Abstract: A method for cleaning a gassing manifold includes providing a gassing module and a complementary clean in place module for coupling to the gassing module. Cleaning solution is pumped from the clean in place module to the gassing module above a minimum flow rate and velocity for effective cleaning.

Abstract: In order to produce a particularly efficient device for deburring and/or cleaning a work piece that is dipped in a fluid medium comprising a fluid discharge device for producing a high pressure fluid jet, it is proposed that the device should comprise a gas discharge device for the production of a gas flow which at least partially envelops the fluid jet.

Abstract: A valve is closed while a cleaning liquid is fed into a tubular body of a cleaning nozzle, and a piezoelectric element applies vibrations to the cleaning liquid. This causes droplets of the cleaning liquid to be produced and discharged from a plurality of discharge holes. The droplet diameter of the discharged droplets is in the range from 15 to 200 ?m, and the distribution of the droplet diameter is such that the value of where a value of 3? does not exceed 10% of the average droplet diameter. The droplet speed is in the range from 20 to 100 meters per second, and the distribution of the droplet speed is such that the value of where a value of 3? does not exceed 10% of the average droplet speed. The droplet flow rate is not less than 10 milliliters per minute. Discharging the droplets of the cleaning liquid from the cleaning nozzle toward a substrate while satisfying these discharge conditions improves cleaning efficiency without damages to the substrate.

Abstract: A movable trash container cleaning system includes a vehicle with a spray booth and a movable access door for enclosing the spray booth. A manipulating arm is provided for engaging and lifting a container disposed outside a vehicle and inverting a container inside the spray booth. A sprayer is provided and disposed for spraying the fluid onto inside surfaces of the inverted container to clean the container and dislodge the solids. A stationary platform is provided for receiving the dislodge solids wash from the inverted container and the ram packer moves to dislodge the solids from the platform into a storage chamber in the vehicle.

Abstract: An automatic toilet bowl treatment device, wherein said device comprises: a fluid reservoir, a pump means, a hanger means, and a fluid spray means wherein the entire device is configured so that it can be suspended from, preferably wholly suspended from, a part of a toilet bowl and in particular, a part of the toilet bowl rim. The device is used for the automatic treatment of a lavatory appliance, preferably a toilet bowl and especially preferably the interior surfaces of a toilet bowl which process comprises operating the device to provide a quantity of a treatment composition at periodic intervals to one or more interior surfaces of the lavatory appliance, and preferably to one or more of the interior surfaces of a toilet bowl.

Abstract: Provided are an apparatus and a method of cleaning a substrate. The apparatus includes a substrate supporting unit supporting a substrate, a container surrounding the substrate supporting unit and collecting an organic solvent scattered from the substrate, and a fluid supplying unit provided on one side of the container and spraying a liquid organic solvent with bubbles to the substrate. The fluid supplying unit includes a nozzle head ejecting the organic solvent to the substrate, an organic solvent supplying line supplying the organic solvent from an organic solvent storage tank to the nozzle head, and a bubble providing element provided on the organic solvent supplying line and providing bubbles to the liquid organic solvent.

Abstract: A device and method for treating the surface of a semiconductor wafer provides a treatment fluid in the form of a dispersion of gas bubbles in a treatment liquid generated at acoustic pressures less than those required to induce cavitation in the treatment liquid. A resonator supplies ultrasonic or megasonic energy to the treatment fluid and is configured to create an interference pattern in the treatment fluid comprising regions of pressure amplitude minima and maxima at an interface of the treatment fluid and the semiconductor wafer. The resonator is mounted in the space between the rotary chuck body and a wafer carried in rotation with the chuck body; however, the resonator itself is stationary in relation to rotation of the wafer and chuck body.

Abstract: A dishwasher including a washing compartment at which washing of dishware is performed, a water collecting unit provided at a lower portion of the washing compartment in a concave manner to collect water that has been used for the washing, a micro filter disposed at the water collecting unit and configured to filter garbage being generated at the time of the washing of the dishware, and an ultrasonic wave generating apparatus configured to radiate an ultrasonic wave at the micro filter, thereby automatically cleaning the micro filter and thus, a user may not need to directly clean the micro filter.

