Abstract: There is provided a sample processing and observing method including irradiating a focused ion beam to a sample to form an observed surface, irradiating an electron beam to the observed surface to form an observed image, removing the surface opposite to the observed surface of the sample, forming a lamella including the observed surface and obtaining a transmission observed image for the lamella.

Abstract: In a scanning electron microscope, an optimum scanning method for reducing the amount of deflection of a primary electron beam and secondary electrons is determined to acquire stable images. An energy filter is used to discriminate between energy levels. The change in yield of obtained electrons is used to measure the variation in specimen potential. The time constant of charging created during electron beam irradiation is extracted. The scanning method is optimized based on the extracted time constant to reduce the distortion and magnification variation that appear in a SEM image.

Abstract: A substrate surface inspection method inspects for a defect on a substrate including a plurality of materials on a surface thereof. The inspection method comprises: irradiating the surface of the substrate with an electron beam, a landing energy of the electron beam set such that a contrast between at least two types of materials of the plurality of materials is within a predetermined range; detecting electrons generated by the substrate to acquire a surface image of the substrate, with a pattern formed thereon from the at least two types of materials eliminated or weakened; and detecting the defect from the acquired surface image by detecting as the defect an object image having a contrast by which the object image can be distinguished from a background image in the surface image. Defects present on the substrate surface can be detected easily and precisely by using a cell inspection.

Abstract: This invention provides a monochromator for reducing energy spread of a primary charged particle beam in charged particle apparatus, which comprises a beam adjustment element, two Wien-filter type dispersion units and an energy-limit aperture. In the monochromator, a double symmetry in deflection dispersion and fundamental trajectory along a straight optical axis is formed, which not only fundamentally avoids incurring off-axis aberrations that actually cannot be compensated but also ensures the exit beam have a virtual crossover which is stigmatic, dispersion-free and inside the monochromator. Therefore, using the monochromator in SEM can reduce chromatic aberrations without additionally incurring adverse impacts, so as to improve the ultimate imaging resolution. The improvement of the ultimate imaging resolution will be more distinct for Low-Voltage SEM and the related apparatuses which are based on LVSEM principle, such as the defect inspection and defect review in semiconductor yield management.

Abstract: A transmission electron microscope includes an electron gun 1 that irradiates a sample 5 with an electron beam 2; an electron detector 13 that detects electrons that are passed through the sample 5 and scattered; a first detection-side annular aperture 15 that is located between the electron detector 13 and the sample 5 and has a ring-shaped slit that limits inner and outer diameters of a transmission region of electrons scattered from the sample 5; and a second detection-side annular aperture 16 that is located between the first detection-side annular aperture 15 and the electron detector 13 and has a ring-shaped slit that limits inner and outer diameters of a transmission region of scattered electrons that have passed through the first detection-side annular aperture 15. It is, therefore, possible to detect electrons scattered at high scattering angles without a limitation caused by a spherical aberration of an electron lens and improve a depth resolution.

Abstract: Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization ion source is comprised of an emitter tip (21) for generating ions; an emitter base mount (64) for supporting the emitter tip; an ionizing chamber which has an extraction electrode (24) opposed to the emitter tip and which is configured so as to surround the emitter tip (21); and a gas supply tube (25) for supplying gas to the vicinity of the emitter tip. The emitter base mount and a vacuum container magnetically interact with each other.

Abstract: A transmission electron microscope is capable of correcting, with high efficiency and high accuracy, an electron energy loss spectrum extracted from each of measured portions included in an electron energy loss spectral image with two axes representing the amount of an energy loss and positional information on a measured portion. The transmission electron microscope has an electron spectroscope and a spectrum correction system. The spectrum correction system corrects a spectrum extracted from each measured portion included in an electron energy loss spectral image acquired from a sample based on a difference between a spectrum extracted from a standard portion of a standard spectral image and a spectrum extracted from a portion different from the standard portion.

