Abstract: A method and apparatus for removing debris from the propulsion system of a vehicle such as a battle tank, including a tank in which the vehicle is positioned, means for lifting the vehicle in the tank, and means to wash the vehicle's propulsion system while the vehicle is in raised position.

Abstract: A method and apparatus for transporting an object from one workstation to another, where the object or workstations may be contaminated with unwanted dirt or dust particles, are disclosed. The object is gripped at one work station with a movable transfer arm. The movable transfer arm has an end effector including an array of nano-scale projections, where each projection provides one or more distal contact ends. The density of the contact ends is such as to grip a surface of the object with an intermolecular force sufficient to hold the object for movement After moving the gripped object to the workstation, the end effector is manipulated to release the gripped object. Before, during or after transport of the object, the arm's end effector is brought into contact with a cleaning surface.

Abstract: Disclosed is a producing method of a semiconductor device comprising a first step of supplying a first reactant to a substrate to cause a ligand-exchange reaction between a ligand of the first reactant and a ligand as a reactive site existing on a surface of the substrate, a second step of removing a surplus of the first reactant, a third step of supplying a second reactant to the substrate to cause a ligand-exchange reaction to change the ligand after the exchange in the first step into a reactive site, a fourth step of removing a surplus of the second reactant, and a fifth step of supplying a plasma-excited third reactant to the substrate to cause a ligand-exchange reaction to exchange a ligand which has not been exchange-reacted into the reactive site in the third step into the reactive site, wherein the first to fifth steps are repeated predetermined times.

Abstract: When, according to the invention, a washing system (1) is made of a pipe of synthetic material, where the pipe is divided into a washing tunnel (5) and a tank (6) separated by a package conveyor (3) and a drain bottom (7), a washing system is achieved, where the system may be advantageously by established by coupling a plurality of pipes together and by introducing a fully mounted drain bottom via an open pipe end. The selection of synthetic material as a pipe material results in great savings of material, while providing a tunnel which is stable and self supporting, and which is sound and heat insulating and hygienic, so that both the initial and the operating costs are reduced significantly.

Abstract: Apparatus to clean silicon electrode assembly surfaces which controls or eliminates possible chemical attack of electrode assembly bonding materials, and eliminates direct handling contact with the parts to be cleaned during acid treatment, spray rinse, blow dry, bake and bagging. Aspects of the apparatus include a kit including an electrode carrier to hold an electrode assembly, a treatment stand to allow access to the electrode assembly, a spider plate to clamp the electrode assembly in the electrode carrier, a nitrogen purge plate to supply nitrogen gas to the backside of the electrode assembly during acid cleaning of the electrode, a water rinse plate to supply water to the electrode face, a blow dry plate to supply nitrogen to dry the electrode assembly and a bake stand to support the electrode assembly during a bake before placing the clean electrode assembly in a bag.

Abstract: A wash cylinder or chamber for an automated cleaning station to clean an object or a person's body part includes nozzles on the interior of the cylinder, the nozzles of one embodiment comprising an increasing roll angle providing a novel spray pattern. Additionally, embodiments of the invention include fluid guidance and conveyance structures, angled nozzles, sealing structures, finger guards, nozzle ribs, wash chamber seating mechanisms and drains, and nozzle inlays having a plurality of nozzles. Also disclosed are methods of washing an object or body part using a wash cylinder or chamber and methods of assembling a wash cylinder or chamber.

Abstract: A proximity head for generating and maintaining a meniscus for processing a substrate is described. The proximity head includes a plurality of meniscus nozzles formed on a face of the proximity head, the nozzles being configured to supply liquid to the meniscus, a plurality of vacuum ports formed on the face of the proximity head, the vacuum ports being arranged to completely surround the plurality of meniscus nozzles, and a plurality of gas nozzles formed on the face of the proximity head, the gas nozzles at least partially surrounding the vacuum ports. The proximity head further includes means for reducing a size and frequency of entrance and/or exit marks at a leading edge and a trailing edge on the substrate by aiding and encouraging liquid from the meniscus to evacuate a gap between the substrate and the carrier.

