Abstract: A floor care appliance such as a vacuum cleaner is provided having a traction wheel powered edge cleaner comprised of a vertical axis rotary agitator which is affixed to either the right or left side of the suction nozzle. The agitator is rotated by the traction wheel when the vacuum cleaner is disposed along a wall surface and moved relative to the wall surface. The rotating action of the agitator sweeps dirt particles off of the wall surface and along the edge of the wall surface into the path of the suction nozzle for pickup. When not in use the edge cleaner is stored in the accessory storage rack like other accessory tools. The agitator can have differing agitator elements such as bristles or a fluff wheel.

Abstract: A method for processing semiconductor wafers includes processing a semiconductor wafer in a processing chamber having upper and lower chambers, decoupling the upper chamber from the lower chamber, cleaning the upper chamber, determining, while decoupled, that a leak rate and a particle count for the upper chamber meets predetermined criteria, and coupling the upper chamber to the lower chamber.

Abstract: When vehicle wheels are powder-coated with powder coating, those surfaces on which no coating is wanted are always also coated. To suck off the powder coating from these surface areas before it is baked in, a device which includes a conveyor system, an electronic camera and a suction station is used. The electronic camera records the axial and angular position of the vehicle wheels which pass it, and supplies corresponding data to a controller. After a certain time delay, this causes a suction head in the suction station to move, in such a way that it approaches the vehicle wheel with appropriate alignment of its axis and angular position, and using suction nozzles sucks off those surfaces of the vehicle wheel on which the powder coating is not wanted. During the suction process, the suction head moves together with the vehicle wheel, at the same speed.

Abstract: A method for cleaning a heat exchanging coil in an air conditioning unit using a low-pressure cleaning system to remove foreign particles that have accumulated on the heat exchanging coil. The low-pressure cleaning system discharges air at a low pressure, high velocity, and a high volume in order to clean the heat exchanging coil. Further, the low-pressure cleaning system can inject a substance into the discharge air flow to aid in cleaning the heat exchanging coil.

Abstract: A method for removing an oxide material from a crack in a substrate, the method includes: applying a slurry paste comprising a fluoride salt to the crack; heating the slurry paste and the crack to at least a melting point of the fluoride salt to form a reaction product; and removing the reaction product.

Abstract: The cleaning of particles from an electrostatic chuck. In one embodiment, a method of cleaning an electrostatic chuck in a processing chamber is disclosed. The method comprises directing a flow of gas across the electrostatic chuck to dislodge particles from the electrostatic chuck and removing the flow of gas and particles through an exhaust port in the processing chamber. In this embodiment, the vacuum integrity of the chamber is not compromised during the cleaning of the electrostatic chuck.

Abstract: A cleaner is provided for cleaning the end surface area of a ferrule of a fiber optic connector. The cleaner includes a housing having a mating portion for mating the cleaner with the connector. A cleaning head is movably mounted on the housing for movement across the end surface area. A motor is mounted on the housing and is coupled to the cleaning head for moving the cleaning head in response to operation of the motor. An air jet is mounted on the housing for directing a stream of a cleaning medium toward the cleaning head to remove residue from the end surface area. An exhaust is provided on the housing for removing and evacuating residue from the end surface area. A plurality of the cleaners are mounted on a dummy circuit board for cleaning the end surface areas of the ferrules of a plurality of fiber optic connectors mounted in a given pattern on a backplane of a chassis.

Abstract: A contact lens transfer device for transferring a contact lens from a storage container to a contact lens applicator has a body and a contact lens holder movably mounted on the body. The contact lens holder defines a contact lens support surface, a fluid-flow aperture extending through the contact lens support surface, and a chamber coupled in fluid communication with the fluid-flow aperture. A contact lens is removably receivable on the lens support surface, and the fluid-flow aperture is coupled in fluid communication with an interface between the contact lens and lens support surface for introducing fluid from the chamber, through the fluid-flow aperture and into the interface to release the lens from the lens support surface.

Abstract: A method and device for removing sawdust from a deck surface (24) of a wooden pallet (10) is provided. The device comprises a rotary brush (124) having a working length (WL) defined by a plurality of bristles (130). The working length (WL) is greater than a width (WD) of the deck surface (24). A mechanism (136) is connected with the rotary brush (124) and is actuatable for rotating the rotary brush (124). A support (32) rotatably supports the rotary brush (124). The mechanism (136) is fixed relative to the support (32). Rotation of the rotary brush (124) when the bristles (130) are in contact with the deck surface (24) of the wooden pallet (10) simultaneously removes sawdust and debris across the width (WD) of the deck surface (24).

