Abstract: A remotely-operable cleaning device having a claw assembly that can manipulate tools and instruments within a vessel. The cleaning device has collapsible tracks allowing it to be placed into small openings and to be expanded once it is passed through the small openings. The claw assembly may include opposing fingerlike projections. The cleaning device may be configured to handle forces from high pressure water lines. The cleaning device may be configured to assembly and disassembly via locking pins. The cleaning device may be transported and/or lowered into a vessel via a lift box or crane of the present invention. The crane may be configured for assembly at a location of interest.

Abstract: In the printer, after ink is discharged from nozzle openings by making a closed space area, formed by bringing a cap into contact with a recording head, enter into a negative pressure state due to negative pressure accumulated in a discharge flow path by driving a pump, when making the negative pressure state of the closed space area be subjected to a pressure change in a direction of coming to an atmospheric pressure state, after the air flows into the closed space area by making a second opening and closing valve provided at an inflow flow path which makes the closed space area and an aerial space communicate with each other be in an opened state, the inflow of the air into the closed space area through the inflow flow path is stopped in a state where negative pressure remains in the closed space area.

Abstract: A substrate processing method that is a method for removing a resist, the surface layer of which has been cured, from a substrate having a pattern disposed inside the resist and includes an SPM supplying step of supplying an SPM, formed by mixing sulfuric acid and a hydrogen peroxide solution, to the substrate and a liquid temperature increasing step of changing, in parallel to the SPM supplying step, a mixing ratio of the sulfuric acid and the hydrogen peroxide solution used to form the SPM to increase the liquid temperature of the SPM supplied to the substrate in the SPM supplying step.

Abstract: A pet waste vacuum and bagging device is described. The device is equipped with a canister, collection receptacle, collection chute, vacuum motor, and a bag sealer. The device eliminates the need for an individual to come into any contact with pet waste, including the temperature and the smell conventionally known to emanate from pet waste. The device employs the vacuum motor to collect pet waste within the collection receptacle via the collection chute. The collection receptacle is lined with a plastic bag, which is sealed and released from the collection receptacle within the canister upon activation of a dispose button by the user. The device is powered by rechargeable batteries, and may be equipped with a charging cradle to maintain a fully battery charge.

Abstract: An ironing apparatus includes an ironing die and an ironing punch, an injection port for injecting gas or liquid to the metal plate at a high pressure to remove substance adhered to the metal plate therefrom, a suction port for sucking the adhered substance removed from the metal plate, and a protrusion mount portion with a protrusion for preventing dispersion of the gas or the liquid. An ironing method for ironing the metal plate having the single surface or both surfaces coated with the organic resin film includes the steps of injecting the gas or the liquid from the injection port to the metal plate at the high pressure to remove the adhered substance from the metal plate, and sucking and collecting the adhered substance removed from the metal plate from the suction port. The adhered substance such as the hair may be removed by the aforementioned invention.

Abstract: A flexible vacuum attachment and method of use is provided for attaching a vacuum section to a vacuum to collect debris from a surface. The vacuum attachment comprises a flexible vacuum nozzle and nozzle opening, An end of the nozzle is attachable to a connector, which is then attachable to a vacuum. The nozzle forms a tube made of flexible material with a suction end. The suction end of the nozzle has a flexible tapered opening that is radially collapsible and foldable in one or more axial directions that can conform to various shapes. The tapered opening may include a rim that extends coplanar to a vacuumable surface. The suction end is capable of beating up and down on a vacuumable surface when operated with a vacuum.

Abstract: Provided is a pump system. The pump system includes an AC (alternating current) electric motor, a converter, a smoothing unit, an inverter, a volt/hertz pulse width-modulation controller, and a main controller. The AC electric motor operates a pump which is a load. The converter receives AC power and converts the AC power into DC (direct current) power. The smoothing unit smoothes a DC voltage converted by the converter. The inverter converts the DC voltage output from the smoothing unit into an AC voltage. The volt/hertz pulse width-modulation controller applies switching voltage to a semiconductor switching device of the inverter. The main controller changes an operating frequency according to a load detected when the Ac electric motor is in operation and puts the AC electric motor to a sleep mode after determining a load operation status.

Abstract: A method of preparing a sealing surface of a container for application of a seal. A lip of the container may be heated, rinsed, and dried to establish the sealing surface. Then the seal may be applied to the sealing surface.

