Abstract: A sample stage device (10) is so configured as to calculate ideal position information xtg(i), tg(i) per predetermined period that is unaffected by drive conditions relating to gaps (25, 26), etc., and to determine, per predetermined cycle and in real time, deviations dx(i), dy(i) between real-time measured positions x(i), y(i) by position detectors comprising laser interferometers (33, 34), etc., and ideal position information xtg(i), tg(i). In addition, it calculates, based on deviations dx(i), dy(i) thus determined, such speed command values vx(i), vy(i) for motors (27, 28) that measured values x(i), y(i) would follow ideal position information xtg(i), tg(i), and performs stable and high-speed positioning control for a sample table (11) through feedback control that controls speed in real time.

Abstract: The invention relates to a charged-particle apparatus having a charged particle source with an optical axis; a magnetic immersion lens comprising a first lens pole and a configurable magnetic circuit; and a first sample stage movable with respect to the optical axis. The apparatus has a first configuration to position the sample, mounted on the first stage, with respect to the optical axis and a second configuration, having a second lens pole mounted on the first stage and intersecting the optical axis, equipped with a second sample stage to position the sample between the two lens poles and is movable with respect to the optical axis, causing the optical properties of the magnetic immersion lens to differ in the two configurations, and can, in the second configuration, be changed by positioning the second lens pole using the first stage, thus changing the magnetic circuit.

Abstract: There are provided an evaluation device and an evaluation method for a substrate mounting apparatus capable of simply evaluating a temperature control function of the substrate mounting apparatus depending on evaluation conditions or circumstances and an evaluation substrate used for the same. The substrate mounting apparatus holds a target substrate mounted on a mounting surface and controls a temperature of the target substrate. The evaluation device includes an evacuable airtight chamber in which the substrate mounting apparatus is provided; an evaluation substrate which is mounted on the mounting surface instead of the target substrate and includes a self-heating resistance heater; and a temperature measurement unit which measures a temperature of the evaluation substrate.

Abstract: Charged particle beam apparatus arrangements in which either a first noise absorber which provides noise absorbing performance specialized for a first frequency range including the natural frequency of the charged particle beam apparatus as reference, or a second noise absorber which provides noise absorbing performance specialized for a second frequency range including the frequency of acoustic standing waves generated within the cover as reference, or both of the first and second noise absorbers is/are disposed within a cover of the charged particle beam apparatus.

Abstract: The present invention relates to a carrier device for transporting one or more manipulators into a vacuum specimen chamber of an electron microscope, characterized in that the carrier device comprises: (i) a platform having securing means for detachably securing the one or more manipulators to the platform, and (ii) electrical connectors secured to the platform for the electrical connection of the one or more manipulators. The present invention also relates to a method for transporting the carrier device into the vacuum specimen chamber of the electron microscope without altering the vacuum of the vacuum specimen chamber comprising transporting the carrier device of the invention through the specimen exchange chamber of the electron microscope and into the vacuum specimen chamber.

Abstract: A workpiece adjustment assembly is disclosed. The assembly can include a shaft, a spherical bearing, and a wafer support. A spherical housing receives the spherical bearing and allows the bearing to rotate therein. The housing and bearing may form an air bearing. A seal may be formed in the housing to prevent gas from the air bearing and the ambient atmosphere from migrating to a process chamber side of the housing. A set of spherical air pads may be positioned on an ambient side of the bearing to press the bearing against the housing when the process chamber is not under vacuum conditions. The seal can include a set of differentially pumped grooves. The spherical bearing enables the wafer manipulation end, and a wafer attached thereto, to be moved with four degrees of freedom. The arrangement facilitates isocentric scanning of a workpiece. Methods for using the assembly are also disclosed.

Abstract: A multiple degree of freedom sample stage or testing assembly including a multiple degree of freedom sample stage. The multiple degree of freedom sample stage includes a plurality of stages including linear, and one or more of rotation or tilt stages configured to position a sample in a plurality of orientations for access or observation by multiple instruments in a clustered volume that confines movement of the multiple degree of freedom sample stage. The multiple degree of freedom sample stage includes one or more clamping assemblies to statically hold the sample in place throughout observation and with the application of force to the sample, for instance by a mechanical testing instrument. Further, the multiple degree of freedom sample stage includes one or more cross roller bearing assemblies that substantially eliminate mechanical tolerance between elements of one or more stages in directions orthogonal to a moving axis of the respective stages.