Abstract: A bar jet assembly formed of a base plate having a cleaning fluid discharge chamber communicating with a cleaning fluid input surface and a discharge slot in a cleaning fluid output surface; and a pair of cover plates coupled to the fluid output surface of the base plate and forming therebetween an inclined cleaning fluid discharge orifice communicating with the base plate discharge slot.

Abstract: A lane maintenance machine has a cleaning system that includes at least one cleaning liquid dispensing head which reciprocates back and forth transversely of the lane as the machine travels along the length of the lane. In a preferred embodiment the dispensing head emits successive squirts of liquid from a positive displacement pump, such as a peristaltic pump. The positive displacement pump provides accurate, precise metering of the cleaning liquid and affords board-by-board control of the dispensing action. A wiping assembly immediately behind the cleaning liquid dispensing head provides a web of cloth-like material looped under a compressible backup roller to wipe the applied liquid into a thin film and to pick up a measure of the liquid along with oil and dirt.

Abstract: The invention relates to a method for preventing contamination on the surfaces of optical elements comprising a multi-layer system, during the exposure thereof to radiation at signal wave lengths in an evacuated closed system comprising a residual gas atmosphere, whereby the photocurrent generated by means of photo emission from the radiated surface of the multi-layer system is measured. The photocurrent is used to regulate the gas composition of the residual gas. The gas composition is altered according to at least one lower and one upper threshold value of the photocurrent. The invention also relates to a device for regulating the contamination on the surface of at least one optical element during exposure and an EUV-lithographic device and a method for cleaning the surfaces of the optical elements contaminated by carbon.

Abstract: A cleaning device (10) includes a handle assembly (14). A cleaning head (12, 312, 512) is pivotally mounted to the handle assembly (14). The cleaning head selectively holds a cleaning pad (70) for collecting dust and debris from a surface to be cleaned. A suction nozzle (18) is carried by the cleaning head. A dirt collecting receptacle (208) is mounted to the housing and is in fluid communication with the suction nozzle and with a suction fan and motor assembly (30). At least one spray nozzle (22) is mounted on the suction nozzle. A liquid delivery system (90) delivers a cleaning fluid to the at least one spray nozzle.

Abstract: A dual mode carpet cleaning method is capable of being used in both a deep cleaning mode and a fast drying surface cleaning mode. The method utilizes a carpet cleaning apparatus that provides selective communication with different sets of cleaning jets. One set of cleaning jets is operated to deliver a first cleaning solution that penetrates deeply into a carpet in the deep cleaning mode. A second set of cleaning jets is operated to deliver a lower flow rate of a second cleaning solution that does not penetrate as deeply into the carpet and dries quickly. The method involves manually operating a valve on the apparatus to selectively communicate a source of cleaning fluid of the apparatus with one of the first set of cleaning jets and the second set of cleaning jets, and discharging the cleaning liquid from the selected one of the first set of cleaning jets and second set of cleaning jets onto a carpet to be cleaned.

Abstract: A pipe renovating method and system in which a pipe is first cleaned and then coated with a suitable coating material. In the cleaning step, pressurized air and particles of abrasive material are pumped into a first end of a pipe while suction is applied to the second end of the pipe via a vacuum pump to improve flow along the entire length of the pipe. The coating material is subsequently pumped in at one end of the cleaned pipe while suction is applied at the other end. In each step, the suction flow rate is higher than the input flow rate, so as to steer the mixture towards the second end. This method can be used to coat and clean different sections of a pipe system, by connecting the input materials successively to different access ports in the system.

Abstract: A three-dimensional printer uses inkjet-type printheads to rapidly prototype, or print, a three-dimensional model. A powder feeder includes a conveyor system and a metering system to deliver powder to a build area in measured quantities. The powder feeder also includes a vacuum system for loading powder into a feed reservoir or chamber. The vacuum system can also be used to cleanup excess powder. Other powder control features include powder gutters and magnetic powder plows. During printing, a cleaning system operates to remove powder from the printheads. In the event of a printhead or jet failure, the failure can be detected and corrective measures taken automatically. After printing, the model can be depowdered and infiltrated in an enclosure.

