Abstract: An apparatus capable of improving image quality by making it possible to suck specimens of different sizes electrostatically, and uniformalizing an electric field of a specimen edge portion, while suppressing increase in prime cost is provided. Specimen holding means is an electrostatic chuck, a master flat plane part surrounding a specimen of the largest size of specimen sizes, and an opening surrounding a specimen size except for the largest specimen size are included at an outer peripheral portion of the electrostatic chuck, a dummy specimen attachable to and detachable from the electrostatic chuck is included, and at a time of switching the specimen size, a dummy specimen is selected (or may be prevented from being used).

Abstract: An assembly for holding a microscopy sample for storage, observation, manipulation, characterization and/or study of the sample using a microscopy instrument is provided. The assembly includes mating first and second parts having faces between which a microscopy sample, including a TEM grid mounted sample, is secured. A spring is used to provide compression between the faces. A rotatable member such as a threaded screw is operable to draw the parts apart from one another. An annular wall functions to protect microscopy samples held in the assembly from damage.

Abstract: A differential pumping system in which a vacuum chamber is manufactured to have a plurality of vacuum pumps and conductance limit plates between the vacuum pumps. The differential pumping system in which an ion is implanted from an ionization source, passes through the vacuum chamber and is detected by a detection unit includes a plurality of vacuum pumps in the vacuum chamber and one or more conductance limit plates between the vacuum pumps, and the conductance limit plates form an angle less than 90° with the transmission direction of the ion. According to such a constitution, higher degree of vacuum and the ion transmission efficiency are maintained without increasing the length of the vacuum chamber. Furthermore, it is possible to minimize the attenuation of an ion detection signal due to a collision with a neighboring neutral molecule, improving the sensitivity of an ion detection device.

Abstract: A positioning device for positioning an aperture plate in an ion beam of an ion implantation system has two fixture parts that can be moved relative to each other by means of at least one positioning drive, of which the one fixture part can be connected or is connected to an abutment point that is disposed in a fixed location relative to an ion beam source, and the other fixture part can be connected or is connected to the aperture plate. An adjustment device has a fixture device and a display device. By means of the position-changing device, it is possible to change the position of at least one of the fixture parts relative to the positioning drive. By means of the display device it is possible to check whether the fixture parts are in a predetermined position relative to each other.

Abstract: There is provided a mini environment type transfer unit which can efficiently transfer a sample to a critical dimension scanning electron microscope (CD-SEM) even in the case of use of a SMIF pod which can store only one photomask. In addition to a load port, a stocker which can store a plurality of photomasks is provided in the mini environment type transfer unit. A mask storage slot in which a plurality of storage units are stacked is provided in the stocker, and one photomask is stored in each storage unit. A sensor is provided in each storage unit to determine whether or not the photomask is normally stored. Additionally, a sensor is provided in each storage unit to detect whether or not the photomask exists.

Abstract: A two-part container for preserving material samples during storage and transport is separable and can be sealed with the presence of an elastomeric O-ring and internal threads on each part of the container. In the configuration at which the threads first engage between the two halves of the container, there is a small hole in the outer top part just above the O-ring of the bottom mating part. When the two container parts are mated and the sealing O-ring is below the small hole, inert gas can be made to flow through an inlet valve, into the container, and out through the small hole. In this configuration, the inert gas flows through the container and purges the atmospheric gas, replacing it with inert gas. After a period of time, the two container parts are rotated so that the sealing O-ring moves above the small hole. This will stop the flow into and out of the container. After this, the gas inlet valve is closed to seal the inert gas in the container.

Abstract: A charged-particle optical system (100) such as an electron microscope has a vacuum chamber (102) with a space (104) for accommodating a specific one (114) of multiple specimens in operational use. The charged-particle optical system has a loader (106) with a part (108) that is moveable into and out of the space. The part is configured for attaching a specimen carrier (110), brought from outside the system, to a first holder (112) or to detach the carrier from the first holder and to remove the carrier from inside the system. The carrier accommodates a first specimen. The system has an interface (116) in a wall of the chamber for removably accommodating the first holder (112) or a second holder (118) with a second specimen (120) mounted thereon.