Abstract: A method for mounting a specimen on a specimen carrier for milling in an ex-situ lift-out (EXLO) milling process is described where “cross-section” specimens, plan view specimens, or bulk specimens may be lifted-out for analysis. The method comprising positioning the specimen on a recessed surface within a specimen carrier top surface so that a region to be milled is centered about a carrier opening formed through the specimen carrier. Peripheral edges of the specimen are then wedged against inwardly sloping side walls framing the recessed surface. Finally, the specimen is mounted to the specimen carrier so that a path of a milling beam intersects the region to be milled and carrier opening.

Abstract: A specimen positioning device (100) is for use in or with a charged particle beam system having a specimen chamber (1) and has: a base (10) provided with a hole (12) in operative communication with the specimen chamber (1); a specimen holder (20) movably mounted in the hole (12) and having a first portion (22) and a second portion (24); and a first portion support portion (40) supporting the first portion (22) in the specimen chamber (1). The second portion (24) supports the first portion (22) via a resilient member (34).

Abstract: An examination and processing machine, in particular a lithography appliance, for use in the semiconductor industry, comprising a machine frame (1), an examination or processing device (5) for a work piece (4), a carriage (3) which is mounted on the machine frame (1) and can hold the work piece (4), a handling device (6) for positioning the work piece (4) on the carriage (3) and for removing it from the carriage (3), a series of oscillation isolators (2) for low-oscillation mounting of the machine frame (1), and individual control devices (30, 40, 20) for controlling the carriage (3), the handling device (6) and the oscillation isolators (2). These control devices (20, 30, 40) are subordinate to an overall control device (50), which acts as a host system, via a real-time bus (60).

Abstract: Provided is a sample device for a charged particle beam, which facilitates the delivery of a sample between an FIB and an SEM in an isolated atmosphere. An atmosphere isolation unit 10 for putting a lid 9 on an atmosphere isolation sample holder 7 isolated from the air and taking the lid 9 off the sample holder, is provided in a sample exchanger 5 that communicates with a sample chamber 4 of the FIB 1 or the SEM through a gate; and the lid 9 is taken off only by pushing a sample exchange bar 11, and thereby only the sample holder 7 is set in the sample chamber 4.

Abstract: A device is described that allows for the insertion and removal of a Transmission Electron Microscope (TEM) specimen stage and insertion rod into and out of a vacuum chamber. The device can be configured to accommodate specimen stage and insertion rods manufactured by all TEM producers. The device has a side-entry slot for accepting the cylindrical stage rod and a locking mechanism, such that unwanted contact with the specimen and the specimen stage itself is avoided during entry and exit from the plasma vacuum chamber. The devices hold said specimen stage and insertion rod in position during the process of plasma cleaning in a vacuum chamber.

Abstract: A method is provided for setting a position of a carrier element, arranged in a particle beam device, that holds an object. The particle beam device has a beam generator for generating a particle beam and an objective for focusing the particle beam. The carrier element is movable using a first stepper motor. A movement of the carrier element is started by actuating the first stepper motor using a first motor current in the form of an alternating current. The first motor current is set to a first frequency and a first amplitude. The movement of the carrier element is decelerated by reducing the first frequency and by reducing the first amplitude of the first motor current. The first frequency is reduced to zero during a first period of time. The first amplitude is reduced to an amplitude of a first holding current during the first period of time.

Abstract: An in situ optical specimen holder is disclosed which allows imaging and analysis during dynamic experimentation. This holder assembly includes a set of focusing and reflection optics along with an environmental cell. Electromagnetic radiation can be used to optically excite the specimen in the presence or absence of fluid and the source of such radiation may be located within the body of the holder itself. The spot size of the irradiation at the specimen surface can be varied, thus exciting only a specific region on the specimen. The window type cell provides a variable fluid path length ranging from the specimen thickness to 500 ?m. The holder has the provision to continuously circulate fluids over the specimen. The pressure within the cell can be regulated by controlling the flow rate of the fluids and the speed of the pumps.

Abstract: To improve an apparatus reliability by applying a voltage suitable to a situation, a charged-particle-beam apparatus 1 of the present invention includes: a sample stage 25; an electrostatic chuck 30; and an electrostatic-chuck controlling unit 13, and generates an image of a sample 24 by irradiating the sample 24 held on the sample stage 25 by the electrostatic chuck 30 with an electron beam 16. The electrostatic-chuck controlling unit 13, when the electrostatic chuck 30 holds the sample 24, applies a preset initial voltage to a chuck electrode of the electrostatic chuck 30; determines whether or not the sample 24 is normally clamped to the electrostatic chuck 30; and increases the voltage applied to the chuck electrode until determining that the sample 24 is clamped normally to the electrostatic chuck 30 if determining that the sample 24 is not clamped normally to the electrostatic chuck 30.