Abstract: An aqua comb used with a hose for thoroughly and quickly cleaning, rinsing and combing the hair of both humans and animals. The aqua comb comprises four design elements: 1) a rotating hose nut with internal seal that is employed to attach the aqua comb to various hose endings, 2) an on/off valve for controlling fluid flow through the aqua comb, 3) an elongated and rigid fluid spray body with fluid discharge openings, and 4) a semi-rigid comb member positioned above the discharge openings to lift hair and allow fluid spray to reach scalp and skin thereunder. The core design element of the aqua comb is the presentation angle and comb member structure which work in concert with the fluid spray discharged from the fluid spray openings in its elongated spray body to multiply and leverage mechanical cleaning and combing action.

Abstract: An aqua comb typically used with a garden hose for thoroughly and quickly cleaning reusable pleated pool water filters and like filter cartridges having a pleated configuration. The aqua comb comprises four design elements: 1) a rotating hose nut with internal seal that is employed for leak-resistant attachment of the aqua comb to various hose endings, 2) an on/off valve for fluid flow control, 3) an elongated and rigid fluid spray body with fluid discharge openings, and 4) a semi-rigid comb member with long fingers. The core design element of the aqua comb is the combined presentation angle and physical design shape of its comb member which works in concert with the fluid spray discharged from the fluid spray openings in its elongated spray body to multiply and leverage mechanical cleaning action even in the valleys between filter pleats.

Abstract: An apparatus, operable with a source of cleaning fluid under pressure, for cleaning external surfaces of heat exchange tubes of an air cooled heat exchanger which tubes are situated in generally horizontal rows vertically separated from each other, thus defining a generally horizontal zone between each two adjacent rows, including a. a spray mat having: i. top and bottom fluid impermeable sheets sealed at their mutual peripheral edges defining at least one chamber with a fluid inlet into said chamber for receiving a flow of the cleaning fluid under pressure, and ii. a plurality of laterally spaced apertures and coupled spray nozzles in the top and bottom sheets which are in fluid communication with the chamber, and b. a positioning mechanism for moving the spray mat transversely into and out of one of the zones between two adjacent rows of the heat exchange tubes.

Abstract: A force transducer is coupled to a distal portion of a shaft of a surgical instrument. The force transducer includes proximal and distal portions, radial ribs, and a plurality of strain gauges. The radial ribs form a plurality of through passages. The surgical instrument further includes a flush manifold that receives a liquid from a proximal portion of the shaft, and that directs the liquid along a first subset of through passages of the plurality of through passages toward the distal portion of the force transducer. A plenum at the distal portion of the force transducer collects the liquid from the first subset of through passages and redirects the liquid back toward the proximal portion of the shaft along a second subset of through passages of the plurality of through passages different from the first subset of through passages.

Abstract: A method of web cleaning, particularly relatively soft polymeric webs, without using dipping baths or ultrasonic energy. The method includes conveying the web against a backup roller and spraying the web with a high pressure liquid while the web is supported by the backup roller. Thereafter, residual fluid from the high pressure stream is stripped from the web by a gas curtain while the web is supported by the backup roller. In many convenient embodiments, the web is contacted with a cleaning roller while the web is in contact with the backup roller.

Abstract: A hand carried, manually operated apparatus for cleaning flooring, carpet, upholstery, and the like includes a cleansing fluid chamber, a waste fluid chamber, a pump and an applicator. A first fluid passageway connects the pump and cleansing fluid chamber, a second passageway connects the cleansing fluid chamber and applicator, a third passageway connects the applicator and waste fluid chamber, and a fourth passageway connects the waste fluid chamber and pump. A first one-way valve permits flow from the pump to the cleansing fluid chamber but inhibits reverse flow; and a second one-way valve permits flow from the applicator to the waste fluid chamber but inhibits reverse flow. Air is transferred through the pump from the waste fluid chamber to the cleansing fluid chamber as cleansing fluid is transferred to the applicator from the cleansing fluid chamber and waste fluid is transferred from the applicator to the waste fluid chamber.

Abstract: There is provided a substrate cleaning method capable of cleaning a substrate on which a fine pattern is being formed in a short time with a simple configuration without having a harmful influence on the fine pattern. In the method, the substrate is transferred from a processing chamber for performing a process on the surface of the substrate therein to a cleaning chamber for cleaning the substrate therein. The substrate is cooled to a temperature in the cleaning chamber. A superfluid is supplied to the surface of the substrate, and contaminant components in the fine pattern are flowed out along with the superfluid as the superfluid flows over from the surface of the substrate.

