Abstract: A method and system for removing volatile residues from a substrate are provided. In one embodiment, the volatile residues removal process is performed en-routed in the system while performing a halogen treatment process on the substrate. The volatile residues removal process is performed in the system other than the halogen treatment processing chamber and a FOUP. In one embodiment, a method for volatile residues from a substrate includes providing a processing system having a vacuum tight platform, processing a substrate in a processing chamber of the platform with a chemistry comprising halogen, and treating the processed substrate in the platform to release volatile residues from the treated substrate.

Abstract: In a first aspect, a method for cleaning a semiconductor fabrication chamber component having an orifice is provided. The method includes (A) placing the component into a bath having a cleaning solution; (B) flowing a fluid into the orifice thereby maintaining at least a first portion of the orifice free from cleaning solution while the cleaning solution cleans the component; and (C) withdrawing the fluid from the orifice such that cleaning solution enters into the first portion of the orifice and cleans the first portion of the orifice. Numerous other aspects are also provided.

Abstract: Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent drying step which preferably incorporates the use of a surface tension reducing agent during at least partial drying; and the method may be performed using automated rinsing equipment; also described are automated rinsing apparatuses useful with the method.

Abstract: An apparatus for inducing variable randomized patterns of traversing at least a floor of a swimming pool by a suction cleaner device; said apparatus including a water flow driven mechanism interposed between a suction pump inlet in a wall of said swimming pool and said suction cleaning device; said apparatus further including a suction hose and an angled connector attached to said suction hose; said angled connector rotatably connected to a swivelling outlet port of said suction cleaning device; said apparatus inducing substantially continuous axial rotation of said suction hose and said angled connector whereby rotating the hose and angled connector alters the geometry of the propulsion force of the pool cleaner thus steering the pool cleaner all over the pool.

Abstract: A substrate is inclined when treatment liquid is ejected onto the substrate to remove photoresist from the substrate. Uniform processing of the substrate with the treatment liquid and collection of the treatment liquid are thus facilitated. Collected treatment liquid is treated with ozone and then reused.

Abstract: Stepper and/or scanner machines including cleaning devices and methods for cleaning stepper and/or scanner machines are disclosed herein. In one embodiment, a stepper and/or scanner machine includes a housing, an illuminator, a lens, a workpiece support, a cleaning device for removing contaminants from the workpiece support, and a stage carrying the workpiece support. The stage and/or cleaning device is movable to selectively position the workpiece support proximate to the cleaning device. It is emphasized that this Abstract is provided to comply with the rules requiring an abstract. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims. 37 C.F.R. § 1.72(b).

Abstract: The pulsed partial pressure hydrogen cleaning of cobalt-based alloys in turbine components is achieved by disposing the component within a vacuum furnace and heating the component. Upon heating to about 1400° F., a partial pressure hydrogen gas and a vacuum are repetitively cycled within the furnace by supplying in each cycle a fresh supply of hydrogen gas, followed by removal of reaction products between the hydrogen gas and surface contaminants and substantially all residual hydrogen gas from within the furnace. The repetitious cycling renders the surfaces clean, enabling refurbishment thereof by activated diffusion healing repair.

Abstract: A cleaning processing apparatus comprises a spin chuck for holding a wafer W, an under plate being positioned to face the back surface of the wafer W with a prescribed gap provided therebetween, a support member for supporting the under plate, and a nozzle hole formed to extended through the plate member and the support member. A chemical liquid, a pure water and a gas can be supplied into a nozzle hole through opening-closing valves, and the chemical liquid and the pure water remaining inside the nozzle hole can be sucked by a sucking device. A pure water remaining inside the nozzle hole is sucked and removed by using the sucking device after the processing of the wafer W with a pure water and, then, a gas is spurted onto the back surface of the wafer W.

Abstract: A proximity head for generating and maintaining a meniscus for processing a substrate is described. The proximity head includes a plurality of meniscus nozzles formed on a face of the proximity head, the nozzles being configured to supply liquid to the meniscus, a plurality of vacuum ports formed on the face of the proximity head, the vacuum ports being arranged to completely surround the plurality of meniscus nozzles, and a plurality of gas nozzles formed on the face of the proximity head, the gas nozzles at least partially surrounding the vacuum ports. The proximity head further includes means for reducing a size and frequency of entrance and/or exit marks at a leading edge and a trailing edge on the substrate by aiding and encouraging liquid from the meniscus to evacuate a gap between the substrate and the carrier.

