon; a diffuser plate, provided as facing the substrate placed on the substrate table with a gap, for discharging gas existing in the gap toward outside, the diffuser plate having a size almost the same as or larger than the substrate; a substrate-temperature adjuster, installed in the substrate table, for adjusting a temperature of the substrate; and a decompression mechanism for decompressing the airtight chamber. The diffuser plate has a temperature adjuster for making temperature adjustments to have a temperature difference between a first region and a second region of the diffuser plate, the first region facing a center region of the substrate, the second region being outside the first region and including a region facing an outer region of the substrate.

Abstract: A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

Abstract: A dishwasher includes a wash and rinse system that operates to dislodge soil particles that adhere to internal surfaces of a washing chamber. During wash and rinse cycles, the washing chamber is initially filled to a first level with washing fluid. The washing fluid is drawn into a wash system through operation of a pump, that causes the washing fluid in the washing chamber to fall to a second level, and directed to a spray arm that sprays jets of washing fluid onto the kitchenware. Thereafter, the wash system enters a pause period during which the washing fluid is caused to return to the first level in the washing chamber to loosen particles from walls of the chamber. After the pause period, the trajectory of the jets of washing fluid is varied to further clean the kitchenware and the internal surfaces of the washing chamber.

Abstract: A low-pressure dryer dries a substrate applied a coating solution thereon at low pressure. The dryer includes an airtight chamber installing a substrate table to place the substrate thereon; a diffuser plate, provided as facing the substrate placed on the substrate table with a gap, for discharging gas existing in the gap toward outside, the diffuser plate having a size almost the same as or larger than the substrate; a substrate-temperature adjuster, installed in the substrate table, for adjusting a temperature of the substrate; and a decompression mechanism for decompressing the airtight chamber. The diffuser plate has a temperature adjuster for making temperature adjustments to have a temperature difference between a first region and a second region of the diffuser plate, the first region facing a center region of the substrate, the second region being outside the first region and including a region facing an outer region of the substrate.