For Metallic, Siliceous, Or Calcareous Basework, Including Chemical Bleaching, Oxidation Or Reduction Patents (Class 134/2)
  • Patent number: 11142726
    Abstract: The present invention relates to a liquid composition soluble in water or other polar substance and its use for vehicle cleansing and care, in particular for all the treatments provided in the washing steps of vehicles. The composition comprises at least one active enzymatic component.
    Type: Grant
    Filed: October 20, 2017
    Date of Patent: October 12, 2021
    Assignee: FRA-BER S.R.L.
    Inventors: Franco Berton, Gabriele Berton
  • Patent number: 11145514
    Abstract: Provided are a removal liquid for removing an oxide of a Group III-V element, an oxidation prevention liquid for preventing the oxidation of an oxide of a Group III-V element or a treatment liquid for treating an oxide of a Group III-V element, each liquid including an acid and a mercapto compound; and a method using each of the same liquids. Further provided are a treatment liquid for treating a semiconductor substrate, including an acid and a mercapto compound, and a method for producing a semiconductor substrate product using the same.
    Type: Grant
    Filed: July 12, 2017
    Date of Patent: October 12, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Satomi Takahashi, Seongmu Bak, Atsushi Mizutani, Tadashi Inaba
  • Patent number: 11117292
    Abstract: Embodiments of the present disclosure include a rotational molding device. The rotational molding device comprises a frame, a vessel coupled to the frame and configured to be heated or cooled, and a mold coupled to the frame and configured to rotate about a first axis by a first rotation mechanism and configured to rotate about a second axis by a second rotation mechanism. The vessel includes a particle bed comprising a plurality of fluidized particles, the mold is configured to form a molded part, and the mold includes a cavity corresponding to a shape of the molded part.
    Type: Grant
    Filed: May 9, 2019
    Date of Patent: September 14, 2021
    Inventor: Dustin Eplee
  • Patent number: 11090881
    Abstract: A method of molding a component includes the steps of providing a plurality of fibers, applying the fibers with a low temperature sizing to form a plurality of sized fibers, forming a preform from the plurality of sized fibers, placing the preform in a mold, and de-sizing the preform by heating the mold to an initial temperature that is sufficient to break down the low temperature sizing to a gaseous phase. A molding apparatus is also disclosed.
    Type: Grant
    Filed: October 20, 2014
    Date of Patent: August 17, 2021
    Assignee: RAYTHEON TECHNOLOGIES CORPORATION
    Inventors: John D. Riehl, Charles R. Watson
  • Patent number: 11091843
    Abstract: Provided is an acid-pickling additive for a surface oxide scale of a stainless steel material, a preparation method thereof and an acid-pickling method. The acid-pickling additive consists of 1 to 10 parts by weight of an alcohol amine compound, 0.1 to 5 parts by weight of a metal complex ligand, 0 to 10 parts by weight of a nitrogen-containing organic cyclic compound, 0 to 3 parts by weight of an alcohol compound, 0 to 3 parts by weight of a plant extract, and 1 to 2 parts by weight of water. This acid-pickling additive can solve the problems of high energy consumption, environmental pollution, and high cost in the existing method for removing an oxide scale of a stainless steel.
    Type: Grant
    Filed: November 15, 2016
    Date of Patent: August 17, 2021
    Assignee: ADD New Technology Development (Shanxi) Co., LTD.
    Inventor: Wenjuan Li
  • Patent number: 11085010
    Abstract: A method of cleaning a cooling water system is disclosed. The method may include contacting a cooling tower fill with a composition that may include a surfactant and an additive selected from an oxidizing agent, an acid, and any combination thereof when the cooling water system is off-line. The method may include contacting a deposit in the cooling tower fill with the composition. The oxidizing agent may be hydrogen peroxide, sodium hypochlorite, chlorine dioxide, ozone, sodium hypobromite, sodium or potassium permanganate, or any combination thereof. The surfactant may include a C8-C10 alkyl polyglycoside and a C10-C18 alkyl polyglycoside.
    Type: Grant
    Filed: August 14, 2018
    Date of Patent: August 10, 2021
    Assignee: ECOLAB USA INC.
    Inventors: Lanhua Hu, Amit Gupta
  • Patent number: 11056343
    Abstract: Embodiments of the disclosed technology include patterning a graphene sheet for biosensor and electronic applications using lithographic patterning techniques. More specifically, the present disclosure is directed towards the method of patterning a graphene sheet with a hard mask metal layer. The hard mask metal layer may include an inert metal, which may protect the graphene sheet from being contaminated or damaged during the patterning process.