Abstract: In a method and apparatus for measuring a potential on a surface of a sample using a charged particle beam while restraining a change in the potential on the sample induced by the charged particle beam application, or detecting a compensation value for a change in a condition for the apparatus caused by the sample being electrically charged, a voltage is applied to a sample such that a charged particle beam does not reach the sample (referred to as “mirror state”) when the charged particle beam is applied toward the sample. Information is detected, relating to a potential on the sample using signals obtained by the voltage application.

Abstract: There is provided a charged particle radiation device provided with an aberration corrector capable of correcting aberration with high precision in a short time by automatically setting an aberration coefficient measuring condition to thereby realize measurement with high precision. The charged particle radiation device has a feature that a value of defocus and a value of astigma, occurring owing to aberration at the time of the beam tilting, are estimated on the basis of results of aberration measurement, thereby adjusting an electron optical system on the basis of these values.

Abstract: A method and apparatus for in-situ lift-out rapid preparation of TEM samples. The invention uses adhesives and/or spring-loaded locking-clips in order to place multiple TEM-ready sample membranes on a single TEM support grid and eliminates the use of standard FIB-assisted metal deposition as a bonding scheme. Therefore, the invention circumvents the problem of sputtering from metal deposition steps and also increases overall productivity by allowing for multiple samples to be produced without opening the FIB/SEM vacuum chamber.

Abstract: A pattern measurement apparatus and a pattern measurement method are capable of easily distinguishing a line pattern and a space pattern from one another, without being affected by the luminance of the pattern. The pattern measurement apparatus includes: irradiation unit for irradiating a sample with an electron beam; first electron detector and second electron detector arranged with an optical axis of the electron beam in between; image processor for generating image data of the pattern; line profile generator for generating a line profile of the pattern; and controller for causing the image processor to generate the image data of the pattern on the basis of an amount of electrons corresponding to the difference between a signal detected by the first electron detector and a signal detected by the second electron detector.

Abstract: One embodiment relates to an apparatus for generating two spatially overlapping electron beams on a specimen. A first electron beam source is configured to generate a low-energy electron beam, and an energy-dispersive device bends the low-energy electron beam towards an semitransparent electron mirror. The semitransparent electron mirror is biased to reflect the low-energy electron beam. A second electron beam source is configured to generate a high-energy electron beam that passes through an opening in the semitransparent electron mirror. Both the low- and high-energy electron beams enter the same energy-dispersive device that bends both beams towards the specimen. A deflection system positioned between the high-energy electron source and semitransparent electron mirror is configured to deflect the high-energy electron beam by an angle that compensates for the difference in bending angles between the low- and high-energy electron beams introduced by the energy-dispersive device.

Abstract: A charged particle radiation device wherein the position or the size of a FOV can be easily determined even if a number of measuring points are provided on a sample, and an image capturing condition determining method using the charged particle radiation device are provided. An image capturing condition determining method wherein the field of view of a charged particle radiation device is determined so as to include a plurality of measuring points, characterized in that whether or not the measuring points are overlapped with four sides of the field of view is judged; the field of view is moved so that the measuring points are moved to the inside or outside of the field of view; and the position of the field of view after being moved is determined as a position of the field of view of the charged particle radiation device, and a device to realize the method are proposed.

Abstract: An identification and verification system and a process for said identification and verification of documents is disclosed, which is based on the use of nanoparticles embedded or adsorbed in the document support, utilising the different optical reflectance characteristics thereof in order to obtain, by combining several nanoparticles with specific characteristics, a high effectiveness in the identification of counterfeits.

Abstract: Method and system to obtain confocal STEM images. Arithmetic and control device extracts diffraction images respectively corresponding to successive pixel positions from the images stored in the memory, selects and corrects center positions of the extracted diffraction images, creates an image set having diffraction information in which the center positions of the diffraction images have been corrected and aligned, selects only innermost portions of the diffraction images of the created image set, and reproduces STEM images from the diffraction images, thus obtaining a confocal STEM image.