Abstract: A charged particle beam apparatus includes a column, the column having: a charged particle beam source which generates a charged particle beam to apply a charged particle beam to the surface of a substrate, a position where the charged particle beam is irradiated to the substrate being a beam position; and a gas mechanism provided in proximity to the substrate to supply a gas to the surface of the substrate, the gas mechanism having an opening which permits passage of the charged particle beam, a gas supply opening which locally injects the gas to the vicinity of the beam position, and a gas exhaust opening which exhausts the injected gas in the vicinity of the beam position to exhaust the gas.

Abstract: Specimen holder, specimen inspection apparatus, and specimen inspection method for observing or inspecting a specimen consisting of cultured cells. The specimen holder has a body portion and a film. The body portion has a specimen-holding surface opened to permit access from the outside. The film has a first surface forming the specimen-holding surface. The specimen disposed on the first surface of the film can be irradiated with a primary beam for observation or inspection of the specimen via the film. A region coated with an electrically conductive film is formed on the bottom surface of the body portion facing away from the specimen-holding surface. An optically transparent region not coated with the electrically conductive film is also formed on the bottom surface.

Abstract: A stage for processing a substrate, especially useful for vacuum applications, has a recess just large enough to hold a substantially flat substrate and a chuck or holder, but not much more. The perimeter of both top and bottom of the stage has air bearing surfaces separated from the recess by differentially pumped grooves and seal lands. The air bearing lands are guided between two reference surfaces and the seal lands, being substantially coplanar, create a resistance to flow between the bearings and the recess. On the other side of one of the reference plates mounts the radiation source or process. The opposite reference plate may have a large aperture, non-contact pumping port. This improves vacuum capability and stage precision. The stage may operate in a vacuum environment itself or can provide multiple stages moving between processes or inspection steps within the same tool or process sequence.

Abstract: A TEM sample holder is formed from at least one nano-manipulator probe tip and a TEM sample holder pre-form. The probe tip is permanently attached to the TEM sample-holder pre-form to create a TEM sample holder before attachment of a sample to the point of the probe tip inside a FIB. In the preferred embodiment the probe tip is attached to the TEM sample holder pre-form by applying pressure to the pre-form and the probe tip, so as to cause plastic flow of the pre-form material about the probe tip. The TEM sample holder may have smaller dimensions than the TEM sample holder pre-form; in this case the TEM sample holder is cut from the larger TEM sample holder pre-form, preferably in the same operation as attaching the probe tip.

Abstract: An ion implantation device with a dual pumping mode and method thereof for use in producing atomic or molecular ion beams are disclosed. In one particular exemplary embodiment, an ion implantation apparatus is provided for controlling a pressure within an ion beam source housing corresponding to an ion beam species being produced. The ion implantation apparatus may include the ion beam source housing comprising a plurality of species for use in ion beam production. A pumping section may also be included for evacuating gas from the ion beam source housing. A controller may further be included for controlling the pumping section according to pumping parameters corresponding to a species of the plurality of species being used for ion beam production.

Abstract: A voltage-isolating passageway for providing high voltage isolation between a component maintained at high DC voltage and a component maintained at a substantially lower voltage is described. The voltage-isolating passageway incorporates a transverse magnetic field across its passageway, which reduces the potential energy of charged particles (e.g., electrons) passing through the passageway. The voltage-isolating passageway includes a passageway and at least two magnets. The passageway has two openings and the two magnets are positioned along opposite and exterior surfaces of the passageway wherein the first and second magnets impose a magnetic field in a transverse direction with respect to a lengthwise axis of the passageway. In one embodiment, each of the passageways have small diameters and transfer gases at small flow rates.

