Abstract: Herein disclosed is a device and a method for liquid treatment of a disc-like article comprising rotating a disc-like article, dispensing liquid onto the disc-like article when rotated, collecting liquid, which is flung off the disc-like article when rotated, providing a plate arranged parallel to the disc-like article and facing the disc-like article when rotated, and directing gas parallel to the plate across the plate.

Abstract: This invention provides a substrate processing method including a step of covering in advance the surface of a substrate W with water (28), a step of holding the substrate W generally horizontally with the surface facing upward and rotating it in a horizontal plane (10), and a step of blowing to the substrate top surface drying gas flow that is thin in area in comparison with the substrate W surface (30, 40), in which the water is removed from the substrate top surface by the rotation in the horizontal plane while blowing the drying gas flow, a substrate processing apparatus for implementing the above method, and a control program for use with the above method and apparatus. With this invention, it is possible to dry a cleaned substrate without locally leaving water droplets.

Abstract: The invention is an automatic no contact machine for cleaning and drying tips, air caps, retainers and cups on spray apparatus when changing liquid or when the apparatus will be idle, or to remove build up of paint on applicators that cause spits and drips on surfaces and electrostatic arcing to spray apparatus while containing and recovering cleaning effluents to an environmental standard.

Abstract: An apparatus for cleaning a sawn wafer block includes a cleaning basin, a fixture for holding a sawn wafer block in the cleaning basin such that, when cleaning liquid is present in the cleaning basin, at least a portion of the wafer block having sawn gaps is disposed in the cleaning liquid, at least one outlet port in a bottom region of the cleaning basin, and a closer for the outlet port, by means of which the outlet port may be opened and closed. The closer, the outlet port and the bottom region of the cleaning basin are configured such that, by opening the closer the cleaning liquid is drainable so fast from at least the area of the cleaning basin having the wafer block disposed therein that contaminants are removable from the sawn gaps due to a suction effect of the cleaning liquid.

Abstract: A game ticket scratching device and method includes an elongated tubular member that has an open first end and a closed second end. An axle is mounted within the tubular member adjacent to the first end. A plurality of bristles is attached to and radially extends outwardly away from the axle. A motor is mounted within the housing and is mechanically coupled to the axle. A power supply electrically coupled to the motor. An actuator is operationally coupled to the power supply for selectively turning the power supply on or off. The power supply is turned on so that the axle rotates. The bristles are abutted against a lottery ticket concealing layer so that the bristles scrape the concealing layer off of the game card.

Abstract: A method for cleaning a metal mask is disclosed. The method includes washing the metal mask with an organic solvent that dissolves an organic substance adhered to the metal mask, washing, with pure water, the metal mask from which the adhering substance has been removed, and vacuum drying the metal mask that has been washed with the pure water.

Abstract: The invention relates to a method for preventing contamination on the surfaces of optical elements comprising a multi-layer system, during the exposure thereof to radiation at signal wave lengths in an evacuated closed system comprising a residual gas atmosphere, whereby the photocurrent generated by means of photo emission from the radiated surface of the multi-layer system is measured. The photocurrent is used to regulate the gas composition of the residual gas. The gas composition is altered according to at least one lower and one upper threshold value of the photocurrent. The invention also relates to a device for regulating the contamination on the surface of at least one optical element during exposure and an EUV-lithographic device and a method for cleaning the surfaces of the optical elements contaminated by carbon.

Abstract: The cleaning apparatus of the invention includes first and second cleaning tanks cleaning a mask with a predetermined cleaning solution, a vacuum evaporator vacuum-distilling the cleaning solution of the first and second cleaning tanks, a first cooler cooling the vacuum-distilled cleaning solution to room temperature, a first return pipe returning the cleaning solution cooled by the first cooler to the second cleaning tank, first and second rinse tanks rinsing the mask with a predetermined rinse solution, an atmospheric evaporator distilling the rinse solution of the first and second rinse tanks at atmospheric pressure, a second cooler cooling the rinse solution distilled at atmospheric pressure to room temperature, and a second return pipe returning the rinse solution cooled by the second cooler to the second rinse tank.

