With Object Moving Or Positioning Means Patents (Class 250/442.11)
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Patent number: 9404823Abstract: A load transducer is disclosed herein. The load transducer includes a plurality of beam portions connected to one another in succession, the plurality of beam portions being arranged in a circumscribing pattern whereby a central one of the plurality of beam portions is at least partially circumscribed by one or more outer ones of the plurality of beam portions; and at least one load cell disposed on one of the plurality of beam portions, the at least one load cell configured to measure at least one force or moment component of a load applied to the load transducer. A force measurement assembly including a plurality of load transducers with beam portions arranged in a circumscribing pattern is also disclosed herein.Type: GrantFiled: May 18, 2015Date of Patent: August 2, 2016Assignee: Bertec LimitedInventors: Necip Berme, Benjamin Robert Hoffman
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Patent number: 9399285Abstract: An industrial robot that can control the abrasion and damage of a bearing unit, and also control the deformation of an arm, even in the case of transferring a high-temperature transfer object in a vacuum. The industrial robot includes a bearing unit for supporting an arm at a joint section as a connection section between the arm and the main body. At the joint section, the arm has a first protrusion section protruding toward the main body, and meanwhile the main body has a first housing section in which a first hollow section for housing the first protrusion section is formed. The first protrusion section and the first housing section are formed of a material having higher thermal conductivity than the bearing unit has, and a semisolid thermally-conductive substance, having higher thermal conductivity than the bearing unit has, is placed in the first hollow section.Type: GrantFiled: November 1, 2012Date of Patent: July 26, 2016Assignee: NIDEC SANKYO CORPORATIONInventors: Takayuki Yazawa, Masago Shiba, Hiroto Nakajima, Masashi Fujiwara
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Patent number: 9368320Abstract: The purpose of the present invention is to provide a stage apparatus that effectively suppresses the transmission of heat generated by a drive mechanism to a sample, and a charged particle beam apparatus using the same. In order to achieve the purpose, there are proposed a stage apparatus and a charged particle beam apparatus. The stage apparatus comprises a table; a drive source that drives the table in a predetermined direction; a first connection member provided between the table and the drive source; a second connection member provided between the table and the drive source and closer to the drive source than the first member; a slide unit supported by the second connection member; and a rail guiding the slide unit in a predetermined direction, the first connection member comprising a member having a relatively low heat conductivity with respect to the second connection member.Type: GrantFiled: August 19, 2014Date of Patent: June 14, 2016Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Akira Nishioka, Masaki Mizuochi, Shuichi Nakagawa, Hiroshi Tsuji
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Patent number: 9368326Abstract: A scan head assembled to a scan arm for an ion implanter and a scan arm using the same are provided, wherein the scan head comprises a case, a shaft assembly, an ESC, a first driving mechanism and a second driving mechanism. The case has a normal center line. The shaft assembly passes through a first side of the case and has a twist axis, a first pivot point fixed relative to the case and a first end located outside the case. The ESC is fastened on the first end and capable of holding a work piece. The first driving mechanism is capable of driving the shaft assembly, the ESC and the work piece to tilt relative to the normal center line. The second driving mechanism is capable of driving the shaft assembly, the ESC and the work piece to rotate about the twist axis.Type: GrantFiled: June 17, 2013Date of Patent: June 14, 2016Assignee: ADVANCED ION BEAM TECHNOLOGY, INC.Inventor: Richard F. McRay
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Patent number: 9316569Abstract: A sub-micron scale property testing apparatus including a test subject holder and heating assembly. The assembly includes a holder base configured to couple with a sub-micron mechanical testing instrument and electro-mechanical transducer assembly. The assembly further includes a test subject stage coupled with the holder base. The test subject stage is thermally isolated from the holder base. The test subject stage includes a stage subject surface configured to receive a test subject, and a stage plate bracing the stage subject surface. The stage plate is under the stage subject surface. The test subject stage further includes a heating element adjacent to the stage subject surface, the heating element is configured to generate heat at the stage subject surface.Type: GrantFiled: August 26, 2010Date of Patent: April 19, 2016Assignee: Hysitron, Inc.Inventors: Yunje Oh, Syed Amanulla Syed Asif, Edward Cyrankowski, Oden Lee Warren
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Patent number: 9318301Abstract: A sample introduction device (100) has a pre-evacuation chamber (2), a sample holder (10), a mechanical drive arrangement (30) for moving the sample holder (10), and a controller (90). The controller (90) performs a first operation for controlling the mechanical drive arrangement (30) to move a support member (20) such that this support member (20) supports the sample holder (10) when its sample holding portion (12) is in the pre-evacuation chamber (2) and to bring the support member (20) to a halt, a second operation for making a decision as to whether the sample holding portion (12) can be moved into the sample chamber (1), based on the position at which the support member (20) is halted, and a third operation for moving the support member (20) supporting the sample holder (10) such that the sample holding portion (12) moves from the pre-evacuation chamber (2) into the sample chamber (1) if the decision is affirmative to indicate that the sample holding portion (12) can be moved into the sample chamber (1).Type: GrantFiled: November 26, 2014Date of Patent: April 19, 2016Assignee: JEOL Ltd.Inventor: Masaaki Kobayashi
