Electrode Structure Patents (Class 219/121.52)
  • Patent number: 6593539
    Abstract: Among the embodiments of the present invention, are apparatus, systems, and methods for managing energetic charged particles emitted nearly isotropically from a fusion device. One apparatus of the present invention includes a fusion device in a container and an electric current carrying winding disposed about the container to provide a magnetic field to direct charged particles generated by the device. A pair of electric current carrying coils are positioned within the container to control the strength of the magnetic field in a region between these coils, such that effects on fusion plasma can be minimized. In other forms, charged particles provided from a fusion device are directed along a magnetic channel to an energy converter to provide electric power. One such form includes a magnetic expander and an electron-ion separator to provide a net electric current.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: July 15, 2003
    Inventors: George Miley, Hiromu Momota
  • Patent number: 6583378
    Abstract: The invention prolongs the electrode lifetime of plasma machining electrodes having a hafnium or zirconium insert. A hafnium or zirconium insert 21 inserted into the tip of a copper holder 22 protrudes from the tip of the copper holder 22. The protrusion length L is not larger than the diameter D of the insert, preferably not larger than 0.5 mm. The protruding portion 21a of the insert has a rounded section without sharp angles. The rear surface 21 of the insert is exposed to the flow of the cooling water inside the electrode. At least during the generation of the pilot arc, a plasma gas containing at least 5 mol % nitrogen is used.
    Type: Grant
    Filed: November 22, 2000
    Date of Patent: June 24, 2003
    Assignee: Komatsu Industries Corporation
    Inventors: Yoshihiro Yamaguchi, Kazuhiro Kuraoka, Tetsuya Kabata
  • Patent number: 6580051
    Abstract: A process for synthesizing nanosized powders utilizes a hybrid exploding wire device containing a solid metal wire fuse in the bore of a tube that is open at each end. The ends of the fuse are connected to electrodes on the ends of the tube. The electrodes are designed to erode to maintain a heavy metal plasma. The bore may comprise a corresponding ceramic to be produced, and a microcrystalline powder of a corresponding ceramic may be retained within the bore. An electrical discharge vaporizes and ionizes the fuse. The tube confines the radial expansion of the plasma such that the plasma exits from both ends of the tube where it reacts with a suitable gas to form nanoscale particles. In addition, the plasma gas ablates and vaporizes a portion of the bore wall to contribute to the nanoceramic synthesis. Other alternatives include replacing the fuse with a thin conductive sheath or a consumable metal insert.
    Type: Grant
    Filed: December 18, 2001
    Date of Patent: June 17, 2003
    Assignee: Nanotechnologies, Inc.
    Inventors: Dennis Roger Peterson, Dennis Eugene Wilson, Darrin Lee Willauer
  • Publication number: 20030089689
    Abstract: A quick disconnect for use in a plasma arc torch is provided wherein a plurality of connections disposed therein are configured such that the connections break in a specific order when the quick disconnect is disengaged. Preferably, the quick disconnect comprises a plurality of signal pin connections, a pilot return connection, a fluid connection, and a main power connection. Accordingly, the signal pin connections break before the pilot return connection, the fluid connection, and the main power connection. Further, the pilot return connection breaks before the fluid connection and the main power connection, and the fluid connection breaks before the main power connection as the quick disconnect is disengaged. As a result, a safer quick disconnect in which both gas and electric power are conducted is provided by the present invention.
    Type: Application
    Filed: November 9, 2001
    Publication date: May 15, 2003
    Inventors: Christopher J. Conway, Fred Rogers
  • Publication number: 20030089687
    Abstract: There is provided a susceptor with a built-in electrode that has excellent corrosion resistance and plasma resistance, and that has excellent durability to the stress of heat cycles, and a manufacturing method for a susceptor with a built-in electrode that enables the susceptor to be manufactured economically. The susceptor with a built-in electrode comprises: a susceptor substrate formed from an aluminum oxide based sintered body; an internal electrode built into the susceptor substrate; and a power supply terminal that is provided so as to make contact with this internal electrode, wherein the internal electrode is formed from an aluminum oxide and molybdenum carbide based composite sintered body containing 30 to 95 volume % of molybdenum carbide and 5 to 75 volume % of aluminum oxide.
    Type: Application
    Filed: October 31, 2002
    Publication date: May 15, 2003
    Applicant: Sumitomo Osaka Cement Co., Ltd.
    Inventor: Keigo Maki
  • Patent number: 6563075
    Abstract: A method of fabricating an electrode is disclosed, wherein the electrode comprises a copper holder defining a cavity in a forward end. An emissive element and separator assembly is positioned in the cavity. An intermetallic compound is formed between the emissive element and the separator by heating a relatively non-emissive material until it melts and dipping the emissive element therein before cooling the assembly. As a result, the intermetallic compound is formed significantly faster than by conventional methods.
    Type: Grant
    Filed: December 20, 2001
    Date of Patent: May 13, 2003
    Assignee: The ESAB Group, Inc.