Abstract: In some embodiments, a module is provided that is configured to clean, rinse and dry a substrate. The module includes (1) a tank having an upper tank region positioned above a lower tank region, the upper tank region having (a) an opening through which a substrate is removed from the tank; (b) a first fluid supply configured to supply a first fluid to a surface of a substrate being removed from the tank; and (c) a first suction mechanism, positioned below the first fluid supply, wherein the first suction mechanism is configured to suction fluid supplied from the first fluid supply so as to deter the suctioned fluid from reaching the lower tank region; and (2) a drying vapor supply positioned above the first fluid supply and configured to supply a drying vapor to a surface of a substrate being removed from the tank. Numerous other aspects are provided.

Abstract: A tank cleaning system used for cleaning oil storage tanks. The system includes a rail vacuum pipe, an air line and a steam line connected to an air/steam mixing box. The mixing box includes an air nozzle, a steam nozzle and a mixing box vacuum tube connected to a vacuum pipe. The vacuum pipe includes a steering, guide rail for receiving a swivel wheel. The swivel wheel is attached to a door opening bracket. The bracket is attached to sides of a tank door opening. The steering, guide rail pivots on the swivel wheel and allows an operator, standing outside the tank, to move the mixing box back and forth for engaging and vacuuming up sediment in the tank.

Abstract: A method for cleaning a test sample well, provided in a diagnostic test card, using a cleaning head having a cleaning tube delivering, at its free end, a cleaning fluid, and a suction tube mounted inside the cleaning tube for aspirating the contaminated cleaning fluid from its free end located in proximity to the free end of the cleaning tube. The method provides for relative displacement between the test card and the cleaning head, so that the test card occupies a cleaning position wherein the cleaning tube delivers, at its free end, the cleaning fluid to the inside of the well to be cleaned and the suction tube aspirates the contaminated cleaning fluid.

Abstract: Embodiments of mechanisms for cleaning load ports of semiconductor process tools are provided. The automatic system includes a vacuum cleaner, a rail, and a transport mechanism. The transport mechanism is moveably disposed on the rail and transfers the vacuum cleaner along the rail. The automatic system also includes a system controller. The system controller is connected to the semiconductor process tools and the transport mechanism to detect which load port is unoccupied, such that the system controller controls the transport mechanism to transfer the vacuum cleaner to the unoccupied load port to perform a cleaning process.

Abstract: The present invention discloses a method of reducing contamination in a CVD chamber. The method comprises cleaning the CVD chamber with first cleaning gases containing NF3; removing the particles in the CVD chamber with second cleaning gases containing N2; further removing the particles in the CVD chamber with third cleaning gases containing O2; and seasoning an amorphous carbon layer with mixed gases containing C2H2 and an inert gas.

Abstract: A pallet conveyor includes a conveyor track to guide pallets, and a service station deployed on the conveyor track, the service station to perform a service operation in the pallet conveyor.

Abstract: According to one embodiment, a wafer carrier cleaning method is provided. The wafer carrier cleaning method includes cleaning a wafer carrier with a chemical solution containing a weak acid that can dissolve metals, and cleaning the wafer carrier cleaned with the chemical solution, with pure water. The weak acid contained in the chemical solution is preferably citric acid that can dissolve heavy metals and does not damage the wafer carrier.

Abstract: An automatic robot for cleaning smooth surfaces includes a base having a traveling device, a water feed line and a water drain line. The traveling device is configured to automatically move the base on a smooth surface to be cleaned. The water feed line is configured to apply water to the smooth surface using a capillary effect. The water drain line is configured to drain dirty water from the smooth surface.

Abstract: A robotic cleaner includes a cleaning assembly for cleaning a surface and a main robot body. The main robot body houses a drive system to cause movement of the robotic cleaner and a microcontroller to control the movement of the robotic cleaner. The cleaning assembly is located in front of the drive system and a width of the cleaning assembly is greater than a width of the main robot body. A robotic cleaning system includes a main robot body and a plurality of cleaning assemblies for cleaning a surface. The main robot body houses a drive system to cause movement of the robotic cleaner and a microcontroller to control the movement of the robotic cleaner. The cleaning assembly is located in front of the drive system and each of the cleaning assemblies is detachable from the main robot body and each of the cleaning assemblies has a unique cleaning function.

Abstract: The application discloses an auxiliary device for a tank of an ultrasound apparatus which comprises a rack and at least one adapter for a medical instrument. Thereby, the adapter comprises a housing and at least one coupling element which is movable with respect to the housing by way of a drive and which can be coupled to the medical instrument, so that a movement of the coupling element effects an active movement of at least one region of the medical instrument.