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Patent number: 9312096Abstract: A sample holder according to an embodiment is a sample holder on which a sample to be observed with an electron microscope is mounted. The sample holder includes a support unit, a holder body, and a rotation mechanism. The support unit has a longitudinal direction and has a first end on which the sample can be mounted. The holder body holds the support unit at a second end on the opposite side from the first end. The rotation mechanism is provided inside the holder body and rotates the support unit with the longitudinal direction serving as an axis. A central axis of the holder body and a rotation axis of the support unit are axes in substantially same directions.Type: GrantFiled: September 9, 2014Date of Patent: April 12, 2016Assignee: KABUSHIKI KAISHA TOSHIBAInventor: Kazuhiro Hanada
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Patent number: 9305747Abstract: The invention relates to a maskless lithography system for patterning a target using a plurality of charged particle beamlets. The system comprises an electron optical column including a blanker array for modulating the beamlets. The blanker array includes receivers for receiving data signals and blanker elements for modulating the beamlets in accordance with the data signals. The system further comprises a data path comprising a preprocessing system for processing pattern data and a plurality of transmission channels for transmitting processed pattern data to the blanker elements. The data path further comprises a pattern streaming system for receiving pattern data and generating data signals. First and second channel selectors connect a subset of selected transmission channels for pattern data transmission. The first channel selector is connected between the preprocessing system and the transmission channels. The second channel selector is connected between the channels and the blanker elements.Type: GrantFiled: November 7, 2011Date of Patent: April 5, 2016Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Marco Jan-Jaco Wieland, Teunis Van De Peut, Floris Pepijn Van Der Wilt, Ernst Habekotte
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Patent number: 9275831Abstract: An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (<100 nm thick) TEM lamellae. Preferred embodiments of the present invention also provide an in-line process for S/TEM based metrology on objects such as integrated circuits or other structures fabricated on semiconductor wafer by providing methods to partially or fully automate TEM sample creation, to make the process of creating and analyzing TEM samples less labor intensive, and to increase throughput and reproducibility of TEM analysis.Type: GrantFiled: November 18, 2014Date of Patent: March 1, 2016Assignee: FEI CompanyInventors: Jason Arjavac, Pei Zou, David James Tasker, Maximus Theodorus Otten, Gerhard Daniel
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Patent number: 9275827Abstract: A charged particle beam apparatus includes: a charged particle beam column; a detector configured to detect secondary charged particles; an image processor; a display device; a needle arranged in an irradiation area of charged particle beam; a needle actuator; a user interface; and a controller configured to control the needle actuator to actuate the needle in accordance with a target position that is set by the user interface. The controller controls the needle actuator to move the needle to track a change of the target position that is set by the user interface.Type: GrantFiled: February 9, 2015Date of Patent: March 1, 2016Assignee: HITACHI HIGH-TECH SCIENCE CORPORATIONInventors: Atsushi Uemoto, Tatsuya Asahata, Hidekazu Suzuki, Yo Yamamoto
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Patent number: 9240304Abstract: In at least one embodiment, a specimen holder tip part comprises a specimen setting seat, a specimen mesh for mounting a specimen, a specimen holding part for holding the specimen mesh and a clamping part that clamps the specimen holding part.Type: GrantFiled: July 12, 2013Date of Patent: January 19, 2016Assignee: Mel-Build CorporationInventor: Hiroya Miyazaki
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Patent number: 9218937Abstract: A charged particle beam apparatus includes: a charged particle beam column configured to irradiate an irradiation target with a charged particle beam; a detector configured to detect secondary charged particles emitted from the irradiation target by the irradiation of the charged particle beam; a needle arranged in an irradiation area of the charged particle beam; a needle actuator configured to actuate the needle; and a controller configured to control the needle actuator to actuate the needle along a movement route that is configured by a preset target position and preset way points. The controller controls the needle actuator to set an actuating direction of the needle for each of the way points.Type: GrantFiled: February 9, 2015Date of Patent: December 22, 2015Assignee: HITACHI HIGH-TECH SCIENCE CORPORATIONInventors: Atsushi Uemoto, Tatsuya Asahata, Hidekazu Suzuki, Yo Yamamoto