    Inventors: Wayne Stanley Severance, Jr., Valerian Nemchinsky, Gregory William Diehl
  • Publication number: 20030085205
    Abstract: A transformer-coupled plasma source using toroidal cores forms a plasma with a high-density of ions along the center axis of the torus. In one embodiment, cores of a plasma generator are stacked in a vertical alignment to enhance the directionality of the plasma and generation efficiency. In another embodiment, cores are arranged in a lateral array into a plasma generating plate that can be scaled to accommodate substrates of various sizes, including very large substrates. The symmetry of the plasma attained allows simultaneous processing of two substrates, one on either side of the plasma generator.
    Type: Application
    Filed: April 20, 2001
    Publication date: May 8, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Canfeng Lai, Michael S. Cox, Peter K. Loewenhardt, Tsutomu Tanaka, Shamouil Shamouilian
  • Publication number: 20030085206
    Abstract: The invention provides a susceptor with a built-in plasma generation electrode that can make the throughput by a range of plasma processing of a plate specimen uniform, and that has excellent plasma resistance, thermal conductivity and durability, and a manufacturing method that can obtain this susceptor with a built-in plasma generation electrode easily and economically.
    Type: Application
    Filed: October 29, 2002
    Publication date: May 8, 2003
    Applicant: Sumitomo Osaka Cement Co., Ltd.
    Inventor: Mamoru Kosakai
  • Patent number: 6559407
    Abstract: A cathode assembly 10 for an electric arc spray apparatus. The cathode assembly 10 utilizes a positive cathode retention design which provides for improved heat management characteristics, quick and easy cathode replacement and increased cathode life. The cathode assembly includes a cathode holder 14, a cathode 12 including a first portion 26 which resides within the cathode holder 14, a tip portion 28 which extends from the cathode holder, and a shoulder portion 33 which is formed on the outer surface of the cathode. The cathode assembly 10 further includes a retention member or nut 16 which removably attaches to the cathode holder 14 and which engages the shoulder portion 33, effective to positively retain the cathode 12 within the holder 14. The retention member 14 also includes an aperture through which the cathode tip 28 extends.
    Type: Grant
    Filed: April 5, 2001
    Date of Patent: May 6, 2003
    Assignee: Ford Global Technologies, Inc.
    Inventors: John Edward Chancey, Lawrence Edward Ellis, Larry Gerald Gargol, Srikanth Chinthagunta Reddy
  • Publication number: 20030052096
    Abstract: A plasma emitter apparatus and method for using the same that includes a primary electrode and a secondary electrode. The secondary electrode is porous, that is, it is configured to permit the passage of plasma discharge therethrough. Accordingly, the plasma is received at one side of the secondary electrode and emitted from its opposing plasma exiting side. Numerous configurations of the secondary electrode are possible so long as the plasma discharge is permitted to pass therethrough. For instance, the secondary electrode may be a laminate of multiple insulating material layers with at least one conductive layer sandwiched therebetween. A plurality of apertures are defined through the laminate and a dielectric sleeve is inserted into and retained in the aperture. The generated plasma passes through one or more holes defined in each of the dielectric sleeves.
    Type: Application
    Filed: July 2, 2002
    Publication date: March 20, 2003
    Applicant: PlasmaSol, LLC
    Inventors: Richard Crowe, Sergei Babko-Malyi, Kurt Kovach, Seth Tropper
  • Patent number: 6531029
    Abstract: 200 mm and 300 mm wafers are processed in vacuum plasma processing chambers that are the same or have the same geometry. Substantially planar excitation coils having different geometries for the wafers of different sizes excite ionizable gas in the chamber to a plasma by supplying electromagnetic; fields to the plasma through a dielectric window at the top of the chamber. Both coils include plural symmetrical, substantially circular turns coaxial with a center point of the coil and at least one turn that is asymmetrical with respect to the coil center point. Both coils include four turns, with r.f. excitation being applied to the turn that is closest to the coil center point. The turn that is third farthest from the center point is asymmetric in the coil used for 200 mm wafers. The two turns closest to the coil center point are asymmetric in the coil used for 300 mm wafers.
    Type: Grant
    Filed: June 30, 2000
    Date of Patent: March 11, 2003
    Assignee: Lam Research Corporation
    Inventors: Tuqiang Ni, Kenji Takeshita, Tom Choi, Frank Y. Lin
  • Patent number: 6528751
    Abstract: In accordance with one aspect of the invention, a plasma reactor has a capacitive electrode driven by an RF power source, and the electrode capacitance is matched at the desired plasma density and RF source frequency to the negative capacitance of the plasma, to provide an electrode plasma resonance supportive of a broad process window within which the plasma may be sustained.
    Type: Grant
    Filed: March 17, 2000
    Date of Patent: March 4, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Daniel J. Hoffman, Gerald Zheyao Yin
  • Patent number: 6528753
    Abstract: An electrode for a plasma arc torch and method of fabricating the same are disclosed, wherein the electrode comprises a metallic holder defining a cavity in a forward end. An emissive element and separator assembly is positioned in the cavity. The emissive element has a layer of relatively non-emissive material on the outer surface thereof, which is preferably applied by heating the emissive element to a high temperature such that the emissive element becomes reactive, and spraying the relatively non-emissive material on the emissive element. The coated emissive element is positioned in the separator and the assembly is heated such that the relatively non-emissive material forms a strong bond between with the separator. The superior bonds between the emissive element and separator formed according to the present invention extend the life span of the electrode.
