Abstract: In order to provide a device for generating a pulsed jet of a liquid fluid comprising a fluid inlet, a fluid outlet and a blocking element arranged between the fluid inlet and the fluid outlet, which cyclically closes and opens a fluid passage between the fluid inlet and the fluid outlet, which device enables an improved mechanical action on an object subjected to the pulsed jet, it is proposed that the device comprises at least one bypass, through which a liquid fluid can also be fed to the fluid outlet during a closing phase of the blocking element.

Abstract: A method of performing a cleaning operation with an autoclavable bucketless cleaning system is disclosed.

Abstract: A method of using a rendering trailer, the rendering trailer including a dump box or trailer body with a center gate dividing the interior chamber of the trailer body into forward and rearward compartments, from which dead animal parts may be respectively dumped in different locations. A doorway is formed in the center gate to allow a person to walk therethrough to facilitate washing the forward and rearward compartments. A rigid door is mounted on the center gate to open and close the doorway. Opening the door allows the person to walk through the doorway and wash the compartments. A hose may be draped over a sidewall of the trailer and pulled through the doorway to spray the forward compartment. Perforated panels may be mounted along lower ends of left and right side walls of the trailer body to allow water and other fluids to drain therethrough.

Abstract: A scrub brush housing a swab of foam material impregnated with an anti bacterial disinfectant is first placed over a female luer with an annular portion of the swab compressed against the luer and a central portion of the swab passed into the passage of the luer to effect a full contact with the surfaces of the swab. The swab is then rotated on the female luer for a time sufficient to substantially remove the biofilm on the surfaces of the luer that are contacted by the swab.

Abstract: A wafer cleaning device comprising a wafer stage for holding a wafer having a surface to be washed, a first nozzle positioned above the wafer, a second nozzle positioned above the wafer. A first height is between the first nozzle and the surface and a second height is between the second nozzle and the surface, wherein the first height is shorter than the second height.

Abstract: A complete sanitary system for any toilet site area which allows for the utilization of pressurized domestic running water transferred through a hose connected to a water valve diverting structure further connected to the main toilet domestic water feed line to that particular toilet's water closet. A floor structure with the aforementioned toilet mounted to its top surface side provides the structure to collect, retain and drain the spent waste water from the hose after the water has been used to cleanse the toilet site area. An alternative drainage location in the retention basin of the floor structure with coinciding plumbing piping method allows for a possible solid waste contamination scenario by an overflow toilet or otherwise to be effectively transferred directly into the main sewer pipe.

Abstract: The wet treatment of wafer-shaped articles is improved by utilizing a droplet generator designed to produce a spray of monodisperse droplets. The droplet generator is mounted above a spin chuck, and is moved across a major surface of the wafer-shaped article in a linear or arcuate path. The droplet generator includes a transducer acoustically coupled to its body such that sonic energy reaches a region of the body surrounding the discharge orifices. Each orifice has a width w of at least 1 ?m and at most 200 ?m and a height h such that a ratio of h to w is not greater than 1.

Abstract: In one aspect, a method of cleaning an electronic device manufacturing process chamber part is provided, including a) spraying the part with an acid; b) spraying the part with DI water; and c) treating the part with potassium hydroxide. Other aspects are provided.

Abstract: A process for cleaning a compound semiconductor wafer; the compound semiconductor wafer comprises, taking gallium arsenide (GaAs) as a representative, a group III-V compound semiconductor wafer. The process comprises the following steps: 1) treating the wafer with a mixture of dilute ammonia, hydrogen peroxide and water at a temperature not higher than 20° C.; 2) washing the wafer with deionized water; 3) treating the wafer with an oxidant; 4) washing the wafer with deionized water; 5) treating the wafer with a dilute acid solution or a dilute alkali solution; 6) washing the wafer with deionized water; and 7) drying the resulting wafer. The process can improve the cleanliness, micro-roughness and uniformity of the wafer surface.

Abstract: A produce washer and method of washing produce or other items in a continuous motion washing machine is provided. The produce washer includes a basket, or other collector, that is positioned within a portion of the fluid flow path and sized and shaped to intercept items from a the fluid flow path while at the same time allowing the fluid to continue to flow through a perforated wall in the collector generally in the same circulatory flow path created by the washing machine. The method includes placing items within the wash tank; creating a fluid flow within the wash tank; intercepting one or more of the items from the fluid flow path by the collector; and allowing the fluid to continue flow through the perforated wall in the collector.

