Electrode Structure Patents (Class 219/121.52)
  • Patent number: 6903301
    Abstract: A contact start plasma arc torch is provided that comprises an electrode, a tip, and an initiator that is resiliently biased into contact with the tip, the initiator being movable against the resilient bias to separate from the tip and establish a pilot arc between the initiator and the tip. The initiator is disposed within a start cartridge, which preferably comprises a coil spring that biases the initiator into contact with the tip. The plasma arc torch further comprises a plurality of head vent holes to vent gas from within the start cartridge during operation of the torch. Additionally, the tip defines a plurality of swirl holes and secondary gas holes to generate and control a plasma stream that is subsequently blown from a central exit orifice in the tip.
    Type: Grant
    Filed: February 26, 2002
    Date of Patent: June 7, 2005
    Assignee: Thermal Dynamics Corporation
    Inventors: Joseph P. Jones, Kevin D. Horner-Richardson, Shiyu Chen, Roger W. Hewett
  • Patent number: 6897402
    Abstract: The invention recites a plasma-arc spray gun comprising a cathode and an anode defining a longitudinal axis. The anode further includes an external surface and an internal chamber, the internal chamber extending from a first end to a second end. At least a portion of the internal chamber is defined by revolving a non-linear curve about the longitudinal axis. The plasma-arc spray gun also includes a gun body supporting the cathode and the anode.
    Type: Grant
    Filed: May 15, 2002
    Date of Patent: May 24, 2005
    Assignee: Thermal Spray Technologies, Inc.
    Inventor: Daryl E. Crawmer
  • Patent number: 6888092
    Abstract: Electrode and nozzle that seat within a retaining member and in two different seating locations relative to retaining member. The electrode and nozzle each include an interwoven-double-start thread having two thread cuts, which start 180 degrees from one another as measured around the circumference of the electrode or nozzle. Further, the electrode, nozzle, and retaining member include mating frustum surfaces, which are configured and dimensioned so that the electrode and nozzle seat within the retaining member with less than one turn of the electrode and nozzle relative to the retaining member. Therefore, the electrode and nozzle may be quickly inserted in, and removed from, the retaining member.
    Type: Grant
    Filed: June 24, 2004
    Date of Patent: May 3, 2005
    Assignee: American Torch Tip
    Inventor: Jeffrey Walters
  • Patent number: 6888093
    Abstract: A plasma arc torch includes a first consumable component having a longitudinally extending connection end. A second component in a coaxial relationship with the first consumable component has a bore defined therein into which the connection end of the first component extends. The bore includes a contact surface defined substantially perpendicular to a longitudinal axis of the torch. The connection end of the first component includes a contact shoulder defined substantially perpendicular to the longitudinal axis of the torch, a locking engagement section configured to engage with a corresponding section of the second component, and an alignment section extending longitudinally from the engagement section. The alignment section has a diameter closely matching that of the bore such so as to minimize axial misalignment between the first consumable component and the second component. The first consumable component may be an electrode.
    Type: Grant
    Filed: June 26, 2003
    Date of Patent: May 3, 2005
    Assignee: Innerlogic, Inc.
    Inventor: Steven F. Hardwick
  • Patent number: 6881921
    Abstract: A plasma arc torch has a threadless electrode-cathode locking assembly, a one-piece tip assembly, and a rotational contact starting mechanism. The cathode and electrode of the locking assembly are configured such that relative rotation of the electrode with respect to the cathode causes the electrode to move in an axial direction relative to the cathode for locking the electrode in fixed axial and rotational position with respect to the cathode. The inner wall of the one-piece tip assembly is configured to receive the forward end of the electrode in a non-contact position. Rotation of the electrode with respect to the tip causes an arcing formation on the electrode to contact an arcing chamber within the cavity. Rotation of the electrode away from the tip generatesa pilot arc in the arcing chamber.
    Type: Grant
    Filed: May 22, 2003
    Date of Patent: April 19, 2005
    Assignee: Thermal Dynamics Corporation
    Inventors: Kevin D. Horner-Richardson, Pearl A. Grant, Roger W. Hewett, Gene V. Hewes, Howard H. Horn
  • Patent number: 6872909
    Abstract: Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.
    Type: Grant
    Filed: April 16, 2003
    Date of Patent: March 29, 2005
    Assignee: Applied Science and Technology, Inc.
    Inventors: William M. Holber, Xing Chen, Andrew B. Cowe, Matthew M. Besen, Ronald W. Collins, Jr., Susan C. Trulli, Shouqian Shao
  • Patent number: 6872908
    Abstract: There is provided a susceptor with a built-in electrode and a manufacturing method therefor, in which there is no danger of corrosive gas or plasma or the like penetrating to the inside of the substrate, which has excellent corrosion resistance and plasma resistance, in which nonconductivity under high temperatures is improved, and in which leakage current does not occur.