    Type: Grant
    Filed: May 31, 2001
    Date of Patent: March 4, 2003
    Assignee: The ESAB Group, Inc.
    Inventor: Michael C. McBennett
  • Patent number: 6525292
    Abstract: A plasma torch includes an interchangeable cartridge (100) consisting of just six parts: an anode nozzle made of electrolytic copper 1 a cathode support made of el S32-0684-AMctrolytic copper 2 a doped tungsten cathode 3 a cathode centring diffuser device made of plastic material 4 an assembler made of plastic material 5 a ceramic insert 6. These parts are assembled by means of a press and the assembly of these parts constitutes volumes 71, 72, 73 constituting the cooling circuit of the anode 1 and other components of the torch, and plasmagene gas inflow conduits and connectors. Fluid inflows and outflows are ensured through a connecting and holding structure provided for easy cartridge (100) assembly.
    Type: Grant
    Filed: October 2, 2001
    Date of Patent: February 25, 2003
    Assignee: Commissariat a l'Energie Atomique
    Inventor: Christophe Girold
  • Publication number: 20030034333
    Abstract: A plasma arc torch and method for improving the life of the consumable parts of the plasma arc torch, including the electrode, the tip and the shield cap. The method includes turbulating gas as it flows over the exposed surfaces of the electrode, tip and shield cap to increase turbulence in the hydrodynamic boundary layer of the gas flow, thereby enhancing convective heat transfer. The result of enhanced cooling is improved consumable parts life. For example, to increase the turbulence of the gas flow over the outer surface of the electrode, the plasma arc torch electrode has a roughened, or textured outer surface formed with dimples, axially extending grooves or spiraling grooves formed in the outer surface of the electrode. The inner and outer surfaces of the tip and the inner surface of the shield cap are similarly textured.
    Type: Application
    Filed: March 30, 2001
    Publication date: February 20, 2003
    Inventors: Kevin Horner-Richardson, David Small, Jesse Roberts
  • Patent number: 6521858
    Abstract: A method and apparatus for bonding solid plates together is presented. A modulated directional flow of plasma is applied at and between the bonding surfaces of the plates to be bonded prior to and during the application of pressure to compress the bonding surfaces together to form a direct contact or diffusion bond.
    Type: Grant
    Filed: November 19, 2001
    Date of Patent: February 18, 2003
    Assignee: GeoMat Insights, LLC
    Inventor: Ronald J. Barnett
  • Patent number: 6521859
    Abstract: A system and method for preserving stored foods. The system and method utilizes an apparatus for generating ozone and other atoms and molecules resulting from the bombardment of a feed gas with electrons having, preferably, a first electrode positioned within a channel in a second electrode. The first electrode is a substantially sealed tube made of dielectric material, having at least one electron gun positioned proximate an end for firing electrons into the first electrode. In electrical communication with the electron gun is a rod, maintained in a tube also made of dielectric material, which acts to maintain a constant energy level through the length of the rod and thus the length of the electrode. Within the first electrode is an inert gas which, upon the firing of the electron gun, is formed into a plasma.
    Type: Grant
    Filed: December 12, 2000
    Date of Patent: February 18, 2003
    Assignee: Nytrox 1, Inc.
    Inventor: Lonald H. Jensen
  • Patent number: 6518538
    Abstract: A radio frequency generated plasma is provided to a skin surface in a controlled manner, in order to heat and selectively damage a thin superficial layer, thereby inducing a renewal process of the epidermis. The plasma is generated by providing a vacuum to the probe, and also providing an rf pulse to an electrode within the probe, thereby creating a glow discharge that includes gas ions that contact the skin and cause the skin to heat up.
    Type: Grant
    Filed: October 12, 2001
    Date of Patent: February 11, 2003
    Assignee: Mattioli Engineering Ltd.
    Inventor: Gian Franco Bernabei
  • Patent number: 6504126
    Abstract: The invention is embodied in an antenna for radiating RF power supplied by an RF source into a vacuum chamber, the antenna including plural concentrically spiral conductors, each having a first end located in a first common region and a second end located in a second common region, and each being wound about a common axis passing through both regions, the regions being concentric with the axis, the conductors being substantially the same length, substantially the same shape, and substantially evenly spaced with respect to each other about the common axis.
