Abstract: A plasma system which is to be coupled to a power source, the plasma system including a chamber defining an internal cavity in which a plasma is generated during operation; a coil which during operation couples power from the power source into the plasma within the chamber, the coil having first and second terminals; a first capacitor which is coupled between the first terminal and a reference potential; and a second capacitor connected to the second terminal and through which the power source is coupled to the second terminal.

Abstract: A plurality of electrode bars are arranged in parallel with each other, and side electrode bars are connected to the corresponding opposite ends of the electrode bars, thereby forming a ladder-like RF discharge electrode. Power supply points are arranged axisymmetrically with respect to a reference line, which is a bisector which bisects one side of the RF discharge electrode, while being spaced a predetermined distance from the reference line, thereby suppressing voltage distribution on the ladder electrode, which has an effect on uniformity of discharge distribution, to a sufficiently low level of nonuniformity. Thus, uniform distribution of film deposition rate can be obtained, thereby enabling uniform deposition even in large-area applications.

Abstract: The invention relates to a method and device for improving the surface of a substrate. Plasma is produced by a luminous discharge, close to the substrate to be treated, using a hollow cathode and an anode assigned thereto. A reactive gas located in the area of the luminous discharge is activated, causing a change to occur on the surface of substrate to provide the desired improvement. The hollow cathode is brought to a self-cleansing temperature and maintained at said temperature, whereby the parasitic deposits caused by the reactive gas are removed and/or converted. The self-cleansing temperature is stabilized by taking into account the following factors: the heating of the hollow cathode by the luminous discharge, thermal conduction carried out by the reactive gas and radiation in the direction of a cooled anode arranged at a small distance from the hollow cathode.

Abstract: A plasma arc torch with improved sealing of connections between fluid passages of adjoining parts of the torch, means for reducing current leakage through a control fluid, and an improved pilot arc electrical assembly, includes a main torch body and an insulator body which abut and each of which has a plasma gas passage and a control fluid passage which extend to the abutting end faces of the bodies and are aligned thereat. Connections between the aligned plasma gas passages are made via coupling tubes each having a first portion inserted into a receiving portion of the passage in the main torch body and a second portion inserted into a receiving portion of the passage in the insulator body. Each inserted portion includes a pair of O-rings spaced apart along the length of the tube for sealing the connection.

Abstract: This invention provides a plasma reactor for modifying gas by plasma, including a first planar electrode and a second planar electrode, the two electrodes facing opposite each other approximately in parallel; a dielectric body inserted between the first and the second electrodes; and a complex barrier discharge-generating means for providing a predetermined electric potential difference between the first and the second electrodes; wherein the first and the second electrodes are provided so as to apply complex plasma discharge to the gas to be treated fed between the electrodes, to thereby modify the gas. According to the invention, gas modification efficiency can be remarkably improved.

Abstract: An electrode for supporting an arc in a plasma arc torch. The electrode includes a metallic holder having a cavity formed in a front end portion. An insert assembly is mounted in the cavity. The insert assembly includes an emissive insert composed of a metallic material having a relatively low work function. The emissive insert has a bore formed therein for securing a non-emissive core. The core has a base portion, which provides an interface between the emissive insert and the holder. The core and base portion act to thermally conduct heat out of the emissive insert so that the service life of the emissive insert is increased by the lowering of the emissive insert's operating temperature.

Abstract: The present invention relates to a corona station for the preliminary processing of a strip material. The corona station includes at least one electrode (18) connected to a high-voltage power supply through connection means, a housing containing at least partially the electrode (18) and the connection means, and at least one cylindrical counter-electrode (17), wherein the strip of material (16) does not rest on the whole surface of said counter-electrode (17).

Abstract: The object is to facilitate replacement of consumable parts, such as the electrode, nozzle, or the like, in a plasma torch, whilst suppressing any increase in structural complexity or cost. An electrode 103, insulating guide 105 and nozzle 107 are fit together installed in a retainer cap 113. By means of O-rings 193, 195, 197, the electrode 103, insulating guide 105, nozzle 107 and retainer cap 113 are coupled together by a coupling force which allows the components to be pulled apart and separated manually. By attaching the retainer cap 113 to the torch main unit and detaching the retainer cap 113 from same, the electrode 103, insulating guide 105 and nozzle 107 can be attached and detached to and from the torch main unit, simultaneously.

