Abstract: A dry etching method for forming tungsten wiring having a tapered shape and having a large specific selectivity with respect to a base film is provided. If the bias power density is suitably regulated, and if desired portions of a tungsten thin film are removed using an etching gas having fluorine as its main constituent, then the tungsten wiring having a desired taper angle can be formed.

Abstract: In a liquid crystal display device, a method for creating desirable pretilt angle by means of topography of the substrates, such as a surface that is sloped with respect to the surface of the electrodes. In combination with a low pretilt but highly photo-stable alignment layer, which may be very resistant to high levels of ultraviolet radiation, a high pretilt and photo-stable alignment structure is generated, by essentially combining two incompatible technical approaches. The ever more stringent requirements for projection displays are met. The methods for producing such sloped surfaces and the considerations related to design of the sloped surfaces are disclosed.

Abstract: The present invention provides for a method for the fabrication of microchannels, and more particularly to the fabrication of microchannels for use in Microelectromechanical (MEMS) devices and MEMS related devices. In accordance with an embodiment of the present invention, microchannels are formed by a microfabrication method utilizing electronic imaging techniques in combination with chemical etching and subsequent metallization. The method of the present invention is effective in producing networks of channels in liquid crystal polymer (LCP) polymeric substrates which are highly defined in terms of their patterns, and thus are able to encompass a wide variety of end uses.

Abstract: A method and apparatus is provided for controlling the etch profile of a multilayer layer stack by depositing a first and second material layer with differential etch rates in the same or different processing chamber.

Abstract: A method of fabricating a thin film pattern improve the life of a blanket and reduce the cost and improve reliability in forming the thin film pattern. The method includes injecting an etch resist solution into a blanket on a printing roller, wherein the etch resist solution includes a printing solvent that satisfies the condition 6>?solvent or ?solvent>11, where ?solvent is the solubility parameter of the solvent, or satisfies the condition 6<?solvent<11 and ?<2(D), where ? is the dipole moment of the solvent; rotating the printing roller to uniformly coat the etch resist solution on the blanket; rolling the printing roller coated with the etch resist solution onto a printing plate to pattern the etch resist solution to thereby form an etch resist pattern; transferring the etch resist pattern from the printing roller to a substrate; hardening the etch resist pattern; and forming a desired thin film pattern on the substrate using the etch resist pattern.

Abstract: A method for manufacturing a printing plate is realizes a precise and fine pattern by minimizing a variation of etching critical dimension. The method includes forming a hard mask having an opening on an insulating substrate; forming a first trench having a first depth in the insulating substrate using the hard mask; coating, patterning and developing a first photoresist over an entire surface of the insulating substrate including the hard mask; and forming at least a second trench having a second depth in the insulating substrate using the hard mask, wherein the second depth is deeper than the first depth.

Abstract: A directed energy source is applied to a portion of a material, creating at least one altered region and leaving at least one unaltered region. The material is exposed to an etchant which removes the at least one altered region leaving substantially all of the unaltered region.

Abstract: An LCD is fabricated using a diffraction mask with transmissive, semi-transmissive, and opaque regions. The semi-transmissive region permits formation of a transmission, reflection, or pixel electrode, depending on the type of LCD being fabricated, using the same masking process as that to produce contact holes in an insulating film and a conductive layer. Photoresist exposed through the semi-transmissive region is partially removed during developing that completely removes photoresist in the transmissive or opaque region. The contact holes are formed in the region in which the photoresist is completely removed, the photoresist and underlying conductive layer in the semi-transmissive region are then removed, and the remaining photoresist is stripped.

Abstract: A method for fabricating an LCD device is disclosed, in which a reliable thin film pattern is formed as process deviation is minimized. The method includes forming a thin film on a substrate; forming an etch resist solution on the thin film; applying a soft mold having a concave portion and a convex portion to the etch resist solution, wherein the convex portion includes a first width and a second width different than the first width; forming an etch resist pattern having a predetermined linewidth controlled by the pressure applied by the soft mold; hardening the etch resist pattern; separating the soft mold from the substrate; and patterning the thin film using the etch resist pattern as a mask.