    Type: Grant
    Filed: June 14, 2017
    Date of Patent: July 6, 2021
    Assignee: Cardea Bio, Inc.
    Inventors: Deng Pan, Brett Goldsmith
  • Patent number: 11035044
    Abstract: Described herein is an etching solution suitable for both tungsten-containing metals and GST metals, which comprises: water; at least one phenolic derivative compound having at least two hydroxyl groups; at least one strong base selected from the group consisting of (i) a quaternary base; (ii) an organic amine; and (iii) a metal hydroxide; optionally an ammonium salt of an organic acid; and optionally a water-miscible solvent, wherein the pH of the etching solution is 10 or greater, and wherein the etching solution is substantially free of a peroxide oxidizer and a metal ion-containing oxidizer.
    Type: Grant
    Filed: January 16, 2018
    Date of Patent: June 15, 2021
    Assignee: Versum Materials US, LLC
    Inventors: Wen Dar Liu, Laisheng Sun, Yi-Chia Lee, Tianniu Chen, Gang Chris Han-Adebekun
  • Patent number: 11008706
    Abstract: [Problem] To provide a canvas cleaning device that can prevent re-adhesion of stains as much as possible and also efficiently clean the canvas. [Solution] The canvas cleaning device 100 is provided with a base part 11 capable of sliding along a rail part 1 that extends in a width direction of a canvas K1, a cone part 13 having a cylinder shape, which is attached to the base part 11, and extends straightly, a high pressure water spraying device 13a installed inside the cone part 13, an arm part 15 that is extended and installed on the downstream side from the base part 11 and a nozzle device 16 attached to the tip of the arm part 15, and in this structure, high pressure water is sprayed onto the canvas K1 from the high pressure water spraying device 13a inside the cone part 13.
    Type: Grant
    Filed: March 29, 2019
    Date of Patent: May 18, 2021
    Assignee: MAINTECH CO., LTD.
    Inventors: Hiroshi Sekiya, Tomohiko Nagatsuka, Kazuyuki Yusa
  • Patent number: 10988711
    Abstract: An aqueous cleaning composition, which may be suitable for use in cleaning hard surfaces, is described. The aqueous cleaning composition includes an ionic liquid solvent, an amino alcohol, and a substantial amount of water. The cleaning compositions may also include a disinfecting quaternary surfactant, a nonionic surfactant, such as an ethoxylated alcohol and/or alkyl polyglycoside, and/or a chelating agent, such as an aminopolycarboxylate chelating agent.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: April 27, 2021
    Assignee: S. C. Johnson & Son, Inc.
    Inventors: Art Daniels Sutton, Jr., Lisa Flugge-Berendes, Michael S. Haas
  • Patent number: 10983447
    Abstract: The present disclosure provides an exhaust system for discharging from semiconductor manufacturing equipment a hazardous gas. The exhaust system includes: a main exhaust pipe having a top surface and a bottom surface; a first branch pipe including an upstream end coupled to a source of a gas mixture containing the hazardous gas and a downstream end connected to the main exhaust pipe through the top surface; a second branch pipe including a downstream end connected to the main exhaust pipe through the bottom surface; and a detector configured to detect presence of the hazardous gas in the second branch pipe.
    Type: Grant
    Filed: September 14, 2017
    Date of Patent: April 20, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yu-Fu Lin, Shih-Chang Shih, Chia-Chen Chen
  • Patent number: 10957554
    Abstract: Disclosed is a dry etching method for etching a metal film on a substrate with the use of an etching gas, wherein the etching gas contains a ?-diketone and first and second additive gases; wherein the metal film contains a metal element capable of forming a complex with the ?-diketone; wherein the first additive gas is at least one kind of gas selected from the group consisting of NO, NO2, O2 and O3; wherein the second additive gas is at least one kind of gas selected from the group consisting of H2O and H2O2; wherein the amount of the ?-diketone contained is 10 vol % to 90 vol % relative to the etching gas; and wherein the amount of the second additive gas contained is 0.1 vol % to 15 vol % relative to the etching gas. The etching rate of the metal film is increased by this etching method.
    Type: Grant
    Filed: December 20, 2017
    Date of Patent: March 23, 2021
    Assignee: Central Glass Company, Limited
    Inventors: Kunihiro Yamauchi, Takashi Masuda, Akifumi Yao
  • Patent number: 10954472
    Abstract: Disclosed herein are hard surface cleaning compositions comprising, for example, a pH modifying agent in an amount sufficient to provide an alkaline pH; and a foaming system comprising: a nonionic ethoxylated/propoxylated surfactant; and a nonionic ethoxylated surfactant; wherein the concentration of the nonionic ethoxylated surfactant is greater than the concentration of the nonionic ethoxylated/propoxylated surfactant; and wherein the foaming system provides a structured network comprising a matrix having interstitial spaces. Methods of making and using these compositions are also described.