Abstract: A method of cleaning dust from a computer, computer keyboard, mouse, monitor, or desktop using a hand pump capable of blowing air out of the pump or vacuuming air into the pump. A pump for carrying out this method is disclosed, which pump contains a cylinder having a proximal end and a distal end, a piston inside the cylinder, a handle operatively attached to the proximal end of the piston, and a nozzle at the distal end of the cylinder wherein the hand pump contains side valves adjacent the distal end of the cylinder, which valves open when the piston is moved distally and a front valve which opens when the piston is moved proximally and the cylinder has a dust container surrounding the side valves to collect the dust exiting the side valves to prevent the dust from blowing outside of the cylinder.

Abstract: The various embodiments disclosed and pictured herein illustrate a liquid vacuum apparatus and method that is easy to operate, provides increased safety for operators, mitigates the risk of operator exposure to the liquid, and mitigates the risk of liquid spillage during and after the liquid is transported. As described herein, the liquid vacuum apparatus may be employed either with or without the connector, piping, and end piece; and if an end piece is used, it may take many different forms depending on the particular application.

Abstract: A substrate processing apparatus has a pressure-reducible reaction chamber, a substrate support provided in the reaction chamber, a gas inlet port provided in a wall portion of the reaction chamber to introduce a gas into the reaction chamber, a first plate provided between the substrate support and the gas inlet port in the reaction chamber and having a plurality of first holes for dispersing the gas introduced from the gas inlet port into the reaction chamber, and a second plate provided between the substrate support and the first plate in the reaction chamber in opposing relation to the first plate and having a plurality of second holes for further dispersing the gas dispersed by the first plate. The first and second plates can be moved relatively to each other such that a spacing between the first and second plates is variable.

Abstract: This orbital motion scrubber uses less cleaning solution than many conventional rotary motion scrubbers of comparable scrub width and tank size, which results in longer solution run time. The present invention drives the cleaning element in a high speed orbital motion which results in more revolutions per spot than many conventional rotary motion scrubbers. A flexible pad driver produces better cleaning of uneven hard surface floors than some prior art designs with rigid pad drivers. The brush motor that drives the pad driver and the cleaning element of the present invention uses less electrical energy than the brush motor in many rotary motion scrubbers which results in longer battery run time.

Abstract: A vacuum cleaner includes a housing, a motor-driven suction fan disposed in the housing, a fan motor and a power supply device configured to provide power supply to the fan motor. The vacuum cleaner also includes both a rechargeable battery and cord reel permanently integrated in the housing such that the vacuum cleaner is configured to be alternately operable in a battery mode and a mains mode.

Abstract: To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles and causing the particles to scatter by utilizing the Coulomb force, a means for introducing a gas into the vacuum chamber and causing the particles sticking to the element to scatter by causing a gas shock wave to hit the element, a means for heating the element and causing the particles to scatter by utilizing the thermal stress and thermophoretic force, or a means for causing the particles to scatter by applying mechanical vibrations to the element. The thus scattered particles are removed by carrying them in a gas flow in a relatively high pressure atmosphere.

Abstract: A conveyor-type dish washer and method of operating it, wherein items to be cleaned are conveyed through the dishwasher and are subjected to the action of steam prior to a final-rinse operation but after a wash operation.

Abstract: Methods of cleaning plasma processing chamber components include contacting surfaces of the components with a cleaning solution, while avoiding damage of other surfaces or areas of the components by the cleaning solution. An exemplary plasma processing chamber component to be cleaning is an elastomer bonded electrode assembly having a silicon member with a plasma-exposed silicon surface, a backing member, and an elastomer bonding material between the silicon surface and the backing member.

Abstract: A pool cleaning apparatus includes a housing and a pump for drawing water and debris through an intake port into a filter. A jet-valve housing having a jet valve flap is mounted over the pump to direct a propulsion jet stream from the pump to move the cleaner in a forward direction. A cleaning nozzle is mounted over each of the front and rear portions of the housing, and a pressurized water jet stream is directed at a first pool surface beneath the cleaner through the front end nozzle while moving in a forward direction. When the cleaner engages a second pool surface substantially perpendicular to the first surface, propulsion outlets of the jet valve housing are partially closed to redirect a portion of the propulsion jet stream to the front-end nozzle to lift the front end of the cleaner off the first surface. When the front end of the cleaner disengages from contact with the second surface, the propulsion outlets open to permit the propulsion jet stream to propel the cleaner along the second surface.