    Type: Grant
    Filed: October 11, 2002
    Date of Patent: March 29, 2005
    Assignee: Sumitomo Osaka Cement Co., Ltd.
    Inventors: Takeshi Ootsuka, Kazunori Endou, Mamoru Kosakai
  • Patent number: 6841754
    Abstract: A plasma arc torch that includes a torch body having a nozzle mounted relative to a composite electrode in the body to define a plasma chamber. The torch body includes a plasma flow path for directing a plasma gas to the plasma chamber in which a plasma arc is formed. The nozzle includes a hollow, body portion and a substantially solid, head portion defining an exit orifice. The composite electrode can be made of a metallic material (e.g., silver) with high thermal conductivity in the forward portion electrode body adjacent the emitting surface, and the aft portion of the electrode body is made of a second low cost, metallic material with good thermal and electrical conductivity. This composite electrode configuration produces an electrode with reduced electrode wear or pitting comparable to a silver electrode, for a price comparable to that of a copper electrode.
    Type: Grant
    Filed: March 8, 2002
    Date of Patent: January 11, 2005
    Assignee: Hypertherm, Inc.
    Inventors: David J. Cook, Kirk H. Ferland, Charles Hackett, Young Yang, Richard W. Couch, Zhipeng Lu
  • Patent number: 6838635
    Abstract: In accordance with one aspect of the invention, a plasma reactor has a capacitive electrode driven by an RF power source, and the electrode capacitance is matched at the desired plasma density and RF source frequency to the negative capacitance of the plasma, to provide an electrode plasma resonance supportive of a broad process window within which the plasma may be sustained.
    Type: Grant
    Filed: November 5, 2002
    Date of Patent: January 4, 2005
    Inventors: Daniel J. Hoffman, Gerald Zheyao Yin
  • Publication number: 20040232114
    Abstract: Electrode and nozzle that seat within a retaining member and in two different seating locations relative to retaining member. The electrode and nozzle each include an interwoven-double-start thread having two thread cuts, which start 180 degrees from one another as measured around the circumference of the electrode or nozzle. Further, the electrode, nozzle, and retaining member include mating frustum surfaces, which are configured and dimensioned so that the electrode and nozzle seat within the retaining member with less than one turn of the electrode and nozzle relative to the retaining member. Therefore, the electrode and nozzle may be quickly inserted in, and removed from, the retaining member.
    Type: Application
    Filed: June 24, 2004
    Publication date: November 25, 2004
    Applicant: AMERICAN TORCH TIP
    Inventor: Jeffrey Walters
  • Patent number: 6818853
    Abstract: An apparatus for producing a vacuum arc plasma source device using a low mass, compact inductive energy storage circuit powered by a low voltage DC supply acts as a vacuum arc plasma thruster. An inductor is charged through a switch, subsequently the switch is opened and a voltage spike of Ldi/dt is produced initiating plasma across a resistive path separating anode and cathode. The plasma is subsequently maintained by energy stored in the inductor. Plasma is produced from cathode material, which allows for any electrically conductive material to be used. A planar structure, a tubular structure, and a coaxial structure allow for consumption of cathode material feed and thereby long lifetime of the thruster for long durations of time.
    Type: Grant
    Filed: May 30, 2003
    Date of Patent: November 16, 2004
    Assignee: Alameda Applied Sciences Corp.
    Inventors: Jochen Schein, Andrew N. Gerhan, Robyn L. Woo, Michael Y. Au, Mahadevan Krishnan
  • Patent number: 6809287
    Abstract: An AC plasma display panel of the present invention changes the conventional disposition of three electrodes. Either the scanning electrode or sustaining electrode is disposed in the rib or on the sidewall of the rib. Also, two scanning electrodes both use the same sustaining electrode disposed on the rib. Thus, a high resolution and high precision AC plasma display panel can be obtained.
    Type: Grant
    Filed: May 28, 2002
    Date of Patent: October 26, 2004
    Assignee: Au Optronics Corp.
    Inventors: Chu-Shan Lin, Bing-Ming Ho, Jin-Yuh Lu
  • Publication number: 20040206730
    Abstract: Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.
    Type: Application
    Filed: April 16, 2003
    Publication date: October 21, 2004
    Applicant: Applied Science & Technology
    Inventors: William M. Holber, Xing Chen, Andrew B. Cowe, Matthew M. Besen, Ronald W. Collins, Susan C. Trulli, Shouqian Shao
  • Publication number: 20040195219
    Abstract: A variety of electrodes for use in a plasma arc torch are provided that improve cooling between the electrode and an adjacent cathodic element such as a cathode. At least one passageway is formed between the electrode and the cathode for the flow of a fluid, e.g. cooling fluid, wherein the flow of the fluid is proximate, or through an adjacent vicinity of, electrical contact between the cathode and the electrode. The passageway is formed through the electrode, through the cathode, between the electrode and the cathode, and through a third element in the various forms of the present invention. Further, methods of operating a plasma arc torch using the electrodes according to the various forms of the invention are also provided.
