Abstract: Provided is a method of manufacturing at least one liquid crystal display element, including: a first step of grinding an end surface of a glass substrate pair including two glass substrates overlapping with each other; and a second step of subjecting a surface of the glass substrate pair to chemical polishing.

Abstract: A method of lifting off includes forming a first material layer on a substrate; forming a photoresist pattern including first and second holes and on the first material layer; patterning the first material layer using the photoresist pattern as a patterning mask to form a material pattern having first and second grooves within the material pattern, the first and second grooves corresponding to the first and second holes, respectively; forming a second material layer on an entire surface of the substrate including the photoresist pattern and the first and second grooves; and removing the photoresist pattern and the second material layer on the photoresist pattern at the same time, wherein a portion of the material pattern between the first and second grooves and portions of the material pattern at sides of the first and second grooves constitute a line as a whole.

Abstract: A method for manufacturing a flexible display device in which a flexible substrate is acquired by forming display devices on one side of the substrate and thinning the substrate by removing surface portions on an opposite side of the substrate. The thickness of the substrate is changed from a first thickness, which gives rigidity to the substrate to the second thickness, which gives flexibility to the substrate.

Abstract: Disclosed are various embodiments of methods and systems related to stimulus responsive nanoparticles. In one embodiment includes a stimulus responsive nanoparticle system, the system includes a first electrode, a second electrode, and a plurality of elongated electro-responsive nanoparticles dispersed between the first and second electrodes, the plurality of electro-responsive nanorods configured to respond to an electric field established between the first and second electrodes.

Abstract: A method for manufacturing a flexible electrophoretic display device, including: providing a metal mother substrate having a first thickness, including a unit display panel region and a non-display region adjacent the unit display panel region; forming a display element in the unit display panel region; forming a groove in the non-display region of the mother substrate; cutting the mother substrate along the groove to separate the unit display panel region from the mother substrate; thinning the substrate of the separated unit display panel region; and forming an electrophoretic ink film on the unit display panel region.

Abstract: The invention provides a color filter producing method that is based on dry etching and makes it possible to produce a color filter which has fine and rectangular pixels and is excellent in flatness, and color filters produced by the method. The method is a color filter producing method of forming a first colorant-containing layer on a support, removing the first colorant-containing layer corresponding to a region where a second colorant-containing layer is to be formed by dry etching, forming the second colorant-containing layer so as to be embedded into the layer-removed region, removing the first and second colorant-containing layers corresponding to a region where a third colorant-containing layer is to be formed by dry etching, forming the third colorant-containing layer so as to be embedded into the layer-removed region, and removing the colorant-containing layers laminated on other colorant-containing layers.

Abstract: The present disclosure relates to a method for making a touch panel. The method includes following steps. A substrate is provided, wherein the substrate has a surface and defines two areas: a touch-view area and a trace area; applying an adhesive layer on the surface of the substrate. A carbon nanotube film is placed on a surface of the adhesive layer. The adhesive layer is solidified. An electrode and a conductive trace are formed on a surface of the carbon nanotube film so that part of the carbon nanotube film on the trace area is exposed from space between adjacent conductive lines of the conductive trace to form an exposed carbon nanotube film. The exposed carbon nanotube film is removed.

Abstract: A first etching stop layer and an active layer are formed on an inner surface of a first glass substrate, and a second etching stop layer and a cover layer are formed on an inner surface of a second glass substrate. A display media is formed between the first glass substrate and the second glass substrate. A first passivation layer is formed on an outer surface of the second glass substrate. A first etching process is performed to expose the first etching stop layer. A first flexible substrate is formed on the exposed first etching stop layer, and a second passivation layer is formed on the first flexible substrate. The first passivation layer is removed. A second etching process is performed to expose the second etching stop layer. A second flexible substrate is formed on the exposed second etching stop layer, and the second passivation layer is removed.