Abstract: An apparatus and process for isomerizing a hydrocarbon stream rich in a C4 hydrocarbon and/or at least one of a C5 and C6 hydrocarbon which includes a first drier and a second drier; and a reaction zone communicating with at least the first drier. The first drier operates at a first condition to dry the reactant and the second drier operates at a second condition during regeneration. The used regenerant remaining in the second drier after regeneration can (1) pass through a vent-to-flare assembly in a batch-wise manner; (2) pass through a downflow-depressure-to-low-pressure-device assembly in a batch-wise manner; (3) pass through a cross-over piping purge assembly to minimize upsets in the reaction and fractionation zones when the second drier is placed back in operation; or any combination of (1) (2) and/or (3) to minimize upsets in the reaction and fractionation zones when the second drier is placed back in operation.

Abstract: The present invention is in the field of household cleaning tools. The invention further relates to the use of an air-water jet for the cleaning of hardsurfaces. It is an object of the present invention to provide easier cleaning of hard surfaces. It is therefore an object of the present invention to provide a process of easier cleaning of hard surfaces, especially by means of a device that uses a relatively low water flow rate. Surprisingly it has been found that an external mix air-water jet device may be used for cleaning hard surfaces.

Abstract: A cyclic bubble generation and termination process can be used to effectively clean objects in a liquid. The bubbles can be generated from dissolved gas in the liquid during a pressurizing phase of the cyclic bubble process. Alternatively, the bubbles can be generated from as a by-product in a chemical reaction between chemicals in the liquid and material or chemicals at the surface of a part being processed. A vacuum process or a hyperbaric process can be used for cycling the pressure.

Abstract: A system for cleaning gas turbine engines is described. More specifically, methods and apparatuses for cleaning stationary gas turbines and on-wing turbofan engines found on aircraft are disclosed that includes a trailer-mounted, automated low-pressure water delivery system, additive and detergent injection system, nozzle and manifold technology, and active waste water effluent collector system. The system will deliver the liquid cleaning medium at a specific pressure, temperature, and flow rate to optimize the atomization that occurs at the nozzles.

Abstract: A washing machine and a method of controlling the washing machine may be provided. The washing machine may include a drum in which laundry are provided and rotated. A laundry amount may be sensed. The drum may operate at a first speed so that a part of the laundry tumbles within the drum and another part of the laundry adheres to the drum or the drum operates at a second speed so that the laundry adheres to the drum according to the sensed laundry amount. Accordingly, at a time of a dehydration cycle, stability of the washing machine and a laundry balancing can be ensured.

Abstract: When a dry cleaning process is performed in a processing chamber by adding nitrogen monoxide (NO) gas to a cleaning gas, the handling is facilitated, and cleaning performance is improved. A substrate processing apparatus includes a processing vessel configured to process a substrate, a first cleaning gas supply system configured to pre-mix a gas containing fluorine atoms with the NO gas and supply the pre-mixed gas into the processing vessel, and a second cleaning gas supply system installed apart from the first cleaning gas supply system and configured to supply the fluorine-containing gas into the processing vessel.

Abstract: Disclosed herein is a composition and method for semiconductor processing. In one embodiment, a wet-cleaning composition for removal of photoresist is provided. The composition comprises a strong base; an oxidant; and a polar solvent. In another embodiment, a method for removing photoresist is provided. The method comprises the steps of applying a wet-cleaning composition comprising about 0.1 to about 30 weight percent strong base; about one to about 30 weight percent oxidant; about 20 to about 95 weight percent polar solvent; and removing the photoresist.

Abstract: A vehicle washing system associated with a bay in which a vehicle is parked during the washing operation is equipped with a centering target which can be selectively deployed upon entry of a vehicle to assist the driver in placing the vehicle in the bay. The target may be provided by a vertically-depending spray arm having internal LEDs which are illuminated during vehicle entry and during the washing program. Several alternative target and lighting arrangements are described.

Abstract: In a cleaning method, a substrate having a pattern formed on the surface thereof can be cleaned by using a cleaning fluid, while preventing the pattern protrusions from being flattened when the cleaning fluid is removed or dried. The cleaning method includes the steps of: loading a substrate onto a loading platform inside a processing chamber; heating the substrate; and supplying a cleaning fluid onto the surface of the substrate. The substrate is heated in the substrate heating step so that the Leidenfrost phenomenon occurs and steam of the cleaning fluid is interposed between the substrate and droplets of the cleaning fluid supplied to the substrate in the cleaning fluid supply step.

Abstract: A method for treating a semiconductor device includes dissolving an inert gas species in a wet chemical cleaning solution and treating a material layer of a semiconductor device with the wet chemical cleaning solution in ambient atmosphere. The inert gas species is oversaturated in the wet chemical cleaning solution in the ambient atmosphere.

