Abstract: A cooling gas is discharged from a cooling gas discharge nozzle toward a local section of a front surface of a substrate on which a liquid film is formed. And then the cooling gas discharge nozzle moves from a rotational center position of the substrate toward an edge position of the substrate along a moving trajectory while the substrate is rotated. As a result, of the surface region of the front surface of the substrate, an area where the liquid film has been frozen (frozen area) expands toward the periphery edge from the center of the front surface of the substrate. It is therefore possible to form a frozen film all over the front surface of the substrate while suppressing deterioration of the durability of the substrate peripheral members since a section receiving supply of the cooling gas is limited to a local area on the front surface of the substrate.

Abstract: A method of in situ scale removal from a heat exchange body suspended in a wet cooling tower, wherein the method generates at least one air blast by a generator implementing controlled expansion via a nozzle of a mass of compressed gas in a nozzle towards a zone of the body, the generator being opened at a distance (H) from the zone, and the method consisting in repeating the operation after moving the generator under the body outside the zone.

Abstract: A method of cleaning a turbo pump is described. The turbo pump is coupled with a CVD chamber of depositing a material and thus accumulates the material therein. The method includes using another pump to pump a reactive gas, which can react with the material to form gaseous products, through the turbo pump. Thereby, the turbo pump is cleaned up and is prevented from being a particle source in subsequent CVD operations.

Abstract: Aspects of the invention generally provide methods and apparatus for cleaning adhesive residual on a photomask substrate. In one embodiment, the apparatus includes a processing cell, a support assembly configured to receive a photomask substrate disposed thereon disposed in the processing cell, a protection head assembly disposed above and facing the support assembly, and a head actuator configured to control the elevation of the protection head assembly relative to an upper surface of the support assembly. A cleaning device is provided and positioned to interact with the photomask substrate disposed on the support assembly.

Abstract: In a method for keeping clean a sensor window of an optical sensor for detecting value documents and/or at least one property of value documents which is disposed with at least one portion in a beam path of the sensor, a gas film attached to a surface of the portion is generated on the portion of the sensor window from gas moving relative to the portion.

Abstract: A cleaning solution for fragile objects, such as chandeliers, and a multi-purpose cleaning solution, and methods of manufacture and use. The cleaning solutions comprise about 22% isopropyl alcohol, 0.2%-0.9% detergent, traces of volatile coloring and/or odorizing agents, and up to 100% distilled water to make 100%. As a chandelier cleaner, the solution is applied in two steps by dipping or spraying. The initial application loosens and/or dissolves any contaminants, and the second application causes them to flow away, leaving virtually no film or residue.

Abstract: The present invention provides a method of cleaning a storage case to be used for storing or transporting mask substrates such as photomasks and photomask blanks, semiconductor substrates such as semiconductor wafers, pellicles, or the like. The present invention: facilitates a regular cleaning operation, can be used also for a storage case of a complicated shape, does not require a large scale equipment or an expensive equipment to facilitate an environmental countermeasure, and provides high cleaning effect. The method of cleaning a storage case polluted by adhesion of a foreign substance of an organic material, an ionic foreign substances or an ionic crystal foreign substance physically absorbed, comprises a step of placing the storage case still in air flow of cleaned air or an inert gas in a temperature range from room temperature to 80° C. for desorbing and removing the foreign substance adhered to the storage case.

Abstract: An exhaust foreline for purging fluids from a semiconductor fabrication chamber is described. The foreline may include a first, second and third ports independently coupled to the chamber. A semiconductor fabrication system is also described that includes a substrate chamber that has a first, second and third interface port. The system may also include a multi-port foreline that has a first, second and third port, where the first foreline port is coupled to the first interface port, the second foreline port is coupled to the second interface port, and the third foreline port is coupled to the third interface port. The system may further include an exhaust vacuum coupled to the multi-port foreline.

Abstract: The invention relates to a method including spraying steam in the form of multiple jets with a pressure and a temperature depending on the characteristics of the solar panel to be cleaned and of the impurities to be removed and at an angle that can be adjusted relative to the panel. The method can be combined with gentle cleaning using elements contacting the surface of the panels to be cleaned. The device includes a self-propelled vehicle, a water tank feeding a system for treating and purifying the water prior to feeding a steam generator, with a means for regulating the output temperature and pressure of the steam, which enters a system for distribution to the steam diffusers, which are coupled on a support associated with a cantilevered structure of the self-propelled vehicle.

