Including Use Of Vacuum, Suction, Or Inert Atmosphere Patents (Class 134/21)
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Publication number: 20140020716Abstract: Embodiments of the present invention include a hose handling system having a hose guide plumbed via a wash line to a fluid delivery device. The hose guide includes a pulley installed on a frame member, and a spray nozzle adapted to dispense a wash mixture. The hose guide is adapted to guide a hose as the hose is inserted into or withdrawn from a manhole, with the hose traversing the pulley. The wash mixture can be delivered through a wash line to the hose guide, which sprays the wash mixture on the hose in order to reduce or eliminate gross contamination or microbial contamination on the hose. The wash mixture typically, but not necessarily, has a freezing point below 32 F and includes: a quaternary ammonium compound, an alcohol or glycol, an alcohol ethoxylate, and a fragrance.Type: ApplicationFiled: November 27, 2012Publication date: January 23, 2014Inventor: Thomas P. Suiter
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Patent number: 8617409Abstract: A protective chuck is magnetically levitated on a substrate with a gas layer between the bottom surface of the protective chuck and the substrate surface. The gas layer protects a surface region of the substrate against a fluid layer covering the remaining of the substrate surface without contacting the substrate, reducing or eliminating potential damage to the substrate surface. The magnetically levitated protective chuck can enable combinatorial processing of a substrate, providing multiple isolated processing regions on a single substrate with different material and processing conditions.Type: GrantFiled: November 22, 2011Date of Patent: December 31, 2013Assignee: Intermolecular, Inc.Inventors: Rajesh Kelekar, Kent Riley Child
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Patent number: 8617319Abstract: A dishwasher is provided which can determine whether a filtering device needs to be cleaned based on the time taken for a drain pump to discharge wash fluid from a sump. The dishwasher can make this determination without a manual examination of food waste collected in the filtering device. A related method of controlling the dishwasher based on such a determination is also provided.Type: GrantFiled: August 28, 2008Date of Patent: December 31, 2013Assignee: LG Electronics Inc.Inventor: Ro Mon Son
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Patent number: 8603320Abstract: A method and apparatus are provided for generating and applying a sanitizing liquid. The method includes moving a mobile floor cleaning device along a floor and electrochemically activating a liquid on the mobile floor cleaning device by passing the liquid through a functional generator having first and second electrode chambers that are separated by an ion exchange membrane such that the liquid activated in the first electrode chamber comprises O3 molecules. Substantially all of the liquid activated in the first and second electrode chambers are dispensed from the device within 5 seconds of the time at which the liquids are activated by the functional generator without an intermediate step of storing either of the liquids produced in the first or second electrode chambers. At least some of the dispensed liquid is recovered from the floor with a recovery device carried by the mobile floor cleaning device.Type: GrantFiled: September 16, 2011Date of Patent: December 10, 2013Assignee: Tennant CompanyInventor: Bruce F. Field
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Publication number: 20130319469Abstract: A vacuum nozzle is angled to be able to vacuum both a floor portion and a floor molding at the same time. Unlike conventional vacuum nozzles that are flat, the nozzle as herein described is angled, typically at 90 degrees, to fit into the corner along where the wall meets the floor. The nozzle can also be used, for example, where the ceiling meets the wall, or any other such corner to provide a vacuum cleaning thereto.Type: ApplicationFiled: May 31, 2012Publication date: December 5, 2013Inventors: Richard Borges, SR., Joanny Borges
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Publication number: 20130319466Abstract: A cleaning method for an EUV light generation apparatus may include closing a connection portion so that a chamber interior and the interior of an exposure apparatus do not communicate when EUV light is not being generated, supplying an etchant gas for etching debris that has accumulated on a reflective surface of an optical element to the chamber interior in a state where the connection portion is closed, and exhausting the chamber interior using an exhaust apparatus while supplying the etchant gas.Type: ApplicationFiled: May 31, 2013Publication date: December 5, 2013Inventors: Hakaru MIZOGUCHI, Shinji NAGAI
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Publication number: 20130312792Abstract: A method is provided for cleaning at least one filter of a vacuum cleaner, wherein the vacuum cleaner comprises a suction inlet and a dirt collection container, which can be subjected to negative pressure by a suction unit via the at least one filter and a suction extraction line, and wherein for cleaning purposes the at least one filter can be acted upon by external air on the clean side via at least one external air valve, which moves from a closed valve position via an open valve position back into the closed valve position for cleaning the at least one filter. So that the at least one filter can be cleaned particularly effectively, the suction power of the suction unit can be increased before transfer of the external air valve to the open valve position and reduced again later. A vacuum cleaner for performing the method is also provided.Type: ApplicationFiled: August 6, 2013Publication date: November 28, 2013Applicant: Alfred Karcher GmbH & Co., KGInventors: Maic Hensel, Julien Scholl, Frank Fuchs, Ulrich Engenhardt, Britt Wirbel, Steffen Kunz