Abstract: A apparatus for drying a substrate includes a vacuum manifold positioned adjacent to an edge wheel. The edge wheel includes an edge wheel groove for receiving a peripheral edge of a substrate, and the edge wheel is capable of rotating the substrate at a desired set velocity. The vacuum manifold includes a proximity end having one or more vacuum ports defined therein. The proximity end is positioned at least partially within the edge wheel groove, and using supplied vacuum removes fluids that accumulate in the edge wheel groove and prevents re-deposit of trapped fluids around the peripheral edge of the substrate.

Abstract: An automatic cart wash apparatus. The automatic cart wash apparatus provides improved cleaning of stock carts on a regular basis over manual cleaning by store employees. The automatic cart wash apparatus includes three main stages: a debris removal (vacuum) stage, a cleaning (wash, sanitize, rinse) stage, and a drying stage. The debris removal stage uses forced air and/or suction to remove solid and generally non-soluble waste, such as a paper or other trash and debris, from a stock cart. The cleaning stage uses a selection of detergents, sanitizing agents, and rinse agents to remove soluble or sticky waste, such as food and liquids, and to kill germs, viruses, and bacteria present on the cart. The drying stage removes excess liquids from the cart making it ready for use by the next customer.

Abstract: A vacuum drum washer is designed to enable the use of an end-draining drum for drum lengths exceeding 20 feet. The drum washer includes a cylindrical drum having a mesh screen defining an exterior wall. A plurality of outer filtrate channels are disposed radially inward from the mesh screen. A plurality of inner filtrate channels are disposed radially inward from the outer filtrate channels and extend along generally less than an entire length of the drum. A transfer channel connects the outer filtrate channels and the inner filtrate channels. A plurality of radial drainage chutes are disposed adjacent a head end of the outer and inner filtrate channels, which direct the filtrate to a drain valve.

Abstract: A substrate treatment apparatus according to the present invention includes: a plate to be positioned in spaced opposed relation to one surface of a substrate and having a plurality of outlet ports and a plurality of suction ports provided in an opposed surface thereof to be opposed to the one surface of the substrate; a rinse liquid supplying unit which supplies a rinse liquid containing deionized water to the outlet ports of the plate; a suction unit which evacuates the suction ports of the plate; a drying promoting fluid supplying unit which supplies a drying promoting fluid to the one surface of the substrate to promote drying of the substrate; a substrate holding unit to be positioned on the other surface of the substrate opposite from the one surface for holding the substrate; and a supply controlling unit which controls the rinse liquid supplying unit to discharge the rinse liquid from the outlet ports toward the one surface of the substrate to seal a space defined between the one surface and the oppos

Abstract: An automatic festoon hose handling system for mass transit vehicles such as buses or the like, includes a vacuum or pressurized fluid source, a hose connected to the source, and a lance portion disposed on a distal end of the hose. A festoon assembly is positioned for suspending the hose from an overhead support. The hose is pneumatically extendable and retractable.

Abstract: A method of manufacture includes processing an object in a chamber and subsequently generating an electrical force of attraction to float contaminants off of a region adjacent the processed object before the object is unloaded from the chamber. The object may be processed with the use of plasma. The plasma is produced by introducing a first gas into the chamber and applying a source power to the first gas. The plasma is extinguished after the object is processed with the use of the plasma. Then, a second gas is introduced into the chamber and a source power is applied to the second gas to generate the electrical force of attraction. At this time, the parameters are controlled so that particle contaminants are readily removed without any influence on the object. Also, the same electrode can be used to apply source power to both the first and second gas. Thus, the operation of removing the particle contaminants is relatively simple.

Abstract: Above a wafer which is held by a spin chuck, a blocking member whose opposed surface to the wafer is approximately horizontal is disposed at a higher position than an organic solvent component supplying outlet which is able to move from a central position of the wafer toward the periphery of the wafer. An organic solvent component nozzle scans (moves) together with the blocking member, thereby efficiently supplying a gas containing an organic solvent component discharged from the organic solvent component supplying outlet onto a surface of the wafer without getting discharged from the vicinity of the surface of the wafer owing to the blocking member. Hence, when the organic solvent component nozzle scans (moves), the concentration of the organic solvent component is always high near the organic solvent component supplying outlet.