    Type: Application
    Filed: January 16, 2004
    Publication date: October 7, 2004
    Inventors: Christopher J. Conway, Darrin H. MacKenzie, Milind G. Kelkar, Geoffery H. Putnam
  • Publication number: 20040195220
    Abstract: The invention relates to an emissive electrode insert formed from an alloy containing hafnium and zirconium. The insert typically contains at least 80% hafnium by weight, preferably at least 90% by weight, and 0.1 to 8% zirconium by weight, preferably 0.5 to 5% zirconium by weight. The invention also relates to a plasma torch electrode formed from an electrode body comprising a cavity into which such an emissive insert is fitted; to a plasma torch comprising such an electrode; and to a plasma cutting process for cutting a steel workpiece, in which such a plasma torch is employed.
    Type: Application
    Filed: March 10, 2004
    Publication date: October 7, 2004
    Inventor: Michel Delzenne
  • Patent number: 6781087
    Abstract: Three adjustable electrodes (33a-33c) within a chamber (40) form a thermal plasma generating system (30). The electrodes (33a-33c) are positioned with a narrow gap at one portion and a wide gap at another portion to form a cone shape. The gap between the electrodes is adjusted to accommodate for wear on the electrodes (33a-33c). An electric arc is initiated at the narrowest point between two electrodes which moves over the length of the electrodes because of a magnetic field created by the arc and the forward motion of the injected stream. At the end of the electrodes, the arc is extinguished and another arc is initiated. The continuous are moving along the electrodes ionizes a working stream that is tangentially injected from three pneumatic rings (35a-35c) which provide improved mixing of the working stream for high quality thermal plasma. The thermal plasma exits through a narrow orifice (42).
    Type: Grant
    Filed: July 18, 2003
    Date of Patent: August 24, 2004
    Assignee: Scientific Utilization, Inc.
    Inventors: Paul E. Chism, Jr., Philip G. Rutberg, Alexei A. Safronov, Vasili N. Shiriaev
  • Patent number: 6777639
    Abstract: A system and method for synthesizing nanopowder which provides for precursor material ablation from two opposing electrodes that are substantially axially aligned and spaced apart within a gaseous atmosphere, where a plasma is created by a high power pulsed electrical discharge between the electrodes, such pulse being of short duration to inertially confine the plasma, thereby creating a high temperature and high density plasma having high quench and/or reaction rates with the gaseous atmosphere for improved nanopowder synthesis.
    Type: Grant
    Filed: June 5, 2003
    Date of Patent: August 17, 2004
    Assignee: Nanotechnologies, Inc.
    Inventors: Kurt A. Schroder, Doug K. Jackson
  • Patent number: 6774335
    Abstract: This invention provides a plasma reactor for modifying gas by plasma, including a first planar electrode and a second planar electrode, the two electrodes facing opposite each other approximately in parallel; a dielectric body inserted between the first and the second electrodes; and a complex barrier discharge-generating way for providing a predetermined electric potential difference between the first and the second electrodes; wherein the first and the second electrodes are provided so as to apply complex plasma discharge to the gas to be treated fed between the electrodes, to thereby modify the gas. According to the invention, gas modification efficiency can be remarkably improved.
    Type: Grant
    Filed: May 7, 2001
    Date of Patent: August 10, 2004
    Assignees: Hokushin Corporation, Honda Giken Kogyo Kabushiki Kaisha
    Inventors: Takeshi Yanobe, Hideyuki Fujishiro, Kenji Dosaka, Minoru Torii, Kazuo Ando, Koji Kotani
  • Patent number: 6768079
    Abstract: The invention provides a susceptor with a built-in plasma generation electrode that can make the throughput by a range of plasma processing of a plate specimen uniform, and that has excellent plasma resistance, thermal conductivity and durability, and a manufacturing method that can obtain this susceptor with a built-in plasma generation electrode easily and economically.
    Type: Grant
    Filed: October 29, 2002
    Date of Patent: July 27, 2004
    Assignee: Sumitomo Osaka Cement Co. Ltd.
    Inventor: Mamoru Kosakai
  • Patent number: 6756559
    Abstract: The apparatus for etching a thin film using the plasma includes a reaction chamber having a diffusion area and a reaction area; an upper electrode disposed in the top of the reaction area; a lower electrode spaced apart from the upper electrode and arranged at the bottom of the reaction area; a RF power supply applying RF power to the upper and lower electrodes so as to form the plasmas between the upper and lower electrodes; a gas inlet applying processing gases to the diffusion area; gas-exhausting members sucking the residual plasmas and byproducts of the plasma etch; a buffer plate surrounding the lower electrode at the bottom of the reaction chamber and having a plurality of vent holes and vent hole protectors; and a shielding member between the lower electrode and the buffer plate, the shielding plate protecting the lower electrode from the plasmas.