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Patent number: 8591667Abstract: Methods and apparatus are provided for cleaning jacks in portable electronic components. In one embodiment of the present invention, an adaptor plug is designed having a hollow shaft and the end of the plug is designed with holes that communication with the hollow shaft. The plug can be inserted into a jack, which can operate to open one or more switches within the jack, thereby freeing any debris that may have accumulated under the switches. Compressed air can then be applied down the hollow shaft and out the holes in the plug to displace the debris and clean the jack. In another embodiment, the end of the plug can be constructed such that it rotates about an axis to increase the likelihood that the jack will be cleaned.Type: GrantFiled: November 21, 2012Date of Patent: November 26, 2013Assignee: Apple Inc.Inventors: Adam D. Mittleman, Stephen Zadesky
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Patent number: 8591664Abstract: Methods and apparatuses for integrated cleaning of objects comprising a sequence of wet cleaning and vacuum drying in a same process chamber. The present integrated cleaning process can eliminate moving parts, improving the system reliability. Vacuum decontamination can be included for degassing and decontaminating the cleaned objects. In an embodiment, a cleaner system combines various movements into an integrated movement to be handled by a robot, for example, to improve the throughput. For example, an integrated robot movement comprising picking up a closed container from the input load port, moving both the lid and body together, and then depositing the body and lid separately into the appropriate positions in the cleaner to be cleaned.Type: GrantFiled: June 17, 2010Date of Patent: November 26, 2013Assignees: Dynamic Micro SystemInventor: Lutz Rebstock
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Patent number: 8591661Abstract: Improved methods for stripping photoresist and removing etch-related residues from dielectric materials are provided. In one aspect of the invention, methods involve removing material from a dielectric layer using a hydrogen-based etch process employing a weak oxidizing agent and fluorine-containing compound. Substrate temperature is maintained at a level of about 160° C. or less, e.g., less than about 90° C.Type: GrantFiled: December 11, 2009Date of Patent: November 26, 2013Assignee: Novellus Systems, Inc.Inventors: David Cheung, Ted Li, Anirban Guha, Kirk Ostrowski
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Publication number: 20130306108Abstract: A multi-function surface cleaning apparatus includes a cleaning containment enclosure including a top surface and a plurality of walls connected to form a chamber therebetween, wherein each wall has an inner surface, an outer surface, and a bottom surface, a delivery lance fluidly connected to the top surface of the cleaning containment enclosure, a vacuum suction hose fluidly connected to the top surface of the cleaning containment enclosure, a gun trigger fluidly connected to a proximal end of the delivery lance, and a water pressure line fluidly connected to the gun trigger. The cleaning containment enclosure may include four walls configured to form a diamond-shaped cleaning containment enclosure. The cleaning containment enclosure further may include a plurality of relief vents that extends from the inner surfaces of the walls of the cleaning containment enclosure therethrough to the outer surfaces of the walls of the cleaning containment enclosure.Type: ApplicationFiled: May 16, 2013Publication date: November 21, 2013Inventor: Kevin M. Letera
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Publication number: 20130306107Abstract: In accordance with one or more aspects, a vacuum attachment system for removing debris is disclosed. The system contains attachments that attach to a vacuum device and are specifically designed for particular cleaning purposes. The attachment system can be used for residential, commercial, or automotive cleaning applications. Scraping blades at the end of the attachments are used to loosen stuck-on debris; the debris then being removed by the suction force created by the vacuum device.Type: ApplicationFiled: May 18, 2012Publication date: November 21, 2013Inventor: Matthew Jensen
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Patent number: 8585825Abstract: A method for cleaning a substrate is provided that includes applying a liquid medium to a surface of the substrate such that the liquid medium substantially covers a portion of the substrate that is being cleaned. One or more transducers are used to generate acoustic energy. The generated acoustic energy is applied to the substrate and the liquid medium meniscus such that the applied acoustic energy to the liquid medium prevents cavitation within the liquid medium. The acoustic energy applied to the substrate provides maximum acoustic wave displacement to acoustic waves introduced into the liquid medium. The acoustic energy introduced into the substrate and the liquid medium enables dislodging of the particle contaminant from the surface of the substrate. The dislodged particle contaminants become entrapped within the liquid medium and are carried away from the surface of the substrate by the liquid medium.Type: GrantFiled: October 30, 2008Date of Patent: November 19, 2013Assignee: Lam Research CorporationInventors: Grant Peng, David Mui, Shih-Chung Kon