Abstract: In the drying step of the single wafer type substrate cleaning system for cleaning wafers not stored in a cassette, in a sealed cleaning housing, a spin drying treatment is applied to the wafer when the wafer is supported and rotated at high speed while an inert gas for preventing oxidation is supplied to the face of the wafer, and the amount of the inert gas to be supplied to the face of the wafer is larger at the outer peripheral portion of the wafer than that supplied at the center thereof, thereby preventing oxidation on the face of the wafer effectively while optimizing the benefits of the single wafer type cleaning system.

Abstract: A floor cleaning machine has one or more barriers immediately behind one or more scrubbing brushes, wherein the barriers capture and control flow of a cleaning solution (and/or other substances) that exits from beneath the scrubbing brush(es) so that such a solution is retained adjacent the scrub brush(es) and recycled underneath the scrub brush(es) for enhancing the floor cleaning effectiveness of the floor cleaning machine. The captured solution is urged back into contact with the scrubbing brush(es) by the same rotating action that urged the solution to be ejected from the scrubbing brush(es). The machine also includes at least one splash guard and a squeegee mounted at the rear of the machine, with each of these latter components serving distinctly different functions from that of the barriers. The machine may also include an exterior top storage area for retaining various items that are useful in cleaning the floor.

Abstract: A gutter broom assembly for a street sweeper and method of use are disclosed. The invention relates to street sweeper having a vacuum system for moving air through a portion thereof and having a gutter broom assembly. The gutter broom assembly includes housing, a gutter broom being movable between an operational orientation and a transport orientation relative to the housing, and a skirt assembly attached to the housing. A sweeping chamber is defined within the housing and the skirt assembly which substantially encloses the gutter broom. A vacuum connection between the sweeping chamber and the vacuum system is provided for removing dust within the sweeping chamber when the gutter broom frame is in its operational orientation.

Abstract: Ruthenium, osmium and their oxides can be etched simply and rapidly by supplying an atomic oxygen-donating gas, typically ozone, to the aforementioned metals and their oxides through catalysis between the metals and their oxides, and the ozone without any damages to wafers and reactors and application of the catalysis not only to the etching but also to chamber cleaning ensures stable operation of reactors and production of high quality devices.

Abstract: A biological treatment system, including a wastewater system drain field and at least one perforated distribution pipe located within the drain field and adapted to receive effluent. At least one perforated outer pipe surrounds the at least one distribution pipe to receive effluent from the at least one distribution pipe and to dispense the effluent to the drain field after it has been biologically treated in the at least one outer pipe. The system also includes a method of biological treatment comprising the steps of supplying effluent to at least one vessel positioned within a wastewater drain field; delivering gas to the at least one vessel to interact with the effluent such that the effluent experiences aerobic biological treatment; and passing biologically treated effluent from the at least one vessel to the wastewater drain field.

Abstract: The present invention relates to methods and apparatuses for the use of atmospheric pressure non-thermal plasma to clean and sterilize the surfaces of liquid handling devices.

Abstract: In accordance with the invention, the polymeric coating is removed from a coated optical fiber by disposing the fiber within a non-oxidizing environment and applying sufficient heat to volatilize at least a portion of the polymeric coating. The result is that the coating material bursts from the fiber, yielding a clean glass surface virtually free of surface flaws. In a preferred embodiment the non-oxidizing environment is inert gas and the heat is provided by resistive filament heaters.

Abstract: A developing method comprises determining in advance the relation of resist dissolution concentration in a developing solution and resist dissolution speed by the developing solution, estimating in advance the resist dissolution concentration where the resist dissolution speed is a desired speed or more from the relation, and developing in a state in which the resist dissolution concentration in the developing solution is the estimated dissolution concentration or less.

Abstract: The present invention provides a fluid injection and recovery device capable of spraying a fluid over an object, recovering at least, the sprayed fluid, as well as filtering and recycling the recovered fluid. This fluid injection and recovery device comprises: a main tank capable of containing fluid; a filter unit capable of filtering the fluid contained in the main tank; a fluid sprayer for spraying the fluid filtered with the filter unit over an object; and a recovery unit capable of recovering, into the main tank, the fluid sprayed over the object and the matter removed by the fluid.

Abstract: An embodiment of the invention is an apparatus having a cleaning tank 2, a megasonic energy source 3, and an intake pipe 6 where a membrane contactor 9 is coupled to the intake pipe 6 to change the concentration of nitrogen gas in the deionized water 8 contained in intake pipe 6 to a range between 5.4% to 54% of saturation. Another embodiment is a method of changing the concentration of nitrogen gas in deionized water 8 to a range between 5.4% to 54% of saturation.

