Abstract: The invention relates to a method of cleaning the condenser coil subassembly of an air conditioning apparatus and a bag apparatus for achieving that result. The invention envisions placing a flexible bag construction over and generally around such subassembly, but not over or around the subassembly containing the other components of the air conditioner. This bag has an adjustable mouth portion that will fit over the condenser coil subassembly and also has respective hole means to allow the entry of compressed air and exit of vacuum air, respectively, to and from the enclosed area surrounding the condenser coil subassembly. When the bag is appropriately in place over the subassembly to be cleaned, compressed air is supplied to the enclosed area to loosen and remove debris from the coils while vacuum air is also supplied to remove the debris from the enclosed area to thereby resulting in a cleaning of the condenser coil subassembly without contaminating the area outside the bag.

Abstract: Disclosed is a method for producing a catalyst, in which physical properties of a dried material or a calcined material in a production process of the catalyst are stable and a change in at least one of a catalyst activity and a selectivity to a target product is small and hence reproducibility of the catalyst is excellent. The present invention is a method for producing a catalyst containing molybdenum, bismuth, and iron, which contains the steps of washing a surface of at least one device equipped in an apparatus for the production of catalyst, to which a solid matter adheres, with a basic solution, and producing the catalyst with the apparatus for the production of catalyst thus washed.

Abstract: A substrate holding and rotating device includes: a turntable rotatable; a rotative drive unit which rotates the turntable; a holding member which is provided on the turntable and horizontally holds a substrate in upwardly spaced relation to the turntable; a vertically movable protection disk disposed between the turntable and a substrate holding position; and a magnetic levitation mechanism including a first magnet attached to the protection disk, an annular second magnet which generates a repulsive force with respect to the first magnet, a support member which non-rotatably supports the second magnet, and a relative movement mechanism which moves the support member and the turntable relative to each other.

Abstract: Disclosed is a supercritical processing apparatus and a supercritical processing method for suppressing the pattern collapse or the injection of material constituting a processing liquid into a substrate. A processing chamber receives a substrate subjected to a processing with supercritical fluid, and a liquid supply unit supplies a processing liquid including a fluorine compound to the processing chamber. A liquid discharge unit discharges the supercritical fluid from the processing chamber, a pyrolysis ingredient removing unit removes an ingredient facilitating the pyrolysis of a liquid from the processing chamber or from the liquid supplied from the liquid supply unit, and a to heating unit heats the processing liquid including a fluorine compound of hydrofluoro ether or hydrofluoro carbon.

Abstract: An apparatus for cleaning the surface of a base, comprising: a base; a plurality of apertures flush with the surface of said base, said apertures being connected to a plurality of sub-channels and wherein said apertures are adapted to expel air; at least one air chamber operatively connected with said plurality of sub-channels; a main channel connected with said at least one air chamber; wherein said main channel is supplied from an air compressor; and a main valve located between said at least one air chamber and said main channel, wherein said main valve regulates the air flow from said main channel to said at least one air chamber, said valve being further adapted to close said main channel.

Abstract: Methods of extending the lifetime of pressure gauges coupled to process chambers are disclosed herein. In some embodiments, the methods may include isolating the pressure gauge from a processing volume of the process chamber, increasing a moisture content of the processing volume to above a desired moisture level while the pressure gauge is isolated from the processing volume of the process chamber, reducing a moisture content of the processing volume to a desired moisture level, wherein the processing volume has a leak rate of about 2 mTorr/min or less at the desired moisture level, and exposing the pressure gauge to the processing volume after reaching the desired moisture level. In some embodiments, the moisture content of the process chamber may be increased by performing a cleaning process in the process chamber or by allowing air to enter the processing volume.

Abstract: An assembly tool is provided. The assembly tool comprises a body, a first vacuum channel defined within the body, and a first locating pin attached to the body. The first locating pin has a shaft portion arranged within a surrounding portion of the body. The first locating pin is configured to engage a first alignment feature of a hard drive component at a first contact area to align the hard drive component with the assembly tool. The body is configured to couple the first vacuum channel to a vacuum source and to facilitate particle evacuation from the first contact area via the first vacuum channel when a vacuum is applied by the vacuum source.

