Abstract: The present disclosure provides a method and apparatus for cleaning a semiconductor wafer. In an embodiment of the method, a single wafer cleaning apparatus is provided and a wafer is positioned in the apparatus. A first chemical spray is dispensed onto a front surface of the wafer. A back surface of the wafer is cleaned while dispensing the first chemical spray. The cleaning of the back surface may include a brush and spray of cleaning fluids. An apparatus operable to clean the front surface and the back surface of a single semiconductor wafer is also described.

Abstract: A method for pickling or descaling a concrete surface employing at least one jet of liquid nitrogen at cryogenic temperature below ?100° C. at a pressure of at least 500 bar, distributed by the discharge orifice of at least one nozzle for distributing the jet of liquid nitrogen. At least a portion of the distributing nozzle is protected by a resistant material haying a hardness of at least 7 on Mohs' scale. Preferably, the resistant material is deposited externally on at least a portion of wall of nozzle. Advantageously, the material is selected from tungsten carbide, boron carbide, titanium carbide, silicon carbide, cubic boron nitride, alumina and corundum.

Abstract: A method and apparatus to clean a cover to seal a gap between an object located in a recess of a table and the upper surface of the table outside of the recess. In-line and off-line arrangements are disclosed. Cleaning can be carried out using abrasion, UV radiation or flushing with a cleaning fluid for example.

Abstract: A cleaning system for a cooking range exhaust having a range hood, a backsplash, and an exhaust flue for exhausting cooking effluent is disclosed. The cleaning system can include a fluid delivery system constructed for partial placement within the cooking range exhaust. The fluid delivery system can include a hood spray conduit constructed for placement within the hood and comprising spray openings for directing a degreasing composition to the backsplash. The fluid delivery system can also include a flue spray conduit constructed for placement within or outside the exhaust flue and comprising at least one spray opening for directing the degreasing composition to an interior surface of the flue. The cleaning system can include a pump system constructed for conveying the degreasing composition from a degreasing composition source and through the fluid delivery system. A method of cleaning a cooking range exhaust and a self-cleaning exhaust system are also disclosed.

Abstract: A compressor wash system for compressor washing includes stages of fluid delivery lines coupled at one end to a pump output and at the other end to a corresponding nozzle set. A control valve is connected to the fluid delivery line between the pump and the nozzle set, selectively supplying fluid between the pump and the nozzle set. Each nozzle of a nozzle set is positioned on an inlet of the compressor to allow the stages to wash a portion of the compressor. Nozzle sets are positioned around a bellmouth assembly and/or around an inlet cone of the compressor inlet, with a nozzle spray tip of each nozzle extending into an inlet air flow path of the compressor. Fluid may be directed to one or more of the stages in a sequencing pattern determined and configured to wash the compressor. Templates and installation guides are utilized to position the nozzles.

Abstract: Embodiments of the invention relate to an industrial cleaning system and related methods. The system and methods utilize propelled media to clean equipment and facilities.

Abstract: A method for cleaning the surface of a silicon substrate, covered by a layer of silicon oxide includes: a) exposing the surface for 60 to 900 seconds to a radiofrequency plasma, generated from a fluorinated gas, to strip the silicon oxide layer and induce the adsorption of fluorinated elements on the substrate surface, the power density generated using the plasma being 10 mW/cm2 to 350 mW/cm2, the fluorinated gas pressure being 10 mTorrs to 200 mTorrs, and the substrate temperature being lower than or equal to 300° C.; and b) exposing the surface including the fluorinated elements for 5 to 120 seconds to a hydrogen radiofrequency plasma, to remove the fluorinated elements from the substrate surface, the power density generated using the plasma being 10 mW/cm2 to 350 mW/cm2, the hydrogen pressure being 10 mTorrs to 1 Torr, and the substrate temperature being lower than or equal to 300° C.