Abstract: A method and device for electron diffraction tomography of a crystal sample, which employs scanning of the electron beam over a plurality of discrete locations of the sample, in combination with a beam scanning protocol as the beam converges at every discrete location (42, 43) of the sample (38) to obtain a series of electron diffraction patterns, use of template matching to determine crystal orientations and thickness maps to obtain a common intensity scaling factor.

Abstract: An electron microscope has an electron beam source generating an accelerated electron beam, electromagnetic lenses for converging the electron beam, alignment coils for adjusting the optical axis of the beam transmitted through the lenses, a control unit for controlling the ambient around a specimen, at least one vacuum pump mounted in a given location of the electron optical column, a gas inlet device mounted near the specimen, an imager for creating an image based on a signal arising from the region of the specimen illuminated with the beam, an image output device for recording and displaying the image, and a computer for controlling these components. The computer finds the orifices to be used and diameters of orifices at which the pressure is maintained without electrical discharge in an electron beam source from the selected gas species and the pressure around the specimen.

Abstract: A particle beam device includes a movable carrier element with at least one receiving element for receiving a specimen and in which the receiving element is situated on the carrier element. In various embodiments, the receiving element may be situated removably on the carrier element and/or multiple receiving elements may be situated on the carrier element in such a way that a movement of the carrier element causes a movement of the multiple receiving elements in the same spatial direction or around the same axis. The carrier element may be movable in three spatial directions situated perpendicular to one another and rotatable around a first axis which is parallel to an optical axis of the particle beam device and around a second axis which is situated perpendicular to the optical axis. A method for using the particle beam device in connection with specimen study and preparation is also disclosed.

Abstract: The present invention provides methods, devices, and systems for analyzing defects in an object such as a semiconductor wafer. In one embodiment, it provides a method of characterizing defects in semiconductor wafers during fabrication in a semiconductor fabrication facility. This method comprises the following actions. The semiconductor wafers are inspected to locate defects. Locations corresponding to the located defects are then stored in a defect file. A dual charged-particle beam system is automatically navigated to the vicinity defect location using information from the defect file. The defect is automatically identified and a charged particle beam image of the defect is then obtained. The charged particle beam image is then analyzed to characterize the defect. A recipe is then determined for further analysis of the defect. The recipe is then automatically executed to cut a portion of the defect using a charged particle beam.

Abstract: The present invention relates to methods and systems for 4D ultrafast electron microscopy (UEM)—in situ imaging with ultrafast time resolution in TEM. Single electron imaging is used as a component of the 4D UEM technique to provide high spatial and temporal resolution unavailable using conventional techniques. Other embodiments of the present invention relate to methods and systems for convergent beam UEM, focusing the electron beams onto the specimen to measure structural characteristics in three dimensions as a function of time. Additionally, embodiments provide not only 4D imaging of specimens, but characterization of electron energy, performing time resolved electron energy loss spectroscopy (EELS).

Abstract: A system and method determines the shape of a surface that preferably is a deployed space-based adaptive flexible membrane antenna, using patterned projections, image capturing, and membrane shape processing for producing membrane shape data describing the contour of the surface of the membrane with the membrane shape data then preferably used as inputs for a feedback control actuation system for deforming the membrane to a desired shaped so as to maintain the three-dimensional shape of the membrane in the desired shape.

Abstract: A charged particle shaped beam column includes: a charged particle source; a gun lens configured to provide a charged particle beam approximately parallel to the optic axis of the column; an objective lens configured to form the charged particle shaped beam on the surface of a substrate, wherein the disk of least confusion of the objective lens does not coincide with the surface of the substrate; an optical element with 8N poles disposed radially symmetrically about the optic axis of the column, the optical element being positioned between the condenser lens and the objective lens, wherein N is an integer greater than or equal to 1; and a power supply configured to apply excitations to the 8N poles of the optical element to provide an octupole electromagnetic field. The octupole electromagnetic field is configured to induce azimuthally-varying third-order deflections to the beam trajectories passing through the 8N-pole optical element.