    Type: Grant
    Filed: December 28, 2001
    Date of Patent: June 29, 2004
    Assignee: LG. Philips LCD Co., Ltd.
    Inventor: Poong-Boo Seo
  • Patent number: 6753498
    Abstract: A plasma processing system includes an automated electrode retention mechanism (130) for providing automated engagement of a source electrode (152) with a drive electrode (154). In addition, an automated electrode handling system (320) is provided that has the ability to remove a source electrode (152) from the electrode retention mechanism and replace it with a second source electrode (152′) that is stored in a staging area (340) outside the plasma processing system vacuum chamber. The system may operate automatically under program control of a computer system (200) coupled thereto.
    Type: Grant
    Filed: January 17, 2003
    Date of Patent: June 22, 2004
    Assignee: Tokyo Electron Limited
    Inventors: Murray D. Sirkis, Eric Strang, Yu Wang Bibby, John E. Cronin
  • Patent number: 6740841
    Abstract: A plasma torch including at least two electrodes separated by an insulating cylindrical case having a void, wherein the electrodes are separated by a distance (D) for forming an igniting arc therebetween when the electrodes are connected to a voltage, the distance (D) and the voltage being selected to form substantially a 1 Megavolt/meter electrical field between the electrodes, for forming an arc and causing plasma to be generated from the plasma generating material.
    Type: Grant
    Filed: November 1, 2001
    Date of Patent: May 25, 2004
    Assignee: Giat Industries
    Inventors: Luc Brunet, Jean Mary Lombard, Jean Francois Pierrot, Jean Luc Taillandier
  • Publication number: 20040094519
    Abstract: A variety of electrodes for use in a plasma arc torch are provided that improve cooling between the electrode and an adjacent cathodic element such as a cathode. At least one passageway is formed between the electrode and the cathode for the flow of a fluid, e.g. cooling fluid, wherein the flow of the fluid is proximate, or through an adjacent vicinity of, electrical contact between the cathode and the electrode. The passageway is formed through the electrode, through the cathode, between the electrode and the cathode, and through a third element in the various forms of the present invention. Further, methods of operating a plasma arc torch using the electrodes according to the various forms of the invention are also provided.
    Type: Application
    Filed: April 7, 2003
    Publication date: May 20, 2004
    Inventors: Christopher J. Conway, Kevin J. Kinerson, Mark Gugliotta, Darrin H. MacKenzie
  • Patent number: 6734386
    Abstract: A microporous PVDF membrane is rendered hydrophilic without making it brittle or lowering its heat resistance by exposing the membrane to a plasma under controlled conditions. Specifically, a microporous PVDF membrane is first coated with an appropriate monomer. After the monomer dries, the membrane is exposed to the plasma. Any remaining uncured monomer on the membrane is removed. Thereafter, the membrane is pleated and incorporated in a filter cartridge.
    Type: Grant
    Filed: February 5, 2002
    Date of Patent: May 11, 2004
    Assignee: Meissner Filtration Products, Inc.
    Inventors: Siegfried Lauterbach, Christopher A. Meissner
  • Patent number: 6734385
    Abstract: A microwave plasma burner in which a high temperature plasma is generated. The microwave plasma burner includes a wave inducing tube for receiving and guiding microwaves from an antenna of a magnetron within a wave guide resonator, so as to generate a high temperature plasma by causing vibrations of an injected gas by the help of the microwaves while discharging the injected gas. The microwave plasma burner according to the present invention gives the following effects. A strong high temperature plasma can be generated with a structure not involving vacuum. The flames are generated by the heat which is generated by the vibrations of air, and therefore, a separate igniting device is not required. High temperature flames are generated, and therefore, the burner of the present invention can be used for welding and cutting. A complete combustion occurs due to the heat which is generated by the vibrations, and therefore, any air pollution can be prevented.
    Type: Grant
    Filed: November 8, 2001
    Date of Patent: May 11, 2004
    Assignee: Dae Won Paptin Foam Co. Ltd.
    Inventors: Yoo Byung Bark, Merab I. Taktakkishvili, Sergei I. Gritsinin, Igor Kossyi
  • Publication number: 20040079736
    Abstract: A continuity device for use in a torch height control system of a plasma arc torch is provided that comprises a reattachable engagement member, a connection member, and a contact member in electrical continuity with the connection member and disposed distally from the reattachable engagement member. Accordingly, when the reattachable engagement member is secured to a proximal component of the plasma arc torch, the contact member is in electrical contact with a distal component of the plasma arc torch, thereby providing electrical continuity to the torch height control system through the connection member. Advantageously, the continuity device is reattachable and thus provides for ease of use and replacement of components, such as consumables, of the plasma arc torch. Additionally, methods of using the reattachable continuity device are provided, wherein a distal component of the plasma arc torch contacts a workpiece and electrical continuity is provided through the reattachable continuity device.