Abstract: A method for removing the overspray of a coating which has been sprayed onto a workpiece directs at least one liquid jet from a jet lance as a hydrodynamic wedge in the parting plane between the workpiece and the overspray onto those regions of the workpiece which have overspray.

Abstract: Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy source may be used to clean contaminants from the template and/or the substrate.

Abstract: A processing unit includes third discharge nozzles. Each of the third discharge nozzles discharges a processing liquid toward a lower tapered surface of a groove of a V-shaped cross-sectional configuration formed in a side wall of an inner bath. This forms relatively low-speed liquid flows within the inner bath. The processing unit further includes plate-like members. The plate-like members block upward ones of the liquid flows discharged from the third discharge nozzles and impinging upon the lower tapered surfaces of the inner bath. This achieves the efficient replacement of the processing liquid without disturbing upward flows of the processing liquid within the inner bath. Thus, the processing liquid stored in the processing bath is efficiently replaced with another processing liquid without disturbing the upward flows of the processing liquid within the processing bath.

Abstract: A method and system for cleaning opposed surfaces of a semiconductor wafer having particulate matter thereon. The method includes generating relative movement between a fluid and the substrate. The relative movement is in a direction that is transverse to a normal to one of the opposed surfaces and creates two spaced-apart flows. Each of the flows is adjacent to one of the opposed surfaces that is different from the opposed surface that is adjacent to the remaining flow of the plurality of flows. The fluid has coupling elements entrained therein, and the relative movement is established to impart sufficient drag upon a subset of the coupling elements to create movement of the coupling elements of the subset within the fluid. In this manner, a quantity of the drag is imparted upon the particulate matter to cause the particulate matter to move with respect to the substrate.

Abstract: The present invention relates to a method of removing chewing gum and residues thereof from substrates using chewing gum modifying compositions comprising oxidising reagents and one or more oxidation catalysts.

Abstract: Disclosed are a liquid processing apparatus and a liquid processing method. The liquid processing apparatus includes an ejection port ejecting a first liquid to a wafer, a first liquid supply mechanism supplying sulphuric acid to the ejection port, and a second liquid supply mechanism supplying hydrogen peroxide solution to the ejection port. The first liquid supply mechanism includes a first temperature adjustment mechanism maintaining the first liquid heated to a first temperature, a second temperature adjustment mechanism connected to the first temperature adjustment mechanism, and an ejection line connecting the second temperature adjustment mechanism with the ejection port. The second temperature adjustment mechanism includes a second circulation line and a second heater. The ejection line connects the second circulation line through a switching valve at a location further downstream than the second heater.

Abstract: A solar panel configured to reduce contaminant accumulation thereon, including a surface adapted to harvest solar energy; and a vortex-inducing generator including chevron-shaped features disposed across at least a portion of the surface to reduce contaminant accumulation thereon by causing air flow passing over the surface to remove at least some contaminants deposited thereon and/or keeping particles entrained in the air flow to reduce deposition on the surface. A method of passively cleaning a solar panel includes providing the solar panel, and positioning the solar panel such that the leading edge is oriented to intercept a prevailing wind direction. A solar array includes a plurality of the solar panels, wherein each solar panel is positioned such that the leading edge is oriented to intercept a prevailing wind direction.

Abstract: A lens washing system for cleaning the objective lens of a surgical telescopic instrument while the instrument is disposed within the body of a patient, wherein the system includes a hollow tubular sleeve disposable over a probe of a surgical telescopic instrument such that a distal end of the probe including an objective lens of the surgical telescopic instrument extends past a distal end of the sleeve. The system additionally includes a hollow tubular washing fluid conduit linearly and tangentially disposed along a longitudinal portion of an exterior surface of the sleeve such that a distal end of the conduit including a washing fluid egress port extends past the distal end and objective lens of the probe so that washing fluid dispensed from the egress port is directed onto the objective lens to wash away any debris or media obscuring the objective lens.