Abstract: The invention refers to a device (1) and method for sterilizing partly formed packages (6) in a packaging machine. The device (1) comprises an inner chamber (2) and an outer chamber (3), the inner chamber (2) being provided with a sterilization unit (5). Further, it comprises a carrier unit (10), comprising a separating member (11) and a package carrying member (12), which is being adapted to rotate between a first position in which the package carrying member (12) is located in the outer chamber (3), and in which the separating member (11) separates the inner chamber (2) from the outer chamber (3), and a second position in which the carrier unit (10) has rotated a package (6) into the inner chamber (2) and in which the separating member (11) separates the inner chamber (2) from the outer chamber (3).

Abstract: Disclosed is a treating apparatus capable of improving the throughput during successive processing of target objects without a bad influence on the target objects. The disclosed treating apparatus includes an extendable liquid treating mechanism, and a common handling unit for handling one target object and another target object in order. The treating apparatus includes a recipe producing unit for producing a recipe having a rinsing liquid treatment and a common handling. When one common handling for handling one target object by the common handling unit and another common handling for handling another target object by the common handling unit are temporally overlapped with each other, the recipe producing unit extends the extendable liquid treatment for another target object, and shifts another common handling to an extent that the extendable liquid treatment is extended, thereby avoiding the temporal overlapping of one common handling with another common handling.

Abstract: A liquid-scattering prevention cup, provided in a substrate processing apparatus, is capable of attaching a hydrophilic member, such as a PVA sponge, to an inner surface of a liquid-scattering prevention cup body easily and efficiently. The liquid-scattering prevention cup includes a liquid-scattering prevention cup body, and a liquid-scattering prevention sheet having a surface hydrophilic material layer, attached to an entire area or a predetermined area of the inner surface of the liquid-scattering prevention cup body. The liquid-scattering prevention sheet has been attached to the liquid-scattering prevention cup body by an attachment such that the hydrophilic material layer is exposed.

Abstract: A method for activating the surface of a base material and an apparatus thereof, which is suited to be utilized for pretreatment in electrochemical treatment such as, for example, electroplating or the like, in which the surface of a base material such as metal can be subjected to degreasing treatment and oxide film removing treatment simultaneously, efficiently and rationally, in which productivity can be enhanced and the equipment cost can be reduced, and in which a waste solution can be rationalized so that the solution can be reutilized and the environmental pollution can be prevented. A method for activating the surface of a base material in which the surface of a member to be treated is subjected to degreasing treatment or oxide film removing treatment. Pressurized carbon dioxide is dissolved in a predetermined quantity of water, thereby preparing an oxide film removing solution having a predetermined acidic concentration.

Abstract: The present invention relates to a method for cleaning polycrystalline silicon fragments to a metal content of <100 ppbw, wherein a polysilicon fraction is added to an aqueous cleaning solution containing HF and H2O2, this aqueous cleaning solution is removed and the polycrystalline fraction thereby obtained is washed with highly pure water and subsequently dried.

Abstract: In a process for cleaning beverage filling plants, one or more beverage filling devices (30) including a filling head (32) inside a beverage filling chamber (20) of the beverage filling line (20) are rinsed during the operation of the beverage filling line continuously or intermittently with an aqueous, hygienically non-hazardous cleaning agent (110), present at ambient temperature. Preferably, in addition, vessels (48) which, in the beverage filling chamber (40a) are filled with a beverage (35) and/or a conveyer device (6) for conveying the vessels to the beverage filling chamber (20), are rinsed continuously or intermittently with the cleaning agent (110). The cleaning agent preferably has disinfectant activity.

