With Radiation Modifying Member Patents (Class 250/503.1)
  • Publication number: 20080067451
    Abstract: An improved particle beam treatment system optionally includes exchangeable particle beam nozzles. These particle beam nozzles may be automatically moved from a storage location to a particle beam path or between particle beam paths for use in medical applications. Movement may be achieved using a conveyance, gantry, rail system, or the like. The improved particle beam treatment system optionally also includes more than two alternative particle beam paths. These alternative particle beam paths may be directed to a patient from a variety of different angles and in different planes.
    Type: Application
    Filed: June 5, 2006
    Publication date: March 20, 2008
    Inventors: Timothy Guertin, Marcel R. Marc
  • Publication number: 20080067452
    Abstract: The present invention improves the accuracy of therapy by checking in real time whether an spread-out Bragg peak (SOBP) width agrees with a desired width during irradiation with a beam. The device for outputting a charged particle beam includes a charged particle beam generator 1 including a synchrotron 4; a range modulation device such as a range modulation wheel (RMW) 28 which forms a Bragg peak of an ion beam extracted from this charged particle beam generator 1; an irradiation device 16 which is located in the direction of ion beam propagation of this RMW device 28 and includes a dose monitor 31 for detecting a dose of the ion beam; and an SOBP width calculation device 73 which calculates ion beam Bragg peak formed by the RMW device 28 based on a detection value of the dose monitor 31.
    Type: Application
    Filed: July 6, 2007
    Publication date: March 20, 2008
    Inventors: Kunio MORIYAMA, Noriaki Ouchi, Masahiro Tadokoro, Hisataka Fujimaki
  • Patent number: 7282706
    Abstract: The present invention is directed to a novel arrangement of optical devices for the rapid patterning of laser profiles used for desorption and/or ionization sources in analytical mass spectrometry. Specifically, the new optical arrangement provides for a user-defined laser pattern at the sample target that can be quickly changed (on a microsecond timescale) to different dimensions (or shapes) for subsequent laser firings.
    Type: Grant
    Filed: February 11, 2005
    Date of Patent: October 16, 2007
    Assignee: The Texas A&M University System
    Inventors: David H. Russell, John A. McLean
  • Publication number: 20070228299
    Abstract: The object of the invention in an arrangement for generating extreme ultraviolet radiation based on an electrically operated gas discharge is to reduce the time required for charging the electrodes by reducing the inductance of the discharge circuit. A high-voltage power supply connected to the electrodes which are constructed as disk electrodes and are rotatably mounted has a capacitor battery comprising capacitor elements which are arranged along a ring concentric to the axis of rotation of the electrodes with a ring plane directed parallel to the disk surface. Electrical connections are guided to the disk surfaces from the capacitor elements along a ring concentric to the axis of rotation.
    Type: Application
    Filed: March 29, 2007
    Publication date: October 4, 2007
    Inventors: Christian Ziener, Guido Hergenhan, Frank Flohrer, Carsten Thode
  • Patent number: 7250620
    Abstract: Filters for EUV lithography, methods of manufacture thereof, and methods of filtering in an EUV lithography system are disclosed. The filter comprises a nanotube material layer sandwiched by two thin material layers that are highly transmissive and provide structural support for the nanotube material layer. The filter is supported on at least one side by a patterned structural support. The filter mitigates debris, provides spectral purity filtering, or both.
    Type: Grant
    Filed: January 20, 2005
    Date of Patent: July 31, 2007
    Assignees: Infineon Technologies AG, Sematech Inc.
    Inventors: Stefan Wurm, Vivek Bakshi
  • Patent number: 7247870
    Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.
    Type: Grant
    Filed: August 30, 2006
    Date of Patent: July 24, 2007
    Assignee: Cymer, Inc.