    Type: Application
    Filed: October 24, 2002
    Publication date: April 29, 2004
    Inventors: Jonathan Brasseur, Kevin D. Horner-Richardson
  • Patent number: 6723946
    Abstract: An electrolytic reactor system for producing non-joule heat has a plurality of small cells arranged in an interconnected array, wherein each cell is characterized by having a relatively small cathode separated from a relatively large anode by a small gap, with the cells immersed in an electrolytic bath.
    Type: Grant
    Filed: June 20, 2000
    Date of Patent: April 20, 2004
    Inventors: Rod F. Gimpel, Dennis J. Cravens, John S. Frick, Vince F. Golubic, Dennis G. Letts
  • Patent number: 6717096
    Abstract: A dual mode plasma arc torch is provided that preferably comprises a start cartridge disposed between an electrode and a tip. In one form, the start cartridge comprises an initiator that is in electrical contact with the electrode and that is resiliently biased into contact with the tip, such that when the plasma arc torch is in a contact start mode, the initiator is movable against the resilient bias to separate from the tip and establish a pilot arc between the initiator and the tip. Further, when the plasma arc torch is in a high frequency start mode, the start cartridge spaces the tip from the electrode such that a pilot arc is established between the electrode and the tip. In other forms, a contact start torch is provided that is operable under high frequency, and conversely, a high frequency start torch is provided that is operable under low voltage.
    Type: Grant
    Filed: February 26, 2002
    Date of Patent: April 6, 2004
    Assignee: Thermal Dynamics Corporation
    Inventors: Roger W. Hewett, Kevin D. Horner-Richardson, Joseph P. Jones, Shiyu Chen, Fred Rogers
  • Patent number: 6703580
    Abstract: The invention relates to a plasma torch (1) comprising at least two electrodes (7, 8) separated by a cylindrical insulating case (6) delimiting an internal volume, said electrodes connected by a conductive ignition fuse (11) placed in the internal volume. This torch is characterized in that the fuse (11) comprises at least one conductive material associated with at least one energetic material or one able to react with the conductive material. Application to the ignition of the propellant charge of a munition.
    Type: Grant
    Filed: November 1, 2001
    Date of Patent: March 9, 2004
    Assignee: Giat Industries
    Inventors: Luc Brunet, Jean Mary Lombard, Jean Francois Pierrot, Jean Luc Taillandier
  • Patent number: 6703581
    Abstract: A contact start plasma torch and method of starting the torch includes a negatively charged cathode body and a positively charged anode body. A conductive element in the torch is constructed of an electrically conductive material and is free from fixed connection with the cathode body and the anode body. The torch is operable between an idle mode wherein the conductive element provides an electrically conductive path between the cathode body and the anode body and an pilot mode wherein a pilot arc is formed between the conductive element and at least one of the cathode body and the anode body. The pilot arc is blown by working gas flowing through the torch toward an exit orifice of the torch whereby the working gas is exhausted from the torch in the form of an ionized plasma.
    Type: Grant
    Filed: February 27, 2001
    Date of Patent: March 9, 2004
    Assignee: Thermal Dynamics Corporation
    Inventors: Joseph P. Jones, Roger W. Hewett, Kevin D. Horner-Richardson, David A. Small
  • Patent number: 6703578
    Abstract: Exothermic reaction mixtures are electrically ignited with a low cost foil strip of two conductive strips separated by a layer of insulation. One or more holes are formed in the ignitor to create shaped spark plasma on one side and a venting plasma on the opposite side of the hole. The spark with low energy requirements is sufficient to ignite exothermic reactions for welding, casting and other uses. The ignitor may be part of reusable crucibles and molds, or expendable packages, containers, and molds, or smaller squibs for igniting larger charges. The ignitor may be immersed in or substantially adjacent the charge of exothermic material. The spark forming hole or holes is made and shaped by a punch in a simple and low cost manner. The ignitor eliminates the need for starting powders or materials and flint gun ignitors.
    Type: Grant
    Filed: February 10, 2003
    Date of Patent: March 9, 2004
    Assignee: Erico International Corporation
    Inventors: Richard E. Walker, Dean Moore
  • Patent number: 6700089
    Abstract: An upper electrode unit constituting the upper wall of a processing chamber of an etching device includes a first assembly that includes an upper electrode, a second assembly that supports the first assembly and a third assembly that includes power supply routes. After releasing a second locking mechanism and disengaging the third assembly alone with a removing mechanism, the first assembly is disengaged to perform maintenance on the upper electrode. After locking the second locking mechanism and releasing a first locking mechanism, the removing mechanism is utilized to disengage the second and third assemblies and, as a result, the processing chamber is opened to enable maintenance. By adopting the structure described above, a plasma processing device and a maintenance method thereof, that facilitate maintenance and reduce the workload imposed on the operator, are provided.