Abstract: Methods for repairing patterned structure of electronic devices. A first substrate with a patterned structure thereon is provided, wherein the patterned structure includes at least one defect. The defect corresponds to a defect region while the patterned structure corresponds to a main region. A first surface treatment is performed on the defect region such that the surface characteristics on the defect region are different from those on the main region. The defect region is repaired by inkjet printing. A second surface treatment is performed on the defect region such that the surface characteristics on the defect region are the same as those on the main region.

Abstract: A system and method for providing corrosion protection for a magnetic read/write head is disclosed. A monolayer surface coating is applied to cover those portions of the under layer of a magnetic read/write head not already covered by a previously applied diamond-like coating. This allows for a thinner diamond like coating than previously applied in the art. The monolayer surface coating can be a self-assembled monolayer, such as an organosilicon for hydroxylated surfaces or carboxylic acids for aluminum or other metal oxides. Alternatively, the monolayer surface coating can be directly applied to the under layer with no diamond-like coating being present. The monolayer surface coating can be applied by a surface immersion process or by a vacuum coating process.

Abstract: A method of manufacturing a liquid crystal display apparatus includes forming at least one assembly for forming a plurality of finished liquid crystal display apparatuses, by opposing two glass substrates to have a space therebetween and sealing a periphery of the space between the two glass substrates by an outer peripheral seal member. Outer surfaces of the two glass substrates are etched by soaking the assembly in an etching solution within an etching bath while maintaining a temperature and a concentration of the etching solution within the etching bath at a substantially constant temperature and at a substantially constant concentration. The etched outer surfaces of the glass substrates are flattened by polishing the outer surfaces of the glass substrates.

Abstract: A method of patterning a transparent conductive film adaptive for selectively etching a transparent conductive film without any mask processes, a thin film transistor for a display device using the same and a fabricating method thereof are disclosed. In the method of patterning the transparent conductive film, an inorganic material substrate is prepared. An organic material pattern is formed at a desired area of the inorganic material substrate. A thin film having a different crystallization rate depending upon said inorganic material and said organic material is formed. The thin film is selectively etched in accordance with said crystallization rate.

Abstract: A method of manufacturing a display device includes a cell forming step of forming a predetermined number of cells on a mother substrate, a first polishing step of chemically polishing an outer surface of the mother substrate with use of a predetermined polishing solution, a dividing step of dividing the chemically polished mother substrate so as to include a number of cells, which is less than the predetermined number, and a second polishing step of mechanically polishing the outer surface of the divided mother substrate with use of a solid polishing agent.

Abstract: A method for forming a pattern is provided that includes: providing a cliché having a plurality of convex patterns; applying an adhesive force reinforcing agent onto each surface of the convex patterns; forming an etching object layer on a substrate and then applying ink onto an upper portion of the etching object layer; attaching the cliché and the substrate to each other such that the convex patterns onto which the adhesive force reinforcing agent is applied can come in contact with the ink applied onto the etching object layer; and forming ink patterns which selectively remain on the etching object layer by separating the substrate and the cliché from each other.

Abstract: A method of fabricating a flat panel display device including: coating an etch-resist on a thin film; forming a soft mold having a groove and a protrusion for patterning the thin film; treating an end surface of the protrusion; applying the soft mold to the etch-resist to form an etch-resist pattern; separating the soft mold from the etch-resist pattern; and etching the thin film by using the etch-resist pattern to form a thin film pattern.

Abstract: A method for removing color resist from an exposure alignment mark. In an embodiment, a color resist layer is formed over a color filter substrate with an alignment mark thereon. A concentric tube system is provided with an outer tube surrounding an inner tube. A solvent is injected via the inner tube to contact and dissolve the color resist directly overlying the alignment mark. The dissolved color resist is extracted by the outer tube of the concentric tube system to expose the alignment mark. By repeating the dissolving and extraction steps, all alignment marks on the color filter substrate are consequently uncovered for subsequent exposure alignment.

Abstract: A method is provided for manufacturing an electro-optical device, in which fine scratches or cracks can be removed by etching without damaging wiring, an electro-optical device, and an electronic apparatus. According to the method, a liquid crystal panel used in an electro-optical device is cut as a single product. Then, before an IC mounting step, in a state of the single product liquid crystal panel, a wet etching is performed on the cut faces and edges of the first and second substrates to remove fine scratches or cracks from the cut faces and edges of the substrates. At this time, wiring portions, IC mounting terminals, substrate mounting terminals, and alignment marks, which are formed on the protruding region, are covered with a protection layer.

