Aldehyde-containing Patents (Class 205/304)
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Patent number: 10072344Abstract: A reactor is provided which comprises: a plurality of reaction units located within a reaction zone, each of the reaction units being adapted to enable carrying out a chemical reaction of one or more raw gases (e.g. at least one of CO2 and H20); ingress means to allow introduction of the one or more raw gases into the reaction zone and to allow distributing the incoming gas to the plurality of reaction units; egress means to allow exit of reaction products from the reaction zone; and a heating system. The reaction units extend essentially along a longitudinal axis of the reaction zone and are arranged in a spaced-apart relationship along a lateral axis of the reaction zone. The heating system comprises a plurality of heating sources extending along the reaction zone, thereby providing at least a part of the energy to carry out the reaction process within the reaction units.Type: GrantFiled: June 25, 2013Date of Patent: September 11, 2018Assignee: YEDA RESEARCH AND DEVELOPMENT CO. LTD.Inventors: David Scheiner, Jacob Karni, Raymond A George, Gabriel Seiden
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Patent number: 10072347Abstract: Systems and methods for tin antimony plating are provided. One plating method includes doping a tin (Sn) plating solution with antimony (Sb). One method also includes electroplating a component using the antimony-doped tin plating. The antimony-doped tin plating formed by one method includes between about 1% and about 3% antimony.Type: GrantFiled: October 5, 2012Date of Patent: September 11, 2018Assignee: THE BOEING COMPANYInventor: Thomas A. Woodrow
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Publication number: 20150122662Abstract: Tin electroplating baths having certain brightening agents and nonionic surfactants provide tin-containing solder deposits having good morphology, reduced void formation and improved within-die uniformity.Type: ApplicationFiled: November 5, 2013Publication date: May 7, 2015Inventors: Julia WOERTINK, Yi QIN, Jonathan D. PRANGE, Pedro O. LOPEZ MONTESINOS
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Publication number: 20150122661Abstract: Tin-containing electroplating baths having a combination of certain brightening agents provide tin-containing solder deposits having reduced void formation and smooth morphology.Type: ApplicationFiled: November 5, 2013Publication date: May 7, 2015Inventors: Julia WOERTINK, Yi QIN, Jonathan D. PRANGE, Pedro O. LOPEZ MONTESINOS
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Publication number: 20140183050Abstract: Tin or tin alloy plating liquid with a sufficient plated deposit can be formed in the opening without causing burns on the plated film surface or abnormal deposits, and which has a good via filling effect. When a specific ?,?-unsaturated carbonyl compound is added into the tin or tin alloy plating liquid, the plating liquid with good via filling performance can be obtained, and the deposit which is substantially free of voids and burns or abnormal deposits on the deposit surface are reduced.Type: ApplicationFiled: December 27, 2013Publication date: July 3, 2014Inventors: Hiroki OKADA, Li SHENGHUA, Makoto KONDO
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Patent number: 8603315Abstract: A method for electrochemically plating tin or tin alloy onto a workpiece to provide a tin or tin alloy deposit on said workpiece having a stress differential and workpieces characterized by a tin or tin alloy deposit having a stress differential.Type: GrantFiled: January 5, 2007Date of Patent: December 10, 2013Assignee: Faraday Technology, Inc.Inventors: E. Jennings Taylor, Jenny J. Sun
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Publication number: 20130270122Abstract: An additive obtained from the reaction product obtained by reacting glutaraldehyde and at least one type of compound selected from hydrocarbon compounds containing a hydroxyl group, and at least one type of compound selected from amine compounds, as well as a tin or tin alloy plating solution containing this additive.Type: ApplicationFiled: May 18, 2013Publication date: October 17, 2013Inventors: Motoya SHIMAZU, Yasuo OHTA