Abstract: A method of clearing residue from a fluid conduit includes commencing flush fluid flow through the fluid conduit and injecting a first fluid into the fluid conduit at a first point to induce turbulent flow of the flush fluid. The first fluid is preferably a gas. The method further includes sampling the flush fluid downstream of the first point to confirm the residue is adequately cleared from the fluid conduit.

Abstract: A general method and apparatus for treating materials at high speed comprises the steps of dissolving a relatively high concentration ozone gas in a solvent at a relatively low predetermined temperature T1 to form an ozone-solvent solution with a relatively high dissolved ozone concentration, and heating either the ozone-water solution or the material to be treated or both, the ozone-solvent solution and the material to be oxidized with a point-of-use heater to quickly increase the temperature to a predetermined higher temperature T2>T1, and applying the ozone-solvent solution to said material(s) whereby the heated ozone-water solution will have a much higher dissolved ozone concentration at said higher temperature, than could be achieved if the ozone gas was initially dissolved in water at said higher temperature.

Abstract: A wheel frame for supporting at least two wheels along the bottom surface of a vacuum inlet nozzle of the type commonly used for vacuuming concrete floors of shops and other areas which have cement or wooden floors. The wheel frame is rectangular and has preferably two wheels held by the frame. The frame fits over the conventional vacuum nozzle and snaps over the flange at the bottom of the vacuum nozzle. The wheels are positioned so that they are near the back of the nozzle so that the front edge of the nozzle can be lifted by tilting the nozzle toward the back. This greatly facilitates the vacuuming up of leaves and other larger objects which do not fit under the front edge of the conventional vacuum nozzle.

Abstract: A process for removing an aqueous slurry suspension comprising a blast medium and coating substance residues which produced when cleaning surfaces which have a corrosion protection coating. The process, which is particularly applicable to ships and industrial facilities, involves the steps of a) suctioning the aqueous slurry suspension by means of an air feed into a receiving tank which has an outside pressure to tank vacuum ratio of more than 1:0.52; b) diluting the suspension with water; c) continuous feeding of the diluted suspension by means of a pump overcoming a height differential>5 meters; d) separating the solids from the water by means of sedimentation in a settling tank; and e) recycling the separated water. Suctioning of the aqueous slurry suspension is by means of air into receiving a tank which has a vacuum of at least 0.5 bar with respect to atmospheric pressure, in combination with a pump which continuously feeds the water-diluted suspension over a height differential>5 meters.

Abstract: An apparatus and method for automatically collecting metallic impurities of a semiconductor wafer. In one aspect, an apparatus includes an air tight process chamber including a loading unit for loading the semiconductor wafer and unloading unit for unloading the semiconductor wafer; a vapor phase decomposition unit disposed in the process chamber for decomposing a silicon oxide layer on the semiconductor wafer; and a scanning unit disposed in the process chamber for scanning the semiconductor wafer to collect the metallic impurities. The scanning unit includes a scanning solution bottle for obtaining scanning solution that is used for absorbing metallic impurities on the semiconductor wafer; a scanning arm capable of downward, upward, and rotational movement; and a nozzle coupled to the scanning arm for drawing in scanning solution from the scanning solution bottle, and for forming a droplet of scanning solution that cohers to the nozzle when scanning a semiconductor wafer to collect metallic impurities.

Abstract: A carpet grooming attachment for a motorized brush device, the attachment having a generally triangular shaped housing; the attachment attaching to the wheel axle of a motorized brush device; a brush; means for delivering fluid attached to a external surface of the housing; and means for providing suction to the housing. The means for delivering a fluid may have at least one interchangeable and adjustable spray tip to deliver the fluid. The carpet grooming attachment of the present invention may have a pre-spray hose. The invention also includes a carpet-cleaning device with an attachment and methods of cleaning carpets using a motorized brush device with a carpet grooming attachment.

Abstract: A cleaning method and an etching method for removing, by cleaning grease components and silicon micro pieces hard to remove, used for an apparatus and a carrier for manufacturing a semiconductor wafer or a semiconductor device. Matters to be removed are brought into contact with XeF2 gas produced by sublimation in a vacuum atmosphere to decompose and gasify the grease components and to remove silicon pieces by etching. If a trace of residual water is left in the vacuum atmosphere before the cleaning, the H2O reacts with XeF2, so that HF is produced. Therefore, for example, the native oxide SiO2 formed on the silicon pieces can be removed, and XeF2 can directly react with silicon, thereby enabling etching. The cleaning and etching speeds are extremely accelerated.