    Type: Grant
    Filed: September 28, 2001
    Date of Patent: March 2, 2004
    Assignee: Tokyo Electron Limited
    Inventor: Takaaki Hirooka
  • Patent number: 6693253
    Abstract: An induction plasma torch comprises a tubular torch body, a gas distributor head located at the proximal end of the torch body for supplying at least one gaseous substance into the chamber within the torch body, a higher frequency power supply connected to a first induction coil mounted coaxial to the tubular torch body, a lower frequency solid state power supply connected to a plurality of second induction coils mounted coaxial to the tubular torch body between the first induction coil and the distal end of this torch body. The first induction coil provides the inductive energy necessary to ignite the gaseous substance to form a plasma. The second induction coils provide the working energy necessary to operate the plasma torch. The second induction coils can be connected to the solid state power supply in series and/or in parallel to match the impedance of this solid state power supply.
    Type: Grant
    Filed: October 8, 2002
    Date of Patent: February 17, 2004
    Assignee: Universite de Sherbrooke
    Inventors: Maher Boulos, Jerzy Jurewicz
  • Patent number: 6689984
    Abstract: There is provided a susceptor with a built-in electrode that has excellent corrosion resistance and plasma resistance, and that has excellent durability to the stress of heat cycles, and a manufacturing method for a susceptor with a built-in electrode that enables the susceptor to be manufactured economically. The susceptor with a built-in electrode comprises: a susceptor substrate formed from an aluminum oxide based sintered body; an internal electrode built into the susceptor substrate; and a power supply terminal that is provided so as to make contact with this internal electrode, wherein the internal electrode is formed from an aluminum oxide and molybdenum carbide based composite sintered body containing 30 to 95 volume % of molybdenum carbide and 5 to 75 volume % of aluminum oxide.
    Type: Grant
    Filed: October 31, 2002
    Date of Patent: February 10, 2004
    Assignee: Sumitomo Osaka Cement Co., Ltd.
    Inventor: Keigo Maki
  • Patent number: 6686559
    Abstract: An electrode for supporting an arc in a plasma arc torch. The electrode includes a metallic holder having a front end and a rear end. An emissive insert cavity is formed in the front end. An emissive insert is mounted in the cavity and is a metallic material having a relatively low work function. The front end is a casting made of a metal which is selected from silver, gold, platinum, rhodium, indium, palladium, nickel and alloys thereof. The rear end is a metal selected from copper and copper alloys. A cylindrical post extends inwardly from the front end of the metallic holder. The cylindrical post has an inner-rear tip portion which is a metal selected from copper and copper alloys.
    Type: Grant
    Filed: April 2, 2002
    Date of Patent: February 3, 2004
    Assignee: The American Torch Tip Company
    Inventor: Jeffrey K. Walters
  • Patent number: 6686558
    Abstract: An inductive plasma torch operating at atmospheric pressure is used for wafer or glass substrate processing. Said torch employs a linear type of plasma confinement. This linear torch is particularly suitable for photoresist etching and processes in which it has the advantages of high chemical isotropic etch rate and low plasma damage.
    Type: Grant
    Filed: January 23, 2001
    Date of Patent: February 3, 2004
    Assignee: TimeDomain CVD, Inc.
    Inventor: Simon I. Selitser
  • Patent number: 6686555
    Abstract: A method for plasma jet welding by means of a free radio frequency-induced plasma beam wherein, the rf-induced plasma beam is generated by a procedure involving a second process gas into a tube so that it has a tangential flow component and the introduction of the plasma through a metal expansion jet at the outlet.
    Type: Grant
    Filed: August 16, 2002
    Date of Patent: February 3, 2004
    Assignees: MTU Aero Engines GmbH, DaimlerChrysler AG
    Inventors: Erwin Bayer, Stefan Laure, Jürgen Steinwandel
  • Patent number: 6683274
    Abstract: Disclosed is a wafer susceptor which includes: a ceramic body; a RF electrode mounted within the ceramic body; a heater mounted within the ceramic body and spaced apart from the RF electrode by a predetermined distance to be disposed below the RF electrode; and an RF shield of a metal material, the RF shield being electrically grounded and mounted within the ceramic body, the RF shield being disposed between the RF electrode and the heater without being in contact with either the heater or the RF electrode. In case where an RF power is applied to the RF electrode, it is possible to minimize an influence of an RF noise on the heater 24. Accordingly, since the RF power can be applied to the susceptor while heating the susceptor at a high temperature, it is possible to deposit a high-density thin film and also control properties of the thin film such as stress and step coverage. Further, the invention may take the stabilization of the power system.
    Type: Grant
    Filed: November 18, 2002
    Date of Patent: January 27, 2004
    Assignee: Junsung Engineering Co., Ltd.