Abstract: Methods and systems for virus inactivation in the production or processing of biological or other sensitive substances are provided. The disclosed methods and systems for virus inactivation involve the key steps of dissolving carbon dioxide into biological or other sensitive substances; and treating the substance with the dissolved carbon dioxide at conditions which are less than critical pressure and temperature for a prescribed treatment time to inactivate at least 80% of the target virus or viruses contained within the biological or other sensitive substances. The disclosed carbon dioxide treatments for virus inactivation may optionally include concurrently or sequentially subjecting the substances with an acid treatment to lower the pH of the substance and inactivate viruses contained within the biological or other sensitive substance.

Abstract: An apparatus for cleaning a substrate is disclosed. The apparatus having a first head unit and a second head unit. The first head unit is positioned proximate to the surface of the substrate and has a first row of channels defined within configured to supply a foam to the surface of the substrate. The second head unit is positioned substantially adjacent to the first head unit and proximate to the surface of the substrate. A second and a third row of channels are defined within the second head unit. The second row of channels is configured to supply a fluid to the surface of the substrate. The third row of channels is configured to apply a vacuum to the surface of the substrate.

Abstract: A vacuum plate converts a conventional wheelbarrow into a wet and dry dual purpose vacuum cleaner receptacle. Collection of fluids and solids directly into a wheelbarrow simplifies larger cleaning tasks, small flood remediation, transport of bulk particulate materials such as sand, pea stone, and mulch, and allows hydro-excavation to be carried out in home improvement and small scale professional landscaping projects. A fluid level sensor prevents the wheelbarrow from overflowing when collecting large quantities of fluid, and a sump pump allows fluids to be drained from collected slurries, leaving only solids in the wheelbarrow for reuse or independent disposal.

Abstract: A vacuum exhaust method of a substrate processing apparatus, after opening to the atmosphere, depressurizes a vacuum processing chamber having therein a mounting table for mounting a target substrate thereon. The vacuum exhaust method includes covering a surface of the mounting table with a protection member; sealing the vacuum processing chamber; vacuum evacuating the sealed vacuum processing chamber; and adsorbing at least one of foreign substances and out-gases by the protection member.

Abstract: A method of cleaning at least one optical component of at least one irradiation device having at least one radiation source in a vacuum chamber. The source generates in particular extreme ultraviolet and/or soft X-ray radiation whose rays are guided via the optical component onto a workpiece to be treated, during which the optical component is at least partly polluted because of an inorganic substance introduced by the radiation source. A least one reaction partner that is substantially translucent or transparent to the rays is introduced via a feeder device in dependence on the prevailing reaction conditions. The reaction partner reacts chemically with the polluting deposits so as to remove them from the optical component.

Abstract: A cyclone comprises a second or lower portion that is pivotable with respect to a first or upper portion about an articulation between a first position and a second position; the second portion being aligned with the first portion along a first or vertical axis when the second portion is in the first position, and the second portion being aligned on a second axis that is different from the first axis when the second portion is moved from the first position to the second position. In various additional embodiments, the second axis may be normal to the first axis, for example, in the first position the lower portion is horizontal and in the first position the lower portion is vertical and aligned with the upper portion. The second position may be used as a cleaning position. When the lower portion is pivoted away from the upper portion, the vortex is interrupted. In the second position, the lower portion may also interface with a suction mechanism.

Abstract: Embodiments of the present invention include a hose handling system having a hose guide plumbed via a wash line to a fluid delivery device. The hose guide includes a pulley installed on a frame member, and a spray nozzle adapted to dispense a wash mixture. The hose guide is adapted to guide a hose as the hose is inserted into or withdrawn from a manhole, with the hose traversing the pulley. The wash mixture can be delivered through a wash line to the hose guide, which sprays the wash mixture on the hose in order to reduce or eliminate gross contamination or microbial contamination on the hose. The wash mixture typically, but not necessarily, has a freezing point below 32 F and includes: a quaternary ammonium compound, an alcohol or glycol, an alcohol ethoxylate, and a fragrance.

Abstract: Interior parts of gasoline engines are readily cleaned by a method comprising the steps of connecting an a cleaning liquid supply pipe having a gas supply port thereon airtightly to a port of an intake pipe of the engine below a throttle valve-attached position of the engine; operating the engine to draw cleaning liquid in the form of liquid drop and simultaneously drawing continuously a gas having an oxygen concentration of less than 20 vol. % into the intake pipe; and exhausting the cleaning liquid having been brought into contact with the internal parts of the engine with an exhaust gas.