Abstract: Devices, including a wash ring assembly, and methods are provided for the removal of excess fluid or solids from the exterior or interior of a probe used to transfer fluids, for instance, in an automated assay device. Typically, a probe is used to aspirate and dispense a sample fluid material such as whole blood or a reagent. The devices and methods provided herein are useful for removing excess fluid from the exterior or interior of the probe so as to prevent dripping and cross-contamination between samples or reagents. It is also contemplated that, utilizing the devices and methods provided herein, washing and/or drying can be performed simultaneously as the probe is in motion, aspirating a sample and/or dispensing a sample.

Abstract: An apparatus and method for cleaning a surface. The apparatus includes a frame having wheels and a handle extending outwardly therefrom. A disc plate assembly is mounted on the frame for rotation about a first vertical axis and a nozzle assembly is mounted on the disc plate assembly for rotation about a second vertical axis. The disc plate assembly is rotated at a lower speed than the nozzle assembly. Separate pneumatically-operable motors drive the wheels, the disc plate assembly and nozzle assembly. A skirt extends downwardly from the frame and outwardly from nozzles on the nozzle assembly. The nozzles may be raised or lowered relative to the surface to be cleaned. Fluid is delivered from a fluid source to the nozzles and a vacuum port is provided on the frame to enable dirty fluid to be removed from a chamber bounded by the skirt.

Abstract: The present disclosure provides a cleaning apparatus that includes a wafer holding unit configured to hold and rotate a target wafer W, and a cleaning jig with a supplying surface that covers a joint surface of the target wafer W. The cleaning jig is provided with a gas-liquid supplying unit configured to supply a solvent of an adhesive, a rinse liquid of the solvent and an inert gas into a gap between the joint surface and the supplying surface. The cleaning jig is also provided with a suction unit configured to suck the solvent or rinse liquid (mixed liquid) which is supplied to the gap between the joint surface and the supplying surface, and a gas supplying unit configured to supply gas to a step portion.

Abstract: An apparatus for cleaning an article may include a cleaning head. The cleaning head may have a lower edge and may include an annular steam chamber and a steam nozzle. The annular steam chamber may define a vacuum chamber that may be configured to receive the article therewithin. The annular steam chamber may have a plurality of discrete apertures positioned in vertically spaced relation to the lower edge. The steam nozzle may be configured to provide steam to the annular steam chamber for discharge through the apertures into the vacuum chamber.

Abstract: In accordance with one embodiment of the present disclosure, a method for preventing corrosion of a plasma-exposed yttria-coated constituent from ambient acidic hydrolysis wherein the plasma-exposed yttria-coated constituent includes a hydrolysable acid precursor is disclosed.

Abstract: A self-limiting vacuum (SLV) nozzle is provided for collecting or removing combustible dust. The nozzle comprises a nozzle body comprising a nozzle inlet port, a nozzle unloader port, and a suction port; a suction tube assembly operably connected to the nozzle inlet port; a material deflector for directing vacuumed material from the suction tube assembly into the suction port; and an unloader hood installed in the unloader port. Discs can be installed in the unloader or suction port to control collection of combustible dust by the nozzle so that the concentration of dust collected within the hose stays below the minimum explosive concentration (MEC). The nozzle is operably connected to a vacuum source. Systems and methods for collecting combustible dust using the nozzle and a vacuum system are provided. Operation of the nozzle regulates the MEC of the combustible dust that is collected in the vacuum system.

Abstract: A method and apparatus for wetting the surface of a workpiece is disclosed. The apparatus includes a chamber with a vacuum port and a fluid port and a workpiece holder including a body, a ring, and a port. The body includes a surface and defines a cavity extending from the surface. The ring is adapted to retain the workpiece on the surface of body over the cavity. The ring forms a fluid seal relative to the workpiece and to the workpiece holder. The port is defined in the body and in communication with the cavity. The port affects pressure in the cavity to minimize a pressure differential between the front and back surfaces of the workpiece. The fluid port is in communication with the chamber. The fluid port delivers a fluid (e.g., a substantially degassed fluid) to wet the front surface of the workpiece during operation of the chamber at a reduced pressure relative to atmosphere.

Abstract: The present disclosure provides an apparatus for fabricating a semiconductor device. The apparatus includes a mechanical structure that is operable to secure a position of a semiconductor wafer. The wafer has a front surface and a back surface. The apparatus includes a wafer cleaning device that is operable to clean a predetermined region of the wafer on the back surface. The predetermined region of the wafer at least partially overlaps with one or more alignment marks. The present disclosure also provides a method of fabricating a semiconductor device. The method includes loading a semiconductor wafer into a wafer handling system. The method includes removing contaminant particles from an edge region of the wafer from the back side. The alignment marks are located in the edge region. The method includes collecting the removed contaminant particles and discarding the collected contaminant particles out of the wafer handling system.