Abstract: The invention relates to the use of an alkaline aqueous composition comprising a) an amine oxide b) a nonionic surfactant, not being an amine oxide, and c) a cationic hydrotrope having the formula (I), where R=C6-C22 hydrocarbyl, R1 and R2 are independently C1-C4 alkyl, n is at least 12, and at most 25, and X? is an anion, e.g. halide or methylsulphate; for removal of dirt from hard surfaces. In particular the composition significantly reduces the amount of traffic film remaining on the surface after brushless vehicle cleaning as compared to presently applied formulation concepts. Further, the invention relates to certain such compositions and intermediates to make these.

Abstract: A surface treatment method of a metal member according to an embodiment of the invention includes removing an oily substance on the metal member by using gas-liquid two fluids that are obtained by boiling heated and pressured water under ordinary pressure. A surface treatment device of a metal member for removing an oily substance on the metal member includes self-generation two fluids production means for producing gas-liquid two fluids by boiling heated and pressured water under ordinary pressure, and a surface treatment room carrying out a surface treatment by bringing the self-generation two fluids into contact with the metal member.

Abstract: Systems, methods and apparatus for making a chemical head including forming a first return chamber in the chemical head, forming a second return chamber in the chemical head, forming a plurality of first return conduits from a head surface to the first return chamber, forming a plurality of second return conduits from a head surface to the second return chamber and wherein at least one of the first return conduits and the second return conduits being formed at a first angle relative to the head surface, the first angle being greater than about 20 degrees to a meniscus plane normal.

Abstract: An automated cleaning system for an aircraft fuselage interior is provided. The system has a movable assembly designed to fit within an aircraft fuselage interior to be cleaned. The movable assembly has a removable track assembly and an automated transport mechanism mounted on the removable track assembly, the automated transport mechanism being a guided cart that travels on the removable track assembly. The movable assembly further has a manifold and frame assembly mounted on the automated transport mechanism and a fluid dispensing assembly coupled to the manifold and frame assembly for dispensing fluids onto an aircraft fuselage interior surface. The system further has a fluid management system coupled to the movable assembly for supplying the fluids to the fluid dispensing assembly. The system further has a control system that communicates with and controls the movable assembly and the fluid management system.

Abstract: Semiconductor wafers are treated in a liquid container filled at least partly with a solution containing hydrogen fluoride, such that surface oxide dissolves, are transported out of the solution along a transport direction and dried, and are then treated with an ozone-containing gas to oxidize the surface of the semiconductor wafer, wherein part of the semiconductor wafer surface comes into contact with the ozone-containing gas while another part of the surface is still in contact with the solution, and wherein the solution and the ozone-containing gas are spatially separated such that they do not come into contact with one another.

Abstract: A cleaning system for an installation processing foodstuffs, with a guide path and with a robot arm which is displaceable along the guide path and on which at least one nozzle for discharging a cleaning agent onto the installation, is attached in a manner such that the at least one nozzle may be moved in a targeted manner to individual points of the installation for its cleaning, by way of displacing and moving the robot arm.

Abstract: An apparatus, system, and method are disclosed for a combination brush and shampoo. The apparatus includes a handle, a removable brush head extending outward from a first end of the handle, the brush head having a plurality of apertures, an end coupler connected with a second end of the handle, a main channel extending from the end coupler, through the handle and brush head to the bristle pack such that the end coupler is in fluid communication with the plurality of apertures, and a reservoir formed in the brush head having a cleaning agent channel extending to and intersecting with the main channel. The system includes the apparatus and a semi-rigid region in the reservoir configured to be depressed and force the cleaning agent out of the reservoir. The method includes providing the apparatus, ejecting cleaning agent, and rinsing with water.

Abstract: A method for cleaning containers, in particular bottles of glass or plastics, and a cleaning machine with at least one cleaning medium, with the containers cleaned at least in one station preferential for the cleaning result and/or in a procedure step with at least essentially chemical-free cleaning media. The cleaning medium is advantageously a granular material, in particular granular ice, carried under pressure with compressed air or compressed water. The cleaning machine suited for carrying out the method includes downstream of an unpacking and presoaking station, a pre-cleaning station with a high pressure water blasting pre-cleaning section, and subsequently an intensive cleaning station with at least one intensive cleaning section to which a pressure blasting system for chemical-free, granular material and a carrier medium are associated, and a disinfection station following the intensive cleaning station.