    Type: Grant
    Filed: December 20, 2000
    Date of Patent: January 7, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Xue-Yu Qian, Arthur H. Sato
  • Patent number: 6492612
    Abstract: The present invention is constituted of a lower electrode structure (1) comprising a base table (2) formed of a conductive material, an electrostatic adsorption member (3) formed on the base table (2) and having a dielectric layer (4) on which the substrate to be mounted and within which an electrode (5) electrically isolated from the base table (2) is housed, first wiring (7) having an end connected to the electrode (3) of the electrostatic adsorption member, a direct-current source (8) connected to the other end of the first wiring (7), second wiring (10) having an end connected to the base table (2), a high frequency source (11) connected to the other end of the second wiring (10), a third wiring (14) for connecting the first wiring (7) and the second wiring (10), and a capacitor (13) formed on the third wiring (14). Plasma processing is performed by disposing the lower electrode structure (1) in the chamber (21).
    Type: Grant
    Filed: June 28, 2001
    Date of Patent: December 10, 2002
    Assignee: Tokyo Electron Limited
    Inventors: Chihiro Taguchi, Ryo Nonaka
  • Publication number: 20020179578
    Abstract: An electrode for a plasma arc torch and method of fabricating the same are disclosed, wherein the electrode comprises a metallic holder defining a cavity in a forward end. An emissive element and separator assembly is positioned in the cavity. The emissive element has a layer of relatively non-emissive material on the outer surface thereof, which is preferably applied by heating the emissive element to a high temperature such that the emissive element becomes reactive, and spraying the relatively non-emissive material on the emissive element. The coated emissive element is positioned in the separator and the assembly is heated such that the relatively non-emissive material forms a strong bond between with the separator. The superior bonds between the emissive element and separator formed according to the present invention extend the life span of the electrode.
    Type: Application
    Filed: May 31, 2001
    Publication date: December 5, 2002
    Inventor: Michael C. McBennett
  • Publication number: 20020179579
    Abstract: An AC plasma display panel is disclosed. The AC plasma display panel of the present invention changes the conventional disposition of three electrodes. Either the scanning electrode or sustaining electrode is disposed in the rib or on the sidewall of the rib. Also, two scanning electrodes both use the same sustaining electrode disposed on the rib. Thus, a high resolution and high precision AC plasma display panel can be obtained.
    Type: Application
    Filed: May 28, 2002
    Publication date: December 5, 2002
    Applicant: AU OPTRONICS CORP.
    Inventors: Chu-Shan Lin, Bing-Ming Ho, Jin-Yuh Lu
  • Patent number: 6489585
    Abstract: A plasma treatment apparatus includes two or more pairs of electrodes for plasma generation, a treatment chamber for accommodating the electrodes, gas supply unit for supplying a plasma-generation gas such as rare gas into the chamber, and a power supply. A pulse-like or AC voltage is applied between the electrodes to generate dielectric barrier discharge plasma of the gas in the vicinity of atmospheric pressure, so that an object placed between the electrodes is treated by the plasma. At least one of the electrodes is provided with a tubular electrode substrate and a protection layer formed by heat-fusion coating a glass-based material on at least an outer surface exposed to plasma of the tubular electrode substrate.
    Type: Grant
    Filed: July 27, 2000
    Date of Patent: December 3, 2002
    Assignee: Matsushita Electric Works, Ltd.
    Inventors: Kosuke Nakamura, Yasushi Sawada, Hiroaki Kitamura, Yoshitami Inoue
  • Patent number: 6483070
    Abstract: An electrode for supporting an arc in a plasma arc torch is provided and includes an emissive element for supporting the arc, which may be formed of hafnium; a relatively non-emissive member comprising a first metal including silver, which is positioned to circumscribe a front surface of the emissive element; and a metallic holder for holding the non-emissive member. The holder is in one embodiment made of a copper alloy including a major portion of copper and a minor portion of another metal, such as nickel. After assembly, the electrode is subjected to a heat treatment that causes a thermal bonding between the relatively non-emissive member and the metallic holder, which, during subsequent operation of the electrode, provides good thermal conduction away from the emissive element and improves the consumable life of the electrode.
    Type: Grant
    Filed: September 26, 2001
    Date of Patent: November 19, 2002
    Assignee: The ESAB Group, Inc.
    Inventors: Gregory W. Diehl, Michael C. McBennett
  • Patent number: 6472632
    Abstract: A method of producing nanocrystalline ceramic powder by creating a plasma stream in a reactor vessel, and physically converting a ceramic precursor material into ceramic particles suspended in the vessel, using the plasma stream. A metallic reactant may additionally be introduced into the vessel using the plasma stream, wherein the metallic reactant forms ceramic particles having the same composition as the ceramic particles of the physical converting step. The plasma stream is created using an electrothermal gun. The gun may use a ceramic barrel which is eroded by the plasma stream. Alternatively (or additionally), the ceramic precursor material may be injected as particulates into the plasma stream, wherein the ceramic precursor particulates are micron-sized or larger. A novel electrothermal gun design may optionally use a replaceable insert constructed of the ceramic precursor material.