Abstract: A simple yet effective system for cleaning fans and air circulators facilitates the cleaning of ceiling and hard-to-reach units without having to remove the blades or other parts to be cleaned. A flexible bag encloses parts of a fan to be cleaned. A source of compressed air is used for inflating the bag, and a source of vacuum is used for collecting particulates used for cleaning. A user-controlled nozzle is used for spraying particulates against parts of the fan to be cleaned. The user-controlled nozzle terminates in a narrow tube operative to puncture the bag, which is preferably a transparent plastic bag. The source of compressed air and the source of vacuum may share a common vacuum unit with particulate filter such as a “shop-vac” type of equipment. The particulates used for cleaning may include any suitable abrasive though, in the preferred embodiment, granulated walnut or other nut shells are used. In contrast to devices that clean with liquids, the enclosure may envelope the motor and blades.

Abstract: A swimming pool cleaner discharges water jets under the cleaner body, directed toward its center from its sides, to agitate and lift debris toward one or more vacuum intake openings, to greatly enhance the cleaning ability of the cleaner. The suspended dirt and debris become semi-buoyant under the force of the jetted water which is preferably moving in the same direction as the cleaner, so that the relative speed between the cleaner and the suspended dirt and debris is reduced, thereby enabling the cleaner to move at a relatively faster rate and still clean with equivalent or even greater efficiency than a pool cleaner that is not equipped with directional cleaning water jets. In addition, displaced front and back orientations of the intake ports allow for longer time for any dirt and debris to be picked up.

Abstract: A portable vacuum canister is disclosed for vacuuming debris by a hand-held suction hose and for transferring the debris down through the vacuum canister and into an existing garbage disposal for grinding, where it is then washed down the drain. The vacuum canister adapts and slides into an existing disposal opening.

Abstract: Provided is an apparatus for cleaning a rubbing-cloth. The apparatus includes a rubbing-cloth fixing unit, a pile removing head, and a transferring unit. The rubbing-cloth fixing unit is fixed to a base body and fixes a rubbing-cloth that is substantially unfolded. The pile removing head is disposed on the rubbing-cloth fixing unit and sucks and removes the piles attached onto the rubbing-cloth. The transferring unit is fixed to the base body and transfers the pile removing head along an upper surface of the rubbing-cloth with respect to the rubbing-cloth fixing unit. Accordingly, particles that are generated when a rubbing-cloth is cut out from a fabric are quickly removed from the rubbing-cloth, so that scratches may be prevented from being generated on an alignment film.

Abstract: Provided is an apparatus for cleaning and drying a substrate by applying a plurality of chemicals and gases to the substrate. The apparatus may include: a substrate support member including a chuck receiving a substrate; a first nozzle member injecting a drying fluid onto a top surface of the substrate for drying the substrate; a low cover including an opened top and enclosing the chuck; and an upper cover selectively closing the opened top of the low cover so as to dry the substrate in a closed space. Therefore, the apparatus dries a substrate more efficiently and protects the substrate from being contaminated by foreign pollutants. Furthermore, generation of an undesired oxidation layer on the substrate can be prevented.

Abstract: Methods for reducing or inhibiting deposition on or within press felts to increase the effective life of the press felt and reduce or eliminate the need for batch cleaning are disclosed. The methods disclosed treat press felt while paper is being produced with compositions containing at least one enzyme. Additionally, the enzymes can be applied in combination with other non-enzymatic felt conditioning products either by blending and applying at the same application point or by applying the enzyme and the non-enzymatic felt conditioning product at two different locations along the felt. The treatments are applied continuously or intermittently.

Abstract: Provided is a machine and a method for inspecting an input shaft of a power system. First an second cameras take a photograph of first and second champer of the input shaft from directions perpendicular to the chamfers to capture image data of the chamfers. The input shaft is rotated by an indexing drive until overlapping a central line of first and second chamfers of an input shaft on a standard line of image array coordinate system of a computer. Then, widths of the first and second chamfers of the input shaft is calculated. Thereafter, the indexing drive rotates the input shaft by predetermined degrees. The computer processes image data of another first and second chamfers captured by the first and second cameras and calculates widths of the another first and second chamfers. Continuously, widths of remaining chamfers of the input shaft are calculated.