Abstract: A fluid feeder which is capable of removing foreign matter on the surface of a rotor is provided. The fluid feeder is provided with a rotor housing body on which a rotor housing chamber for housing a rotor of a canned electric motor is installed and a pump casing in which a fluid feeding chamber hermetically installed so as to be connected consecutively to the rotor housing chamber is installed and an impeller is housed inside the fluid feeding chamber. Further, a hollow pipe body is used to connect the vicinity of a side face of the fluid feeding chamber with an upper end of the rotor housing chamber.

Abstract: The present invention relates to a liquid hard surface cleaning composition comprising melamine foam fibers, wherein the composition is packaged in a container.

Abstract: Systems and methods for exposing semiconductor workpieces to vapors for through-hole cleaning and/or other processes are disclosed. A representative method includes exposing a semiconductor workpiece to a vapor, with the semiconductor workpiece having an opening extending from a first surface of the workpiece through the workpiece to a second surface facing opposite from the first surface. The opening can include a contaminant, and the method can further include drawing the vapor and the contaminant through at least a portion of the opening and away from the second surface of the semiconductor workpiece.

Abstract: A method for cleaning deposits from a wave energy converter includes driving at least one rotatably mounted component that is coupled to an energy converter. The energy converter is configured to convert energy from wave motion of a fluid into a different form of energy. A negative energy balance of the wave energy converter is present during the cleaning over an average period of time.

Abstract: A dynamic cyclic nucleation transport (D-CNX) process can be used to wet process an object, such as cleaning or etching. In the D-CNX process, the chamber volume is cyclically enlarged and reduced, effectively reducing and increasing the chamber pressure, respectively. During the pressure reduction phase, bubbles can be generated, which can be terminated or travel to the liquid surface during the pressure increment phase. The generation and termination of bubbles can clean or etch the object, even in hard to reach places.

Abstract: Methods and chemical solvents used for cleaning residues on metal contacts during a semiconductor device packaging process are disclosed. A chemical solvent for cleaning a residue formed on a metal contact may comprise a reactive inorganic component and a reactive organic component. The method may comprise spraying a semiconductor device with a chemical solvent at a first pressure, and spraying the semiconductor device with the chemical solvent at a second pressure less than the first pressure.

Abstract: Disclosed are a nozzle cleaning apparatus and a nozzle cleaning method, which are capable of effectively cleaning a nozzle for discharging a process liquid to a substrate. A nozzle 30 is accommodated in a cleaning container 2 having a funnel-shaped portion 2b. A solvent T as a cleaning liquid is supplied along an inner surface of the funnel-shaped portion 2b. The solvent T forms a vortex flow whirling around the nozzle 30. By exposing the nozzle 30 to the vortex flow, the nozzle 30 can be effectively, thoroughly cleaned.

Abstract: A dry cleaning method of a substrate processing apparatus includes forming a metal oxide by oxidizing a metal film adhered to the inside of a processing chamber of the substrate processing apparatus; forming a complex by reacting the metal oxide with ?-diketone; and sublimating the complex to be removed. A cleaning gas containing oxygen and ?-diketone is supplied into the processing chamber while heating the inside of the processing chamber. A flow rate ratio of oxygen to ?-diketone in the cleaning gas is set such that a formation rate of the metal oxide is lower than a formation rate of the complex.

Abstract: A process chamber for processing semi-conductor wafers. The chamber includes at least one rotor within the process chamber. The rotor is adapted to receive and/or process semi-conductor wafers. The top of the process chamber also includes a tiltable rim. This rim tilts from a non-inclined position to an inclined position. The wafers may be loaded into and unloaded from the process chamber when the rim is in its inclined position.

Abstract: The present invention relates to a mould drum for moulding products from a mass of food starting material. The mould drum comprises one or more cavities with a mould cavity wall having at least partially a porous structure, whereas each cavity is connected to a passage. The present invention further relates to a cleaning apparatus for the inventive mould drum with supporting means for supporting the axis of the drum. Additionally, the present invention relates to a process for cleaning the inventive drum.