Abstract: A method for manufacturing a liquid crystal display to prevent seal opening and perform a Tape Automated Bonding (TAB) repair process. The method includes depositing an organic passivation layer on an entire area of a lower substrate where TFTs, data bus lines and data pads are formed, forming contact holes on source/drain electrodes, removing the organic passivation layer from a data pad area and a gate pad area, and using the organic passivation layer with contact holes as a mask, wherein the gate pad area is opened, and forming a reflection electrode or a pixel electrode on the lower substrate.

Abstract: The present invention relates to improvements in methods of manufacture of substrates which can be used in varying shapes and sizes for various authenticating or security applications, which combine the advantages of indicia formed from metallisation or demetallisation of a security element and the colorshift effects of liquid crystal materials. The invention therefore provides a method of manufacturing a substrate comprising the steps of applying a darkly colored resist to at least a part of a metallic layer on one side of a substantially transparent polymeric film, removing metal from areas not covered by the resist to form demetallised regions and applying a polymeric liquid crystal material over the resist and the demetallised regions.

Abstract: A method for forming a transparent electrode film is provided. The method includes: forming an insulating film on a substrate material, forming a contact hole in the insulating film, and coating a region where a transparent conductive film is to be formed with a liquid containing a precursor of the transparent conductive film. The liquid coats any unnecessary insulating film formed on the substrate material inside the contact hole when the contact hole is formed. The liquid is a solvent containing fluorine capable of dissolving the unnecessary insulating film. By annealing the liquid to volatilize the components of the unnecessary insulating film dissolved in the precursor substance of the transparent conductive film, the unnecessary insulating film is removed.

Abstract: A method for forming uniform, sharply defined periodic regions of reversed polarization within a unidirectionally polarized ferroelectric material proceeds as a two-step process. First, alignment keys are formed on upper and lower planar surfaces of a unidirectionally polarized ferroelectric material by producing a spaced pair of alignment key shaped domain reversed regions and etching alignment key shaped notches in the upper and lower surfaces where the domain reversed regions intersect the surface planes. These notches, being vertically aligned between the upper and lower surfaces, are then used to align photomasks over a surface coating of photoresist formed directly on the material surface or on SiO2 layers coating the material surface.

Abstract: Multilayer cathode backplate structures are provided for use with a field emitter in display panels. Processes for making the structures are also disclosed. The backplate structures are made of a plurality of electrodes separated by one or more patterned layers of a dielectric composition, each said patterned layer being formed by firing a thick film dielectric composition which has been patterned by diffusion patterning.

Abstract: The invention relates to an optically variable marking comprising a semiopaque substrate with a first surface that is covered with an optically variable layer that is for example a liquid crystal polymer layer or a layer comprising pearlescent pigments, and a second surface that is partially covered with a metal layer in the shape of a pattern, to methods of its preparation and to its use for decorative or security applications.

Abstract: A method for fabricating an optical interference display cell is described. A first electrode and a sacrificial layer are sequentially formed on a transparent substrate and at least two openings are formed in the first electrode and the sacrificial layer to define a position of the optical interference display cell. An insulated heat-resistant inorganic supporter is formed in each of the openings. A second electrode is formed on the sacrificial layer and the supporters. Finally, a remote plasma etching process is used for removing the sacrificial layer.

Abstract: A method of fabricating a liquid crystal display panel includes preparing an upper substrate and a lower substrate, bonding the upper substrate to the lower substrate, cleaning exposed surfaces of the bonded upper and lower substrates, and eliminating the exposed surfaces of the bonded upper and lower substrates.

Abstract: A plurality of scan lines and gate electrodes are formed on a pixel array area of a substrate, and a plurality of bottom pad electrodes are formed on a gate and a source pad area of the substrate. An insulating layer and a plurality of active layers are formed on the substrate. A plurality of signal lines, source/drain electrodes are formed on the pixel array area, and a plurality of top pad electrodes are formed on the gate and the source pad area. A circuit testing process is performed. A passivation layer having via holes is formed on the pixel array area, and a plurality of contact holes are formed in the gate and the source pad area. A patterned transparent conductive layer filling the via holes and the contact holes is formed on the substrate.