Abstract: A method of cleaning a submerged surface covered by a liquid medium includes injecting a cleaning liquid with a submerged fluid jet through the liquid medium at the submerged surface. The method may also include introducing at least one of a non-reactive gas and a reactive gas with the cleaning liquid through the submerged fluid jet.

Abstract: A method of simultaneously cleaning and disinfecting an industrial water system is described and claimed. The method involves the addition to the water of the industrial water system of a Compound selected from the group consisting of the alkali salts of chlorite and chlorate and mixtures thereof; and an acid, followed by allowing the water in the industrial water system to circulate for several hours. The reaction of the alkali salts of chlorite and chlorate and acid produces chlorine dioxide in-situ in the water of the industrial water system. The chlorine dioxide kills microorganisms and the acid acts to remove deposits upon the water-contact surfaces of the equipment. This cleaning and disinfecting method works in a variety of industrial water systems including cooling water systems.

Abstract: The present invention provides methods of removing liquid from a barrier structure in the context of treating microelectronic workpieces with one or more treatment materials, including liquids, gases, fluidized solids, dispersions, combinations of these, and the like.

Abstract: The embodiments describe methods for controlling the particles generated when cleaning and drying a wafer in a spin rinse dryer (SRD) module. In some embodiments, the substrate surface is cooled by dispensing deionized (DI) water across the surface of the substrate, while the substrate rests on the SRD chuck. In addition, a method for controlling the particles generated when sleeves in a processing module or SRD contact a substrate surface during a clamping operation or when the sleeves are removed from the substrate surface is provided. A bottom edge or lip of the sleeves and/or the surface of the wafer contacting the sleeve is wetted during clamping/unclamping operations. Alternatively, the substrate may be wetted prior to clamping/unclamping operations.

Abstract: A method for cleaning turbines on-line comprises extracting water from air directly at a turbine site having a turbine and treating the air and the extracted water to obtain extremely clean water having a conductivity of less than 3 microsiemens/cm. This extremely clean water is then fed to the turbine to clean the turbine blades while the turbine is on-line. Preferably the extremely clean water is fed through a deionizer before being fed to the turbine.

Abstract: The invention comprises a method of cleaning a kitchenware article, the method comprising a pre-treatment step in which a pre-cleaning composition is applied to the kitchenware article; and a dishwashing step in which the kitchenware article is washed in a dishwashing machine using a dishwashing composition; characterised in that the pre-cleaning composition is ejected from a pressurised aerosol canister and provides a cleaning foam on the surface of the kitchenware article.

Abstract: Embodiments of the current invention describe cleaning solutions to clean the surface of a photomask, methods of cleaning the photomask using at least one of the cleaning solutions, and combinatorial methods of formulating the cleaning solutions. The cleaning solutions are formulated to preserve the optical properties of the photomask, and in particular, of a phase-shifting photomask.

Abstract: The invention comprises a method of carrying out machine dishwashing, using a cleaning composition, the method comprising delivery of the cleaning composition into the machine, characterised in that the cleaning composition is delivered to the machine from a pressurised aerosol canister as a foam or as a foam precursor which forms foam before the machine is operated.

Abstract: A method for treating substrates with treating liquids, using a treating tank for storing the treating liquids, a holding mechanism for holding the substrates in a treating position inside the treating tank, first and second treating liquid supply devices, a temperature control device, and a control device. A first treating liquid is supplied into the treating tank, then a second treating liquid of lower surface tension and higher boiling point than the first treating liquid is supplied, and placed in a temperature range above the boiling point of the first treating liquid and below the boiling point of the second treating liquid. Then the second treating liquid supply device may be controlled to replace the first treating liquid with the second treating liquid, while controlling the temperature control device to maintain the second treating liquid in the same temperature range.

Abstract: A system and method for removing polymer residue from around a metal gate structure formed on a surface of a substrate during a post-etch cleaning operation includes determining a plurality of process parameters associated with the metal gate structure and the polymer residue to be removed. A plurality of fabrication layers define the metal gate structure and the process parameters define characteristics of the fabrication layers and the polymer residue. A first cleaning chemistry and second cleaning chemistry are identified and a plurality of application parameters associated with the first and second cleaning chemistries are defined based on the process parameters. The first and second application chemistries are applied sequentially in a controlled manner using the application parameters to substantial remove the polymer residue while preserving the structural integrity of the gate structure.