Abstract: A robotic pool or tank cleaner is propelled by water jets, the direction of which is controlled by the direction of rotation of a reversible pump motor that is horizontally mounted in the pool cleaner housing that has a propeller attached to either end of the motor drive shaft which projects from opposing ends of the motor body, each of the propellers being positioned in, or near a water jet discharge conduit that terminates in discharge ports at opposite ends of the housing. Each discharge conduit has a pressure-sensitive flap valve downstream of the respective propellers. When the propellers rotate in one direction, the water is drawn through one or more openings in the base plate, passes through one or more filter assemblies associated with the pool cleaner and is discharged through one of the discharge ports as a water jet of sufficient force to propel the pool cleaner.

Abstract: The system includes a wash source configured to concurrently generate a plurality of streams that are each incident on a sensor structure configured to detect a presence and/or amount of a compound on the sensor structure. The sensor structure has electrodes on a substrate. The wash source generates the streams such that each one of the streams is incident on a different one of the electrodes. Each of the streams is incident on one of the electrodes at an angle that is non-perpendicular to the sensor.

Abstract: A carwash system is disclosed wherein a spray arm dependingly mounted to an overhead longitudinally movable carriage for dispensing fluids onto the exterior surfaces of a vehicle in a wash bay unidirectionally circumnavigates the vehicle for multiple circuits while performing one or more wash functions by coordinating longitudinal and rotational movements of the arm through the selective operation of two independent motor drives. Electrical power and/or data is carried to and from electrical devices on the arm by way of a slip ring conductor which is mounted coaxially with the arm pivot on the bottom side of the carriage. The fluid supply conduit also passes concentrically through this pivot.

Abstract: A method for cleaning plated polished disks used in hard drive media is provided. The method includes positioning plated polished disks in a first batch scrubber having multiple first brushes, wherein each of the plated polished disks is positioned between two of the first brushes, and scrubbing the plated polished disks with the first brushes. The method further includes positioning the plated polished disks scrubbed in the first batch scrubber in a second batch scrubber having multiple second brushes, wherein each of the plated polished disks is positioned between two of the second brushes, and scrubbing the plated polished disks with the second brushes.

Abstract: A method of maintaining a floor comprises discharging a diluting fluid from a first reservoir to a mixing apparatus, discharging a cleaner concentrate from a second reservoir to the mixing apparatus, continuously identifying changes in fluid level within the first reservoir with a level sensor, providing a first signal indicative of an identified change in fluid level, passing the cleaner concentrate and diluting fluid through a flow control device, and processing the first signal to generate an output signal and controlling operation of the pump and the flow control device in response to the output signal to provide a flow of fluid to a cleaning device at a substantially constant ratio of the diluting fluid from the first reservoir to the cleaner concentrate from the second reservoir for substantially all fluid levels of the first reservoir.

Abstract: A non-Newtonian concentrate composition includes a sensitizer or irritant, a surfactant, an anti-mist component and optionally a stability component. Example sensitizers and irritants include, but are not limited to, acids, quaternary compounds, and amines, and example anti-mist components include, but are not limited to, polyethylene oxide and polyacrylamide.

Abstract: A conductor cleaning system for cleaning aluminum strands of all aluminum and steel reinforced conductors, such as ACSS, ACSR, ACAR, and AAA. The conductor cleaning system having a container adapted to receive a portion of a conductor to be cleaned, a housing adapted to receive and support the container, and a cleaning solution contained in the container for cleaning the portion of the conductor. The cleaning solution being adapted to clean the conductor without reacting with or damaging the conductor.

Abstract: In a substrate processing method according to the present invention, a cleaning liquid nozzle supplies a rinsing liquid to a central portion of a substrate and thereafter moves from a position corresponding to the central portion of the substrate to a position corresponding to a peripheral, edge portion thereof while supplying the rinsing liquid before stopping at the position corresponding to the peripheral edge portion. Next, a drying liquid nozzle moves from the position corresponding to the peripheral edge portion to the position corresponding to the central portion while supplying a drying liquid. Then, the drying liquid nozzle is kept stationary at the position corresponding to the central portion for a predetermined period of time while supplying the drying liquid. Thereafter, a gas nozzle moves from the position corresponding to the central portion to the position corresponding to the peripheral edge portion while supplying an inert gas.

Abstract: A hard floor surface care process comprising a process of identifying, cleaning, polishing, and protecting manmade and natural stone hard floor surfaces having a single surface or multi-surface quality. The hard floor surface care process comprising an acid reactive or nonreactive hard floor surface identifying process; an emulsifying solution, agitating, and toweling cleaning process; a polishing process utilizing a lubricating solution with a polishing chemistry or pad, and a protecting process utilizing a protecting chemistry selected as a function of the identifying process.