Abstract: A biofilm-removing agent which effectively removes biofilms is provided. A biofilm-removing agent containing a basic amino acid derivative represented by the following formula (1) or a salt thereof: (wherein R1 represents a linear- or branched-alkyl group having 4 to 18 carbon atoms or a linear- or branched-alkenyl group having 4 to 18 carbon atoms; X and Y each represent a group selected from the groups represented by the following formulas: and m represents an integer from 1 to 5).

Abstract: A cleaning system and method for cleaning heat transfer surfaces in a boiler using a temperature measuring system for measuring and monitoring wall temperature of an annular wall of the tube of a lance of one or more sootblowers. Controlling a flow of steam or other fluid through the tube during the cooling portions of the strokes based on wall temperature measurements from the temperature measuring system. Infrared or thermocouple temperature measuring systems may be used. The steam or other fluid may be flowed at a default flowrate that may be substantially zero until the temperature measuring system indicates the wall temperature of the annular wall begins to exceed a predetermined temperature limit which may be the softening point of the annular wall. Then the steam or other fluid is flowed at a rate greater than the default flowrate.

Abstract: A method for cleaning a semiconductor wafer composed of silicon directly after a process of chemical mechanical polishing of the semiconductor wafer includes transferring the semiconductor wafer from a polishing plate to a first cleaning module and spraying both side surfaces of the semiconductor wafer with water at a pressure no greater than 1000 Pa at least once while transferring the semiconductor wafer. The semiconductor wafer is then cleaned between rotating rollers with water. The side surfaces of the semiconductor wafer are sprayed with an aqueous solution containing hydrogen fluoride and a surfactant at a pressure no greater than 70,000 Pa. Subsequently, the side surfaces are sprayed with water at a pressure no greater than 20,000 Pa. The wafer is then dipped into an aqueous alkaline cleaning solution, and then cleaned between rotating rollers with a supply of water. The semiconductor wafer is then sprayed with water and dried.

Abstract: A system for cleaning and maintaining a vault includes a vault that may have equipment submerged in water. The vault includes a floor, at least one wall, and a cover that collectively define a vault interior. In some versions there is contaminated water in the vault that is at least one foot above the lowest point on the vault floor. In some versions, the water may be 12 to 14 feet above the lowest point on the floor. A portion of the floor may slope toward a vacuum head that is indirectly coupled with a source of suction. In some versions, at least the vault floor is lined with a liner that has a low coefficient of friction and is corrosive resistant. The source of suction may be a vacuum hose of a vacuum truck.

Abstract: Cleaning compositions containing a corrosion inhibitor are provided for removing soil from carpets, upholstery and the like without subjecting common metal alloys used in aircraft and other constructions to corrosive attack. Cleaning compositions include at least one dispersing agent, at least one anti-redeposition agent, at least one corrosion inhibitor, at least one pH modifier, at least one chelating agent and at least one stabilizing agent. The compositions also optionally include at least one fragrance and/or at least one preservative agent. Methods for making and using the cleaning compositions are also described.

Abstract: A vacuum processing apparatus includes a vacuum chamber for performing a plasma process and a cleaning process unit for performing a cleaning process to apply a plasma process to a wafer on which a single layer or a laminated film containing a metallic film is formed by using a corrosive gas, and a control unit having a sequence to abort the plasma process when an abnormality occurs in the vacuum chamber and transfer the wafer subjecting to the aborting of the plasma process to the cleaning process unit, after elapsing a predetermined time, to perform the cleaning process.

Abstract: A cleaning device for a component loaded with lint in a household appliance for laundry care. The cleaning device includes a rinsing unit to guide rinsing fluid to the component to remove the lint. The rinsing unit has a flow element disposed above the component, and the flow element builds up a dynamic pressure of the rinsing fluid in the flow element.

Abstract: In order to provide a device for generating a pulsed jet of a liquid fluid comprising a fluid inlet, a fluid outlet and a blocking element arranged between the fluid inlet and the fluid outlet, which cyclically closes and opens a fluid passage between the fluid inlet and the fluid outlet, which device enables an improved mechanical action on an object subjected to the pulsed jet, it is proposed that the device comprises at least one bypass, through which a liquid fluid can also be fed to the fluid outlet during a closing phase of the blocking element.