Abstract: Methods and apparatus for a movable megasonic wafer probe. A method is disclosed including positioning a movable probe on a wafer surface, the movable probe having an open bottom portion that exposes a portion of the wafer surface; applying a liquid onto the wafer surface through a bottom portion of the movable probe; and moving the movable probe at a predetermined scan speed to traverse the wafer surface, applying the liquid to the wafer surface while moving over the wafer surface. In additional embodiments the method includes providing a transducer for applying megasonic energy to the wafer surface. Apparatus embodiments are disclosed including the movable megasonic wafer probe.

Abstract: Methods are presented for cleaning and removing powder or other substances which may result from a Color Run™-style event or from other events or circumstances. In one embodiment, a contamination area, i.e., an area where powder or some other substance has been disseminated, is cleaned by plugging one or more storm drains, using water to wash the powder into the storm drain(s), and then relocating the contaminated water from the storm drain(s) into one or more sewer drain(s) or other acceptable location(s). Additional steps may include pre-cleaning the anticipated contamination area, using a sweeper vacuum to clean up the powder, pre-washing the anticipated contamination area, pre-cleaning the storm drain(s), closing access to storm drains that will not be used, pre-treating with a sodium hypochlorite solution, and/or pretreating with a brine solution.

Abstract: Spray apparatus and uses thereof are described herein. A vacuum spray nozzle apparatus may include a first tube in fluid communication with a fluid source, a rotor coupled to the tube, a conduit in fluid communication with the passages of the first tube, and a second tube coupled to the conduit, the second tube being in fluid communication with a vacuum source. The rotor is in fluid communication with the pressurized fluid source. The conduit is substantially arched or angled such that an outlet of the conduit is offset a radial distance in a radial direction from the rotor axis, and when pressurized fluid is ejected from the outlet, during use, rotates the conduit. The vacuum spray nozzle apparatus is configured to remove components from a material through the second tube when a pressure of the system is reduced using the vacuum source.

Abstract: A method for cleaning an interior of a process chamber after performing a process of forming a carbon-containing film on a substrate in the process chamber includes performing a cycle a predetermined number of times. The cycle includes supplying a modifying gas into the process chamber to modify deposits including the carbon-containing film deposited on a surface of a member in the process chamber and supplying an etching gas into the process chamber to remove the modified deposits through a thermochemical reaction.

Abstract: A device for cleaning a fixed abrasive polishing pad includes a main body having a surface facing the polishing pad, an inlet coupled to an end of the main body and configured to supply a cleaning liquid, an inject orifice coupled to the inlet for injecting the cleaning liquid and being provided on the surface of the main body, an outlet coupled to the end of the main body, and a recycle orifice coupled to the outlet, and being provided on the surface of the main body.

Abstract: A portable vacuum includes a container having a sidewall, an open bottom portion, an opposing, open top portion and an attachment opening in the sidewall. A bucket is detachably coupled to the container. A vacuum unit is detachably coupled to and closes off the top portion of the container, the vacuum unit having at least one air inlet and at least one air exhaust port. The vacuum unit is operable to selectably generate an air stream entering the air inlet and exiting the air exhaust port. The portable vacuum also includes an elongate, generally hollow suction tube having a first end and an opposing second end, the first end being detachably coupled to the attachment opening of the container. The air stream generates a vacuum at the second end of the suction tube operable to draw waste material into the suction tube, the waste material being deposited in the bucket.

Abstract: A method for cleaning an etching chamber is disclosed. The method comprises providing an etching chamber; introducing a first gas comprising an inert gas into the etching chamber for a first period of time; and transporting a first wafer into the etching chamber after the first period of time, wherein the first wafer undergoes an etching process.

Abstract: A wafer carrier purge apparatus, an automated mechanical handling system, and a method of handling a wafer carrier during integrated circuit fabrication are provided. The wafer carrier purge apparatus includes a purge plate adapted for insertion into a carrier storage position. The purge plate includes a gas port and a gas nozzle in fluid communication with the gas port. The gas port receives a gas flow. The gas nozzle is adapted to contact an inlet port of a wafer carrier. The purge plate further includes a vacuum port and a vacuum nozzle in fluid communication with the vacuum port, spaced from the gas nozzle. The vacuum nozzle is adapted to capture gas that escapes from the wafer carrier through an outlet port of the wafer carrier. The purge plate is separate and removable from the carrier storage position.