Abstract: To provide a method for producing liquid crystal display panels from a panel assembly, the display panels having a panel thickness smaller than that of the assembly, by which favorable scribe grooves can be formed, which therefore allows contribution to thin profiles and narrow frame regions of the display panels. The method includes a first scribe-formation step of forming, after a first step of thinning a TFT substrate assembly 20A and a CF substrate assembly 30A of a panel assembly 10A by etching, first scribe grooves 20b on an outer surface 20a of the TFT substrate assembly 20A along regions where seals 40 are disposed, and a second thinning step of further thinning the substrate assemblies 20A and 30A by etching, and developing the first scribe grooves 20b formed on the outer surface 20a to expose portions of the seals 40 at bottoms of the first scribe grooves 20b.

Abstract: A method for manufacturing a light guide plate includes the following steps. At least one dot area and at least one non-dot area are defined on a mask. A lithography and etching process using the mask is performed a mold to form at least one recess having a rough surface on the mold and leave at least one non-etched microstructure on the mold. The recess corresponds to the non-dot area, and the non-etched microstructure corresponds to the dot area. An injection molding process using the mold is performed to form the light guide plate. The light guide plate has at least one protrusion having a rough surface on the light guide plate and at least one indented microstructure in the light guide plate. The protrusion corresponds to the recess, and the indented microstructure corresponds to the non-etched microstructure.

Abstract: An antenna structure includes a coil unit formed by etching a conductive film in a non-display area of a display and a set of electrodes for transmitting signals connected to terminals of the coil unit. The antenna structure can be a near field communication antenna or a radio frequency identification antenna to transmit and receive signals with the coil unit formed in the non-display area of the display to save the occupation space in a portable communication device. Therefore, the antenna structure can effectively reduce the size of the portable communication device.

Abstract: A copper conducting wire structure is for use in the thin-film-transistor liquid crystal display (LCD) device. The copper conducting wire structure includes at least a buffer layer and a copper layer. A fabricating method of the copper conducting wire structure includes the following steps. At first, a glass substrate is provided. Next, the buffer layer is formed on the glass substrate. The buffer layer is comprised of a copper nitride. At last, the copper layer is formed on the buffer layer.

Abstract: A method of manufacturing a liquid crystal display device is provided which includes ashing first and second photoresist patterns, whereby a copper oxide film is formed at portions of a data line and a source-drain pattern exposed between the ashed first and second photoresist patterns and between the ashed first and second portions of the first photoresist pattern; deoxidizing or removing the copper oxide film; performing a plasma treatment to change the exposed portions of the data line and the source-drain pattern into a copper compound; removing the copper compound using a copper compound removing solution to form source and drain electrodes below the ashed first and second portions, respectively, wherein the copper compound removing solution substantially has no reaction with the copper group material; dry-etching a portion of an ohmic contact layer between the source and drain electrodes using the source and drain electrodes as an etching mask, the ohmic contact layer formed by patterning the impurity-d

Abstract: A method of manufacturing a liquid crystal display apparatus includes forming at least one assembly for forming a plurality of finished liquid crystal display apparatuses, by opposing two glass substrates to have a space therebetween and sealing a periphery of the space between the two glass substrates by an outer peripheral seal member. Outer surfaces of the two glass substrates are etched by soaking the assembly in an etching solution within an etching bath while maintaining a temperature and a concentration of the etching solution within the etching bath at a substantially constant temperature and at a substantially constant concentration. The etched outer surfaces of the glass substrates are flattened by polishing the outer surfaces of the glass substrates.

Abstract: In one embodiment, a first substrate having a plurality of array regions is prepared. A seal material is formed in each of the array regions. A peripheral seal material is arranged outside the array regions extending in a first direction. The peripheral seal material has an exhaust opening provided at a portion of the peripheral seal material extending in a second direction. A dummy seal material is formed between the peripheral seal material extending in the first direction and the seal material formed in the array region. A second substrate is arranged on a surface of the first substrate in a jig. The inside of the jig is decompressed, and the atmosphere between the first and second substrates is exhausted while applying a pressure to the first and second substrates. Then, the first and second substrates are attached by curing the seal material, the peripheral seal material and the dummy seal material.