Abstract: A method and apparatus for the manipulation of colloidal particulates and biomolecules at the interface between an insulating electrode such as silicon oxide and an electrolyte solution. Light-controlled electrokinetic assembly of particles near surfaces relies on the combination of three functional elements: the AC electric field-induced assembly of planar aggregates; the patterning of the electrolyte/silicon oxide/silicon interface to exert spatial control over the assembly process; and the real-time control of the assembly process via external illumination. The present invention provides a set of fundamental operations enabling interactive control over the creation and placement of planar arrays of several types of particles and biomolecules and the manipulation of array shape and size. The present invention enables sample preparation and handling for diagnostic assays and biochemical analysis in an array format, and the functional integration of these operations.

Abstract: Due to lights with different wavelengths having different indexes of refraction in a liquid crystal, a retardation between lights with different wavelengths occurs and causes the problem of viewing angle of the liquid crystal display. The present invention provides a manufacturing method of light-guiding apparatus of a liquid crystal display to form light-guiding pillars having a characteristic of total reflection as a fiber. The light from back light module through the light-guiding pillars enters the liquid crystal at an incident angle smaller than 150 for reducing the retardation between lights with different wavelengths.

Abstract: A method and apparatus for the manipulation of colloidal particulates and biomolecules at the interface between an insulating electrode such as silicon oxide and an electrolyte solution. Light-controlled electrokinetic assembly of particles near surfaces relies on the combination of three functional elements: the AC electric field-induced assembly of planar aggregates; the patterning of the electrolyte/silicon oxide/silicon interface to exert spatial control over the assembly process; and the real-time control of the assembly process via external illumination. The present invention provides a set of fundamental operations enabling interactive control over the creation and placement of planar arrays of several types of particles and biomolecules and the manipulation of array shape and size. The present invention enables sample preparation and handling for diagnostic assays and biochemical analysis in an array format, and the functional integration of these operations.

Abstract: A composite liquid crystal panel includes a plurality of liquid crystal panels and a picture display surface. It cuts the border of each liquid crystal panel to a width of only one pixel, then bonding the panels together, installing the picture display surface on the liquid crystal panel, and distributing a portion of light from the normal pixels adjoining the border to the pixels corresponding to the border to resolve the gap problem. Light distribution is accomplished by using a pair of mirrors and a pair of reflecting surfaces to reflect the light of the pixels, so that light may be reflected above the pixels on the border and generate light. Then the pixels on the border and the pixels adjoining the border are redefined to form an image dot. Finally, through redistributing the light, the seams on the border may be completely eliminated.

Abstract: A method of fabricating a liquid crystal display device includes providing a cliché having a plurality of grooves, each of the grooves having different depths and widths, filling resist material into the plurality of grooves, transferring the resist filled in the grooves onto a printing roll to form a plurality of resist portions along a circumference of the printing roll, and applying the resist portions onto a surface of an etching layer, wherein the applied resist portions form a resist pattern along the surface of the etching layer.

Abstract: A liquid crystal display device is disclosed, which can remove a defect generated from polishing and etching of a glass substrate. The LCD device includes first and second substrates assembled together with some spaces therebetween, each having an etched outer surface, and a passivation film outside the first and second substrates. In the LCD device, the passivation film such as BCB or photo-acrylate is formed on a surface of a glass substrate damaged by etching and polishing processes, so as to repair the damaged surface of the glass substrate.

Abstract: A process for providing a metal-seeded liquid crystal polymer comprising the steps of providing a liquid crystal polymer substrate to be treated by applying an aqueous solution comprising an alkali metal hydroxide and a solubilizer as an etchant composition for the liquid crystal polymer substrate. Further treatment of the etched liquid crystal polymer substrate involves depositing an adherent metal layer on the etched liquid crystal polymer substrate. An adherent metal layer may be deposited using either electroless metal plating or vacuum deposition of metal such as by sputtering. When using electroless metal plating, a tin(II) solution applied to the liquid crystal polymer provides a treated liquid crystal polymer substrate to which the application of a palladium(II) solution provides the metal-seeded liquid crystal polymer. The etchant composition comprises a solution in water of from 35 wt. % to 55 wt. % of an alkali metal salt, and from 10 wt. % to 35 wt.