Abstract: In a method for removing deposit that has attached to a main surface of a substrate from the main surface of the substrate using air knife units where a slit portion is formed so that a fluid can be discharged in band form, a fluid introduction path having an approximately uniform form in the direction perpendicular to the direction in which a number of air knife units move relative to the substrate is formed between the air knife units and the main surface of the substrate while the air knife units move relative to the substrate, a fluid is discharged toward the fluid introduction path from a slit that is formed in the rear portion of the above described air knife units, and then, passes through the fluid introduction path so as to be led to a wall surface that is formed so as to face the front portion of the air knife units or the fluid which has the appearance of a wall surface, and furthermore, deposit on the substrate that has attached to the substrate is led away from the main surface of the substrate,

Abstract: A rapid cooling system for a rapid thermal processing chamber includes a rapid thermal processing chamber having a wafer support for supporting a wafer. A tank having a supply of cooling liquid is provided in fluid communication with the chamber. A pump is provided in fluid communication with the rapid thermal processing chamber and the tank for pumping the cooling liquid from the tank to the chamber and cooling the wafer during the cooling phase of rapid thermal processing.

Abstract: In the exemplary embodiment, a steam-cleaning apparatus is described for sanitizing and cleaning a surface or object. The apparatus has a first reservoir for receiving water, a heater for heating the water within the first reservoir, a second reservoir for receiving a sanitizing agent, a mixing nozzle, a first actuator for enabling the heated water from the first reservoir through the mixing nozzle at the surface or object for cleaning the surface or object; and a second actuator for enabling the sanitizing agent from the second reservoir to the mixing nozzle for mixing the sanitizing agent with the heated water therein, and for enabling the mixed heated water and sanitizing agent at the surface or object for sanitizing the surface or object deeply into its finest fissures and pores.

Abstract: A method and apparatus for a backwash system for cleaning an underwater intake filter assembly. The backwash system includes an underwater tank coupled on one end to a source of compressed fluid and on the other end to the intake screen assembly. The backwash system includes a U-shaped release conduit that is adapted to release a predetermined quantity of fluid to the intake screen in order to clean the filter assembly of waterborne debris.

Abstract: In order to produce a particularly efficient device for deburring and/or cleaning a work piece that is dipped in a fluid medium comprising a fluid discharge device for producing a high pressure fluid jet, it is proposed that the device should comprise a gas discharge device for the production of a gas flow which at least partially envelops the fluid jet.

Abstract: This substrate processing apparatus supplies wafers W accommodated in a closed processing container 10 with ozone gas and steam for processing the wafers W. The apparatus includes an ozone-gas generator 40 for supplying the ozone gas into the processing container 10, a steam generator 30 for supplying the steam into the processing container 10 and a steam nozzle 35 arranged in the processing container 10 and connected to the steam generator 30. The steam nozzle 35 is equipped with a nozzle body 35a having a plurality of steam ejecting orifices 35f formed at appropriate intervals and a heater 35h for preventing dewdrops of the steam from being produced in the nozzle body 35a. Consequently, it is possible to prevent the formation of dewdrops of solvent steam, which may produce origins of particles in the closed processing container, unevenness in cleaning (etching), etc., and also possible to improve the processing efficiency.

Abstract: The substrate processing apparatus includes a plurality of processing chambers. A given processing chamber is cleaned by first executing first processing during which voltage application control is executed to control a voltage applied to an electrostatic chuck based upon first processing voltage application information provided for the particular processing chamber while drawing an inert gas into the processing chamber and evacuating the processing chamber sustaining therein low pressure conditions therein and then executing second processing during which voltage application control is executed to control the voltage application to the electrostatic chuck based upon second processing voltage application information for the processing chamber while drawing in the inert gas and evacuating the processing chamber, the internal pressure of which is set to a high level.

Abstract: In a dry process after a cleaning process using a cleaning-liquid nozzle and a rinse process using a side rinse nozzle are performed on a wafer W, the wafer W is turned, feeding of pure water to a center point of the wafer W from a pure-water nozzle is started, and substantially at the same, injection of a nitrogen gas from a gas nozzle to a center portion of the wafer W at a point at an adequate distance apart from the center of the wafer W is started. Next, while the pure-water nozzle is caused to scan toward the periphery of the wafer W, the gas nozzle is caused to scan toward the periphery of the wafer W in an area radially inward of the position of the pure-water nozzle after the gas nozzle passes the center of the wafer W.