Abstract: A lithographic mask is placed in a chamber which is then sealed. The gas pressure in the chamber is reduced to dislodge contaminant particles on the mask surface.

Abstract: A method for cleansing used reaction cuvettes so that whenever certain assays are to be or have been performed in the reaction cuvette, the cuvette is automatically subjected to an additional cleaning operation by providing a number of washing and drying manifolds, each of which is independently selectively activated to perform or not perform a cleaning operation.

Abstract: A cleaning head for a vacuum sweeper that incorporates a magnetic flux generator that bathes the area of carpet being engaged by the rotating brush beater in the cleaning head with a pulsing magnetic field. The magnetic flux generator disrupts the static attraction between opposing charged small particles and the carpet fibers to which the small particles are attached to allow the brush beater apparatus in the cleaning head to separate the small particles from the carpet fibers. The dislodged small particles, including allergens, bacteria and mold spores, are removed from the carpet in the air stream created by the vacuum sweeper and captured by a micro-filter filtration system. The magnetic flux field is created with the conventional household current that powers the operation of the vacuum cleaner without requiring the generation of high voltages or an electrostatic discharge from the cleaning head.

Abstract: A robot cleaning system and a dust removing method of the same that are capable of moving a first dust collector mounted in a robot cleaner to a docking station to remove dust collected in the first dust collector. The robot cleaning system includes a robot cleaner having an opening, though which a first dust collector to collect suctioned dust is carried in and out of the robot cleaner, a docking station, to which the robot cleaner is docked to remove the dust collected in the first dust collector, and a collector moving unit to move the first dust collector to the docking station.

Abstract: A method for reducing energy consumption, and amounts of cleaning liquids and rinse liquids used. A cleaning head has a plurality of cleaning units and a drying unit. The organic, and inorganic, substance cleaning portions of each cleaning head, blows a first, and a second, cleaning agent selectively over a portion to be cleaned of a substrate, and sucks reaction products etc. through a first, and second, suction mouth, respectively. A rinse portion blows pure water over the portion of the substrate from which inorganic substances have been removed, and sucks its vapor through a third suction mouth. The drying unit dries the substrate by blowing out a heated gas from a hot wind blowing-out mouth. A light guide illuminates the portion to be cleaned, of the substrate, with ultraviolet light, and thereby decomposes residual organic substances.

Abstract: Ruthenium, osmium and their oxides can be etched simply and rapidly by supplying an atomic oxygen-donating gas, typically ozone, to the aforementioned metals and their oxides through catalysis between the metals and their oxides, and the ozone without any damages to wafers and reactors and application of the catalysis not only to the etching but also to chamber cleaning ensures stable operation of reactors and production of high quality devices.

Abstract: A vibration device separates foreign particles from a semiconductor device, and a suction interface of a suction device covers an opening portion of the semiconductor device. A space connected with a vacuum passage and a communication passage is formed between the semiconductor device and the suction interface. The suction device suctions the space, and fresh air is introduced into the space through the communication passage. As a result, a current of air is generated from the communication passage to the vacuum passage, and foreign particles are suctioned and removed from the space.

Abstract: A method is provided, which includes moving a mobile floor cleaning device along a floor; electrochemically activating a liquid on the mobile floor cleaning device, and dispensing the electrochemically activated liquid from the mobile floor cleaning device.

Abstract: A method is provided, which includes moving a mobile floor cleaning machine along a floor. Onboard the mobile floor cleaning machine, a liquid is sparged by electrolysis. The sparged liquid is dispensed from the mobile floor cleaning machine.

Abstract: In a method for a thin film forming apparatus, after the deposition of a thin film is completed, a cleaning gas may be introduced repeatedly into an interior of a process chamber for predetermined intervals. The method may be performed without a drastic temperature drop in the process chamber in order to remove a thin film layer left in the chamber. A purge gas may introduced into the chamber continuously or alternatively with the cleaning gas.