Abstract: Methods and devices for mass spectrometry are described, specifically the use of nanoparticulate implantation as a matrix for secondary ion and more generally secondary particles. A photon beam source or a nanoparticulate beam source can be used a desorption source or a primary ion/primary particle source.

Abstract: A charged particle beam apparatus includes: a sample chamber; a sample stage; an electron beam irradiation system for irradiating the sample with an electron beam; a focused ion beam irradiation system for irradiating the sample with a focused ion beam; a sample stage drive unit having a rotational axis orthogonal to at least one of an irradiation axis of the electron beam irradiation system and an irradiation axis of the focused ion beam irradiation system; and a sample transporting mechanism for transporting the sample to the sample stage. The sample transporting mechanism includes a transportation path provided in the sample stage drive unit in a direction parallel to the rotational axis of the sample stage drive unit, and is configured to transport the sample to the sample stage through the transportation path.

Abstract: A specimen holder is configured to hold, during a sample preparation procedure carried out using first and second sample preparation apparatuses, a semiconductor device to be analyzed using an electron microscope. The specimen holder includes a holding portion having a support configured to support the semiconductor device; and a supporting portion configured to releasable support the holding portion. The supporting portion includes an engaging element configured to couple the specimen holder into the first and second sample preparation apparatuses during the sample preparation procedure, and a guide configured to enable the holding portion to slide within the guide and vary a position of the holding portion with respect to the supporting portion.

Abstract: Provided is a circuit-pattern inspection device which enables efficient inspection of a semiconductor wafer by selectively inspecting areas on the semiconductor wafer, such as boundaries between patterns thereon, where defects are likely to occur during the step of producing the semiconductor wafer while changing the beam scanning direction for each area. Two-dimensional beam-deflection control is employed for inspection operations in a continuous-stage-movement-type circuit-pattern inspection device in which only one-dimensional scanning has been employed conventionally. That is, by employing a combination of an electron-beam-deflection control in a first direction parallel to the stage-movement direction and an electron-beam-deflection control in a second direction intersecting the stage-movement direction, it is possible to obtain an image of any desired area for inspection that is set within a swath.

Abstract: A lithography apparatus includes a stage on which a target object is placed; a chamber in which the stage is arranged and which has one side surface in which an opening having a size which is enough to carry the stage in or out is formed, the opening being closed with an independent lid; an electro-optic lens barrel arranged on the chamber; and a rib portion formed to have a shape that is convex on an upper portion of the side surface of the chamber in which the opening is formed.

Abstract: The present disclosure significantly reduces the waiting time from inserting a specimen holder into an electron microscope until high quality data acquisition is possible. Characterizing the present disclosure, it is a specimen holder partly made of low thermal expansion material. The low thermal expansion material can be any of group 4, 5 or 6 in the periodic table of the elements.

Abstract: There is provided a composite charged particle beam apparatus, in which a first rotation axis of a rotatable stage intersects a beam irradiation axis of a FIB column and a beam irradiation axis of an SEM so as to be substantially perpendicular thereto, respectively, at a sample observing position, the rotatable stage is provided with a supporting member which can be rotated with respect to the first rotation axis, and the supporting member is connected to a movement mechanism which can dispose the sample at the sample observing position.

Abstract: An elongated member is formed which has a frontal and a distal end, and a length axis. The frontal end satisfies vacuum sealing and maneuverability specifications of a sample holder for a particle beam microscope. The elongated member includes a tubular section defining an axial cavity along the length axis, and having an orifice toward the distal end of the elongated member. The resulting device is characterized as being a sample holder for use in particle beam microscopes. The sample holder enables the examination of high aspect ratio samples by accommodating them in its axial cavity. The examination can take place without prior modification of the high aspect ratio samples.

Abstract: System and method for EMI shielding for a CD-SEM are described. One embodiment is a scanning electron microscope (“SEM”) comprising an electron gun for producing an electron beam directed toward a sample; a secondary electron (“SE”) detector for detecting secondary electrons reflected from the sample in response to the electron beam; and a dual-layer shield disposed around and enclosing the SE detector. The shield comprises a magnetic shielding lamina layer and a metallic foil layer.