Abstract: The invention is directed to a method for at least partially removing a contamination layer (15) from an optical surface (14a) of an EUV-reflective optical element (14) by bringing a cleaning gas into contact with the contamination layer. In the method, a jet (20) of cleaning gas is directed to the contamination layer (15) for removing material from the contamination layer (15). The contamination layer (15) is monitored for generating a signal indicative of the thickness of the contamination layer (15) and the jet (20) of cleaning gas is controlled by moving the jet (20) of cleaning gas relative to the optical surface (14a) using this signal as a feedback signal. A cleaning arrangement (19 to 24) for carrying out the method is also disclosed. The invention also relates to a method for generating a jet (20) of cleaning gas and to a corresponding cleaning gas generation arrangement.

Abstract: Depending on the actual operating situation and the composition of the fuels used for driving the internal combustion engine, contamination of the moving blades, of the guide device and of the turbine casing parts occurs sooner or later in the exhaust gas turbine. According to the invention, a small quantity of cleaning fluid is fed continuously or cyclically into the exhaust gas flow of an exhaust gas turbine and is directed onto the components to be cleaned. The small quantity of cleaning fluid can be fed in with unchanged operation of the internal combustion engine, such that the exhaust gas turbine can be cleaned or kept clean within the entire operating range of the internal combustion engine. Fluctuations in the power output of the internal combustion engine on account of requisite cleaning of the exhaust gas turbine therefore do not occur. Furthermore, the formation of thermostress cracks in the critical turbine casing parts is largely avoided.

Abstract: An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer.

Abstract: A substrate (W) is processed with the use of a process liquid such as a deionized water. Then, a first fluid which is more volatile than the process liquid is supplied to an upper surface of the substrate (W) from a fluid nozzle (12) to form a liquid film. Next, a second fluid which is more volatile than the process liquid is supplied to the upper surface of the substrate (W) from the fluid nozzle (12), while the wafer (W) is being rotated. During this supply operation, a supply position (Sf) of the second fluid to the substrate (W) is moved radially outward from a rotational center (Po) of the substrate (W). As a result, it is possible to prevent the generation of particles on the substrate (W) after it is dried by using the first and second fluids.

Abstract: In a substrate cleaning method and a substrate cleaning method according to the present invention, a brush 3 is brought into contact with a substrate W while rotating the same, and a cleaning position Sb of the brush 3 is moved relative to the substrate W from a center part of the substrate W toward a peripheral part thereof. A process fluid formed of liquid droplets and a gas is sprayed by a two-fluid nozzle 5 onto the substrate W, and a cleaning position Sn of the two-fluid nozzle 5 is moved relative to the substrate W from a center part of the substrate W toward a peripheral part thereof. During the movement of the cleaning position Sb of the brush 3 from the center part of the substrate W toward the peripheral part thereof, the cleaning position Sb of the two-fluid nozzle is positioned nearer to a center P0 than the cleaning position Sb of the brush 3. Since contaminations of the brush are prevented from adhering again to the wafer, it can be avoided that the wafer W is contaminated.

Abstract: A method of cleaning a UV irradiation chamber includes steps of: (i) after completion of irradiating a substrate with UV light transmitted through an optical transmitted window provided in the UV irradiation chamber, generating radical species of a cleaning gas outside the UV irradiation chamber; and (ii) introducing the radical species from the outside of the UV irradiation chamber into the UV irradiation chamber, thereby cleaning the optical transmitted window.

Abstract: Apparatus to clean silicon electrode assembly surfaces which controls or eliminates possible chemical attack of electrode assembly bonding materials, and eliminates direct handling contact with the parts to be cleaned during acid treatment, spray rinse, blow dry, bake and bagging. Aspects of the apparatus include a kit including an electrode carrier to hold an electrode assembly, a treatment stand to allow access to the electrode assembly, a spider plate to clamp the electrode assembly in the electrode carrier, a nitrogen purge plate to supply nitrogen gas to the backside of the electrode assembly during acid cleaning of the electrode, a water rinse plate to supply water to the electrode face, a blow dry plate to supply nitrogen to dry the electrode assembly and a bake stand to support the electrode assembly during a bake before placing the clean electrode assembly in a bag.