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Patent number: 9190242Abstract: A particle beam device and a sample receptacle apparatus, which has a sample holder, are disclosed. The sample holder is arranged in a movable fashion along at least a first axis and along at least a second axis. Furthermore, the sample holder is arranged in a rotatable fashion about a first axis of rotation and about a second axis of rotation. A first sample holding device is arranged relative to the sample holder in a rotatable fashion about a third axis of rotation, in which the third axis of rotation and the second axis of rotation are at least in part arranged laterally offset with respect to one another. Furthermore, a control apparatus is provided, in which the first sample holding device is rotatable about the third axis of rotation into an analysis position and/or treating position using the control apparatus.Type: GrantFiled: September 22, 2011Date of Patent: November 17, 2015Assignee: Carl Zeiss NTS GmbHInventors: Josef Biberger, Ralph Pulwey
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Patent number: 9168623Abstract: A biaxial linear-motion micro drive apparatus includes: a mounting base A on an upper surface of a Z-direction sliding base; a Z-direction micro actuator fixed within the mounting base A and connected with a Z-direction micro-motion platform connected with an X-direction sliding base; Z-direction guide rail strips arranged on the Z-direction sliding; two Z-direction guide rail blocks provided on one Z-direction guide rail strip fixedly mounted on a lower surface of the X-direction sliding base; a mounting base B provided on an upper surface of the X-direction sliding base; an X-direction micro actuator in the mounting base B and connected with an X-direction micro-motion platform connected with an XZ biaxial motion platform; two X-direction guide rail strips arranged on the upper surface of the X-direction sliding base; two X-direction guide rail blocks provided on each X-direction guide rail strip mounted on a lower surface of the XZ biaxial motion platform.Type: GrantFiled: October 13, 2011Date of Patent: October 27, 2015Assignee: XI'AN UNIVERSITY OF TECHNOLOGYInventors: Yumei Huang, Hongyan Liu, Xingang Yang, Yong Yang
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Patent number: 9115973Abstract: A profile measuring instrument includes: a fixed member of which position relative to a workpiece having a surface to be profile-measured is fixed; a scanning member supported by the fixed member and movable in a scan direction along the surface of the workpiece relative to the fixed member; a laser interferometer that detects a displacement of the surface of the workpiece along the scan direction. The laser interferometer includes: a polarizing beamsplitter provided to the scanning member; a reference mirror fixed to the fixed member; a measurement optical path extending from the polarizing beamsplitter to the workpiece; and a reference optical path extending from the polarizing beamsplitter to the reference mirror. A difference between an optical path length of the measurement optical path and an optical path length of the reference optical path is a predetermined tolerable error or less.Type: GrantFiled: May 28, 2013Date of Patent: August 25, 2015Assignee: MITUTOYO CORPORATIONInventors: Yoshimasa Suzuki, Akinori Saito
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Patent number: 9105446Abstract: An object of the present invention is to provide a charged particle beam apparatus that effectively removes electrical charges from an electrostatic chuck. In order to achieve the above object, the charged particle beam apparatus of the present invention includes a sample chamber that maintains a space containing an electrostatic chuck mechanism (5) in a vacuum state; and in which the charged particle beam apparatus includes an ultraviolet light source (6) to irradiate ultraviolet light within the sample chamber, and a irradiation target member irradiated by the ultraviolet light; and the irradiation target member is placed perpendicular to the adsorption surface of the electrostatic chuck.Type: GrantFiled: January 28, 2013Date of Patent: August 11, 2015Assignee: Hitachi High-Technologies CorporationInventors: Yasushi Ebizuka, Seiichiro Kanno, Makoto Nishihara, Masashi Fujita
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Patent number: 9099281Abstract: Disclosed is a charged particle radiation apparatus capable of capturing a change in a sample due to gaseous atmosphere, light irradiation, heating or the like without exposing the sample to atmosphere. The present invention relates to a sample holder provided with a sample stage that is rotatable around a rotation axis perpendicular to an electron beam irradiation direction, the sample holder being capable of forming an airtight chamber around the sample stage. A sample is allowed to chemically react in any atmosphere, and three-dimensional analysis on the reaction is enabled. A sample liable to change in atmosphere can be three-dimensionally analyzed without exposing the sample to the atmosphere.Type: GrantFiled: October 22, 2010Date of Patent: August 4, 2015Assignee: Hitachi High-Technologies CorporationInventors: Toshie Yaguchi, Yasuhira Nagakubo, Junzo Azuma, Akira Watabe
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Patent number: 9082584Abstract: The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.Type: GrantFiled: December 30, 2014Date of Patent: July 14, 2015Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Jerry Peijster, Guido de Boer
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Patent number: 9070532Abstract: The disclosed invention provides a sample holder capable of reducing or preventing the influence of a charged particle beam deflected by applying a magnetic field to a sample and provided with means for simply switching between a mode of observing a sample while applying a magnetic field to the sample, and a mode free of a magnetic field in which a magnetic field becomes zero completely. The sample holder includes a magnetic field generating element including three or more magnetic gaps for applying a magnetic field to a sample, a cantilever-beam-shaped sample holding element that holds a sample on one end thereof, and a moving mechanism that adjusts a relative position between a sample and a magnetic gap. The magnetic gaps can be placed along an optical axis of a charged particle beam.Type: GrantFiled: April 24, 2014Date of Patent: June 30, 2015Assignee: Hitachi, Ltd.Inventors: Akira Sugawara, Tomokazu Shimakura, Yoshio Takahashi