Abstract: An apparatus and method is provided for removing smudges (506, 706, 806, 906) including oils and dust from portable electronic displays. The apparatus comprises a display device (110, 150, 500, 700, 800, 900, 1000) positioned within a housing (102, 104, 808), comprising a transparent cover (302, 502, 702, 802, 902, 1002) having a surface (508, 908) viewable through an opening in the housing (102, 104, 808) and a susceptibility to receiving contaminants (506, 706, 806, 906). A vibration device (504, 704, 804, 904, 1004) is positioned against the transparent cover (302, 502, 702, 802, 902, 1002) to provide motion (510) in a direction parallel to the surface, thereby causing the contaminants to move (708) across the surface (508, 908). The contaminants (506, 706, 806, 906) may then be hidden by the housing (102, 104, 808) or ejected by a motion (912) perpendicular to the surface by another vibrating device (911).

Abstract: A wheel washing assembly contains a machine frame, a pendulum assembly pivotably supported on the machine frame, and two washing manifolds, including a first washing manifold and a second washing manifold, attached to the pendulum assembly. Each of the washing manifolds has a nozzle assembly for ejecting water at a wheel to be washed. The washing manifolds are pivotable between a start washing position and an end washing position by an automatic motion of the pendulum assembly. The washing manifolds further automatically track the wheels to be washes by a motion of one of the wheels.

Abstract: A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. The invention includes spraying a line of fluid to a substrate, thereby creating an air/fluid interface line on the substrate; supplying a line of drying vapors to the air/fluid interface line, thereby creating a Marangoni drying effect along the air/fluid interface line; and moving the substrate relative to the air/fluid line. Numerous other aspects are provided.

Abstract: To provide a cleaning sheet that can remove foreign matter adhering on a probe needle without wearing the probe needle and that does not allow the foreign matter to re-adhere on the probe needle, the cleaning sheet has a cleaning layer on at least one surface thereof, the cleaning layer containing a urethane polymer and a vinyl monomer.

Abstract: A method for assessing and guaranteeing the thermal hygiene efficiency in a multi-tank dishwasher in which there is at least one sensor that transmits a temperature inside at least one treatment zone to a machine control system, in particular to the control system of the multi-tank dishwasher, the method includes: detecting the temperature inside at least one of the treatment zones by the sensor; determining the heat input applied to the items to be cleaned in at least one of the treatment zones on the basis of the temperature determined; comparing the heat input in the at least one treatment zone with a predefined heat input; and, as a function of the result of the comparison of the heat input values, varying the transport speed of the items to be cleaned through the multi-tank dishwasher, or varying the temperature of at least one of the process parameters acting on the heat input values as a control variable in a control loop for at least one of the treatment zones.

Abstract: An apparatus and method for removing contaminants from a workpiece is described. Embodiments of the invention describe placing a workpiece on a holding bracket within a process chamber to hold and rotate the workpiece to be cleaned. A first cleaning fluid is provided to the workpiece non-device side, while a degasified liquid is provided to the workpiece device side during megasonic cleaning. The degasified liquid inhibits cavitation from occurring on and damaging the device side of the workpiece during megasonic cleaning.

Abstract: After the resist stripping liquid is supplied to the surface of the substrate which is being rotated at a first rotational speed, the rotational speed of the substrate is reduced from the first rotational speed to a second rotational speed with the supply of the resist stripping liquid to the surface of the substrate continued, thereby forming a liquid film by a mount of the resist stripping liquid on the surface of the substrate and then, maintaining a state where the liquid film is formed.

Abstract: Electrodes are conveyed edgewise along a path. The electrodes can be supported by their bottom peripheral edge and can be maintained generally vertically. A plurality of wash nozzles are positioned adjacent to the path on opposing sides thereof. Wash spray from the nozzles is directed to impinge sides of the electrode. The nozzles can be arranged linearly to form a nozzle array angled so that the wash spray impinges an upper portion prior to a bottom portion of the electrode. Separate sections for rinsing or pre-washing can be provided within a washing chamber. Used water can be collected and recycled.