Abstract: A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. The invention includes spraying a line of fluid to a substrate, thereby creating an air/fluid interface line on the substrate; supplying a line of drying vapors to the air/fluid interface line, thereby creating a Marangoni drying effect along the air/fluid interface line; and moving the substrate relative to the air/fluid line. Numerous other aspects are provided.

Abstract: A substrate cleaning method including rotating a substrate at least for a period, supplying a liquid to the front surface of the substrate and cleaning the substrate, and drying the substrate is provided. Said drying of the substrate includes: reducing a rotational speed of the substrate to a first rotational speed lower than a rotational speed for cleaning the substrate; starting to move a liquid supply position from approximately the center of the substrate towards a peripheral portion when the rotational speed of the substrate is reduced down to the first rotational speed; stopping liquid supply when the second rotational speed lower than the first rotational speed is reached; increasing the rotational speed from the second rotational speed; and supplying a gas towards the substrate while rotating the substrate at a higher rotational speed than the second rotational speed.

Abstract: In a substrate processing apparatus configured to perform a predetermined process on a target substrate accommodated in a process chamber, the process chamber is cleaned by alternately performing an operation of generating plasma of a gas containing oxygen within the process chamber, and an operation of generating plasma of a gas containing nitrogen within the process chamber.

Abstract: In a process chamber of a substrate processing apparatus, such as an RTP apparatus, a carrier is placed and configured to carry out a contaminant that has been attached to it. In this state, a cleaning gas containing N2 and O2 is introduced into the process chamber, and cleaning is performed under conditions including a pressure of 133.3 Pa or less and a temperature of 700° C. to 1,100° C. This cleaning is repeatedly performed by sequentially replacing a plurality of carriers.

Abstract: An article of manufacture suitable for cleaning the top of a vehicle, comprising: at least one blower: and a support for said blower, wherein said support positions the blower to blow snow or debris from the top of a vehicle. This invention improves on prior art by using blowers to remove snow from large vehicles.

Abstract: A method for the continuous cleaning of the surface of a material (2) which is coated with an organic substance. Steps of the method are: introducing the material (2) into a treatment area which is supplied with a gas stream containing oxygen; earthing the material (2); and generating a plasma by imposing an electric field between the surface of the material (2) and at least one dielectric-covered electrode (3), the electric field being pulsed and providing a succession of positive and negative voltage pulses in relation to the material (2). Moreover, the maximum voltage of the positive pulses U+ is greater than the arc-striking voltage Ua, and the maximum absolute value of the voltage of the negative pulses U? is less than the striking voltage Ua. Also, a generator and a device which are used to carry out this method.

Abstract: A method and system for cleaning containers being transposed through a container cleaning line, including an open-ended housing, a predetermined container flow path defined by the line of moving containers traversing the enclosure defined by the housing longitudinally, a first set of ionizing air nozzles mounted within the housing for directing ionized compressed air toward the containers in the container flow path, with at least one of the nozzles directing air flow into an open side of each container as it passes the nozzle and a second set of high velocity air nozzles mounted within the housing for directing high velocity compressed air toward the container flow path, the second set of high velocity nozzles being disposed along a direction essentially parallel to the container flow path with at least one of the nozzles flows directing high velocity air flow into the open side of each container as it passes the nozzle. Nozzle guards are provided to prevent contact between the containers and the nozzles.

Abstract: An accessory for use with an air gun to effect particulate pick-up on a surface comprising a flexible member having one end fitted about the end of the air gun and with the other end having a substantially larger opening. The air gun is operated and the second opening is kept close to the surface to be cleaned such that particulate matter is forced upwardly into the flexible member from where it may subsequently be discharged.

Abstract: The invention concerns an apparatus for the contactless cleaning of a conveying element which is designed to receive rod-shaped articles in the tobacco-processing industry, including at least one ionising element for removing electrostatic charges on the surfaces of the conveying element to be cleaned, at least one rotating compressed-air nozzle for loosening and removing contaminants located on surfaces of the conveying element, and a suction device for extracting the contaminated outgoing air, characterized in that associated with the apparatus is a housing for forming a cleaning chamber at least partially shielded from the environment, whereby the cleaning chamber has an inlet opening and an outlet opening for the conveying element to be cleaned, such that upper side and lower side of the conveying element are surrounded. Furthermore, the invention concerns an arrangement for transporting and/or storing rod-shaped articles with an apparatus for contactless cleaning with the above-mentioned characteristics.