Abstract: Design data and sample characteristic information corresponding to individual areas on the design data are used to perform an image quality improvement operation to make appropriate improvements on image quality according to sample characteristic corresponding to the individual areas on the image, allowing a high speed area division on the image. Further, the use of a database that stores image information associated with the design data allows for an image quality improvement operation that automatically emphasizes portions of the image that greatly differ from past images of the similar design data.

Abstract: The present invention is concerned with a procedure to quantitatively determine both, total and effective porosity of carbonated sedimentary rocks, and is based on the elaboration of molds of the rock pores-structure and on the determination of the volumetric and gravimetric properties of the rock and its mold. Determination of the effective porosity is achieved by using an original formula, developed by the authors of the present invention. Additionally, the structure of micro and nanopores in the rock is characterized by scanning electron microscopy (SEM), to identify relevant properties for permeability analyses such as: dimensions, shapes, type of connections, pore-structure patterns and pore throats. These and other parameters are used as indicators of the reservoir production and storage capacity.

Abstract: An image of a measurement object is displayed, and specification of a feature image and a measurement position is received on the displayed image. The feature image, the specification has been received, and information on relative positions for the feature image, which represents the measurement position and a display position of a dimension line, are stored. A newly acquired image of the measurement object is compared with the feature image to identify information on the attitude and the position of the image of the measurement object. A measurement position is set for the image of the measurement object with the identified attitude and position, and then predetermined physical quantities are measured. Based on the stored information on the relative position for the feature image displaying the dimension line, a dimension line indicating a measurement position and a measurement result are displayed at predetermined positions.

Abstract: A method of investigating a sample using Scanning Electron Microscopy (SEM), comprising the following steps: Irradiating a surface (S) of the sample using a probing electron beam in a plurality (N) of measurement sessions, each measurement session having an associated beam parameter (P) value that is chosen from a range of such values and that differs between measurement sessions; Detecting stimulated radiation emitted by the sample during each measurement session, associating a measurand (M) therewith and noting the value of this measurand for each measurement session, thus allowing compilation of a data set (D) of data pairs (Pi, Mi), where 1?i?N, wherein: A statistical Blind Source Separation (BSS) technique is employed to automatically process the data set (D) and spatially resolve it into a result set (R) of imaging pairs (Qk, Lk), in which an imaging quantity (Q) having value Qk is associated with a discrete depth level Lk referenced to the surface S.

Abstract: To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 10?10 Torr without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.

Abstract: A charged particle beam apparatus of the present invention comprises a transmission electron detector (113; 206) having a detection portion divided into multiple regions (201 to 205; 301 to 305), wherein a film thickness of a sample is calculated by detecting a transmission electron beam (112) generated from the sample when the sample is irradiated with an electron beam (109), as a signal of each of the regions in accordance with scattering angles of the transmission electron beam, and thereafter calculating the intensities of the individual signals. According to the above, there is provided a charged particle beam apparatus capable of performing accurate film thickness monitoring while suppressing an error due to an external condition and also capable of processing a thin film sample into a sample having an accurate film thickness, which makes it possible to improve the accuracy in structure observations, element analyses and the like.

Abstract: A method for Transmission Electron Microscopy (TEM) sample creation. The use of a Scanning Electron Microscope (SEM)—Scanning Transmission Electron Microscope (STEM) detector in the dual-beam focused ion beam (FIB)/SEM allows a sample to be thinned using the FIB, while the STEM signal is used to monitor sample thickness. A preferred embodiment of the present invention can measure the thickness of or create TEM and STEM samples by using a precise endpoint detection method. Preferred embodiments also enable automatic endpointing during TEM lamella creation and provide users with direct feedback on sample thickness during manual thinning. Preferred embodiments of the present invention thus provide methods for endpointing sample thinning and methods to partially or fully automate endpointing.