Abstract: A teat cup cleaning device comprises a heating chamber provided with a discharge outlet that is closable by a valve and arranged for connection to a teat cup. A filling device is arranged for filling the heating chamber with an amount of cleaning liquid and retaining a given quantity of gas. The chamber is provided with a heating arrangement arranged to heat the contents of the heating chamber to a temperature T higher than the boiling point Tk of the cleaning liquid at ambient pressure. On operation of the valve superheated cleaning liquid is discharged to clean a teat cup.

Abstract: An apparatus and method are disclosed in which a semiconductor substrate having a surface containing contaminants is cleaned or otherwise subjected to chemical treatment using a foam. The semiconductor wafer is supported either on a stiff support (or a layer of foam) and foam is provided on the opposite surface of the semiconductor wafer while the semiconductor wafer is supported. The foam contacting the semiconductor wafer is pressurized using a form to produce a jammed foam. Relative movement between the form and the semiconductor wafer. such as oscillation parallel and/or perpendicular to the top surface of the semiconductor wafer. is then induced while the jammed foam is in contact with the semiconductor wafer to remove the undesired contaminants and/or otherwise chemically treat the surface of the semiconductor wafer using the foam.

Abstract: The invention relates to a method for removing a photoresist capable of attaining a sufficient removal rate even using a general-purpose cleaning apparatus. A photoresist formed on a surface of a substrate is removed using supersaturated water solution of ozone. Further, it is preferred that a removal operation is performed under a condition of suppressing reduction in ozone concentration of the supersaturated water solution.

Abstract: Disclosed herein are various cleaning systems based on the assemblage of a container, a nozzle, an actuator, and one or more releasable cover members configured to receive an item to be cleaned. Also disclosed is a method for cleaning an item based on the steps of obtaining one of the various cleaning systems, detaching a cover member from the assembly, placing the item in the cover member, dispensing cleaning product into the cover member and waiting a sufficient time for the cleaning product to clean the item. Further disclosed is a cleaning product based on a liquid carrier and a foaming product.

Abstract: A device for cleaning and storing a mouthguard, including two main chambers shaped for receiving and holding a mouthguard. One of the main chambers has a sealable lid for retaining disinfecting liquid and the other main chamber has vents to allow water to drain away, and to allow air flow for drying the mouthguard.

Abstract: Provided is a liquid processing apparatus in which a target substrate is horizontally held on a substrate holding unit and rotated around a vertical shaft, and the chemicals are supplied from a chemical supplying unit to the bottom surface of the target substrate that is rotating. In particular, the liquid processing apparatus performs a first step in which the chemicals are supplied to the target substrate while rotating the target substrate at a first rotation speed, a second step in which the supply of the chemicals is halted and the chemicals are thrown off by rotating the target substrate at a second rotation speed higher than the first rotation speed, and a third step in which the rinse liquid is supplied to the target substrate while rotating the target substrate at a third rotation speed equal to or lower than the first rotation speed.

Abstract: A carwash system is disclosed wherein a spray arm dependingly mounted to an overhead longitudinally movable carriage for dispensing fluids onto the exterior surfaces of a vehicle in a wash bay unidirectionally circumnavigates the vehicle for multiple circuits while performing one or more wash functions by coordinating longitudinal and rotational movements of the arm through the selective operation of two independent motor drives. Electrical power and/or data is carried to and from electrical devices on the arm by way of a slip ring conductor which is mounted coaxially with the arm pivot on the bottom side of the carriage. The fluid supply conduit also passes concentrically through this pivot.

Abstract: A fine bubble generating apparatus that efficiently generates fine bubbles on the nanometer level. A cylindrical member has a cylindrical inner peripheral surface, a first end wall member closing one end of the cylindrical member, and a second end wall member closing the other end of the cylindrical member. The cylindrical member and the first and second end wall members define a fluid swirling chamber. The cylindrical member has a fluid inlet hole at a position close to the second end wall member to supply a gas-liquid mixed fluid in the tangential direction of the peripheral surface of the fluid swirling chamber. The second end wall member has a fluid outlet hole extending therethrough along the center axis of the inner peripheral surface of the fluid swirling chamber. The gas-liquid mixed fluid is introduced into the fluid swirling chamber at a position close to the second end wall member.