    Type: Grant
    Filed: September 15, 1999
    Date of Patent: October 29, 2002
    Assignee: Nanoscale Engineering and Technology Corporation
    Inventors: Dennis Roger Peterson, Dennis Eugene Wilson
  • Publication number: 20020144982
    Abstract: A cathode assembly 10 for an electric arc spray apparatus. The cathode assembly 10 utilizes a positive cathode retention design which provides for improved heat management characteristics, quick and easy cathode replacement and increased cathode life. The cathode assembly includes a cathode holder 14, a cathode 12 including a first portion 26 which resides within the cathode holder 14, a tip portion 28 which extends from the cathode holder, and a shoulder portion 33 which is formed on the outer surface of the cathode. The cathode assembly 10 further includes a retention member or nut 16 which removably attaches to the cathode holder 14 and which engages the shoulder portion 33, effective to positively retain the cathode 12 within the holder 14. The retention member 14 also includes an aperture through which the cathode tip 28 extends.
    Type: Application
    Filed: April 5, 2001
    Publication date: October 10, 2002
    Inventors: John Edward Chancey, Lawrence Edward Ellis, Larry Gerald Gargol, Srikanth Chinthagunta Reddy
  • Publication number: 20020134766
    Abstract: A transferred plasma heating anode for heating a molten metal in a container by applying Ar plasma generated by passing a direct current through the molten metal, the transferred plasma heating anode comprising; an anode, composed of a conductive metal, that has an internal cooling structure, a metal protector having an internal cooling structure that is placed outside the anode with a constant gap between the anode and the protector, and a gas supply means that supplies an Ar-containing gas to the gap, is characterized by the central portion on the external surface of the anode tip end being inwardly recessed.
    Type: Application
    Filed: August 10, 2001
    Publication date: September 26, 2002
    Inventors: Takeshi Kawachi, Kazuto Yamamura, Hiroyuki Mitake, Junichi Kinoshita, Katsuhiro Imanaga, Masahiro Doki, Yoshiaki Kimura, Teruo Kawabata
  • Patent number: 6452130
    Abstract: An electrode for a plasma arc torch and method of fabricating the same are disclosed, and wherein the electrode comprises a copper holder defining two coaxial cavities. An emissive element is secured to one of the cavities and serves as the cathode terminal for the arc during operation. A relatively non-emissive separator is disposed about the emissive element within the other cavity, and acts to separate the copper holder and the emissive element, as well as resisting detachment of the arc from the emissive element and attachment to the copper holder.
    Type: Grant
    Filed: April 16, 2001
    Date of Patent: September 17, 2002
    Assignee: The ESAB Group, Inc.
    Inventors: Ding Qian, Tommie Zack Turner, Rue Allen Lynch
  • Publication number: 20020121505
    Abstract: The apparatus for etching a thin film using the plasma includes a reaction chamber having a diffusion area and a reaction area; an upper electrode disposed in the top of the reaction area; a lower electrode spaced apart from the upper electrode and arranged at the bottom of the reaction area; a RF power supply applying RF power to the upper and lower electrodes so as to form the plasmas between the upper and lower electrodes; a gas inlet applying processing gases to the diffusion area; gas-exhausting members sucking the residual plasmas and byproducts of the plasma etch; a buffer plate surrounding the lower electrode at the bottom of the reaction chamber and having a plurality of vent holes and vent hole protectors; and a shielding member between the lower electrode and the buffer plate, the shielding plate protecting the lower electrode from the plasmas.
    Type: Application
    Filed: December 28, 2001
    Publication date: September 5, 2002
    Inventor: Poong-Boo Seo
  • Patent number: 6444945
    Abstract: A plasma source includes a structure made up of two hollow cathode shapes connected to a bipolar AC power supply. The bipolar power supply alternately drives one hollow cathode to a negative voltage while the opposite hollow cathode is driven to a positive voltage. As one of the two hollow cathode shapes is driven negative, the hollow cathode discharge forms within the corresponding cavity. The other cathode then forms an anode, causing electrons to escape the plasma and travel to the other side, completing the electric circuit. The plasma generator thus formed may be used as a heat source for an effusion cell to form a plasma from a reactant gas, or to increase the reactivity of gas situated between a vacuum deposition source and a substrate to be coated.
    Type: Grant
    Filed: March 28, 2001
    Date of Patent: September 3, 2002
    Assignee: CP Films, Inc.
    Inventors: Peter Maschwitz, Jaime Li
  • Patent number: 6433300
    Abstract: An electrode for a plasma arc torch and method of fabricating the same are disclosed, and wherein the electrode comprises a copper holder defining a cavity in a forward end. An emissive element and separator assembly is positioned in the cavity, and no brazing materials are used to secure the components of the electrode. An intermetallic compound is formed between the emissive element and the separator, and a eutectic alloy is formed between the separator and metallic holder by independent heating steps. A crimping process is also disclosed for further strengthening the electrode and increasing the operational life span thereof.
    Type: Grant
    Filed: May 31, 2001
    Date of Patent: August 13, 2002
    Assignee: The ESAB Group, Inc.