Abstract: The invention proposes a process and device for the at least partial elimination of carbon deposits in a heat exchanger in which an oxidation treatment is carried out comprising at least one controlled-oxidation stage at a conventional temperature between 400 and about 500° C. for a period of at least 4 hours, by means of an oxidizing fluid comprising for the greater part an inert gas, and a lesser quantity of oxygen, under conditions such that the temperatures of the fluids feeding or leaving the heat exchanger remain below about 520° C. throughout the oxidation treatment, and in that the hot approach of the exchanger remains below about 120° C. throughout the oxidation treatment. The invention also relates to a hydrotreatment system for the implementation of this process and this device.

Abstract: A method for cleaning a plasma chamber after metal etching. First, a substrate having a metal layer thereon is placed in a plasma chamber. Next, the metal layer is etched. Finally, the substrate is removed from the plasma chamber to perform a dry cleaning which includes the following steps. First, the inner wall of the plasma chamber is cleaned by plasma etching using oxygen as a process gas. Next, the top and bottom electrode plates in the plasma chamber are cleaned by plasma etching using chlorine and boron chloride as process gases. Next, the inner wall of the plasma chamber is cleaned again by plasma etching using sulfur hexafluoride and oxygen as process gases. Finally, oxygen and helium used as purging gases are injected into the plasma chamber and exhausted from therein.

Abstract: A vacuum cleaner attachment and method of use thereof provides an effective cleaning system for fungi and the like. A vacuum paddle extension enables the attachment to travel into narrow cracks and crevices where fungus may grow and by use of an abrasive and porous pad dislodges such fungus or fungi. When attached to a vacuum system, such as a HEPA (High Efficiency Particulate Air-Filtered) vacuum system, the debris and particulate matter generated by the abrasive process is drawn into the vacuum attachment and into the vacuum system where it is removed from the air which is then expelled by the vacuum system. Better cleaning of surfaces afflicted with fungi, molds, and the like is then achieved in a manner that is safer and more effective.

Abstract: An exhaust adaptor and method which includes attachment of an exhaust bellow or conduit to a process chamber to facilitate vacuum-induced evacuation of residual toxic gases from the chamber during cleaning and/or maintenance of the chamber. A throttle valve of the chamber is first removed from a throttle valve housing, and one end of the exhaust adaptor is next attached to the throttle valve housing. An exhaust bellow or conduit is attached to the opposite end of the adaptor. As a down flow of air is directed into the open chamber, vacuum pressure is induced in the chamber interior through the exhaust bellow or conduit, the adaptor and the valve housing, respectively. Air disturbances in the chamber interior are thus eliminated, and toxic residual gases generated in the chamber interior are therefore incapable of diffusing to the exterior of the chamber.

Abstract: A cleaning method for removing fats, oils, and silicon small particles, which are conventionally difficult to remove, adhering to devices and carriers used to manufacture a semiconductor wafer or a semiconductor device. An etching method is also disclosed. XeF2 gas produced by sublimation is made to contact with an object to be cleaned in a vacuum atmosphere so as to decompose and gasify the oils and fats and to remove silicon small particles by etching. Prior to the cleaning, when a trace amount of residual water is left in the vacuum atmosphere, H2O reacts with XeF2, and HF is produced. For example, a native oxide SiO2 formed on the surface of silicon small particles can be removed, and XeF2 directly reacts with silicon, therby enabling etching. The cleaning etching rates are extremely high.

Abstract: The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.

Abstract: An apparatus and method for cleaning objects having generally irregular surface features, such as reloadable photographic cameras, has a partial enclosure having opposing side walls, and a top wall joining the opposing side walls. An air ionizing element composed of an ion emitter and an air knife is arranged in the enclosure for electrostatically neutralizing the object with ions entrained in a curtain-like stream of air directed onto the object.

Abstract: A method of cleaning the interior of a processing chamber first performs a halogenation treatment by supplying a treatment gas containing a halogenating gas into the processing chamber and heating a support member for a target substrate, thereby halogenating a metal element in a by-product film. A reduction treatment is then performed by supplying a treatment gas containing a reducing gas into the processing chamber, thereby reducing a halide of the metal element and liberating the metal element. An oxidation treatment is then performed by supplying a treatment gas containing an oxidizing gas into the processing chamber and heating the casing walls of the processing chamber, thereby passivating the liberated metal element by oxidation.