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Patent number: 8585828Abstract: A hand carried, manually operated apparatus for cleaning flooring, carpet, upholstery, and the like includes a cleansing fluid chamber, a waste fluid chamber, a pump and an applicator. A first fluid passageway connects the pump and cleansing fluid chamber, a second passageway connects the cleansing fluid chamber and applicator, a third passageway connects the applicator and waste fluid chamber, and a fourth passageway connects the waste fluid chamber and pump. A first one-way valve permits flow from the pump to the cleansing fluid chamber but inhibits reverse flow; and a second one-way valve permits flow from the applicator to the waste fluid chamber but inhibits reverse flow. Air is transferred through the pump from the waste fluid chamber to the cleansing fluid chamber as cleansing fluid is transferred to the applicator from the cleansing fluid chamber and waste fluid is transferred from the applicator to the waste fluid chamber.Type: GrantFiled: April 7, 2012Date of Patent: November 19, 2013Assignee: Season 4, LLCInventors: Ken Joyner, Daniel Lee Bizzell, Karl Christopher Gabriel, Raeshon Lamont McNeil, Thomas James Philpott, Michael Starkey, Juan Carlos Perez, Ian D. Kovacevich
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Patent number: 8580044Abstract: A system and method for semiconductor processing chamber includes a housing that can cover an annular gap of a pedestal well of the semiconductor processing chamber. A cleaning nozzle is removably coupled to a compressed dry air (CDA) supply. The cleaning nozzle can inject the CDA into the pedestal well while the housing can contain a byproduct dust agitated by the injected CDA. The byproduct dust is evacuated by at least one vacuum port that is removably coupled to a vacuum source.Type: GrantFiled: August 13, 2010Date of Patent: November 12, 2013Assignees: Samsung Austin Semiconductor, L.P., Samsung Electronics Co., Ltd.Inventors: Eric McCormick, Rolando Mendez, Bradley May
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Patent number: 8580039Abstract: A surface treatment method of a metal member according to an embodiment of the invention includes removing an oily substance on the metal member by using gas-liquid two fluids that are obtained by boiling heated and pressured water under ordinary pressure. A surface treatment device of a metal member for removing an oily substance on the metal member includes self-generation two fluids production means for producing gas-liquid two fluids by boiling heated and pressured water under ordinary pressure, and a surface treatment room carrying out a surface treatment by bringing the self-generation two fluids into contact with the metal member.Type: GrantFiled: August 31, 2010Date of Patent: November 12, 2013Assignee: Hitachi Cable, Ltd.Inventors: Tomonori Saeki, Yoshiyuki Ando
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Patent number: 8580045Abstract: Systems, methods and apparatus for making a chemical head including forming a first return chamber in the chemical head, forming a second return chamber in the chemical head, forming a plurality of first return conduits from a head surface to the first return chamber, forming a plurality of second return conduits from a head surface to the second return chamber and wherein at least one of the first return conduits and the second return conduits being formed at a first angle relative to the head surface, the first angle being greater than about 20 degrees to a meniscus plane normal.Type: GrantFiled: September 22, 2011Date of Patent: November 12, 2013Assignee: Lam Research CorporationInventors: Enrico Magni, Eric Lenz
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Publication number: 20130291899Abstract: A self-contained vacuum apparatus having a housing with an air inlet aperture for receiving debris, a dustbag in the housing communicable with the air inlet for storing received debris, a suction motor communicable with the air inlet aperture for generating suction at the aperture to draw the debris into the dustbag, an air outlet aperture communicable with the suction motor to exhaust air from the vacuum apparatus, and an on/off switch for activating the vacuum apparatus, the vacuum apparatus being mountable in a cavity to locate the air inlet aperture adjacent a floor surface so that debris urged towards the air inlet aperture is drawn into the dustbag upon activation of the on/off switch.Type: ApplicationFiled: December 7, 2011Publication date: November 7, 2013Applicant: Sweepovac LimitedInventors: Henry Joseph Fingleton, Dermot Thomas Costello
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Patent number: 8574372Abstract: A nozzle cleaning method includes cleaning an outer wall of a dispenser nozzle after liquid is sucked and before the liquid is discharged and cleaning at least an inner wall of the dispenser nozzle after the liquid is discharged.Type: GrantFiled: November 9, 2009Date of Patent: November 5, 2013Assignee: Beckman Coulter, Inc.Inventors: Akihisa Kuroda, Mitsuhisa Kobayashi, Yoshihiro Kase, Tamotsu Okawa
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Patent number: 8562752Abstract: A process chamber for processing semi-conductor wafers. The chamber includes at least one rotor within the process chamber. The rotor is adapted to receive and/or process semi-conductor wafers. The top of the process chamber also includes a tiltable rim. This rim tilts from a non-inclined position to an inclined position. The wafers may be loaded into and unloaded from the process chamber when the rim is in its inclined position.Type: GrantFiled: November 17, 2011Date of Patent: October 22, 2013Assignee: APPLIED Materials, Inc.Inventor: Daniel J. Woodruff
