Abstract: Provided is a charged particle beam device that is capable of suppressing an field-of-view deviation occurring when observing a tilted image or a left-right parallax-angle image acquired by irradiating a tilted beam on a sample while continuously compensating a focus. By means of an aligner for compensating field-of-view (54) installed between an objective lens (7) that focuses a primary charged particle beam on a surface of the sample (10), and a deflector for controlling tilt angle (53) that tilts the primary charged particle beam, the field-of-view deviation occurring during tilting of the primary charged particle beam is suppressed based on an amount of compensation required by a tilt angle of the deflector for controlling tilt angle (53), lens conditions, and a distance between the objective lens (7) and the sample (10), in conjunction with a focus compensation of the objective lens (7).

Abstract: In a sample observation method, a sample stage is placed at a first tilt angle with respect to a charged particle beam, and an observation surface of a sample is irradiated with the charged particle beam to acquire a first charged particle image. The sample stage is then tilted to a second tilt angle different from the first tilt angle about a first sample stage axis, and the observation surface is again irradiated with the charged particle beam to acquire a second charged particle image. The sample stage is tilted to a tilt angle at which an area of the observation surface in the acquired charged particle image is the larger of the first charged particle image and the second charged particle image. The observation surface is then irradiated with the charged particle beam to observe the observation surface.

Abstract: One or more methods and apparatuses for determining a characteristic, such as volume, of an excavated void of a construction material are provided. The one or more methods may include excavating a void defined in a construction material, interacting with the void using a material interacting device for determining at least one measurement thereof, manipulating the at least one measurement to determine a characteristic of the void such as the volume thereof, obtaining at least one measurement of the material, and determining a characteristic of the void based on the measurements obtained. The apparatus may include at least one material interacting device configured to interact with a surface of a construction material and a surface of a void defined therein for determining at least one respective measurement thereof and manipulate a plurality of the at least one measurement so as determine a characteristic of the void.

Abstract: A process for measuring strain is provided that includes placing a sample of a material into a TEM as a sample. The TEM is energized to create a small electron beam with an incident angle to the sample. Electrical signals are generated that control multiple beam deflection coils and image deflection coils of the TEM. The beam deflection control signals cause the angle of the incident beam to change in a cyclic time-dependent manner. A first diffraction pattern from the sample material that shows dynamical diffraction effects is observed and then one or more of the beam deflection coil control signals are adjusted to reduce the dynamical diffraction effects. One or more of the image deflection coil control signals are then adjusted to remove any motion of the diffraction pattern.

Abstract: In an upper main body of a sample holder, a laminate of an insulative thin film and a secondary electron emission protective thin film is provided. An electron beam emitted from an electron gun enters the secondary electron emission protective thin film side. The undersurface of the insulative thin film is a sample adhesion surface, where a sample to be an observation target is held by adsorption or the like. The secondary electron emission protective thin film is made of a material having a low secondary electron emission coefficient ? and, preferably, is non-insulative. That is, the secondary electron emission protective thin film is conductive even though the electric resistance is high. Accordingly, the charge level of a site irradiated with the electron beam has a low charge level.

Abstract: A method for automatically displaying an image with an available effect applied on a digital display device includes analyzing the image stored on a storage device and choosing the available effect to apply to the image, where analyzing the image includes executing an image analysis on the image to identify at least one characteristic of the image, where the available effect to apply to the image to be displayed is automatically chosen from a list of available effects which may be applied to the image in consideration of the at least one characteristic of the image, and rendering the image with the available effect applied on the digital display device.

Abstract: Provided is an electron beam scanning method for forming an electric field for appropriately guiding electrons emitted from a pattern to the outside of the pattern, and also provided is a scanning electron microscope. When an electron beam for forming charge is irradiated to a sample, a first electron beam is irradiated to a first position (1) and a second position (2) having the center (104) of a pattern formed on the sample as a symmetrical point, and is then additionally irradiated to two central positions (3, 4) between the first and second irradiation position, the two central positions (3, 4) being on the same radius centered on the symmetrical point as are the first and second positions. Further, after that, the irradiation of the first electron beam to the central positions between existing scanning positions on the radius is repeated.

Abstract: A method is provided for processing and/or observing an object using at least one particle beam that is scanned over the object. A scan region on the object is determined, the scan region having scan lines, and the particle beam is moved in a first scanning direction along one of the scan lines. The first scanning direction is changed to a second scanning direction at a change-of-direction time. Changing from the first scanning direction to the second scanning direction comprises setting of a point of rotation in that scan line of the scan region in which the particle beam is situated at the change-of-direction time, with an axis of rotation extending through the point of rotation. The first scanning direction is changed into the second scanning direction by rotating the scan region about the axis of rotation, with the point of rotation being selected dependent on the direction of rotation.