Abstract: An upright vacuum cleaner includes a nozzle assembly having a suction inlet and a rotary agitator. A canister assembly is pivotally connected to the nozzle assembly. The vacuum cleaner also includes a suction generator and a dirt collection vessel. Still further, the vacuum cleaner includes a clutch assembly for controlling power transmission from the drive motor of the suction generator to the rotary agitator. The clutch assembly includes a pulley driven by the drive motor, a first clutch element connected to the pulley, a second clutch element connected to the rotary agitator and an actuator for displacing the second clutch clement between a first, engaged position and a second, disengaged position.

Abstract: A method for cleaning objects is disclosed. The method includes placing the objects into a cleaning chamber and contacting them with a dense phase gas. After draining the dense phase gas from the cleaning chamber, the pressure in the cleaning chamber is changed at a rate of at least 1 bar per minute, preferably at a rate of 5 bar per minute, more preferably at a rate of 10 bar per minute.

Abstract: A portable system (8) for handling gases when treating a surface within an interior space of an object. The object has one or more openings (20a, 22) that can be used as an inlet opening (26) and one or more openings that can be used as an outlet opening (28). The portable system includes a seal assembly (30) configured to substantially seal the outlet opening and an evacuation unit connected to the seal assembly. The seal assembly has the capability of being moved to the object. The evacuation unit (44) is configured to establish a flow of gases within the interior space of the object. The evacuation unit has the capability of being moved to the object. The flow of gases within the interior space of the object substantially removes particulates and/or volatiles from the interior space. The portable system also includes a filtering unit (50) which is configured to treat the gases. The filtering unit has the capability of being moved to the object.

Abstract: There is obtained an MOCVD oriented vaporizer which eliminates a phenomenon that thin-film materials are adhered to a portion of the vaporizer near and around a spout thereof. A carrier gas/small amount oxidizing gas supply part supplies a carrier gas, which is supplied through an internally formed gas passage and which contains a material solution, to a vaporization part; a bubble prevention/material solution supply part supplies a material for preventing generation of bubbles of the carrier gas containing the material solution, and the material solution, into the carrier gas; a solvent vaporization restricting/cooling system restricts vaporization of a solvent; and a swirl flow preventing gas supply part supplies a gas for preventing occurrence of swirl flows near a gas outlet of the vaporization part.

Abstract: A substrate processing apparatus for drying a substrate including a chamber, a vapor supply part, an open/close valve, and a controller, is disclosed. While the chamber is hermetically sealed, a substrate is cleaned by pure water. Water vapor of high temperature and pressure is thereafter supplied from the vapor supply part, to raise the temperature and pressure in the chamber. When the substrate surface is covered with pure water at a temperature of 100 degrees centigrade or higher, the controller brings the open/close valve to an open state to release the ambient atmosphere in the chamber in the atmosphere outside, thereby instantaneously bringing the chamber to a condition of reduced pressure. As a result, water mark formation caused by processing solution adhering to the substrate is suppressed in the drying process.

Abstract: Process for the production of flexographic printing plates by means of direct laser engraving, in which the particulate and gaseous degradation products formed in the course of the engraving are taken up by means of a suction apparatus, and the waste gas stream laden with the degradation products is purified by means of a combination of at least one solids filter and at least one oxidatively operating purification stage.

Abstract: The present invention resides in a washing device constructed by a conveyer of a carrying-in side arranged in a frame, a reservoir lower portion having plural rails for holding the work and an ultrasonic generator arranged in this frame, each reservoir upper portion united with this reservoir lower portion, a raising-lowering device for raising and lowering each reservoir upper portion, an arm mechanism for work conveyance, a moving device for controlling advancing and retreating movements of the arm mechanism, a movable device for controlling a swinging return of the arm mechanism, and a conveyer of a carrying-out side for conveying a processed work. The conveyer and the rail of each reservoir lower portion are approximately arranged on the same face. The work is horizontally moved through this conveyer and the rail and is washed and dried by utilizing the union of each reservoir lower portion and each reservoir upper portion.