    Type: Grant
    Filed: November 2, 2015
    Date of Patent: March 23, 2021
    Assignee: Colgate-Palmolive Company
    Inventors: Carlos Munoz Carrillo, Cesar Rodriguez Cedillo, Edna Ambundo
  • Patent number: 10953407
    Abstract: Generally described, the methods disclosed herein for recycling fiber composite source objects, such as wind turbine blades, include converting a whole wind turbine blade to an output material state that is useful for manufacturing other products, such as those used in construction of buildings, packaging, raw materials, and pellets, among other products. The recycling process is performed while tracking the progress and location of each wind turbine blade such that the direct source of the output material may be determined. In some embodiments, the method includes sectioning the wind turbine blades, crushing the wind turbine blade sections, tracking the progress of each blade through the process, and loading output materials into a suitable transportation vessel.
    Type: Grant
    Filed: October 31, 2018
    Date of Patent: March 23, 2021
    Assignee: GFSI GROUP LLC
    Inventors: Don Lilly, Ronald Albrecht
  • Patent number: 10930512
    Abstract: A method of processing a plate-shaped workpiece that includes layered bodies containing metal which are formed in superposed relation to projected dicing lines, includes the steps of holding the workpiece on a holding table, and thereafter, cutting the workpiece along the projected dicing lines with an annular cutting blade, thereby separating the layered bodies. The cutting blade has a groove defined in a face side or a reverse side of an outer peripheral portion thereof that cuts into the workpiece in the step of cutting the workpiece. The step of cutting the workpiece includes the step of cutting the workpiece while supplying a cutting fluid containing an organic acid and an oxidizing agent to the workpiece.
    Type: Grant
    Filed: March 23, 2018
    Date of Patent: February 23, 2021
    Assignee: DISCO CORPORATION
    Inventor: Kenji Takenouchi
  • Patent number: 10913893
    Abstract: Embodiments of compositions of a wet etchant and additive thereto for selectively etching silicon nitride to silicon oxide are disclosed. In an example, a composition of an additive to a phosphoric acid etchant includes an inhibitor and a dispersant. The inhibitor is absorbable on a surface of silicon oxide and capable of inhibiting etching of the surface of silicon oxide by the phosphoric acid etchant. The dispersant is capable of reacting with a by-product of a reaction between the phosphoric acid etchant and at least one of silicon oxide and silicon nitride and reducing a viscosity of the phosphoric acid etchant.
    Type: Grant
    Filed: December 5, 2018
    Date of Patent: February 9, 2021
    Assignee: YANGTZE MEMORY TECHNOLOGIES CO., LTD.
    Inventors: Rong Xu, Wenbin Sun, Jie Su
  • Patent number: 10916473
    Abstract: A method includes forming a first dielectric layer over a wafer, etching the first dielectric layer to form an opening, filling a tungsten-containing material into the opening, and performing a Chemical Mechanical Polish (CMP) on the wafer. After the CMP, a cleaning is performed on the wafer using a weak base solution.
    Type: Grant
    Filed: October 17, 2019
    Date of Patent: February 9, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chien-Hao Chung, Chang-Sheng Lin, Kuo-Feng Huang, Li-Chieh Wu, Chun-Chieh Lin
  • Patent number: 10874883
    Abstract: A method for preparing a product for treating the skin and mucous membranes comprises the steps of making available a suitable quantity of trichloroacetic acid, making available a suitable quantity of hydrogen peroxide, making a first mixture of the trichloroacetic acid and the hydrogen peroxide, making available a determinate quantity of the basic compound able to achieve a buffer effect of the trichloroacetic acid comprised in the first mixture, and adding the basic compound.
    Type: Grant
    Filed: December 12, 2006
    Date of Patent: December 29, 2020
    Inventor: Rossana Castellana
  • Patent number: 10867801
    Abstract: According to one embodiment, an etching apparatus for etching a semiconductor with an aid of a noble metal catalyst, includes a reaction vessel configured to accommodate a semiconductor substrate provided with a catalyst layer including a noble metal, and a feeder configured to feed, to the reaction vessel, an oxidizer, hydrogen fluoride, an organic additive, and carbon dioxide in a supercritical or subcritical state.