    Inventors: Gi Chung Kwon, Soo Sik Yoon, Hong Sik Byun
  • Publication number: 20040011770
    Abstract: A method of and a structure for controlling the temperature of an electrode (4). The electrode is heated prior to etching the first wafer and both a (temporally) stationary and a (spatially) homogeneous temperature of the silicon electrode are maintained. Resistive heater elements (1) are either embedded within the housing of the electrode (3) or formed as part of the electrode. The resistive heater elements form a heater of a multi-zone type in order to minimize the temperature non-uniformity. The resistive heater elements are divided into a plurality of zones, wherein the power to each zone can be adjusted individually, allowing the desirable temperature uniformity of the electrode to be achieved. Preheating the electrode to the appropriate operating temperature eliminates both the “first wafer effect” and non-uniform etching of a semiconductor wafer.
    Type: Application
    Filed: April 24, 2003
    Publication date: January 22, 2004
    Inventors: Eric J. Strang, Andrej Mitrovic, Jim Fordemwalt, Wayne L. Johnson
  • Patent number: 6677551
    Abstract: A process for operating a plasma torch having an improved start up and shut down sequence to substantially increase electrode element life. The first shut down mode is controlled such that plasma gas flow through the swirl ring and nozzle prevents the formation of an oxide layer upon the electrode. The shut down method is especially useful for torches which operate at 100 amps or greater. The inclusion of an aluminum jacket surrounding the electrode outer walls has been found to contribute to the ability to avoid formation of oxide layers on the electrode.
    Type: Grant
    Filed: July 23, 2002
    Date of Patent: January 13, 2004
    Assignee: InnerLogic, Inc.
    Inventor: Steven F. Hardwick
  • Patent number: 6657153
    Abstract: An electrode for a plasma arc torch and method of fabricating the same are disclosed, and wherein the electrode comprises a copper holder defining a cavity in a forward end. An emissive element and separator assembly is positioned in the cavity, and no brazing materials are used to secure the components of the electrode. The emissive element, separator, and metallic holder are heated to accelerate diffusion bonding between the emissive element and separator, and between the separator and metallic holder. A crimping process is also disclosed for further strengthening the electrode and increasing the operational life span thereof.
    Type: Grant
    Filed: January 31, 2001
    Date of Patent: December 2, 2003
    Assignee: The ESAB Group, Inc.
    Inventors: Michael C. McBennett, Rue Allen Lynch, Tommie Zack Turner
  • Patent number: 6657152
    Abstract: A torch head includes a torch body which is inserted into the tube member, a cathode tube which is arranged in the torch body such that the longitudinal axis of the cathode tube is aligned to the longitudinal axis of the torch body and which has a cathode at the distal end of the cathode tube, an anode member which is arranged on the distal end side of the cathode tube, and a spraying material supply tube which opens toward a mouth opening formed in the anode member and which is arranged outside the torch body. In the anode member, a plasma gas supply chamber in which the front end of the cathode tube is stored in a non-contact state, an orifice which communicates with the plasma gas supply chamber and in which the cathode is stored in a non-contact state, and a plasma generation chamber which communicates with the orifice, which has a longitudinal axis substantially perpendicular to the longitudinal axis of the torch body, and which has the mouth opening are formed.
    Type: Grant
    Filed: July 17, 2002
    Date of Patent: December 2, 2003
    Assignee: Shimazu Kogyo Yugengaisha
    Inventor: Tadahiro Shimazu
  • Patent number: 6649860
    Abstract: A transferred plasma heating anode for heating a molten metal in a container by applying Ar plasma generated by passing a direct current through the molten metal, the transferred plasma heating anode comprising; an anode, composed of a conductive metal, that has an internal cooling structure, a metal protector having an internal cooling structure that is placed outside the anode with a constant gap between the anode and the protector, and a gas supply means that supplies an Ar-containing gas to the gap, is characterized by the central portion on the external surface of the anode tip end being inwardly recessed.
    Type: Grant
    Filed: August 10, 2001
    Date of Patent: November 18, 2003
    Assignee: Nippon Steel Corporation
    Inventors: Takeshi Kawachi, Kazuto Yamamura, Hiroyuki Mitake, Junichi Kinoshita, Katsuhiro Imanaga, Masahiro Doki, Yoshiaki Kimura, Teruo Kawabata
  • Publication number: 20030209526
    Abstract: The present invention relates to novel heaters and methods of heating a vacuum chamber, such as a semiconductor wafer plasma processing chamber, using a ceramic igniter array consisting of a plurality of ceramic igniters positioned in a substrate.
    Type: Application
    Filed: May 7, 2002
    Publication date: November 13, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Ananda H. Kumar, Tetsuya Ishikawa, Kwok Manus Wong, Farahmand E. Askarinam
  • Publication number: 20030201257
    Abstract: The invention recites a plasma-arc spray gun comprising a cathode and an anode defining a longitudinal axis. The anode further includes an external surface and an internal chamber, the internal chamber extending from a first end to a second end. At least a portion of the internal chamber is defined by revolving a non-linear curve about the longitudinal axis. The plasma-arc spray gun also includes a gun body supporting the cathode and the anode.