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Patent number: 8562753Abstract: Disclosed are a nozzle cleaning apparatus and a nozzle cleaning method, which are capable of effectively cleaning a nozzle for discharging a process liquid to a substrate. A nozzle 30 is accommodated in a cleaning container 2 having a funnel-shaped portion 2b. A solvent T as a cleaning liquid is supplied along an inner surface of the funnel-shaped portion 2b. The solvent T forms a vortex flow whirling around the nozzle 30. By exposing the nozzle 30 to the vortex flow, the nozzle 30 can be effectively, thoroughly cleaned.Type: GrantFiled: December 21, 2010Date of Patent: October 22, 2013Assignee: Tokyo Electron LimitedInventors: Takeshi Hirao, Akihiro Fujimoto, Yasutaka Souma
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Patent number: 8562751Abstract: A dry cleaning method of a substrate processing apparatus includes forming a metal oxide by oxidizing a metal film adhered to the inside of a processing chamber of the substrate processing apparatus; forming a complex by reacting the metal oxide with ?-diketone; and sublimating the complex to be removed. A cleaning gas containing oxygen and ?-diketone is supplied into the processing chamber while heating the inside of the processing chamber. A flow rate ratio of oxygen to ?-diketone in the cleaning gas is set such that a formation rate of the metal oxide is lower than a formation rate of the complex.Type: GrantFiled: January 17, 2012Date of Patent: October 22, 2013Assignees: Tokyo Electron Limited, Central Glass Company, LimitedInventors: Isao Gunji, Yusaku Izawa, Hitoshi Itoh, Tomonori Umezaki, Yuta Takeda, Isamu Mori
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Patent number: 8551260Abstract: A fuel injection flush tool adapted to be connected to a conventional fuel injection flush canister in which a supply of combustible liquid fuel injection cleaner is stored. Liquid cleaner is delivered from the flush canister to a gasoline or diesel-driven engine being serviced by which to burn off carbon deposits from the fuel injectors and related parts during a tune-up or service. During one embodiment, air is applied to the flush canister so that the liquid cleaner is delivered from the canister at a pressure which corresponds to the operating pressure of the engine running at idle. In this case, the fuel injectors can advantageously be cleaned (i.e., decarbonized) in a relatively short time and at reduced cost without having to turn off the engine, disable the fuel pump, or remove seats, fuses, relays, etc.Type: GrantFiled: March 22, 2010Date of Patent: October 8, 2013Inventors: Parviz R. Horriat, Jimmy B. Horriat
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Patent number: 8551253Abstract: A method for cleaning plated polished disks used in hard drive media is provided. The method includes positioning plated polished disks in a first batch scrubber having multiple first brushes, wherein each of the plated polished disks is positioned between two of the first brushes, and scrubbing the plated polished disks with the first brushes. The method further includes positioning the plated polished disks scrubbed in the first batch scrubber in a second batch scrubber having multiple second brushes, wherein each of the plated polished disks is positioned between two of the second brushes, and scrubbing the plated polished disks with the second brushes.Type: GrantFiled: June 29, 2010Date of Patent: October 8, 2013Assignee: WD Media, LLCInventors: Nazman Na'im, Yeong Yih Boo
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Patent number: 8545640Abstract: In a substrate processing method according to the present invention, a cleaning liquid nozzle supplies a rinsing liquid to a central portion of a substrate and thereafter moves from a position corresponding to the central portion of the substrate to a position corresponding to a peripheral, edge portion thereof while supplying the rinsing liquid before stopping at the position corresponding to the peripheral edge portion. Next, a drying liquid nozzle moves from the position corresponding to the peripheral edge portion to the position corresponding to the central portion while supplying a drying liquid. Then, the drying liquid nozzle is kept stationary at the position corresponding to the central portion for a predetermined period of time while supplying the drying liquid. Thereafter, a gas nozzle moves from the position corresponding to the central portion to the position corresponding to the peripheral edge portion while supplying an inert gas.Type: GrantFiled: June 16, 2011Date of Patent: October 1, 2013Assignee: Tokyo Electron LimitedInventors: Teruomi Minami, Naoyuki Okamura, Yosuke Kawabuchi
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Patent number: 8545637Abstract: A cleaning device (1) performs a cleaning of an article by blowing a cleaning medium (5) by an air stream onto the article (4). The cleaning device (1) includes a cleaning tank (6) that forms a space for the cleaning medium (5) to be blown, which includes an opening; a holding unit (3) that holds the article (4) at the opening; a pool member (19) that is arranged on an outer edge of the opening with a clearance between the pool member (19) and the article (4); and a cleaning-medium collecting unit (8) that brings the cleaning medium (5) leaked out of the outer edge and accumulated in the clearance back into the cleaning tank (6).Type: GrantFiled: February 24, 2009Date of Patent: October 1, 2013Assignee: Ricoh Company, Ltd.Inventors: Akihiro Fuchigami, Tatsuya Satoh, Yoichi Okamoto, Yuusuke Taneda