Abstract: A mobile washing apparatus is disclosed. The mobile washing apparatus can include a mobile chassis having a plurality of wheels, a first spray head assembly, and a first adjustable support structure. The first spray head assembly may have a first spray head having a top plate and a side skirt. The top plate and side skirt can together define an interior space. A first rotating sprayer wand may be located within the interior space of the first spray head. The first adjustable support structure supports the first spray head assembly from the mobile chassis. The first adjustable support structure can be configured such that the first spray head assembly is positionable in a horizontal direction and positionable in a vertical direction. The first spray head also defines a face angle and the first adjustable support structure is configured such that the face angle of the first spray head is adjustable.

Abstract: An apparatus for cleaning a surface, such as the surface of a rotating disk, the apparatus comprising an articulating arm associated via a linkage to a rotating member driven by a motor. Rotation of the rotating member causes linkage to move the articulating arm in an oscillating pattern. A nozzle associated with the distal end of the articulating arm can convey pressurized air or liquid from a source to a surface in an oscillating pattern based on the construction of the arm, linkage, the rotating member and the speed of rotation.

Abstract: A method of cleaning an automatic biochemical analyzer, wherein the cleaning solution includes: at least one anionic surfactant, at least one nonionic surfactant, an alkali metal hydroxide, an alkali metal citrate, and a buffering agent stabilizing the pH value above 13.0. In some embodiments, the cleaning solution provides low residual rate of proteins, low residual rate of lipids, desirable within-batch repeatability in clinical testing, low level of cross-contamination, and low level of reactant deposit after cleaning, without affecting test results of the biochemical analyzer. In some embodiments, the cleaning solution has no corrosive effects on the liquid path and reaction cup of the analyzer. The ingredients of the cleaning solution may also be biodegradable.

Abstract: A method and system for cleaning a substrate in a multi-module cleaning assembly is provided. The method begins by receiving the substrate into the cleaning module. A cleaning chemistry, at a temperature elevated from an ambient temperature, is applied onto a top surface of the substrate. Concurrent with application of the cleaning chemistry, vapors are exhausted from the cleaning chemistry through a port located below a bottom surface of the substrate with the vapor exhaustion providing a negative pressure relative to a pressure external to the cleaning module. The application of the cleaning chemistry is terminated, followed by termination of the exhausting of the vapors. The substrate is dried after the flowing of inert gas is terminated.

Abstract: An engine wash system includes a manifold to secure to a nose cone of an engine; a feeder pipe connecting to the manifold to deliver wash liquid to the manifold; a plurality of nozzles connected to the manifold to direct the wash liquid into the engine; a hook connected to the manifold to connect to a slot on the nose cone; and a guide connected to the feeder to align the manifold relative to the engine.

Abstract: An engine wash system for delivering wash liquid to an engine with a lift fan and a main engine, the lift fan including a plurality of inlet guide vanes and a nose cone, and the main engine connected to the lift fan by a shaft, the engine wash system includes a lift fan manifold to deliver wash liquid to the lift fan; and a main engine manifold to deliver wash liquid to the main engine, wherein the lift fan manifold and the main engine manifold can deliver the wash liquid simultaneously.

Abstract: A method for removing the edge bead from a substrate by applying an impinging stream of a medium that is not a solvent for the material to be removed. The medium is applied to the periphery of the substrate with sufficient force to remove the material. Also, an apparatus to perform the inventive method.

Abstract: Apparatus and related methods for continually measuring and dispensing precise amounts of bulk chemical in a car wash application. A gravimetric dispensing assembly can include a load cell and a syringe dosing pump that is suspended below the load cell such that an entire mass of the syringe dosing pump is communicated to the load cell. In this manner, the load cell can measure the actual mass of chemical being dispensed from the syringe dosing pump on a continuous basis without solely relying on the rated volumetric capacity of the syringe dosing pump. The syringe dosing pump can be driven by a stepper motor that can be pulsed as directed by a controller so as to maintain, increase or decrease an amount of bulk chemical being dispensed from the syringe dosing pump.

Abstract: Some demonstrative embodiments of the invention include an apparatus and a method for removing the support structures from three-dimensional objects, in which the support removal is carried out using techniques that decrease the duration of the support removal process and increase the quality of the final three-dimensional objects. This method also ensures the safe removal of the support structures without damage to the three-dimensional object.

Abstract: A plating apparatus includes: a plating bath configured to store a plating solution therein; a substrate transport device configured to remove a substrate before plating from a substrate cassette and return the substrate after plating to the substrate cassette; a substrate holder configured to detachably hold the substrate with a sealing member sealing a peripheral portion of the substrate and immerse the substrate in the plating solution in the plating bath; a dummy substrate arranged in a position accessible by the substrate transport device; and a substrate holder cleaning bath configured to immerse the substrate holder in a cleaning liquid to clean the substrate holder when holding the dummy substrate with the sealing member sealing a peripheral portion of the dummy substrate.