Abstract: Embodiments of the present invention generally relate to a method and apparatus for ex-situ cleaning of a chamber component part. In one embodiment, a system for cleaning component parts in a cleaning chemistry is provided. The system comprises a wet bench set-up comprising a cleaning vessel assembly for holding one or more component parts to be cleaned during a cleaning process and a detachable cleaning cart detachably coupled with the cleaning vessel assembly for supplying one or more cleaning chemistries to the cleaning vessel assembly during the cleaning process.

Abstract: According to one embodiment, a supercritical drying method comprises cleaning a semiconductor substrate with a chemical solution, rinsing the semiconductor substrate with pure water after the cleaning, changing a liquid covering a surface of the semiconductor substrate from the pure water to alcohol by supplying the alcohol to the surface after the rinsing, guiding the semiconductor substrate having the surface wetted with the alcohol into a chamber, discharging oxygen from the chamber by supplying an inert gas into the chamber, putting the alcohol into a supercritical state by increasing temperature in the chamber to a critical temperature of the alcohol or higher after the discharge of the oxygen, and discharging the alcohol from the chamber by lowering pressure in the chamber and changing the alcohol from the supercritical state to a gaseous state. The chamber contains SUS. An inner wall face of the chamber is subjected to electrolytic polishing.

Abstract: A cleaning system for a photomask unit is disclosed. The photomask unit defines an inner chamber and includes a photomask, a pellicle frame, a diaphragm-like pellicle film, and a ventilation port. The cleaning system includes: a housing defining an outer chamber; and a reduced-pressure generating unit disposed to intermittently generate a reduced-pressure zone in the outer chamber and in proximity to the photomask unit such that a pressure differential is generated between the inner chamber and the reduced-pressure zone to cause a central film portion of the diaphragm-like pellicle film to move toward or away from a central pattern region of the photomask so as to permit the cleaning gas to flow out of or into the ventilation port alternately.

Abstract: The invention relates to a method for cleaning an outer surface (1) arranged at the bottom of a tank (3), a vessel or similar, said method comprising the steps of: generating and supplying a pressurized cleaning fluid by means of a production source (2) of pressurized cleaning fluid, the fluid pressure being between 3 and 12 bar; conveying the cleaning fluid opposite the said outer surface (1) of the tank (3) by circulating the fluid in a pipe network (4) arranged below the tank (3); cleaning the outer surface (1) of the tank (3) by means of a plurality of rotating jets of cleaning fluid, the said plurality of jets being generated by at least one multi-jet rotating head (10) connected to the pipe network (4), wherein conveying of the cleaning fluid is realized by the pipe network (4) forming a closed loop (5) arranged below and near the centre (6) of the outer surface (1) of the tank (3), the said closed loop (5) being supplied with cleaning fluid by a feed pipe (7) connected to the said production source (2)

Abstract: The present invention relates to an installation for cleaning and/or degreasing manufactured parts. The installation applicator includes a first outlet nozzle connected to a device for producing vapor in order to produce a central jet consisting of the pressurized water vapor and a second outlet nozzle surrounding the first nozzle. The second nozzle is connected to a device for producing pressurized air in order to produce a peripheral jet consisting of the pressurized air. The nozzles form a composite treatment jet made of the central jet of pressurized water vapor and the peripheral jet of pressurized air with the peripheral jet surrounding the central jet.

Abstract: A process is provided for removing polymeric fouling on process equipment surfaces to restore the efficiency of such equipment. This is accomplished by contacting the fouled equipment with a solvent comprising at least one non-aromatic hydrocarbon compound, or a mixture of one or more non-aromatic organic compounds and one or more aromatic hydrocarbon compounds, for a period of time sufficient to remove the polymeric fouling.