Abstract: An inspection apparatus and a semiconductor device manufacturing method using the same. The inspection apparatus is used for defect inspection, line width measurement, surface potential measurement or the like of a sample such as a wafer. In the inspection apparatus, a plurality of charged particles is delivered from a primary optical system to the sample, and secondary charged particles emitted from the sample are separated from the primary optical system and introduced through a secondary optical system to a detector. Irradiation of the charged particles is conducted while moving the sample. Irradiation spots of the charged particles are arranged by N rows along a moving direction of the sample and by M columns along a direction perpendicular thereto. Every row of the irradiation spots of the charged particles is shifted successively by a predetermined amount in a direction perpendicular to the moving direction of the sample.

Abstract: A specimen holder has two levers on which probes for current measurement are carried. The levers are in contact with a spherical body, the spherical body acting as a pivotal point. When the levers are pushed by micrometer heads, the probes move in the X-direction. When the levers are pulled, the probes are pushed back by springs and move in the ?X-direction. When the first lever is pushed by a further micrometer head, the first probe rotates about the spherical body and thus moves in the Y-direction. When the first lever is pulled, the first probe is pushed back by the first spring and moves in the ?Y-direction. The second probe is moved along the Y-axis by similarly manipulating a further micrometer head. The two probes can be moved along the Z-axis by similarly manipulating other micrometer heads.

Abstract: A method of efficiently inspecting a thin film magnetic head is provided. The method including holding a slider bar having a plurality of the thin film magnetic head elements in a row by an inspecting holding jig made of a nonmagnetic material; loading the slider bar held by the inspecting holding jig to a sampling placing part of a scanning electron microscope; and sequentially executing shape inspection of the plurality of thin film magnetic head elements on the slider bar by the scanning electron microscope.

Abstract: A particle beam system having a beam source for generating a particle beam and a vacuum air bearing. The beam source is mounted to a first side of the vacuum air bearing, with an active side of the vacuum air bearing disposed on an opposing second side of the vacuum air bearing. The active side is adapted to receive and retain a substrate. A beam port is formed completely through the vacuum air bearing from the first side to the second side. Means are provided for moving the substrate across the second side of the vacuum air bearing and positioning the substrate under the beam port. Means are also provided for sealing an interior of the beam source from exposure to atmosphere through the beam port.

Abstract: without substantially touching the surface, having annular rings forming annular orifices, one of the rings forming an air bearing portion and having passages through which a flow of a gas can be established in a first direction, where the flow of the gas is sufficient to create a cushion of air between the puck and the surface, and at least some of the orifices for drawing vacuums through the orifices in a second direction opposite to the first direction against the surface.

Abstract: A device for operating gas in the vacuum or low-pressure environment and for observation of the operation includes a housing. The housing has a thinner part formed at a side thereof, and at least one spacer mounted therein for partitioning off its inside into a gas chamber and at least one buffer chamber outside the gas chamber. The gas chamber has two inner apertures provided on the spacers above and below the gas chamber. The housing has two outer apertures provided respectively on a top side thereof and a bottom side thereof. All of the inner and outer apertures are coaxial with one another and located on the thinner part. The housing has a pumping port for communication with the buffer chamber, and a gas inlet for communication with the gas chamber.

Abstract: A charged particle beam examination equipment for examining and measuring a semiconductor wafer, comprising a wafer exchange portion for exchanging an unexamined wafer and an examiner wafer with each other, which has a first arm longitudinally sliding for reciprocation, a first wafer gripping part provided to the distal end of the first arm, for gripping/releasing the wafer, a second arm longitudinally sliding for reciprocation, and a second wafer gripping part provided to the distal end of the second arm, for gripping/releasing the wafer. The apparatus may shorten the time required for exchange of the wafers so as to enhance the throughput during examination and measurement of the wafers.

Abstract: A sample container assembly for use in a microscope including a sample enclosure, an electron beam permeable, fluid impermeable, membrane sealing the sample enclosure from a volume outside the sample enclosure and a pressure controller assembly communicating between the sample enclosure and a volume outside the sample enclosure.