Abstract: The invention is embodied in a coil antenna for radiating RF power supplied by an RF source into a vacuum chamber of an inductively coupled plasma reactor which processes a semiconductor wafer in the vacuum chamber, the reactor having a gas supply inlet for supplying processing gases into the vacuum chamber, the coil antenna including plural concentric spiral conductive windings, each of the windings having an interior end near an apex of a spiral of the winding and an outer end at a periphery of the spiral of the winding, and a common terminal connected to the interior ends of the plural concentric spiral windings, the RF power source being connected across the terminal and the outer end of each one of the windings.

Abstract: A discharge tube for a local etching apparatus has a portion positioned within a waveguide which is for the generation of plasma, the said portion being tapered so as to be divergent toward an orifice side of the discharge tube. Even in the event a maximum field strength position of a standing wave in the waveguide should be deviated due to a change in microwave transmission characteristic of the material of the discharge tube or a change in the position of a plunger under the influence of heat, the maximum field strength position lies somewhere in the vicinity of a wall surface of the tapered portion, so that a supplied gas is converted to plasma stably in a short time. When the discharge tube is to be cooled, the cooling can be done effectively with a cooling gas which is cooled by adiabatic expansion while passing through the tapered portion.

Abstract: A capacitively coupled RF plasma reactor allows treatment of large workpiece surfaces with an accurate control of ion bombardment onto the respective electrode surfaces and thus an adjacent workpiece, be it to a desired low or to a desired high level. The reactor includes a first and a second electrode arrangement mutually spaced and confining a plasma reaction volume, at lest one of the electrode arrangements comprising electrically mutually isolated sub-electrodes, a first group of the sub-electrodes being commonly connected to a first electric input, and a second group of the sub-electrodes being commonly connected to a second electric input. The reactor thus substitutes at least one of the two customarily used reactor electrodes by an array of sub-electrodes which, by way of their respective first and second electric inputs, may be independently and thus differently electrically operated, usually but not exclusively with RF voltages.

Abstract: A four-nozzle plasma generator comprising two anode electrode chambers and two cathode electrode chambers connected to DC power sources and generating four plasma jets of which the shape and the path are determined by an external magnetic field system. The plasma jets converge on a central area into which the material to be processed is injected, in order to form a single plasma stream. The nozzles are symmetrically arranged on a hood which includes a flat water-cooled diaphragm provided with a central aperture.

Abstract: An ECR plasma CVD apparatus includes a cavity for producing an ECR plasma, a vacuum chamber connected to the cavity, a base plate holder for holding a base plate or substrate, an electrode plate, and a high frequency applying device for applying a high frequency current to the electrode plate. The electrode plate is disposed on a side opposite to the cavity with the base plate therebetween. The base plate is arranged parallel to the electrode plate with a predetermined space therebetween to generate an electrostatic coupling in the vacuum chamber. A high frequency current is applied to the electrode plate, so that the RF bias can be uniformly applied to the surface of a non-conductive base plate without contacting to thereby uniformly form a CVD membrane thereon.

Abstract: An object is to provide a plasma torch having a function to achieve fully satisfactory cooling of the nozzle and shield cap. A plasma torch 1 comprises a nozzle 17 positioned at the front end portion of the torch 1 so as to cover an electrode 13, with a plasma gas passage 37 interposed therebetween. A shield cap 21 is mounted at the front end of the nozzle 17, and these components 13, 17 and 21 are accommodated in a retainer cap 23. Assist gas passages 45, 55 are formed in the wall of the retainer cap 23, and feed assist gas to the vicinity of the plasma arc 81. A space enclosed by the retainer cap 23, nozzle 17 and shield cap 21 is a cooling water passage 63. The retainer cap 23, nozzle 17 and shield cap 21 faces the cooling water passage 63, and hence directly and powerfully water-cooled.

Abstract: A mechanism for plasma surface treatment includes a rotating head having at least one eccentrically disposed plasma nozzle for generating a plasma jet directed in parallel with the axis of rotation. The nozzle includes a swirl system for swirling the plasma jet.

Abstract: An inductive plasma torch operating at atmospheric pressure is used for wafer or glass substrate processing. Said torch employs a linear type of plasma confinement. This linear torch is particularly suitable for photoresist etching and processes in which it has the advantages of high chemical isotropic etch rate and low plasma damage.

Abstract: Plasma nozzle, in particular for pretreating surface, including a casing defining a nozzle channel which has an axis and a mouth and through which a working gas is passed, an electrode disposed coaxially in the nozzle channel, and a counter electrode surrounding the nozzle channel, wherein the mouth of the nozzle channel is angled relative to the axis thereof.

