Abstract: A scan wheel for an ion implanter. The scan wheel having a plurality of wafer support elements each having an elastomer layer 7 on which a wafer is supported. Each wafer support element 3 has a plurality of spring loaded plungers 10 of a material having a lower coefficient of friction than that of the elastomer layer 7 so as to support a wafer such that it can be slid across the wafer support element 3 without sticking to the elastomer layer 7. A position detector 33 can be provided on a gripper which mounts each wafer on a wafer support element to detect that the wafer has been correctly positioned.

Abstract: A specimen holder including a specimen-holding table including a plane for placing a specimen, and a pair of members protruding from the plane, with the specimen-holding table being disposed between the pair of members. Here, the plane of the specimen-holding table is formed at an angle from a plane including top portions of the pair of members protruding from the plane of the specimen-holding table. The invention provides an electron microscope holder and a spacer used therein, which provide a high X-ray detection efficiency even when EDX analysis using an X-ray analyzer whose center axis only makes a small angle with a specimen-holding surface is performed on a specimen to be sectionally observed by TEM produced by FIB processing.

Abstract: A holder support device in an electron microscope. The device has a detachable cylindrical holder extending along the X-axis. The holder support device permits the position of the inner end of the holder to be adjusted along the X-, Y-, and Z-axes and about the angular position about the X-axis. The support device has an inner cylinder rotatably held to an outer cylinder. The inner cylinder is provided with a holder through-hole and a pin guide hole. The holder is slidably held in the holder through-hole. The pin guide hole guides a pin on the holder when it is inserted into the holder through-hole. The outer cylinder is provided with a circumferential guide hole and axial guide holes.

Abstract: A method and apparatus for cleaning an analytical instrument while operating the analytical instrument are described. In one embodiment, a method comprises evacuating hydrocarbons from a specimen chamber of an analytical instrument into a plasma chamber via a mesh. The plasma is ignited in the plasma chamber to react with the hydrocarbons.

Abstract: An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad 18 connected to a vacuum chamber 14 containing an electron beam column 15 and in a condition that the static pressure floating pad 18 is attached to a subject 1 to be irradiated without contacting, and an electron beam irradiating the subject 1 to be irradiated through an electron beam path 19 of the static pressure floating pad 18, whereby the vacuum chamber and the electron beam column can be maintained in the required degree of vacuum even in a condition that the static pressure floating pad 18 is separated from the subject 1 to be irradiated. A vacuum seal valve 30 including a piston to open and close the electron beam path 19 is provided within the static pressure floating pad 18.

Abstract: To advantageously eliminate the disadvantage of attenuation of the radiant light from dielectric barrier discharge lamps by a UV transmission component, a treatment device using dielectric barrier discharge lamps is provided with a lamp chamber in which dielectric barrier discharge lamps are located and in which there is an inert gas atmosphere; a treatment chamber, in which an article to be treated is located, is provided with a treatment gas atmosphere, and a UV transmission component by which the lamp chamber and the treatment chamber are separated from one another. In each of the lamp chamber and the treatment chamber there are devices for determining the gas pressure within the respective chamber, a supply arrangement for delivering gas to the inside the respective chamber and an arrangement for discharging gas from the respective chamber.

Abstract: The present invention pertains to modified ion source targets suitable for use with liquid matrices (e.g., glycerol and lactic acid) in liquid matrix-assisted laser desorption/ionisation (MALDI) methods, as used, for example, in infrared (IR) liquid MALDI mass spectrometry (MS), preferably using time of flight (TOF) instruments. The modified targets comprise (a) a target plate (3) adapted for use in an ion source, said plate having an outward facing surface; and (b) a shielded sample cavity comprising: (i) a sample cavity (4) formed in said outward facing surface, said cavity having a sample cavity mouth and a sample cavity volume, and adapted to receive a liquid sample (5); and (ii) a perforated sample cavity shield (1), said shield covering said sample cavity mouth and having one or more exit holes through which ions formed inside the sample cavity may escape or be extracted.