Abstract: A device for providing for electron excited x-ray fluorescence may include means for driving two contacting surfaces against each other in a low fluid pressure environment, such that high energy electrons strike a sample under test and provide for x-ray fluorescence of the sample. The sample under test may be in or on a sample holder, whose position with respect to the contacting surfaces is adjustable. For example, the sample holder may be positionable to be a different distances from the contacting surfaces.

Abstract: A charged particle beam apparatus for processing a tip end portion of a sample into a needle shape, includes an ion beam irradiation unit that irradiates the tip end portion with ion beams, an electron beam irradiation unit that irradiates the tip end portion with electron beams, a secondary electron detection unit that detects secondary electrons generated at the tip end portion by the irradiation with the electron beams, and an EBSD detection unit that detects diffracted electrons generated at the tip end portion by the irradiation with the electron beams.

Abstract: A biological sample image acquiring apparatus includes: an objective lens magnifying a region of a biological sample; an imaging device imaging the region magnified by the objective lens; a movement controller moving the focus of the objective lens in the thickness direction of the target region of the biological sample and moving the image of the region, which magnified by the objective lens to be imaged onto an imaging device, in an in-plane direction; and a biological sample image acquiring unit acquiring a biological sample image of the region by exposing the imaging device to light while the movement controller is moving the image of the region.

Abstract: The present invention provides an electron beam apparatus comprising a means for visualizing an axial displacement of a retarding electric field, and a means for adjusting axial displacement. The axial displacement visualizing means includes a reflective plate (6), and an optical system (2, 3) for converging a secondary electron beam (9) on the reflective plate (6), and the axial displacement adjusting means includes an incline rotation mechanism (8) for a sample stage (5). With this configuration, in electron beam apparatuses such as SEM and the like, such problems as visual field displacement caused by displacement of the axial symmetry of the electric field between an objective lens (3) and a sample (4) and inability to measure secondary electrons and reflected electrons that provide desired information can be eliminated.

Abstract: Provided is a phase plate for use in an electron microscope which lessens the problem of image information loss caused by interruption of an electron beam and ameliorates the problem of anisotropic potential distributions. This phase plate comprises openings (23) connected into a single opening, and multiple electrodes (11) arranged in the opening from the outer portion of the opening towards the center of the opening. The cross sections of the electrodes (11) are configured such that a voltage application layer (24) comprising a conductor or a semiconductor is covered by a shield layer comprising a conductor or a semiconductor with an intermediate insulating layer. By this means, this phase plate is capable of lessening electron beam interruption due to the electrodes (11), and of ameliorating the problem of anisotropic potential distributions.

Abstract: According to the present invention, in a charged particle beam device having a charged particle source, an objective lens for focusing a primary-charged particle beam emitted from the charged particle source, a scan deflector for scanning the primary-charged particle beam on a sample, and a detector for detecting signal particles generated from the sample under scanning of the primary-charged particle beam, whereby a sample image is obtained by using the signal particles of the detector, the charged particle beam device comprises a deflector for deflecting an angle of irradiation of the primary-charged particle beam onto the sample, first and second independent power supplies for passing currents to the deflector, and a switch for switching over voltages applied from the two power supplies in unit of one line or one frame of scanning of the primary-charged particle beam.

Abstract: The electrical charging by a primary electronic is inhibited to produce a clear edge contrast from an observation specimen (i.e., a specimen to be observed), whereby the shape of the surface of a sample can be measured with high accuracy. An observation specimen in which a liquid medium comprising an ionic liquid is formed in a thin-film-like or a webbing-film-like form on a sample is used. An electron microscopy using the observation specimen comprises: a step of measuring the thickness of a liquid medium comprising an ionic liquid on a sample; a step of controlling the conditions for irradiation with a primary electron on the basis of the thickness of the liquid medium comprising the ionic liquid; and a step of irradiating the sample with the primary electron under the above-mentioned primary electron irradiation conditions to form an image of the shape of the sample.