Abstract: The invention discloses a planarization method for a wafer having a surface layer with a recess, comprises: forming an etching-resist layer on the surface layer to fill the entire recess; etching the etching-resist layer and the surface layer, till the surface layer outside the recess is flush to or lower than the bottom of the recess, the etching speed of the surface layer being higher than that of the etching-resist layer; removing the etching-resist layer; and etching the surface layer to a predetermined depth. The method can avoid concentric ring recesses on the surface of the wafer resulted from a chemical mechanical polishing (CMP) process in the prior art, and can be used to obtain a wafer surface suitable for optical applications.

Abstract: A method for fabricating a liquid crystal display (LCD) device wherein a photolithography technique is replaced by soft lithography is disclosed. The method includes: forming a thin film transistor array substrate; forming a color filter substrate; bonding the thin film transistor array substrate and the color filter substrate; and applying a liquid crystal between the thin film transistor array substrate and the color filter substrate, wherein at least one of the forming the thin film transistor array substrate and the forming the color filter substrate includes a pattern forming method using a soft mold. The pattern forming method may be a soft lithography process that includes: contacting a soft mold having a particular pattern with a surface of a buffer layer and applying a constant heat to the soft mold and buffer layer to transfer the particular pattern onto the buffer layer.

Abstract: A touch sensing type liquid crystal display device includes an array substrate including a first substrate, a common electrode, a pixel electrode, and a touch sensing unit; a color filter substrate including a second substrate and facing the array substrate; an anti-static layer on an outer side of the second substrate and including a conductive polymer, a UV-setting binder and transparent silica and having a sheet resistance of several tens of Mega ohms per square (?/sq) to several Giga ohms per square (?/sq); and a liquid crystal layer between the first substrate and an inner side of the second substrate.

Abstract: A method of manufacturing an alignment substrate includes preparing a first substrate on which an alignment film aligned in a first alignment direction is formed; forming a plurality of fluoro-polymer patterns on the first substrate; changing the alignment direction of regions of the alignment film on which the fluoro-polymer patterns are not formed; and removing the fluoro-polymer patterns by using a fluoro-solvent.

Abstract: The present invention provides a liquid crystal display device having gate wires and source/drain wires with a multilayer structure made of the same material which can be manufactured at low cost, as well as a manufacturing method for the same. In accordance with the manufacturing method, a wet etching process is carried out on the gate wires and the source/drain wires using an etchant including hydrofluoric acid and an oxidant, and the concentration of hydrofluoric acid in the etchant is different between the etchant for the gate wires and that for the source/drain wires.

Abstract: In one embodiment, an etching method is disclosed. The method can include producing an oxidizing substance by electrolyzing a sulfuric acid solution, and producing an etching solution having a prescribed oxidizing species concentration by controlling a produced amount of the produced oxidizing substance. The method can include supplying the produced etching solution to a surface of a workpiece.

Abstract: A liquid crystal display panel comprises an upper substrate including a plurality of color filters, a lower substrate comprising a plurality of circuit lines, and a sealant for adhering the upper substrate and the lower substrate to each other. A seal area black matrix transmitting ultraviolet (UV) light rays for curing the sealant is formed in the upper substrate. The seal area black matrix is formed by stacking the plurality of color filters in a seal area.

Abstract: The present invention includes the steps of providing a substrate having a main surface; depositing a dual-metal layer such as Mo/AlNd, MoW/AlNd, MoW/Al onto the main surface of the substrate; defining gate and word line patter using a layer of photoresist; and using the photoresist as an etching mask, a first metal dry etching process is carried out to etch the dual-metal layer at an etching selectivity that is significantly higher than prior art. The first metal dry etching process uses oxygen/fluorine containing etching gas mixture and oxygen/chlorine containing etching gas mixture to form the dual-metal gate and word line pattern having slightly oblique sidewalls. End point detection mode detected at 704 nm is used in the first metal dry etching process.