    Inventor: Michael C. McBennett
  • Patent number: 6429400
    Abstract: A plasma processing apparatus for performing plasma processing of an article, comprising: a central electrode; a tubular outer electrode which is provided so as to surround the central electrode; a tubular reaction pipe which is disposed between the central electrode and the outer electrode so as to electrically insulate the central electrode and the outer electrode from each other; a gas supply device for supplying a plasma producing gas to a discharge space defined between the central electrode and the outer electrode in the reaction pipe; an AC power source for applying an AC voltage between the central electrode and the outer electrode; wherein not only the plasma producing gas is supplied to the discharge space by the gas supply device but the AC voltage is applied between the central electrode and the outer electrode by the AC power source so as to generate a glow discharge in the discharge space under atmospheric pressure such that a plasma jet is blown to the article from a blow-off outlet of the reac
    Type: Grant
    Filed: September 22, 2000
    Date of Patent: August 6, 2002
    Assignee: Matsushita Electric Works Ltd.
    Inventors: Yasushi Sawada, Keiichi Yamazaki, Yoshitami Inoue, Sachiko Okazaki, Masuhiro Kogoma
  • Patent number: 6423924
    Abstract: The invention relates to a method of treating the surface of a material or of an object by means of plasma generated by an electric discharge. It also relates to a device for implementing the method. The electric discharge is stabilized by confining said plasma in the form of at least one string, and the surface treatment is performed by putting the surface in contact with the plasma string along said string.
    Type: Grant
    Filed: October 23, 2000
    Date of Patent: July 23, 2002
    Assignee: Tepla AG
    Inventors: Serguei Goloviatinskii, Stanislav Begounov
  • Patent number: 6423922
    Abstract: A method of forming an electrode for a plasma arc torch is disclosed, and wherein the electrode comprises a copper holder defining an opening therein. An emissive element is secured to a cavity formed in a relatively non-emissive separator having a solid rear wall at one end thereof. The emissive element and separator are positioned within the opening defined by the copper holder such that the emissive element is surrounded by the separator and the copper holder. In this regard, the emissive element is prevented from movement along the longitudinal axis of the torch relative to the separator during a post-assembly heating step. In addition, the emissive element is not exposed to the atmosphere during the heating step, which allows a greater bond between the emissive element and the separator.
    Type: Grant
    Filed: May 31, 2001
    Date of Patent: July 23, 2002
    Assignee: The ESAB Group, Inc.
    Inventor: Valerian Nemchinsky
  • Publication number: 20020092834
    Abstract: The invention relates to an apparatus for coating a substrate with a plasma arc torch, and with such a plasma arc torch the powdery additive is to be heated, melted open and accelerated towards the surface with plasma gas generated in the plasma arc torch, and with an additional laser beam. In the plasma arc torch, an annular cathode is located or a plurality of individual cathodes are arranged about a longitudinal axis. Gas is supplied into a plasma space which is located between such an annular cathode or the plurality of cathodes, and such an annular anode. With the invention, coating is to be allowed to be formed with a higher speed and deposition rate, respectively, with respect to the conventional solution with the same and increased quality, respectively, and the directional independence for the formation of the coating is to be ensured.
    Type: Application
    Filed: December 20, 2001
    Publication date: July 18, 2002
    Applicant: Fraunhofer-Gesellschaft Zur Forderung der angewandten Forschung e.V.
    Inventors: Steffen Nowotny, Roman Zieris, Tobias Neumann, Gerhard Eckart
  • Patent number: 6420673
    Abstract: An electrode for a plasma arc torch and method of fabricating the same are disclosed, and wherein the electrode comprises a copper holder defining a cavity in a forward end. An emissive element and separator assembly is positioned in the cavity. The emissive element is formed from the powders of at least two materials, and the separator includes a material that is substantially similar to one of the materials forming the emissive element. The emissive element is heated and a plurality of thermal conductive paths are formed that extend from within the emissive element to the separator that improve the thermal conductivity of the electrode.
    Type: Grant
    Filed: February 20, 2001
    Date of Patent: July 16, 2002
    Assignee: The ESAB Group, Inc.
    Inventor: Valerian Nemchinsky
  • Patent number: 6410879
    Abstract: A device with a plasma torch with a rod-shaped non-consumable electrode which is held in a receiver, is connected with an electric connection and penetrates a nozzle which is in connection with a gas connection. In order to also enable the rapid and secure welding of difficult alloys it is provided that a further rod-shaped non-consumable electrode is disposed in the receiver which is made from an electrically non-conducting material, which further electrode also penetrates a nozzle which is in connection with a gas connection, with the two electrodes enclosing an acute angle and each being in connection with a separate voltage source supplying direct voltage pulses, the level of which exceeds at least the arc voltage of an arc between one of the electrodes and a counterelectrode which is associated with the same and connected with the same voltage source.
    Type: Grant
    Filed: June 18, 2001
    Date of Patent: June 25, 2002
    Assignee: Inocon Technologie Ges.m.b.H
    Inventor: Gerhard Schwankhart
  • Patent number: 6410880
    Abstract: A plasma torch for vaporizing a molten salt containing a volatile component and a refractory component injects the molten salt into a device that includes a cylindrical shaped outer member and a cylindrical shaped inner member coaxially positioned inside the outer member to surround a chamber. An induction coil positioned between the inner and outer members generates r.f. power which is initially used to vaporize the volatile component of the molten salt to create a carrier gas having an elevated temperature. The carrier gas then heats the refractory component, under an increased vapor pressure from the carrier gas. This action, in turn, breaks down the refractory component of the molten salt into fine droplets. These fine droplets are maintained in the chamber until they also vaporize. In one embodiment, the plasma torch includes a nozzle for spraying droplets of the molten salt into said chamber.