Abstract: A surface cleaning apparatus is disclosed. In some embodiments, the surface cleaning apparatus comprises a member having a dirty fluid inlet. A fluid flow path extends from the dirty fluid inlet to a clean air outlet of the surface cleaning apparatus and includes a suction motor. At least one cyclone is positioned in the fluid flow path and has at least one material outlet and a divider plate associated with the material outlet. A material collection chamber is in flow communication with the at least one cyclone. The apparatus further comprises a liner bag retaining member.

Abstract: There is disclosed a substrate processing apparatus including a processing chamber housing a substrate, pipes for supplying gas into the processing chamber, and heaters provided in the middle of the pipes, and heating the gas. In the substrate processing apparatus, the heaters heat the gas to a temperature lower than a temperature at which exhaust gas is generated from the pipes to dry the substrate in the heated gas.

Abstract: Concentrated hydrogen peroxide solution is utilized for biomass, biofilm and pathogen remediation and/or sterilization, disinfection, sanitizing, cleaning and/or removing soils from spaces or surfaces. Instead of utilizing diluted low concentration and pH slightly acidic to alkaline hydrogen peroxide, the applicant proposes the use of a formulated and concentrated hydrogen peroxide solution with preferably with an acidic pH such as about 3.5 along with low levels of inhibitors and/or the addition of activators such as ozone, iron, etc. Foaming occurs in many instances identifying treatment in progress and an anti-microbial solution can provide long term protection against re-growth.

Abstract: A trash container having a base disposed on a support surface. The base has an aperture adjacent the support surface. A receptacle is disposed above the base. The receptacle contains debris received from an opening in an upper end of the receptacle. A vacuum draws debris through the aperture into a channel adjacent to the base and toward the receptacle. A collection chamber is associated with the receptacle and is configured to receive and collect debris from the vacuum and direct debris into the receptacle. The trash container can also include a lid disposed on an upper end of the receptacle. A method of collecting debris for depositing in a trash container includes providing suction to an aperture in a base of the trash container to draw debris from a surface adjacent the container. The method also includes capturing the debris drawn through the aperture in a collection chamber.

Abstract: Disclosed is a method for drying a surface of a disc-shaped article comprising covering said surface with a rinsing liquid, whereby a closed liquid layer is formed, and removing said rinsing liquid, wherein said rinsing liquid containing at least 50 wt. % water and at least 5 wt. % of a substance, wherein the substance lowers the surface energy of water, wherein said removing of the liquid is initiated by blowing gas onto said closed liquid layer, whereby the closed liquid layer is opened at on discrete area.

Abstract: Resists can be removed while metal contamination of wafers, etc. and generation of particles, and growth of oxide films are suppressed. A substrate processing method comprises feeding a processing gas, such as ozone gas, into a processing vessel to pressurize an atmosphere surrounding a substrate. A solvent gas, such as steam, is fed into the processing vessel while the processing gas is fed into the processing vessel, whereby a resist of the substrate can be removed with the solvent gas and the processing gas while metal corrosion, etc. can be prevented.

Abstract: A jetting device and a method of jetting droplets of viscous medium onto a substrate. The jetting device includes a jetting outlet through which the droplets are jetted. The jetting device further includes a wall located at the jetting outlet, downstream of the jetting outlet seen in the jetting direction. The wall is provided with an orifice through which jetted droplets are permitted to pass through. A gaseous flow is provided within the space past the jetting outlet such that an adverse effect on the performance of the jetting device is prevented, the adverse effect resulting from the accumulation of viscous medium residue at the jetting outlet.

Abstract: An apparatus for inducing variable randomized patterns of traversing a floor of a swimming pool by a suction cleaner device; said apparatus comprising a water flow driven mechanism for axial rotation of a pool cleaner hose; said hose located between a suction pump inlet and said suction cleaner device.