Abstract: A method is provided for reducing the amount of film fragments discharged into a processing liquid circulation system during removal of films from wafers, thereby reducing the frequency of filter cleaning or filter replacement. The method includes exposing a wafer containing a film formed thereon in a process chamber of a substrate processing system to a processing liquid, where the wafer is not rotated or is rotated at a first speed and the processing liquid is discharged from the process chamber to a processing liquid circulation system. Subsequently, exposure of the wafer to the processing liquid is discontinued and the wafer is rotated at a second speed greater than the first speed to centrifugally remove fragments of the film from the wafer. Next, the wafer is exposed to the same or a different processing liquid and the processing liquid is discharged from the process chamber to a processing liquid drain.

Abstract: An apparatus and a method for removing a coating film capable of stable treatment for removing unnecessary coating film at a substrate edge are provided. A substrate is clamped by approach stages from front and rear directions on a chuck, and fixed when accurate registration thereof is achieved. Then, the substrate edge is moved back and forth together with the chuck and the approach stage, so that the edge of the substrate is introduced in a space between an upper piece and a lower piece of a fixed arm portion. While the substrate is being moved, a solvent is fed from a nozzle portion onto a surface thereof and a purge gas is fed through a purge gas feeding pipe, so as to remove the coating film from the surface of the substrate by sucking and discharging the solvent and dissolved coating film through a discharge pipe.

Abstract: A method of removing particles from a wafer is provided. The method is adopted after a process for removing unreactive metal of a salicide process or after a salicide process and having oxide residue remaining on a wafer or after a chemical vapor deposition (CVD) process that resulted with particles on a wafer. The method includes performing at least two cycles (stages) of intermediate rinse process. Each cycle of the intermediate rinse process includes conducting a procedure of rotating the wafer at a high speed first, and then conducting a procedure of rotating the wafer at a low speed.

Abstract: A method for the continuous cleaning of the surface of a material (2) which is coated with an organic substance. Steps of the method are: introducing the material (2) into a treatment area which is supplied with a gas stream containing oxygen; earthing the material (2); and generating a plasma by imposing an electric field between the surface of the material (2) and at least one dielectric-covered electrode (3), the electric field being pulsed and providing a succession of positive and negative voltage pulses in relation to the material (2). Moreover, the maximum voltage of the positive pulses U+ is greater than the arc-striking voltage Ua, and the maximum absolute value of the voltage of the negative pulses U? is less than the striking voltage Ua. Also, a generator and a device which are used to carry out this method.

Abstract: A method of wet cleaning a surface is disclosed. The method of wet cleaning a surface of at least one material chosen from silicon, silicon-germanium alloys, A(III)/B(V)-type semiconductors and epitaxially grown crystalline materials, such as germanium, includes the following successive steps: a) the surface is brought into contact with an HF solution; b) the surface is rinsed with acidified, deionized water, then a powerful oxidizing agent is added to the deionized water and the rinsing is continued; c) optionally, step a) is repeated, once or twice, while optionally reducing the contacting time; d) step b) is optionally repeated, once or twice; and e) the surface is dried.

Abstract: The invention is directed to a friction stir welding tool cleaning method and apparatus for fixed and retractable pin tools. The method and apparatus use a heating component, a temperature indicator component, a controller component, and a rotatable tool cleaner component for cleaning fixed pin tools. An additional bore cleaner component is used for cleaning retractable pin tools. Heat is applied to a friction stir welding tool having a surface with weld process residue material until the process residue material is sufficiently plasticized, and then the tool cleaner component is applied to the heated tool to remove the plasticized residue on the pin and shoulder surfaces of the tool, and for retractable pin tools, the bore cleaner component is applied to the heated tool to remove the plasticized residue in the tool bore.

Abstract: There are disclosed systems and methods of debriding tissue. In an embodiment, a system includes a bone tube having an opening sized to receive a bone with tissue disposed thereon, the opening of the bone tube sized to exclude entry of an operator's hand; a spray nozzle configured to emit a water jet into the bone tube; and an outlet from the bone tube. In another embodiment, a method includes assembling a sterile debridement system; placing a sterile mesh bag over a bone tube having an opening sized to receive a bone with tissue disposed thereon, the opening of the bone tube sized to exclude entry of an operator's hand; inserting one end of a bone into the bone tube; actuating a spray nozzle directed into the bone tube, and the water jet configured to debride tissue from the bone within the bone tube. Other embodiments are also disclosed.