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Patent number: 8518230Abstract: A method of reducing tin whisker formation including steps of a) providing a tin or tin-alloy bath containing one or more sources of tin and one or more crystal plane orientation enhancing compounds selected from imides, imines, amides, polyamides, amines, polyamines, polyols, dibutyl thiourea, allyl thiourea, amino thiazole, rhodanine, sulfosalicylic acid and sulfamides; and b) electrodepositing a layer of tin or tin-alloy on a substrate, the tin or tin-alloy layer is free of crystal planes or equivalent planes thereof forming an angle of 5° to 22° with an adjacent crystal plane or an equivalent plane.Type: GrantFiled: July 13, 2005Date of Patent: August 27, 2013Assignee: Rohm and Haas Electronic Materials LLCInventor: André Egli
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Patent number: 8466314Abstract: An additive obtained from the reaction product obtained by reacting glutaraldehyde and at least one type of compound selected from hydrocarbon compounds containing a hydroxyl group, and at least one type of compound selected from amine compounds, as well as a tin or tin alloy plating solution containing this additive.Type: GrantFiled: April 26, 2011Date of Patent: June 18, 2013Assignee: Rohm and Haas Electronic Materials LLCInventors: Motoya Shimazu, Yasuo Ohta
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Publication number: 20110259754Abstract: An additive obtained from the reaction product obtained by reacting glutaraldehyde and at least one type of compound selected from hydrocarbon compounds containing a hydroxyl group, and at least one type of compound selected from amine compounds, as well as a tin or tin alloy plating solution containing this additive.Type: ApplicationFiled: April 26, 2011Publication date: October 27, 2011Applicant: Rohm and Haas Electronic Materials LLCInventors: Motoya SHIMAZU, Yasuo Ohta
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Patent number: 7931793Abstract: An additive obtained from the reaction product obtained by reacting glutaraldehyde and at least one type of compound selected from hydrocarbon compounds containing a hydroxyl group, and at least one type of compound selected from amine compounds, as well as a tin or tin alloy plating solution containing this additive.Type: GrantFiled: April 24, 2008Date of Patent: April 26, 2011Assignee: Rohm and Haas Electronic Materials LLCInventors: Motoya Shimazu, Yasuo Ohta
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Publication number: 20100000873Abstract: A plating solution and a plating method, which does not use a complexing agent and which provides favorable solder wetting properties and an extremely low coupling rate when electrolytic tin plating is performed, and particularly when electrolytic tin plating is performed using a barrel plating method.Type: ApplicationFiled: June 11, 2009Publication date: January 7, 2010Applicant: Rohm and Haas Electronic Materials LLCInventors: Masaaki Imanari, Fai Lung Ting, Motoya Shimazu, Yasuo Ohta
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Patent number: 6773568Abstract: The present invention provides inter alia electroplating compositions, methods for use of the compositions and products formed by the compositions. Electroplating compositions of the invention are characterized in significant part by a grain refiner/stabilizer additive comprising one or more non-aromatic compounds having &pgr; electrons that can be delocalized, e.g., an &agr;,&bgr; unsaturated system or other conjugated system that contains a proximate electron-withdrawing group. Compositions of the invention provide enhanced grain refinement and increased stability in metal plating solutions, particularly in tin and tin alloy plating formulations.Type: GrantFiled: July 16, 2003Date of Patent: August 10, 2004Assignee: Shipley Company, L.L.C.Inventors: Andre Egli, Anja Vinckier, Jochen Heber, Wan Zhang
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Patent number: 6706418Abstract: The present invention provides inter alias electroplating compositions, methods for use of the compositions and products formed by the compositions. Electroplating compositions of the invention are characterized in significant part by a grain refiner/stabilizer additive comprising one or more non-aromatic compounds having &pgr; electrons that can be delocalized, e.g., an &agr;,&bgr; unsaturated system or other conjugated system that contains a proximate electron-withdrawing group. Compositions of the invention provide enhanced grain refinement and increased stability in metal plating solutions, particularly in tin and tin alloy plating formulations.Type: GrantFiled: June 29, 2001Date of Patent: March 16, 2004Assignee: Shipley Company L.L.C.Inventors: Andre Egli, Anja Vinckier, Jochen Heber, Wan Zhang