    Type: Grant
    Filed: July 23, 2018
    Date of Patent: December 15, 2020
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventor: Kazuhito Higuchi
  • Patent number: 10844332
    Abstract: An alkaline wet solution for protecting features on a patterned substrate and a substrate processing method using the alkaline wet solution are described. The method includes providing a patterned substrate containing a low-k material, a metal oxide feature, and an etch residue, performing a treatment process that exposes the patterned substrate to an alkaline wet solution that forms a protective coating on the metal oxide feature, the alkaline wet solution containing a mixture of 1) water, 2) ammonium hydroxide, a quaternary organic ammonium hydroxide, or a quaternary organic phosphonium hydroxide, and 3) dissolved silica, and performing a wet cleaning process that removes the etch residue but not the metal oxide feature that is protected by the protective coating. The patterned substrate can further include a metallization layer and the alkaline wet solution can further contain 4) an inhibitor that protects the metallization layer from etching by the alkaline wet solution.
    Type: Grant
    Filed: December 14, 2018
    Date of Patent: November 24, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Takayuki Toshima, Hiroshi Marumoto, Yoshinori Nishiwaki, Trace Hurd
  • Patent number: 10833251
    Abstract: A composition for cleaning a magnetic pattern, a method of manufacturing a magnetic memory device, a method of forming a magnetic pattern, and a magnetic memory device, the composition including a glycol ether-based organic solvent; a decomposing agent that includes an aliphatic amine; and at least one of a chelating agent, or a cleaning accelerator that includes an organic alkaline compound, wherein the composition is devoid of water.
    Type: Grant
    Filed: August 22, 2018
    Date of Patent: November 10, 2020
    Assignees: SAMSUNG ELECTRONICS CO., LTD., SAMYOUNG PURE CHEMICALS CO., LTD.
    Inventors: Ho-Young Kim, Jin-Hye Bae, Hoon Han, Won-Jun Lee, Chang-Kyu Lee, Geun-Joo Baek, Jung-Ig Jeon
  • Patent number: 10832917
    Abstract: A method is presented for post chemical mechanical polishing (PCMP) clean for cleaning a chemically-mechanically polished semiconductor wafer. The method includes planarizing the semiconductor wafer, subjecting the semiconductor wafer to a de-oxygenated mixture of DI water and PCMP solution, and applying a de-oxygenated environment during the cleaning. The solution can be de-oxygenated by nitrogen degas or by introducing a reducing agent. The environment can be de-oxygenated by purging with an inert gas, such as nitrogen.
    Type: Grant
    Filed: June 9, 2017
    Date of Patent: November 10, 2020
    Assignee: International Business Machines Corporation
    Inventors: Donald F. Canaperi, Pavan S. Chinthamanipeta, Raghuveer R. Patlolla, Cornelius B. Peethala
  • Patent number: 10800996
    Abstract: A high foaming liquid alkaline cleaner comprises one or more alkalinity sources; one or more surfactants comprising a hydrotrope, one or more wetting and soil emulsifying surfactants, one or more foam volume generating surfactants, and one or more foam boosting surfactants and one or more sequestrants. Optionally, an organic solvent can be utilized. The high foaming liquid alkaline cleaning composition is generally prepared in a concentrated form and can be diluted as with water. The alkaline cleaner provides effective cleaning properties, with respect to fats, oils, and organic soils.
    Type: Grant
    Filed: February 11, 2019
    Date of Patent: October 13, 2020
    Assignee: American Sterilizer Company
    Inventors: Jessica Sue Haney Boester Linder, Ping Xia, Nancy-Hope Elizabeth Kaiser
  • Patent number: 10780030
    Abstract: Disclosed are compositions comprising at least one bicarbonate compound, at least one acid, at least one film forming polymer, and at least one cosmetically acceptable carrier, wherein the weight ratio of the at least one bicarbonate compound to the at least one acid is greater than or equal to about 1:1, and methods of altering the shape of keratin fibers comprising contacting the fibers with the compositions.
    Type: Grant
    Filed: July 31, 2014
    Date of Patent: September 22, 2020
    Assignee: L'OREAL
    Inventors: Michell Chen, Gloria Frimpong Allorbi, Anand Mahadeshwar
  • Patent number: 10774290
    Abstract: A detergent composition in the form of an effervescent tablet having high dissolution rate and good stability, which is suitable for producing aqueous solutions of cleaning compositions for cleaning hard surfaces and clothes. The tablet includes an alkylsulfate-type anionic surfactant, an effervescent system, a combination of at least two disintegrating agents, and urea.