Abstract: A system for removing paint and other coatings from hard surfaces is mounted on a truck for over-the-road travel. The truck bed carries a high power vacuum pump, a self propelled tractor with an attached blast head, a liquid reservoir, a sump or vacuum tank, and a ramp for loading the tractor. The reservoir is connected to a low pressure pump that transfers water to the high pressure pump. The high pressure pump is connected to the blast head by a high pressure hose. A vacuum hose is connected to the sump which has an internal enclosure for separating the waste materials from the liquid for easy dumping of semi dried materials.

Abstract: The present invention, in a preferred embodiment, is a photoresist stripper formulation, comprising: Hydroxylamine ; Water; a solvent selected from the group consisting of dimethylsulfoxide; N-methylpyrrrolidine; dimethylacetamide; dipropylene glycol monomethyl ether; monoethanolamine and mixtures thereof; a base selected from the group consisting of choline hydroxide, monoethanolamine, tetramethylammonium hydroxide; aminoethylethanolamine and mixtures thereof; a metal corrosion inhibitor selected from the group consisting of catechol, gallic acid, lactic acid, benzotriazole and mixtures thereof; and a bath life extending agent selected from the group consisting of glycerine, propylene glycol and mixtures thereof. The present invention is also a method for using formulations as exemplified in the preferred embodiment.

Abstract: A top plate 32 is provided with a top plate rotation mechanism configured to rotate the top plate 32 in a horizontal plane. An outside cup peripheral case 50 disposed around a cup 40 is configured to move between an upper position, in which a top end of the cylinder 50 is positioned above the cup 40, and a lower position located below the upper position. A nozzle support arm 82 configured to support a nozzle 82a is moved, in a horizontal direction, between an advanced position, in which the arm 82 is advanced into the outside cup peripheral case 50 via a side opening 50m formed in a side surface of the outside cup peripheral case 50 when the cylinder 50 is located in the upper position, and a retracted position, in which the arm 82 is retracted outward from the outside cup peripheral case 50.

Abstract: To provide an ultrasonic cleaning apparatus and an ultrasonic cleaning method capable of suppressing generation of cleaning unevenness after the ultrasonic cleaning of an object to be cleaned. An aspect of the present invention includes a cleaning tank 21 in which a cleaning liquid 23 is stored; a first and a second ultrasonic transducers 34a and 34b that give ultrasonic vibrations to the object to be cleaned 22 immersed in a cleaning liquid within the cleaning tank; a first ultrasonic generator 36 that applies a high-frequency output to the first ultrasonic transducer; a second ultrasonic generator 37 that applies a high-frequency output to the second ultrasonic transducer; and a controller 38 that varies and controls at least one of the outputs of the first and the second ultrasonic generators, and a first ultrasonic wave oscillated from the first ultrasonic transducer is caused to interfere with a second ultrasonic wave oscillated from the second ultrasonic transducer.

Abstract: A method and apparatus for providing multiple spray zones to different subportions of a silverware basket within the wash chamber of a dishwasher.

Abstract: A drainer basket assembling structure of a stepping wringer bucket includes a bucket body, having a containing space concavely formed at the bottom of a front side, a shaft base formed at the top of the containing space; a base, having two support stands installed in the containing space; a driving mechanism installed between the two support stands for producing a driving force; a transmission shaft installed in the containing space and whose bottom is driven by the driving mechanism; and a drainer basket driven by the transmission shaft. An upper end of the transmission shaft is protruded out from the shaft base, and a protruding end is provided for sheathing the coupling base of the drainer basket and form a sheathing and linking structure with the protruding end of the transmission shaft, such that the drainer basket can be assembled from the top of the bucket body.

Abstract: This invention relates to cleaning compositions comprising unsaturated fluorinated hydrocarbons. The invention further relates to use of said cleaning compositions in methods to clean, degrease, deflux, dewater, and deposit fluorolubricant. The invention further relates to novel unsaturated fluorinated hydrocarbons and their use as cleaning compositions and in the methods listed above.