Abstract: A stormwater vault and a process for servicing the stormwater vault speeds the process of cleaning a stormwater vault. The stormwater vault has a built in liquefaction system for liquefying settled debris in the vault which works together with a sloped or angled floor in the vault. The settled debris is flushed toward the inlet to a vacuum removal line inserted into the vault through an access opening for removing the settled debris from the vault.

Abstract: A substrate is moved below a substrate cleaning module in a direction extending from a leading edge to a trailing edge of the substrate cleaning module. A cleaning material is dispensed downward toward a top surface of the substrate along the leading edge of the substrate cleaning module. A rinsing material is dispensed downward toward the top surface of the substrate along the trailing edge of the substrate cleaning module to generate a rinsing meniscus. Vacuum suction is applied at a vacuum suction location along a bottom surface of the substrate cleaning module and parallel to the leading and trailing edges of the substrate cleaning module. The vacuum location is positioned between a dispense location of the cleaning material and a dispense location of the rinsing material. A plenum region located between the dispense location of the cleaning material and the vacuum location is vented.

Abstract: A method of cleaning containers in a container cleaning machine, in which the containers are moved in receptacles to a cleaning area, where both the containers and the receptacles are at least partially submerged in a dipping bath of liquid cleaning medium. The containers are positioned such that closed portions of the containers are at an equivalent or higher vertical position than mouth portions of the containers. A nozzle arrangement is used to produce a jet of a cleaning medium which impinges the interior of a corresponding container. The jet has a force which is insufficient to move the container from its resting position in its corresponding container receptacle.

Abstract: The aim of the invention is to provide a method for the treatment of a transport support (1) for the conveyance and storage of semiconductor substrates, with said support (1) possibly having first undergone a cleaning operation using a liquid. The method includes a treatment stage in which the transport support (1) is placed in a sealed chamber (4) connected to a vacuum pump (5) and said transport support (1) is subjected to the combined action of a subatmospheric pressure and infrared radiation to favor the removal of foreign bodies on the walls of the transport support (1). The invention also concerns a treatment station for a transport support (1) for implementation of the method.

Abstract: A debris collecting system comprises a debris collecting assembly including an air-flow generating device and a debris body. The system further comprises an intermediate debris collecting container connected to the debris collecting assembly such that the collected debris is by-passing the debris body of the assembly.

Abstract: A method of operating a sweeping machine, including a battery, a positioning receiver, a battery charge monitoring system and a computer, and having a cleaning and a transport mode of operation The method comprising the steps of: a) providing the computer with the location of a charging station, b) using the positioning receiver to provide the computer with the location of the sweeping machine, c) using the computer to provide an estimate of an amount of energy required to drive the sweeping machine from its location to the charging station in the transport mode, d) using the battery charge monitoring system to provide the computer with the amount of energy remaining in the battery, e) using the computer to compare the estimate with this amount of energy, and f) providing an operator notification when the amount of energy remaining in the battery falls below a predetermined amount of the estimate.

Abstract: A method is disclosed. The method comprises the steps of preparing a serviceable catalytic converter such that a catalyst substrate of the catalytic converter is serviceable while the catalytic converter remains connected to an exhaust system by forming a lower surface of the body of the catalytic converter with an absence of material in order to provide at least one opening in the lower surface of the body of the catalytic converter for permitting selective access to a fluid-flow passage that extends through the body of the catalytic converter that contains the catalyst substrate; and disposing at least one close-out member in the at least one opening for fluidly-sealing the at least one opening. A component of an exhaust system that is serviceable while remaining fluidly-connected and physically-connected to the exhaust system is also disclosed.

Abstract: A method of collecting cut hair is disclosed. The steps include providing a vacuum source and a filter assembly having a top piece, a bottom piece, and a filter member. The assembly has a generally circular perimeter. A vacuum is applied to the assembly interior, and the cut hairs are moved through the aperture and into the assembly. The cut hairs are circulated in a collecting vortex and collected on the filter member.

Abstract: A cleaning path guidance method combined with a dirt detection mechanism is performed in an automatic cleaning device to generate a cleaning path, so as to guide the automatic cleaning device to clean an area to be cleaned, in which plural grids are defined in the area. The method includes: moving the automatic cleaning device in the area to clear dirt away, and continuously detecting a flow of the dirt cleared away to obtain a dirt level of a current gird; if the dirt level of the current gird exceeds a threshold, marking the grid as a dirty grid; performing an algorithm and finding a shortest path passing through all dirty grids as a cleaning path according to the marked dirty grids; and moving the automatic cleaning device to pass through each dirty grid according to the clean path, so as to clean each dirty gird sequentially.