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Publication number: 20130247939Abstract: A method for cleaning tanks and other containers including, but not necessarily limited to, tanks associated with land-based drilling rigs and/or used in connection with hydraulic fracturing operations. Recoverable liquids and associated solids are first removed from a tank to be cleaned. A cleaning solution is prepared in a weir tank and sprayed into a tank to be cleaned. Sprayed cleaning solution, together with any debris or residue from the tank being cleaned, is pumped back to the weir tank and recycled for further cleaning.Type: ApplicationFiled: March 26, 2013Publication date: September 26, 2013Inventors: PEAK CHANTHAVONGSY, DALE MARTIN
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Patent number: 8529704Abstract: An operation method for cleaning a vacuum processing apparatus includes feeding a cleaning gas into a film deposition chamber of the vacuum processing apparatus when a predetermined number of batches of film deposition process is finished. The predetermined number of batch of film deposition processes is calculated based on a film deposition-related operating time (a film deposition time and a film deposition preparation time) and a cleaning-related operating time (a cleaning procedure time, a cleaning procedure preparation time, and a pre-deposition film deposition time).Type: GrantFiled: June 27, 2008Date of Patent: September 10, 2013Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Eishiro Sasakawa, Masahiro Sakaki, Shigekazu Ueno, Keisuke Kawamura, Akemi Takano
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Publication number: 20130220378Abstract: Apparatuses and methods for vacuuming floors and other surfaces can include a vacuum cleaner head having a first chamber in communication with a first inlet positioned on a bottom surface of the vacuum cleaner head and a first outlet connected to a vacuum line, a second chamber in communication with a second inlet positioned on at least one side of the vacuum cleaner head and a second outlet connected to the vacuum line, and a divider separating the first chamber from the second chamber.Type: ApplicationFiled: February 24, 2012Publication date: August 29, 2013Inventors: Pravinchandra Patel, Nutan Patel
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Publication number: 20130220379Abstract: The invention relates to a method for cleaning coked cavities, in particular inlet, channels (10) and valves (15) of an internal combustion engine (12), comprising the following steps: introducing an alkaline liquid into a cavity to be cleaned; heating the alkaline liquid; and extracting the alkaline liquid and the dirt particles contained therein by suction from the cavity. Said method can be carried out especially simply and effectively using a device comprising a first probe (21), which is provided at the leading end thereof with one or more nozzles (23) for injecting an alkaline liquid into the cavity to be cleaned and which is connected at the other end thereof to the delivery side (24) of a pump (25), wherein warmed alkaline liquid can be supplied to the intake side (26) of said pump. A second probe (22) is provided for extracting the alkaline fluid and the dirt particles contained therein by suction from the cavity.Type: ApplicationFiled: August 24, 2011Publication date: August 29, 2013Applicant: TUNAP INDUSTRIE CHEMIE GmbH & Co. PRODUKTIONS KGInventors: Friedrich A. Sprügel, Alfons Urban
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Publication number: 20130213439Abstract: A holder assembly comprises a first and a separable second part, the first part detachable from the second part, the first part comprising a tube and an environmental cell interface and the second part comprising an electron microscope interface, as a result of which the first part can be cleaned at high temperatures without exposing the second part to said high temperature. By forming the holder assembly from detachable parts, one part can be cleaned by heating it to a high temperature of, for example, 1000° C., clogging in the tubes can be removed by reduction of carbon, while keeping the other part (often comprising mechanical fittings, ball bearing, sliders, or such like) cool. The cleaning can be enhanced by blowing, for example, oxygen or hydrogen through the tubes.Type: ApplicationFiled: February 15, 2013Publication date: August 22, 2013Applicants: Delft University of Technology, FEI CompanyInventors: FEI Company, Delft University of Technology
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Patent number: 8512478Abstract: A cleaning and drying-preventing method including: positioning a nozzle in a container such that a funnel-like inner circumferential surface of the container is located around a periphery of a distal end of the nozzle; sucking a liquid in the nozzle to retract a level of the liquid to a side of a supply passage; supplying a solvent into the container to form a swirl flow of the solvent turning around the distal end of the nozzle, and cleaning the nozzle by the swirl flow; supplying a solvent into the container to form a liquid pool of the solvent; and further retracting the level of the liquid in the nozzle to the side of the supply passage. A liquid layer, an air layer, and a solvent layer are formed in the nozzle in this order from the side of the supply passage, to prevent drying of the liquid in the nozzle.Type: GrantFiled: June 20, 2012Date of Patent: August 20, 2013Assignee: Tokyo Electron LimitedInventors: Yasuyuki Kometani, Takeshi Hirao, Kentaro Yamamura, Kenichi Miyamoto