Abstract: Disclosed are an apparatus for etching or stripping a substrate of a liquid crystal display device and a method thereof. The present invention includes carrying out an etching or stripping process on substrates using an etchant in a first etchant tank, counting a number of the substrates etched or stripped using the etchant in the first etchant tank, checking readiness of a second etchant tank at a predetermined point in time before the counted number reaches a maximum substrate number set up previously for the etchant tanks, and carrying out the etching or stripping process on the substrates using an etchant in the second etchant tank when the second etchant tank is in readiness for use and the counted number reaches the maximum substrate number.

Abstract: A method of patterning a transparent conductive film adaptive for selectively etching a transparent conductive film without any mask processes, a thin film transistor for a display device using the same and a fabricating method thereof are disclosed. In the method of patterning the transparent conductive film, an inorganic material substrate is prepared. An organic material pattern is formed at a desired area of the inorganic material substrate. A thin film having a different crystallization rate depending upon said inorganic material and said organic material is formed. The thin film is selectively etched in accordance with said crystallization rate.

Abstract: There is provided a manufacturing method for a charged particle migration type display panel which has a plurality of cells partitioned between two substrates placed opposite to each other by partition walls, and charged particles enclosed in the individual cells, the method including a partition wall forming step of forming the partition walls in one of the substrates, and an electrode film forming step of forming, by vapor deposition, an electrode film on a surface of the substrate where the partition walls are formed, wherein an electric contact is disconnected between the electrode film formed on the substrate surface and a surplus electrode film formed on a side face of the partition wall in the electrode film forming step by performing an insulating part forming step of forming an insulating part so shaped that a deposition material does not reach vicinities of at least bases of the partition walls before the electrode film forming step.

Abstract: A method of reforming a metal pattern for improving the productivity and reliability of a manufacturing process, an array substrate and a method of manufacturing the array substrate are disclosed. In the method, a first wiring pattern is formed on an insulation substrate. The first wiring pattern is removed. A second wiring pattern is formed on an embossed pattern by using the embossed pattern as an alignment mask. The embossed pattern is defined by a recess formed on a surface of the insulation substrate. Accordingly, the insulation substrate having the recess formed thereon may not be discarded, and may be reused in forming the first wiring pattern. In addition, the embossed pattern defined by the recess is used as an alignment mask, so that the alignment reliability of a metal pattern may be improved.

Abstract: A method of manufacturing a display substrate includes forming a first metallic pattern including gate and storage conductors and a gate electrode of a switching device on a base substrate, forming a gate insulation layer, forming a second metallic pattern and a channel portion including a source line, source and drain electrodes of the switching device, forming a passivation layer and a photoresist film on the second metallic pattern, patterning the photoresist film to form a first pattern portion corresponding to the gate and source conductors and the switching device, and a second pattern portion formed on the storage line, etching the passivation layer and the gate insulation layer, and forming a pixel electrode using the first pattern portion. Therefore, excessive etching of the stepped portion may be prevented, so that a short-circuit defect between a metallic pattern and a pixel electrode may be prevented.

Abstract: An indium cap layer is formed by blanket depositing indium onto a surface of metallic interconnects separated by interlayer dielectric, and then selectively chemically etching the indium located on the interlayer dielectric leaving an indium cap layer. Etchants containing a strong acid are provided for selectively removing the indium.

Abstract: A display substrate includes; a base substrate, a deformation preventing layer disposed on a lower surface of the base substrate, wherein the deformation preventing layer applies a force to the base substrate to prevent the base substrate from bending, a gate line disposed on an upper surface of the base substrate, a data line disposed on the base substrate, and a pixel electrode disposed on the base substrate.

Abstract: This invention relates to a method of forming fine pattern that is adaptive for forming a fine pattern without limit of an exposure resolution, a liquid crystal display device and a fabricating method. The method of forming fine pattern comprises forming a photo-resist pattern on a transparent conductive layer. The photo-resist pattern having a minimum line width corresponding to an exposure resolution of an exposure device. The method further comprises over-etching the transparent conductive layer by an etching process using the photo-resist pattern as a mask to form an electrode pattern having a line width narrower than the exposure resolution of the exposure device.