Abstract: A plasma arc torch with improved sealing of connections between fluid passages of adjoining parts of the torch, means for reducing current leakage through a control fluid, and an improved pilot arc electrical assembly, includes a main torch body and an insulator body which abut and each of which has a plasma gas passage and a control fluid passage which extend to the abutting end faces of the bodies and are aligned thereat. Connections between the aligned plasma gas passages are made via coupling tubes each having a first portion inserted into a receiving portion of the passage in the main torch body and a second portion inserted into a receiving portion of the passage in the insulator body. Each inserted portion includes a pair of O-rings spaced apart along the length of the tube for sealing the connection.

Abstract: An electrode body (3) for a plasma torch comprises at least one tapping (15) within which is provided at least one recess (8) extending over all the lengths (d) of the tapping (15), and at least one downstream portion defining a recess (16) located between the upstream tapped portion and the bottom of the electrode body (3)

Abstract: A power segmented electrode useful as part of an upper electrode and/or substrate support for supporting a substrate such as a semiconductor wafer in a plasma reaction chamber such as a single wafer etcher. The power segmented electrode includes a plurality of electrodes which are supplied radiofrequency power in a manner which provides uniform processing of the substrate. The power to the electrodes can be supplied through a circuit incorporating interelectrode gap capacitance, one or more variable capacitors, one or more current sensors, a power splitter, one or more DC biasing sources, and/or power amplifier.

Abstract: This plasma torch (10) for the excitation of a gas for the purpose of analyzing it comprises a tubular injector (12), intended to be connected to a source for supplying a gas to be analyzed, and an external cylindrical sleeve (14) coaxial with the injector (12) and defining a cylindrical annular channel (32) for supplying a plasma gas, intended to be connected to a corresponding supply source for the purpose of generating a plasma (P). The diameter of the injector (12) can vary.

Abstract: The invention is embodied in a coil antenna for radiating RF power supplied by an RF source into a vacuum chamber, the coil antenna including plural helical conductors each having a first end and a second end, the first ends being adapted for connection to a first common RF potential, the second ends being adapted for connection to a second common RF potential, each of the plural conductors being wound about a common axis of helical symmetry, each of the second ends being spaced substantially equally from the axis and from each other.

Abstract: The invention is embodied in an antenna for radiating RF power supplied by an RF source into a vacuum chamber, the antenna including plural concentrically spiral conductors, each having a first end located in a first common region and a second end located in a second common region, and each being wound about a common axis passing through both regions, the regions being concentric with the axis, the conductors being substantially the same length, substantially the same shape, and substantially evenly spaced with respect to each other about the common axis.

Abstract: The invention is embodied in a coil antenna for radiating RF power supplied by an RF source into a vacuum chamber, the coil antenna including plural helical conductors each having a first end and a second end, the first ends being adapted for connection to a first common RF potential, the second ends being adapted for connection to a second common RF potential, each of the plural conductors being wound about a common axis of helical symmetry, each of the second ends being spaced substantially equally from the axis and from each other.

Abstract: An inductive plasma torch operating at atmospheric pressure is used for wafer or glass substrate processing. Said torch employs a linear type of plasma confinement. This linear torch is particularly suitable for photoresist etching and processes in which it has the advantages of high chemical isotropic etch rate and low plasma damage.

Abstract: A plasma arc torch with improved sealing of connections between fluid passages of adjoining parts of the torch includes a main torch body and an insulator body which abut and each of which has a plasma gas passage and a control fluid passage which extend to the abutting end faces of the bodies and are aligned thereat. Connections between the aligned plasma gas passages are made via coupling tubes each having a first portion inserted into a receiving portion of the passage in the main torch body and a second portion inserted into a receiving portion of the passage in the insulator body. Each inserted portion includes a pair of O-rings spaced apart along the length of the tube for sealing the connection. An elongate insulating conduit is sealingly received within the control fluid passages of the insulator body and main torch body, and extends through the main torch body into a control fluid connector tube.

Abstract: The invention concerns an inductive plasma torch comprising an external tube, an intermediate tube and a central injector (16) including at least a central tube (20, 21) injecting reagent and a peripheral sheathing tube (22). A gas similar to plasma gas is injected into the space between the central tube (20, 21) and the sheathing tube (22), in conditions suited for obtaining a laminar flow, said flow remaining laminar up to the plasma torch central zone. The sheathing tube emerges substantially at the first turn of the inductor coil.