Abstract: A vacuum exhaust method of a substrate processing apparatus, after opening to the atmosphere, depressurizes a vacuum processing chamber having therein a mounting table for mounting a target substrate thereon. The vacuum exhaust method includes covering a surface of the mounting table with a protection member; sealing the vacuum processing chamber; vacuum evacuating the sealed vacuum processing chamber; and adsorbing at least one of foreign substances and out-gases by the protection member.

Abstract: A method for removing painted markings is provided that includes the step of applying a paint removal agent to a painted marking on a surface. A covering may be applied to the paint removal agent. Further, a fluid may be applied to the covering as the covering covers the paint removal agent to effect removal of the painted marking, the paint removal agent, and the covering.

Abstract: A vacuum drainage system for unclogging a clogged drain comprises a source of vacuum, a hose having a proximal end portion and a distal end portion, the proximal end portion of the hose being connected to the source of vacuum when the system is in use, and a drain clean-out device being received on the distal end portion of the hose when the system is in use. The drain clean-out device comprises a hollow tubular structure, a sealing member receiving portion located on the exterior surface of the hollow tubular structure at the first end portion of the structure, and a sealing member mountable on the sealing member receiving portion for creating a seal between the sealing member and the exterior service of the structure and between the sealing member and a clogged drain when the hollow tubular structure, with the sealing member mounted thereon, is positioned over a clogged drain, with the sealing member being in contact with an entrance to the drain or with a surface surrounding the entrance to the drain.

Abstract: A bell jar includes a metallic bell jar (1), and a metallic base plate (2) on which the bell jar (1) is placed, and packing (3) seals an inside of a container. To the base plate (2), a pressure gauge (4), a gas introduction line (5), and a gas discharge line (6) are connected so as to allow monitoring of internal pressure of the bell jar (1) and introduction and discharge of a gas. A vacuum pump (7) is provided in a path of the gas discharge line (6), and the vacuum pump (7) reduces internal pressure of the bell jar so as to be lower than vapor pressure of water. The vacuum pump (7) reduces the internal pressure of the bell jar so as to be lower than vapor pressure of water, thereby efficiently removing moisture, and completing drying of the bell jar in a short time.

Abstract: Provided is a method and apparatus for cleaning a photomask. The photomask including a first region and a second region surrounding the first region, a pattern to be protected disposed on the first region, and a material to be removed exists on the second region. A cleaning liquid is sprayed from an inside region of the second region toward an outer region of the second region to remove the material, and a gas is blown from the first region toward the second region to protect the pattern.

Abstract: Embodiments of the invention provide a system and method for operating a pressure-driven pool cleaner. The system includes a hydraulic timer assembly and a venturi vacuum assembly. The method includes directing water to the hydraulic timer assembly and the venturi vacuum assembly, driving the pressure-driven pool cleaner with the hydraulic timer assembly according to a timed movement cycle including a combination of backward movement and forward movement, and suctioning debris with the venturi vacuum assembly. The venturi vacuum assembly is independent of the hydraulic timer assembly so that suctioning occurs during the backward movement and the forward movement.

Abstract: A method for removal of a deposition on an uncapped multilayer mirror of an apparatus. The method includes providing a gas that includes one or more of H2, D2, and DH, and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the apparatus; producing hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas; and bringing the uncapped multilayer mirror with deposition into contact with at least part of the hydrogen and/or deuterium radicals and the radicals of the one or more additional compounds to remove at least part of the deposition.

Abstract: A chandelier cleaning apparatus includes a tent-like enclosure made of a transparent plastic. In a first embodiment, the enclosure includes a main body having a flat top panel and a flat, imperforate bottom panel. A central aperture is formed in the top panel and a zipper extends from the central aperture to an outer periphery of the top panel so that the central opening is enlarged when the zipper is open. The chandelier passes through the central aperture when the zipper is open and is enclosed within the enclosure when the zipper is closed. A mist of hot water is sprayed onto the chandelier with a wand that extends though a small opening in the enclosure. The time required to clean a typical chandelier drops from hours to minutes, no chemicals are used, and the chandelier is touched only by the hot mist.