    Inventors: Alexander I. Ershov, William N. Partlo
  • Patent number: 7247869
    Abstract: A particle therapy system capable of measuring energy of a charged particle beam even during irradiation of the charged particle beam is provided. A beam delivery (irradiation) system comprises a block collimator constituted by a pair of collimator members, and an energy detector mounted to one of the collimator members to be disposed on the upstream side thereof. When the pair of collimator members are moved in directions away from each other, a beam passage is formed between them. The energy detector constitutes an energy measuring device together with a signal processing unit. A part of the ion beam having reached the interior of the irradiation nozzle is irradiated to a patient through the beam passage. When a part of the remaining ion beam enters the energy detector, electric charges generate in the energy detector. The signal processing unit determines energy of the ion beam based on a position within the energy detector at which electric charges have generated in maximum amount.
    Type: Grant
    Filed: October 25, 2004
    Date of Patent: July 24, 2007
    Assignee: Hitachi, Ltd.
    Inventors: Masahiro Tadokoro, Shunji Kakiuchi, Hiroshi Akiyama, Mamoru Katane, Koji Matsuda
  • Patent number: 7230258
    Abstract: A light source chamber in an Extreme Ultraviolet (EUV) lithography system may include a secondary plasma to ionize debris particles created by the light source and a foil trap to trap the ionize particles to avoid contamination of the collector optics in the chamber.
    Type: Grant
    Filed: July 24, 2003
    Date of Patent: June 12, 2007
    Assignee: Intel Corporation
    Inventors: David Ruzic, Robert Bristol, Bryan J. Rice
  • Patent number: 7169481
    Abstract: A radiation image conversion panel that has a phosphor layer. The phosphor layer contains a binding agent, a phosphor particle, and at least aryl carboxylic acid or alicyclic carboxylic acid, expressed by the following general Formula: R—R1—COOX, or R—COOX in which R represents (1) an aryl group; (2) an aryl group, replaced with an alkyl group whose number of carbons is 1 to 5, a hydroxyl group, a carboxylic acid group, or a halogen group; (3) a hydroaryl group; or (4) a hydroaryl group (alicyclic group), replaced with an alkyl group whose number of carbons is 1 to 5, a hydroxyl group, or a halogen group; R1 is a hydrocarbon radical whose number of carbons is 1 to 12; and X represents a hydrogen atom, alkaline metal, or —N+ (R2)4 (where R2 represents an alkyl group whose number of carbons is 2 or less).
    Type: Grant
    Filed: March 19, 2001
    Date of Patent: January 30, 2007
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiroshi Ogawa, Shinichiro Fukui, Yasuo Iwabuchi, Noriyuki Inoue, Shigeo Hirano
  • Patent number: 7148497
    Abstract: A variable wavelength ultraviolet lamp. An apparatus for selectively producing one or more of a plurality of wavelength distributions of light is provided, comprising a primary light source having a primary wavelength distribution, at least one wavelength-transforming material that, in response to illumination by the primary light source produces secondary light having a wavelength distribution different from the primary light wavelength distribution, the wavelength-transforming material being disposed on a substrate external to the primary light source, and a wavelength-transforming material selection mechanism for placing at least a portion of one or more selected wavelength-transforming materials in front of the primary light source, in a selected preferred direction of light emission from the apparatus, such that the selected wavelength-transforming materials emit from the apparatus light having a wavelength distribution different from the primary light wavelength distribution.
    Type: Grant
    Filed: December 19, 2003
    Date of Patent: December 12, 2006
    Inventor: William G. Gardner
  • Patent number: 7126110
    Abstract: The present invention relates to an optronic passive surveillance device, especially for infrared surveillance. It comprises a front optic (1) of given useful instantaneous field, means (2) for scanning a scene with a given total field of observation, means (3) for forming the image of the scene and means (4) for detecting said image. According to the invention, the detection means (4) comprise a two-dimensional matrix detector (41), the field of the detector along each of the dimensions being greater than or equal to said useful instantaneous field of the front optic along said dimension, and allow the acquisition, for each elementary area of the scene corresponding to the useful instantaneous field of the front optic, of N subimages formed on said detector (N?1), with a given integration time for each subimage.