Abstract: Disclosed is an electron beam apparatus and method which can retain the state that minimizes the amount of water content contained at a gap between a high-voltage cable and a high-voltage introduction insulator to thereby prevent creation of high-voltage discharge and current leakage. The apparatus comprises a means for applying a high voltage to an acceleration electrode while eliminating electron release from an electron source and for detecting a change in an emission current corresponding to a change in an acceleration voltage at this time. In addition, the apparatus comprises a means for issuing a cautionary notice or warning when the change of this emission current exceeds a prespecified value. Further, the apparatus comprises a means for letting a dry gas flow in a gap portion between the electron gun's high-voltage cable and the high-voltage introduction insulator to thereby dehumidify said gap portion.

Abstract: In a lithographic apparatus using exposure radiation of a relatively short wavelength, e.g. 157 or 126 nm, a laminar flow of N2 is provided across parts of the beam path in or adjacent to moving components of the apparatus. The laminar flow is faster than the maximum speed of the moving components and the diffusion rate of air thereby minimizing the contamination of the N2 by mixing with air. Laminar flow may be ensured by providing partitions to divide the beam path into separate spaces, by covering rough or non-planar surfaces in components on or adjacent to the laminar flow and by providing aerodynamic members.

Abstract: A correction electron optical system (3) has substrates in which apertures for constituting electron lenses are formed. Valves (14) whose opening degrees can be adjusted are used to relax the pressure difference between the upper and lower surfaces of each substrate caused when supply/exhaust pumps (51-56) adjust the internal pressure of a main body cover (80). The opening degrees are controlled based on outputs from differential pressure sensors (13). The pressure sensors (13) can be replaced with photosensors.

Abstract: A bearing for use in a vacuum chamber comprises a gas bearing discharging pressurised gas into a gap between two members to maintain a predetermined separation between those members. To avoid the gas forming the gas bearing being an unacceptable leak into the vacuum chamber, a vacuum pump is provided between the vacuum chamber and the gas bearing.

Abstract: An electron beam irradiation system has a pumping block at an end of a microscope column of electron optics. The system has the rotary stage, the microscope column for directing an electron beam at the target on the rotary stage, the pumping block for evacuating air in the gap between the column and the target, a moving mechanism for sliding the rotary stage between a working position and a mounting position, and a cover member. In the working position, the target is opposite to the column. The cover member is brought into intimate contact with the rotary stage or target to prevent vacuum deterioration when the rotary stage moves from the working position to the mounting position.

Abstract: A focusing stage is provided on a slide table of a support mechanism portion on which a master is supported, at a position adjacent to the master. At the time of recording, first, the focusing stage is irradiated with an electron beam to thereby focus the electron beam, and thereafter recording is conducted by irradiating the master with the electron beam.

Abstract: The purpose of the present invention is to avoid a decrease in the mechanical strength of a Si substrate because of the repetition of ion-implantation and annealing processes. As ions are implanted while the Si substrate surface temperature is kept at as low as −60° C. or less. Then the Si substrate is heated to recover the implantation defects caused by the ion-implantation. Such a combination of the low temperature ion-implantation and the annealing processes is repeated as required.

Abstract: The present invention relates generally to methods, apparatuses and materials to reduce or minimize the heating of a substrate (and associated distortions of the photomask) caused by electron-beam energy deposited in the substrate during patterning. The present invention provides useful materials and methods for reducing such reflection or re-radiation effects, leading to temperature stability of the substrate, reduced thermal distortion and the possibility of increased patterning accuracy. The infrared absorbing materials of the present invention also possess sufficient electrical conductivity to dissipate scattered electrons residing on the material, and sufficient thermal conductivity to dissipate heat rapidly and not result in local heating or significant temperature rise of the absorber.