Abstract: Improved methods of rinsing and drying microelectronic devices by way of an immersion processing apparatus are provided for effectively cleaning microelectronic devices. Methods and arrangements control the separation of one or more microelectronic devices from a liquid environment as part of a replacement of the liquid environment with a gas environment. Cleaning enhancement substance, such as IPA, is introduced into the gas environment according to a controlled profile while the separation step is conducted. The controlled profile being directed to the timing of introduction of cleaning enhancement substance, the concentration of cleaning enhancement substance and/or flow rates thereof into the vessel. Controlled timing of gas and cleaning enhancement substance delivery can also improve effectiveness of separation.

Abstract: A plating apparatus and a plating liquid removing method removes a plating liquid remaining on a substrate-contacting portion, or portions in its vicinity, of a substrate holding member. The plating apparatus comprises a head having a rotatable housing provided with a substrate holding member for holding a substrate, a plating process container, disposed below the head, for holding a plating liquid therein, and a plating liquid removing mechanism for removing plating liquid remaining on the substrate-contacting portion, or the portions in its vicinity, at an inner circumferential edge of the substrate holding member.

Abstract: A towable sweeping apparatus includes a housing supported by a plurality of surface-engaging wheels and an impeller mounted to the housing and adjustable relative to the surface. The impeller includes a plurality of blades rotatable about an axis. A space permitting air flow is present between a portion closest to the axis of at least one of the plurality of blades and the axis. The towable sweeping apparatus also includes a drive motor inter-operably connected to the impeller and a bin arranged to receive debris collected by the impeller. The bin includes an angulated surface adapted to facilitate removal of debris from the towable sweeping apparatus.

Abstract: A counter-top appliance has a food container with internal fins extending inward from the outer wall at an angle offset from radial. The food container is coupled to a motor for rotation in either of two directions. One direction of rotation produces a scooping, elevating and subsequent discharge of liquid and fluent materials such as might be useful for washing or breading, while the second direction of rotation presents a surface adapted for massaging meat during marinating. The food container is preferably sealed through vacuum, and has a simple geometry which greatly facilitates thorough cleaning of the container. Meats, produce, pasta, and other diverse foods are processed using the counter-top appliance, and a method for processing one or a sequential set of foods is disclosed.

Abstract: A substrate is transferred from an environment at about vacuum into a load lock through a first door. The substrate is then sealed within the load lock. The pressure within the load lock is raised to a high pressure above vacuum. A second door coupling the load lock to a high-pressure processing chamber is then opened and the substrate moved from the load lock into the high-pressure chamber. The substrate is then sealed within the high-pressure chamber. High-pressure processing, such as high pressure cleaning or high pressure deposition, is then performed on the substrate within the high-pressure chamber. Subsequently, the second door is opened and the substrate transferred into the load lock. The substrate is then sealed within the load lock. The pressure within the load lock is lowered to about vacuum and the first door opened. The substrate is then removed from the load lock into the environment.

Abstract: An interface assembly for interconnecting respective housings and output and input drive shafts of a power plant and a vacuum blower by hard mounting, the interface assembly including: an adapter plate secured to a housing of the power plant in rigid and rotationally fixed contact therewith at an output drive shaft thereof; a rigid metal casting interfaced to the adapter plate on the power plant in rigid and rotationally fixed contact therewith, the rigid metal casting further interfaced to a housing of the vacuum blower in rigid and rotationally fixed contact therewith at an input drive shaft thereof; and a rigid coupler assembly interfaced in rigid and rotationally fixed contact to each of the output and input drive shafts for transferring power from the power plant output drive shaft to the vacuum blower input drive shaft.

Abstract: The invention relates to a method, whereby a cleaning and disinfecting circuit is established for the vacuum channels of an upper sealing tool (1) and a lower sealing tool (2). In the present case, the vacuum pump (3) is switched off and the connecting line to the sealing station is sealed or disconnected from the flanges at the point (10). The vacuum channels of the upper sealing station (1) are connected to the vacuum channels of the lower sealing tool (2) by means of an adapter (13) in a fluid-tight manner. The fluid circuit is closed by a pump (14), a fluid container (15) and the associated pipes, which are connected to the flanges (11), (12). Said pump (14) pumps a cleaning and disinfecting fluid, in the present case active chlorine, into the vacuum channels of the upper sealing station (1).