    Type: Grant
    Filed: October 1, 2002
    Date of Patent: October 24, 2006
    Assignee: Thales
    Inventors: Michel Papuchon, Philippe Antier, Ludovic Perruchot, Alain Verdaguer
  • Patent number: 7122812
    Abstract: A light source for examining sites in heating, ventilating, and air conditioning systems for leaks using a fluorescent dye is described. The light source can include a low voltage lamp or a low heat generating lamp.
    Type: Grant
    Filed: June 20, 2003
    Date of Patent: October 17, 2006
    Assignee: Bright Solutions, Inc.
    Inventors: Terrence D. Kalley, John R. Burke, David Gentit
  • Patent number: 7109503
    Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.
    Type: Grant
    Filed: February 25, 2005
    Date of Patent: September 19, 2006
    Assignee: Cymer, Inc.
    Inventors: Norbert R. Bowering, Bjorn A. M. Hansson, Alexander N. Bykanov, Oleh Khodykin, Alexander I. Ershov, William N. Partlo
  • Patent number: 7056389
    Abstract: The object of the invention is to measure temperature using pyrometers, in a simple and economic way, enabling precise temperature measurement, even for low temperatures. The invention presents a device and method for thermally treating substrates, wherein the substrate is exposed to at least a first and at least a second radiation; the predetermined wavelengths of the first radiation are absorbed between the first radiation source and the substrate; a radiation from the substrate is measured in the predetermined wavelength using a radiation detector arranged on the same side as a second radiation source; the second radiation from the second radiation source is modulated and determined.
    Type: Grant
    Filed: May 23, 2002
    Date of Patent: June 6, 2006
    Assignee: Mattson Thermal Products
    Inventors: Markus Hauf, Christoph Striebel
  • Patent number: 7022382
    Abstract: An apparatus and method efficiently focuses laser light to a target fiber to rapidly and evenly cure a coating on the fiber and to increase a draw rate for the fiber. The laser light is expanded and refocused to a strip of light having a diameter that is a multiple of the fiber diameter. The strip of light is applied to one side of the fiber and a reflection of the strip of light is focused to a second side of the fiber to provide uniform radiation of the fiber.
    Type: Grant
    Filed: June 16, 2000
    Date of Patent: April 4, 2006
    Assignee: Alcatel
    Inventors: Igor Vladimir Khudyakov, Michael P. Purvis, Bob J. Overton
  • Patent number: 7002169
    Abstract: A method of generating photons by sonoluminescence, from a gas bubble trapped in a liquid reservoir (2) by a standing ultrasound wave. An ultrasound impulse emitted by high-frequency transducers (T1–T8) is superposed on the standing wave, the high-frequency transducers being pre-focused onto the gas bubble and pre-synchronized with the light emissions from the gas bubble during an initial training stage in which said focusing and said synchronization are optimized.
    Type: Grant
    Filed: February 27, 2002
    Date of Patent: February 21, 2006
    Assignee: Centre National de la Recherche Scientific-CNRS
    Inventors: Jean-Louis Thomas, Mathias Fink
  • Patent number: 6984835
    Abstract: An irradiation apparatus has a large irradiation field and is capable of ensuring the uniformity of a dose distribution without strengthening the performance of an irradiation field enlarging device. The irradiation apparatus includes a beam interruption part for performing a plurality of irradiations of a radiation beam, a position control part for controlling a location to be irradiated in such a manner that the entire surface of the target can be irradiated in a plurality of irradiation zones including an overlapping area formed by the plurality of irradiations, and a multileaf collimator control part for providing a slope to a dose distribution in the overlapping area of the respective irradiation zones, so that the dose distribution over the entire surface of the target including the overlapping area is made flat or uniform by the plurality of irradiations of the radiation beam.