Abstract: The present invention relates to a defect inspection apparatus based on the fact that contrasts of a grain and a void of a semiconductor copper interconnect in a scanning electron microscope are changed depending on electron beam irradiation accelerating voltages. A charged particle beam apparatus of the present invention irradiates the same portion of a specimen with electron beams at a plurality of accelerating voltages, and differentiates a grain (65, 66) from a void (67) on the basis of a contrast change amount of the same portion in a plurality of images (61, 62) acquired so as to respectively correspond to the plurality of accelerating voltages. Consequently, it is possible to automatically detect a grain and a void in a differentiation manner at a high speed without destructing a specimen.

Abstract: The present invention provides a dual-beam apparatus which employs the dark-field e-beam inspection method to inspect small particles on a surface of a sample such as wafer and mask with high throughput. The dual beam apparatus comprises two single-beam dark-field units placed in a same vacuum chamber and in two different orientations. The two single-beam dark-field units can perform the particle inspection separately or almost simultaneously by means of the alternately-scanning way. The invention also proposes a triple-beam apparatus for both inspecting and reviewing particles on a sample surface within the same vacuum chamber. The triple-beam apparatus comprises one foregoing dual-beam apparatus performing the particle inspection and one high-resolution SEM performing the particle review.

Abstract: The X-ray analyzer repeats scanning of a sample by an electron beam from an electron gun (beam source), detects a characteristic X-ray from the sample by an X-ray detector, generates an element distribution image of the sample by a signal processor every scanning, and stores a plurality of element distribution images in a sequential order. Temporal changes of the element distribution image of the sample are obtained. Moreover, by moving a stage by a moving unit concurrently with the scanning, an element distribution image of the sample where the scanning position is varied is obtained. By generating the element distribution image while varying the scanning position, positioning of the range where the element distribution image is to be obtained on the sample can be quickly performed based on the element distribution image itself.

Abstract: Methods of orientation imaging microscopy (OIM) techniques generally performed using transmission electron microscopy (TEM) for nanomaterials using dynamical theory is presented. Methods disclosed may use a wide angle convergent beam electron diffraction for performing OIM by generating a diffraction pattern having at least three diffraction discs that may provide additional information that is not available otherwise.

Abstract: A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.

Abstract: An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.

Abstract: A system of investigating aberrations in a charged particle lens system, wherein a charged particle beam is directed from a multitude of directions through a pivot point on a sample stage. An image figure is recorded for each of multiple focus settings at each beam direction setting, creating a set of registered images. This set of images is compared to reference images to derive aberrations present in the lens system without the use of an amorphous sample present.

Abstract: The present invention is concerned with a procedure to quantitatively determine both, total and effective porosity of carbonated sedimentary rocks, and is based on the elaboration of molds of the rock pores-structure and on the determination of the volumetric and gravimetric properties of the rock and its mold. Determination of the effective porosity is achieved by using an original formula, developed by the authors of the present invention. Additionally, the structure of micro and nanopores in the rock is characterized by scanning electron microscopy (SEM), to identify relevant properties for permeability analyzes such as: dimensions, shapes, type of connections, pore-structure patterns and pore throats. These and other parameters are used as indicators of the reservoir production and storage capacity.

Abstract: This invention relates to multi-purpose probe-based apparatus, and to methods for providing images of surface topography, and detection and quantitative mapping of local mechanical and electromagnetic properties in non-resonant oscillatory mode. These methods may include filtering of incoming probe signals. These incoming probe signals provide time deflection curves, parts of which are used for the control of scanning and collection of data that reflects sample adhesion, stiffness, elastic modulus and viscoelastic response, electric and magnetic interactions. These methods permit adaptive choice of an AFM's deflection set-point, which allows imaging at the contact repulsive force for precise surface profilometry, as non-resonant oscillation brings tip and sample into intermittent contact. These methods permit choosing a desired deformation model that allows an extraction of quantitative mechanical properties including viscoelastic response from deflection curves.

Abstract: Methods and apparatus for generating an image of a specimen with a microscope (e.g., TEM) are disclosed. In one aspect, the microscope may generally include a beam generator, a stage, a detector, and an image generator. A plurality of crystal parameters, which describe a plurality of properties of a crystal sample, are received. In a display associated with the microscope, an interactive control sphere based at least in part on the received crystal parameters and that is rotatable by a user to different sphere orientations is presented. The sphere includes a plurality of stage coordinates that correspond to a plurality of positions of the stage and a plurality of crystallographic pole coordinates that correspond to a plurality of polar orientations of the crystal sample.