Abstract: A method for cleaning the surface of a silicon substrate, covered by a layer of silicon oxide includes: a) exposing the surface for 60 to 900 seconds to a radiofrequency plasma, generated from a fluorinated gas, to strip the silicon oxide layer and induce the adsorption of fluorinated elements on the substrate surface, the power density generated using the plasma being 10 mW/cm2 to 350 mW/cm2, the fluorinated gas pressure being 10 mTorrs to 200 mTorrs, and the substrate temperature being lower than or equal to 300° C.; and b) exposing the surface including the fluorinated elements for 5 to 120 seconds to a hydrogen radiofrequency plasma, to remove the fluorinated elements from the substrate surface, the power density generated using the plasma being 10 mW/cm2 to 350 mW/cm2, the hydrogen pressure being 10 mTorrs to 1 Torr, and the substrate temperature being lower than or equal to 300° C.

Abstract: A system and method for heating a purging fluid contained in a portable oil sump or reservoir, and pumping the hot purging fluid through a bearing housing in order to purge the bearing and bearing housing of accumulated hardened grease, sludge, and debris. The heated purging fluid can then be suctioned into the sump or reservoir, screened and filtered, and re-circulated through bearing housing to continue purging the bearing and bearing housing.

Abstract: A debris removal attachment for use with a hand-held power tool. The attachment includes an extension shaft, a first impeller coupled to the extension shaft, and a housing provided adjacent the first impeller. The rotation of the first impeller is configured to generate a pressure differential sufficient to draw debris into the housing.

Abstract: A substrate is placed on a plurality of support pins within an opening of a carrier, such that a gap exists between the radial perimeter of the substrate and the carrier. The substrate and carrier are passed in a linear direction through a meniscus generated between respective faces of upper and lower proximity heads. Each of the upper and lower proximity heads includes a plurality of meniscus nozzles configured to supply liquid to the meniscus. A plurality of vacuum ports are formed on the respective face of each of the upper and lower proximity heads and are arranged to completely surround the plurality of meniscus nozzles. Liquid of the meniscus is evacuated from the gap between the radial perimeter of the substrate and the carrier so as to reduce a size and a frequency of at least one of entrance or exit marks on the substrate.

Abstract: A method for cleaning first and second filters of a suction device for cleaning purposes is provided. The suction device has a dirt collection container with a suction inlet. The dirt collection container is subjected to negative pressure via first and second suction lines, respectively, following the first and second filters. First and second closing valves close first and second external air inlets, respectively, into the first and second suction lines. For cleaning the filters, the closing valves are opened, subjecting the filters to external air on the clean space side. The dirt collection container is subjected to negative pressure via the first suction line and first filter by a first suction unit and via the second suction line and second filter by a second suction unit. The suction lines are sealed off relative to each other on the clean space side at least during the cleaning of the filters.

Abstract: Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy source may be used to clean contaminants from the template and/or the substrate.

Abstract: There is disclosed a substrate processing apparatus including a processing chamber housing a substrate, pipes for supplying gas into the processing chamber, and heaters provided in the middle of the pipes, and heating the gas. In the substrate processing apparatus, the heaters heat the gas to a temperature lower than a temperature at which exhaust gas is generated from the pipes to dry the substrate in the heated gas.

Abstract: A vacuum attachment tool is provided for use with one or more vacuum systems and with a source of pressurized cleaning fluid, the tool adapted for removing fluids, solids, debris and produced substances from a hydrocarbon-producing well from a surface, such as a drilling rig floor. The tool can include a brush head having a vacuum orifice, the brush head adapted for loosening fluids and solids from the surface so they can be vacuumed up through the orifice to the vacuum system. The tool can further include an orifice disposed on the brush head for dispensing pressurized cleaning fluid, and a valve mechanism for controlling the flow of the pressurized cleaning fluid.

Abstract: A method includes generating a solvent-containing vapor that contains a solvent. The solvent-containing vapor is conducted to a package assembly to clean the package assembly. The solvent-containing vapor condenses to form a liquid on a surface of the package assembly, and flows off from the surface of the package assembly.

Abstract: The present invention relates to a method of removing chewing gum and residues thereof from substrates using chewing gum modifying compositions comprising oxidising reagents and one or more oxidation catalysts.

Abstract: A cover tube concentric about a pressure tube at the opposite end.