Abstract: An ink composition used in a roll printing process and A method of forming a pattern on a substrate using the same are disclosed. The ink composition used in a roll printing process includes polymer or oligomer, a rosin ester based tackifier, and solvent. The method of forming a pattern on a substrate includes forming an organic film by coating an ink composition on the outer circumferential surface of a roller, forming a preliminary pattern on the outer circumferential surface of the roller, and allowing the preliminary pattern to adhere to the substrate.

Abstract: A composition for removing a conductive material and a manufacturing method of an array substrate using the composition, wherein the composition may include a nitric acid of about 3 to 15 wt %, a phosphoric acid of about 40 to 70 wt %, an acetic acid of about 5 to 35 wt %. The composition may further include a chlorine compound of about 0.05 to 5 wt %, a chlorine stabilizer of about 0.01 to 5 wt %, a pH stabilizer of about 0.01 to 5 wt %, and water of residual quantity.

Abstract: Disclosed is a substrate processing apparatus to supply processing liquid having a predetermined flow rate and concentration to a substrate processing unit of the substrate processing apparatus with high accuracy. The substrate processing apparatus processes substrates in a plurality of substrate processing units by using the processing liquid supplied from a processing liquid supply part. If the flow rate of the processing liquid simultaneously used by the substrate processing units is less than a control flow rate that is controllable at the processing liquid supply part, the processing liquid is supplied from the processing liquid supply part such that the flow rate of the processing liquid is substantially identical to the control flow rate.

Abstract: A method of manufacturing a liquid crystal device provided with a liquid crystal layer held between a pair of substrates opposed to each other, and an oriented film disposed between at least one of the substrates and the liquid crystal layer, includes: (a) providing an inorganic oriented film to the one of the substrates; (b) forming a first organic film with a first silane-coupling agent, the first organic film randomly covering a surface of the inorganic oriented film with a predetermined coverage factor smaller than 1; and (c) forming, after step (b), a second organic film with a second silane-coupling agent having a carbon number different from a carbon number of the first silane-coupling agent, the second organic film covering the surface exposed from the first organic film, thereby forming the oriented film composed mainly of the first organic film, the second organic film, and the inorganic film.

Abstract: The apparatus for processing a substrate includes a substrate carrier for carrying a substrate, a chemical-applying unit for applying chemical to the substrate, and a gas-applying unit for applying gas atmosphere to the substrate.

Abstract: The present invention provides an etchant composition containing 60 to 75 wt % of phosphoric acid (H3PO4), 0.5 to 15 wt % of nitric acid (HNO3), 2 to 15 wt % of acetic acid (CH3COOH), and 0.1 to 15 wt % of aluminum nitrate (Al(NO3)3).

Abstract: Disclosed are various embodiments of methods and systems related to stimulus responsive nanoparticles. In one embodiment includes a stimulus responsive nanoparticle system, the system includes a first electrode, a second electrode, and a plurality of elongated electro-responsive nanoparticles dispersed between the first and second electrodes, the plurality of electro-responsive nanorods configured to respond to an electric field established between the first and second electrodes.

Abstract: An etchant composition, and methods of patterning a conductive layer and manufacturing a flat panel display device using the same are provided. The etchant composition may include phosphoric acid, nitric acid, acetic acid, water and an additive, wherein the additive includes a chlorine-based compound, a nitrate-based compound, and an oxidation regulator. In addition, the flat panel display device may be manufactured by patterning a gate electrode, source/drain electrodes and a pixel electrode using the same etchant composition. The gate electrode, source/drain electrodes and the pixel electrode may be formed of different conductive materials. Accordingly, processes are simplified so that manufacturing costs may be reduced and productivity may be improved.