Abstract: Electron-activated photon emission materials are disclosed. A first electron source emits a first electron having a first predetermined energy at a first nanoparticle of a photon emission material that includes a first layer of a plurality of nanoparticles. A first photonic response of the receipt of the first electron by the first nanoparticle is determined. The first photonic response is interpreted as a first numeric value.

Abstract: A measuring device and method is used to select focusing points on an object. A CCD of the measuring device is positioned at the top of an initial focusing range, then moves to the bottom of the initial focusing range at a first speed to capture first images of the object. Image points corresponding to each focusing point in the first images are identified to compute coordinates of a first focal point of each focusing point. The initial focusing range is updated according to Z-coordinates of the first focal points. The CCD is positioned at the bottom of the updated focusing range, then, moves to the top of the updated focusing range at a second speed to capture second images of the object. Image points corresponding to each focusing point in the second images are identified to compute coordinates of a second focal point of each focusing point.

Abstract: A phase plate for a charged particle beam system, such as a transmission electron microscope (TEM), is described. The phase plate comprises a support having a through-hole and an elongate member which is magnetisable in a direction along its length and which extends partially across the through-hole and which is narrower than the through-hole.

Abstract: A STEM system is disclosed wherein an imaging system is used to image the electron scatter pattern plane of the HAADF detector onto a two-dimensional array detector. A data acquisition system stores and processes the data from the two-dimensional array detector. For each illumination pixel of the STEM, one frame of data is generated and stored Each frame includes data of all scattered angles and can be analyzed in real time or in off-line at any time after the scan. A method is disclosed for detecting electrons emitted from a sample by detecting electrons scattered from the sample and generating plurality of corresponding signals, each signal indicative of scattering angle of a scattered electron; generating a plurality of signal groups, each signal group being a collection of signals of a user selected scattering angle.

Abstract: An optical module includes at least a carrying stage, at least an actuator unit and at least an optical assembly. The carrying stage has a first aperture. The actuator unit is disposed at one side of the carrying stage and has a second aperture. The optical assembly is connected with the actuator unit, and the actuator unit adjusts the position of the optical assembly. A radiated wave enters from one side of the optical module and passes through the first aperture, the second aperture and the optical assembly. A microscope with the optical module has compact size and is easily assembled and carried. The optical module and microscope can efficiently reduce the effect of ambient temperature variations so as to improve the measuring stability thereof.

Abstract: The present invention relates to methods and systems for 4D ultrafast electron microscopy (UEM)—in situ imaging with ultrafast time resolution in TEM. Single electron imaging is used as a component of the 4D UEM technique to provide high spatial and temporal resolution unavailable using conventional techniques. Other embodiments of the present invention relate to methods and systems for convergent beam UEM, focusing the electron beams onto the specimen to measure structural characteristics in three dimensions as a function of time. Additionally, embodiments provide not only 4D imaging of specimens, but characterization of electron energy, performing time resolved electron energy loss spectroscopy (EELS).

Abstract: The invention relates to a charged-particle microscope comprising a charged-particle source; a sample holder; a charged-particle lens system; a detector; and a beam pulsing device, for causing the beam to repeatedly switch on and off so as to produce a pulsed beam. The beam pulsing device comprises a unitary resonant cavity disposed about a particle-optical axis and has an entrance aperture and an exit aperture for the beam. The resonant cavity is configured to simultaneously produce a first oscillatory deflection of the beam at a first frequency in a first direction and a second oscillatory deflection of the beam at a second, different frequency in a second, different direction. The resonant cavity may have an elongated (e.g. rectangular or elliptical) cross-section, with a long axis parallel to said first direction and a short axis parallel to said second direction.

Abstract: An electron microscope includes an electron beam source, a first electromagnet, a second electromagnet and a detector. The field generated by the first electromagnet has an effect of three lenses subsequently arranged along the beam path. A first lens of these lenses is arranged upstream of the object plane and focuses the beam at the object plane. The second lens of these three lenses is arranged downstream of the object plane. The third lens of these three lenses generates an image of a diffraction plane of the second lens at the detector. The magnetic field generated by the second electromagnet has an effect of a fourth lens and can be changed in order to change a size of the image of the diffraction plane of the second lens on the detector.