Abstract: An autonomous floor cleaning robot includes a transport drive and control system arranged for autonomous movement of the robot over a floor for performing cleaning operations. The robot chassis carries a first cleaning zone comprising cleaning elements arranged to suction loose particulates up from the cleaning surface and a second cleaning zone comprising cleaning elements arraigned to apply a cleaning fluid onto the surface and to thereafter collect the cleaning fluid up from the surface after it has been used to clean the surface. The robot chassis carries a supply of cleaning fluid and a waste container for storing waste materials collected up from the cleaning surface.

Abstract: A system performs a method for removing air bubbles from a proximity head. The system pumps a fluid into a delivery passage in the proximity head that includes, input channels, a plenum, output channels, a return passage, and return channels. The fluid flows from the delivery passage through the input channels into the plenum. Each of the input channels has an inverted V-shaped opening into the plenum to urge any air bubbles in the plenum to flow upwards through the inverted V-shaped opening. The fluid flows from the plenum through the output channels onto a substrate. The system creates suction in the return passage which is connected to the return channels. The return channels suction the fluid from the substrate. A connecting passage connects the delivery passage and the return passage, allowing air bubbles to escape from the delivery passage into the return passage.

Abstract: In a mass spectrometer or gas chromatograph/mass spectrometer system, a conditioning gas such as, for example, hydrogen is added to condition or clean one or more components or regions of the mass spectrometer such as the ion source. The conditioning gas may be added upstream of the mass spectrometer such as, for example, into a sample inlet or a chromatographic column, or may be added directly into the mass spectrometer. The conditioning gas may be added off-line, when the mass spectrometer is not analyzing a sample, or on-line during sample analysis. When added on-line, the conditioning gas may be mixed with a carrier gas such as, for example, helium. In another embodiment, the conditioning gas also serves as the carrier gas through the column; another gas such as, for example, helium may be added to the carrier gas stream.

Abstract: A system for cleaning and maintaining a vault includes a vault that may have equipment submerged in water. The vault includes a floor, at least one wall, and a cover that collectively define a vault interior. In some versions there is contaminated water in the vault that is at least one foot above the lowest point on the vault floor. In some versions, the water may be 12 to 14 feet above the lowest point on the floor. A portion of the floor may slope toward a vacuum head that is indirectly coupled with a source of suction. In some versions, at least the vault floor is lined with a liner that has a low coefficient of friction and is corrosive resistant. The source of suction may be a vacuum hose of a vacuum truck.

Abstract: An apparatus for improving fluid exchange across a microplate. A microplate having one or more internal modifications which aid the introduction and removal of fluids from the wells of the plate and minimize the damage caused to biological matter located therein upon introduction or removal of a pipette tip and/or fluids, and/or an apparatus for inclining the microplate at an angle from the horizontal and retaining the microplate in the inclined position, to facilitate fluid introduction and aspiration from the wells of the microplate.

Abstract: According to one embodiment, a supercritical drying method comprises cleaning a semiconductor substrate with a chemical solution, rinsing the semiconductor substrate with pure water after the cleaning, changing a liquid covering a surface of the semiconductor substrate from the pure water to alcohol by supplying the alcohol to the surface after the rinsing, guiding the semiconductor substrate having the surface wetted with the alcohol into a chamber, discharging oxygen from the chamber by supplying an inert gas into the chamber, putting the alcohol into a supercritical state by increasing temperature in the chamber to a critical temperature of the alcohol or higher after the discharge of the oxygen, and discharging the alcohol from the chamber by lowering pressure in the chamber and changing the alcohol from the supercritical state to a gaseous state. The chamber contains SUS. An inner wall face of the chamber is subjected to electrolytic polishing.

Abstract: Disclosed herein are devices, methods and systems for ex-situ component recovery. The ex-situ recovery can be performed by desorbing or outgassing components of a processing system in a recovery system, rather than in the processing system itself. The recovery system can include a docking station and/or a heated vacuum chamber. The heated vacuum chamber can be used to desorb or outgas components that will be located inside the processing system, while the docking station can be used to desorb or outgas components that will be connected to the processing system. The processing system components can be placed under pressure by the recovery system to desorb or outgas contaminants and remove virtual leaks. The recovery system pressure can include a vacuum roughing pump, a turbomolecular pump, and/or a cryogenic pump to apply a pressure necessary to desorb or outgas the components.