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Patent number: 9058959Abstract: The present invention is provided to enable a detailed inspection of a specimen and preventing a distortion of an observation image even when a specimen containing an insulating material is partially charged. For a scanning ion microscope utilizing a gas field ionization ion source, a thin film is disposed between an ion optical system and a specimen, and an ion beam is applied to and transmitted through this thin film in order to focus a neutralized beam on the specimen. Furthermore, an electrode for regulating secondary electrons discharged from this thin film is provided in order to eliminate mixing of noises into an observation image.Type: GrantFiled: November 8, 2012Date of Patent: June 16, 2015Assignee: Hitachi High-Technologies CorporationInventors: Yoshimi Kawanami, Yoichi Ose
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Publication number: 20150144804Abstract: In many cases, the charged particle beam apparatus is used basically for observation at a magnification of 10,000 times or higher. It is thus difficult to recognize how the orientation of a sample seen with the naked eye corresponds to the origination of the sample appearing on an acquired image. This makes it difficult intuitively to grasp the tilt direction and other details of the sample. An object of this invention is to provide a charged particle beam apparatus allowing the orientation and the tilted state of the sample to be grasped intuitively.Type: ApplicationFiled: June 3, 2013Publication date: May 28, 2015Inventors: Tohru Ando, Kunji Shigeto, Shotaro Tamayama, Yusuke Narita
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Patent number: 9042515Abstract: The invention relates to a device (10; 10a;10b; 10c; 50) for checking pharmaceutical products (1), in particular hard gelatin capsules, by means of at least one radiation source (30; 60) preferably embodied as an X-ray source, and a conveying device which conveys the products (1) in a clocked manner in a radiation area (31) of the radiation source (30; 60). The radiation emitted by the radiation source (30; 60) penetrating the products (1) preferably perpendicular to the longitudinal axes thereof (2), and the radiation is captured on the side of the products (1) opposite the radiation source (30) by means of at least one sensor element (35) which is coupled to an evaluation device (36). The invention is characterized in that the conveyor device is embodied as a conveyor wheel (15; 15a; 51) which can rotate in a stepped manner about an axis (12; 52), and the products (1) are arranged, while being conveyed in the radiation area (31), in receiving areas (28; 37; 56) of the conveyor wheel (15; 5a; 51).Type: GrantFiled: March 1, 2012Date of Patent: May 26, 2015Assignee: Robert Bosch GmbHInventors: Werner Runft, Iulian Maga, Jens Schlipf, Martin Vogt
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Patent number: 9040908Abstract: A method and apparatus for altering the orientation of a charged particle beam sample is presented. Embodiments of the method includes providing a first work piece on a sample stage having a sample stage plane, the first work piece including a lamella plane in a first orientation. A sample is milled from the first work piece using an ion beam so that the sample is substantially free from the first work piece. A probe is attached to the sample, the probe including a shaft having a shaft axis, the shaft axis oriented at a shaft angle in relation to the sample stage plane, the shaft angle being non-normal to the sample stage plane. The probe is rotated about the shaft axis through a rotational angle so that the lamella plane is in a second orientation. The sample is attached to or placed on the sample on either the first work piece, the first work piece being the work piece from which the sample was milled, or on a second work piece, the second work piece being a work piece from which the sample was not milled.Type: GrantFiled: June 28, 2013Date of Patent: May 26, 2015Assignee: FEI COMPANYInventor: Richard J. Young
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Publication number: 20150137002Abstract: A sample holder is provided allowing for favorable observation of a cross-sectional sample using a retarding method. The sample holder includes: a sample placement member on which a first fixing member, a cross-sectional sample as an observation sample, and a second fixing member are placed in contact with each other, and inserted inside the electronic optical lens barrel of an electron microscope; and a voltage introduction means for introducing a voltage to the sample placement member. The sample placement member has a positioning section for positioning the first fixing member, the cross-sectional sample, and the second fixing member onto a placement position. A positioning section positions the first planar surface of the first fixing member and the second planar surface of the second fixing member which are disposed respectively adjacent to the observation surface of the cross-sectional sample, parallel to the observation surface at locations equidistant from the observation surface.Type: ApplicationFiled: May 30, 2013Publication date: May 21, 2015Inventors: Kazuhiro Koyama, Masahiro Akatsu