    Type: Grant
    Filed: March 9, 2016
    Date of Patent: September 15, 2020
    Inventor: Lorena Martí Coma
  • Patent number: 10731114
    Abstract: Solvents useful for removing, among other things, photoresists and poly(amic acid)/polyimide from display/semiconductor substrates or electronic processing equipment, consist essentially of: (A) a first component consisting of a sulfoxide, e.g., DMSO; (B) a second component consisting of a glycol ether, e.g., ethylene glycol monobutyl ether; and (C) a third component consisting of at least one of N-formyl morpholine, N,N-dimethyl propionamide, 3-methoxy-N,N-dimethyl propanamide, triethyl phosphate, N,N-dimethyl acetamide; N,N-diethyl acetamide, N,N-diethyl propionamide, N-methyl acetamide, N-methyl propionamide, N-ethyl acetamide, and N-ethyl propionamide.
    Type: Grant
    Filed: January 20, 2017
    Date of Patent: August 4, 2020
    Assignee: Dow Global Technologies LLC
    Inventors: Qi Jiang, Xin Jiang, Hua Ren, Eungkyu Kim, Jianhai Mu, Kaoru Ohba
  • Patent number: 10722926
    Abstract: Disclosed is a supercritical-state cleaning system, comprising a cleaning chamber, a gas booster apparatus, a first heating apparatus, and a carbon dioxide supply apparatus. The cleaning chamber is separately connected to the first heating apparatus and the carbon dioxide supply apparatus. A vacuum pump set is connected to the cleaning chamber. Compared with the prior art, in the Invention, air introduced when a workpiece enters a cleaning chamber is completely removed, so as to prevent mixing of CO2 and air, thereby improving a cleaning effect.
    Type: Grant
    Filed: July 15, 2019
    Date of Patent: July 28, 2020
    Assignee: SHANGHAI YIBAI INDUSTRIAL FURNACES CO., LTD.
    Inventors: Fan Yang, Jingfeng Yang
  • Patent number: 10720323
    Abstract: A method for processing a semiconductor wafer in a PECVD deposition chamber with a circular pedestal and a recessed portion formed around the outer top surface of the pedestal. The method may include using a circular wafer carrier ring with a recessed portion.
    Type: Grant
    Filed: January 8, 2016
    Date of Patent: July 21, 2020
    Assignee: TEXAS INSTRUMENTS INCORPORATED
    Inventors: Jian Song, Ruben Anthony Pesina, Kamal Avala
  • Patent number: 10707069
    Abstract: A method of polishing a semiconductor wafer includes polishing a surface of the semiconductor wafer using a polishing pad while supplying a polishing agent slurry containing abrasives during a first step. The polishing pad is free of abrasives and includes a first surface that contacts the semiconductor wafer, the first surface having a surface structure including elevations. Supply of polishing agent slurry is subsequently ended and, in a second step, the surface of the semiconductor wafer is polished using the polishing pad while supplying a polishing agent solution having a pH value of at least 12 that is free of solids.
    Type: Grant
    Filed: March 2, 2011
    Date of Patent: July 7, 2020
    Assignee: SILTRONIC AG
    Inventors: Juergen Schwandner, Michael Kerstan
  • Patent number: 10699241
    Abstract: Disclosed are methods for developing authorized chemical palettes for formulating products with reduced adverse environmental and/or health concerns, and advising the public to a greater extent regarding the ingredients of products formulated using these palettes. Also disclosed are computer systems to implement such methods.
    Type: Grant
    Filed: June 7, 2011
    Date of Patent: June 30, 2020
    Assignee: S. C. Johnson & Son, Inc.
    Inventors: Christopher Beard, Kylee E. Eblin, Fred J. Joachim, H. Fisk Johnson, III, Frank A. Jones, Jennifer C. Perkins, Robert J. Seifert, Kelly M. Semrau, George C. Daher, Usha Vedula
  • Patent number: 10692714
    Abstract: A method for cleaning a semiconductor wafer by using a chemical tank containing an SC-2 solution including, a plurality of the chemical tanks are used, and among SC-2 solutions contained in the plurality of chemical tanks, an HCl concentration in an SC-2 solution contained in a chemical tank to be finally used is lowered to the lowest to clean the semiconductor wafer. The method for cleaning a semiconductor wafer thus provided can improve the particle level in SC-2 cleaning for a semiconductor wafer without degrading the metal impurity level on the semiconductor wafer surface.
    Type: Grant
    Filed: February 22, 2017
    Date of Patent: June 23, 2020
    Assignee: SHIN-ETSU HANDOTAI CO., LTD.
    Inventors: Susumu Sarashina, Tomofumi Takano
  • Patent number: 10684234
    Abstract: A method for inspecting a rotary machine having a fluid flow path includes a step of connecting an observation device to a connection port having an open/close valve that opens/closes a communication hole that communicates with the outside of the rotary machine and the flow path, the main body being connected to the connection port where the open/close valve is closed; a step of opening the open/close valve and inserting an insertion rod protruding from the main body of the observation device into the communication hole; a step of observing the inside of the flow path by an observation optical system provided at a leading end portion of the insertion rod; a step of withdrawing the insertion rod from the communication hole and closing the open/close valve; and a step of detaching the main body of the observation device from the connection port.