Abstract: A method and an installation for high-pressure liquid jet deburring are proposed, in which a machined workpiece (44) is deburred by means of a high-pressure/high-speed liquid jet from a high-pressure jet nozzle (30) that is connected to a high-pressure liquid circuit (32). According to the invention, the deburring receptacle (16) has a flooding inlet (48) connected to a liquid supply circuit for flooding the deburring receptacle (16) with cleaning liquid and is configured to contain a bath (46) of cleaning liquid during operation. Prior to deburring, the deburring receptacle (16) is flooded with cleaning liquid via a flooding inlet (48) of the deburring receptacle. Further according to the invention, the machined portion (44) is deburred after flooding and by means of a liquid jet without gas sheath such that the high-pressure/high-speed liquid jet and at least the machined portion are immersed in a bath of cleaning liquid during deburring.

Abstract: A cleaning method of cleaning a joint surface of a processing target substrate separated from a superposed substrate, while the processing target substrate is placed inside an annular frame and held by a tape bonded to a surface of the frame and a non-joint surface of the processing target substrate, the cleaning method including: a placement step of placing a cleaning jig to face the processing target substrate such that a supply surface of the cleaning jig for supplying a solvent for the adhesive onto the joint surface of the processing target substrate covers the joint surface and a distance between the supply surface and the joint surface is a predetermined distance; and a cleaning step of then supplying the solvent between the supply surface and the joint surface and diffusing the supplied solvent over the joint surface by a surface tension.

Abstract: The present invention discloses a method of washing ware, in particular in an automatic domestic or institutional ware washing machine, using a detergent composition containing a cationic starch. This eliminates the need for a surfactant in the rinse step. The cationic starch provides a layer of cationic starch on the ware so as to afford a sheeting action in an aqueous rinse step without any added rinse agent.

Abstract: A hand-washing system for washing fingernail beds and cuticular regions of human fingers and thumbs (collectively “digits”). The hand-washing system includes a work enclosure for containing ones of the digits and a high-velocity, high-flow water spray during a washing operation. The work enclosure defines an interior space, part of which defines an energy-dissipation region that, during use, provides a water reservoir for dissipating energy in the high-velocity, high flow water spray. The work enclosure includes a high-energy spray nozzle and a digit portal sized to receive the four fingers of one hand simultaneously in closed-fingered, upwardly-curled configuration. A mixing valve may be provided to allow a user to adjust the temperature of the water during washing. A quick-disconnect fluid-coupling assembly may also be provided and be used to quickly select between work enclosures of differing size.

Abstract: A cleaning apparatus for cleaning a hair-cutting portion of an electric hair-cutting device includes a cleaning-liquid basin for receiving the hair-cutting portion of the electric hair-cutting device in a central area such that the hair-cutting portion is at least partially immersed in the cleaning liquid. The electric hair-cutting device is cleaned by generating a cleaning-liquid flow revolving within the basin around the central area of the basin, the hair-cutting portion being at least partially immersed in the cleaning liquid. The liquid flow effectively entrains debris away from the hair-cutting portion.

Abstract: A column-type solid-liquid countercurrent contact apparatus, a washing apparatus for solid particles such as poly(arylene sulfide) (PAS) particles, a PAS manufacturing apparatus, a method of solid-liquid countercurrent contact, a method of washing solid particles such as PAS particles, and a method of manufacturing PAS, wherein a column top part, a column body part, and a column bottom part are included, the column body part is provided with a plurality of stirring chambers connected in the vertical direction and mutually divided by a ring-shaped partitioning plate, a paddle blade (a blade diameter/a diameter of the stirring chamber?0.65 and the blade diameter/the diameter of the stirring chamber?0.10) and a baffle are disposed at each of the plurality of stirring chambers, and a disc having a size covering at least a part of a communication opening positioned below the paddle blade is attached to a rotating shaft or to the paddle blade.