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Patent number: 9013572Abstract: A sample observation method of the present invention comprises a step of defining, with respect to an electron microscope image, an outline of an observation object with respect to a sample (3), or a plurality of points located along the outline, and a step of arranging a plurality of fields of view for an electron microscope along the outline, wherein electron microscope images of the plurality of fields of view that have been defined and arranged along the shape of the observation object through each of the above-mentioned steps are acquired. It is thus made possible to provide a sample observation method that is capable of selectively acquiring, with respect to observation objects of various shapes, an electron microscope image based on a field of view definition that is in accordance with the shape of the observation object, as well as an electron microscope apparatus that realizes such a sample observation method.Type: GrantFiled: October 19, 2009Date of Patent: April 21, 2015Assignee: Hitachi High-Technologies CorporationInventors: Akiko Fujisawa, Hiroyuki Kobayashi, Eiko Nakazawa
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Patent number: 9000397Abstract: A specimen holder and method for controlling the same, which can mount and fasten a specimen to allow observation thereof by joining a body and a stand of the specimen holder together. The specimen holder includes: a body; a specimen mounting part formed at an end of the body for fixing a specimen; elasticity means located inside the body; and a stand detachably joined with the body. The stand includes: a base part; and a joining part protrudingly formed on the upper face of the base part and having a through hole to which at least a part of the specimen mounting part is inserted. The specimen mounting part includes: a first grip part located at an end portion of the specimen mounting part for fixing one side of the specimen; and a second grip part movably connected with the elasticity means for fixing the other side of the specimen.Type: GrantFiled: October 21, 2013Date of Patent: April 7, 2015Assignee: Hitachi High-Technologies Korea Co., Ltd.Inventor: Heyoung Cheol Heyoung
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Patent number: 9001966Abstract: A transmission X-ray analyzer (1) for detecting a transmission X-ray image of a sample (100) that is continuous in a band shape includes: a TDI sensor (14); an X-ray source (12) arranged opposed to a TDI sensor; a pair of support rollers (31, 32) arranged away from the TDI sensor between the TDI sensor and the X-ray source, the pair of support rollers being configured to transport the sample to a detection position of the TDI sensor while keeping a constant interval between the TDI sensor and the sample; and a pair of outside rollers (51, 52) arranged respectively on an outer side of the pair of support rollers in a transportation direction (L). One of the pair of support rollers and one of the pair of outside rollers are arranged at different positions as to apply a tension to the sample between the pair of support rollers.Type: GrantFiled: February 18, 2013Date of Patent: April 7, 2015Assignee: Hitachi High-Tech Science CorporationInventor: Yoshiki Matoba
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Patent number: 8987682Abstract: A specimen positioning device (100) is for use in or with a charged particle beam system having a specimen chamber (1) and has: a base (10) provided with a hole (12) in operative communication with the specimen chamber (1); a specimen holder (20) movably mounted in the hole (12) and having a first portion (22) and a second portion (24); and a first portion support portion (40) supporting the first portion (22) in the specimen chamber (1). The second portion (24) supports the first portion (22) via a resilient member (34).Type: GrantFiled: December 10, 2013Date of Patent: March 24, 2015Assignee: JEOL Ltd.Inventor: Mitsuru Hamochi
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Publication number: 20150060695Abstract: A charged particle beam apparatus includes: an electron beam irradiation unit irradiating a sample with electron beams having a first irradiation axis; a rotation stage holding the sample and having a rotation axis in a direction perpendicular to the first irradiation axis; an ion beam irradiation unit irradiating the sample with ion beams having a second irradiation axis that is substantially parallel to the rotation axis; a detection unit detecting at least one of charged particles and X rays generated via the sample by the irradiation with the ion beams and electron beams; and a gaseous ion beam irradiation unit irradiating the sample with gaseous ion beams.Type: ApplicationFiled: August 27, 2014Publication date: March 5, 2015Inventors: Xin MAN, Tatsuya ASAHATA, Atsushi UEMOTO
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Patent number: 8969828Abstract: This invention stabilizes positioning and provides improved positioning accuracy in a scanning electron microscope provided with stage-driving means utilizing an effect of rolling friction. In this scanning electron microscope that includes a sample stage equipped with an x-table, a y-table, a z-table, a rotation table, and a tilting table, and moved by means of stepping motors each connected to a ball screw via a coupling, a sliding friction element is disposed at a position close to the ball screw, between the x-table and the y-table and between a tilting base and the x-table.Type: GrantFiled: May 11, 2011Date of Patent: March 3, 2015Assignee: Hitachi High-Technologies CorporationInventors: Naoki Sakamoto, Kaname Takahashi, Shigeru Haneda, Shinsuke Kawanishi
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Publication number: 20150053857Abstract: The purpose of the present invention is to provide a stage apparatus that effectively suppresses the transmission of heat generated by a drive mechanism to a sample, and a charged particle beam apparatus using the same. In order to achieve the purpose, there are proposed a stage apparatus and a charged particle beam apparatus. The stage apparatus comprises a table; a drive source that drives the table in a predetermined direction; a first connection member provided between the table and the drive source; a second connection member provided between the table and the drive source and closer to the drive source than the first member; a slide unit supported by the second connection member; and a rail guiding the slide unit in a predetermined direction, the first connection member comprising a member having a relatively low heat conductivity with respect to the second connection member.Type: ApplicationFiled: August 19, 2014Publication date: February 26, 2015Inventors: Akira NISHIOKA, Masaki MIZUOCHI, Shuichi NAKAGAWA, Hiroshi TSUJI