Abstract: Voltage is applied to conducting loops wrapped around the outside of a non-conducting chamber (e.g., a glass tube) to generate a capacitively coupled discharge plasma inside the chamber. In one embodiment, a seed gas is injected into the chamber through an inlet in an otherwise closed end of the chamber, while the other end is open to the ambient atmosphere. In such an embodiment, the seed gas is used to ignite the plasma in air at essentially atmospheric pressure. The present invention has different applications, including, but not limited to, (a) passivating toxic or polluting gases that are injected into the chamber along with the seed gas and (b) treating materials placed within a second chamber that is connected to the open end of the plasma-generating chamber such that active species migrate into the second chamber to interact with the materials placed therein.

Abstract: Many boards 7 to be processed are disposed within a metal chamber 1 in an isolated state, and many ground electrode plates 9 are disposed near by both surfaces of the boards 7 so as to be at the same potential as the chamber 1. While a microwave generated by a magnetron 3 from an upper portion of the chamber 1 is applied in the chamber 1, both surfaces of the boards 7 are processed at a time with plasma by using glow discharges produced between the boards 7 and plates 9 due to a difference in high-frequency potential between the boards 7 and plates 9 under presence of reaction gas.

Abstract: An electrode for a plasma arc cutting torch, wherein the electrode comprises a holder having a tapered tip and emissive element concentrically disposed therein. The holder has an included angle of taper at the tip of between about 25° and about 40° and a diameter at the tip approximately equal to, or slightly larger than, the diameter of the end surface of the emissive element. The electrode is configured such that the holder comprises a relatively thin holder wall at the tip of the electrode which evaporates due to the heat from the adjacent arc generated through the emissive element such that the tapered tip erodes generally simultaneously with the emissive element. Generally simultaneous erosion of both the holder and the emissive element thus avoids the problems of overheating and/or double arcing and extends the service life of the electrode. A method of operation of a plasma arc torch is also provided.

Abstract: An electrode for plasma arc torches has a tip body having a tip cavity with a cavity sidewall. An emissive insert having an insert sidewall resides in the tip cavity. A noble metal foil is interposed between the insert sidewall and the cavity sidewall. To fabricate the electrode, a tip body blank is provided, and a tip cavity having a cavity sidewall is formed therein. An emissive insert having an insert sidewall and being loosely insertable into the tip cavity is provided. The insert sidewall is provided with a textured surface with protuberances. A noble metal foil is selected, having an insert-contacting surface and a cavity-contacting surface. The emissive insert and the noble metal foil are placed into the tip cavity of the tip body blank, arranged such that the insert-contacting surface of the foil faces the insert sidewall of the emissive insert, while the cavity-contacting surface of the foil faces the cavity sidewall.

Abstract: This invention relates to a plasma focus source for generating radiation at a selected wavelength, the invention involving producing a high energy plasma sheathe which moves down an electrode column at high speed and is pinched at the end of the column to form a very high temperature spot. An ionizable gas introduced at the pinch can produce radiation at the desired wavelength. In order to prevent separation of the plasma sheathe from the pinch, and therefore to prolong the pinch and prevent potentially damaging restrike, a shield of a high temperature nonconducting material is positioned a selected distance from the center electrode and shaped to redirect the plasma sheathe to the center electrode, preventing separation thereof. An opening is provided in the shield to permit the desired radiation to pass substantially unimpeded.

Abstract: A main electrode (2, 20, 30, 44, 127) for plasma arc generator, a generator (50, 70, 80, 126) comprising same and a process for treatment of solidifying liquid metal by the mentioned generator, wherein the main electrode in association with a counter electrode (15, 28, 42, 54, 73, 86, 122) provides a two-rail structure capable of generating a plasma arc discharge displaceable along a closed path uninterruptedly. The uninterrupted movement of the arc discharge is achieved by a specific design of the main electrode. The electrode comprises an essentially tubular body having a first rim (3, 24, 33, 89) usually connected to a d.c. power source via at least one connector site (12), and a second, working rim (4, 27, 34, 46, 63, 78, 90) serving for the electric arc discharge. The tubular body is divided by at least one slot (gap) (6, 22, 32, 49, 52, 88) associated with one connector site and extending between the first and second rims so that it forms at the second rim region a second rim gap.