Abstract: The present invention makes it possible, even when using an ordinary electron beam device (not an environment-controlled electron beam device), to create locally a low vacuum condition in the vicinity of a sample and cool said sample by means of a sample holder alone, without modifying the device or adding equipment such as a gas cylinder. The sample to be observed is placed in a sample holder provided with: a vessel that can contain a substance to serve as a gas source; and a through-hole in the bottom of a sample mount on said vessel. Via the through-hole, gas evaporating or volatilizing from the vessel is supplied to the sample under observation, thereby creating a localized low-vacuum state at or in the vicinity of the sample. Also, the heat of vaporization required for volatilization can be used to cool the sample.

Abstract: Disclosed is a high resolution and high throughput charged particle radiation device that attenuates the natural vibration of an ion pump in a short time, excited by a reaction force at the time of driving the stage, and prevents occurrence of a loop of force and a loop of current. The charged particle radiation device includes a sample chamber (4) for disposing a sample (3) therein, a charged particle radiation optical lens tube (1) for irradiating the sample (3) with charged particle radiation (10), ion pumps (2a, 2b) for evacuating the charged particle radiation optical lens tube (1), a frame (16) fixedly attached to the sample chamber (4), the frame (16) facing one end of each of the ion pumps (2a, 2b), and vibration absorbers provided between the frame (16) and the one end of each of the ion pumps (2a, 2b), each of the vibration absorbers including a layered structure which includes a viscoelastic sheet (20a, 20b) sandwiched between metal plates (18a, 18b, 21a, 21b).

Abstract: A sample holder assembly includes a sample tray, a base plate, a stage mount, and a calibration standard mounted onto the stage mount. Three mating structures on the bottom of the base plate mate with corresponding structures on a stage mount that is attached to the sample stage of the SEM. An optional contacting conductor provides electrical contact between the stage mount and the base plate so that charge generated on the sample by the electron beam can leave the sample through the sample conductive layer to the sample tray, to the base plate, to the stage mount, and through the grounded stage.

Abstract: In the case of inspecting samples having different sizes by means of a semiconductor inspecting apparatus, a primary electron beam bends since distribution is disturbed on an equipotential surface at the vicinity of the sample at the time of inspecting vicinities of the sample, and what is called a positional shift is generated. A potential correcting electrode is arranged outside the sample and at a position lower than the sample lower surface, and a potential lower than that of the sample is applied. Furthermore, a voltage to be applied to the potential correcting electrode is controlled corresponding to a distance between the inspecting position and a sample outer end, sample thickness and irradiation conditions of the primary electron beam.

Abstract: Method and system are offered which evacuate a sample holder such that a sample can be inserted into the electron optical column of a microscope while certainly preventing exposure to the atmosphere. The system has pumping control means for controlling a vacuum pumping sequence. The inside of a microscope goniometer is evacuated to a given low vacuum state while the pressure inside a hermetic sample chamber is kept constant by the pumping control means. Then, the partition valve of the sample chamber is opened by the pumping control means and the sample chamber is brought to the low vacuum state. Then, the goniometer and sample chamber are brought to a high vacuum state by the pumping control means. Then, the sample is brought into the front end of the goniometer, and the sample holder is inserted into the electron optical column.

Abstract: An object of the invention is to provide an electron beam device and a sample holding device for the electron beam device that can observe the reaction between a sample and a gas at high resolution while a gas atmosphere is maintained even by using thin diaphragms. To solve one of the problems described above, in an electron beam device having the function of separately exhausting an electron beam irradiation portion of an optical column, a sample chamber and an observation chamber, a gas supply means for supplying a gas to a sample and an exhaust means for exhausting a gas are provided to sample holding means, diaphragms are disposed above and below the sample to separate the gas atmosphere and vacuum of the sample chamber and to constitute a cell sealing the atmosphere around the sample, and a mechanism for spraying a gas is provided to the outside of the diaphragms. The gas sprayed outside the diaphragms has low electron beam scattering performance such as hydrogen, oxygen or nitrogen.

Abstract: An ion beam processing apparatus includes an ion beam irradiation optical system that irradiates a rectangular ion beam to a sample on a first sample stage, an electron beam irradiation optical system that irradiates an electron beam to the sample, and a second sample stage to hold a test piece, extracted from the sample. The ion beam can be tilted by rotating the second sample stage about a tilting axis. A controller controls the width of skew of an intensity profile representing an edge of the rectangular ion beam in a direction perpendicular to a first direction in which the tilting axis of the second sample stage is projected on the second sample stage surface so that the width will be smaller than the width of skew of an intensity profile representing another edge of the ion beam in a direction parallel to the first direction.