    Type: Grant
    Filed: January 10, 2000
    Date of Patent: June 25, 2002
    Assignee: Archimedes Technology Group, Inc.
    Inventors: Sergei Putvinski, Stephen F. Agnew, Tihiro Ohkawa, Leigh Sevier
  • Patent number: 6407359
    Abstract: The invention provides apparatus having a series of individual plasma excitation devices each constituted by a wire applicator of microwave energy, having one end connected to a source for producing microwave energy and having an opposite end fitted with at least one magnetic dipole for creating at least one surface having a magnetic field that is constant and of intensity corresponding to electron cyclotron resonance, the dipole being mounted at the end of the microwave applicator in such a manner as to ensure that electrons accelerated to electron cyclotron resonance oscillate between the poles so as to create a plasma diffusion zone situated on the side of the dipole that is remote from the end of the applicator, the individual excitation devices being distributed relative to one another and in proximity with the work surface so as to create together a plasma that is uniform for the work surface.
    Type: Grant
    Filed: August 2, 2000
    Date of Patent: June 18, 2002
    Assignee: Metal Process (Societe a Responsabilite Limitee)
    Inventors: Thierry Lagarde, Jacques Pelletier
  • Patent number: 6403915
    Abstract: An electrode having a ribbed configuration providing a large surface area for cooling the electrode. The electrode includes an elongated electrode body having a first end and a second end. The electrode also includes a shoulder having an enlarged diameter body integral with the electrode body. The shoulder has an imperforate face toward the first end and at least one rib extending aft of the face towards the second end of the electrode body.
    Type: Grant
    Filed: August 31, 2000
    Date of Patent: June 11, 2002
    Assignee: Hypertherm, Inc.
    Inventors: David J. Cook, Charles A. Landry, Steve J. Schaefer
  • Publication number: 20020060207
    Abstract: A device to place an incision into matter with a harmonious plasma cloud. A radiofrequency generator system produces pulsed or continuous electromagnetic waveform which is transmitted by an active transmitter incising electrode tip. This generated electromagnetic wave is utilized to initiate a plasma cloud with processes such as thermal ionization and a photoelectric effect which then trigger an Avalanche Effect for charged atomic particles at the surface of the active transmitter incising electrode tip. This electromagnetic wave is impedance matched, frequency matched, power matched and tuned to the plasma cloud in order to sustain and control a harmonious plasma cloud with reduced atomic particle turbulence and chaos. This harmonious plasma cloud forms a coating over the surface of the active transmitter electrode tip as well as acts to reduce the energy needed from the power amplifier of our plasma cutting device.
    Type: Application
    Filed: October 31, 2001
    Publication date: May 23, 2002
    Inventors: Damian Coccio, Richard J. Fugo
  • Patent number: 6388381
    Abstract: A miniaturized construction and slit end orifice configurations of a constricted glow discharge chamber and method are disclosed. The polarity and geometry of the constricted glow discharge plasma source is set so that the contamination and energy of the ions discharged from the source are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a homogeneous linear plasma stream with contamination below practical detection limits. Other configuration include a hollow chamber with an anode outside the chamber located opposite its discharge constriction orifice. The constriction orifice may be circular or a slit and can be aligned to form a linear array for processing web substrates.
    Type: Grant
    Filed: February 19, 1999
    Date of Patent: May 14, 2002
    Assignee: The Regents of the University of California
    Inventor: Andre Anders
  • Publication number: 20020050486
    Abstract: A plasma processing apparatus includes a processing container 53, a mounting table 61 arranged in the processing container 53 to support a wafer W, a sealing plate 55 opposed to the wafer W supported by the mounting table 61, an annular antenna 73 arranged on the sealing plate 55 and consisting of an annular waveguide to introduce a microwave into the processing container 53 through the sealing plate 55, the annular antenna 73 being arranged so that a plane containing an annular waveguide path defined by the annular waveguide is generally parallel with the sealing plate 55, a directional coupler 79 arranged on the periphery of the annular antenna 73, a propagation waveguide 81 connected to the directional coupler 79 and a microwave oscillator 83 connected to the propagation waveguide 81. Accordingly, it is possible to form an uniform microwave in the antenna, so that an uniform plasma can be produced in the processing container.