Abstract: A device and method of use for cleaning a ground surface with pressurized cleaning solution is disclosed. The device includes a transportable deck having at least a first chamber and a second chamber, each first and second chamber being in open communication with the surface, said first chamber having a nozzle for directing a pressurized cleaning solution toward the ground surface, and said second chamber having a vacuum outlet for removing cleaning solution and debris from the surface. Additional embodiments of the present invention may include a solution recycling system for reusing recovered solution.

Abstract: A cleaning apparatus for an ECMD anode pad including a vacuum head which applies vacuum pressure to the surface of the anode pad between ECMD operations in order to remove particles precipitated onto the surface of the anode pad and prevent or minimize inadvertent scratching or peeling of a wafer supported by the pad during the process. The particles are dislodged from the anode pad and removed from the ECMD system by flow of electrolyte solution into the vacuum head. The electrolyte solution is typically filtered before returning to the electrolyte tank for ultimate redistribution to the ECMD system.

Abstract: In one embodiment, the invention includes a method of removing at least a portion of a material from a substrate. The method includes providing a substrate in a reaction chamber, the substrate having a material supported thereover, and first etching the material while the substrate is in the reaction chamber. The method also includes, after the first etching, cleaning a component from at least one sidewall of the reaction chamber while the substrate remains therein; the component comprising a species that is present in the material. The cleaning includes exposing the sidewall and substrate to conditions which substantially selectively remove the component from the sidewall while not removing the material from the substrate, and not etching any other materials supported by the substrate. After the cleaning, the method includes second etching the material while the substrate is in the reaction chamber.

Abstract: A method and apparatus are provided for removing solid and/or liquid residues from electronic components such as semiconductor wafers utilizing liquid or supercritical carbon dioxide which is solidified on the surface of the wafer and then vaporized and removed from the system. In a preferred embodiment the solidification and vaporizing steps are repeated (cycled) before removal of the CO2 from the vessel. The residues are carried away with the vaporized carbon dioxide.

Abstract: A process for etching multiple layers on a substrate 25 in an etching chamber 30 and cleaning a multilayer etchant residue formed on the surfaces of the walls 45 and components of the etching chamber 30. In multiple etching steps, process gas comprising different compositions of etchant gas is used to etch layers on the substrate 25 thereby depositing a compositionally variant etchant residue inside the chamber 30. In one cleaning step, a first cleaning gas is added to the process gas to clean a first residue or to suppress deposition of the first residue onto the chamber surfaces. In a second cleaning step, another residue composition is cleaned off the chamber surfaces using a second cleaning gas composition.

Abstract: A method and a device for controlling the suction, by speed alteration of a blower motor, in a unit for suctioning away thread breakage in a textile machine. A standard speed of the blower motor without speed control is established to achieve the suction, after which the speed of the blower motor is so controlled that a set suction is reached and maintained.

Abstract: A method for cleaning an electrodeposition surface following an electroplating process including providing a process surface including electro-chemically deposited metal following an electrodeposition process; and, cleaning the process surface with a sulfuric acidic cleaning solution to remove electrodeposited metal particles according to at least one of an immersion and spraying process the spraying process including simultaneously rotating the process surface.

Abstract: A system for processing substrates within a chamber and for cleaning accumulated material from chamber components is provided. The system includes a reactive species generator adapted to generate a reactive gas species for chemically etching accumulated material from chamber components, and a processing chamber having at least one component with a mirror polished surface which is exposed to the reactive species. Preferably to have the greatest impact on chamber cleaning efficiency, the mirror polished surface is a surface of a component such as a gas distribution plate or a backing plate, and/or is a surface of a plurality of smaller components (e.g., chamber wall liners, a gas conductance line, etc.) so as to constitute a large percentage of the surface area exposed to the reactive species. Most preferably all bare aluminum surfaces which the reactive species contacts are mirror polished.

Abstract: A milking plant for milking animals, such as cows, wherein milk collecting means, prefeably in the form of teat cups, are attached to the teat of the animal whereafter milk is taken from the animal by use of vacuum. The milk is transported by a milk line system (31) to milks storage means comprising a cooling tank (30). For cleaning purposes the milk line system from each milk collecting means can be shut off from the milk tank by valve means (32) in order for separate cleaning of the milk line system. The invention is characterized by preventing any possible leakage of detergent from a cleaning fluid to the milk that has been collected in the milk tank, by providing a pressure difference between the two fluids. The pressure difference between the fluids is preferably achieved by connecting the cleaning fluid to the vacuum supply (4) of the milking plant.