Abstract: A mobile cleaning device for cleaning parts of a burner is provided. The mobile cleaning device includes a closable pressure vessel, wherein a nozzle end of the burner is located inside the pressure vessel. An end of the burner, which is used for supplying fuel and is arranged opposite from the nozzle end, is located outside the pressure vessel. Further, a method for cleaning parts of the burner is provided.

Abstract: A self-propelled robotic cleaning apparatus for cleaning a submerged surface of a pool or tank includes a housing defining an interior chamber containing a filter assembly for filtering water flowing through at least one water inlet formed in the base plate. A filter backwash assembly is positioned within the interior chamber and has at least one fluid discharge outlet for providing a pressurized flow of a fluid towards the exterior surface of the filter assembly as a backwash to rinse and dislodge the debris therefrom.

Abstract: An apparatus is described for cleaning the exterior of a furnace heat exchanger that includes a bundle of finned convection or bare radiant tubes heated when in use by the flue gases of a heater furnace. The apparatus comprises a motorised carriage 10 guided for movement along the outer surface of the bundle in a direction parallel to the tubes and a holder 24 on the carriage for holding a lance 20 in a position relative to the carriage 10 that permits the lance 20 to penetrate between the tubes of the bundle and to be advanced along the core by the carriage while remaining in the latter position.

Abstract: A method that uses an L-?-dipalmitoleoyl-phosphatidylcholine (DPPC) surfactant based device that reacts with a substance in a known manner, to detect a substance of interest or to extract a substance of interest from a material is provided. The principles of the present invention are particularly useful in detecting/measuring a substance that is harmful to a human, and also to extracting NACL from saltwater.

Abstract: The present invention provides a liquid composition for removing dental cement from the surface of non-living objects, comprising i) an inorganic base; ii) a complexing agent; iii) optionally a surfactant; and iv) an aqueous solvent. In a preferred embodiment, the composition comprises a surfactant, and an aqueous solvent comprising water mixed with a polar solvent miscible with water, preferably alcohol. Said objects to be cleaned comprise workpieces and instruments used in restoration work. Said workpieces may comprise crowns, bridges, inlays, and other prostheses. Said instruments may, comprise, for example, tools used during the dental operation which contacted the cement.

Abstract: A clothes treatment appliance includes a transfer pipe leading to a water-cleanable unit of the clothes treatment appliance. The transfer pipe includes a water diverter that diverts part of the water exiting the transfer pipe in a sideway direction. A method for cleaning a water-cleanable unit of a clothes treatment appliance includes releasing water into a transfer pipe and diverting part of the water exiting the transfer pipe in a sideway direction.

Abstract: A method and a device are for cleaning drill cuttings comprising cuttings and oil-based drilling mud, wherein a significant proportion of the drilling mud is removed from the drill cuttings. The method comprises: disposing the drill cuttings in a receptacle; vibrating the receptacle until particle fluidization of the drill cuttings takes place; maintaining the drill cuttings in a particle-fluidized state during the subsequent treatment; adding a soap to the drill cuttings allowing, the soap to flow through the drill cuttings whilst the drill cuttings are particle-fluidized; draining liquid from the receptacle; and then emptying cleaned drill cuttings out of the receptacle.

Abstract: Nozzle apparatus and cleaning apparatus having such nozzle apparatus are disclosed. An example method for flood-washing a workpiece in a cleaning container includes providing of a cleaning container in which the workpiece is arranged and simultaneously impacting the workpiece using a first fluid stream and a second fluid stream. The first fluid stream being directed from a first nozzle chamber of a nozzle apparatus having a slit-shaped nozzle opening. The first fluid stream includes a liquid cleaning medium. The second fluid stream being directed from a second nozzle chamber of the nozzle apparatus. The second nozzle chamber fluidly coupled with the first nozzle chamber. The second fluid stream includes a liquid cleaning medium. The second fluid stream includes a jet direction which is warped at an acute angle or substantially perpendicular relative to the jet direction of the first fluid stream.

Abstract: Some embodiments herein generally relate to self-clean lenses, sensor systems, and/or methods of cleaning. In some embodiments, a self-cleaning lens is provided for a sensor for monitoring a liquid.

Abstract: A substrate processing apparatus includes a substrate holding unit holding a substrate, a cleaning liquid supplying unit supplying, to the substrate held by the substrate holding unit, a cleaning liquid containing a foaming agent that foams due to application of foaming energy, and a foaming energy supplying unit applying the foaming energy to the cleaning liquid in contact with the substrate held by the substrate holding unit.