Abstract: A method and apparatus for altering the orientation of a charged particle beam sample is presented. Embodiments of the method includes providing a first work piece on a sample stage having a sample stage plane, the first work piece including a lamella plane in a first orientation. A sample is milled from the first work piece using an ion beam so that the sample is substantially free from the first work piece. A probe is attached to the sample, the probe including a shaft having a shaft axis, the shaft axis oriented at a shaft angle in relation to the sample stage plane, the shaft angle being non-normal to the sample stage plane. The probe is rotated about the shaft axis through a rotational angle so that the lamella plane is in a second orientation. The sample is attached to or placed on the sample on either the first work piece, the first work piece being the work piece from which the sample was milled, or on a second work piece, the second work piece being a work piece from which the sample was not milled.

Abstract: Conventionally, in a general-purpose scanning electron microscope, the maximum accelerating voltage which can be set is low, and hence thin crystal samples which can be observed under normal high-resolution observation conditions are limited to samples with large lattice spacing. For this reason, there has no means for accurately performing magnification calibration. As means for solving this problem, the present invention includes an electron source which generates an electron beam, a deflector which deflects the electron beam so as to scan a sample with the electron beam, an objective lens which focuses the electron beam on the sample, a detector which detects an elastically scattered electron and an inelastically scattered electron which are transmitted through the sample, and an aperture disposed between the sample and the detector to control detection angles of the elastically scattered electron and the inelastically scattered electron.

Abstract: The present invention relates to a method for cleaning a phase plate (1) for a transmission electron microscope wherein said phase plate is etched before being irradiated for the first time in the TEM, and is then held in an ultra-pure holding atmosphere until the irradiation in the TEM.

Abstract: An image acquisition method and system for use in transmission electron microscopy and capable of providing information about a wide range of frequency range. The method is initiated with setting at least one of the spherical aberration coefficient and chromatic aberration coefficient of the imaging system of the microscope to suppress attenuation of a contrast transfer function due to an envelope function. Then, an image is obtained by the imaging system placed in defocus conditions.

Abstract: A scanning charged particle beam device configured to image a specimen is described. The scanning charged particle beam device includes a source of charged particles, a condenser lens for influencing the charged particles, an aperture plate having at least two aperture openings to generate at least two primary beamlets of charged particles, at least two deflectors, wherein the at least two deflectors are multi-pole deflectors, a multi-pole deflector with an order of poles of 8 or higher, an objective lens, wherein the objective lens is a retarding field compound lens, a beam separator configured to separate the at least two primary beamlets from at least two signal beamlets, a beam bender, or a deflector or a mirror configured to deflect the at least two signal beamlets, wherein the beam bender is a hemispherical beam bender or beam bender having at least two curved electrodes, and at least two detector elements.

Abstract: The present invention provides a drawing apparatus for performing drawing on a substrate with a charged particle beam, the apparatus comprising an optical system configured to irradiate the substrate with the charged particle beam, a substrate stage configured to hold the substrate, an aperture member provided with the substrate stage, a detector configured to detect a charged particle beam having passed through an aperture of the aperture member, and a support configured to support the detector, wherein the support and the substrate stage are separated from each other.

Abstract: The invention relates to a method for determining a distance between charged particle beamlets in a multi-beamlet exposure apparatus. The apparatus is provided with a sensor comprising a converter element for converting charged particle energy into light and a light sensitive detector provided with a two-dimensional pattern of beamlet blocking and non-blocking regions. The method comprises scanning a first beamlet over the pattern, receiving light generated by the converter element, and converting the received light into a first signal. Then the two-dimensional pattern and the first beamlet are moved relatively with respect to each other over a predetermined distance. Subsequently, the method comprises scanning a second beamlet over the pattern, receiving light generated by the converter element, and converting the received light into a second signal. Finally, the distance between the first beamlet and second beamlet is determined based on the first signal, the second signal and the predetermined distance.

Abstract: The invention relates to a method for adjusting a Cs corrector in a STEM using a crystalline sample. The method comprises recording a through-focus series, converting the obtained images to Fourier space, thus forming a set of images alike diffraction images. By then determining the symmetry of the Fourier images, the corrector can be tuned for better symmetry, and the transfer limit can be determined by determining the maximum distance of the spots from the center. By repeatedly performing these steps, the corrector can be tuned to its optimum performance.

Abstract: A detector (100) is used to detect a charged particle beam (EB), and includes a first light emission portion (10) for converting the charged particle beam into light, a second light emission portion (20) for converting the charged particle beam transmitted through the first light emission portion (10) into light, and a light detector (30) for detecting the light produced by the first light emission portion (10) and the light produced by the second light emission portion (20). The first light emission portion (10) is a powdered scintillator. The second light emission portion (20) is a single crystal scintillator.