Abstract: A parts washer comprises a cabinet, a platform, a liquid distributor, a coupling, and a drive system. The platform is disposed inside the cabinet and supports articles that are required to be cleaned. The distributor is disposed inside the cabinet to one side of the platform and has one or more outlets that direct the liquid in a generally radial direction toward the platform. The coupling couples the distributor to an inside of the cabinet in a manner allowing at least 2° of freedom of motion of the distributor. More particularly, the coupling allows the distributor to move in a complex motion comprising a combination of tilting, rotation and up and down motion.

Abstract: An apparatus for processing a substrate is disclosed. The apparatus includes a polishing section configured to polish a substrate, a transfer mechanism configured to transfer the substrate, and a cleaning section configured to clean and dry the polished substrate. The cleaning section has plural cleaning lines for cleaning plural substrates. The plural cleaning lines have plural cleaning modules and plural transfer robots for transferring the substrates.

Abstract: The present invention resides in a washing device constructed by a conveyer of a carrying-in side arranged in a frame, a reservoir lower portion having plural rails for holding the work and an ultrasonic generator arranged in this frame, each reservoir upper portion united with this reservoir lower portion, a raising-lowering device for raising and lowering each reservoir upper portion, an arm mechanism for work conveyance, a moving device for controlling advancing and retreating movements of the arm mechanism, a movable device for controlling a swinging return of the arm mechanism, and a conveyer of a carrying-out side for conveying a processed work. The conveyer and the rail of each reservoir lower portion are approximately arranged on the same face. The work is horizontally moved through this conveyer and the rail and is washed and dried by utilizing the union of each reservoir lower portion and each reservoir upper portion.

Abstract: A method for cleaning a substrate is provided. The method includes providing foam to a surface of the substrate, brush scrubbing the surface of the substrate, providing pressure to the foam, and channeling the pressured foam to produce jammed foam, the channeling including channeling the pressured foam into a gap, the gap being defined by a space between a surface of a brush enclosure and the surface of the substrate. The brush scrubbing of the surface of the substrate and the channeling of the pressured foam across the surface of the substrate facilitate particle removal from the surface of the substrate.

Abstract: A mobile aeroengine washing cart, and a method of their operation, comprises a platform having two lateral walls, a front wall and a drip tray for capturing washing medium during an engine washing operation. The lateral and front walls and the drip tray are moveable between a stowed position, for transportation, and a deployed position for engine washing.

Abstract: A process for removing the coating layers from finished golf balls is disclosed herein. The process involves soaking the golf balls in a removal solution and then subjecting the golf balls to ultrasonic treatment in order to remove a coating layer, an indicia and/or a paint layer.

Abstract: The invention is directed at systems and methods which provide for effective cleaning and drying of vehicles of different shapes and sizes. The invention in one example includes a vehicle washing apparatus comprising a conveyor system to move a vehicle along a path, and a bridge assembly supported above a vehicle and moveable along the length thereof. At least one trolley assembly is operatively supported by the bridge assembly and is moveable in a direction generally transverse to the movement of the bridge assembly. At least one cleaning arm assembly for delivering cleaning fluid to or for brushing the surface of a vehicle is operatively supported by the at least one trolley assembly or bridge.

Abstract: A method for spin-on wafer cleaning. The method comprises controlling spin speed and vertical water jet pressure. The vertical jet pressure and the spin speed are substantially maintained in inverse proportion. Wafer spin speed is between 50 to 1200 rpm. Vertical wafer jet pressure is between 0.05 to 100 KPa.