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Patent number: 8963102Abstract: An apparatus that can capture a rotation series of images of an observation area within a range of ?180° to +180° around the x axis thereof, and can capture a rotation series of images of the observation area within a range of ?180° to +180° around the y axis thereof.Type: GrantFiled: January 11, 2013Date of Patent: February 24, 2015Assignee: Hitachi High-Technologies CorporationInventors: Ruriko Tsuneta, Hideki Kikuchi, Hideo Kashima
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Patent number: 8952342Abstract: The invention relates to a charged particle system provided with a support and positioning structure for supporting and positioning a target on a table, the support and positioning structure comprising a first member and a second member and at least one motor so as to move the first member relative to the second member, wherein a shield is present to shield at least one charged particle beam from electromagnetic fields generated by said at least one motor, the support and positioning structure further comprising a spring mechanically coupling the first member and the second member for at least partially bearing the weight of the first member, table and target.Type: GrantFiled: December 16, 2010Date of Patent: February 10, 2015Assignee: Mapper Lithography IP B.V.Inventors: Jerry Peijster, Aditya Mehendale, Andre Johannes Maria Hilderink
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Patent number: 8952330Abstract: System and method for EMI shielding for a CD-SEM are described. One embodiment is a scanning electron microscope (“SEM”) comprising an electron gun for producing an electron beam directed toward a sample; a secondary electron (“SE”) detector for detecting secondary electrons reflected from the sample in response to the electron beam; and a dual-layer shield disposed around and enclosing the SE detector. The shield comprises a magnetic shielding lamina layer and a metallic foil layer.Type: GrantFiled: January 17, 2014Date of Patent: February 10, 2015Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chia-Chi Tsao, Syun-Jie Jhan, Yi-Cheng Shih, Chwen Yu
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Patent number: 8946652Abstract: Provided is a sample positioning technology wherein micro-vibrations of a top table on which a sample is placed are suppressed such that the quality of an image to be observed or the precision of a measured dimension value can be improved. A sample positioning apparatus according to the present invention is provided with an active brake for stopping the top table, an inner frame which surrounds the active brake, an outer frame which surrounds the inner frame, and actuators for driving the active brake. The actuators, after driving the active brake to stop the top table with respect to a stage, press the outer frame to adjust the position of the top table.Type: GrantFiled: November 8, 2012Date of Patent: February 3, 2015Assignee: Hitachi High-Technologies CorporationInventors: Motohiro Takahashi, Hironori Ogawa, Nobuo Shibata, Masaki Mizuochi, Shuichi Nakagawa, Hiroshi Tsuji
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Publication number: 20150014526Abstract: The present invention provides a multi-view X-ray inspection system. In one embodiment, a beam steering mechanism directs the electron beam from an X-ray source to multiple production targets which generate X-rays for scanning which are subsequently detected by a plurality of detectors to produce multiple image slices (views). The system is adapted for use in CT systems. In one embodiment of a CT system, an electron beam generated by a single radiation source is steered by an electron beam transport mechanism comprising at least two dipoles and a quadrupole on to a target arranged in an approximated arc. The inspection system, in any configuration, can be deployed inside a vehicle for use as a mobile detection system.Type: ApplicationFiled: May 6, 2014Publication date: January 15, 2015Applicant: Rapiscan Systems, Inc.Inventors: Joseph Bendahan, James Kevin Jones, Deepa Angal-Kalinin, Kiril Borisov Marinov
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Patent number: 8921781Abstract: In the case of inspecting samples having different sizes by means of a semiconductor inspecting apparatus, a primary electron beam bends since distribution is disturbed on an equipotential surface at the vicinity of the sample at the time of inspecting vicinities of the sample, and what is called a positional shift is generated. A potential correcting electrode is arranged outside the sample and at a position lower than the sample lower surface, and a potential lower than that of the sample is applied. Furthermore, a voltage to be applied to the potential correcting electrode is controlled corresponding to a distance between the inspecting position and a sample outer end, sample thickness and irradiation conditions of the primary electron beam.Type: GrantFiled: August 20, 2013Date of Patent: December 30, 2014Assignee: Hitachi High-Technologies CorporationInventors: Go Miya, Seiichiro Kanno, Hiroyuki Kitsunai, Masaru Matsushima, Toru Shuto