Abstract: A method of inspecting an object using a scanning particle beam microscope, the method comprising: operating the microscope in a high-resolution mode by laterally scanning a particle beam of the high-resolution mode; operating the microscope in a 3D-mode for acquiring a three-dimensional representation of the object by laterally scanning a particle beam of the 3D-mode; wherein the particle beam of the high-resolution mode and the particle beam of the 3D-mode have a same beam energy and a same focus distance; and wherein an aperture angle of the particle beam of the 3D-mode is at least 2 times greater, or at least 5 times greater, or at least 10 times greater, or at least 100 times greater than an aperture angle of the particle beam of the high-resolution mode.

Abstract: A method of measuring a three-dimensional device in a wafer is provided. The method comprises the step of forming a trench in the wafer. The trench has a facet passing through the three-dimensional device a predetermined offset from a desired image position. The method further comprises iteratively, until a remaining distance between the facet and the desired image position is less than a predetermined threshold, adjusting one or more parameters of a polishing beam based on the remaining distance, polishing the facet with the polishing beam to position the facet closer to the desired image position, and measuring the remaining distance.

Abstract: A ponderomotive phase plate system and method for controllably producing highly tunable phase contrast transfer functions in a transmission electron microscope (TEM) for high resolution and biological phase contrast imaging. The system and method includes a laser source and a beam transport system to produce a focused laser crossover as a phase plate, so that a ponderomotive potential of the focused laser crossover produces a scattering-angle-dependent phase shift in the electrons of the post-sample electron beam corresponding to a desired phase contrast transfer function.

Abstract: A pattern data examination method and system capable of accurately and speedily examining a circuit pattern without failing to extract pattern contour data are provided. While pattern comparison is ordinarily made by using a secondary electron image, a contour of a pattern element is extracted by using a backscattered electron image said to be suitable for observation and examination of a three dimensional configuration of a pattern element, and pattern inspection is executed by using the extracted contour of the pattern element. More specifically, pattern inspection is executed by comparing a contour of a pattern element with design data such as CAD data to measure a difference between the contour and the data, and by computing, for example, the size of the circuit pattern element from the contour of a pattern.

Abstract: A particle optical arrangement providing an electron microscopy system 3 and an ion beam processing system 7 comprises an objective lens 43 of the electron microscopy system having an annular electrode 59 being a component of the electron microscopy system arranged closest to a position 11 of an object to be examined. Between the annular electrode and a principal axis 9 of the ion beam processing system 7 a shielding electrode 81 is arranged.

Abstract: A method of inspecting an EUV reticle is proposed, which uses an electron beam (EB) with low density and high energy to scan the surface of an EUV reticle for inspecting the EUV reticle. A step of conditioning surface charge is followed by a step of inspecting surface of the EUV reticle. The step of conditioning surface can neutralize the surface charge and the step of inspecting can obtain an image of the EUV reticle. The present invention uses a scanning electron microscope (SEM) to provide a primary electron beam for conditioning the surface charge and a focused primary electron beam for scanning the surface.

Abstract: A scanning electron microscope can discriminate secondary particles in a desired energy region by band-pass and detect the secondary particles with a high yield point. Even when a lens 23 is disposed on an electron source side of an objective lens 18, and a primary electron beam forms any optical system on the electron gun side of the lens, the lens operates the primary electron beam to be converged to a convergent point 24 that is a specific position. A detection ExB 16 that supplies a field that affects the locus of the secondary particles that are generated from a specimen 2 is disposed at the convergent point 24 of the primary electron beam so as to lead only the secondary particles in a specific energy range to a detection unit 13.

Abstract: Apparatus, systems, and methods may operate to receive incident energy within a chamber defining a first part of an interaction volume that attenuates the incident energy as a function of path length to provide attenuated energy. Additional activity may include simultaneously transforming the attenuated energy characterized by a substantially exponential intensity function into resultant energy characterized by a substantially polynomial intensity function. The transformation may be accomplished using an interacted energy transformation element that defines a second part of the interaction volume, the transformation element operating to intercept the attenuated energy along a plurality of path lengths. Other activity may include transmitting the resultant energy to a receiver. Additional apparatus, systems, and methods are disclosed.