Abstract: A method for separating an oil-substance mixture includes communicating the oil-substance mixture into a first separator tank to separate the oil from the substance, and communicating a remaining portion of the oil-substance mixture into a second separator tank to separate the oil from the substance of the remaining portion.

Abstract: The invention provides a heat transfer composition comprising R-1234ze(E), R-32 and 1,1,1,2-tetrafluoroethane (R-134a).

Abstract: There is provided a vacuum degreasing and cleaning apparatus, including a cleaning chamber having an injector and a sprayer that eject a solvent to an object to be cleaned, a plurality of storage tanks that store the solvent, a distiller that distills the solvent in the storage tank, and a replenisher tank that stores the solvent distilled by the distiller, wherein a heating means is provided in the inside of the sprayer in a nesting way. There is also provided a vacuum degreasing and cleaning method using the aforementioned vacuum degreasing and cleaning apparatus, wherein the solvent is pressurized and supplied to the inside of the sprayer, heated to a temperature not lower than a saturation temperature in the cleaning chamber under a reduced pressure, and thereafter sprayed in the cleaning chamber under the reduced pressure.

Abstract: Processes for enhancing solubility and the reaction rates in supercritical fluids are provided. In preferred embodiments, such processes provide for the uniform and precise deposition of metal-containing films on semiconductor substrates as well as the uniform and precise removal of materials from such substrates. In one embodiment, the process includes, providing a supercritical fluid containing at least one reactant, the supercritical fluid being maintained at above its critical point, exposing at least a portion of the surface of the semiconductor substrate to the supercritical fluid, applying acoustic energy, and reacting the at least one reactant to cause a change in at least a portion of the surface of the semiconductor substrate.

Abstract: The present invention discloses an improved cleaning composition for cleaning metal surfaces such as aluminum and aluminum-containing alloys. The cleaning composition of the present invention comprises water and an ethoxylate of an alcohol having Formula R1—OH wherein R1 is a saturated or unsaturated, straight-chain or branched aliphatic having from 12 to 80 carbon atoms; an inorganic pH adjusting component; and at least one surfactant that is different than the ethoxylate set forth above. The cleaning composition of the present invention also has an average water-break-free percent reduction of less than 50% after 7 days aging of a working composition prepared from the cleaning composition. The present invention also provides a method of cleaning a metal surface with the cleaning composition of the invention.

Abstract: A spraying apparatus for simultaneously dislodging insects from a plant's leaves and cleaning the plant includes a tubular handle portion having a bend point and being connected to a substantially straight tubular main body portion. A nozzle portion at a distal end of the main body is adapted to create a substantially planar wall of water around the nozzle portion when the apparatus is connected to a source of water under pressure. In operation, a user holds the handle so that the main body is substantially horizontal and advances the nozzle into and out of the plant at a plurality of locations. The wall of water is directed in all directions and dislodges insects from the top and bottom sides of infested leaves. Additionally, the wall of water dislodges dirt and insect waste and directs it downwardly off of the plant with the flowing wall of water. The bent handle enables the user to treat the plant at varying locations without excessive bending and craning.

Abstract: A method of operating a dishwasher having a treating chamber for washing utensils for removing wash liquid with soil particles from the treating chamber and storing a portion of the removed wash liquid for subsequent use.

Abstract: An automatic coin—or electronic card—operated washing machine and dryer for helmets, which operates as an automatic and autonomous vending service machine and combines the quick and effective washing of a helmet with the protection of its parts and units and comprises a body (1), where the washing chamber (2) is located. The washing chamber (2), where all cleaning operations of the helmet take place, is supplied with a waterproof gate (17) which is connected thereto. The washing chamber (2) is connected to the brush and spraying mechanism, the wring mechanism (11) and the drying mechanism. The invented washing machine is connected to the water supply through a pipe (4), a water discharge pipe (3) the operation thereof is electronically controlled by an operation control system (14) which is connected to a main server (via a modem).