Abstract: A vacuum bearing structure comprises a combination of a planar gas bearing with a differentially-pumped vacuum seal. The bearing surface and the vacuum seal surfaces are formed of a porous material divided into a first outer region through which bearing gas can percolate to provide support and an inner second region providing the vacuum seal. An exhaust groove separates the two regions so that bearing gas can flow to atmosphere. The resulting structure can operate at a lower fly height to reduce loading on the differentially-pumped vacuum seal. The structure is particularly useful for motion feedthroughs into vacuum processes such as ion implantation.

Abstract: In a multi-table lithographic apparatus in which substrate tables may be exchanged between a first working zone where substrates are loaded onto and removed from the table and a second working zones where wafers are exposed, collision prevention means are provided to prevent collisions between tables in the exchange process. The collision prevention means may be formed of a labyrinth or a revolving door. The exchange process may be controlled by shuttles, optionally including drive means, that are interlinked so that the tables can only be exchanged between zones together.

Abstract: A specimen holder support device for use with an electron microscope. The specimen holder support device alleviates atmospheric pressure (back pressure) applied via a specimen holder to a holder inner end-positioning drive mechanism for placing the inner end of a specimen holder in position. The specimen holder has a guide pin. The specimen holder support device comprises a holder mounting member, a slider, a slider-arresting member, and a spring, together with the holder inner end-positioning drive mechanism. The holder mounting member is formed at the outer end of a swinging member so as to extend axially, and has a slider-receiving hole into which the guide pin of the specimen holder protrudes. The holder inner end-positioning drive mechanism abuts against the specimen holding portion of the specimen holder and moves the specimen holding portion axially, thus placing the specimen holding portion in position. The slider has a pin engagement portion and an arrested portion for movement limitation.

Abstract: The present invention comprises an apparatus for performing in-situ elemental analyses of surfaces. The invention comprises an atmospheric electron x-ray spectrometer with an electron column which generates, accelerates, and focuses electrons in a column which is isolated from ambient pressure by a:thin, electron transparent membrane. After passing through the membrane, the electrons impinge on the sample in atmosphere to generate characteristic x-rays. An x-ray detector, shaping amplifier, and multi-channel analyzer are used for x-ray detection and signal analysis. By comparing the resultant data to known x-ray spectral signatures, the elemental composition of the surface can be determined.

Abstract: A method and apparatus for shielding a valve gate from potentially harmful environmental conditions. A valve gate can be moved from a closed position, in which the valve gate closes a valve passage and is potentially exposed to harmful environmental conditions, to a retracted position, in which the valve gate is shielded from the harmful environmental conditions. For example, the valve gate can be retracted inside a housing and a door can be closed over an opening in the housing to protect the valve gate. Other portions of the valve, such as a valve seat, can also be protected from harmful conditions, e.g., by closing a valve seat opening to prevent substances or other environmental conditions from leaving the valve passage.

Abstract: A system is provided for imaging, in an ESE microscope or other variable pressure microscope, a single sample at various time intervals during dissolution of the sample in a liquid. The system includes a sample chamber having a sample well. The sample well includes an first fluid port and a second fluid port for forming a dissolution bath in the sample well. In accordance with the system according to the present invention, the sample chamber is placed into the specimen chamber of the ESE microscope and a sample is deposited into the sample well of the sample chamber. The sample is immersed in a liquid which flows through the sample well via the first and second fluid ports during a dissolution cycle. The liquid is then drained from the sample well via one of the first and second fluid ports during a draining cycle, and then, during an imaging cycle, the sample is imaged by the ESE microscope.

Abstract: A mass spectrometer is structured such that a lens unit is firmly kept at a fixed position inside a main body by providing springs and hooking their top ends by hooks while their bottom ends are affixed to the main body such that the elastic force of the deformed springs presses the lens unit against one of inner walls of the main body.