    Type: Application
    Filed: October 12, 2001
    Publication date: May 2, 2002
    Inventors: Nobuo Ishii, Kibatsu Shinohara
  • Patent number: 6380507
    Abstract: Apparatus and a method are disclosed for generating energy from the essentially complete disassociation of organic matter in a plasma arc furnace operating under pyrolytic conditions. Energy is produced by the disassociation in the form of synthesis gases such as hydrogen and carbon monoxide that can be used to generate electricity, and heat energy from the process and from burning the synthesis gasses are also used to generate electricity. In addition, inorganic matter that is input to the furnace is rendered ecologically and biologically safe and is extracted from the furnace to be re-cycled into new uses such as insulation and road paving material. Organic matter, along with non-organic matter, is pre-processed and sized before being input to the plasma arc furnace. The pre-processed matter is fed into a molten silica bath in the furnace through hollow electrodes that are inserted into the silica bath to create the plasma arc.
    Type: Grant
    Filed: April 25, 2000
    Date of Patent: April 30, 2002
    Inventor: Wayne F. Childs
  • Publication number: 20020046990
    Abstract: The present invention generally provides a substrate processing system having a thermally conductive and electrically insulative member coupled to a heated member that provides for heat dissipation from the heated member. In a preferred embodiment, the present invention provides for heat dissipation through thermal conductance of an electrically insulated coil in an IMP reaction chamber.
    Type: Application
    Filed: December 10, 2001
    Publication date: April 25, 2002
    Applicant: Applied Materials, Inc.
    Inventors: Richard Hong, James H. Tsung, Gunnar Vatvedt, Peijun Ding, Arvind Sundarrajan
  • Publication number: 20020046993
    Abstract: A method of producing nanocrystalline ceramic powder by creating a plasma stream in a reactor vessel, and physically converting a ceramic precursor material into ceramic particles suspended in the vessel, using the plasma stream. A metallic reactant may additionally be introduced into the vessel using the plasma stream, wherein the metallic reactant forms ceramic particles having the same composition as the ceramic particles of the physical converting step. The plasma stream is created using an electrothermal gun. The gun may use a ceramic barrel which is eroded by the plasma stream. Alternatively (or additionally), the ceramic precursor material may be injected as particulates into the plasma stream, wherein the ceramic precursor particulates are micron-sized or larger. A novel electrothermal gun design may optionally use a replaceable insert constructed of the ceramic precursor material.
    Type: Application
    Filed: September 5, 2001
    Publication date: April 25, 2002
    Inventors: Dennis Roger Peterson, Dennis Eugene Wilson
  • Publication number: 20020043520
    Abstract: A radio frequency generated plasma is provided to a skin surface in a controlled manner, in order to heat and selectively damage a thin superficial layer, thereby inducing a renewal process of the epidermis. The plasma is generated by providing a vacuum to the probe, and also providing an rf pulse to an electrode within the probe, thereby creating a glow discharge that includes gas ions that contact the skin and cause the skin to heat up.
    Type: Application
    Filed: October 12, 2001
    Publication date: April 18, 2002
    Inventor: Gian Franco Bernabei
  • Patent number: 6373023
    Abstract: Thermionic emission of electrons is utilized to initiate arc discharge in a pulsed plasma thruster.
    Type: Grant
    Filed: March 2, 2000
    Date of Patent: April 16, 2002
    Assignee: General Dynamics (OTS) Aerospace, Inc.
    Inventors: William A. Hoskins, Robert J. Cassady
  • Publication number: 20020040889
    Abstract: A method and apparatus for plasma waste disposal of hazardous waste material, where the hazardous material is volatilized under vacuum inside a containment chamber to produce a pre-processed gas as input to a plasma furnace including a plasma-forming region in which a plasma-forming magnetic field is produced. The pre-processed gas is passed at low pressure and without circumvention through the plasma-forming region and is directly energized to an inductively coupled plasma state such that hazardous waste reactants included in the pre-processed gas are completely dissociated in transit through the plasma-forming region. Preferably, the plasma-forming region is shaped as a vacuum annulus and is dimensioned such that there is no bypass by which hazardous waste reactants in the pre-processed gas can circumvent the plasma-forming region. The plasma furnace is powered by a high frequency power supply outputting power at a fundamental frequency.
    Type: Application
    Filed: December 20, 2000
    Publication date: April 11, 2002
    Applicant: Research Triangle Institute
    Inventors: Robert J. Markunas, John B. Posthill, Robert C. Hendry, Raymond Thomas
  • Publication number: 20020033386
    Abstract: A device with a plasma torch with a rod-shaped non-consumable electrode (3, 4) which is held in a receiver (1), is connected with an electric connection and penetrates a nozzle (9) which is in connection with a gas connection. In order to also enable the rapid and secure welding of difficult alloys it is provided that a further rod-shaped non-consumable electrode (3, 4) is disposed in the receiver (1) which is made from an electrically non-conducting material, which further electrode also penetrates a nozzle (9′) which is in connection with a gas connection, with the two electrodes (3, 4) enclosing an acute angle and each being in connection with a separate voltage source (31, 32) supplying direct voltage pulses, the level of which exceeds at least the arc voltage of an arc between one of the electrodes (3, 4) and a counterelectrode which is associated with the same and connected with the same voltage source (31, 32).
    Type: Application
    Filed: June 18, 2001
    Publication date: March 21, 2002
    Applicant: Inocon Technologie Ges.m.b.H
    Inventor: Gerhard Schwankhart