    Type: Grant
    Filed: January 23, 2004
    Date of Patent: January 10, 2006
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventor: Hisashi Harada
  • Patent number: 6927407
    Abstract: A radiation shielding arrangement for shielding high-energy neutron radiation and gamma radiation from high-energy particle accelerators or storage rings includes a shielding element made of water-containing material, for example with chemically bound water or water of crystallization, in particular gypsum. The water component of the material preferably makes up at least 5, 10 or 20 percent by weight. The hydrogen nuclei or protons contained therein moderate neutrons in a virtually ideal manner because of the almost identical mass and the maximum pulse transformation associated with this.
    Type: Grant
    Filed: March 18, 2004
    Date of Patent: August 9, 2005
    Assignee: Gesellschaft fur Schwerionenforschung mbH
    Inventors: Willi Brüchle, Georg Fehrenbacher, Torsten Radon, Frank Gutermuth
  • Patent number: 6891178
    Abstract: A method is provided for determining the positional accuracy of leaves of a multileaf collimator for delivering doses of radiation to a particular spatial location for treatment purpose. The method could be implemented as routine quality assurance check of the multileaf collimator leaf positioning errors. The method includes producing a first field and producing a second field, which is different from the first field. A dosimeter means is included for measuring a radiation dose difference or ratio between the first field and the second field at at least one spatial location. The dose difference or ratio is then used to determine the positional accuracy of the leaves by comparing with a known relationship between leaf positional errors and relative dosimeter outputs. The method provides a more simplified, accurate, efficient and reliable method over currently used methods.
    Type: Grant
    Filed: July 15, 2002
    Date of Patent: May 10, 2005
    Assignee: The Board of Trustees of the Lealand Stanford Junior University
    Inventor: Lei Xing
  • Patent number: 6867929
    Abstract: The present invention provides a light source device that is safe for human eyes and whose switching is performed at high speed. The light source device comprises one or more laser light sources (1) for emitting a monochromatic or polychromatic light beam, a diffuser (3), which may be transmissive, reflective, or a mixture thereof, for diffusing the light beam received directly from the laser light source or via an optical focusing system (2), and an optical collimator (4), which collimates the diffused light bundle emitted from the diffuser (3).
    Type: Grant
    Filed: May 14, 2002
    Date of Patent: March 15, 2005
    Assignees: Universidad Politecnica de Madrid, Victor Company of Japan, Limited
    Inventors: Francisco-José López-Hernández, Juan-Carlos Mi{overscore (n)}ano-Dominguez, Pablo Benitez-Giménez, Masahisa Sakai, Kazutoshi Hirohashi
  • Patent number: 6835679
    Abstract: A method and apparatus for light curing of composite materials in which the radiation required to initiate the curing is delivered via one or more lossy fiber optics. The fiber optics are made lossy by methods such as bending the fiber, weaving the fiber into a mat to create periodic micro-bends, tailoring the thickness of the fiber cladding to allow evanescent wave transmission, or simply removing the cladding at intervals along the fiber. Distribution of the light through out the composite material results in dramatic power and time reductions over traditional light curing methods. Unlike thermal curing of composite materials, there is no need for an auto-clave and hence no limit on the size of the part that may be created. Additional benefits include the possibility of curing at operational temperature and so avoiding thermal stresses.
    Type: Grant
    Filed: December 26, 2002
    Date of Patent: December 28, 2004
    Assignee: Continuum Dynamics, Inc.
    Inventors: Alan J. Bilanin, Andrew E. Kaufman, Robert McCullough
  • Patent number: 6834984
    Abstract: A UV curing lamp is provided which includes a curved and reflective surface which may be a cold mirror and may redirect incident UV light toward a band-pass filter. The UV light may be reflected by the curved, reflective surface and transmitted through the band-pass filter whereas the IR and visible light may pass through the curved, reflective surface. The UV, IR, and visible light reflected by shutters and direct UV, IR, and visible light from the lamp are separated by the band-pass filter which transmits the UV light and reflects the IR and visible light.