Abstract: Internal cleaning of inverted cans includes engaging a can's cylindrical wall with a wall-conforming vacuum or adhesive gripper, causing a spraying unit to travel axially in and out of the can's opening while the can is inverted on a circular conveyor, and using a supporting arm or bottom stop to subject the can to a counterforce against a flushing force from sprayed cleaning medium. This prevents the can from being pressed out of a receptacle in which it sits during cleaning.

Abstract: A cleaning method for a working mechanism for a medical manipulator, the working mechanism including a shaft, a force transmitting member in the shaft, a working unit at one end of the shaft with a working unit moved by the force transmitting member, and a cover over a portion of the working unit, with a gap between the cover and shaft, and a hole is disposed on a side of the cover. The method includes the steps of inserting an end of the shaft with the cover into one end of a tube, sealing the tube and shaft with a sealing element, disposing a sucking and discharging element on another end of the tube, and immersing another end of the shaft into a cleaning agent. By activating the sucking and discharging element, sucking and discharging of the cleaning agent is carried out repeatedly, from the other end of the shaft.

Abstract: The present invention provides a cleaning method for an electing head of an alignment film printer, which is used automatically to clean up the ejection head of the alignment film printer, comprising the following steps: spraying a dissolving liquid to the ejection head of the alignment film printer at a specific time according to a specific moving path to dissolve droplets coagulated on the nozzles of the ejection head, and the dissolving liquid sprayed to cover all the ejection heads of the alignment film printer; proceeding with a vacuum suction according to the moving path to remove the dissolving liquid covered on the surface of the ejection head. The present invention further provides a cleaning device for an electing head of an alignment film printer. The cleaning method and device for the ejection head of the alignment film printer according to the present invention can prevent effectively the ejection head of the alignment film printer from clogging because of dry drip.

Abstract: A system for vacuuming out sediment when installed on the inside of a gravity feed, elevated potable water tank or tower holding water at a pressure head of the kind having a riser serving as a water inlet and outlet. The system having a manifold installed along the bottom wall of the tank or tower connected to a plurality of downwardly directed nozzles. The manifold is connected to a drain pipe passing down through the riser and is supported so that the nozzles are positioned above the bottom wall in the vicinity of the sediment. When water is allowed to flow through the drain pipe, the pressure head causes sediment which may otherwise be a health risk and promote electrolytic corrosion to be vacuumed out by the nozzles.

Abstract: A method for removing native oxides from a substrate surface is provided. In one embodiment, the method comprises positioning a substrate having an oxide layer into a processing chamber, exposing the substrate to a gas mixture while forming a volatile film on the substrate and maintaining the substrate at a temperature below 65° C., heating the substrate to a temperature of at least about 75° C. to sublimate the volatile film and remove the oxide layer, and depositing a first layer on the substrate after heating the substrate.

Abstract: A cleaning method includes (a) providing a process chamber after forming an oxide film on a substrate in the process chamber formed by a reaction tube and a manifold supporting the reaction tube by performing a cycle a predetermined number of times, the cycle including supplying a source gas to the substrate through a first nozzle in the manifold extending upward to an inside of the reaction tube, and supplying an oxidizing gas to the substrate through a second nozzle in the manifold extending upward to the inside of the reaction tube; and (b) cleaning an inside of the process chamber. The step (b) includes a first cleaning process of supplying a hydrogen fluoride gas into the reaction tube through the second nozzle; and a second cleaning process of supplying a hydrogen fluoride gas onto an inner wall surface of the manifold through a third nozzle disposed in the manifold.

Abstract: A machine for cleaning a head-disk assembly (HDA) of a hard disk drive (HDD) includes a nest that seals the HDA between an upper and lower portion during cleaning. An inlet port receives a gas and an exhaust port exhausts the gas and entrained particles. A shock drive delivers mechanical shocks to the nest and the HDA while the gas is flowing through the HDA. A blower may circulate the gas from the exhaust port to the inlet port. A filter may be coupled to the inlet port. The HDA nest may be movable along an axis of the mechanical shocks delivered by the shock drive. A blow tube may deliver gas to a screw hole and a coaxial vacuum tube may rest against a surface around the screw hole to encapsulate the blow tube during cleaning and remove the gas and particles from the screw hole.