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Patent number: 8907303Abstract: In the present invention, a stage device is configured to: provide a marker on a specimen, a specimen holder or a rotary table that allows measurement of position and direction; perform a rotation and translation movement of a stage according to a predetermined operation pattern; measure the position and direction of the marker there; identify the rotation center position of the rotary table from the results of this measurement; further create a correction value table relative to a rotation angle by calculating rotation-angle correction value for correcting the rotation error, and translation correction value for correcting a positional variation of the rotation center position; obtain from the correction value table the correction values associated with either an inputted rotation-angle command value or an actual rotation angle; and control the stage device by correcting either the rotation-angle and translation-position command values inputted or a rotation-angle and translation-position detected.Type: GrantFiled: June 6, 2012Date of Patent: December 9, 2014Assignee: Hitachi High-Technologies CorporationInventors: Yasuyuki Momoi, Kaname Takahashi, Shigeru Haneda
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Patent number: 8905369Abstract: The invention relates to a vibration isolation module (101) for a lithographic apparatus or an inspection apparatus. The module comprises a support frame (102), an intermediate body (103) and a support body (104) for accommodating the lithographic apparatus. The intermediate body is connected to the support frame by means of at least one spring element such that the intermediate body is a hanging body. The support body is connected to the intermediate body by means of at least one pendulum rod (108) such that the support body is a hanging body. The invention further relates to a substrate processing system comprising such vibration isolation module.Type: GrantFiled: September 10, 2012Date of Patent: December 9, 2014Assignee: Mapper Lithography IP B.V.Inventors: Jerry Johannes Martinus Peijster, Rogier Martin Lambert Ellenbroek, Guido De Boer
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Publication number: 20140353500Abstract: There is provided an apparatus that can capture a rotation series of images of an observation area within a range of ?180° to +180° around the x axis thereof, and can capture a rotation series of images of the observation area within a range of ?180° to +180° around the y axis thereof.Type: ApplicationFiled: January 11, 2013Publication date: December 4, 2014Inventors: Ruriko Tsuneta, Hideki Kikuchi, Hideo Kashima
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Publication number: 20140353499Abstract: A sample holder for an electron microscope has multiple sample stands, can allow at least one sample stand to move, and enables multiple samples for a transmission electron microscope to be prepared by a focused ion beam apparatus. A holder tip opening is provided in a tip of the sample holder. A back end of the sample holder has a knob, a rolling mechanism, a coarse adjustment mechanism, and a connector. By pressing the knob, fixation of the rolling mechanism is canceled, and the back end from the rolling mechanism and the tip of the sample holder will rotate. This rolling mechanism enables arrangement of the samples to be rotated in both the observing of a sample and the preparing of a sample for a transmission electron microscope with the focused ion beam apparatus. Moreover, the sample stand is movable by the coarse adjustment mechanism and the fine adjustment mechanism.Type: ApplicationFiled: December 3, 2012Publication date: December 4, 2014Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Shohei Terada, Yoshifumi Taniguchi, Yasuhira Nagakubo
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Patent number: 8895944Abstract: A scan head assembled to a scan arm for an ion implanter and a scan arm using the same are provided, wherein the scan head is capable of micro tilting a work piece and comprises a case, a shaft assembly, an electrostatic chuck, a first driving mechanism and a micro-tilt mechanism. The shaft assembly passes through a first side of the case and has a twist axis. The electrostatic chuck is fastened on a first end of the shaft assembly outside the case for holding the work piece. The first driving mechanism is disposed within the case and capable of driving the shaft assembly and the ESC to rotate about the twist axis. The micro-tilt mechanism is disposed within the case and capable of driving the shaft assembly and the ESC to tilt relative to the case.Type: GrantFiled: January 18, 2013Date of Patent: November 25, 2014Assignee: Advanced Ion Beam Technology, Inc.Inventor: Richard F. McRay
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Patent number: 8890067Abstract: An inspection system using a scanning electron microscope includes a scanning electron microscope chamber inspecting an object to be inspected by using an electron beam and maintaining a vacuum condition, a stage positioned below the scanning electron microscope chamber to be separated therefrom and mounted with the object to be inspected, and a transverse guide transferring the scanning electron microscope chamber on the stage. Atmospheric conditions are maintained between the scanning electron microscope chamber and the object to be inspected. Accordingly, object to be inspected a large size of an object to be inspected may be inspected without damage to the object to be inspected such that a cost reduction and a yield improvement may be realized.Type: GrantFiled: May 30, 2013Date of Patent: November 18, 2014Assignee: Samsung Display Co., Ltd.Inventors: Young-Gil Park, Won-Bong Baek, Ki-Won Oh