Abstract: A vacuum cleaner includes a drive unit configured to generate a volume flow rate and a negative pressure, when energized, during operation of the vacuum cleaner, a means for determining a measure of the volume flow rate generated during operation, a pressure sensor for determining a measure of the negative pressure generated during operation, and a drive unit controller. The drive unit controller is configured to generate an operand from the measure of the determined volume flow rate and the measure of the determined negative pressure, and to compare the operand with a predefinable threshold, as a design limit. The drive unit controller is operable to reduce the electrical power input to the drive unit based on the comparison of the operand to the design limit.

Abstract: A system for removing paint and other coatings from hard surfaces is mounted on a truck for over-the-road travel. The truck bed carries a high power vacuum pump, a self propelled tractor with an attached blast head, a liquid reservoir, a sump or vacuum tank, and a ramp for loading the tractor. The reservoir is connected to a low pressure pump that transfers water to the high pressure pump. The high pressure pump is connected to the blast head by a high pressure hose. A vacuum hose is connected to the sump which has an internal enclosure for separating the waste materials from the liquid for easy dumping of semi dried materials.

Abstract: A substrate cleaning device is capable of removing more diverse contaminants from substrates than ultra-low temperature aerosol ejection, while avoiding technical problems inherent to wet cleaning, such as micro-roughness, watermarks, loss of substrate material and destruction of the device structure. A substrate cleaning device for cleaning wafers to which cleaning target objects have adhered includes a cluster spraying unit which sprays the wafer with one or more types of clusters formed of cleaning preparation molecules agglomerated together, a suction unit which sucks the cleaning target objects separated by spraying the clusters of the cleaning agent molecules; and a unit for moving the wafer and the cluster spraying unit relative to the one another along the surface of the wafer W to which the cleaning target objects have adhered.

Abstract: A process for removing carbonaceous deposits on surfaces of catalysts and plant parts by treating the deposits with a superheated stream of steam admixed at least temporarily with an oxygenous gas is provided, which involves, in each case monitoring the offgas CO2 content after condensation of the steam, at a temperature of at least 300° C.: (a) treating the carbonaceous deposits with superheated steam at a temperature of at least 300° C. until the CO2 content of the offgas has exceeded a maximum; (b) then, with further supply of superheated steam, commencing oxygen supply, the amount of oxygen supplied being adjusted such that the CO2 content in the offgas decreases further until it has fallen to a value of <1% by volume; and then (c) ending the supply of superheated steam and passing an oxygenous gas over remaining amounts of carbonaceous deposits until the deposits have been virtually removed.

Abstract: A method of surface cleaning wherein recovering a soiled cleaning fluid from a surface to be cleaned is subsequent to the application of fluid to the surface as a module moves along different and opposite directions.

Abstract: An apparatus to clean an electronic device may include a head structure having a first surface adapted to face a body to be cleaned, and a plurality of supply openings and return openings on the first surface. At least a portion of the supply openings and return openings are positioned as alternating rows of supply openings and return openings. The supply openings are larger in area than the return openings in at least a majority of the alternating rows. The supply openings and the return openings are adapted to transmit at least one of a gas and a liquid therethrough. The head structure is adapted to permit the transmission of at least one of a gas and a liquid through the supply openings and at the same time the head structure is also adapted to permit the transmission of at least one of a gas and a liquid through the return openings. Other embodiments are described and claimed.

Abstract: A film removing device includes an approach stage having a flat approach part having a surface substantially flush with the surface of a substrate supported on a support member. The flat approach part faces a first side surface of the substrate at a corner of the substrate where the first side surface and a second side surface of the substrate join. A film removing nozzle spouts a solvent toward a peripheral part of the substrate and sucks a solution while being moved along the second side surface and the approach stage. A gas is spouted into a gap between the flat approach part and the corner of the substrate so that the gas flows through the gap toward the second side surface.

Abstract: A method and apparatus are provided for reducing an oxidation-reduction potential (ORP) of an electrochemically activated liquid. The ORP is reduced by emitting ions from an ion generator into the electrochemically activated liquid, wherein the ions have a charge polarity that is opposite to the ORP of the liquid.

Abstract: To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles and causing the particles to scatter by utilizing the Coulomb force, a means for introducing a gas into the vacuum chamber and causing the particles sticking to the element to scatter by causing a gas shock wave to hit the element, a means for heating the element and causing the particles to scatter by utilizing the thermal stress and thermophoretic force, or a means for causing the particles to scatter by applying mechanical vibrations to the element. The thus scattered particles are removed by carrying them in a gas flow in a relatively high pressure atmosphere.