Abstract: An electron microscope is provided. In another aspect, an electron microscope employs a radio frequency which acts upon electrons used to assist in imaging a specimen. Furthermore, another aspect provides an electron beam microscope with a time resolution of less than 1 picosecond with more than 105 electrons in a single shot or image group. Yet another aspect employs a super-cooled component in an electron microscope.

Abstract: A scanning transmission electron microscope system includes: an annular dark-field detector; an electron energy loss spectroscopic apparatus configured to acquire an electron energy loss spectroscopy spectrum of a first electron beam from the annular dark-field detector; and an image processing apparatus configured to generate a first STEM image based on an output signal from the annular dark-field detector and generate a second STEM image based on an integrated value of the electron energy loss spectroscopy spectrum.

Abstract: A transmission electron microscope (100) includes an electron beam source (2), an illumination lens (10), an objective lens (20), an intermediate lens system (30), a pair of transfer lenses (40) located behind the intermediate lens system (30), and an energy filter (60) for separating the electrons of the beam L transmitted through the specimen (S) according to energy. The transfer lenses (40) transfer the first image to the entrance crossover plane (S1) of the energy filter (60) and to transfer the second image to the entrance image plane (A1) of the filter (60). An image plane (A3) is formed between the first transfer lens (40a) and the second transfer lens (40b).

Abstract: Conventionally, in a general-purpose scanning electron microscope, the maximum accelerating voltage which can be set is low, and hence thin crystal samples which can be observed under normal high-resolution observation conditions are limited to samples with large lattice spacing. For this reason, there has no means for accurately performing magnification calibration. As means for solving this problem, the present invention includes an electron source which generates an electron beam, a deflector which deflects the electron beam so as to scan a sample with the electron beam, an objective lens which focuses the electron beam on the sample, a detector which detects an elastically scattered electron and an inelastically scattered electron which are transmitted through the sample, and an aperture disposed between the sample and the detector to control detection angles of the elastically scattered electron and the inelastically scattered electron.

Abstract: A sample observation method of the present invention comprises a step of defining, with respect to an electron microscope image, an outline of an observation object with respect to a sample (3), or a plurality of points located along the outline, and a step of arranging a plurality of fields of view for an electron microscope along the outline, wherein electron microscope images of the plurality of fields of view that have been defined and arranged along the shape of the observation object through each of the above-mentioned steps are acquired. It is thus made possible to provide a sample observation method that is capable of selectively acquiring, with respect to observation objects of various shapes, an electron microscope image based on a field of view definition that is in accordance with the shape of the observation object, as well as an electron microscope apparatus that realizes such a sample observation method.

Abstract: A control device (50) for a charged particle beam device (100) tilts the irradiation axis of a primary electron beam (4) to the left, straight, or to the right via tilting coils (11, 12) each time the primary electron beam (4) scans the surface of a sample (15) over a single scanning line. When the irradiation axis is changed, the focal point of the primary electron beam (4) is adjusted by a focal point-adjusting coil (14) based on the tilt of the irradiation axis in order to take a left-tilted observation image, a non-tilted observation image or a right-tilted observation image of the surface of a sample (15) for each scanning line. The left-tilted observation images, non-tilted observation images and right-tilted observation images for the scanning lines obtained up to this point are simultaneously displayed on the same display device (31). In this way, focused non-tilted observation images and focused tilted observation images can be taken and displayed nearly simultaneously.

Abstract: The present invention provides a contour extraction technique capable of resolving not only spuriousness, duplication, or branches in the contours of a sample pattern, but also discontinuities in the contours. A thinning process is performed with respect to design data for generating a sample pattern, and pattern in/out definition information defining the inside and outside of a pattern formed on a target sample is generated. Then, based on the Marker Controlled Watershed Segmentation method, region segmentation is performed by expanding regions indicated by the pattern in/out definition information while referencing pixel values of an edge-enhanced image of a target sample image, and pattern contours are generated.

Abstract: An embodiment is to provide a technique that continuously applies a certain amount of an electron beam to a sample by selecting a beam applied to the sample from an electron beam emitted from an electron source in a scanning electron microscope. A charged particle apparatus is configured, including: a mechanism that detects the distribution of electric current strength with respect to the emitting direction of an electron beam emitted from an electron source; a functionality that predicts a fluctuation of an electric current applied to a sample by predicting the distribution of the electric current based on the detected result; a functionality that determines a position at which a beam applied to the sample is acquired based on the predicted result; and a mechanism that controls a position at which a probe beam is acquired based on the determined result.