Abstract: Provided is a charged-particle beam apparatus capable of preventing a small amount of dust from being attached to an electrostatic lens serving as an objective lens to apply a high voltage to the electrostatic lens. The charged-particle beam apparatus 1 includes a chamber 2 which has an interior 2a evacuated by an intra-chamber evacuating means 4, and a lens-barrel 3 which emits a charged-particle beam B1 onto a sample S put in the interior 2a of the chamber 2.

Abstract: The invention relates to an apparatus for evacuating samples. A sample 4 is hereby placed in a cavity 3 of a sheet 1 with a smooth surface 2. A sole plate 5 Is placed upon this smooth surface 2, whereby the smooth surface 2 and the sole plate 5 placed thereupon together form a vacuum seal. The sole plate 5, upon which a vacuum column 6 is mounted, can be slid across the smooth surface 2. By sliding the sole plate 5 over the cavity 4, the cavity 4 is evacuated in several steps. In an embodiment of the invention, the vacuum column 6 takes the form of an ESEM (Environmental Scanning Electron Microscope). In this way, it is possible to inspect the evacuated sample 4 with the ESEM.

Abstract: A method of sample extraction entails making multiple, overlapping cuts using a beam, such as a focused ion beam, to create a trench around a sample, and then undercutting the sample to free it. Because the sidewalls of the cut are not vertical, the overlapping cuts impinge on the sloping sidewalls formed by previous cuts. The high angle of incidence provides a greatly enhanced mill rate, so that making multiple overlapping cuts to produce a wide trench can requires less time than making a single, deep cut around the perimeter of a sample.

Abstract: A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a surrounding of a location of the work piece to be processed. The radiation is preferably provided by an electron microscope. An objective lens of the electron microscope is preferably disposed between a detector of the electron microscope and the work piece. A gas supply arrangement of the material processing system comprises a valve disposed spaced apart from the processing location, a gas volume between the valve and a location of emergence of the reaction gas being small. The gas supply arrangement further comprises a temperature-adjusted, especially cooled reservoir for accommodating a starting material for the reactive gas.

Abstract: A method of operating liquid in a vacuum or low-pressure environment and observing the operation and a device for the operation and the observation respectively, including the steps of preparing a housing, putting the housing in the vacuum or low-pressure environment and control liquid, vapor, and buffer chambers under the same temperature, infusing vapor into the vapor chamber through a gas inlet and control the vapor pressure inside the vapor chamber to be equal to the saturated vapor pressure of a liquid specimen inside the liquid chamber under the same temperature to prevent the inside liquid from volatilization, and evacuating the buffer chamber through the pumping port to pump out the vapor and prevent the vapor from exhausting through outer apertures out of the housing. A probing source can pass through the outer, inner, and vapor apertures for observation and analysis of the liquid specimen inside the liquid chamber.

Abstract: Sealing structure provided between a transfer chamber and a chamber, such as a process chamber, connected to the transfer chamber includes an insert member, a docking member, and annular seals. The insert member is fixed to the exterior of the transfer chamber and the docking member is fixed to the insert member. The docking member has an extension received in a passageway of the process chamber, a support portion received in the insert member, and a flange received in a passageway of the transfer chamber. The extension, support portion and flange have different outer diameters in cross section such that inclined surfaces extend between the outer peripheral surfaces of the flange, the support portion and the extension. The annular seals are disposed along the inclined surfaces, and the extension prevents the annular seal from being damaged by plasma used to process a substrate in the process chamber.

Abstract: A method of operating liquid in a vacuum or low-pressure environment and observing the operation and a device for the operation and the observation respectively, including the steps of preparing a housing, putting the housing in the vacuum or low-pressure environment and keep a predetermined temperature difference between liquid, vapor, and buffer chambers, infusing vapor into the vapor chamber through a gas inlet and control the vapor pressure inside the vapor chamber to be equal to the saturated vapor pressure of a liquid specimen inside the liquid chamber under the same temperature to prevent the inside liquid from volatilization, and evacuating the buffer chamber through the pumping port to pump out the vapor and prevent the vapor from exhausting through outer apertures out of the housing. A probing source can pass through the outer, inner, and vapor apertures for observation and analysis of the liquid specimen inside the liquid chamber.