    Type: Grant
    Filed: October 31, 2002
    Date of Patent: December 28, 2004
    Assignee: Delaware Captial Formation, Inc.
    Inventors: Mark Tausch, Charles Alexander
  • Patent number: 6815681
    Abstract: An electron beam lithography apparatus, which uses a patterned emitter, includes a pyroelectric plate emitter that emits electrons using a patterned metal thin layer formed on the pyroelectric plate as a mask. When the emitter is heated, electrons are emitted from portions of the emitter covered with a patterned dielectric layer, and not from portions of the emitter covered with a patterned metal thin layer, and a pattern of the emitter is thereby projected onto a substrate. To prevent dispersion of emitted electron beams, the electron beams may be controlled by a permanent magnet, an electro-magnet, or a deflector unit. A one-to-one or x-to-one projection of a desired pattern on the substrate is thereby obtained.
    Type: Grant
    Filed: June 20, 2003
    Date of Patent: November 9, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dong-wook Kim, In-kyeong Yoo, Chang-wook Moon, In-sook Kim
  • Patent number: 6740893
    Abstract: An optical instrument includes an optical element and a detector for detecting an impurity concentration in an ambience containing a space surrounding the optical element. By controlling the impurity concentration on the basis of an output of the detector, deposition of impurities on the optical element and deterioration of the optical characteristic of the optical element thereby can be prevented effectively.
    Type: Grant
    Filed: October 3, 2000
    Date of Patent: May 25, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventor: Masayuki Tanabe
  • Patent number: 6717161
    Abstract: Apparatus for providing substantially two-dimensionally uniform irradiation of elongated three-dimensional objects while the objects are rotating and moving across the irradiator, with a high level of irradiance and with a substantially constant radiation dose on surfaces of the objects during each phase of the rotation and movement. At least one source of radiation produces radiation to irradiate the surfaces of the objects. Each of the sources of radiation is within a respective elongated elliptical reflecting trough and is spaced from the focal axis of the respective trough. Each trough terminates in an opening defining a rectangular plane substantially perpendicular to the major axis of the ellipse of the respective trough and substantially parallel to the longitudinal axis of the respective radiation source. Reflectors extend from the trough substantially to the path of the objects.
    Type: Grant
    Filed: April 30, 2003
    Date of Patent: April 6, 2004
    Assignee: Fusion UV Systems, Inc.
    Inventors: Miodrag Cekic, Boris Geller
  • Patent number: 6713774
    Abstract: A structure and method for changing or controlling the thermal emissivity of the surface of an object in situ, and thus, changing or controlling the radiative heat transfer between the object and its environment in situ, is disclosed. Changing or controlling the degree of blackbody behavior of the object is accomplished by changing or controlling certain physical characteristics of a cavity structure on the surface of the object. The cavity structure, defining a plurality of cavities, may be formed by selectively removing material(s) from the surface, selectively adding a material(s) to the surface, or adding an engineered article(s) to the surface to form a new radiative surface. The physical characteristics of the cavity structure that are changed or controlled include cavity area aspect ratio, cavity longitudinal axis orientation, and combinations thereof.