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Patent number: 6582582Abstract: An electroplating bath is disclosed that is particularly suited to the electrodeposition of tin, zinc and alloys of the foregoing in a smooth and bright electrodeposit. The disclosed electroplating bath comprises propanedioic acid, diethyl ester, polymer with N-(3-aminopropyl)-1,3-propanediamine, N-(2-carboxy benzoyl) as a brightener additive. In addition, the electroplating bath may also comprise carboxylic acids, ammonium salts, aldehyde compounds and a variety of co-brighteners.Type: GrantFiled: March 9, 2001Date of Patent: June 24, 2003Inventor: Donald Becking
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Patent number: 5651873Abstract: An electroplating solution (A), comprises an aqueous solution consisting essentially of lead phenolsulfonate: 1 to 250 g/liter in terms of Pb content; tin phenolsulfonate: 0.1 to 250 g/liter in terms of Sn content; phenolsulfonic acid: 20 to 300 g/liter; polyoxyethylene polyoxypropylene alkylamine: 1 to 50 g/liter; a 1-naphthaldehyde derivative: 0.001 to 1 g/liter; and an aldol sulfanilic acid derivative: 0.1 to 30 g/liter; or an aqueous solution (B) consisting essentially of lead methanesulfonate: 1 to 250 g/liter in terms of Pb content; tin methanesulfonate: 0.1 to 250 g/liter in terms of Sn content; methanesulfonic acid: 20 to 300 g/liter; polyoxyethylene polyoxypropylene alkylamine: 1 to 50 g/liter; and an aldol sulfanilic acid derivative: 0.1 to 30 g/liter.Type: GrantFiled: June 26, 1995Date of Patent: July 29, 1997Assignees: Mitsubishi Materials Corporation, Daiwa Fine Chemicals Co., Ltd.Inventors: Naoki Uchiyama, Masayoshi Kohinata, Akihiro Masuda, Yoshiaki Okuhama, Seishi Masaki, Masakazu Yoshimoto
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Patent number: 5326453Abstract: New formulations for the electrodeposition of a dense, reflective tin or tin-lead alloy on a cathode have been developed. Such electrodeposition solutions are partially comprised of an additive which is comprised of at least one nonionic surfactant which is electrolyzed prior to starting the electrodeposition process. The electrodeposition solution is also comprised of an amount of an aliphatic dialdehyde kept low enough so that the solder deposits contain no more than 500 ppm of co-electrodeposited carbon. The additive and the aliphatic dialdehyde is mixed with a solution comprised of an alkane or alkanol sulfonic acid and a tin alkane or alkanol sulfonate or a mixture of a tin and lead alkane or alkanol sulfonate to form an electrodeposition solution. A dense, reflective finish is then electrodeposited on a cathode by using such an electrodeposition solution.Type: GrantFiled: February 19, 1993Date of Patent: July 5, 1994Assignees: Motorola, Inc., Technic, Inc.Inventors: Duane W. Endicott, Michael D. Gernon, Heng K. Yip
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Patent number: 5118394Abstract: A brightener is added in the ratio of 0.5-5 g per 1 l of electric plating bath of pH 4-8 containing citric acid or citrate for tin or tin alloy plating. The brightener contains a water soluble reaction product obtained by reacting polyamine such as pentaethylenehexamine, aliphatic aldehyde such as formaldehyde, and aromatic carboxylic acid such as methyl benzoate.Type: GrantFiled: December 5, 1990Date of Patent: June 2, 1992Assignee: Murata Manufacturing Co., Ltd.Inventors: Toshiaki Makino, Atsuyoshi Maeda
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Patent number: 5110423Abstract: This invention relates to alkyl and alkanol sulfonic acid plating baths and to methods for plating tin and tin-lead alloys. It also relates to low foaming wetting systems based on low to moderate foaming surfactants and soluble, non-silicon containing defoamers, and to low volatility brightener systems.Type: GrantFiled: May 25, 1990Date of Patent: May 5, 1992Assignee: Technic Inc.Inventors: John L. Little, Philip W. Schultz, Harry Kroll