Abstract: An object of the present invention is to prevent foreign bodies attracted by a magnetic field of an objective lens or an electric field of an electrode plate and adhered to a surface of the objective lens or electrode plate from dropping onto the surface of a sample and adhering there during observation of the sample. To achieve the above object, an electron microscope in which, when a sample to be measured is moved away from below an objective lens, an exciting current to the objective lens of a scanning electron microscope is turned off or excitation thereof is made weaker than before the sample to be measured being moved away, or an applied voltage to an acceleration cylinder for accelerating an electron beam is turned off or made lower than before the sample to be measured being moved away is proposed.

Abstract: A system, apparatus, and method for determining position and two angles of incidence of an ion beam to a surface of a workpiece is provided. A measurement apparatus having an elongate first and second sensor is coupled to a translation mechanism, wherein the first sensor extends in a first direction perpendicular to the translation, and wherein the second sensor extends at an oblique angle to the first sensor. The first and second elongate sensors sense one or more characteristics of the ion beam as the first and second sensors pass through the ion beam at a respective first time and a second time, and a controller is operable to determine a position and first and second angle of incidence of the ion beam, based, at least in part, on the one or more characteristics of the ion beam sensed by the first sensor and second sensor at the first and second times.

Abstract: A cryogenic variable temperature scanning tunneling microscope of novel design and component configuration, for use in conjunction with a variety of low temperature methodologies.

Abstract: A substrate inspection apparatus 1-1 (FIG.

Abstract: A stage for processing a substrate, especially useful for vacuum applications, has a recess just large enough to hold a substantially flat substrate and a chuck or holder but not much more. The perimeter of the recessed side has an air bearing surface separated from the recess by differentially pumped groves and seal lands. The air bearing lands are urged against a reference plate guide surface and the seal lands being substantially coplanar create a resistance to flow between the groves and recess, on the other side of the base reference plate mounts the radiation source. The VCS may operate in a vacuum environment itself, or in another preferred embodiment, it provides the possibility for multiple stages moving between process or inspection steps within the same tool or process sequence.

Abstract: A semi-closed observational environment for an electron microscope includes a housing having at least two spacers for partitioning itself into a receiving chamber, a gas chamber below the receiving chamber, a buffer chamber below the gas chamber, at least one gas inlet formed at the gas chamber, and at least one pumping port formed at the buffer chamber. The receiving chamber has at least two view holes formed at top and bottom sides thereof respectively, wherein the latter communicates with the gas chamber. The gas chamber has at least one gas aperture formed at a bottom side thereof for communication with the buffer chamber. The buffer chamber has at least one outer aperture formed at a bottom side thereof for communication with outside. The two view holes of the receiving chamber are coaxially aligned with the gas and outer apertures. A film is mounted to and seals the upper view hole.

Abstract: A control for pressurizing a load lock. The control initiates pressurization of the loadlock interior by coupling a source of gas to the loadlock interior. A representative load lock includes a pressure sensor and multiple valves to atmosphere where at least one such valves is a passthrough valve for removal of and insertion of workpieces from and into a load lock interior. A second fast acting valve also opens to atmosphere. A pressure rise inside the loadlock interior is monitored and when the pressure reaches a threshold pressure above atmosphere the fast acting valve is opened to atmosphere. This second fast acting valve is configured to relieve overpressure from the passthrough valve prior to opening of said passthrough valve. Workpiece movement is accomplished with the aid of a robot which reaches into the loadlock interior as it is either depositing workpieces or retrieving them.