Abstract: A method of cleaning a semiconductor device. The method includes: A chemical cleaning using an organic solvent without using deionized water. An iso propyl alcohol cleaning using the iso propyl alcohol. Drying by inserting the semiconductor device into a dryer and then ejecting an inert gas thereto to dry and clean simultaneously. A method may clean a semiconductor device without using deionized water, so that corrosion of the semiconductor device can be substantially prevented by avoiding the use of deionized water, while substantially removing containments from the semiconductor device.

Abstract: An apparatus for processing a substrate is disclosed. The apparatus includes a proximity head having a surface that can be interfaced in proximity to a surface of a substrate. The proximity head has a plurality of dispensing ports capable of dispensing a first process mixture and a second process mixture to the surface of the substrate. The proximity head also has a plurality of removal ports capable of removing the first and second process mixtures from the surface of the substrate. The apparatus also has a distribution manifold connected to the plurality of dispensing ports for dispensing the first process mixture and second process mixture. The distribution manifold is connected to the plurality of removal ports, and is structured to define selected regions of the proximity head for delivery and removal of the first process mixture and the second process mixture.

Abstract: A vacuum apparatus such as PM 400 or LMM 500 includes: a chamber to transfer or process a wafer; a plurality of movable parts in the chamber; a high-voltage power supply 485 to introduce a high voltage HV to the chamber; a gas supply unit 445 to supply a gas to the chamber; and an exhaust mechanism 490 to exhaust a purge gas in the chamber. The vacuum apparatus is cleaned by supplying the purge gas from the gas supply unit 445 and exhausting the purge gas in the chamber via the exhaust mechanism 490, repeating a motion of each movable part, and controlling the purge-gas pressure to be equal to or more than a predetermined pressure before and/or during and/or after the repeated motions of each movable part, and/or allowing the power supply 485 to intermittently output the HV before and/or after the motions of each movable part.

Abstract: A method for cleaning, method and device for the application of a protective medium to a turbine blade, and a method for placing cooling bores in a turbine blade is disclosed. For this purpose, hot supercritical carbon dioxide is used as a tempering and/or cleaning medium and compressed and decompressed one or more successive times. The cleaning medium is decompressed to a pressure at which the gas assumes a volume that is a multiple of the volume of the compressed cleaning medium in the pressure tank. In so doing, it is possible to remove particulate and other impurities, even from recesses, blind holes, or open hollow spaces.

Abstract: A drainpipe cleaning apparatus prevents leakage of cleaning fluid from the drainpipe while cleaning the drainpipe. The drainpipe cleaning apparatus 1 has a cleaning fluid tank 10 for storing the cleaning fluid, a fluid delivery line 15, fluid drain line 23, gas-liquid separation tank 24, gas exhaust line 26, circulation line 28, gas recovery line 31, cleaning fluid return line 33, and control device 45. The control device 45 runs a cleaning process by driving a gas discharge pump 36 to create negative pressure inside the wastewater drainpipe 2 in a transit vessel and driving a cleaning fluid pump 16 to cause the cleaning fluid to flow backwards through the wastewater pipe 2. The control device 45 also monitors the pressure detected by a inlet-side pressure detector 20 during the cleaning process.

Abstract: A device and method for vacuuming solid particles out of a chemical reactor tube.

Abstract: A wafer clamping apparatus is provided to secure a wafer within a chamber during wafer processing. The wafer clamping apparatus creates a pressure differential between a top surface and a bottom surface of the wafer. The pressure differential serves to pull the wafer toward a wafer support structure in contact with the wafer bottom surface, whereby the wafer is secured and maintained in an immobile state. The wafer clamping apparatus also includes options for controlling the pressure differential between the top and bottom surfaces of the wafer. The wafer clamping apparatus is implemented without requiring contact with the wafer top surface and with minimal increase in chamber design complexity.

Abstract: This disclosure provides an approach for cleaning an ion implanter. In this disclosure, there is a vacuum device having an in-take port adapted to receive a contaminant removing hose. The vacuum device and hose are configured to provide constant suction to the ion implanter. A dry ice blaster having a dry ice dispensing hose is configured to supply dry ice. A sealing plate is adapted to attach to an access section of a processing region of the ion implanter. The sealing plate has a first opening configured to receive the contaminant removing hose and the dry ice dispensing hose.