Abstract: A novel method of cleaning and disinfecting organically contaminated articles such as, for instance, medical instruments, wherein the cleaning cycle consists of two sections divided by removal and replenishing the cleaning liquid, in each section of which the temperature of the cleaning liquid is raised to and maintained at between 40° C. and 60° C. for a predetermined time and the pH-value is raised to between 8.5 and 12 by adding an alkaline cleaning agent. During the second section a low-molecular peroxide compound is added to the cleaning liquid after the cleaning agent.

Abstract: A particle purge system purges particles from an electronic device. The electronic device is inverted and secured to an interface plate included with the system. A clean purge fluid is injected into an inlet of the interface plate to release and remove particles in the electronic device. The particle purge system agitates the electronic device to enhance the release of particles from components in the electronic device into the purge fluid. At least a portion of the purge fluid that contains the released particles is exhausted through an outlet in the interface plate.

Abstract: A method of cleaning pipeline pigs of a material that is to be recycled includes providing a vessel having an interior. A manifold is placed within the vessel interior, the manifold having a plurality of openings. The vessel is filled with a solvent that is capable of dissolving the material to be recycled. The pipeline pig is placed in the vessel and above the manifold. A volume of gas is bubbled into the vessel via the manifold openings. These steps are repeated with multiple pigs in sequence so that the material to be recycled is concentrated over time within the vessel. Thereafter, the material that has accumulated within the vessel is recycled. The solvent is preferably a terpene blend with an ethoxylated alcohol. The material to be recycled is preferably paraffin and/or asphaltene.

Abstract: The application of a gel-like material is disclosed for cleaning a surface having foreign matter thereon, such gel-like material produced by magnetically treating and mixing two solutions, the first solution being comprised of water and sodium bicarbonate and the second solution comprised of water and sodium silicate. The first solution is passed through a positively charged magnetic field, and the second solution is passed through a negatively charged magnetic field. The two solutions are then mixed together to form a gel.

Abstract: A mobile vehicle washing apparatus in which the length, width and height of the apparatus may each be adjusted to the size of the vehicle to be washed and for easier transport. The frame dimensions may be adjusted by a system of cranks found on each frame member that may need to be adjusted. Also, attached to the frame are swinging arm members that may clean the bottom side of a vehicle passing through them. Powered brush members are used in the apparatus as a means to scrub vehicle surfaces. The cleaning and rinsing fluids pass through a series of hoses and nozzles mounted about the frame so that the tops and left and right sides of the vehicles being cleaned may be covered by said fluids.

Abstract: A method and system utilizing a mobile cleaning unit for providing cleaning of heat exchanger tube bundles. The mobile cleaning unit utilizes a pressurized seal positioned about top door of the cleaning enclosure to provide a fluid and vapor lock of the cleaning enclosure. An oxygen purging system of the cleaning enclosure, the cleaning fluid reservoir, and the control panels provides additional safety. The mobile cleaning unit can use cleaning fluid produced at the facility site and return the cleaning fluid to the facility site for reprocessing after the heat exchanger tube bundles are cleaned.

Abstract: A vehicle washing system including a frame having an overhead section and a pair of generally opposing side support sections. The vehicle washing system includes an entrance and an exit side. The vehicle washing system also includes a plurality of rails that extend generally in the direction between the entrance side and the exit side. The frame linearly reciprocates along the plurality of rails to travel over a stationary vehicle. The frame has a first fluid dispensing device located in the half adjacent its entrance side and a second fluid dispensing device located adjacent its exit side. The first fluid dispensing device includes a plurality of manifolds each of which is in communication with a supply of fluid to apply fluid to the vehicle. The second fluid dispensing device includes a plurality of manifolds each of which is in communication with a supply of fluid to apply fluid to the vehicle.

Abstract: A system for cleaning semiconductor lithography tools provides for cycling a polished-side down semiconductor wafer through the lithography tool using conventional automated robotics for loading and unloading the wafer from a vacuum chuck of the lithography tool. The vacuum chuck may provide a continuous clamping vacuum feature and may include a vacuum ring that surround the periphery of the vacuum chuck. The chuck and vacuum ring may advantageously be formed of a high accuracy ceramic or plastic such as ZeroDur ceramic. The polished side of the semiconductor wafer includes grooves in a polished surface and which extend inwardly from a peripheral edge of the wafer, the grooves provide gaps between the wafer and chuck allowing the wafer to be released by a slow loss of vacuum-pressure through the gaps. The pristine clean polished surface of the wafer getters contaminating particles from the chuck.