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Patent number: 8513593Abstract: In a mass spectrometer or gas chromatograph/mass spectrometer system, a conditioning gas such as, for example, hydrogen is added to condition or clean one or more components or regions of the mass spectrometer such as the ion source. The conditioning gas may be added upstream of the mass spectrometer such as, for example, into a sample inlet or a chromatographic column, or may be added directly into the mass spectrometer. The conditioning gas may be added off-line, when the mass spectrometer is not analyzing a sample, or on-line during sample analysis. When added on-line, the conditioning gas may be mixed with a carrier gas such as, for example, helium. In another embodiment, the conditioning gas also serves as the carrier gas through the column; another gas such as, for example, helium may be added to the carrier gas stream.Type: GrantFiled: December 17, 2012Date of Patent: August 20, 2013Assignee: Agilent Technologies, Inc.Inventors: Bruce D. Quimby, Michael J. Szelewski, Michael K. Freed, Harry F. Prest
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Publication number: 20130206178Abstract: A sweeper assembly can include a plurality of holes drilled in one or more sweeper headers that can be angled downwards towards the basin floor to produce a gentle flow of fluid to keep particulate matter rolling along the basin floor. A centrifugal separator can include a curved velocity plate for smoothly directing flow from an inlet pipe to an inner wall of the separator and creating a downward vortex of particulate-laden fluid within the centrifugal separator. The centrifugal separator can include one or more reversal mechanisms for transferring particulate matter to a collection chamber and reversing the direction of particle-free fluid, which may upwardly exit through a discharge pipe. The centrifugal separator can include a bleed valve in the discharge pipe for automatically bleeding accumulated air in the “dead zone” between the inlet pipe and the top of the centrifugal separator.Type: ApplicationFiled: March 15, 2013Publication date: August 15, 2013Applicant: ELECTRONIC PRECIPITATION SYSTEMS, LLCInventor: ELECTRONIC PRECIPITATION SYSTEMS, LLC
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Patent number: 8506718Abstract: A polymer removing apparatus for use in removing polymer annularly adhered to a peripheral portion of a target substrate includes a processing chamber for accommodating the target substrate having the polymer annularly adhered to the peripheral portion thereof; a mounting table for mounting the target substrate thereon; and a laser irradiation unit for irradiating ring-shaped laser light at once to the whole polymer annularly adhered to the target substrate. The polymer removing apparatus further includes an ozone gas supply unit for supplying an ozone gas to the polymer annularly adhered to the target substrate and a gas exhaust unit for exhausting the ozone gas.Type: GrantFiled: August 17, 2010Date of Patent: August 13, 2013Assignee: Tokyo Electron LimitedInventors: Takehiro Shindou, Masaki Kondo
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Publication number: 20130199574Abstract: A method of using a hand-held power tool having a debris removal attachment is provided. The method includes providing a hand-held power tool having an output shaft and selectively coupling an extension shaft to the output shaft. The method also includes coupling a first impeller to the extension shaft and providing a housing adjacent the first impeller. The method further includes rotating the first impeller to generate a pressure differential sufficient to draw debris into the housing. The extension shaft has a first end and a second end, the first end configured to couple to the output shaft of the hand-held power tool, and the second end configured to couple to a tool bit.Type: ApplicationFiled: March 15, 2013Publication date: August 8, 2013Applicant: ROBERT BOSCH TOOL CORPORATIONInventor: Robert Bosch Tool Corporation
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Publication number: 20130199575Abstract: Disclosed is a method and apparatus for collecting debris produced by a tool from a work location on a work surface. The apparatus comprises an enclosure surrounding and defining the work location within an interior thereof and an outer body located to the outside of the enclosure. The enclosure is spaced apart from the work surface by a gap distance wherein the enclosure and the outer body enclose and define chamber therebetween. The apparatus further comprises a port passing through the outer body so as to place the chamber in fluidic communication with a vacuum source. The method comprises containing the debris at the work location within the interior of the enclosure, drawing the debris between the enclosure and the surface into the chamber and suctioning the debris out of the chamber through a collection port.Type: ApplicationFiled: October 7, 2010Publication date: August 8, 2013Inventor: Anthony Koeck