Abstract: A method of installing an inspection port on a pipe having asbestos insulation extending therearound in which the method has the steps of positioning the inspection port within a glove bag, affixing an opening of the glove bag onto a surface of the pipe, removing a section of asbestos insulation from the pipe, installing the inspection port onto the pipe within an area of the removed section, and removing the glove bag from the surface of the pipe. An air flow through the bag removes heat from the interior of the glove bag. The interior of the glove bag is maintained at a pressure below ambient.

Abstract: The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.

Abstract: A method and apparatus for cleaning a source gas introduction pipe, which can prevent strong adhesion of contaminant mainly containing carbon powder on an outer surface of the source gas introduction pipe to easily remove the contaminant in a short period of time. While compressed air is sprayed toward the contaminant, the contaminant removed by the spray of the compressed air is exhausted outside a system of a deposition chamber by suction and exhausting device so that the contaminant is not transferred to sides of the deposition chamber and a plastic container in which a CVD film is formed, in a process for extracting the source gas introduction pipe from the plastic container after the CVD film is formed on an inner surface of the plastic container.

Abstract: A method for cleaning and drying semiconductor wafers improves device yield by providing more advanced control of the ratio of drying fluid to cleaning fluid, for example the ratio of N2 vapor to IPA vapor. In addition, a quick drain process is employed to improve process throughput, and to further improve particle and watermark removal during the cleaning and drying steps.

Abstract: A hard surface cleaner includes a motorized scrub head, a fluid recovery device, a primary cleaning liquid component container, a cleaning agent container, a flow control device and a fluid flow path. The flow control device is configured to supply a flow of cleaning agent from the cleaning agent container at a flow rate of less than approximately 10 cubic centimeters per minute to a flow of primary cleaning liquid component from the primary cleaning liquid component container. The fluid flow path is configured to receive a flow of cleaning liquid, which comprises the cleaning agent and the primary cleaning liquid component.

Abstract: In a state of the inside of a treatment chamber of treatment equipment being evacuated, therein a cleaning gas containing trifluoroaceticacid (TFA) as a cleaning agent is supplied. Metal such as copper used in the formation of an interconnection or an electrode and stuck on an inner wall surface of the treatment chamber, when coming into contact with the cleaning agent (TFA) in the cleaning gas, without forming an oxide or a metallic salt, is directly complexed. The complex is sublimed due to the evacuation and is exhausted outside the treatment chamber. Accordingly, at less labor and low cost, the cleaning can be efficiently implemented.

Abstract: A device for alternately applying pressure and vacuum to pipes in order to remove or prevent build-up of undesirable coatings inside the pipes is disclosed. The device includes a pressure and vacuum source connected to a plenum having a hose attached to the plenum at a proximal end and a control mechanism attached to the hose near a distal end. The control mechanism is operable to control the plenum to rapidly switch between variable amounts of vacuum and pressure to the hose. The plenum may also be controlled to supply neither vacuum nor pressure to the hose. The device may be used in a wide variety of settings, including industrial, commercial, marine hospitality industry, and household settings.

Abstract: Gas is introduced prior to a flooding process of a vacuum chamber of a vacuum installation, into coverings of elements, which coverings can be ventilated such that solid bodies are blown out of said coverings thereby preventing a penetration of said solid bodies into the coverings.

Abstract: A longitudinal cutting device, that is usable for cutting a length of material such as a fabric or a paper web, includes a cylinder which supports the length of fabric or web. A blade cooperates with the cylinder to cut the fabric or web. A blower nozzle is used to direct a flow of fluid against the surface covering the cylinder. A suction nozzle is provided for suctioning the flow of fluid from the covering surface before it touches the length of fabric or the web.

Abstract: A system for removing dust, dirt and like from the surface of a flexible paper substrate and accurately positioning same comprises a transport assembly for conveying the paper substrate along a path of travel. The transport assembly includes a rotating vacuum drum having an outer surface over which the paper substrate is trained in the direction of drum rotation as it moves along the path of travel. Openings are provided in the outer surface of the vacuum drum, and a suction source is connected to those openings so that dust, dirt and the like on the surface of the paper substrate are drawn away by the suction as the paper substrate moves along the path of travel over the drum. The linear speed of the paper substrate is slightly more or less than the surface velocity of the vacuum drum so that the paper sweeps across the drum surface during the cleaning process.