    Type: Application
    Filed: May 15, 2002
    Publication date: October 30, 2003
    Applicant: Thermal Spray Technologies, Inc.
    Inventor: Daryl E. Crawmer
  • Patent number: 6639174
    Abstract: Protective cap for a plasma arc working torch, includes a cap body (7) having an opening (17) for the passage of plasma gas, the cap body (7) being made of at least one material of ceramic type. The ceramic is a silicon nitride or an aluminum silicate. Preferably, the ceramic cap body (7) is clad with boron nitride deposited on the external surface of the cap body, the thickness of the cladding of boron nitride being less than 3 mm. Torch provided with such a cap and its use in a steel plate plasma cutting operation.
    Type: Grant
    Filed: December 14, 2001
    Date of Patent: October 28, 2003
    Assignees: La Soudure Autogene Francaise, L'Air Liquide - Societe Anonyme a Directoire et Conseil de Surveillance pour l'Etude et l'Exploitation des Procedes Georges Claude
    Inventors: Regis Augeraud, Michel Delzenne
  • Patent number: 6614000
    Abstract: The present invention is an organic halogen compound decomposition device which utilizes a plasma, wherein a stable and reliable ignition at operation commencement is possible, and where following ignition, a good plasma form can be maintained and stable operation is possible. The organic halogen compound decomposition device is equipped with a cylindrical waveguide 7 made up of an outer conductor 8 and an inner conductor 9, and a dual construction discharge tube 5 made up of an inner tube 11 and an outer tube 12 which is provided inside the cylindrical waveguide 7 and on an identical axis. Furthermore, a probe antenna 9a formed from an extension of the inner conductor 9 is positioned so as to encircle the discharge tube 5, and the tip of the inner tube 11 is positioned further inwards than the tip of the probe antenna 9a.
    Type: Grant
    Filed: December 12, 2000
    Date of Patent: September 2, 2003
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Masahiro Bessho, Toshio Hattori, Yasuhiro Tsubaki
  • Publication number: 20030155332
    Abstract: A plasma generating apparatus and method for treating a surface of a workpiece. This apparatus comprises a power supply 100, at least one powerable electrode connected to the power supply 100, at least one groundable electrode connected to ground, a dielectric separating the at least one powerable electrode and the at least one groundable electrode, a chamber at least partially housing both the powerable electrode and the groundable electrode and a first inlet for admitting a first gas into the chamber such that the first gas can flow between the at least one powerable electrode and the at least one groundable electrode. The at least one powerable electrode and the at least one groundable electrode are disposed in an array. These electrodes are arranged to be on a common side of a workpiece, to provide a portable apparatus.
    Type: Application
    Filed: December 21, 2001
    Publication date: August 21, 2003
    Inventors: Saswati Datta, John Andrew McDaniel, Seyed Farhad Miralai, Vesselin Nikolov Shanov
  • Patent number: 6603091
    Abstract: A cleaning device with deeply reaching plasma and assisting electrodes has supporting racks, a chamber, a plasma sources, metallic grids. Flat boards to be cleaned such as circuit boards are located in the supporting racks. The supporting racks are disposed in the chamber. The metallic grids are disposed on two sides of the chamber. The plasma source is disposed next to the metallic grids. Electric voltage is applied to the metallic grids such that plasma from the plasma source can be pushed deeply into the supporting racks to evenly and sufficiently clean the circuit boards.
    Type: Grant
    Filed: April 4, 2002
    Date of Patent: August 5, 2003
    Assignee: Nano Electronics and Micro System Technologies, Inc.
    Inventors: Chia-Yuan Hsu, Yong-Hau Foo, Paul Hong
  • Patent number: 6600127
    Abstract: A process for synthesizing nanosized powders utilizes a hybrid exploding wire device containing a solid metal wire fuse in the bore of a tube that is open at each end. The ends of the fuse are connected to electrodes on the ends of the tube. The electrodes are designed to erode to maintain a heavy metal plasma. The bore may comprise a corresponding ceramic to be produced, and a microcrystalline powder of a corresponding ceramic may be retained within the bore. An electrical discharge vaporizes and ionizes the fuse. The tube confines the radial expansion of the plasma such that the plasma exits from both ends of the tube where it reacts with a suitable gas to form nanoscale particles. In addition, the plasma gas ablates and vaporizes a portion of the bore wall to contribute to the nanoceramic synthesis. Other alternatives include replacing the fuse with a thin conductive sheath or a consumable metal insert.
    Type: Grant
    Filed: September 13, 2000
    Date of Patent: July 29, 2003
    Assignee: Nanotechnologies, Inc.
    Inventors: Dennis Roger Peterson, Dennis Eugene Wilson, Darrin Lee Willauer