    Type: Grant
    Filed: November 30, 2000
    Date of Patent: March 30, 2004
    Assignee: Battelle Memorial Institute
    Inventors: John G. DeSteese, Zenen I. Antoniak, Michael White, Timothy J. Peters
  • Patent number: 6674829
    Abstract: A neutron radiation installation for treatment of different types of cancer tumours, comprising a source of neutrons (11), like a nuclear reactor or an accelerator dependent source of radiation, a conventional filter (14) for reducing the radiation energy to a suitable level for radiation treatment of cancer tumours, having low energetic neutron beams of an energy of between 1 eV and 40 keV, or preferably between 1 keV and 20 keV, and a radiation tube (22) out of which radiation beams are emitted towards a patient (10) having a cancer tumour (23), whereby an optimum radiation is obtained at a distance of between 50 and 100 cm from the output surface of the conventional filter (14), and in which the installation comprises an additional radiation filter (21) mounted between the conventional filter (14) and the output of the radiation tube, which additional filter is of a material which filters off neutrons in the epithermic spectrum from low energetic neutron beams up to an energy of about 1 keV, in particular
    Type: Grant
    Filed: March 9, 2001
    Date of Patent: January 6, 2004
    Assignees: Radicon AB, Studsvik AB
    Inventor: Kurt Sköld
  • Patent number: 6667487
    Abstract: A containment apparatus for containing a cloud of charged particles comprises a cylindrical vacuum chamber having a longitudinal axis. Within the vacuum chamber is a containment region. A magnetic field is aligned with the longitudinal axis of the vacuum chamber. The magnetic field is time invariant and uniform in strength over the containment region. An electric field is also aligned with the longitudinal axis of the vacuum chamber and the magnetic field. The electric field is time invariant, and forms a potential well over the containment region. One or more means are disposed around the cloud of particles for inducing a rotating electric field internal to the vacuum chamber. The rotating electric field imparts energy to the charged particles within the containment region and compress the cloud of particles.
    Type: Grant
    Filed: January 31, 2003
    Date of Patent: December 23, 2003
    Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventors: William Herbert Sims, III, James Joseph Martin, Raymond A. Lewis
  • Patent number: 6639235
    Abstract: An apparatus for altering the radiation intensity delivered from a radiation source has a plate member for holding a plurality of radiation modulating devices. A frame member is coupled to the radiation source for holding the plate member between the radiation source and a target area. The frame member allows the plate member to rotate within the frame member so different radiation modulating devices may be positioned between the radiation source and the target area to alter the radiation intensity delivered.
    Type: Grant
    Filed: August 23, 2002
    Date of Patent: October 28, 2003
    Inventor: Erdal M. Gurgoze
  • Patent number: 6614135
    Abstract: An apparatus for generating electromagnetic pulses includes circuitry comprising an induction coil having a silver anode projecting into the coil. Moveable silver mass elements are adjustably mounted on the anode. The circuitry is immersed in liquid hydrogen and when energized produces electromagnetic pulses. If is believed that some of the anode material is consumed during the production of EMP converting the anode material into electromagnetic radiation energy. As the consumption continues the elongate anode assembly produces a composite wave form that equates to the size, shape and arrangement of the mass elements.
    Type: Grant
    Filed: March 20, 2000
    Date of Patent: September 2, 2003
    Inventor: Thomas Joseph Clapham
  • Patent number: 6614037
    Abstract: Disclosed is an electron beam irradiating apparatus including an electron beam source; an accelerating unit for accelerating electrons emitted from the electron beam source; a deflecting unit for deflecting a highly energized electron beam generated by the accelerating unit in a scanning direction; a vacuum vessel accommodating the electron beam source, the accelerating unit, and the deflecting unit in a vacuum environment; a window foil for ejecting the electron beam from the vacuum environment into a gas environment; a crosspiece for adhering to and supporting the window foil; and a cooling block for shielding the crosspiece from the electron beam in areas that the electron beam intersects the crosspiece.
    Type: Grant
    Filed: February 6, 2001
    Date of Patent: September 2, 2003
    Assignee: Ebara Corporation
    Inventor: Yoshihiko Naito
  • Publication number: 20030147500
    Abstract: A radiation source comprising:
    Type: Application
    Filed: February 11, 2003
    Publication date: August 7, 2003
    Applicant: ELGEMS LTD.
    Inventor: Naor Wainer
  • Patent number: 6563126
    Abstract: An ultraviolet light permeable filter for an ultraviolet detection light is equipped on a filter glass surface with a dielectric multi-film layer which allows a visible radiation of wave length from 694 nm to 780 nm to reflect on the layer. The 694 nm to 780 nm wave length does not penetrate through the multi-film layer. When placed in an ultraviolet detection system, this filter prevents the occurrence of a reddish halation during inspection and display of a flaw detection light.