Abstract: Silicon grids with electron-transparent SiO2 windows for use as substrates for high-resolution transmission electron microscopy of chemically-modified SiO2 surfaces are fabricated by forming an oxide layer on a silicon substrate. An aperture is defined in the silicon substrate by etching the substrate to the oxide layer. A single substrate can include a plurality of apertures that are in respective frame regions that are defined by one or more channels in the substrate. Structural or chemical functionalizations can be provided, and surface interactions observed via TEM.

Abstract: An electron beam apparatus equipped with a height detection system includes an electron beam unit emitting an electron beam to the specimen, and a height detection system for detecting height of the specimen which is set on a table. The height detection system includes an illumination system configured to direct first and second beams of light through a mask with a multi-slit pattern to a surface of the specimen at substantially opposite azimuth angles and at substantially equal angles of incidence, first and second detectors which respectively detect first and second multi-slit images of the first and second beams reflected from the specimen and generate output signals thereof, and a device which receives the output signals and generates a comparison signal which is responsive to the height of the specimen. An objective lens of the electron beam unit is controlled in accordance with the comparison signal.

Abstract: A transmission electron microscope (TEM) micro-grid includes a pure carbon grid having a plurality of holes defined therein and at least one carbon nanotube film covering the holes. A method for manufacturing a TEM micro-grid includes following steps. A pure carbon grid precursor and at least one carbon nanotube film are first provided. The at least one carbon nanotube film is disposed on a surface of the pure carbon grid precursor. The pure carbon grid precursor and the at least one carbon nanotube film are then cut to form the TEM micro-grid in desired shape.

Abstract: A method for imaging a surface, including scanning a first region of the surface with a primary charged particle beam at a first scan rate so as to generate a first secondary charged particle beam from the first region, and scanning a second region of the surface with the primary charged particle beam at a second scan rate faster than the first scan rate so as to generate a second secondary charged particle beam from the second region. The method also includes receiving the first secondary charged particle beam and the second secondary charged particle beam at a detector configured to generate a signal in response to the beams, and forming an image of the first and the second regions in response to the signal.

Abstract: A system and method for using electron beams with engineered phase dislocations as scanned probes in electron probe beam instruments such as scanning transmission electron microscopes. These types of electron beams have unique properties and can provide better information about a specimen than conventional electron beams. Phase dislocations may be created based on a pattern disposed on a nanoscale hologram, which may be placed in the electron optical column of the electron probe beam instrument. When an electron beam from the instrument is directed onto the hologram, phase dislocations may be imprinted onto the electron beam when electrons are diffracted from these holograms. For example, electron probe beams with spiral phase dislocations may occur. These spiral phase dislocations are formed using a hologram with a fork-patterned grating. Spiral phase dislocations may be used to provide magnetic contrast images of a specimen.

Abstract: A corrector (10) for an electron microscope is proposed which is less sensitive to fluctuations of the electrical power supply if a stigmatic intermediate image (9) of the axial fundamental rays (x?, y?) is produced in the quadrupole field (1?) of a first quadrupole element (1) and this quadrupole field (1?) is set such that astigmatic intermediate images (12, 13) of the off-axial fundamental rays (x?, y?) are produced in the region of the center of the quadrupole fields (3?, 4?) of a third (3) and fourth multipole element (4) and there also, due to the setting of the quadrupole field (2?) of a second quadrupole element (2), the axial fundamental rays (x?, y?) of the same section (x, y) as that, in which the intermediate images (12, 13) of the off-axial fundamental rays (x?, y?) are located, each exhibit a maximum.

Abstract: A focused charged particle beam apparatus including an aberration corrector, capable of finding the absolute value of the aberration coefficient at high speed, and capable of making high-accuracy adjustments at high speed. A deflection coil tilts the input beam relative to the object point, and measures the defocus data and aberration quantity at high speed while the beam is tilted from one image, and perform least squares fitting on these results to find the absolute value of the aberration coefficient prior to tilting the beam, and to adjust the aberration corrector.