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Patent number: 8893309Abstract: An embodiment of a scanning tunneling microscope (STM) reactor includes a pressure vessel, an STM assembly, and three spring coupling objects. The pressure vessel includes a sealable port, an interior, and an exterior. An embodiment of an STM system includes a vacuum chamber, an STM reactor, and three springs. The three springs couple the STM reactor to the vacuum chamber and are operable to suspend the scanning tunneling microscope reactor within the interior of the vacuum chamber during operation of the STM reactor. An embodiment of an STM assembly includes a coarse displacement arrangement, a piezoelectric fine displacement scanning tube coupled to the coarse displacement arrangement, and a receiver. The piezoelectric fine displacement scanning tube is coupled to the coarse displacement arrangement. The receiver is coupled to the piezoelectric scanning tube and is operable to receive a tip holder, and the tip holder is operable to receive a tip.Type: GrantFiled: June 22, 2010Date of Patent: November 18, 2014Assignee: The Regents of the University of CaliforniaInventors: Feng Tao, Miquel Salmeron, Gabor A. Somorjai
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Patent number: 8884247Abstract: A method and system for creating an asymmetrical lamella for use in an ex situ TEM, SEM, or STEM procedure is disclosed. The shape of the lamella provides for easy orientation such that a region of interest in the lamella can be placed over a hole in a carbon film providing minimal optical and spectral interference from the carbon film during TEM, SEM, or STEM procedure of chemical analysis.Type: GrantFiled: September 25, 2012Date of Patent: November 11, 2014Assignee: FEI CompanyInventors: Thomas G. Miller, Jason Arjavac, Damon Heer, Michael Strauss, Gerardus Nicolaas Anne van Veen
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Patent number: 8884222Abstract: A mount for a scanning probe sensor package (27) comprises a support structure (1, 5) defining a plane within the mount and at least one movable snap joint element (9) designed for interacting with a respective counterpart (43) in a scanning probe sensor package (27). The snap joint element (9) is movable to a first position in which it exerts a force on a mounted scanning probe sensor package (27) so as to force said scanning probe sensor package (27) in a normal direction of said plane towards the support structure (1,5) and to a second position in which it allows a scanning probe sensor package (27) to be mounted to or dismounted from the support structure (1, 5) along normal direction of said plane.Type: GrantFiled: October 5, 2010Date of Patent: November 11, 2014Assignee: SPECS Surface Nano Analysis GmbHInventor: Joerg Rychen
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Publication number: 20140319371Abstract: The disclosed invention provides a sample holder capable of reducing or preventing the influence of a charged particle beam deflected by applying a magnetic field to a sample and provided with means for simply switching between a mode of observing a sample while applying a magnetic field to the sample, and a mode free of a magnetic field in which a magnetic field becomes zero completely. The sample holder includes a magnetic field generating element including three or more magnetic gaps for applying a magnetic field to a sample, a cantilever-beam-shaped sample holding element that holds a sample on one end thereof, and a moving mechanism that adjusts a relative position between a sample and a magnetic gap. The magnetic gaps can be placed along an optical axis of a charged particle beam.Type: ApplicationFiled: April 24, 2014Publication date: October 30, 2014Inventors: Akira Sugawara, Tomokazu Shimakura, Yoshio Takahashi
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Patent number: 8872128Abstract: A novel specimen holder for specimen support specimen support devices for insertion in electron microscopes is provided. The novel specimen holder of the invention provides mechanical support for specimen support devices and as well as electrical contacts to the specimens or specimen support devices.Type: GrantFiled: June 18, 2013Date of Patent: October 28, 2014Assignee: Protochips, Inc.Inventors: John Damiano, Jr., Stephen E. Mick, David P. Nackashi, Montie Roland, Paul Hakenewerth
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Patent number: 8859993Abstract: A sample holder to be disposed between an electrostatic chuck and a sample smaller than the upper surface of the electrostatic chuck is provided, the sample holder including: a base plate formed in the same size as the upper surface of the electrostatic chuck; a sample placement portion located on the upper surface of the base plate, and designed to place the sample thereon; and a circumferential portion being a portion of the upper surface of the base plate other than the sample placement portion, and having a conductive material exposed to the outside.Type: GrantFiled: August 15, 2013Date of Patent: October 14, 2014Assignee: Advantest Corp.Inventors: Hirofumi Hayakawa, Akiyoshi Tsuda
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Patent number: 8853648Abstract: A sample holder for efficiently performing the processing or observation of a sample by means of charged particles while cooling. Particularly, disclosed is a sample holder whereby the processing or observation of a material which may be affected by the influence of heat damage can be performed in a state in which the material is cooled, and furthermore, the influence due to a sample processing method using charged particles can be reduced by cooling. The sample holder is provided with a sample stage capable of fixing a sample piece extracted from a sample by ion beam irradiation, and a rotation mechanism for rotating the sample stage in a desired direction, which can be attached to an ion beam device and a transmission electron microscope device, and which has a movable heat transfer material for thermally connecting the sample stage and a cooling source, and an isolation material for thermally isolating the sample stage and the heat transfer material from the outside.Type: GrantFiled: April 7, 2010Date of Patent: October 7, 2014Assignee: Hitachi High-Technologies CorporationInventors: Yasuhira Nagakubo, Toshiaki Tanigaki, Katsuji Ito