Abstract: Methods for processing substrate through a head that is configured to be placed in close non-contact proximity to a surface of a substrate are provided. One method includes applying a first fluid onto the surface of the substrate from conduits in the head when the head is in close proximity to the surface of the substrate and removing the first fluid from the surface of the substrate. The removing is processed just as first fluid is applied to the surface of the substrate, and the removing ensures that the applied first fluid is contained between a surface of the head and the surface of the substrate and the first fluid being applied and removed defines a controlled meniscus. The method further includes moving the controlled meniscus over different regions of the surface of the substrate when movement of the head or the substrate is dictated. The moving of the controlled meniscus enables processing of part or all of the surface of the substrate using the first fluid.

Abstract: A method for cleaning a dry compressing screw-type vacuum pump with internal compression includes the following method steps: operating the screw-type pump (12) at nominal rotation speed, mixing a cleaning fluid composed of a rinsing liquid and a rinsing gas at a volume ratio of at least 1:10, and introducing the cleaning fluid into the gas inlet (16) of the screw-type pump (12). The cleaning method allows a dry compressing screw-type vacuum pump with internal compression to be cleaned in a simple manner at regular intervals.

Abstract: Compositions for cleaning concrete or other cementitious substrates that do not contribute to the alkali-silicate reaction are provided, and methods for use thereof. The cleaning compositions comprise lithium salts such as lithium hydroxide, lithium oxide and/or lithium carbonate, at least one surface active agent, optionally a glycol ether and/or hydrocarbon solvent, a sodium-free or substantially sodium-free chelating agent or agents and/or one or more adjuncts at least partially contributing to the useful properties of the composition.

Abstract: The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.

Abstract: A device for drying substrate comprising a processing vessel housing a specified number of substrates such as semiconductor wafers installed erectedly in parallel to one another, a first substrate supporting member supporting substrates within the processing vessel, the processing fluid supplying section supplying to the processing vessel, the processing fluid for performing processing such as cleaning processing on the substrates, a processing fluid exhausting section exhausting processing fluid from the processing vessel, and a drying fluid supplying section supplying, to the processing vessel, the liquid drops of drying fluid for performing drying processing on the substrates.

Abstract: An EUV lithographic apparatus includes an EUV radiation source, an optical element and a cleaning device. The cleaning device includes a hydrogen radical source and a flow tube in communication with the hydrogen radical source. The cleaning device is configured to provide a flow of hydrogen radicals and the flow tube is arranged to provide a hydrogen radical flow at a predetermined position within the lithographic apparatus, for example for cleaning a collector mirror.

Abstract: Disclosed herein are a vacuum cleaner capable of being converted into a handy cleaner, and a handy cleaner-integrated vacuum cleaner. The vacuum cleaner includes a main body having a body inlet, a body outlet and a mounting part, and accommodating a motor assembly to induce air into the main body through the body inlet and then to discharge the air through the body outlet, and a dust container mounted on the mounting part to filter foreign matter from air which enters the main body through the body inlet; wherein the mounting part comprises a first mounting part on which the dust container is detachably mounted, and a second mounting part constituting an accommodation space. The handy cleaner-integrated vacuum cleaner includes an accommodation part formed on the main body to receive various kinds of nozzle, which will be connected to the body inlet.

Abstract: An first example method and apparatus for etching and cleaning a substrate comprises device with a first manifold and a second manifold. The first manifold has a plurality of nozzles for dispensing chemicals onto the substrate. The second manifold is attached to a vacuum source and/or a dry air/gas source. A second example embodiment is a wafer cleaning device and method that uses a manifold with capillary jet nozzles and a liquid capillary jet stream to clean substrates.

Abstract: A process of washing plastics contaminated with polychlorinated biphenyls (PCBs) is provided to reduce the concentration of the PCBs. A two-step process includes a first washing step using a selected washing solution or solvent, such as, a non-flammable solvent, and followed by a second step using thermal desorption. The two-step process enables reducing the concentration of PCBs in polymers, such as recovered from shredder residue, for example, to as low as 0.253 PPM. One of the preferred solvents is Perchloroethylene.

Abstract: A wet/dry vacuum bag may be used to collect both wet and dry debris without destruction of the bag and without loss in performance.