Abstract: A cleaning method and system that utilize an organic cleaning solvent and pressurized fluid solvent is disclosed. The method and system have no conventional evaporative hot air drying cycle. Instead, the method and system utilize the solubility of the organic solvent in pressurized fluid solvent as well as the physical properties of pressurized fluid solvent. After an organic solvent cleaning cycle, the solvent is extracted from the textiles at high speed in a rotating drum in the same way conventional solvents are extracted from textiles in conventional evaporative hot air dry cleaning machines. Instead of proceeding to a conventional drying cycle, the extracted textiles are then immersed in pressurized fluid solvent to extract the residual organic solvent from the textiles. This is possible because the organic solvent is soluble in pressurized fluid solvent. After the textiles are immersed in pressurized fluid solvent, pressurized fluid solvent is pumped from the drum.

Abstract: Method of de-coating metallic coated scrap pieces, the metallic coated scrap pieces comprising a metallic core layer and a metallic coating layer of which the liquidus temperature of the metallic coating layer is lower than the solidus temperature of the metallic core layer, such as brazing sheet scrap pieces, or from metallic coated scrap pieces of which the upper part of the melting range of the metallic core layer has an overlap with the lower part of the melting range of the metallic core layer. The metallic coating layer is at least partially removed from the metallic core layer of said scrap pieces by agitating the scrap pieces at an elevated temperature T above the solidus temperature of the metallic coating layer and below the liquidus temperature of the metallic core layer, together with abrading particles. The abrading particles are brought into fluidisation during the agitating of the metallic coated scrap pieces, thereby forming a fluidised bed.

Abstract: Systems for processing microelectronic substrates in a process chamber that incorporate improved technology for transitioning from a wet process to a dry process (especially transitioning from rinsing to drying). At least a portion of residual liquid remaining in fluid supply lines after a wet treatment is removed via a pathway that avoids purging directly onto the substrates. Related methods are also included in the present invention.

Abstract: A method for removing contaminants from a material (39), such as resin particles, includes the steps of providing a vessel (50), directing a cleaning fluid (41) into the vessel (50), transferring the material into the vessel (50), moving the material within the vessel (50), and removing contaminants from the material as cleaning fluid (41) flows in the vessel (50). The vessel (50) has a vessel inlet (52) and a spaced apart vessel outlet (54). The cleaning fluid (41) is directed into the vessel (50) so that the cleaning fluid (41) flows in the vessel (50). The material (39) is transferred into the vessel (50) through the vessel inlet (52), and the material (39) is then moved within the vessel (50) from the vessel inlet (52) towards the vessel outlet (54). The cleaning fluid (41) flowing in the vessel (50) contacts the material (39) while the material is moving from the vessel inlet (52) toward the vessel outlet (54) and removes contaminants (39) from material (39).

Abstract: A method for cleaning a generator coil, the method including the step of cleaning the generator coil with a vibratory tank cleaning system. The vibratory tank cleaning system may include means for inducing vibrations through a particulate medium. The vibratory tank cleaning system may include a vibratory tank that holds the particulate medium. The means for inducing vibrations through the particulate medium may be an actuator. In addition to the particulate medium, the vibratory tank also may hold water. In other embodiments, the vibratory tank may hold an acidic aqueous solution or a caustic aqueous solution.

Abstract: Provided is a method of cleaning a flexible substrate. The method includes the steps of: preparing a flexible substrate and detaching an impurity adhered to both surfaces of the flexible substrate using rotating first rollers disposed on the both surfaces of the flexible substrate; and removing the impurity by transferring the impurity from the first roller to a second roller using the rotating second roller having a relatively higher adhesion than the first roller.