    Type: Grant
    Filed: January 18, 2002
    Date of Patent: May 13, 2003
    Assignee: Marktec Corporation
    Inventor: Masami Motoyama
  • Patent number: 6552864
    Abstract: A method and a system for generating a beam of radiation in a target plane located in a near-filed region of a radiation emitting means. A beam of radiation having a substantially plane wavefront is emitted. A normal Bessel beam, having its transverse profile substantially in the form of a Bessel function, is produced from said emitted beam of radiation. The normal Bessel beam is produced in a first medium of a refraction index n1 and is directed towards the target plane located in a second medium having a refraction index n2, such that n2<n1. Passage of the normal Bessel beam from the first medium into the second medium results in the generation of an evanescent Bessel beam of radiation propagating in the second medium. The evanescent Bessel beam has a center lobe significantly smaller in size than the wavelength of radiation in the second medium, and basically retains its shape in the second medium.
    Type: Grant
    Filed: February 25, 2000
    Date of Patent: April 22, 2003
    Assignee: Ramot at Tel Aviv University Ltd.
    Inventor: Shlomo Ruschin
  • Publication number: 20030030015
    Abstract: A method and apparatus for precisely controlling the area and accuracy of total radiation dose exposure of an article to be irradiated. In accordance with the method of the invention, the article to be irradiated is not exposed to ultra-violet radiation until the ultra-violet radiation sources of the apparatus have reached a maximum level of radiation output. Additionally, the apparatus is constructed and arranged so that the ultra-violet radiation impinging on the article can be instantly stopped thereby permitting a precise determination of the radiation dose to which the article has been exposed. To accomplish this, a source of radiation is disposed proximate the support that supports the article and a novel shutter arrangement is disposed between the support and the source of radiation for positively preventing any radiation from reaching the article until the shutter apparatus is moved to an open position.
    Type: Application
    Filed: August 10, 2001
    Publication date: February 13, 2003
    Inventor: Alex Waluszko
  • Patent number: 6501814
    Abstract: A dry radioactive substance storage facility stores spent fuel assemblies from nuclear power plants. The facility comprises a structure having a storage room storing storage tubes containing spent fuel assemblies. An air inlet duct defining an air inlet passage through which air is supplied into the storage room and a stack defining an air discharge passage through which air from the storage room is discharged outside are connected to the storage room. Radiation shielding members are disposed on the side of the air inlet duct and on the side of the stack, respectively, in the storage room to intercept radiation propagating toward the air inlet passage and the air discharge passage.
    Type: Grant
    Filed: September 25, 2001
    Date of Patent: December 31, 2002
    Assignee: Hitachi, Ltd.
    Inventors: Masashi Shimizu, Koichi Maki, Keiichiro Shibata, Masashi Oda, Naoki Kumagai, Hidetoshi Kanai
  • Publication number: 20020179859
    Abstract: An arc tube 6 of discharge lamp comprises a main tube body 11 of translucent ceramic sealed with a terminal plate 13 at both ends thereof. The main tube body 11 comprises integrally a large diameter portion 11A, a tapered portion 11B which is disposed at both sides of the large diameter portion 11A and has a smaller diameter toward the forward end thereof, and a small diameter portion 11C connected to the forward end of the tapered portion 11B. The curvature radius R of the border of the tapered portion 11B with the small diameter portion 11C is not smaller than 2 mm.
    Type: Application
    Filed: November 19, 2001
    Publication date: December 5, 2002
    Inventors: Yasaburo Takeji, Shinji Taniguchi
  • Publication number: 20020063224
    Abstract: Disclosed herein is a radiation image conversion panel that has a phosphor layer.