Abstract: Information of a specimen holder or information of a specimen mounted on the specimen holder is stored in a memory inside the specimen holder mounted to an electron microscope. The memory is accessed to transmit the information of the specimen holder to the electron microscope, thereby ensuring that the user can use the specimen holder without mistaking characteristics of the specimen holder and danger of erroneous recording of the specimen information can be reduced.

Abstract: A sample chamber and a column are connected to each other and comprise a magnetic substance. An exhaust section controls a pressure in the sample chamber and the column. A stage controller controls a stage, above which a sample is placed, in the sample chamber. An electron beam source power supply supplies power to an electron beam source, which emits an electron beam to the sample. A power supply supplies voltage to electron optic system, which controls the electron beam. The sample chamber, exhaust section, stage controller, electron beam source power supply and power supply are grounded by a first, second, third, fourth and fifth grounding point, respectively. The electron beam source and the electron optic system are electrically insulated from the sample chamber, column, exhaust section and stage. One of the first, second and third grounding point is different from the fourth or fifth grounding point.

Abstract: A device for operating gas in the vacuum or low-pressure environment and for observation of the operation includes a housing. The housing has a thinner part formed at a side thereof, and at least one spacer mounted therein for partitioning off its inside into a gas chamber and at least one buffer chamber outside the gas chamber. The gas chamber has two inner apertures provided on the spacers above and below the gas chamber. The housing has two outer apertures provided respectively on a top side thereof and a bottom side thereof. All of the inner and outer apertures are coaxial with one another and located on the thinner part. The housing has a pumping port for communication with the buffer chamber, and a gas inlet for communication with the gas chamber.

Abstract: A mover combination (226) for moving and positioning a device (34) includes a mover (328) that defines a fluid passageway (370) and a circulation system (330) having a passageway inlet (374) and a passageway outlet (376). The circulation system (330) directs a circulation fluid (378) into the fluid passageway (370). The circulation system (330) can include a liquid/gas separator (384) that is in fluid communication with the fluid passageway (370). With this design, the plumbing for the liquid (378A) and the gas (378B) can each be optimized. Additionally, the circulation system (330) can include a pressure control device (388) that controls the pressure of the circulation fluid (378) in at least a portion of the fluid passageway (370).

Abstract: A device for cleaning an electrostatic chuck in an ion implanter includes a power supplier for generating a hot wire voltage, an electrostatic chuck for sucking a wafer, and a hot wire installed in the interior of the electrostatic chuck and driven by the hot wire voltage supplied from the power supplier for emitting heat from the electrostatic chuck.

Abstract: A mechanism for connecting first and second members through a sealing member sandwiched therebetween includes a position adjustment portion which adjusts a position of the first member in a direction substantially perpendicular to a surface of the second member with respect to the sealing member arranged on the second member, a reference portion which is provided to the second member and has a reference surface substantially perpendicular to the surface of the second member, and a pressing portion which presses the first member in a direction substantially parallel to the surface of the second member against the reference surface of the reference portion. A positioning member is provided to the first member and comes into contact with the reference surface of the reference portion, with the positioning member being position-adjustable with respect to a reference position of the first member.

Abstract: A lithographic apparatus comprising: an illumination system for providing a projection beam of radiation; a gas pressure controlled article clamp for clamping an article to be placed in a beam path of the projection beam of radiation; and a pressure circuit for controlling the article clamp, comprising a supply line for connection with the article clamp. According to the invention, a buffer volume is provided for providing a buffered gas pressure pulse in the supply line. In this way, faster clamp response times can be realized.

Abstract: A charged particle beam apparatus in which an electrostatic lens is used as a main focusing element to obtain a subminiature high-sensitivity high-resolution SEM, a drift tube for an electron beam is located inside a column between an electron source and a sample, and a detector for secondary electrons is located inside the drift tube. This solves the problem associated with the provision of a secondary electron detector, which heretofore has been a bottleneck in making a subminiature high-resolution SEM column.