Abstract: A substrate, such as a semiconductor chip or wafer, is implanted along with product wafers in an ion implant vacuum system. The substrate is then annealed in an annealing step that is accomplished while the substrate is within the vacuum system. The annealer is a rapid thermal annealer, such as a laser annealer or a flash lamp annealer. The annealing step does not affect the product wafers. Then a measurement is performed on the implanted and annealed substrate while it is within the vacuum system that can be suitably correlated with implant dose. The measurement can be with a technique such as a four point probe or with a tool that measures optical reflectivity from a surface of the implanted substrate. An additional implant can then be provided to product wafers if necessary to come closer to the desired dose.

Abstract: An aperture (5) connects a first chamber (1) with a second chamber (2), and is surrounded by an annular nozzle (7) formed by inner and outer walls (6, 8), which connects the first chamber (1) with a third chamber (3). A supersonic annular gas jet (9) is ejected by the annular nozzle (7) into the first chamber (1), creating a Venturi pumping action at the core of the jet in the vicinity of the aperture (5). The second chamber (2) may thus be maintained at a substantially lower pressure than the first chamber (1). Inner wall (6) and outer wall (8) may be relatively movable for varying gas flow, and the first chamber (1) may include baffles or skimmers to modify gas flow, e.g., to create a high density molecular beam. An electron or ion beam (4) may be transferred from the second chamber (2) to the first chamber (1), e.g., as part of an environmental scanning electron microscope.

Abstract: An ion-implantation apparatus includes a chamber and a pressure controller for maintaining an internal pressure of the chamber at not less than 1E-4 Torr during an ion-implantation process.

Abstract: A sample table for use in a pattern exposure machine configured to transfer a circuit pattern formed in a mask onto a sample. The sample table is divided into a center part and a peripheral part surrounding the center part. The center part and the peripheral part include a chuck mechanism for attracting the sample, respectively. A portion or the whole of the peripheral part are movable in a radial direction of the sample table in a condition that the sample is attracted to the peripheral part of the sample table. Thus, the invention operates such that when the pattern on the sample has become smaller or larger than a mask pattern, the sample, such as a silicon substrate, is expanded or contracted for a shortened time to obtain a desired.

Abstract: A sample transfer apparatus has a transfer arm for supporting a sample and is mounted for undergoing movement to transfer the sample from a first station to a second station. The transfer arm has a holding portion for holding the sample by hydrogen bonding.

Abstract: In a charged particle beam apparatus comprising an ion optical system 3 for focusing ions, a secondary charged particle detector 7 for detecting secondary charged particles produced by beam irradiation of scanning a focused ion beam 2 focused by the ion optical system 3 to a predetermined region of a sample 5, a display unit 9 for displaying an image of the sample surface 5 based on a signal of the secondary charged particle detector, and a gas injector 4 for blowing a gas to the sample surface 5, a focused ion beam processing apparatus is characterized by conducting processing by cooling a gas trap provided between a reservoir 13 or cylinder 18 and a valve 12 to control an assist gas having a high vapor pressure and blowing it through the gas injector 4 simultaneously with irradiating a focused ion beam.

Abstract: In order to provide an ion implanter which can process the material in high accuracy by preventing charge up of the material, in an ion implanter comprising an ion source for generating an ion beam, a mass separator for separating and emitting only a necessary ion seed from said ion beam, a post acceleration tube for accelerating said ion bean emitted so as to have energy necessary for an ion implanting, a quadrupole lens department for shaping said accelerated ion beam to have a suitable shape for being implanted to, an ion deflection department for isolating and removing beam components being neutral electrically from said shaped ion beam, and an ion implanting room for implanting said ion to said material by implanting said ion beam that neutral beam components are removed, at least a post acceleration tube holds its high vacuum degree, and vacuum degree of the ion implanting room is held to generate a beam plasma.