Abstract: The present invention is a processing method for applying predetermined processing to a workpiece with said workpiece mounted on a mounting stage arranged in a process chamber in a depressurized atmosphere, in which when no workpiece is mounted on the mounting stage, an inactive gas is discharged from at least a heat transfer gas supply hole of the mounting stage in the process chamber so that a gas layer is formed on a mounting surface of the mounting stage. The present invention is also a processing apparatus.

Abstract: A gas channeling device for selectively channeling blasts of gas from an air cannon to various locations comprises a stationary portion and a movable portion. The stationary portion comprises a fluid inlet passageway and at least first and second fluid outlet passageways. The movable portion comprises a fluid channeling passageway, and is pivotally movable about a pivot axis relative to the stationary portion in a manner such that the movable portion can be selectively positioned in alternative first and second positions relative to the stationary portion. The fluid channeling passageway operatively connects the fluid inlet passageway to the first fluid outlet passageway when the movable portion is in the first position. The fluid channeling passageway operatively connects the fluid inlet passageway to the second fluid outlet passageway when the movable portion is in the second position.

Abstract: In a method of removing a film residue from a wafer in a substrate processing system, a surface of the wafer is exposed to a processing liquid to thereby lift a first portion of the film residue off the surface of the wafer. In addition, a continuous or pulsed stream of pressurized gas is applied against the surface of the wafer to remove a second portion of the film residue from the wafer. The method may include rotating the wafer relative to the stream of pressurized gas. The stream of pressurized gas may be applied subsequent to exposing the surface of the wafer to the processing liquid and any residual processing liquid may be removed with the second portion of film residue by the stream of pressurized gas. Alternatively, the stream of pressurized gas may be applied concurrently with the processing liquid to remove the film residue and processing liquid in a single step.

Abstract: Disclosed are windshield washer compositions comprising a nonionic amino-modified silicone-polyalkyl copolymer, said copolymer being water dispersible and hydrophilic. In one embodiment, the disclosed washer compositions are ready to use washer fluids. In another embodiment, the disclosed windshield washer compositions are additive concentrates. Also disclosed is a method of treating a glass surface comprising applying the disclosed compositions to a glass surface. In one embodiment, a suitable glass surface is the windshield of a transportation vehicle such as an automobile.

Abstract: An autoclavable bucketless cleaning system. The system includes an autoclavable vessel with an inside for storing fluid under pressure and with a first connection point and a second connection point disposed at an outside of the vessel, an autoclavable outlet regulator assembly for dispensing fluid from the vessel and removably connected to the vessel at the first connection point so as to be in fluid communication with the inside of the vessel, and an autoclavable inlet regulator assembly for pressurizing the vessel and removably connected to the vessel at the second connection point to be in fluid communication with the inside of the vessel.

Abstract: A method and apparatus to remove vapor from a storage tank comprising introducing a stream of gas into the storage tank to cause mixing of the vapor within the tank. The stream of gas is preferably introduced into the storage tank through a gas nozzle that increases the velocity of the gas. Furthermore, the gas nozzle may have a fixed or variable orientation that introduces the stream of gas to flow into a region of the storage tank to prevent retention of the vapor in that region. A mixture of the vapor and the gas is withdrawn from the storage tank through an outlet port and provided to an abatement unit, such as a condenser or burner. Where the abatement device is a condenser, the gas and any uncondensed vapor may be returned to the storage tank through the gas nozzle, or through a second gas nozzle.

Abstract: A cleaning apparatus and method which includes spraying high pressure air obliquely onto a cleaning surface from an air nozzle disposed in the vicinity of the cleaning surface of a cleaning object to be cleaned. A recovery portion of the cleaning apparatus which is disposed in front of an outlet port of the air nozzle recovers at least air containing foreign matter removed from the cleaning object by making the air exhaust into an exhaust introducing passage along a wall surface of an air guide. The recovery portion of the cleaning apparatus includes an air guide section disposed in front of the outlet port of the air nozzle, and an air cover section, which forms an exhaust introducing passage for recovering the air that flows along an air guide wall surface of the air guide section.

Abstract: A vehicle mounted patching system for patching potholes and the like and incorporating method and apparatus for removing and flushing asphalt emulsion from the feed lines of the patcher which completely recycles the cleaning agent used to flush the feed lines, as well as eliminating any external discharge of potentially toxic materials.