Abstract: In a method of manufacturing a device which includes processes in which a plurality of unit regions (first bits D1 and second bits D2) are established upon a substrate in the form of a lattice, and in which liquid drops are discharged by an ink device in each unit region, when a first bitmap which is made up from a plurality of the first bits D1 and a second bitmap which is made up from a plurality of the second bits D2 whose size is different from that of the first bits D1 have been established, the highest common divisor of the size of the first bits D1 and the size of the second bits D2 is calculated, this highest common divisor is taken as the size of third bits D3, the first bitmap and the second bitmap are re-set to the third bits, and the liquid drops are discharged in positions regulated by the third bitmap.

Abstract: A composite liquid crystal panel includes a plurality of liquid crystal panels and a picture display surface. It cuts the border of each liquid crystal panel to a width of only one pixel, then bonding the panels together, installing the picture display surface on the liquid crystal panel, and distributing a portion of light from the normal pixels adjoining the border to the pixels corresponding to the border to resolve the gap problem. Light distribution is accomplished by using a pair of mirrors and a pair of reflecting surfaces to reflect the light of the pixels, so that light may be reflected above the pixels on the border and generate light. Then the pixels on the border and the pixels adjoining the border are redefined to form an image dot. Finally, through redistributing the light, the seams on the border may be completely eliminated.

Abstract: Substantially transparent electrodes are formed on a substrate by a process including forming on the substrate, in order, a bottom high index layer, a metallic conductive layer, and a top high index layer with a conductivity of at least about 400 ?/square; and chemically etching the bottom high index layer, the top high index layer and the conductive layer to form discrete electrodes in the metallic conductive layer.

Abstract: A thin-film device is fabricated by forming a protective layer and a thin-film device layer one by one on a first substrate and bonding a second substrate on the thin-film device layer via a first adhesive layer or a coating layer and first adhesive layer, removing the first substrate at least in a part thereof by etching with a chemical solution, bonding the protective layer, which covers the thin-film device layer on a side of the first substrate, to a third substrate via a second adhesive layer, and removing the second substrate. The protective layer is formed of at least two layers having resistance to the chemical solution used upon removal of the first substrate.

Abstract: A thin film formation method in accordance with the present invention forms banks (110) where affinity bank layers and non-affinity bank layers are alternately layered by repeating a step of forming an affinity bank layer (111-11n) with a material having affinity for a thin film material solution (130) (such inorganic material as SiO2) and a step of forming a non-affinity bank layer (121-12n) with a material having non-affinity for the thin film material solution (130) (such organic material as resist) one or more times. Finally the thin film material solution (130) is filled between banks by an ink jet method, heat treatment is executed, and a thin film layer (131-13n) is sequentially layered. By these steps, cost required for affinity control can be decreased and forming multi-layer thin films with uniform film thickness becomes possible.

Abstract: A pixel electrode employs a transparent electrode made from indium-zinc-oxide (IZO) that is capable of preventing damage and bending thereof. In a liquid crystal display device containing pixel electrodes, the transparent electrode is made from indium-zinc-oxide (IZO) having an amorphous structure so that it can be etched within a short period of time with a low concentration of etchant. Accordingly, it is possible to prevent damage and bending of the transparent electrode upon the patterning thereof.

Abstract: A thin flat panel display which can be simply manufactured, and a method for manufacturing the same. An etchable upper substrate and an etchable lower substrate are prepared. Image display means are formed on an inner surface of the lower substrate in such a way that if two or more image display means are provided, each of the image display means are isolated from each other. The upper and lower substrates are combined together so that the image display means are individually sealed up. The outer surfaces of the upper and lower substrates are etched. The combined upper and lower substrates are cut in units of an image display means.

Abstract: A method is provided for manufacturing an electro-optical device, in which fine scratches or cracks can be removed by etching without damaging wiring, an electro-optical device, and an electronic apparatus. According to the method, a liquid crystal panel used in an electro-optical device is cut as a single product. Then, before an IC mounting step, in a state of the single product liquid crystal panel, a wet etching is performed on the cut faces and edges of the first and second substrates to remove fine scratches or cracks from the cut faces and edges of the substrates. At this time, wiring portions, IC mounting terminals, substrate mounting terminals, and alignment marks, which are formed on the protruding region, are covered with a protection layer.