    Type: Grant
    Filed: March 31, 2015
    Date of Patent: June 16, 2020
    Assignee: MITSUBHISHI HEAVY INDUSTRIES COMPRESSOR CORPORATION
    Inventors: Yuji Masuda, Shinichiro Tokuyama
  • Patent number: 10676820
    Abstract: There is provided a cleaning method of a film forming apparatus in which a process of forming a silicon film, a germanium film or a silicon germanium film on a substrate mounted on a substrate holder in a processing container is performed, comprising: etching away the silicon film, the germanium film or the silicon germanium film adhered to an interior of the processing container including the substrate holder by supplying a halogen-containing gas not containing fluorine into the processing container in a state where the substrate holder, which was stored in a dew point-controlled atmosphere after the film forming process, is accommodated in the processing container with no substrate being mounted thereon.
    Type: Grant
    Filed: November 12, 2018
    Date of Patent: June 9, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Mitsuhiro Okada, Yutaka Motoyama
  • Patent number: 10676394
    Abstract: Described herein are various antimicrobial glass articles that have improved resistance to discoloration when exposed to harsh conditions. The improved antimicrobial glass articles described herein generally include a glass substrate that has a low concentration of nonbridging oxygen atoms, a compressive stress layer and an antimicrobial silver-containing region that each extend inward from a surface of the glass substrate to a specific depth, such that the glass article experiences little-to-no discoloration when exposed to harsh conditions. Methods of making and using the glass articles are also described.
    Type: Grant
    Filed: November 9, 2018
    Date of Patent: June 9, 2020
    Assignee: Corning Incorporated
    Inventors: Yuhui Jin, Charlotte Diane Milia, Christine Coulter Wolcott
  • Patent number: 10626343
    Abstract: A lubricant for firearms includes a base and nanoparticles dispersed throughout the base. The base may include a hydrocarbon or a mixture of hydrocarbons. The base may be in a liquid form or in a semisolid form. Fat from an animal source, such as porcine fat or, more specifically, bacon fat, may be employed as a hydrocarbon of the base. Fat from an animal source may be rendered or otherwise clarified. The nanoparticles may include nanospheres, which may have an average diameter of about 100 nm or less. The lubricant may also include a hydrocarbon from a vegetable source (e.g., a vegetable oil, etc.), a hydrocarbon from a petrochemical source, and/or a synthetic petrochemical lubricant. The lubricant may include a fragrance to impart it with a desired scent (e.g., a bacon scent, etc.). Methods for lubricating and cleaning metallic surfaces of firearms are also disclosed. In such a method, nanoparticles from a lubricant may be introduced into and retained within microscopic crevices in the metallic surfaces.
    Type: Grant
    Filed: November 19, 2018
    Date of Patent: April 21, 2020
    Assignee: Brave Response Shooting, LLC
    Inventor: Brandon R. Scott
  • Patent number: 10569310
    Abstract: A method is for cleaning a substrate transfer mechanism for loading a substrate into a heat treatment chamber for sublimating by-products by heat. The substrate transfer mechanism includes a holding unit for holding the substrate. The method includes repeatedly moving the holding unit into and out of the heat treatment chamber.
    Type: Grant
    Filed: March 13, 2017
    Date of Patent: February 25, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Keiichi Nagakubo
  • Patent number: 10573509
    Abstract: The cleaning apparatus includes multiple kinds of cleaning modules each configured to perform a cleaning processing of a substrate, a first accommodating section configured to accommodate the multiple kinds of cleaning modules therein, and a fluid supply section configured to supply a fluid to the cleaning modules accommodated in the first accommodating section through a pipe. Each of the multiple kinds of cleaning modules includes a pipe connection portion having a common connection position to be connected with the pipe.
    Type: Grant
    Filed: June 23, 2017
    Date of Patent: February 25, 2020
    Assignee: Ebara Corporation
    Inventors: Koji Maeda, Hiroshi Shimomoto, Kuniaki Yamaguchi, Hiroshi Aono, Tetsuya Yashima, Hidetatsu Isokawa, Kenji Shinkai, Mitsuhiko Inaba, Koichi Hashimoto, Junji Kunisawa, Mitsuru Miyazaki, Fujihiko Toyomasu
  • Patent number: 10562079
    Abstract: Disclosed is a supercritical-state cleaning system, comprising a cleaning chamber (4), a gas booster apparatus (11), a first heating apparatus (5), and a carbon dioxide supply apparatus. The cleaning chamber (4) is separately connected to the first heating apparatus (5) and the carbon dioxide supply apparatus. A vacuum pump set (1) is connected to the cleaning chamber (4). Compared with the prior art, in the Invention, air introduced when a workpiece enters a cleaning chamber is completely removed, so as to prevent mixing of CO2 and air, thereby improving a cleaning effect.