Abstract: This disclosure provides an approach for cleaning an ion implanter. In this disclosure, there is a vacuum device having an in-take port adapted to receive a contaminant removing hose. The vacuum device and hose are configured to provide constant suction to the ion implanter. A dry ice blaster having a dry ice dispensing hose is configured to supply dry ice. A sealing plate is adapted to attach to an access section of a processing region of the ion implanter. The sealing plate has a first opening configured to receive the contaminant removing hose and the dry ice dispensing hose.

Abstract: A surface cleaning system having a storage container, debris collection apparatus and debris conduit is disclosed. Water discharged from spray nozzles configured in a circular arrangement forces debris into a debris collection ring and then a debris conduit. An auger, water pressure or air pressure is used to force the debris through debris conduit into the storage container for disposal. The design of the debris collection apparatus also facilitates the capture of most of the water used to force the debris into the debris collection apparatus. Accordingly, the system is able to reuse the water thereby extending the surface area that may be cleaned with a specified amount of water.

Abstract: An apparatus and method for cleaning polymer film are provided and include a support assembly for supporting the polymer film to be cleaned, the support assembly being constructed and arranged to move the polymer film for cleaning, and at least one nozzle disposed adjacent the polymer film for providing CO2 to the polymer film for dislodging particulate matter from the polymer film and the at least one aperture, and for cleaning thereof.

Abstract: A cleaning arrangement is provided for use in an EUV lithographic apparatus, for example an EUV lithographic apparatus with a Sn source. The cleaning arrangement includes a gas source for a hydrogen containing gas and a hydrogen radical source. The hydrogen radical source is a source of (UV) radiation which induces photo dissociation of the hydrogen. Radicals may reduce Sn oxides (if present) and my form volatile hydrides of Sn deposition and/or carbon deposition. In this way the cleaning arrangement can be used to clean optical elements from Sn and/or C deposition. The EUV source may be used as hydrogen radical source. An optical filter is used to remove undesired EUV radiation and transmit desired UV radiation.

Abstract: A cleaning effect is improved by cleaning a component that has a recess structure by using a cleaning medium of a liquefied gas or a supercritical fluid. By the cleaning method of removing adhering substances adhering to at least the surface of the recess structure of the component that has the recess structure, cleaning is carried out by using the supercritical gas or the liquefied gas so that the cleaning medium spreads over the surface of the recess structure.

Abstract: A steam cooking system includes a steam cooking chamber having an access door and a drain for draining condensate from the steam cooking chamber along a drain path. A steam generator unit heats water to generate steam. The steam generator unit is connected for delivery of steam from the steam generator to the steam cooking chamber via a first steam path during a cooking operation. The steam generator unit is also connected for delivery of steam from the steam generator to the drain path via a second steam path during a steam flushing operation.

Abstract: A wafer preparation method is provided for producing a wet region and then a corresponding dry region on the wafer. Brushing produces the wet region on the wafer. As the brushing moves in a selected scan operation across the wafer, a generating operation forms a meniscus that follows the brushing and dries the wet region. The generating operation produces the meniscus at least partially surrounding the wet region scrubbed by the scrubbing. The controlled meniscus is formed by applying fluid to the surface of the wafer and simultaneously removing the fluid. The scan operations may be selected so the brushing scrubs the wet region and then the meniscus forms the dry region where the scrubbing took place. The scan operations include a radial scan, a linear scan, a spiral scan and a raster scan.

Abstract: A method and apparatus for removing soil from an inner surface of a lumen wall of a medical instrument are disclosed. A carrier gas entrains particles capable of sublimation at room temperature and transports the particles into and through the lumen. As the particles collide with the soil attached to the inner surface of the lumen wall, and as the particles sublime, the soil is removed from the inner surface of the lumen wall and transported out an exit of the lumen.

Abstract: A method of cleaning dust from a computer, computer keyboard, mouse, monitor, or desktop using a hand pump capable of blowing air out of the pump or vacuuming air into the pump. A pump for carrying out this method is disclosed, which pump contains a cylinder having a proximal end and a distal end, a piston inside the cylinder, a handle operatively attached to the proximal end of the piston, and a nozzle at the distal end of the cylinder wherein the hand pump contains side valves adjacent the distal end of the cylinder, which valves open when the piston is moved distally and a front valve which opens when the piston is moved proximally and the cylinder has a dust container surrounding the side valves to collect the dust exiting the side valves to prevent the dust from blowing outside of the cylinder.