Abstract: Fabrication of a reflective spatial light modulator including a micro-mirror array. In one embodiment, the micro mirror array is fabricated from a substrate that is a single crystal material by only two main etching steps. A first etch forms cavities in a first side of the material. A second etch forms support posts, a vertical hinge, and a mirror plate. Between the first and second etches, the substrate can be bonded to addressing and control circuitry.

Abstract: A method for forming a pattern using a printing process is disclosed in the present invention. The method includes providing a substrate having an etching layer formed thereon, locating a master having at least one opening in the etching layer, filling a resist in the at least one opening of the master, and separating the master from the substrate to leave the resist on the substrate.

Abstract: A method for manufacturing a TFT panel of an LCD device includes the steps of wet etching a multilayer metallic structure including a high-melting-point metal film (HMPM) film, Al film and another HMPM film while using side etching technique by using a photoresist mask, hot-water washing the side walls of the Al film after the wet etching, and dry etching for configuring the channel region of a TFT in each pixel, and removing the photoresist mask. The presence of the photoresist mask and the protection film prevents corrosion of Al caused by plasma of the etching gas in the dry etching.

Abstract: The present invention is directed to a method for placing spacer uniformly and securely onto the substrate of a liquid crystal display element, comprising the steps of: (a) Preparing an UV [or thermal] curable resin containing spacer particles. (b) Dispersing certain amount of above spacer-resin mixture on a gravure cylinder with well finished designed cells to be used as the spacer-resin carrier. (c) Removing excess spacer-resin mixture and forced on spacer particle with resin into each hole by means of doctor knife. (d) Transferring individual spacer-resin onto a second smooth surfaced roller according to the designed pattern by means of contact. (e) Transferring individual patterned spacer-resin onto the surface of substrate of a liquid crystal display element from the second roller with any conventional coating methods. Likewise, the edge sealant for LCD can be placed by a similar method.

Abstract: The present invention provides a polymer in which coumarin, a photo-reactive molecule, is grafted onto a polyimide for preparing liquid crystal alignment layer which has a superior alignment property and an excellent thermal stability in photo-alignment, a process for preparing the said grafted polymer, a process for preparing liquid crystal alignment layer by employing the said grafted polymer, and a liquid crystal alignment layer prepared by the process. The polymer of the invention is prepared by mixing a coumarin compound with a polyimide, dissolving the mixture in an organic solvent, adding a catalyst, and stirring under an environment of N2 gas. The polymer of the invention is superior in terms of the thermal stability, which makes possible its universal application for the development of a novel liquid crystal display(LCD).

Abstract: A device for cutting a liquid crystal display panel and a method for cutting using the same are disclosed in the present invention. The device includes a first scribing unit having first and second wheels for forming a first scribing line on surfaces of first and second mother substrates that are bonded to each other, a first breaking unit for breaking the first and second mother substrates along the first scribing line, a first rotating unit for rotating the first and second mother substrates to form a second scribing line.

Abstract: A combined wet etching method for stacked films which is capable of performing etching processes in a collective manner while controlling an amount of side-etching on each of stacked films and of making uniform side edges. In the wet etching method, two or more types of etching methods are performed in combination, on stacked films containing first and second films being deposited sequentially on a substrate and each having a different film property. The two or more types of wet etching methods include, at least, a first wet etching method in which side-etching on the first film is facilitated more than side-etching on the second film and a second wet etching method in which side-etching on the second film is facilitated more than side-etching on the first film.

Abstract: An indium tin oxide (ITO) film is formed at room temperature in a moistened (water added) atmosphere, and the formed film is thermally treated at 180° C. or more for about one hour or longer. The water added atmosphere is determined to have a total partial pressure of water of about 8.2×10−3 pascals or less in a film forming chamber, so that an effect of improving film quality by annealing in a later step can be produced. When a total partial pressure of water in the film forming chamber is set to 3.20×10−3 pascals or more, an amorphous ITO film can be formed, and an etching treatment can be performed quickly after forming the film. A heat treatment after forming the film (patterning) is appropriately performed under conditions of a temperature of about 180° C. or more (e.g., about 220° C.) for one hour or more (e.g., about one hour to about three hours). Thus, the film is polycrystallized, and an ITO film having low resistance and high transmittance can be produced.