    Type: Grant
    Filed: December 29, 2017
    Date of Patent: February 18, 2020
    Assignee: Shanghai Yibai Industrial Furnaces Co., Ltd.
    Inventors: Fan Yang, Jingfeng Yang
  • Patent number: 10535510
    Abstract: A substrate-treating apparatus includes a liquid-providing part, a first liquid-removing knife and a returning part. The liquid-providing part provides a first liquid chemical for cleaning a substrate that includes a metal pattern and a photoresist pattern on the metal pattern, and for removing an etchant that remains on the substrate. The first liquid-removing knife sprays a second liquid chemical in a direction inclined and opposite to a returning direction of the substrate, so as to remove the first liquid chemical, the first liquid chemical including a metal precipitate. The returning part returns the substrate from the liquid-providing part toward the first liquid-removing knife in the returning direction.
    Type: Grant
    Filed: July 24, 2015
    Date of Patent: January 14, 2020
    Assignee: Samsung Display Co., Ltd.
    Inventors: Bong-Kyun Kim, Young-Min Moon, Soo-Min An
  • Patent number: 10529588
    Abstract: In accordance with an embodiment, a substrate treatment method includes bringing a first metallic film on a substrate into contact with a first liquid, mixing a second liquid into the first liquid, and bringing the first metallic film or a second metallic film different from the first metallic film into contact with a liquid in which the first liquid and the second liquid are mixed together to etch the first or second metallic film. The first liquid includes an oxidizing agent, a complexing agent, and water (H2O) of a first content rate to etch the first metallic film. The second liquid includes water (H2O) at a second content rate higher than the first content rate after the etching has started.
    Type: Grant
    Filed: June 20, 2018
    Date of Patent: January 7, 2020
    Assignee: Toshiba Memory Corporation
    Inventors: Yuya Akeboshi, Hiroshi Tomita, Hisashi Okuchi, Yasuhito Yoshimizu, Hiroaki Yamada
  • Patent number: 10519406
    Abstract: Treating a sulfide scale includes contacting the sulfide scale with an oxidizing composition that includes a first oxidizer and a second oxidizer.
    Type: Grant
    Filed: September 1, 2017
    Date of Patent: December 31, 2019
    Assignee: Saudi Arabian Oil Company
    Inventors: Katherine Leigh Hull, Brent Cooper
  • Patent number: 10472596
    Abstract: Methods and compositions for improving laundry quality in multiple areas including detergency, bleaching and wastewater operations are provided by a laundry additive composition. The laundry additive composition and methods of using the composition control iron and other transition metals in water utilized within laundry applications.
    Type: Grant
    Filed: June 27, 2018
    Date of Patent: November 12, 2019
    Assignee: Ecolab USA Inc.
    Inventors: Jason Lang, Jimmy Stokes, Carter M. Silvernail, David Dotzauer, Steven Lundberg, Krista Otting
  • Patent number: 10439365
    Abstract: In an example, the present invention provides a method for fabricating a light emitting device configured as a Group III-nitride based laser device. The method also includes forming a gallium containing epitaxial material overlying the surface region of a substrate member. The method includes forming a p-type (Al,In,Ga)N waveguiding material overlying the gallium containing epitaxial material under a predetermined process condition. The method includes maintaining the predetermined process condition such that an environment surrounding a growth of the p-type (Al,In,Ga)N waveguide material is substantially a molecular N2 rich gas environment. The method includes maintaining a temperature ranging from 725 C to 925 C during the formation of the p-type (Al,In,Ga)N waveguide material, although there may be variations. In an example, the predetermined process condition is substantially free from molecular H2 gas.
    Type: Grant
    Filed: April 10, 2019
    Date of Patent: October 8, 2019
    Assignee: Soraa Laser Diode, Inc.
    Inventors: Po Shan Hsu, Melvin McLaurin, Thiago P. Melo, James W. Raring
  • Patent number: 10435617
    Abstract: Provided in this disclosure, in part, are methods, compositions, and systems for degrading organic matter, such as kerogen, in a subterranean formation. Further, these methods, compositions, and systems allow for increased hydraulic fracturing efficiencies in subterranean formations, such as unconventional rock reservoirs. Also provided in this disclosure is a method of treating kerogen in a subterranean formation including placing in the subterranean formation a composition that includes a first oxidizer including a persulfate and a second oxidizer including a bromate.