Abstract: A vacuum seal and fluid bearing apparatus for reducing the distortion of the bearing surfaces of a gas bearing is described. The apparatus includes a stator attached around an aperture in a vacuum housing and having a first planar fluid bearing surface. A movable member for closing the vacuum housing aperture having a second fluid bearing surface extending parallel to the first bearing surface is adapted to be supported spaced from the first bearing surface by a bearing fluid. A vacuum seal is provided between the movable member and the stator. In use, a force due to atmospheric pressure acts on the movable member in a direction normal to the bearing surfaces and a movable member includes a pressure relief structure to reduce any bending moment produced in the movable member by the force.

Abstract: An ion implantation apparatus has a vacuum chamber, a beam exposure region defined in an end of the vacuum chamber, and a pair of substrate holding robots disposed one on each side of the beam exposure region, each for holding a semiconductor wafer to allow the semiconductor wafer to be exposed to a beam in the beam exposure region. A pair of load-lock chambers is disposed in an opposite end of the vacuum chamber in confrontation with the substrate holding robots, respectively. A pair of feed robots is disposed between the load-lock chambers and the substrate holding robots, respectively. The vacuum chamber houses a relay table disposed between the feed robots, for relaying a semiconductor wafer.

Abstract: A fluid bearing vacuum seal assembly comprises an annular stator with first and second opposed surfaces, at least part of the first surface defining a first bearing surface. The stator also defines an aperture having a wall extending between the first and second surfaces. The assembly also comprises a rotor with first and second opposed surfaces, the second surface defining in part a second bearing surface which is supported relative to the first bearing surface in use so that the rotor is rotatable relative to the stator. A cylindrical wall projects axially from the second surface of the rotor through the aperture in the stator. An annular flange projects radially outwardly from the cylindrical wall adjacent to the second surface of the stator. At least one annular differential pumping channel is defined in each of the first and second surfaces of the stator and the wall which connects the first and second surfaces.

Abstract: A fluid bearing and seal for an ion implanter is disclosed. The fluid bearing has a stator attached to a base and a moving member provided over the stator so that a fluid bearing can be formed between the opposing surfaces of the stator and the moving member. Either the base or the stator has a locating member extending normal to the bearing surface and the other one of either the base or the stator has a recess shaped to receive the locating member. A fluid seal enables the member to slide in the recess in the normal direction to seal off an enclosed volume between the member and the other one of either the stator or the base. A plurality of fixtures are distributed at points in a plane parallel to the bearing surface to fix the locating member and the other one of either the stator or the base together at these points to form the enclosed volume. The number of the fixtures is the minimum necessary so that the bearing surface of the stator remains undistorted.

Abstract: Apparatus for holding and aligning a sample to be examined by a scanning electron microscope or the like includes an alignment device having base structure installable in the scanning electron microscope in a predetermined orientation. The alignment device also includes a holder for the sample which is mounted to the base structure for rotative movement about a rotation axis relative to the base structure. An adjuster is mounted on the base structure and can be manipulated to rotate the sample holder about the rotation axis. This alignment device is installed in a base holder and a video camera captures an image of the sample held by the sample holder. The image is displayed on a video monitor and the adjuster is then manipulated to rotatively align the sample to a desired orientation. The alignment device, including the sample, may then be removed from the base holder and installed in the scanning electron microscope with the sample being properly aligned.

Abstract: The purpose of the present invention is to avoid a decrease in the mechanical strength of a Si substrate because of the repetition of ion-implantation and annealing processes. As ions are implanted while the Si substrate surface temperature is kept at as low as −60° C. or less. Then the Si substrate is heated to recover the implantation defects caused by the ion-implantation. Such a combination of the low temperature ion-implantation and the annealing processes is repeated as required.

Abstract: An adsorption plate formed of a carrier and a precious metal catalyst carried by the carrier is provided at that portion of at least one of a beam column and a sample chamber incorporated in a charged-particle beam apparatus, in which carbon compounds may be generated. Further, a precious metal catalyst is provided on each deflector electrode contained in the beam column.