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Publication number: 20130199573Abstract: A hand carried, manually operated apparatus for cleaning flooring, carpet, upholstery, and the like includes a cleansing fluid chamber, a waste fluid chamber, a pump and an applicator. A first fluid passageway connects the pump and cleansing fluid chamber, a second passageway connects the cleansing fluid chamber and applicator, a third passageway connects the applicator and waste fluid chamber, and a fourth passageway connects the waste fluid chamber and pump. A first one-way valve permits flow from the pump to the cleansing fluid chamber but inhibits reverse flow; and a second one-way valve permits flow from the applicator to the waste fluid chamber but inhibits reverse flow. Air is transferred through the pump from the waste fluid chamber to the cleansing fluid chamber as cleansing fluid is transferred to the applicator from the cleansing fluid chamber and waste fluid is transferred from the applicator to the waste fluid chamber.Type: ApplicationFiled: April 7, 2012Publication date: August 8, 2013Inventors: Ken Joyner, Daniel Lee Bizzell, Karl Christopher Gabriel, Raeshon Lamont McNeil, Thomas James Philpott, Michael Starkey, Juan Carlos Perez, Ian D. Kovacevich
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Publication number: 20130199566Abstract: The invention relates to a method for cleaning filters (22) which are designed as solid bodies having pores and/or having channels which are open towards the surface, by blasting using a blasting medium, characterised in that the blasting medium is gaseous and contains solid or liquid blasting agents, if appropriate in the form of substances having a boiling point of no more than 140° C., the blasting medium is accelerated in a jet nozzle (16, 18) so that it strikes the filter (22) at least at almost the speed of sound, and during blasting the filter (22) is disposed in front of an intake opening (34, 34?) which draws in the blasting medium as well as ambient air.Type: ApplicationFiled: April 1, 2011Publication date: August 8, 2013Inventor: Jens Werner Kipp
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Patent number: 8500914Abstract: With the device (1) according to the invention for blowing off impurities on bottle bottoms, in particular bottle inspection machines, a solution is to be created which makes it possible to achieve an optimum blow-off result at comparatively lower air volume flows. This is achieved according to the invention in that beneath the nozzle head (3) in the annular body (5) a channel (6) is provided, which is connected to a compressed air line (7), which in turn is linked to the compressed air feed line (9), wherein the channel (6) in the upper edge pointing to the nozzle head (3) forms an annular gap (14)—triggering the Venturi effect.Type: GrantFiled: February 5, 2009Date of Patent: August 6, 2013Assignee: KHS GmbHInventor: Claas Fritsche
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Publication number: 20130192645Abstract: An apparatus for cleaning a collection system of debris is shown and described. The apparatus may include a debris collector having a capacity and an inlet hose operatively coupled with the debris collector, at least a portion of the inlet hose positionable within the collection system. The apparatus may also include at least one vacuum operatively coupled with the debris collector, where the vacuum creates suction capable of forcing debris and fluid from the collection system into the inlet hose, and a debris reduction assembly attached to the inlet hose, where the debris reduction assembly is capable of generally reducing a size of the debris entering the inlet hose.Type: ApplicationFiled: January 18, 2013Publication date: August 1, 2013Applicant: Jet-Vac, LLCInventor: Jet-Vac, LLC
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Publication number: 20130192640Abstract: According to one embodiment, the disclosure provides a system for removal of deleterious chemicals from a fiber optic line. The system may a fiber optic line having two ends, an outer tube, an optical fiber, and an inner volume, a fluid operable to move through the inner volume, the fluid operable to remove at least one deleterious chemical other than hydrogen from the fiber optic line, and a fluid controller connected to at least one end of the fiber optic line and operable to control movement of the fluid through the inner volume. According to another embodiment, the disclosure provides a method of removing a deleterious chemical from a fiber optic line. According to a third embodiment, the disclosure provides a method of removing a deleterious chemical from a fiber optic line by introducing a vacuum in an inner volume of a sealed fiber optic line in a static or cyclical manner.Type: ApplicationFiled: January 26, 2012Publication date: August 1, 2013Inventors: Neal G. Skinner, John L. Maida, JR., Etienne M. Samson, David P. Sharp, Kari-Mikko Jaaskelainen, Michel LeBlanc
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Publication number: 20130192646Abstract: In order to recover the resources (cleaning agent, heat) contained in the cleaning agent vapors suctioned off a cleaning system for cleaning industrially produced components, it is proposed to guide the suctioned-off waste air ({dot over (V)}ab) in a recovery device (5) through a heat register (9) of a refrigeration device (6) and thereby to heat it substantially to the temperature of the waste air ({dot over (V)}ab), and to supply the waste air ({dot over (V)}ab) heated and dried in this manner to the cleaning chamber (2) in the region of a bulkhead door (16) as preheated dried supply air ({dot over (V)}zu).Type: ApplicationFiled: July 25, 2011Publication date: August 1, 2013Applicant: TMS TRANSPORT- UND MONTAGESYSTEME GMBHInventor: Reiner Wittendorfer