    Type: Grant
    Filed: April 11, 2019
    Date of Patent: October 8, 2019
    Assignee: Saudi Arabian Oil Company
    Inventors: Katherine Leigh Hull, Ghaithan A. Al-Muntasheri, Younane N. Abousleiman, David Jacobi
  • Patent number: 10420221
    Abstract: A desmear treatment method for a wiring board material is provide that is capable of performing desmear treating on the interior of a through hole formed in an insulating layer without requiring complicated steps and obtaining an insulating layer having appropriate surface roughness. The desmear treatment method comprises forming a hole passing through an insulating layer, wherein the insulating layer is made of a resin containing a filler, and desmear treating the wiring board material with radicals. The wiring board material includes a depletable resist layer formed on the insulating layer, and the depletable resist layer is made of a resin to be depleted in the desmear treatment step. A method of manufacturing a wiring board material to be subjected to the desmear treatment method and a composite insulating layer forming material used in the manufacturing method are also disclosed.
    Type: Grant
    Filed: November 21, 2014
    Date of Patent: September 17, 2019
    Assignee: Ushio Denki Kabushiki Kaisha
    Inventors: Kenichi Hirose, Makoto Wasamoto, Shinichi Endo
  • Patent number: 10407779
    Abstract: The invention is a method of stripping one or more additional coats covering a barrier primer coat that covers a surface. The barrier coat contains a catalyst, such as manganese dioxide and, or, manganese carbonate, for the decomposition of hydrogen peroxide. The top coat of the covered surface is contacted with the stripping agent at decomposition reaction conditions.
    Type: Grant
    Filed: January 6, 2016
    Date of Patent: September 10, 2019
    Assignee: Akzo Nobel Coatings International B.V.
    Inventor: Mark Robert Zentner
  • Patent number: 10366908
    Abstract: In a substrate processing apparatus, gas is supplied from above a shield plate to a lid internal space within a chamber so that pressure in the lid internal space becomes higher than pressure in a chamber-body internal space and the gas in the lid internal space is sent to the chamber-body internal space. The gas flowing from the lid internal space is discharged through a body discharge port provided below a substrate in the chamber-body internal space. This forms a generally cylindrical current of gas in the chamber. The supply of processing liquids to an upper surface of the substrate is conducted on the inner side of the generally cylindrical current. This suppresses mists and fumes of processing liquids passing through the generally cylindrical current and entering into the lid internal space from the gap between the shield plate and the lid bottom part.
    Type: Grant
    Filed: March 13, 2015
    Date of Patent: July 30, 2019
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Takeshi Yoshida
  • Patent number: 10358599
    Abstract: Compositions, methods, and systems permit selectively etching metal oxide from reactor metal parts (e.g., titanium and/or titanium alloys). The etching composition comprises an alkali metal hydroxide and gallic acid. The method is useful for cleaning reaction chambers used in the deposition of metal oxide films such as aluminum oxide.
    Type: Grant
    Filed: September 12, 2016
    Date of Patent: July 23, 2019
    Assignee: ASM America, Inc.
    Inventors: Srini Raghavan, Eric Shero, Mohith Verghese
  • Patent number: 10344564
    Abstract: Removing inorganic scale and other acid-soluble materials in the presence of a particulate pack can sometimes result in unwanted alterations to the particulate pack. Methods for removing inorganic scale can comprise: introducing a descaling agent comprising an N-(phosphonoalkyl)iminodiacetic acid or any salt thereof into a wellbore in fluid communication with a particulate pack, an inorganic scale being present in the wellbore or in the particulate pack; contacting the descaling agent with the particulate pack and the inorganic scale; and removing at least a portion of the inorganic scale using the N-(phosphonoalkyl)iminodiacetic acid or any salt thereof without substantially affecting the particulate pack.
    Type: Grant
    Filed: February 12, 2015
    Date of Patent: July 9, 2019
    Assignee: Halliburton Energy Services, Inc.
    Inventors: Aaron Michael Beuterbaugh, Enrique Antonio Reyes, Alyssa Lynn Lablanc
  • Patent number: 10286629
    Abstract: The present invention relates to methods for forming a layered composite material, the finished product comprising at least one geopolymeric layer and at least one cement-based layer. The method of the invention allows the provision of products with more varied appearances, shapes, colours, gloss, or surface structures such as decorations, reliefs, roughness, or the like. Products obtained according to the method of the invention also form part of the invention.
    Type: Grant
    Filed: November 14, 2014
    Date of Patent: May 14, 2019
    Assignee: ImerTech SAS
    Inventor: Gilles Gasgnier