Abstract: In a substrate stage device, a substrate is held by a substrate support member mounted on a Y step surface plate. The substrate support member moves in the scanning direction in long strokes on the Y step surface plate. The part corresponding to an exposure area of the substrate is held by suction in a non-contact manner from below by a fixed point stage, and other parts are supported by levitation by the plurality of air floating devices placed on the Y step surface plate. The part corresponding to the exposure area of the substrate is controlled so that surface position of the substrate is located in the depth of focus of the projection optical system by the fixed point stage.

Abstract: A focused ion beam system includes a sample holder having a fixing plane for fixing a sample, a sample base on which the sample holder is provided, a focused ion beam irradiating mechanism that irradiates a focused ion beam to the sample, microtweezers that hold the sample and have the axial direction at a predetermined angle to a surface of the sample base, an opening/closing mechanism that opens and closes the microtweezers, a rotating mechanism that rotates the microtweezers about the axial direction, and a moving mechanism that moves the position of the microtweezers.

Abstract: Provided is a holder capable of a precise observation from 3 or more directions to analyze complicated internal structures of a specimen thereof, and more particularly, a specimen holder capable of a 3-axis movement for transmission electron microscope (TEM) 3D analysis that rotates cradles for supporting the specimen and moves the cradles back and forth and left and right, and freely changes directions of the specimen, thereby making it possible to more accurately analyze the specimen in three dimensions.

Abstract: The present invention relates to a specimen box for an electron microscope, which comprises a first substrate, a second substrate, and a metal adhesion layer. The first substrate has a first surface, a second surface, a first concave, and one or more first through holes, wherein the first through hole penetrates through the first substrate. The second substrate has a third surface, a forth surface, and a second concave. Besides, the metal adhesion layer is disposed between the first substrate and the second substrate to form a space for a specimen placed therein. In addition, the specimen box of the present invention further comprises one or more plugs. When the plug is assembled into the first through hole to seal the specimen box, the in-situ observation can be accomplished by using an electron microscope.

Abstract: In the embodiment a charged particle beam system includes a main chamber, an exchange chamber, an x-y positioning stage housed in the main chamber, a substrate-supporting structure supported by or provided by said stage and moveable in first and second perpendicular directions of travel between limits which define a field of travel and a substrate handling device housed inside the main chamber for loading and unloading a substrate into and out of the main chamber, the device comprising a bar and a side member for supporting the substance to one side of the bar. A method of loading a substrate in a charged particle beam system is also disclosed.

Abstract: In various embodiments of the invention, a cargo container can be monitored at appropriate time intervals to determine that no controlled substances have been shipped with the cargo in the container. The monitoring utilizes reactive species produced from an atmospheric analyzer to ionize analyte molecules present in the container which are then analyzed by an appropriate spectroscopy system. In an embodiment of the invention, a sorbent surface can be used to absorb, adsorb or condense analyte molecules within the container whereafter the sorbent surface can be interrogated with the reactive species to generate analyte species characteristic of the contents of the container.

Abstract: Provided is a composite charged particle beam apparatus, including: an electron beam column for irradiating a sample with an electron beam; an ion beam column for irradiating the sample with an ion beam to perform etching processing; a sample stage drive portion for moving a sample stage in an irradiation axis direction of the electron beam; and a column adjusting portion for moving the ion beam column relatively to a sample chamber such that the sample is irradiated with the ion beam at a position irradiated with the electron beam.

Abstract: Provided is a cross-section processing and observation apparatus, including a control portion for repeatedly executing a process including slice processing by an ion beam and acquisition of a SIM image by a secondary electron emitted from a cross-section formed by the slice processing, in which the control portion divides an observation image into a plurality of areas, and finishes the process when a change has occurred between an image in one area of the plurality of areas and an image in an area, which corresponds to the one area, of an observation image of another cross-section acquired by the process.

Abstract: Since charging characteristics differ between the outer circumferential portion and the center portion of a sample to be inspected, equivalent inspection sensitivities cannot be obtained in the outer circumferential portion and the center portion of the sample to be inspected. A sample cover is provided in the outer circumferential portion of a sample holder on which the sample to be inspected is placed. Charging characteristics of the sample cover are changed according to charging characteristics of the sample to be inspected. Consequently, uniform charged states can be formed in the outer circumferential portion and the center portion of the sample. Inspection/observation of the outer circumferential portion of the sample can be realized at higher sensitivity than in the past.