    Type: Application
    Filed: March 19, 2001
    Publication date: May 30, 2002
    Inventors: Hiroshi Ogawa, Shinichiro Fukui, Yasuo Iwabuchi, Noriyuki Inoue, Shigeo Hirano
  • Publication number: 20020011575
    Abstract: The method for making a multilayer composite having one or more colors brings together a number of acrylic layers, which are partially cured in a first step and completely cured in a second step. The curing takes place with actinic radiation, such as accelerated electrons, UV radiation or X-ray radiation, the curing unit operating with different dosage rates during the two steps. The curable acrylic layers are applied to the respective supporting layers by screen printing or stencil printing, or else may be applied to the supporting layers by casting or with the aid of printing rollers.
    Type: Application
    Filed: January 22, 2001
    Publication date: January 31, 2002
    Inventors: Laurens Petrus Vogels, Wilhelmus Josephus Alex Van De Wall
  • Patent number: 6303937
    Abstract: The present invention is for a ceramic calibration filter, in one embodiment a ceramic attenuator (410), for attenuating radiation between a light source (402) and a sensor (422). A laser signal is reduced by ceramic attenuator (410) to a low-level signal that can be measured the sensor (422).
    Type: Grant
    Filed: February 27, 1998
    Date of Patent: October 16, 2001
    Assignee: Eastman Kodak Company
    Inventors: Roger S. Kerr, Kurt M. Sanger
  • Patent number: 6295123
    Abstract: Conventional optical lithography has a lower limit of about 180 nm because the projection system is opaque to radiation of wavelength shorter than this. This limitation has been overcome by using, in a standard photoreduction system, light in the form of a train of short duration high intensity pulses. Because of two-photon interactions, light having half the wavelength of the illuminating radiation is then generated in the focal plane. There are thus two aerial images present while the photoresist is being exposed. One is the conventional long wavelength image and its associated CD while the other is the short wavelength image with its smaller CD. Since the resist is sensitive to only the shorter wavelength, only the lower CD image remains after development.
    Type: Grant
    Filed: October 13, 2000
    Date of Patent: September 25, 2001
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventor: Chun-Ming Wang
  • Patent number: 6278562
    Abstract: A filter for absorbing electromagnetic radiation which is used in heating a welding zone wherein a first part is joined to a second part. The filter includes a filter housing which contains a chamber within which a fluid is placed. The fluid absorbs undesired wavelengths of radiation from a heating source before the radiation reaches the welding zone. A heat exchanger may be connected to the filter in order to cool the fluid during the filtering process.
    Type: Grant
    Filed: July 9, 1999
    Date of Patent: August 21, 2001
    Assignee: Branson Ultrasonics Corporation
    Inventor: Donald C. Lovett
  • Patent number: 6271524
    Abstract: A gamma ray collimator assembly comprising a first portion and a second collimator portion, the first and second portions having different gamma ray acceptance angles.
    Type: Grant
    Filed: August 5, 1998
    Date of Patent: August 7, 2001
    Assignee: Elgems, Ltd.
    Inventors: Naor Wainer, Gideon Berlad, Yaron Hefetz, Dov Maor, Israel Ohana, Natan Hermony
  • Patent number: 6191428
    Abstract: An arrangement of shutter segments each having longitudinally opposed ends, front and back edges, and top and bottom solid surfaces, wherein each segment is adjacent to at least one other segment. The segments are arranged with the front and back edges of each segment in parallel along a first direction, and with one of the front or back edge of each segment overlapping one of the top or bottom surfaces of an adjacent segment. A drive hub is rigidly connected to each segment, respectively. A drive train engages all of the drive hubs, for simultaneously reciprocating the hubs and connected shutter segments rotatively through an actuation angle of no more than approximately 90 degrees (preferably 45 degrees) around respective axes of rotation which are parallel and coplanar along the first direction.
    Type: Grant
    Filed: June 30, 1998
    Date of Patent: February 20, 2001
    Inventor: Joseph J. Gilberti