Abstract: A system and method for characterizing and charging a sample. The system includes a vacuum chamber, a first apparatus in the vacuum chamber and configured to characterize a sample, and a second apparatus in the vacuum chamber and configured to charge the sample. The second apparatus includes an electron gun configured to provide an electron beam to the sample and including an emission cathode biased to a first voltage relative to a reference voltage, a sample holder configured to support the sample, and a mesh located between the electron gun and the sample holder. Additionally, the second apparatus includes a first voltage supply configured to bias the mesh to a second voltage relative to the sample holder, and a second voltage supply configured to bias the sample holder to a third voltage relative to the reference voltage.

Abstract: A reciprocating drive system, method, and apparatus for scanning a workpiece are provided, wherein a motor comprising a rotor and stator operable to individually rotate about a first axis is operable to reciprocally translate the workpiece with respect to a stationary reference. A shaft rotatably driven by the rotor extends along the first axis, and a scan arm is operably coupled to the shaft, wherein the scan arm is operable to support the workpiece thereon. Cyclical counter rotations of the shaft by the motor are operable to rotate the scan arm, therein scanning the workpiece through the ion beam along a first scan path, wherein the stator acts as a reaction mass to the rotation of the rotor. A controller is further operable to control an electromagnetic force between the rotor and the stator, therein generally determining a rotational position of the rotor and the stator.

Abstract: A voltage-isolating passageway for providing high voltage isolation between a component maintained at high DC voltage and a component maintained at a substantially lower voltage is described. The voltage-isolating passageway incorporates a transverse magnetic field across its passageway, which reduces the potential energy of charged particles (e.g., electrons) passing through the passageway. The reduction in electron potential energy reduces the energy of collisions between electrons and molecules and therefore reducing the likelihood of avalanche ionization. The voltage-isolating passageway includes a passageway and at least two magnets. The passageway has two openings and the two magnets are positioned along opposite and exterior surfaces of the passageway wherein the first and second magnets impose a magnetic field in a transverse direction with respect to a lengthwise axis of the passageway.

Abstract: An ion implantation apparatus structure is provided that does not allow gas to accumulate in the vicinity of a wafer when implantation ions to the wafer. The ion implantation apparatus includes a rotating body that rotates in a fixed direction, a vacuum chamber that houses the rotating body, and an ion beam injecting portion that injects an ion beam to a wafer placed on the rotating body. The rotating body comprises one or more wafer placement boards having a wafer placement face on one face, a driving portion that drives the wafer placement board, and a gas evacuation member provided protruding from one face of the wafer placement board having a gas evacuation wall face on the front in the direction of rotation, and functions such that due to rotation of the wafer placement board, the gas evacuation wall face collides with gas present on one face of the wafer placement board and the gas is evacuated upward or to the rear face of the wafer placement face.

Abstract: An improved method and apparatus are provided for cleaning the specimen and interior specimen chamber of Electron Microscopes, and similar electron beam instruments. The apparatus consists of a UV source oxygen-radical generator placed on a specimen chamber port or inside the specimen chamber under vacuum. Air or other oxygen and nitrogen mixture is admitted to the generator at a pressure below 1 Torr. The UV source radiates UV wavelengths below 190 nm that are used to disassociate oxygen to create the oxygen radicals. The oxygen radicals then disperse by convective flow throughout the chamber to clean hydrocarbons from the surfaces of the chamber, stage and specimen by oxidation to volatile oxide gases. The oxide gases are then removed by the convective flow to the vacuum pump.

Abstract: A cluster tool includes multiple tools for microscopic processing of a sample positioned around a rotatable base. A sample holder on the base rotates the sample between the working areas of the tools. A slidable vacuum seal maintains a vacuum in a sample chamber for tools that require a vacuum.

Abstract: A specimen tip holder assembly for mounting a specimen tip in a transmission electron microscope (TEM) is described. The specimen tip holder assembly comprises a tip holder for supporting a specimen tip. The tip holder is coupled to an elongate support for movement in a direction substantially perpendicular to the axis of the support. An actuator is mounted to the support for causing motion of the tip holder relative to the support.