Abstract: A method for adjusting an operating parameter of a particle beam device and a sample holder, which is suitable in particular for performing the method are provided. An adjustment of an operating parameter of a particle beam device is possible without transfer of the sample holder out of the particle beam device. A reference sample is placed in a first sample receptacle, so that in ongoing operation of the particle beam device, the sample holder need only be positioned in such a way that the reference sample is bombarded and measured with the aid of a particle beam generated in the particle beam device.

Abstract: A stage device to be used in a vacuum includes: a gas supply unit for generating a gas; a base member having upper, lower, right, and left surfaces; a slider formed in a frame shape surrounding the base member and having surfaces facing the respective surfaces of the base member, and disposed to be movable; and an air bearing configured to float the slider by supplying the gas to a space between the base member and the slider. The slider includes: an air chamber provided on the surface facing the base member for accumulating air, and the base member includes thereinside a slider-moving air flow passage configured to guide the gas from an inlet port to an outlet port for supplying the gas to the air chamber of the slider.

Abstract: A method is described for producing a micro-gripper, which comprises a base body and a gripping body connected integrally to the base body, which projects beyond the base body and provides a receptacle slot on a free end area in such a way that a micrometer-scale or sub-micrometer-scale object may be clamped in the receptacle slot for gripping and holding, as well as a micro-gripper according to the species.

Abstract: Provided is a method and an apparatus for inspecting a sample surface with high accuracy. Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.

Abstract: In the case of inspecting samples having different sizes by means of a semiconductor inspecting apparatus, a primary electron beam bends since distribution is disturbed on an equipotential surface at the vicinity of the sample at the time of inspecting vicinities of the sample, and what is called a positional shift is generated. A potential correcting electrode is arranged outside the sample and at a position lower than the sample lower surface, and a potential lower than that of the sample is applied. Furthermore, a voltage to be applied to the potential correcting electrode is controlled corresponding to a distance between the inspecting position and a sample outer end, sample thickness and irradiation conditions of the primary electron beam.

Abstract: A novel specimen holder for specimen support devices for insertion in electron microscopes. The novel specimen holder of the invention provides mechanical support for specimen support devices and as well as electrical contacts to the specimens or specimen support devices.

Abstract: A method for attaching a frozen specimen to a manipulator probe tip typically inside a charged-particle beam microscope. The method comprises cooling the probe tip to a temperature at or below that of the frozen specimen, where the temperature of the frozen specimen is preferably at or below the vitrification temperature of water; bringing the probe tip into contact with the frozen specimen, and bonding the probe tip to the frozen specimen by flowing water vapor onto the region of contact between the probe tip and the frozen specimen. The bonded probe tip and specimen may be moved to a support structure such as a TEM grid and bonded to it by similar means. The probe tip can then be disconnected by heating the probe tip or applying a charged-particle beam.

Abstract: A device for holding a specimen holder, the device including a body with a slot formed therein. The slot includes an interior for receiving the specimen holder which may be a flat disk with edges and a pair of opposing sides. The disk may be made of a resilient deformable material. The slot may be sized to receive the specimen holder through an open top end and may taper from top bottom, such that the bottom end of the slot is smaller than the specimen holder. The slot further configured to contact the specimen holder along edges of the specimen holder and to allow some sideways deformation of the specimen holder without either side of the specimen holder distant from the edges coming into contact with the interior of the slot.

Abstract: A device and method for analyzing a sample provide for extracting a part to be analyzed from the sample with the aid of a previously generated opening in the sample. The part to be analyzed is examined in greater detail with the aid of a particle beam. For this purpose, the sample is placed in the opening or on a sample holder.

Abstract: A particle beam device includes a movable carrier element with at least one receiving element for receiving a specimen and in which the receiving element is situated on the carrier element. In various embodiments, the receiving element may be situated removably on the carrier element and/or multiple receiving elements may be situated on the carrier element in such a way that a movement of the carrier element causes a movement of the multiple receiving elements in the same spatial direction or around the same axis. The carrier element may be movable in three spatial directions situated perpendicular to one another and rotatable around a first axis which is parallel to an optical axis of the particle beam device and around a second axis which is situated perpendicular to the optical axis. A method for using the particle beam device in connection with specimen study and preparation is also disclosed.