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Patent number: 8491722Abstract: A method of monitoring a tube or pipeline, wherein an IP comprising an electronics module arrangement, is driven along the interior of the tube or pipeline by fluid pressure, wherein the IP transmits monitoring signals through the fluid that provides the pressure to the wall of the tube or pipeline, receives signals returned from the wall, analyzes the returned signals and stores data relating to the condition of the wall of the pipeline.Type: GrantFiled: September 23, 2008Date of Patent: July 23, 2013Assignee: Cokebusters LtdInventor: John Phipps
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Publication number: 20130180550Abstract: Cleaning heads for extracting liquid from a surface and methods of use are disclosed herein. A cleaning head may include a head body and/or a neck portion that define an internal chamber. A vacuum hose can couple to an opening into the internal chamber. A bottom wall of the head body can be positioned against the surface from which liquid is to be extracted. The bottom wall defines a floor of the internal chamber, a plurality of suction holes into the internal chamber, and a plurality of ridges and a plurality of depressions disposed on an outer surface of the bottom wall. The depressions form vacuum chambers against the surface as suction is applied through the suction holes. An upper wall defines a top of the internal chamber. A sight portion allows visibility of liquid and other material extracted and/or drawn into the vacuum hose.Type: ApplicationFiled: December 27, 2012Publication date: July 18, 2013Inventors: Willie Dee Kent, Steven Rodger Kent
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Patent number: 8486201Abstract: Disclosed is a method for drying a plate-like article; the method including rinsing with an aqueous rinsing liquid with subsequent rinsing with an organic solvent, wherein the organic solvent has a water content of below 20 mass-% wherein the organic solvent is supplied at a solvent temperature, which is at least 30° C. and not higher than 60° C.Type: GrantFiled: July 1, 2010Date of Patent: July 16, 2013Assignee: Lam Research AGInventor: Aurelia Plihon
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Publication number: 20130174873Abstract: A substrate cleaning method is capable of preventing a liquid stream on a substrate from being cut and circuit patterns thereon from being damaged. The substrate cleaning method includes a liquid film forming process that forms a liquid film on an entire substrate surface by supplying a cleaning liquid L from a central portion of the substrate W toward a peripheral portion thereof while rotating the substrate; a drying region forming process that discharges a gas G on the substrate surface and removes the cleaning liquid on the substrate surface; and a residual liquid removing process that removes the cleaning liquid remaining between the circuit patterns by discharging a gas G while moving in a diametrical direction of the substrate.Type: ApplicationFiled: January 3, 2013Publication date: July 11, 2013Applicant: TOKYO ELECTRON LIMITEDInventor: TOKYO ELECTRON LIMITED
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Publication number: 20130174874Abstract: A method of cleaning a surface comprising applying cleaning solution to a surface, applying suction to the surface to remove the applied cleaning solution from surface, and selectively interrupting the suction to the surface for a selected time to increase dwell time of the cleaning solution on the surface. In one embodiment, the suction is interrupted when a moveable duct door fluidly and selectively opens and closes a suction leak hole within the working air conduit. In another embodiment, the suction is interrupted when a actuator selectively moves the duct door between the first and second positions within the working air conduit to restrict the working air flow in the working air conduit. The suction reduction selectively increases the cleaning solution dwell time.Type: ApplicationFiled: February 25, 2013Publication date: July 11, 2013Applicant: BISSELL HOMECARE, INC.Inventor: BISSELL Homecare, Inc.
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Patent number: 8480807Abstract: The invention relates to a method of cleaning and/or sterilization of an object provided in a hermetically sealed enclosure, providing a pressure difference between an internal volume of the enclosure and surroundings and generating a plasma solely inside the enclosure for said cleaning and/or sterilization of the object. The invention further relates to an apparatus for enabling the same. The apparatus 10 comprises a vacuum chamber 1, which can be evacuated using a vacuum pump 2, and a source 3 arranged to generate plasma of a suitable gas in an enclosure 8, which is substantially hermetically closed with respect to the atmosphere of the vacuum chamber. The enclosure 8 may be of a flexible type or may be manufactured from a rigid material. In case when the enclosure is rigid the pressure inside the enclosure may be lower than an outside pressure.Type: GrantFiled: October 16, 2009Date of Patent: July 9, 2013Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderziek TNOInventors: Norbertus Benedictus Koster, René Koops, Kemal Agovic, Fokko Pieter Wieringa
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Patent number: 8480810Abstract: A method and system for cleaning a surface, having particulate matter thereon, of a substrate features impinging upon the surface a jet of a liquid having coupling elements entrained therein. A sufficient drag force is imparted upon the coupling elements to have the same move with respect to the liquid and cause the particulate matter to move with respect to the substrate.Type: GrantFiled: October 4, 2006Date of Patent: July 9, 2013Assignee: Lam Research CorporationInventors: Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Michael Ravkin, Mikhail Korolik, Fritz C. Redeker