Abstract: The present invention relates to methods and systems for 4D ultrafast electron microscopy (UEM)—in situ imaging with ultrafast time resolution in TEM. Single electron imaging is used as a component of the 4D UEM technique to provide high spatial and temporal resolution unavailable using conventional techniques. Other embodiments of the present invention relate to methods and systems for convergent beam UEM, focusing the electron beams onto the specimen to measure structural characteristics in three dimensions as a function of time. Additionally, embodiments provide not only 4D imaging of specimens, but characterization of electron energy, performing time resolved electron energy loss spectroscopy (EELS).

Abstract: The invention provides a charged particle beam device to inspect or structure a specimen with a primary charged particle beam propagating along an optical axis; a beam tube element having a tube voltage; and a retarding field analyzer in the vicinity of the beam tube element to detect secondary charged particles generated by the primary charged particle beam on the specimen. According to the invention, the retarding field analyzer thereby comprises an entrance grid electrode at a second voltage; at least one filter grid electrode at a first voltage; a charged particle detector to detect the secondary charged particles; and at least one further electrode element arranged between the entrance grid electrode and the at least one filter grid electrode. The at least one further electrode element reduces the size of the stray fields regions in the retarding electric field region to improve the energy resolution of the retarding field analyzer.

Abstract: An apparatus basically uses a simple and compact multi-axis magnetic lens to focus each of a plurality of charged particle beams on sample surface at the same time. In each sub-lens module of the multi-axis magnetic lens, two magnetic rings are respectively inserted into upper and lower holes with non-magnetic radial gap. Each gap size is small enough to keep a sufficient magnetic coupling and large enough to get a sufficient axial symmetry of magnetic scale potential distribution in the space near to its optical axis. This method eliminates the non-axisymmetric transverse field in each sub-lens and the round lens field difference among all sub-lenses at the same time; both exist inherently in a conventional multi-axis magnetic lens.

Abstract: One embodiment relates to a method of automated inspection of scattered hot spot areas on a manufactured substrate using an electron beam apparatus. A stage holding the substrate is moved along a swath path so as to move a field of view of the electron beam apparatus such that the moving field of view covers a target area on the substrate. Off-axis imaging of the hot spot areas within the moving field of view is performed. A number of hot spot areas within the moving field of view may be determined, and the speed of the stage movement may be adjusted based on the number of hot spot areas within the moving field of view. Another embodiment relates to an electron beam apparatus for inspecting scattered areas on a manufactured substrate. Other embodiments, aspects and features are also disclosed.

Abstract: Compact, dual energy radiation scanning systems are described comprising two particle beam accelerators, each configured to accelerate charged particles to different energies, positioned parallel to a direction of movement of an object to be inspected. The accelerator may be positioned perpendicular to a plane of the conveying system, instead. Bend magnet systems bend each charged particle beam toward a respective target. Alternatively, a single dual energy accelerator capable of accelerating charged particles to at least two different energies is positioned parallel to the direction of movement of the object, or perpendicular to a plane of the conveying system. A single bend magnet system is provided to bend each accelerated charged particle beam toward the same target. The particle beams may be bent through an orbit chamber. Two separate passages may be defined through at least part of the orbit chamber, one for charged particles having each energy.

Abstract: Provided is a signal processing method for a charged particle beam, and a signal processing device, wherein the amount of beam radiation per unit area is restricted, while maintaining the magnifications in the X and Y directions constant. Proposed, in order to achieve the above-mentioned purpose, is a signal processing method and a signal processing device wherein a plurality of images taken at different places are added up, and an image is formed. Proposed as a specific example is a signal processing method and a signal processing device that obtains a repeating pattern formed on a sample and having the same shape or similar shapes, by moving the field of view, and that forms an image (or a signal waveform) by adding up the obtained signal, and conducts measurements using this image.