Abstract: A method for forming a pattern includes forming a resist pattern on a printing roll, printing a multi-stepped resist pattern on an etching object layer formed on a substrate by using the printing roll and etching the etching object layer by using the printed resist pattern as a mask.

Abstract: A light source device is formed by a plasma formation chamber including a plasma formation region where plasma is formed by electrodeless discharge to generate light and an optical window defining the lower end of the plasma region in the plasma formation chamber and transmitting the light. A microwave transmitting window is formed in the plasma chamber for introducing microwaves for generating the plasma. Furthermore, outside of the microwave transmitting window, a microwave antenna is connected to the microwave window for introducing the microwaves.

Abstract: A system and method for performing high flow rate dispensation of a chemical onto a photolithographic component are disclosed. The system and method includes providing a photolithographic component in a manufacturing tool. The photolithographic is positioned at a predetermined distance from a nozzle dispensing a chemical. Dispensation of a chemical at a high flow rate onto a photolithographic component, the rate of flow operable to reduce harmful effects from occurring on the surface of the photolithographic substrate.

Abstract: A digital watermark which is incorporated, perceptibly or imperceptibly, into a diffractive device such as a hologram. When applied to protect and/or authenticate a document of value or a product, the device provides an increased degree of overt and covert security, and permits tracking of the sale, use or other parameters associated with the product and/or document of value.

Abstract: An apparatus and a method for etching insulating film prevents generation of spots by spraying etchant on a lower surface of the substrate as well as the upper surface.

Abstract: A method for manufacturing a TFT panel of an LCD device includes the steps of wet etching a multilayer metallic structure including a high-melting-point metal film (HMPM) film, Al film and another HMPM film while using side etching technique by using a photoresist mask, hot-water washing the side walls of the Al film after the wet etching, and dry etching for configuring the channel region of a TFT in each pixel, and removing the photoresist mask. The presence of the photoresist mask and the protection film prevents corrosion of Al caused by plasma of the etching gas in the dry etching.

Abstract: Disclosed is an etching apparatus enabling to increase productivity of etching glass substrates. The present invention includes an etching bath having an etchant, a plurality of sensors inside the etching bath detecting a level of the etchant, and a deionized water tube spraying a deionized water to the sensors.

Abstract: A fabrication method of an IPS mode LCD including forming a pixel electrode and a common electrode on a first substrate; forming a passivation layer on the pixel electrode and common electrode; forming a black matrix layer on a second substrate; forming a color filter layer on the black matrix layer; forming an overcoat layer on the color filter layer; and irradiating an ion beam on the passivation film on the first substrate and the overcoat layer on the second substrate to perform an orientation treatment of the passivation film and the overcoat layer. The common electrode, the pixel electrode, the gate line and the data line are formed in a stripe configuration or a zigzag configuration. In a zigzag configuration, there is at least one bent portion in the configuration.

Abstract: A substrate etching apparatus includes a chamber in which first and second insulating substrates are received, a blocking shutter, and a first spray head. The first spray head is arranged in the chamber and sprays an etchant toward the first insulating substrate. The blocking shutter surrounds end portions of the first and second substrates and isolates a first area in which the first insulating substrate is positioned from a second area in which the second insulating substrate is positioned.

Abstract: A method for fabricating a liquid crystal display device is disclosed. The method includes forming a first conductive layer on an insulating substrate, forming a first insulating layer, a second conductive layer, and a third conductive layer on the first conductive layer, patterning the second conductive layer and the third conductive layer, such that the third conductive layer is located on a partial region of the second conductive layer and a partial region of the third conductive layer adjacent to the first conductive layer is removed, forming a second insulating layer on the patterned third conductive layer, forming a first contact hole to expose the first conductive layer by patterning the first and second insulating layers, and a second contact hole to expose the third conductive layer by patterning the second insulating layer, and forming a fourth conductive layer to connect the first and third conductive layers with each other by way of the first and second contact holes.

Abstract: A method of fabricating an array substrate for a liquid crystal display device is provided.